CN216120244U - Wafer overturning device, system and wafer fixing mechanism - Google Patents
Wafer overturning device, system and wafer fixing mechanism Download PDFInfo
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- CN216120244U CN216120244U CN202122256496.7U CN202122256496U CN216120244U CN 216120244 U CN216120244 U CN 216120244U CN 202122256496 U CN202122256496 U CN 202122256496U CN 216120244 U CN216120244 U CN 216120244U
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
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Abstract
The utility model discloses a wafer turning device, a system and a wafer fixing mechanism, wherein the wafer turning device comprises the wafer fixing mechanism, the wafer fixing mechanism comprises a channel for the wafer to enter and exit, and the wafer turning device also comprises: the wafer fixing mechanism is arranged in the shell, and at least one end of the shell, corresponding to the channel, is provided with an opening for the wafer to enter and exit. The wafer fixing mechanism is arranged in the wafer overturning device to fix the wafer, so that the wafer can be conveniently switched between a horizontal state and a vertical state.
Description
Technical Field
The utility model relates to the technical field of semiconductors, in particular to a wafer overturning device, a wafer overturning system and a wafer fixing mechanism.
Background
In the semiconductor industry, a plurality of wafers (wafers) are stored horizontally in a wafer box with their front surfaces (chip surfaces) facing upward, in particular, 12-inch wafers currently stored horizontally in a FOUP (front opening unified pod). However, in some processes, especially batch cleaning processes, it is not only necessary to change the wafer from the horizontal carrier to the vertical carrier; it is also necessary to rotate the wafers in the singular position (or in the even position) 180 degrees in the vertical direction, so that the vertically arranged wafers are stored in a front-to-front manner, and the front surface is prevented from being contaminated by the dust on the back surface of the wafer (the contact surface of the robot arm) during the manufacturing process.
In the prior art, generally, a single-arm single-claw robot arm is used to take out wafers from a wafer cassette one by one, the robot arm directly rotates the wafers taken out from a singular groove (or an even groove) by 90 degrees (or-90 degrees) on the hand, and after other wafers rotate by 90 degrees in the opposite direction, the wafers are put into a vertical carrier one by one in order to meet the requirements of turning the wafers in the positive and negative directions and rotating the wafers in the horizontal and vertical directions. The biggest problem of the design is that the single-chip transmission consumes too much time and cannot meet the capacity requirement of mass production equipment.
Therefore, it is necessary to provide a further solution to the above problems.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a wafer overturning device, a wafer overturning system and a wafer fixing mechanism so as to overcome the defects in the prior art.
In order to solve the technical problems, the technical scheme of the utility model is as follows:
a wafer turnover device comprises a wafer fixing mechanism, wherein the wafer fixing mechanism comprises a channel for the wafer to enter and exit, and the wafer turnover device also comprises:
the wafer fixing mechanism is arranged in the shell, and an opening for the wafer to enter and exit is formed in at least one end, corresponding to the channel, of the shell.
In a preferred embodiment of the utility model, the device further comprises a driving mechanism, and the housing is connected with an actuating end of the driving mechanism and driven by the driving mechanism to rotate around an axis parallel to the horizontal plane and perpendicular to the channel so as to enable the channel to be parallel to or perpendicular to the horizontal plane.
The other technical scheme is as follows:
a wafer overturning system comprises the wafer overturning device.
In a preferred embodiment of the present invention, the apparatus further includes a wafer carrying device, and the wafer carrying device is used for carrying the wafer turned to the vertical state by the wafer turning device.
In a preferred embodiment of the present invention, the wafer carrying apparatus includes:
the wafer bearing comb set comprises two wafer bearing combs which are oppositely arranged so as to respectively clamp edges on two opposite sides of the wafer in a vertical state and cooperate to bear the wafer.
The other technical scheme is as follows:
a wafer holding mechanism comprising:
the horizontal supporting mechanism comprises two supporting comb columns which are oppositely arranged so as to support the wafer in a horizontal state in a matching manner, and a channel for the wafer to enter and exit is formed between the two supporting comb columns;
the circumferential clamping mechanism comprises at least two clamping comb columns and at least two clamping comb columns, wherein the at least two clamping comb columns are arranged at two ends of the channel respectively, and the at least two clamping comb columns are matched with the supporting comb columns to clamp the wafer on the supporting comb columns.
In a preferred embodiment of the present invention, the circumferential clamping mechanism includes two clamping comb pillars respectively disposed at two ends of the channel, and the center positions of the two clamping comb pillars are matched with the center positions of the two supporting comb pillars.
In a preferred embodiment of the present invention, the circumferential clamping mechanism includes at least three clamping comb pillars respectively disposed at two ends of the channel, and a center position of a circumscribed circle of a closed figure formed by the at least three clamping comb pillars is adapted to a center position of the two supporting comb pillars.
In a preferred embodiment of the present invention, the circumferential clamping mechanism includes four clamping comb columns disposed at two ends of the channel, and a center position of a circumscribed circle of a closed figure formed by the four clamping comb columns coincides with a center position of the two supporting comb columns.
In a preferred embodiment of the present invention, the supporting comb comprises a plurality of supporting plates, and the plurality of supporting plates are sequentially stacked at intervals along a direction perpendicular to a horizontal plane to horizontally support a plurality of wafers.
In a preferred embodiment of the present invention, the circumferential clamping mechanism further includes two driving assemblies two, the driving assemblies two are used for driving the two clamping combs located at the same end of the channel to rotate, the driving assemblies two include a driving member, a connecting rod connected to an execution end of the driving member, and two driving members, two ends of the connecting rod are respectively provided with a waist-shaped hole, one end of each driving member is fixed to one end of each clamping comb, and the other end of each driving member extends into the corresponding waist-shaped hole and can slide along the waist-shaped hole, so as to drive the corresponding clamping comb to rotate.
In a preferred embodiment of the present invention, the supporting comb further includes a rotating shaft disposed along the height direction of the channel, and the supporting plates are connected to the rotating shaft to move close to and support the wafer or move away from and avoid the wafer under the driving of the rotating shaft.
In a preferred embodiment of the present invention, the clamping comb comprises a plurality of clamping plates, and the clamping plates are matched with the corresponding supporting plates to contact the edges of the wafers on the corresponding supporting plates.
In a preferred embodiment of the present invention, the supporting plate is connected to the rotating shaft through a connecting member, and an avoiding space is provided between the connecting member and any end of the supporting plate, and the avoiding space is used for avoiding the wafer when the supporting plate is separated from the wafer.
In a preferred embodiment of the present invention, a plurality of the supporting plates are arranged in a row along a circumferential direction of the rotating shaft, and any one end of the supporting plate supports the wafer; or the like, or, alternatively,
the supporting plates are at least provided with two rows along the circumferential direction of the rotating shaft, and any one of the two rows supports the wafer.
In a preferred embodiment of the utility model, the end of the clamping plate is provided with a V-shaped groove matched with the thickness of the wafer.
In a preferred embodiment of the present invention, a gap is disposed between adjacent clamping plates, and the gap is matched with the wafer for the wafer to pass through.
In a preferred embodiment of the present invention, the holding comb is capable of rotating to drive the holding plate to move away from and avoid the wafer entering and exiting the channel, or to move close to and cooperate with each other to hold the wafer on the supporting comb.
In a preferred embodiment of the present invention, the circumferential clamping mechanism further includes a buffer component, and the buffer component is disposed on a rotation track of the clamping comb away from the wafer, so as to limit the separation of the clamping comb from the wafer.
In a preferred embodiment of the present invention, the circumferential clamping mechanism further includes a buffer component disposed on a moving path of the connecting rod for limiting the separation of the clamping comb from the wafer.
Compared with the prior art, the utility model has the beneficial effects that:
the wafer fixing mechanism arranged in the wafer overturning device is used for fixing the wafer, so that the wafer is convenient to convert between a horizontal state and a vertical state; further, the wafer fixing mechanism realizes the fixation of the wafer in a horizontal state or a vertical state through the cooperation of the horizontal supporting mechanism and the circumferential clamping mechanism, and is convenient to cooperate with other equipment to complete the wafer transfer.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a perspective view of a wafer flipping apparatus according to the present invention;
FIG. 2 is a perspective view of the wafer flipping apparatus of the present invention with a portion of the housing removed;
FIG. 3 is a schematic top view of a portion of FIG. 2;
FIGS. 4(a) - (b) are schematic structural diagrams of supporting comb pillars in different embodiments of the wafer flipping apparatus of the present invention;
FIG. 5 is a perspective view of a supporting comb of an embodiment of the wafer flipping apparatus of the present invention;
FIG. 6 is a schematic view of a supporting comb of another embodiment of the wafer flipping apparatus of the present invention;
FIG. 7 is a schematic front view of FIG. 6;
FIG. 8 is a perspective view of a clamping comb of the wafer flipping device of the present invention;
FIG. 9 is a top view of FIG. 8;
FIG. 10 is a partial side view of FIG. 8;
FIG. 11 is a partial perspective view of the wafer flipping apparatus according to the present invention;
FIG. 12 is a perspective view of a wafer carrier device according to the present invention in use;
FIG. 13 is a partial perspective view of a wafer carrier apparatus according to the present invention;
FIG. 14 is a schematic front view of FIG. 13;
FIG. 15 is a partial schematic view of the wafer carrier apparatus of the present invention in an in-use state.
Specifically, 1, a wafer;
600. a wafer turning device; 610. supporting the comb posts; 611. a rotating shaft; 612. a connecting member; 613. a support plate; 614. a drive motor; 615. a belt pulley; 616. a belt; 620. clamping the comb columns; 621. a clamping plate; 6211. a V-shaped groove; 6212. a gap; 622. a connecting rod; 6221. a kidney-shaped hole; 623. a transmission member; 624. a limiting block; 630. a housing; 640. a supporting seat; 650. a fixed seat; 651. an elastic member; 652. a contact block;
700. a wafer carrying device; 710. a mounting seat; 720. a first driving mechanism; 730. a bearing table; 731. carrying a wafer comb; 740. a second driving mechanism; 750. a wafer scanning device.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are used merely for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be taken as limiting the scope of the present invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the utility model, the meaning of "a plurality" is two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
As shown in fig. 1 to 3, the wafer flipping device 600 is used for flipping the wafer 1 between 0 ° and 360 °, and includes a wafer holding mechanism and a housing 630 for accommodating the wafer holding mechanism.
Specifically, the wafer fixing mechanism includes a channel for the wafer 1 to enter and exit, and at least one end of the housing 630 corresponding to the channel is provided with an opening for the wafer 1 to enter and exit.
Preferably, the apparatus further comprises a driving mechanism to drive the housing 630 to rotate, and the housing 630 is connected to an actuating end of the driving mechanism, so as to turn the wafer 1 at any angle between 0 ° and 360 °. Preferably, the housing 630 is rotated by a driving mechanism about an axis parallel to the horizontal plane and perpendicular to the passage so that the passage is parallel or perpendicular to the horizontal plane, thereby facilitating the entry and exit of the wafer 1.
Specifically, the housing 630 has a rectangular frame structure, and includes an upper fixing plate and a lower fixing plate disposed opposite to each other to mount the wafer fixing mechanism, and two rotating fixing plates disposed opposite to each other to be connected to the rotating mechanism to realize integral turning.
The rotating mechanism comprises two opposite supporting seats 640 and a driving mechanism arranged in any supporting seat 640, and the driving mechanism is preferably a hollow rotating motor so as to realize accurate automatic adjustment of a rotating angle. The housing 630 is disposed between the two supporting bases 640 and is rotated by a rotating motor with a brake and an encoder, so as to realize any turning between 0 ° and 360 °, i.e. to rotate around an axis parallel to the horizontal plane and perpendicular to the channel, so as to make the channel parallel or perpendicular to the horizontal plane.
Preferably, the supporting seat 640 is connected to the external supporting structure through a bottom plate, and a waist-shaped hole is formed in the bottom plate to realize left and right position adjustment, and a jack screw may be further provided to realize up and down position adjustment.
Of course, the apparatus may further include a detection mechanism to detect the state of the wafer 1 and the states of the mechanisms in the apparatus, so as to ensure the accuracy of the operation position.
The detecting mechanism includes a wafer 1 presence sensor, a wafer fixing mechanism position sensor, a driving member position sensor, and the like, for detecting the state of the wafer 1, the state of the wafer fixing mechanism, and the state of the driving member.
More specifically, the upper fixing plate and the lower fixing plate are respectively provided with a sensor for detecting whether the wafer 1 is in a centering state or not, and a correlation sensor is adopted, wherein the front pair and the rear pair are used for detecting the position of the wafer 1 to judge whether the wafer 1 is in the centering state, and the middle pair is used for detecting whether the wafer 1 is in the centering state or not, so that the next operation is judged.
The wafer flipping apparatus 600 may be disposed in a wafer flipping system.
The wafer flipping system may further include a wafer carrying device 700, wherein the wafer carrying device 700 is used for carrying the wafer 1 flipped to be vertical by the wafer flipping device 600.
As shown in fig. 12, the wafer carrier 700 includes at least two sets of carrier wafer comb sets nested together, and at least one set of carrier wafer comb set can be lifted relative to the other carrier wafer comb sets. Specifically, the wafer-supporting comb set includes two wafer-supporting combs 731 disposed oppositely to clamp two opposite side edges of the wafer 1 in a vertical state, respectively, and cooperate with the wafer 1.
The wafer carrier 700 may further include a carrier 730 and at least one driving mechanism three 760 disposed in the carrier 730, wherein the driving mechanism three 760 is connected to any one of the carrier wafer comb sets to drive the carrier wafer comb set to move up and down relative to other carrier wafer comb sets.
In one embodiment, the wafer carrier 700 includes a mounting base 710, a first driving mechanism 720 for driving the mounting base 710 to move, a second driving mechanism 740 for driving the second driving mechanism 730 to move, and a third driving mechanism arranged on the mounting base 710.
The mount 710 can move horizontally under the driving of the first driving mechanism 720, that is, the mount 710 can translate between the initial position and the wafer 1 taking and placing position under the driving of the first driving mechanism 720. The first driving mechanism 720 may be a linear module to drive the mount 710 to move back and forth along a straight line.
The susceptor 730 is disposed on the top of the mounting base 710 to support the wafer 1. The second driving mechanism 740 is disposed in the mounting base 710, and is configured to lift and rotate the platen 730 so that the platen 730 further moves to a corresponding position for taking and placing the wafer 1, and is configured to lift the platen 730 to a corresponding height to cooperate with the wafer scanning device 750 for scanning the wafer 1. The second driving mechanism 740 may include a vertically disposed linear module for lifting and a cylinder connected to the linear module for rotation.
As shown in fig. 13 and 14, the susceptor 730 includes at least two wafer-supporting comb sets nested to support wafers 1 in different states. The wafer comb set includes two wafer combs 731 disposed opposite to each other, so that the wafer 1 is vertically clamped between the wafer combs 731.
Taking two wafer-bearing comb sets as an example, the two wafer-bearing comb sets include an inner wafer-bearing comb set and an outer wafer-bearing comb set, the two wafer-bearing combs 731 of the outer wafer-bearing comb set are respectively located outside the two wafer-bearing combs 731 of the inner wafer-bearing comb set, and the inner wafer-bearing comb set and the outer wafer-bearing comb set are connected to a third driving mechanism to change the working state of the inner wafer and the outer wafer, as shown in fig. 15. The third driving mechanism can be a cylinder, and the inner layer and the outer layer are driven by the cylinder to lift so as to replace different groups of bearing wafer combs to bear the wafer 1. Specifically, inboard bearing wafer comb 731 is connected with the cylinder keysets through inboard wafer comb mounting panel, and the cylinder keysets passes through the cylinder upper plate and realizes being connected with the cylinder. The box structure, namely the bearing table 730, which is composed of a box cover plate, box side plates and a box bottom plate is arranged below the wafer comb mounting plate. When the outer wafer-bearing comb 731 is used, the cylinder is at an initial position, i.e., the inner wafer-bearing comb 731 is at a position lower than the outer wafer-bearing comb 731 by a certain distance. The cylinder adapter plate and part of the inner side wafer comb mounting plate are positioned at the lower part in the box body structure and are also positioned at a certain distance from the box body bottom plate. When the inner side bearing wafer comb 731 is used, the cylinder jacks up, the bearing wafer comb 731 is driven by the cylinder adapter plate to rise together, and the height of the bearing wafer comb is higher than that of the outer side bearing wafer comb 731 by a certain distance. From pleasing to the eye and installation space aspect consideration, pass through cylinder support diaphragm, the left and right riser of cylinder and cylinder fixed plate installation with the cylinder and fix to the box bottom plate on, be located the drum that goes up and down along with the straight line module that goes up and down together. On the cylinder, aiming at the cylinder speed regulating valve and the sensor, the side edge of the cylinder is provided with an opening and a cylinder cover plate. When in use, the cover plate is only required to be taken down.
The wafer-supporting comb 731 is provided with a plurality of clamping grooves along the length direction thereof so that the edge of the wafer 1 is embedded in the clamping grooves to be fixed. Specifically, the wafer carrying comb 731 is provided with 50 clamping slots to receive two sets of 25 wafers 1, so as to achieve the processing throughput of 50 wafers 1 at a time. Preferably, a set of 25 wafers 1 is loaded back and forth, and the two sets are alternately arranged, that is, the 25 wafers 1 are loaded into the first set and alternately arranged on the 50 holding grooves, and the 25 wafers 1 in the second set are inserted between two adjacent wafers 1 in the first set, that is, the two sets of wafers 1 are alternately arranged.
As shown in fig. 12, the wafer carrier 700 may further be connected to a wafer scanning device 750, so as to scan the state of the wafer 1 on the wafer carrier 700. Specifically, a wafer scanning device 750 is disposed near the initial position of the wafer carrier 700, and the wafer scanning device 750 includes a scanning sensor, and the scanning sensor can move along the length direction of the wafer carrier comb set to comprehensively scan the wafer 1 clamped by the scanning sensor, so as to quickly detect the information of the wafer 1 and the position state of the wafer 1.
The wafer fixing mechanism provided in the wafer flipping apparatus 600 as shown in fig. 1 to 3 includes a horizontal supporting mechanism and a circumferential clamping mechanism. The horizontal supporting mechanism includes two supporting comb pillars 610 disposed oppositely to support the wafer 1 in a horizontal state, and a channel for the wafer 1 to enter and exit is formed between the two supporting comb pillars 610. The circumferential clamping mechanism comprises at least two clamping comb posts 620 which are respectively arranged at two ends of the channel, and the at least two clamping comb posts 620 are matched with the supporting comb posts 610 to clamp the wafer 1 on the supporting comb posts 610.
The wafer fixing mechanism is disposed in the housing 630, and two ends of the housing 630 corresponding to the channel are provided with openings for the wafer 1 to enter and exit.
As shown in fig. 3, the wafer 1 enters and exits the wafer flipping apparatus 600 in the direction of the arrow, it is understood that the wafer 1 can be moved in from one side and out from the other side, or from the same side.
A horizontal support mechanism and a circumferential chucking mechanism are provided in the housing 630 to hold the wafer 1. The rotation mechanism drives the wafer 1 in the housing 630 to turn over at any angle between 0-360 °, and particularly, the rotation mechanism drives the wafer 1 in a horizontal state to rotate clockwise 90 ° to a vertical state, or rotate counterclockwise 90 ° to a vertical state.
As shown in fig. 2 and 3, the horizontal supporting mechanism includes two supporting combs 610 disposed opposite to each other and a first driving assembly for driving the two supporting combs 610 to rotate.
The two supporting combs 610 are oppositely disposed. The supporting comb 610 includes a rotating shaft 611, a connecting member 612 extending along an axial direction of the rotating shaft 611, and a plurality of supporting plates 613 disposed along a height direction of the connecting member 612, wherein the connecting member 612 and the plurality of supporting plates 613 thereon form a comb-shaped structure. The axial direction of the rotating shaft 611 is perpendicular to the in-out direction of the wafer 1, so that a plurality of wafers 1 can be correspondingly placed on the plurality of support plates 613. The support plate 613 is used for carrying the wafer 1, and preferably, the support plate 613 is a slope structure, and the support surface is inclined towards the bottom surface of the channel to reduce the contact area with the wafer 1, that is, when the wafer 1 enters the channel, the channel is in a state of being parallel to the horizontal plane, and the support surface is inclined towards the bottom surface of the channel, so that the support surface is in line contact or point contact with the wafer 1. Generally, one side of the connector 612 is provided with the same number of support plates 613 as the number of wafers 1 stored in the wafer 1 cassette 3 to completely receive one cassette of wafers 1, and specifically, 25 support plates 613 are provided to respectively carry 25 wafers 1, although not limited thereto, the number of the support plates 613 may be less than 25, or more than 25.
When the wafer 1 needs to be loaded, the two comb support columns 610 rotate to the supporting position for the wafer 1 to be inserted into and the edge of the comb support column is seated on the support plate 613, i.e. the rotating shaft 611 rotates an angle to drive the support plate 613 to rotate to the supporting position to load the wafer 1; when it is not necessary to carry the wafer 1 or avoid the wafer 1 from moving, the two comb support posts 610 rotate to the avoiding position to avoid the wafer 1, i.e. the rotating shaft 611 rotates an angle to drive the support plate 613 to rotate to the avoiding position and further away from the wafer 1.
In order to separately or alternatively load the wafers 1 before and after the processing process, the supporting comb 610 can be preferably rotated to the first supporting position and the second supporting position to respectively load the wafers 1 in different states or alternatively load the wafers 1.
The support plates 613 may be provided in at least two rows along the circumferential direction of the rotating shaft 611, and the support plate 613 in any one of the two rows supports the wafer 1. Referring to fig. 4a and 5, in one embodiment, two rows of support plates 613 are respectively disposed on two opposite sides of the support comb 610 in the height direction. Of course, the two rows of supporting plates 613 may not be disposed oppositely, but only need to form an included angle therebetween, so that when the wafer 1 contacts one of the two rows, the other one of the two rows does not contact the other one of the two rows. In this embodiment, the 180 ° arrangement is favorable for controlling the conversion between the support position and the avoidance position.
The two rows of support plates 613 respectively support wafers 1 in different states, and the distance D between the two rows of support plates 613, the length L of the support plates 613 and the position of the rotating shaft 611 are matched to enable the comb support 610 to rotate 90 ° and then to be separated from contact with the wafer 1. Specifically, when the two supporting combs 610 are both in the initial state, the row of supporting plates 613 of the two supporting combs 610 is in the opposite state to contact with the wafer 1 and carry the wafer 1, that is, the supporting combs 610 are in the first supporting position; both the two supporting combs 610 rotate 90 ° around the axis in the initial state, the supporting plates 613 of the two supporting combs 610 are disengaged from the wafer 1, that is, the supporting combs 610 are in the avoiding position; the two comb support posts 610 continue to rotate about the axis in the same direction by 90 °, and the other row of support plates 613 of the two comb support posts 610 are opposite to each other to contact with the wafer 1 and carry the wafer 1, i.e. the comb support posts 610 are at the second support position. Of course, when the two rows of support plates 613 are not symmetrically disposed, the corresponding angle is rotated according to the position thereof to switch different stations.
The plurality of support plates 613 may be arranged in a row along the circumferential direction of the rotating shaft 611, and any one end of the support plates 613 supports the wafer 1. Referring to fig. 4b, in another embodiment, only one side of the supporting comb 610 is provided with 25 supporting plates 613 along the height direction thereof, two ends of the supporting plates 613 respectively support wafers 1 in different states, and the length L of the supporting plates 613, the width W thereof and the position of the rotating shaft 611 are matched to make the supporting comb 610 rotate a certain angle and then be separated from contact with the wafer 1. Specifically, when the two supporting combs 610 are both in the initial state, one end of the supporting plate 613 of the two supporting combs 610 is in an opposite state to contact with the wafer 1 and carry the wafer 1, that is, the supporting combs 610 are in the first supporting position; the two supporting combs 610 rotate around the axis by a certain angle in the initial state, the supporting plates 613 of the two supporting combs 610 are separated from the contact with the wafer 1, that is, the supporting combs 610 are in the avoiding position at this time; the two comb support columns 610 continue to rotate around the axis in the same direction by a certain angle, and the other ends of the support plates 613 of the two comb support columns 610 are opposite to each other to contact with the wafer 1 and carry the wafer 1, i.e. the comb support columns 610 are at the second support position.
Referring to fig. 6 and 7, in order to reduce the size of the support plate 613 and facilitate the support plate 613 to be separated from the wafer 1, the support combs 610 in the above two embodiments may be provided with an escape space. Specifically, the support plate 613 is connected to the rotating shaft 611 through a connecting member 612, and an avoiding space is provided between the connecting member 612 and any one end of the support plate 613, and the avoiding space is used for avoiding the wafer 1 when the support plate 613 is separated from the wafer 1. The connecting member 612 is spaced from the end of the support plate 613, i.e., the connecting member 612 is connected to a portion of the support plate 613. In one embodiment, as shown in the solid line portion of fig. 6, the connecting member 612 is shorter than the supporting plate 613, so as to increase the space between the connecting member 612 and the supporting plate 613, when the supporting comb 610 rotates the supporting plate 613, the wafer 1 gradually approaches the end of the connecting member 612 and is then separated from the supporting comb 610. In another embodiment, as shown in the dotted line in fig. 6, the thickness of the connecting member 612 is gradually decreased along the direction a toward the direction b, and the space between the connecting member 612 and the supporting plate 613 is increased, so that when the supporting comb 610 drives the supporting plate 613 to rotate, the wafer 1 gradually approaches the end of the connecting member 612 and further comes out of contact with the supporting comb 610.
Further, the end of the connecting member 612 is tapered from the side thereof away from the supporting plate 613 to the side thereof close to the supporting plate 613, so that the end of the supporting plate 613 is not connected to the connecting member 612, and the contact area between the connecting member 612 and the supporting plate 613 is as large as possible, thereby improving the strength of the joint between the two and further improving the stability of the carrier wafer 1.
As shown in fig. 11, the first driving assembly includes a driving motor 614, a pulley 615, and a belt 616. Specifically, the same ends of the two comb support columns 610 are respectively provided with a belt pulley 615, and are connected with each other through a belt 616 to achieve synchronous rotation, and the belt pulley 615 on any one comb support column 610 is connected with a driving motor 614 through the belt 616 so as to drive the two comb support columns 610 to rotate synchronously. The drive motor 614 may be a servo motor or a stepper motor. In order to ensure the rotation balance of the two supporting combs 610, a cylinder lock pin is respectively arranged near the two supporting combs 610 to control the rotation, the lock pin rises to allow the rotation, and the lock pin is locked after the reset.
Preferably, a comb position sensor is provided on the pulley 615 to confirm the rotation angle of the supporting comb 610.
As shown in fig. 2 and 3, the circumferential clamping mechanism includes four clamping combs 620 and a second driving assembly for driving the four clamping combs 620 to rotate. In this embodiment, two driving components two are used to drive two corresponding clamping comb posts 620 respectively. The center of the circle circumscribing the closed figure formed by the four clamping comb columns 620 coincides with the center of the two supporting comb columns 610.
Of course, the circumferential clamping mechanism may also include two clamping combs 620 separately disposed at two ends of the channel, and the center positions of the two clamping combs 620 are matched with the center positions of the two supporting combs 610, so as to clamp and fix the wafer 1 on the supporting combs 610.
Or, the circumferential clamping mechanism includes at least three clamping comb pillars 620 respectively disposed at two ends of the channel, and a center position of an outer circle of a closed figure formed by the at least three clamping comb pillars 620 is matched with center positions of the two supporting comb pillars 610, so as to clamp and fix the wafer 1 located on the supporting comb pillars 610.
The holding comb 620 can rotate to drive the holding plate 621 to move away from and avoid the wafer 1 in the access channel, or move close to and cooperate with each other to hold the wafer 1 on the supporting comb 610. In this embodiment, the four clamping comb pillars 620 are respectively disposed on two sides of the two supporting comb pillars 610 to clamp the plurality of wafers 1 on the two supporting comb pillars 610 after rotation. Meanwhile, the clamping comb column 620 is rotatably arranged, so that the wafer 1 can be conveniently rotated to avoid the wafer 1 when entering the channel, and the wafer 1 can be smoothly placed on the horizontal supporting mechanism.
As shown in fig. 8 to 10, the clamping comb 620 is provided with a plurality of clamping plates 621 along the height direction thereof to clamp a plurality of wafers 1 respectively, and generally, 25 clamping plates 621 are provided to clamp 25 wafers 1 respectively, but not limited thereto. The number of clamping plates 621 is generally the same as the number of single-side support plates 613, so as to clamp all the wafers 1 on the support plates 613.
One side of the clamping plate 621 facing the wafer 1 is provided with a V-shaped groove 6211 to cooperate with the edge of the wafer 1, generally speaking, the maximum width of the V-shaped groove 6211 is slightly larger than the thickness of the wafer 1 to clamp the wafer 1. The arrangement of the V-shaped groove 6211 makes the clamping plate 621 in point contact with the wafer 1, and the contact area is very small, thereby preventing the wafer 1 from polluting the clamping plate 621, and enabling the wafer 1 before and after the processing process to be clamped and moved by using the same clamping plate 621.
A gap 6212 is formed between adjacent clamping plates 621, and the gap 6212 is matched with the wafer 1 for the wafer 1 to pass through, so as to match with a subsequent device to take away the wafer 1 turned to be vertical.
As shown in FIG. 11, the second driving assembly comprises a driving member, a connecting rod 622 connected to the driving member, and a transmission member 623 connected to the rotating shaft of the clamping comb 620.
Waist-shaped holes 6221 are opened at both ends of the connecting rod 622, one end of the transmission member 623 is connected with the rotating shaft of the clamping comb column 620, and the other end is slidably arranged in the waist-shaped hole 6221. The driving member drives the connecting rod 622 to move in the wafer 1 in-out direction, which causes the driving member 623 to slide in the waist-shaped hole 6221, and further drives the clamping comb 620 to rotate around its rotation axis to clamp or separate the wafer 1 on the supporting comb 610. Two clamping combs 620 located at the same end of the wafer 1 in-out direction are controlled by a driving assembly two. More specifically, the two links 622 move away from each other so that the four clamping combs 620 clamp the wafer 1, and the two links 622 move relative to each other so that the four clamping combs 620 are out of contact with the wafer 1. The drive member is preferably a cylinder.
The two ends of the moving direction of the connecting rod 622 are preferably provided with stoppers 624 to limit the moving distance of the connecting rod 622.
The buffer assembly is disposed on the moving path of the connecting rod 622 for limiting the separation of the clamping comb 620 from the wafer 1. Specifically, a side of the connecting rod 622 close to the outside of the channel is provided with a buffer mechanism, the buffer mechanism includes a fixed seat 650 fixed with the housing 630, the fixed seat 650 is provided with an elastic member 651 facing the connecting rod 622, and preferably, a front end of the elastic member 651 is provided with a contact block 652. When the clamping comb 620 is in the clamping state, the side of the connecting rod 622 abuts against the abutting block 652, so that when the wafer 1 in the clamped state is subjected to a radial acting force, the wafer 1 can be buffered by the buffering mechanism, and the wafer 1 is prevented from being damaged. Preferably, the maximum compression amount of the elastic member 651 is matched to the wafer 1 lift-up distance. Further, the conflict block 652 is a shaft sleeve, a guide shaft is arranged on the connecting rod 622, and the guide shaft is slidably connected with the shaft sleeve, so that the moving stability of the connecting rod 622 is further improved. The elastic member 651 is preferably a compression spring.
Of course, the buffer assembly may also be disposed on the rotation track of the clamping comb 620 away from the wafer 1 for limiting the separation of the clamping comb 620 from the wafer 1.
When the horizontal supporting mechanism and the circumferential clamping mechanism are installed, the supporting height alignment of the supporting comb columns 610 at two sides and the arc center and height alignment of the four clamping comb columns 620 can be realized by means of the wafer 1 positioning tool corresponding to the size and shape of the wafer 1, so that after the wafer 1 in the whole mechanism is clamped, the wafer 1 is aligned with the supporting comb columns 610 and the clamping comb columns 620 in the center and is consistent in height.
In the system, the wafer carrying device 700 is used for docking with the wafer flipping device 600 and transferring the wafer 1 in a vertical state therebetween, taking the wafer 1 as an example, the operation flow is as follows:
the wafer turnover device 600 turns over 25 wafers 1 from a horizontal state to a vertical state, the supporting comb columns 610 rotate to an avoidance position, namely, the wafers 1 are separated from contact, and the wafers 1 are clamped and fixed by the four clamping comb columns 620, so that the wafers 1 are prevented from being damaged by friction between the surfaces of the wafers 1 and the supporting surfaces of the supporting comb columns 610 in the subsequent wafer taking process;
the first driving mechanism 720 drives the mounting base 710 to move to the lower part of the wafer turnover device 600, and the third driving mechanism drives the comb group corresponding to the required carrier wafer to ascend to prepare for carrying the wafer 1;
the second driving mechanism 740 drives the susceptor 730 to rotate to a corresponding angle, generally 0 ° or 180 °, so that the two sets of wafers 1 can reach different opposite surfaces, for example, a front surface to face facing each other, a back surface to back facing each other, a front surface to back facing each other, and the like between the two sets of wafers 1;
the second driving mechanism 740 drives the loading platform 730 to ascend, the wafer loading comb 731 contacts the wafer 1 clamped in the wafer overturning device 600 and further lifts the wafer 1 slightly, and the wafer 1 is not damaged due to the action of the buffer mechanism on the wafer overturning device 600;
the clamping comb column 620 close to the bearing platform 730 rotates to separate from the wafer 1, so that the wafer 1 is located on the bearing wafer comb group on the bearing platform 730, and the clamping comb group far from the bearing platform 730 rotates to separate from the wafer 1, so that the wafer 1 is completely located on the bearing wafer comb group;
the second driving mechanism 740 drives the bearing table 730 to descend to finish the taking of the film;
when the second group of wafers 1 is taken, the first driving mechanism 720 drives the mounting seat 710 to move a distance so that the vacant positions on the wafer-bearing combs 731 are aligned with the wafer turning device 600, and the moving distance is matched with the distance between the adjacent clamping plates 621 of the wafer turning device 600 so as to prevent the first group of wafers 1 from colliding with the clamping comb columns 620;
the first driving mechanism 720 drives the mounting base 710 to return to the initial position, and the wafer scanning device 750 is activated to scan the wafer 1.
In the above method, the wafer carrier 700 is rotated 180 degrees horizontally to face the wafer 1, but the wafer turnover device 600 may alternatively rotate clockwise/counterclockwise to face the wafer 1.
In conclusion, the wafer fixing mechanism stably supports the horizontal wafers transferred by the wafer mechanical arm through the horizontal supporting mechanism, and circumferentially clamps and fixes the wafers on the horizontal supporting mechanism through the circumferential clamping mechanism, so that the wafers can be fixed by being separated from the supporting of the horizontal supporting mechanism, and the wafers can conveniently rotate.
It will be evident to those skilled in the art that the utility model is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the utility model being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (18)
1. A wafer turnover device is characterized by comprising a wafer fixing mechanism, wherein the wafer fixing mechanism comprises a channel for the wafer (1) to enter and exit, and the wafer turnover device further comprises:
the wafer fixing mechanism is arranged in the shell (630), and an opening for the wafer (1) to enter and exit is formed in at least one end, corresponding to the channel, of the shell (630).
2. The wafer flipping apparatus of claim 1, further comprising a driving mechanism, wherein the housing (630) is connected to an actuating end of the driving mechanism and driven to rotate about an axis parallel to a horizontal plane and perpendicular to the channel to make the channel parallel or perpendicular to the horizontal plane.
3. A wafer flipping system, comprising a wafer flipping device (600) according to claim 1 or 2.
4. The wafer flipping system according to claim 3, further comprising a wafer carrying device (700), wherein the wafer carrying device (700) is used for carrying the wafer (1) flipped to a vertical state by the wafer flipping device (600).
5. The wafer flipping system of claim 4, wherein the wafer carrier (700) comprises:
the wafer bearing comb comprises at least two groups of bearing wafer comb groups which are nested, wherein at least one group of bearing wafer comb groups can lift relative to other bearing wafer comb groups, and each bearing wafer comb group comprises two bearing wafer combs (731) which are oppositely arranged so as to respectively clamp the edges of two opposite sides of the wafer (1) in a vertical state and cooperate to bear the wafer (1).
6. A wafer fixing mechanism, comprising:
the horizontal supporting mechanism comprises two supporting comb columns (610) which are oppositely arranged so as to be matched with and support the wafer (1) in a horizontal state, and a channel for the wafer (1) to enter and exit is formed between the two supporting comb columns (610);
circumferential clamping mechanism, circumferential clamping mechanism is including dividing locating two at least centre gripping comb post (620) at passageway both ends, at least two centre gripping comb post (620) with support comb post (610) and cooperate, lie in with the centre gripping support on comb post (610) wafer (1).
7. The wafer fixing mechanism according to claim 6, wherein the circumferential clamping mechanism comprises two clamping comb pillars (620) respectively disposed at two ends of the channel, and a central position of the two clamping comb pillars (620) is matched with a central position of the two supporting comb pillars (610).
8. The wafer fixing mechanism according to claim 6, wherein the circumferential clamping mechanism comprises at least three clamping combs (620) respectively disposed at two ends of the channel, and a center position of a circumscribed circle of a closed figure formed by the at least three clamping combs (620) is adapted to a center position of the two supporting combs (610).
9. The wafer fixing mechanism according to claim 6, wherein the circumferential clamping mechanism comprises four clamping comb pillars (620) disposed at two ends of the channel, and a center position of a circle circumscribing a closed figure formed by the four clamping comb pillars (620) coincides with a center position of the two supporting comb pillars (610).
10. The wafer fixing mechanism as claimed in claim 6, wherein the supporting comb (610) comprises a plurality of supporting plates (613), and the plurality of supporting plates (613) are sequentially stacked at intervals in a direction perpendicular to a horizontal plane to horizontally support a plurality of wafers (1).
11. The wafer fixing mechanism according to claim 9, wherein the circumferential clamping mechanism further comprises two driving assemblies two, the driving assemblies two are used for driving the two clamping combs (620) located at the same end of the channel to rotate, the driving assemblies two comprise a driving member, a connecting rod (622) connected to an executing end of the driving member, and two transmission members (623), two ends of the connecting rod (622) are respectively provided with a kidney-shaped hole (6221), one end of each transmission member (623) is fixed to one end of each clamping comb (620), and the other end of each transmission member (623) extends into the corresponding kidney-shaped hole (6221) and can slide along the corresponding kidney-shaped hole (6221) to drive the corresponding clamping comb (620) to rotate.
12. The wafer fixing mechanism as claimed in claim 10, wherein the supporting comb column (610) further comprises a rotating shaft (611) disposed along the height direction of the channel, and a plurality of supporting plates (613) are connected to the rotating shaft (611) to move toward and support the wafer (1) or move away from and avoid the wafer (1) under the rotation of the rotating shaft (611).
13. The wafer fixing mechanism as claimed in claim 10, wherein the clamping comb (620) comprises a plurality of clamping plates (621), and the clamping plates (621) are matched with the corresponding supporting plate (613) to contact the edge of the wafer (1) on the corresponding supporting plate (613).
14. The wafer fixing mechanism according to claim 12, wherein the support plate (613) is connected to the rotating shaft (611) through a connector (612), and an avoiding space is provided between the connector (612) and any one end of the support plate (613), and the avoiding space is used for avoiding the wafer (1) when the support plate (613) is detached from the wafer (1).
15. The wafer fixing mechanism according to claim 12, wherein a plurality of the support plates (613) are arranged in a row along a circumferential direction of the rotating shaft (611), and either end of the support plates (613) supports the wafer (1); or the like, or, alternatively,
the support plates (613) are arranged in at least two rows along the circumferential direction of the rotating shaft (611), and the support plates (613) in any one of the two rows support the wafer (1).
16. The wafer fixing mechanism as claimed in claim 13, wherein the end of the clamping plate (621) is provided with a V-shaped groove (6211) matching the thickness of the wafer (1).
17. The wafer fixing mechanism according to claim 13, wherein a gap (6212) is provided between adjacent clamping plates (621), and the gap (6212) is matched with the wafer (1) for the wafer (1) to pass through.
18. The wafer fixing mechanism as claimed in claim 13, wherein the clamping comb (620) can rotate to drive the clamping plate (621) to move away from and avoid the wafer (1) entering and exiting the channel, or to approach and cooperate with each other to clamp the wafer (1) on the supporting comb (610).
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| CN202111090818.3A Pending CN113725145A (en) | 2021-05-07 | 2021-09-17 | Wafer transfer mechanical arm, transfer method and wafer clamp |
| CN202122263550.0U Active CN216288368U (en) | 2021-05-07 | 2021-09-17 | Wafer horizontal supporting device and wafer transferring mechanical arm |
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| CN202111090674.1A Pending CN113745140A (en) | 2021-05-07 | 2021-09-17 | Wafer transfer mechanical arm, wafer horizontal supporting device and supporting method |
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| CN202111090824.9A Pending CN113707587A (en) | 2021-05-07 | 2021-09-17 | Edge searching device and edge searching method for wafer |
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| CN202111090818.3A Pending CN113725145A (en) | 2021-05-07 | 2021-09-17 | Wafer transfer mechanical arm, transfer method and wafer clamp |
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| CN114361094B (en) * | 2022-03-15 | 2022-06-03 | 三河建华高科有限责任公司 | Efficient feeding transmission device suitable for stacking wafers |
| CN114420616A (en) * | 2022-03-28 | 2022-04-29 | 西安奕斯伟材料科技有限公司 | Groove type cleaning device |
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2021
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Also Published As
| Publication number | Publication date |
|---|---|
| CN113745142A (en) | 2021-12-03 |
| CN216120258U (en) | 2022-03-22 |
| CN113745140A (en) | 2021-12-03 |
| CN216288355U (en) | 2022-04-12 |
| CN216288354U (en) | 2022-04-12 |
| CN113707587A (en) | 2021-11-26 |
| CN113745141A (en) | 2021-12-03 |
| CN216120257U (en) | 2022-03-22 |
| CN216288367U (en) | 2022-04-12 |
| CN113745139A (en) | 2021-12-03 |
| CN216288353U (en) | 2022-04-12 |
| CN216288368U (en) | 2022-04-12 |
| CN113725145A (en) | 2021-11-30 |
| CN114023675A (en) | 2022-02-08 |
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Address after: 201112 floor 2, building 1, No. 555, Wanfang Road, Minhang District, Shanghai Patentee after: Shanghai Han's Fuchuang Technology Co.,Ltd. Address before: 201112 floor 2, building 1, No. 555, Wanfang Road, Minhang District, Shanghai Patentee before: SHANGHAI FORTREND TECHNOLOGY Co.,Ltd. |