CN216074027U - Microwave chemical vapor deposition diamond device - Google Patents

Abstract

The utility model discloses a microwave chemical vapor deposition diamond device, which comprises a vacuum reaction chamber, wherein the top of a cavity of the vacuum reaction chamber is provided with a quartz glass window externally connected with a microwave waveguide tube and an open annular air passage for supplying reaction gas, a liftable sample table is arranged in the cavity, and the cavity is fixed on a cavity fixing plate, and the microwave chemical vapor deposition diamond device is characterized in that: the sample stage is also provided with an open-pored annular gas duct into which a reaction gas is fed. According to the utility model, annular air channel gas distribution is additionally arranged below the sample platform below the reaction chamber, and fresh reaction gas is supplemented in a close range close to a diamond growth area, so that more activated primary carbon can be obtained, and the growth rate and the fixed rate of diamond can be improved; the added air distribution structure can be realized by only adding a workpiece plate air inlet plate above a water-cooling plate of the original equipment, connecting an air supply pipe additionally arranged through an inner cavity of a lifting shaft of the water-cooling plate and then externally connecting an air supply nozzle. Simple structure and low cost.

Description

Microwave chemical vapor deposition diamond device

Technical Field

The utility model relates to a microwave chemical vapor deposition device, in particular to a microwave chemical vapor deposition diamond device applied to diamond growth.

Background

Diamond has many excellent properties, such as high hardness, low friction coefficient, high elastic modulus, high thermal conductivity, high insulation, wide energy gap, high mobility of current carriers, good chemical stability and the like, so that the diamond film has wide application prospects in the industrial fields of electronics, optics, machinery and the like, and the diamond particles are precious ornaments. In recent years, the technology of depositing diamond films and particles under low pressure and low temperature has become more and more mature, and the commercialization and industrial chain is gradually formed. The hot wire method and the microwave plasma method become main techniques for preparing diamond films and particles. These methods essentially use some form of energy to excite and decompose carbon-containing compound gas molecules and under certain conditions cause diamond nucleation and growth on the substrate surface, which is a Chemical Vapor Deposition (CVD) process. The Microwave Plasma Chemical Vapor Deposition (MPCVD) has the characteristics of no internal electrode, and can avoid the discharge pollution of the electrode; the operating air pressure range is wide; the energy conversion efficiency is high; can generate a large-range high-density plasma; microwave and plasma parameters can be conveniently controlled, etc. Therefore, it is an important method for preparing a high-quality diamond film with large area, uniformity and no impurity contamination, and is also an important method for growing large diamond particles with large number of particles.

The MPCVD device is generally divided into four major parts, i.e., a microwave system, a plasma reaction chamber, a vacuum system, and a gas supply system. The microwave system, the vacuum system and the gas supply system are all universal and can be applied to various types of MPCVD devices. The MPCVD plasma reaction chamber of the current production type mostly adopts a metal round cavity with a microwave window; the coupling mode of microwave and plasma mostly adopts the antenna coupling mode. The gas supply system consists of a gas source, a pipeline, a valve for controlling the gas flow, a flowmeter, a gas distribution loop in the reaction chamber and the like.

The existing diamond film is designed and built specially for preparing diamond filmVertical MPCVD apparatus, typical deposition conditions are 1.3X 10 atmospheres³—10.7×10³Pa, substrate temperature 500-900 deg.C, gas source of hydrogen gas mixed with 0.1% -5.0% carbon-containing gas, and microwave of 2.45GHz to generate plasma in the limited area not contacting the wall of the reaction chamber and deposit diamond film or diamond particles on the substrate contacting the plasma. In this way, pure diamond films and diamond particles can be produced without contamination of the wall material.

The gas distribution mode of supplying reaction gas into the reaction chamber of the microwave chemical vapor deposition device for diamond growth in the prior art adopts a gas distribution mode of opening small holes on an annular gas channel positioned above the reaction chamber, which almost becomes the fixed layout of the similar device, and conforms to the flow direction of the plasma generated by coupling the microwave into the reaction chamber from the upper part, and then the plasma is gathered on a substrate on a sample table below the reaction chamber to grow the diamond. This gas distribution method is not perfect for years because no fresh reaction gas is rapidly supplemented when the diamond is grown on the sample table, and more active and fresh primary carbon is lacked when the diamond is synthesized, which is not favorable for improving the growth rate and the perfectness rate of the diamond.

SUMMERY OF THE UTILITY MODEL

The utility model aims to solve the technical problem of providing a microwave chemical vapor deposition diamond device, which has more perfect gas distribution and quicker and more perfect diamond growth; secondly, the device is more simplified and compact.

The technical scheme adopted by the utility model is as follows:

the utility model provides a microwave chemical vapor deposition diamond device, includes a vacuum reaction chamber, the top of the cavity 20 of vacuum reaction chamber is equipped with external microwave waveguide's quartz glass window 24 and supplies the trompil annular air flue of reaction gas, is equipped with liftable sample platform in the cavity, and cavity 20 is fixed on cavity fixed plate 21, characterized by: the sample stage is also provided with an open-pored annular gas duct into which a reaction gas is fed.

Preferably, the specimen stage comprises: the device comprises an air inlet plate 22, a copper back plate 33, a liftable water-cooling lifting disc 15-1, a water-cooling disc support rod 31, an air supply pipe 22-3 and a transmission molybdenum rod 34;

a lower annular air passage 22-1 is dug on the bottom surface of the air inlet plate 22 positioned at the uppermost part and close to the periphery, and a plurality of radial air distribution holes 22-2 are uniformly distributed along the periphery and communicated with the lower annular air passage;

the top surface of the middle copper back plate 33 is tightly attached to the bottom surface of the air inlet plate 22, an annular air passage groove 33-2 of the copper back plate is also dug at the position, corresponding to the lower annular air passage of the air inlet plate 22, of the top surface of the copper back plate 33 and fixedly connected with the upper annular air passage groove and the lower annular air passage groove through screws, the two annular air passage grooves form a whole ring of annular air passages, and vent holes 33-1 are drilled in the bottom surface of the copper back plate 33 and communicated with the annular air passage groove 33-2;

the top surface of the water-cooled lifting disc 15-1 at the bottom is tightly attached and fixed with the bottom surface of the copper back plate 33 and is sealed by an O-shaped sealing ring 32 close to the periphery, an air inlet through hole 15-1-2 is arranged on the surface of the water-cooled lifting disc 15-1 close to the periphery and is communicated with an air vent 33-1 of the copper back plate 33, the lower part of the air inlet through hole is connected with an air supply pipe 22-3, and the air supply pipe 22-3 is externally connected with an air source;

the centers of the air inlet plate 22, the copper back plate 33 and the water-cooling lifting disc 15-1 which are overlapped together are provided with center holes for the upper end and the lower end of a transmission molybdenum rod 34 which can be lifted up and down.

When the device works, a workpiece disc (not shown) can be placed on the upper end face of the air inlet plate 22, the center of the workpiece disc is connected with the transmission molybdenum rod 34 through a matching hole, the transmission molybdenum rod independently controls the lifting, and a sample or a substrate (generally a silicon wafer) for growing diamond is placed on the upper end face of the workpiece disc.

Therefore, the gas distribution of the upper and lower bidirectional annular gas passages of the reaction chamber can be realized, the gas distribution is more perfect, and the diamond growth is faster and more perfect.

Wherein, the component structure that the water-cooling dish goes up and down includes: a water-cooling lifting disc 15-1, a water-cooling disc lifting shaft 15, a water-cooling disc lifting shaft upper end flange 15-2, a limiting plate 30, a water-cooling disc supporting rod 31, a guide flange 2 and a guide flange supporting seat 3, wherein the water-cooling disc lifting shaft 15 is a hollow shaft, an air supply pipe 22-3, an inlet pipe 15-3, an outlet pipe 15-3 and a central transmission rod 29 penetrate through the cavity, the upper end surface of the water-cooling disc lifting shaft 15 is welded with the water-cooling disc lifting shaft upper end flange 15-2, the upper end surface of the flange is fixedly connected with a limit plate 30, the limit plate 30 is provided with a plurality of through holes for the air supply pipe 22-3 and the inlet and outlet water gas to pass through, the center hole of the test platform is a limiting hole of a center transmission rod 29, the upper end head of the center transmission rod 29 is connected with a transmission molybdenum rod 34, the upper end surface of a limiting plate 30 is also propped against the water-cooling disc supporting rod 31, and a test platform protective cover 1 is sleeved on the periphery of the flange 15-2 at the upper end of the water-cooling disc lifting shaft and is fixedly connected with the same.

Further, a cylindrical sample table protective cover 1 with a downward cylinder opening is sleeved on the peripheries of the copper back plate 33 and the water-cooling lifting disc 15-1 and is used for protecting an internal transmission structure.

An annular flange 20-1 is welded in the middle of the cavity 20 of the vacuum reaction chamber and is fixedly connected with a cavity fixing plate 21, and then the cavity 20 is fixed on an equipment support.

The outer wall of the water-cooling disc lifting shaft 15 is also sleeved with a guide flange 2 which is a sleeve with an end face flange and is sleeved in an inner hole of a guide flange supporting seat 3 positioned below the guide flange 2, and the guide flange 2 and the guide flange supporting seat 3 are fixedly connected through screws to guide the lifting shaft 15.

Furthermore, the sample platform is lifted by a vacuum linear introducer to replace the prior mechanical structure which adopts a more complex motor to convert the rotation into the lifting motion.

The preferable structure is as follows; the lower end of the transmission molybdenum rod 34 is connected with the upper end of a push rod 12-1 of a vacuum linear importer 12 through a central transmission rod 29, the upper end surface of the vacuum linear importer 12 is provided with a linear importer connecting flange 12-2, and the linear importer connecting flange is fixedly connected with the lower end surface of a lower end head 15-4 of a water-cooling disc lifting shaft through a metal sealing gasket 38 by screws in a sealing way, so that the vacuum sealing of the inner cavity of the lifting shaft 15 is realized.

And starting the second servo motor 9, converting the positive and negative rotation motion of the motor into linear lifting motion by the vacuum linear introducer, and finally controlling the driving molybdenum rod to lift up and down by the push rod vacuum driving linear lifting motion.

Has the advantages that: firstly, on the existing MPCVD device for growing diamond film or particle, the traditional gas supply mode of an annular gas passage with a small hole only above a reaction chamber is improved, the gas distribution of the annular gas passage with the small hole is additionally arranged below a sample platform below the reaction chamber, and fresh reaction gas is supplemented in a close range close to a diamond growth area, so that more activated primary carbon can be obtained, and the growth rate and the fixed rate of diamond can be improved; the air distribution structure is simple and effective, and can be realized by only adding a workpiece plate air inlet plate above the water-cooling plate of the original equipment, connecting an air supply pipe additionally arranged through the inner cavity of the lifting shaft of the original water-cooling plate and then externally connecting an air supply nozzle. Simple structure and low cost.

Secondly, in the driving mechanism for lifting the sample tray, the original complex rotation transformation linear motion mechanism is replaced by the vacuum linear importer, so that the equipment is simplified and compact, and the mass production and popularization are facilitated.

Drawings

FIG. 1 is a schematic axial view of a reaction chamber structure according to an embodiment of the present invention;

FIG. 2 is a schematic sectional view of the reaction chamber according to the embodiment of the present invention (the workpiece tray is at the highest point);

FIG. 3 is a schematic cross-sectional view of the reaction chamber according to the embodiment of the present invention (the workpiece tray is at the lowest point);

FIG. 4 is a schematic view of the structure of the upper quartz window and water-cooled gas ring assembly of the reaction chamber I of FIG. 3;

FIG. 5 is a schematic view of a part of the structure of the middle workpiece tray lift assembly in the reaction chamber II of FIG. 3 (with the drive molybdenum rods lowered to the lowest level);

FIG. 6 is a partial schematic view of the middle workpiece tray lift assembly in the reaction chamber II of FIG. 3 (with the drive molybdenum rods lowered to their highest position);

FIG. 7 is a schematic view showing the lower part of the reaction chamber III shown in FIG. 3;

FIG. 8 is a schematic view of the structure of the base of the IV reaction chamber of FIG. 3;

FIG. 9 is a schematic view of the outer workpiece tray lift drive assembly of the V-chamber pedestal of FIG. 3;

FIG. 10 is a schematic view of a workpiece tray gas supply line;

FIG. 11 is a schematic view of a work plate cooling water channel.

Reference numerals in the figures refer to: a sample table protective cover 1, a guide flange 2, a guide flange supporting seat 3, a lifting fixing flange 4, a module fixing seat 5, a linear module 6, a lifting plate 7, a first servo motor 8, a second servo motor 9, a protective disc 10, a locking nut 10-1, a protective disc supporting rod 11, a vacuum linear introducer 12, a linear introducer push rod 12-1, a linear introducer connecting flange 12-2, a water nozzle joint 13, a quick joint 14, a water-cooling disc lifting shaft 15, a water-cooling disc 15-1, a spiral water channel 15-1-1, an air inlet through hole 15-1-2, a water inlet 15-1-3, a water return port 15-1-4, a water-cooling disc lifting shaft upper end flange 15-2, a water inlet and outlet pipe 15-3, a water-cooling disc lifting shaft lower end 15-4 and a water inlet 15-4-1, a water return port 15-4-2, a transverse air inlet 15-4-3, a retainer ring hoop 16, a sealing compression flange 17, a sealing seat 18, a loop welding corrugated pipe 19, a corrugated pipe upper end flange 19-1, a corrugated pipe lower end flange 19-2, a cavity 20, a cavity body annular waist flange 20-1, a cavity body fixing plate 21, an air inlet plate 22, a lower annular air passage 22-1, an air distribution hole 22-2, an air supply pipe 22-3, a water cooling air ring seat 23, a water cooling air ring seat inner ring edge 23-1, an air inlet nozzle 23-2, a cooling water ring channel 23-3, an upper annular air passage 23-4, an air distribution small hole 23-5, quartz glass 24, an O-shaped sealing ring 25, an upper pressing ring 26, a lower pressing ring 26-1, an O-shaped sealing 27, a ring sealing top sleeve 28, a central transmission rod 29 and a limiting plate 30, the water cooling disc comprises a water cooling disc support rod 31, an O-shaped sealing ring 321, a copper back plate 33, a vent hole 33-1, an annular air channel groove 33-2, a transmission molybdenum rod 34, a metal sealing gasket 35, an O-shaped sealing ring 36, a metal sealing gasket 37 and a metal sealing gasket 38.

Detailed Description

The structure of the present invention will be described in further detail with reference to the accompanying drawings.

FIG. 1 is a schematic axial view of a reaction chamber structure of an embodiment of an MPCVD diamond growth apparatus, and a cut-away three-dimensional structure of the reaction chamber is shown in the upper half of FIG. 1. The reaction chamber is a vacuum cavity 20 with a part of interlayer water cooling jacket, a plurality of azimuth observation windows are arranged on the side wall of the cavity, a lifting sample platform is arranged in the cavity and penetrates through a middle hole sealing device of a cavity bottom plate (namely a lifting fixing flange 4), and the sample platform can realize sealed up-and-down lifting. The upper top of the chamber has a quartz glass window 24, which is externally connected with a microwave waveguide tube, microwaves are coupled into the reaction chamber through the quartz glass by an antenna (not shown) in the waveguide, the reaction gas in the chamber is excited to generate microwave plasma, and the microwave plasma is focused on a substrate (not shown) of the workpiece disc above the air inlet plate 22 of the sample table below to grow diamond. The lower half part of the figure 1 is a cavity external transmission and driving mechanism for controlling the lifting of the worktable from the lower part of the lifting fixed flange 4.

Fig. 2 and fig. 3 are schematic sectional views of the reaction chamber, wherein fig. 2 shows a sectional structure of the chamber of the vacuum reaction chamber, an outline view (at the highest point) of the sample table assembly in the reaction chamber, and an outline view of the sample table lifting transmission and driving mechanism outside the chamber. And figure 3 shows a cross section of the sample table assembly (in the lowest point state) and a cross section of the sample table lifting transmission and driving mechanism outside the chamber.

Fig. 2 and 3 each show a driving mechanism of the water cooling tray lifting shaft 15, including: module fixing base 5, sharp module 6, lifter plate 7 and first servo motor 8. The module fixing seat 5 is in an inverted L shape, the upper bent short plate of the module fixing seat is fixedly connected to the lower end face of the lifting fixing flange 4 (namely the cavity bottom plate), the linear module 6 is fixedly connected to the inverted L vertical long side plate, the lifting plate 7 is also an inverted L-shaped plate, the left vertical side of the lifting plate is fixedly connected to the movable component of the linear module 6, and the right upper bent short plate of the lifting plate is fixedly connected to the sealing seat 18 on the water cooling disc lifting shaft 15 (see figure 9). The first servo motor 8 is a driving motor of the linear module 6, and the first servo motor 8 is started to rotate forward and backward, so that the movable component of the linear module 6 can move up and down to drive the lifting plate 7 to move correspondingly, and the water-cooling disc lifting shaft 15 is dragged to move up and down.

FIG. 4 is an enlarged view of a portion I of FIG. 3, showing the structure of the quartz window and the water-cooled gas ring assembly at the upper part of the reaction chamber. Shown as a circular window in quartz glass 24 is a compression seal made by an upper compression ring 26 and a lower compression ring 26-1, with screws and by upper and lower O-rings 25. The lower pressure ring is a part of the water-cooling gas ring component below the quartz glass and is fixedly connected with the water-cooling gas ring component through welding. The water-cooling air ring assembly is a spliced and welded piece and comprises a lower pressure ring 26-1, a water-cooling air ring seat 23, an air outlet ring edge 23-1 and an air inlet nozzle 23-2. The upper inner side of the water-cooling air ring seat 23 is welded with a lower pressure ring 26-1 to form a water-cooling ring channel 23-3 which is externally connected with a water inlet and outlet nozzle (not shown) to realize cooling water circulation. An air outlet ring edge 23-1 is welded on the lower inner side of the water-cooling air ring seat 23 to form an annular air passage 23-4, and the periphery of the water-cooling air ring seat 23 is communicated with a welding connection air nozzle 23-2 for reaction gas to enter the annular air passage 23-4 and enter a reaction chamber from an air distribution small hole 23-5 on the air outlet ring edge 23-1. The water-cooling gas ring component is fixedly connected with the end face of the cavity wall in a sealing mode through a metal seal 37 by using screws.

FIGS. 5 and 6 are enlarged views of part II of FIG. 3, which are schematic views of a part of the middle sample stage elevating assembly in the reaction chamber. Fig. 5 shows the lowest state of the driving molybdenum rod, and fig. 6 shows the highest state of the driving molybdenum rod. They show the structure of the specimen table assembly at the upper end of the specimen table lift assembly.

The sample stage includes: the device comprises an air inlet plate 22, a copper back plate 33, a water-cooling lifting disc 15-1, a water-cooling disc support rod 31, an air supply pipe 22-3, a protective cover 1 and a transmission molybdenum rod 34. The uppermost part is a sample table air inlet plate 22 which is a copper disc plate, the lower end surface of the sample table air inlet plate is dug to be close to the periphery of the sample table air inlet plate, a plurality of air distribution holes 22-2 are uniformly distributed along the periphery and communicated with the lower annular air passage; the center of the tube is provided with a through hole. The lower end face of the sample table air inlet plate 22 is attached to the copper back plate 33 and fixedly connected with the copper back plate 33 through screws, an annular air channel groove 33-2 of the copper back plate is dug at the position, corresponding to the lower annular air channel of the sample table air inlet plate 22, of the copper back plate 33, and the copper back plate and the lower annular air channel form a whole annular air channel. The side of the sample table is provided with a vent hole 33-1, the center of the sample table is also provided with a through hole, and the through hole penetrates through the central hole of the sample table air inlet plate 22. The lower end face of the copper back plate 33 is fixedly connected with the upper end face of the water-cooling lifting disc 15-1 in a sealing mode through an O-shaped sealing ring 32 close to the outer periphery and an O-shaped sealing ring 36 close to the center. The top surface of the water-cooling lifting disc 15-1 is provided with a spiral water-cooling groove 15-1-1 and is connected with a water inlet and a water outlet (not shown). An air inlet through hole 15-1-2 is arranged near the periphery of the water-cooling lifting disc 15-1, the upper part of the water-cooling lifting disc is communicated with a vent hole 33-1 of a copper back plate 33, the lower part of the water-cooling lifting disc is connected with an air supply pipe 22-3, the center of the water-cooling lifting disc is also provided with a center hole which is communicated with the center holes of the sample table air inlet plate 22 and the copper back plate 33, a transmission molybdenum rod 34 penetrates through the through hole, and the molybdenum rod 34 can be lifted up and down. The upper end surface of the sample table air inlet plate 22 is provided with a workpiece disc (not shown), the center of the workpiece disc is connected with the transmission molybdenum rod 34 through a matching hole, and the lifting is independently regulated and controlled by the transmission molybdenum rod.

The sample or substrate (generally a silicon wafer) for growing diamond is placed on the upper end face of the workpiece disc, and the sample table protective cover 1 is sleeved on the copper back plate 33 and the periphery of the water-cooling lifting disc 15-1 and is a cylindrical object extending downwards and used for protecting an internal transmission structure. The lower end surface of the water-cooling lifting disc 15-1 supports a plurality of water-cooling disc supporting rods 31 for supporting the water-cooling lifting disc 15-1.

FIG. 7 is a partially enlarged view of the section III in FIG. 3, showing the lower structure of the reaction chamber in FIGS. 5 and 6 and the part of the sample stage driving assembly inside the reaction chamber at the corresponding position. The upper part of the cavity 20 of the vacuum reaction chamber is of an interlayer water-cooling sleeve structure, the middle part of the cavity is welded with an annular flange 20-1 which is fixedly connected with a cavity fixing plate 21, and then the cavity 20 is fixed on an equipment bracket. The lower part of the cavity is also provided with an observation window. FIG. 7 shows a water-cooled plate lift shaft assembly configuration inside a reaction chamber, comprising: the water cooling disc lifting device comprises a water cooling disc lifting shaft 15, a flange 15-2 at the upper end of the water cooling disc lifting shaft, a limiting plate 30, a water cooling disc supporting rod 31, a guide flange 2 and a guide flange supporting seat 3. Fig. 7 shows that the water-cooled disc lifting shaft 15 is a hollow shaft, and an air supply pipe 22-3, an inlet pipe 15-3, an outlet pipe 15-3 (see fig. 11) and a central transmission rod 29 run in the hollow shaft. The upper end surface of the lifting shaft 15 is welded with a water-cooling disc lifting shaft upper end flange 15-2, the upper end surface of the flange is fixedly connected with a limiting plate 30, the limiting plate 30 is provided with a plurality of through holes for allowing an air supply pipe 22-3 and inlet and outlet water and air to pass through, the central hole is a limiting hole of a central transmission rod 29, and the upper end head of the central transmission rod 29 is connected with a transmission molybdenum rod 34. The upper end surface of the limit plate 30 is also pressed against the water-cooling disc support rod 31. The sample table protective cover 1 is sleeved on the periphery of the flange 15-2 at the upper end of the water-cooling disc lifting shaft and is fixedly connected with the water-cooling disc lifting shaft. The outer wall of the water-cooling disc lifting shaft 15 is also sleeved with a guide flange 2 which is a sleeve with an end face flange and is sleeved in an inner hole of a guide flange supporting seat 3 positioned below the guide flange 2, and the guide flange 2 and the guide flange supporting seat 3 are fixedly connected through screws. They guide the lifting shaft 15. The guide flange support 3 and the central drive rod 29 both extend downwards.

FIG. 8 is a partially enlarged view of the base structure of the IV chamber of FIG. 3. It shows the structure of the bottom of the reaction chamber and its lower connection part. The flange on the lower end face of the furnace wall of the cavity 20 of the vacuum reaction chamber is seated on the lifting fixed flange 4, namely the bottom plate of the reaction chamber, and the lifting fixed flange and the bottom plate are hermetically and fixedly connected through a metal sealing gasket 37 by screws. The water-cooling disc lifting shaft 15 penetrates through a central through hole of the lifting fixing flange 4, the guide flange supporting seat 3 is fixedly connected to the upper end face of the lifting fixing flange 4, and the lower end face of the guide flange supporting seat is an external structure of the reaction chamber and an extension part structure of the water-cooling disc lifting shaft penetrating out of the reaction chamber. The lower end face of the left outer side of the lifting fixed flange 4 is fixedly connected with a template fixed seat 5; the right outer side of the lower end surface of the lifting fixed flange 4 is provided with a plurality of screwed-in protective supporting rods 11 and extends downwards.

To further illustrate the out-of-plane structure of the lower end of the lifting mounting flange 4, the lower half of fig. 8 is discussed in conjunction with fig. 9 (i.e., v of fig. 3), which together show a schematic view of the water-cooled plate lift shaft assembly and its drive assembly below the bottom plate of the reaction chamber. They show the vacuum movable sealing component and lifting shaft component outside the water-cooling workpiece tray lifting shaft positioned below the reaction chamber, the driving component structure of the lifting shaft component and the lifting shaft component, and the driving component structure of the central transmission rod.

The outer vacuum seal subassembly of water-cooling work piece dish lift axle includes: the water cooling disc lifting shaft 15, the loop welding corrugated pipe 19, the corrugated pipe upper end flange 19-1, the metal sealing gasket 44, the corrugated pipe lower end flange 19-2, the sealing seat 18, the sealing top sleeve 28, the O-shaped sealing ring 27, the sealing pressing flange 17 and the retainer ring hoop 16. The water-cooling disc lifting shaft 15 passes through the central hole of the bottom plate of the reaction chamber from the cavity of the vacuum reaction chamber and extends all the way down, so as to be connected with a lifting driving mechanism outside the reaction chamber. After the lifting shaft 15 penetrates out of the central hole of the bottom plate of the reaction chamber, the problem of vacuum sealing of the outer wall of the lifting shaft is solved, and in order to adapt to the up-and-down lifting motion of the lifting shaft, a loop corrugated pipe structure is selected and then sealed by a sealing seat. The concrete structure is as follows: a corrugated pipe 19 is movably welded on the outer wall of the lifting shaft shown in figure 8, a corrugated pipe upper end flange 19-1 is welded on the upper end of the corrugated pipe, the corrugated pipe upper end flange 19-1 is fixedly connected with the lower end face of the lifting fixed flange 4 in a sealing mode through a metal sealing gasket 44 by screws, a corrugated pipe lower end flange 19-2 is fixedly welded on the lower end of the movably welded corrugated pipe 19, and a water cooling disc lifting shaft 15 is accommodated in the movably welded corrugated pipe 19 and extends downwards. The lower end face of the lower end flange 19-2 of the corrugated pipe and the end face of the upper flange of the sealing seat 18 are sealed in vacuum through a metal sealing gasket 37 by screws. The water-cooling disc lifting shaft 15 passes through the middle hole of the sealing seat 18 and continues to extend downwards, a sealing top sleeve 28 is sleeved in a gap between the outer wall of the lifting shaft 15 and the inner hole wall of the sealing seat 18 and is a sleeve, the upper end face of the sealing top sleeve abuts against an inner annular convex shoulder of the middle hole of the sealing seat 18, the lower end face of the sealing top sleeve 27 which is sleeved in the gap abuts against an O-shaped sealing ring 27, the lower end face of the O-shaped sealing ring 27 is abutted against by the sleeve which is sleeved in the gap and is provided with a flange, namely the end face of the sleeve of the sealing compression flange 17, the flange of the sealing compression flange 17 is fixedly connected and compressed with the lower flange of the sealing seat 18 through screws, and the outer wall of the lifting shaft 15 is sealed. The lower end face of the sealing and pressing flange 17 is closely attached and limited by a retainer ring hoop 16.

FIG. 9 shows a water-cooled tray lift shaft assembly extending out of the reaction chamber exterior comprising: a water-cooling disc lifting shaft 15, a lower end head 15-4 of the lifting shaft, a quick joint 14, an air supply pipe 22-3 and a water inlet and outlet pipe 15-3. The water-cooling disc lifting shaft 15 extends downwards, the lowest end of the water-cooling disc lifting shaft is welded with a lower end head 15-4 of the lifting shaft, two air supply pipes 22-3 extending downwards in the inner cavity of the lifting shaft 15 are welded on the end head, and a transverse air hole 15-4-3 is connected with the quick connector 14 and supplies air externally. Referring to fig. 10, the schematic diagram of the gas supply pipeline of the sample stage realizes gas supply to the gas loop hole of the gas inlet plate of the sample stage of the reaction chamber. Two water inlet and outlet pipes extending downwards from the inner cavity of the lifting shaft 15 are also welded on the lower end head of the lifting shaft (see the schematic diagram of the water inlet and outlet pipes of the water cooling disc in fig. 11, and the water inlet and outlet pipes are positioned at another azimuth angle with the schematic diagram of fig. 10), and through holes are communicated with a water nozzle joint 13 on the transverse water inlet 15-4-1 and the water outlet 15-4-2, so that cooling circulating water is supplied to the water cooling disc of the reaction chamber. The center of the lower end head of the lifting shaft is provided with a through hole, and the lower end of the through hole is connected with a central transmission rod component.

The center drive link assembly includes: the device comprises a central transmission rod 29, a transmission molybdenum rod 34, a vacuum linear introducer 12, a vacuum linear introducer push rod 12-1, a linear introducer connecting flange 12-2, a second servo motor 9, a metal sealing gasket 45, a protective disc 10, a locking nut 10-1 and a protective disc support rod 11. The upper end of the central transmission rod 29 is fixedly connected with a transmission molybdenum rod 34, the lower end is connected with a push rod 12-1 of the vacuum linear importer, and the push rod 12-1 is a component of the vacuum linear importer 12, extends from the end part thereof and is provided with a vacuum dynamic seal. The upper end face of the vacuum linear importer 12 is provided with a linear importer connecting flange 12-2, and the linear importer connecting flange is fixedly connected with the lower end face of the lower end head 15-4 of the water-cooling disc lifting shaft through a metal sealing gasket 38 by screws in a sealing way, so that the vacuum sealing of the inner cavity of the lifting shaft 15 is realized. The push rod 12-1 is a controlled part of a vacuum linear introducer 12 (a purchased part), the second servo motor 9 is started, the vacuum linear introducer converts the positive and negative rotation motion of the motor into linear lifting motion, the push rod drives the linear lifting motion in a vacuum mode, and the driving molybdenum rod is controlled to lift up and down finally. The central transmission rod component is fixedly connected (suspended) at the lower end of the lifting shaft 15, and the whole body of the central transmission rod component moves up and down along with the lifting shaft 15; in addition, the central transmission rod can be driven to do lifting motion by the central transmission rod. In addition, in order to protect the central transmission rod assembly from safe action, an annular protective disk 10 is additionally arranged below the assembly, and is hung by a protective disk supporting rod 11 fixedly connected to the upper lifting fixing flange 4 (namely the reaction chamber bottom plate) and is fixed by a locking nut 10-1.

The water-cooled disc lifting shaft lifting drive assembly has been described in fig. 2 and 3 and will not be repeated.

Claims (8)

1. The utility model provides a microwave chemical vapor deposition diamond device, includes a vacuum reaction chamber, the top of the cavity (20) of vacuum reaction chamber is equipped with external microwave waveguide's quartz glass window (24) and supplies the trompil annular air flue of reaction gas, is equipped with liftable sample platform in the cavity, and the cavity is fixed on cavity fixed plate (21), characterized by: the sample stage is also provided with an open-pored annular gas duct into which a reaction gas is fed.

2. A microwave chemical vapor deposition diamond apparatus as in claim 1, wherein: the sample stage comprises: the device comprises an air inlet plate (22), a copper back plate (33), a liftable water-cooling lifting disc (15-1), a water-cooling disc support rod (31), an air supply pipe (22-3) and a transmission molybdenum rod (34);

a lower annular air passage (22-1) of the air inlet plate is dug on the bottom surface of the uppermost air inlet plate (22) close to the periphery, and a plurality of radial air distribution holes (22-2) are uniformly distributed along the periphery and communicated with the lower annular air passage;

the top surface of the middle copper back plate (33) is tightly attached to the bottom surface of the air inlet plate, an annular air passage groove (33-2) of the copper back plate is also dug at the position, corresponding to the lower annular air passage of the air inlet plate, of the top surface of the copper back plate, the two annular air passage grooves form a whole ring of annular air passages, and vent holes (33-1) are drilled in the bottom surface of the copper back plate and communicated with the annular air passage groove;

the top surface of the water-cooled lifting disc (15-1) at the bottom is tightly attached and fixed with the bottom surface of the copper back plate and is sealed by an O-shaped sealing ring (32) close to the periphery, an air inlet through hole (15-1-2) is arranged on the surface of the water-cooled lifting disc close to the periphery and is communicated with an air vent (33-1) of the copper back plate, the lower part of the air inlet through hole is connected with an air supply pipe (22-3), and the air supply pipe (22-3) is externally connected with an air source;

the centers of the air inlet plate, the copper back plate and the water-cooling lifting disc which are overlapped together are provided with central holes for enabling the upper end of a driving molybdenum rod (34) to lift up and down.

3. A microwave chemical vapor deposition diamond apparatus as in claim 2, wherein: make the composition structure that the sample platform goes up and down include: a water-cooling lifting disc (15-1), a water-cooling disc lifting shaft (15), a flange (15-2) at the upper end of the water-cooling disc lifting shaft, a limiting plate (30), a water-cooling disc supporting rod (31), a guide flange (2) and a guide flange supporting seat (3), wherein the water-cooling disc lifting shaft (15) is a hollow shaft, an air supply pipe (22-3), an inlet pipe (15-3), an outlet pipe (15-3) and a central transmission rod (29) penetrate through the hollow shaft, the flange (15-2) at the upper end of the water-cooling disc lifting shaft is welded on the upper end surface of the water-cooling disc lifting shaft, the upper end surface of the flange is fixedly connected with a limiting plate, the limiting plate is provided with a plurality of through holes for the air supply pipe (22-3) and the inlet and outlet water gas to pass through, the central hole is a limit hole of a central transmission rod (29), the upper end of the central transmission rod is connected with a transmission molybdenum rod (34), and the upper end surface of the limit plate is also propped against the water-cooling disc support rod (31).

4. A microwave chemical vapor deposition diamond apparatus as in claim 3, wherein: the periphery of the copper back plate (33) and the water-cooling lifting disc (15-1) is sleeved with a cylindrical sample table protective cover (1) with a downward cylinder opening, and the sample table protective cover (1) is sleeved on the periphery of a flange (15-2) at the upper end of a lifting shaft of the water-cooling disc and fixedly connected with the flange.

5. A microwave chemical vapour deposition diamond apparatus according to claim 4, wherein: an annular flange (20-1) is welded in the middle of a cavity (20) of the vacuum reaction chamber and is fixedly connected with a cavity fixing plate (21), and then the cavity (20) is fixed on an equipment support.

6. A microwave chemical vapour deposition diamond apparatus according to claim 5, wherein: the outer wall of the water-cooling disc lifting shaft (15) is further sleeved with a guide flange (2), the guide flange is a sleeve with an end face flange and is sleeved in an inner hole of a guide flange supporting seat (3) below the guide flange, and the guide flange supporting seat are fixedly connected through a screw.

7. A microwave chemical vapour deposition diamond apparatus according to claim 6, wherein: the lifting power of the sample platform adopts a vacuum linear introducer.

8. A microwave chemical vapour deposition diamond apparatus according to claim 7, wherein: the lower end of the transmission molybdenum rod (34) is connected with the upper end of a push rod (12-1) of a vacuum linear importer (12) through a central transmission rod (29), the upper end surface of the vacuum linear importer is provided with a linear importer connecting flange (12-2), and the linear importer connecting flange is fixedly connected with the lower end surface of the lower end head (15-4) of the water-cooling disc lifting shaft through a metal sealing gasket (38) by screws in a sealing way.

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