CN215387901U - Plasma liquid nano-polishing stock solution filtering device - Google Patents

Abstract

The utility model provides a plasma liquid nano-polishing stock solution filtering device which comprises a stock solution tank, a filtering tank and a polishing solution loop which are sequentially communicated; the outlet of the filter tank is higher than the inlet of the filter tank; the polishing solution flows through the filter tank from bottom to top, and a filter device is arranged in the filter tank and used for filtering the polishing solution. The device solves the problems of low efficiency, high cost, large occupied space and the like of the conventional polishing solution filtering process.

Description

Plasma liquid nano-polishing stock solution filtering device

Technical Field

The utility model relates to the technical field of plasma liquid nano polishing, in particular to a polishing liquid storage and filtration device.

Background

At present, the plasma liquid nano-polishing uses a low-concentration neutral salt solution as a medium, a plasma gas layer is formed on the surface of a part, and the part is polished, deburred and the like, so that the roughness value of the surface of the polished workpiece can reach or approach the nano level. The removed material on the surface of the part forms tiny particles which are suspended in the solution. In the production process, the concentration of the tiny particles is gradually increased to form impurities to influence the polishing effect. The existing treatment scheme is to stand the polishing solution for two to three days, so that the metal particles are deposited at the bottom of the container, and the polishing solution on the upper layer is pumped out and can be reused. The existing scheme needs to keep polishing solution still for a long time to remove metal impurities, so that production is guaranteed to be uninterrupted, a large amount of polishing solution needs to be prepared, five to eight times of the volume of the polishing equipment needs to be stored generally, production can be guaranteed to be carried out continuously, efficiency is affected, the storage cost of the polishing solution is increased, and a large amount of space is occupied.

Disclosure of Invention

The utility model aims to provide a plasma liquid nano-polishing stock solution filtering device to solve at least one technical problem in the prior art.

In order to solve the technical problem, the utility model provides a plasma liquid nano polishing stock solution filtering device which comprises a stock solution tank, a filtering tank and a polishing solution loop which are sequentially communicated; the outlet of the filter tank is higher than the inlet of the filter tank; the polishing solution flows through the filter tank from bottom to top, and a filter device is arranged in the filter tank and used for filtering the polishing solution.

Rely on gravity and filter equipment's filtration to realize that the polishing solution is on-line to get rid of impurity, rely on the reservoir to realize short-term storage, rely on the polishing solution return circuit to realize recycling, improved filtration efficiency, and then reduce down time, reduced the polishing solution demand, improved productivity ratio, the cost is reduced.

Furthermore, the liquid storage tank is provided with a liquid level sensor which can monitor the liquid level position of the polishing liquid and is connected with a control system of an external automatic production line, so that the external production system can sense the liquid level.

Furthermore, the quantity of the liquid level sensors can be a plurality of, and in the height direction, the liquid level sensors are arranged at intervals, so that the liquid level heights of different positions can be sensed, and reference is provided for production line instructions at any time.

Further, a pump body is arranged on the polishing liquid loop and used for forcing the polishing liquid to flow circularly.

The polishing liquid level is sensed by an automatic control system, the pump body is automatically opened or closed according to the operation requirement, when the polishing liquid purified in the liquid storage tank is at a high level, the polishing liquid is automatically guided into a production line for processing and use, and the pump body can be temporarily closed at the moment, so that the energy is saved; when the purified polishing solution is at a low position, the pump body can be instructed to be opened, the filtration is started, the polishing solution in the liquid storage tank is supplemented, and the steps are repeated in this way, so that the automatic cycle production is realized.

Furthermore, the inclination angle of the filter tank can be 30-90 degrees.

Thus, the polishing liquid flows in from the bottom of the filter tank and flows out from the top of the filter tank. And the heavier impurities in the polishing solution are automatically precipitated and separated by means of gravity.

Preferably, the filtering means in the filtering tank may be provided with a plurality of stages.

The polishing solution is continuously filtered step by step, and different filtering strengths can be designed according to production requirements.

Furthermore, each stage of filtering device comprises 2 groups of partition plates with meshes, and filtering materials are arranged between the partition plates.

So that the polishing solution can pass through the filter material through the meshes of the partition plate; and the filtering materials with different density structures and physical and chemical properties can be selected according to the production filtering requirements.

Preferably, the material of the filtering material can adopt synthetic fiber filtering cotton.

The synthetic fiber filter cotton is suitable for finely filtering the polishing solution, and is economical and practical.

Further, the filtering device is detachably arranged in the filtering tank.

Therefore, regular maintenance work such as replacement of the filtering material, cleaning of the filtering tank and the like can be realized, and the filtering effect of the filtering device is kept as new.

Further, the thickness range of the filtering material can be 1-10 mm.

Therefore, the filtering strength can be guaranteed, and the passing efficiency can be guaranteed.

Furthermore, a cleaning opening is arranged below the filter tank and used for collecting and removing residual impurities.

Thus, the operator can inject water from the position of taking out the filter tank, clean the residual impurities under the filter tank and collect the impurities from the cleaning port.

Furthermore, the design has the upper cover on the reservoir, conveniently carries out dustproof protection and daily maintenance to the reservoir.

Thus, the liquid storage tank is covered normally to prevent dust from entering. The liquid storage tank is opened when maintenance is needed, and operation is convenient.

By adopting the technical scheme, the utility model has the following beneficial effects:

the plasma liquid nano-polishing stock solution filtering device provided by the utility model can be used for quickly filtering used polishing solution, and can realize real-time quick filtering, short-time storage and automatic recycling of the polishing solution on the premise of not stopping production.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.

FIG. 1 is a schematic structural diagram of a plasma liquid nano-polishing stock solution filtering apparatus according to an embodiment of the present invention;

FIG. 2 is an isolated view of a filter tank of the plasma liquid nano-polishing stock solution filter apparatus shown in FIG. 1;

FIG. 3 is an enlarged view of the filtration tank.

Reference numerals:

1-a pump body; 2-a liquid level sensor; 3-a liquid storage tank; 4-cleaning the mouth; 5-a filter tank; 6-liquid inlet; 7-a liquid outlet; 8-a separator; 9-synthetic fiber filter cotton.

Detailed Description

The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

The present invention will be further explained with reference to specific embodiments.

As shown in fig. 1 to 3, the technical solution provided by this embodiment mainly includes: the pump body 1, level sensor 2, reservoir 3, clearance mouth 4, filter-tank 5, inlet 6, liquid outlet 7, baffle 8, synthetic fiber filter pulp 9.

When the polishing machine works, the pump body 1 pumps polishing liquid out of polishing equipment and enters a vertically placed filter tank 5, wherein an upper, middle and lower 3-stage filter device is arranged in the filter tank; each stage of the filtering device comprises two separation plates 8 with meshes, and a synthetic fiber filter cotton 9 with the thickness of 3mm is clamped between the two separation plates 8.

Under the pressure of the pump body 1, the polishing solution gradually rises, a part of metal impurities in the polishing solution are attached to the synthetic fiber filter cotton 9, and a part of metal impurities are deposited at the bottom of the filter tank 5 under the action of gravity.

The filtered polishing solution flows into the liquid storage tank 3 through the liquid inlet 6 and is temporarily stored.

The liquid storage tank 3 is provided with an upper liquid level sensor 2 and a lower liquid level sensor 2, can monitor the height position of the polishing liquid level at any time, is connected with a control system of an external automatic production line and depends on the automatic control system to sense the polishing liquid level;

during production and processing, if the polishing solution in the liquid storage tank 3 is at a high level, the high-level sensor informs the operating system, and the operating system can instruct the liquid outlet 7 to guide the polishing solution into a production line for processing according to program setting, so that the pump body 1 can be temporarily closed, and energy is saved;

when the polishing liquid in the liquid storage tank 3 is at a low position, the low-position sensor informs the operating system, and the operating system can open the pump body 1 according to the program setting instruction, start the filtration and supplement the polishing liquid, and the steps are repeated so as to realize the automatic cycle production.

At the production interval, the operator can take out the filter tank 5 and clean it, and replace the synthetic fiber filter cotton 9.

In addition, in a specific use scene, an operator can fill water from the position of taking out the filter tank 5, clean impurities remained under the filter tank 5 and collect the impurities through the cleaning port 4.

The upper cover which can be opened and closed is arranged on the liquid storage tank 3, and the upper cover is covered at ordinary times to prevent dust from entering, and is opened when maintenance is needed, so that the cleaning operation of workers is facilitated.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the utility model has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.

Claims (10)

1. A plasma liquid nano-polishing stock solution filtering device is characterized by comprising a stock solution tank, a filter tank and a polishing solution loop which are sequentially communicated; the outlet of the filter tank is higher than the inlet of the filter tank; the polishing solution flows through the filter tank from bottom to top, and a filter device is arranged in the filter tank and used for filtering the polishing solution.

2. The plasma liquid nano-polishing stock solution filtering device according to claim 1, wherein the reservoir is equipped with a level sensor for monitoring the level of the polishing liquid in the reservoir.

3. The plasma liquid nano-polishing stock solution filtering device as claimed in claim 2, wherein the number of the liquid level sensors is several, and the several liquid level sensors are arranged at intervals in the height direction.

4. The plasma liquid nano-polishing stock solution filtering device as claimed in claim 1, wherein a pump body is disposed on the loop for forcing the slurry to flow circularly.

5. The plasma liquid nano-polishing stock solution filtering device according to claim 1, wherein the filtering tank is arranged obliquely with an inclination angle ranging from 30 ° to 90 °.

6. The plasma liquid nano-polishing stock solution filtering device as claimed in claim 1, wherein the number of the filtering devices is several, and the several filtering devices are arranged at intervals in the flow direction of the polishing liquid, so as to form a multi-stage filtering structure.

7. The plasma liquid nano-polishing stock solution filtering device according to claim 1, wherein the filtering device comprises partition plates, and a filtering material is arranged between the partition plates.

8. The plasma liquid nano-polishing stock solution filtering device as recited in claim 7, wherein the material of the filtering material is synthetic fiber filter cotton.

9. The plasma liquid nano-polishing stock solution filter device of claim 5, wherein the filter device is removably disposed within the filter tank.

10. The plasma liquid nano-polishing stock solution filtering device as claimed in claim 7, wherein the thickness of the filtering material is designed to be 1-10 mm.

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