CN215296829U - Device for uniformly mixing sampling gas of monitor and constant flow system - Google Patents
Device for uniformly mixing sampling gas of monitor and constant flow system Download PDFInfo
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- CN215296829U CN215296829U CN202023056024.9U CN202023056024U CN215296829U CN 215296829 U CN215296829 U CN 215296829U CN 202023056024 U CN202023056024 U CN 202023056024U CN 215296829 U CN215296829 U CN 215296829U
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Abstract
The application provides a device and constant flow system for monitor sampling gas mixing relates to atmospheric particulates monitoring field. The device comprises: sampling platform, the pressure head that admits air, the pressure head setting that admits air is in on the sampling platform, the pressure head that admits air includes: the main sampling gas circuit is arranged on the sampling platform; the auxiliary gas circuit is arranged outside the main gas inlet and communicated with the sampling platform; and the hole mixing air chamber is communicated with the main sampling air path and the auxiliary air path, wherein the main discharge air path is arranged on the side surface of the sampling platform. According to the device and the system, the gas flowing in the gas chamber can generate vortex by introducing the auxiliary gas circuit, so that the particulate matters in the gas can be uniformly enriched on the sampling spots; clean gas is introduced through the auxiliary gas circuit, self-cleaning and calibration functions are added to the particulate matter monitor, and the final monitoring accuracy of the particulate matter monitor adopting a beta ray absorption method is improved.
Description
Technical Field
The application relates to the field of atmospheric particulate matter monitoring, in particular to a device and a system for sampling and uniformly mixing a particulate matter monitor by a beta-ray method.
Background
The common monitoring methods for atmospheric particulates at present include: manual weighing, beta-ray absorption, and oscillating microbalance. The principle of the beta-ray absorption method is that after the beta-ray passes through a substance to be measured, the intensity attenuation degree of the beta-ray is only related to the mass of the substance to be measured, and is not related to the physical and chemical properties of the substance to be measured. The beta ray absorption method has the advantages that the required sample amount is small, one monitoring data can be automatically obtained every hour, the change condition of the concentration of the particulate matters in the air can be reflected in real time, data transmission can be carried out, remote monitoring and automatic control are facilitated, and the manual workload is greatly reduced. Therefore, the beta-ray method has become one of the main measurement methods of a continuous automatic monitor for the concentration of particulate matter in the atmospheric environment. The existing beta-ray absorption particulate matter monitor mainly has two structures, one is an in-situ structure, namely a sampling position and a detection position are at the same position, and a paper tape does not need to be moved back and forth; the other is an ectopic structure, namely a sampling position and a detection position are at two positions, blank detection is firstly carried out at a position 1, a paper tape is moved to a position 2 for sampling, then the paper tape is moved to the position 1 for detection, the paper tape needs to reciprocate, and the mechanical structure is complex. The invention mainly aims at a beta-ray absorption particulate monitor with an in-situ structure. Due to the in-situ design structure, the sampling spots are not uniform whether the air is supplied laterally or in the same pipeline. The 'CN 108709840A beta-ray particulate matter concentration monitor' adopts a structure that a radioactive source is rotated away during sampling, and the structure is different from the structure that the conventional in-situ sampling can simultaneously detect. In the monitoring process, the left and right unevenness of sampling spots can be caused by side air inflow, and the edge and the center unevenness can be caused by the radioactive source in the air path. The particle detection equipment used for a long time can cause inaccuracy of monitoring data, and a large error can be generated on a detection result due to the fact that particles are deposited on the pipe wall of the detection equipment.
SUMMERY OF THE UTILITY MODEL
The application provides a device and a system for uniformly mixing sampling spots of a particulate matter monitor by a beta-ray method, which have the advantages of simple structure and reliable operation, and can uniformly mix the particulate matter sampling enrichment spots; in the monitoring process, the left and right unevenness of sampling spots caused by side air intake is avoided, the edge and center sampling spots are uneven caused by the radioactive source in the air path, and the accuracy of monitoring data is improved.
The features and advantages of the present solution will become apparent from the following detailed description, or may be learned through practice of the present application.
According to an aspect of the application, a device for uniformly mixing sampling gas of a monitor is provided, which comprises: sampling platform, the pressure head that admits air, the pressure head setting that admits air is on sampling platform, and the pressure head that admits air includes: the main sampling gas circuit is arranged on the sampling platform; the auxiliary gas path is arranged outside the main sampling gas path and communicated with the sampling platform, and the tail end of the auxiliary gas path is in gas connection with the first power device to supply gas for the auxiliary gas path; the hole mixing air chamber is communicated with the main sampling air path and the auxiliary air path, wherein the main exhaust air path is arranged on the side surface of the sampling platform and is communicated with the hole mixing air chamber, and the tail end of the main exhaust air path is in air connection with the second gas power device for auxiliary exhaust.
According to some embodiments, the auxiliary gas path comprises: the first flow adjusting device is arranged in the auxiliary gas path and used for adjusting the size of the gas flow in the auxiliary gas path; the first flow detection device is arranged in the auxiliary gas path after the gas flow flows through the flow regulation device and is used for detecting the size of the gas flow in the auxiliary gas path; and the first gas filtering device is arranged in the auxiliary gas path before the gas flow flows through the flow regulating device and is used for filtering impurities in the gas flow.
According to some embodiments, the relative positions of the main sampling gas path and the auxiliary gas path can be selected from vertical, opposite, same-direction and side-position.
According to some embodiments, the total exhaust gas path includes: the second flow regulating device is arranged in the main exhaust gas path and used for regulating the size of the gas flow in the main exhaust gas path; the second flow detection device is arranged in the main exhaust gas path before the air flow flows through the second flow regulation device and is used for detecting the size of the air flow in the main exhaust gas path; and the second gas filtering device is arranged in the total exhaust gas path and is used for filtering the uniformly mixed gas after sampling.
According to some embodiments, a constant flow control device is additionally arranged at the rear side of the sampling platform, and the first gas power device, the first gas filtering device, the first flow adjusting device, the first flow detecting device, the second gas power device, the second gas filtering device, the second flow adjusting device and the second flow detecting device are controlled.
According to some embodiments, the gas enters the auxiliary gas circuit through the first gas power device; the gas passes through a first gas filtering device to obtain filtered gas; the filtered gas is adjusted to a set constant flow point through a first flow regulating device and enters a hole mixing gas chamber; then, the flow regulating valve of the main gas path is regulated to keep the stable gas inflow of the main sampling gas path, so as to form uniformly mixed sampling gas; the sampling gas passes through the total exhaust gas path and is adjusted to a set flow stable range of the total exhaust gas path through a second flow adjusting device; the sampled gas passes through a second gas filtering device and is exhausted from the second power plant to the environment.
According to some embodiments, the constant flow control device is provided with means for detecting the time of use of the first gas filtering device and the second gas filtering device, and for prompting replacement of the gas filtering devices.
According to some embodiments, the constant flow point is 3L/min.
According to some embodiments, the flow stability range of the main gas path is kept to be (16.67 +/-0.5) L/min; the stable range of the total exhaust gas path flow is (16.67 +/-0.5) L/min.
According to some embodiments, the particulate matter monitor only introduces the clean gas of the auxiliary gas path after the end of one working cycle and before the start of the next working cycle; and then, a clean airflow value of the flow regulating device in a cleaning mode is set by regulating the constant flow control device, and the clean airflow value is greater than a constant flow point, so that the device for uniformly mixing the sampling gas of the monitor is cleaned.
According to some embodiments, the particulate matter monitor enters a zero calibration mode after a duty cycle is complete. In the next working period, only introducing clean gas of the auxiliary gas path; and then, adjusting the constant flow control device, setting the flow adjustment device to calibrate the air flow value in a zero mode, wherein the calibrated air flow value is greater than a constant flow point, and realizing zero calibration of the particulate matter monitor.
According to another aspect of the present application, a constant flow system for monitoring the uniformity of a sampled gas in a monitor is provided, comprising: a first gas power unit for introducing air into the auxiliary air path; the first gas filtering unit is used for filtering impurities in the air; the first flow regulating unit is used for regulating the flow of the gas flowing through the auxiliary gas path; the first flow measuring unit is used for detecting the gas flow; the second gas power unit is used for introducing air into the main exhaust gas path; the second gas filtering unit is used for filtering the sampling gas; the second flow regulating unit is used for regulating the flow of the gas flowing through the main exhaust gas path; and the second flow measuring unit is used for detecting the flow of the sampling gas.
According to the exemplary embodiment, through the introduction of the auxiliary gas path, the gas flowing in the gas chamber can generate vortex, so that the particulate matters in the gas can be uniformly enriched on the sampling spot; clean gas is introduced through the auxiliary gas circuit, self-cleaning and calibration functions are added to the particulate matter monitor, and the final monitoring accuracy of the particulate matter monitor adopting a beta ray absorption method is improved.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without exceeding the protection scope of the present application.
Fig. 1a shows a front cross-sectional view of a device for sampling spot blending of a beta-ray particulate matter monitor according to an exemplary embodiment.
Fig. 1b shows a schematic diagram of a sampling spot blending device of a beta-ray particulate matter monitor according to another exemplary embodiment.
Fig. 2 shows a flow chart of a method for sampling spot blending of a beta-ray method particulate matter monitor according to an exemplary embodiment.
Fig. 3 illustrates a system block diagram of a beta-ray method particulate matter monitor sampling spot blending, according to an exemplary embodiment.
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals denote the same or similar parts in the drawings, and thus, a repetitive description thereof will be omitted.
The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided to give a thorough understanding of embodiments of the disclosure. One skilled in the relevant art will recognize, however, that the embodiments of the disclosure can be practiced without one or more of the specific details, or with other means, components, materials, devices, etc. In such cases, well-known structures, methods, devices, implementation steps, materials, or operations are not shown or described in detail.
Furthermore, the terms "include" and "have," as well as any variations thereof, are intended to cover non-exclusive inclusions. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those steps or elements listed, but may alternatively include other steps or elements not listed, or inherent to such process, method, article, or apparatus.
The terms "first," "second," and the like in the description and claims of the present application and in the above-described drawings are used for distinguishing between different objects and not for describing a particular order. Furthermore, the terms "include" and "have," as well as any variations thereof, are intended to cover non-exclusive inclusions.
The existing beta-ray absorption particulate matter monitor mainly has two structures, one is an in-situ structure, namely a sampling position and a detection position are at the same position, and a paper tape does not need to be moved back and forth; the other is an ectopic structure, namely a sampling position and a detection position are at two positions, blank detection is firstly carried out at a position 1, a paper tape is moved to a position 2 for sampling, then the paper tape is moved to the position 1 for detection, the paper tape needs to reciprocate, and the mechanical structure is complex. Due to the structure of the in-situ design, in the monitoring process, the side air inflow can cause left and right unevenness of sampling spots, and the radioactive source in the air path can cause the edges and the center to be uneven, so that the monitoring data can be inaccurate. Therefore, the device, the system and the method for uniformly mixing sampling spots of the particulate matter monitor adopting the beta-ray absorption method can enable gas flowing in the gas chamber to generate eddy current by introducing the auxiliary gas circuit, so that particulate matters in the gas can be uniformly enriched on the sampling spots, and the final monitoring accuracy of the particulate matter monitor adopting the beta-ray absorption method is improved.
Embodiments of the present application will be described in detail below with reference to the accompanying drawings.
Fig. 1a shows a front cross-sectional view of a device for sampling spot blending of a beta-ray particulate matter monitor according to an exemplary embodiment.
Fig. 1b shows a schematic diagram of a sampling spot blending device of a beta-ray particulate matter monitor according to another exemplary embodiment.
Referring to fig. 1, the device for uniformly mixing the monitor sampling gas comprises: sampling platform 100, the pressure head 200 that admits air sets up on sampling platform 100, and total exhaust gas circuit 105 sets up in sampling platform 100's side, and with hole mixing air chamber 103 UNICOM, the terminal gas connection second gas power device 115 of total exhaust gas circuit assists the exhaust.
According to an embodiment, the intake head 200 comprises: the main sampling gas circuit 101 is arranged on the sampling platform 100; the auxiliary gas path 102 is horizontally arranged outside the main sampling gas path 101 and is communicated with the sampling platform 100; and the hole mixing air chamber 103 is communicated with the main sampling air path 101 and the auxiliary air path 102. In fig. 1a, the main sampling gas path 101 and the auxiliary gas path 102 are arranged in a vertical "Y" shape, and in fig. 1b, they are arranged vertically, but the present application is not limited thereto, and alternatively, they may be arranged in opposite directions and in the same direction.
As shown in fig. 1a, a web fence 104 is attached to the connection between the sampling platform 100 and the intake ram 200 for placing a monitoring paper tape 109 on top of the web fence 104 for securing and protecting the monitoring paper tape 109 from air flow damage in fig. 1 b.
As shown in fig. 1b, the bottom of the sampling platform 100 is provided with an air outlet 105, the mixed gas passes through a second filter device 111 and a second flow regulating device 113, is connected to a second gas power device 115, and is discharged through the second filter device 111 through a gas path connected with the air outlet 105 without polluting the environment.
According to the gas mixing device, one path of auxiliary gas is introduced into the sampling gas path system part, vortex can be caused in the gas chamber, gas is mixed uniformly, and therefore spots enriched on the filter belt are uniform, and accurate measurement is achieved.
According to an embodiment, referring to fig. 1a, the first gas power device 150 supplies gas to the auxiliary gas circuit 102. In the auxiliary gas path 102, a first gas filtering device 190 is first provided for filtering impurities in the gas flow; the left side of the first gas filtering device 190 is connected with the first flow regulating device 180 in an air mode to regulate the gas flow in the auxiliary gas circuit 102; the left side of the auxiliary air path after the air flows through the first flow regulator 180 is connected to the first flow detector 170 for detecting the air flow in the auxiliary air path, and the air flow is fed back to the first flow regulator 180 through the control unit 300 (fig. 3) to increase or decrease the air flow entering the auxiliary air path 102.
Optionally, the first flow measuring device 170 is a mass flow meter; the first flow regulating device 180 is a proportional regulating valve or a mechanical regulating valve; the first gas filtration device 190 is a HEPA filter; the first gas-powered device 150 is a direct flow diaphragm pump.
According to an embodiment, the total exhaust gas path 105 includes therein: the second flow regulating device 113 is arranged in the total exhaust gas path 105 and is used for regulating the size of the gas flow in the total exhaust gas path; the second flow detection device 110 is arranged in the total exhaust gas path before the air flow flows through the second flow regulation device 113 and is used for detecting the size of the air flow in the total exhaust gas path; and the second gas filtering device 111 is arranged in the total exhaust gas path and used for filtering the sampled uniformly-mixed gas. In fig. 1a, the second gas filtering device 111 and the second flow rate detecting device 110 are integrally disposed at the left side of the second flow rate adjusting device 113, but not limited thereto, and in fig. 1b, the second gas filtering device 111 is separately disposed at the left side of the second flow rate adjusting device 113, and the second gas filtering device 111 may also be disposed at the right side of the second flow rate adjusting device 113 according to the requirement.
Fig. 2 is a diagram illustrating steps of a method for sampling spot blending of a beta-ray particulate monitor according to an exemplary embodiment.
According to an embodiment, at S201, gas enters the auxiliary gas path through the gas power device 190;
at S203, the intake air amount is adjusted by the gas power unit 150 controlled by the constant flow rate control device 160; the gas passes through a gas filtering device 190 to obtain filtered gas;
in S205, the filtered gas is adjusted to a constant flow point set by the constant flow control device 160 through the flow regulating device 180, and enters the hole mixing gas chamber 103;
in S207, the intake flow of the main sampling gas path 101 is kept stable by adjusting the constant flow control device 160;
in S209, the sampled gas passes through the total exhaust gas path 105 and is adjusted to a set total exhaust gas path flow stability range by the second flow rate adjustment device 113;
at S211, the sampled gas passes through the second gas filtering device 111 and is exhausted from the second gas dynamic device 115 to the environment.
And a constant flow control device 160 is additionally arranged at the rear side of the sampling platform to control the first gas power device 150, the first gas filtering device 190, the first flow adjusting device 180, the first flow detecting device 170, the second gas power device 115, the second gas filtering device 111, the second flow adjusting device 113 and the second flow detecting device 110.
Optionally, the constant point of the auxiliary gas path is set as flow: 3L/min. From the beginning of preheating of the instrument, the flow of the auxiliary gas circuit is firstly adjusted to be 3L/min so as to be stabilized near the constant flow point, specifically (3 +/-0.15) L/min; then, the flow control valve of the main exhaust path is increased and decreased by adjusting the constant flow control device 160, and the flow of the main gas path is kept at 16.67L/min, specifically (16.67 +/-0.5) L/min; when the flow rate is more than 17.17L/min, adjusting the constant flow control device 160, specifically, reducing the valve of the second flow rate adjusting device 113 to make the flow rate return to 16.67L/min; when the flow rate is less than 16.17L/min, adjusting the constant flow control device 160, specifically, increasing the valve of the second flow rate adjustment device 113 to return the flow rate to 16.67L/min; specifically, automatic control is realized by setting parameters of the constant flow control device 160, and the reciprocating circulation ensures that the flow of the main air path is stabilized at 16.67L/min, generates stable vortex and realizes the purpose of uniformly mixing sampling spots.
Optionally, the constant flow control device 160 is provided with a device for detecting the use time of the first gas filtering device 190 and the second gas filtering device 111, and prompting to replace the gas filtering devices 111 and 190. Specifically, after the replacement of the gas filtering devices 111 and 190, the updating is performed in the constant flow rate control device 160, and the use times of the gas filtering devices 111 and 190 are counted anew.
According to some embodiments, the particulate matter monitor only introduces the clean gas of the auxiliary gas path after the end of one working cycle and before the start of the next working cycle; and then, the clean airflow value of the first flow regulating device 180 in the cleaning mode is set by regulating the constant flow control device 160, and the clean airflow value is greater than the constant flow point, so that the device for uniformly mixing the sampled gas of the monitor is cleaned.
According to some embodiments, the particulate matter monitor enters a zero calibration mode after a duty cycle is complete. In the next working period, only introducing clean gas of the auxiliary gas path; and then, the first flow regulating device 180 is set to calibrate the air flow value in the zero mode by regulating the constant flow control device 160, and the calibrated air flow value is greater than a constant flow point, so that the zero calibration of the particulate matter monitor is realized.
Further, a gas with a known concentration of particulate matter content is introduced to perform span calibration.
Fig. 3 illustrates a system block diagram of a beta-ray method particulate matter monitor sampling spot blending, according to an exemplary embodiment.
A constant flow system for monitor sample gas mixing includes:
a first gas power unit 301 for introducing air into the auxiliary air path;
a first gas filtering unit 303 for filtering impurities in the air;
a first flow rate adjustment unit 305 for adjusting the flow rate of the gas flowing through the auxiliary gas path;
a first flow measurement unit 307 for detecting a gas flow rate;
a second gas power unit 309 for introducing air into the total exhaust gas path;
a second gas filtering unit 311 for filtering the sampling gas;
a second flow rate adjusting unit 313 for adjusting a flow rate of the gas flowing through the total exhaust gas path;
and a second flow measuring unit 315 for detecting the flow of the sampled gas.
According to the embodiment, through the introduction of the auxiliary gas path, the gas flowing in the gas chamber can generate vortex, so that the particulate matters in the gas can be uniformly enriched on the sampling spot. The final monitoring accuracy of the particulate matter monitor adopting the beta-ray absorption method is improved.
The foregoing detailed description of the embodiments of the present application has been presented to illustrate the principles and implementations of the present application, and the description of the embodiments is only intended to facilitate the understanding of the methods and their core concepts of the present application. Meanwhile, a person skilled in the art should, according to the idea of the present application, change or modify the embodiments and applications of the present application based on the scope of the present application. In summary, this summary should not be construed as a limitation on the present application.
Claims (7)
1. The utility model provides a device that is used for monitor sample gas mixing which characterized in that includes: sampling platform, the pressure head that admits air, the pressure head setting that admits air is in on the sampling platform, the pressure head that admits air includes:
the main sampling gas circuit is arranged on the sampling platform;
the auxiliary gas path is arranged outside the main sampling gas path and communicated with the sampling platform, and the tail end of the auxiliary gas path is in gas connection with a first power device to supply gas for the auxiliary gas path;
a hole mixing air chamber communicated with the main sampling air passage and the auxiliary air passage, wherein
And the total exhaust gas path is arranged on the side surface of the sampling platform and communicated with the hole mixing gas chamber, and the tail end of the total exhaust gas path is in gas connection with a second gas power device for auxiliary exhaust.
2. The apparatus of claim 1, comprising, in the auxiliary gas circuit:
the first flow adjusting device is arranged in the auxiliary gas path and used for adjusting the size of the gas flow in the auxiliary gas path;
the first flow detection device is arranged in the auxiliary gas path after the gas flow flows through the first flow adjustment device and used for detecting the size of the gas flow in the auxiliary gas path;
and the first gas filtering device is arranged in the auxiliary gas path before the gas flow flows through the first flow regulating device and is used for filtering impurities in the gas flow.
3. The apparatus of claim 2, wherein the relative positions of said primary and secondary gas sampling paths are selected from vertical, opposing, co-directional, and lateral.
4. The apparatus of claim 1, wherein the total exhaust gas path comprises:
the second flow regulating device is arranged in the main exhaust gas path and used for regulating the size of the gas flow in the main exhaust gas path;
the second flow detection device is arranged in the total exhaust gas path before the airflow flows through the second flow regulation device and is used for detecting the size of the airflow in the total exhaust gas path;
and the second gas filtering device is arranged in the total exhaust gas path and is used for filtering the uniformly mixed gas after sampling.
5. The device of claim 2, wherein a constant flow control device is added on the rear side of the sampling platform to control the first gas power device, the first gas filtering device, the first flow regulating device and the first flow detecting device.
6. The apparatus of claim 4, wherein a constant flow control device is added to the rear side of the sampling platform to control the second pneumatic device, the second gas filtering device, the second flow regulating device and the second flow detecting device.
7. The utility model provides a constant flow system for monitor sample gas mixing which characterized in that includes:
a first gas power unit for introducing air into the auxiliary air path;
the first gas filtering unit is used for filtering impurities in the air;
the first flow regulating unit is used for regulating the flow of the gas flowing through the auxiliary gas path;
the first flow measuring unit is used for detecting the gas flow;
the second gas power unit is used for introducing air into the main exhaust gas path;
a second gas filtering unit for filtering the sampling gas;
the second flow regulating unit is used for regulating the flow of the gas flowing through the main exhaust gas path;
and the second flow measuring unit is used for detecting the flow of the sampling gas.
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