CN215276611U - Semiconductor cleaning equipment with pressure control function - Google Patents
Semiconductor cleaning equipment with pressure control function Download PDFInfo
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- CN215276611U CN215276611U CN202120894477.4U CN202120894477U CN215276611U CN 215276611 U CN215276611 U CN 215276611U CN 202120894477 U CN202120894477 U CN 202120894477U CN 215276611 U CN215276611 U CN 215276611U
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Abstract
The utility model belongs to the technical field of semiconductor technology waste gas cleaning equipment technique and specifically relates to a semiconductor cleaning equipment with pressure control function. The air duct type air conditioner comprises a main frame, wherein an air duct is fixed in the main frame, a plurality of air duct air inlets are arranged on the air duct side by side, each air duct air inlet is connected with an air outlet end of an air inlet cylinder, and the air inlet end of the air inlet cylinder extends out of the main frame; the pressure control unit is arranged between the air inlet barrel body and the air duct and comprises a fixed barrel, an air outlet end of the fixed barrel is communicated with an air inlet of the air duct, the fixed barrel is connected with a rotary drum in a rotating mode through a bearing, the upper end of the fixed barrel is connected with a motor support through a connecting piece in a detachable mode, a control motor is fixed on the motor support, and the output end of the control motor extends into the fixed barrel and is connected with the rotary drum. The spray nozzle in the air inlet cylinder of the utility model sprays washing liquid to the waste gas entering the end surface of the air inlet flange, thereby purifying the harmful substances in the waste gas; the pressure control unit can control the pressure and stabilize the pressure of the superior equipment.
Description
Technical Field
The utility model belongs to the technical field of semiconductor technology waste gas cleaning equipment technique and specifically relates to a semiconductor cleaning equipment with pressure control function.
Background
A large amount of process waste gas is generated in the production process of semiconductor wafers, so as to meet the requirement of environmental protection. The process waste gas needs to be cleaned and purified.
In the prior art, the process waste gas is generally sucked into a cleaning device by pressure air for spraying and washing, and the process waste gas after being sprayed and washed is discharged into the atmosphere, so that the absorption of general concentration acid-base and organic water-soluble waste gas generated in the process of semiconductor cleaning process can be met. However, since the air pressure cannot be freely adjusted, the cleaning equipment can only work at a constant exhaust gas treatment speed, and cannot flexibly cope with different use conditions.
SUMMERY OF THE UTILITY MODEL
The applicant aims at the defects in the prior art and provides a semiconductor cleaning device with a pressure control function, which can flexibly adjust the waste gas cleaning rate according to the use requirement and improve the use flexibility.
The utility model discloses the technical scheme who adopts as follows:
the semiconductor cleaning equipment with the pressure control function comprises a main frame, wherein an air channel is fixed in the main frame, a plurality of air channel air inlets are arranged on the air channel side by side, each air channel air inlet is connected with an air outlet end of an air inlet cylinder, and the air inlet end of the air inlet cylinder extends out of the main frame; a pressure control unit is arranged between the air inlet barrel body and the air duct, the pressure control unit comprises a fixed barrel, an air outlet end of the fixed barrel is communicated with an air inlet of the air duct, the fixed barrel is rotatably connected with a rotary barrel through a bearing, the upper end of the fixed barrel is detachably connected with a motor support through a connecting piece, a control motor is fixed on the motor support, an output end of the control motor extends into the fixed barrel and is connected with the rotary barrel, the control motor can drive the rotary barrel to rotate around the fixed barrel, an air inlet flange end face is arranged on the side face of the fixed barrel, an air inlet window is arranged on the side face of the rotary barrel, and the communication area between the air inlet window and the air inlet flange end face can be adjusted when the rotary barrel rotates; and the air outlet of the air duct is connected with a booster fan.
Furthermore, the side surface of the air duct is detachably connected with the observation window through a connecting piece.
Furthermore, an air inlet cylinder air outlet is connected to the end face of the air inlet flange, an air pressure sensor is arranged at the position of the air inlet cylinder and electrically connected with a control motor, and the control motor can adjust the communication area between the air inlet window and the end face of the air inlet flange according to data measured by the air pressure sensor.
Furthermore, a spraying nozzle is arranged at the position, facing the end face of the air inlet flange, in the air inlet cylinder, and the spraying nozzle sprays washing liquid to the waste gas entering the end face of the air inlet flange.
Furthermore, the upper part of the main frame is provided with a water inlet which is connected with each spray nozzle through a spray pipe, the bottom of the main frame is provided with a water collecting tank, and the bottom of the water collecting tank is provided with a water outlet.
The utility model has the advantages as follows:
the utility model has compact and reasonable structure and convenient operation, and the spray nozzle in the air inlet cylinder sprays the cleaning solution to the waste gas entering the end surface of the air inlet flange, thereby purifying the harmful substances in the waste gas; the pressure control unit can control the pressure and stabilize the pressure of the superior equipment.
Drawings
Fig. 1 is a front view of the present invention.
Fig. 2 is a top view of the present invention.
Fig. 3 is a perspective view of the pressure control unit of the present invention.
Fig. 4 is a semi-sectional view of the pressure control unit of the present invention.
Wherein: 1. a main frame; 2. an air duct; 3. an air inlet cylinder; 4. a pressure control unit; 4.1, fixing the cylinder; 4.2, a rotary drum; 4.3, controlling the motor; 4.4, a motor bracket; 4.5, an end face of the air inlet flange; 4.6, an air inlet window; 5. a spray nozzle; 6. an air pressure sensor; 7. an observation window; 8. a booster fan; 9. a water collection tank; 10. a water inlet; 11. and (7) a water outlet.
Detailed Description
The following describes embodiments of the present invention with reference to the drawings.
As shown in fig. 1 and 2, the air conditioner mainly includes a main frame 1, an air duct 2 is fixed in the main frame 1, a plurality of air duct inlets are arranged on the air duct 2 side by side, an air outlet end of an air inlet cylinder 3 is connected to each air duct inlet, and an air inlet end of the air inlet cylinder 3 extends out of the main frame 1.
In order to observe the inside of the air duct 2, in the embodiment shown in fig. 2, the side surface of the air duct 2 is detachably connected with the observation window 7 through a connecting piece, and the inside of the air duct 2 can be clearly observed through the observation window 7.
In order to adjust the exhaust gas cleaning rate according to the requirement, as shown in the embodiment shown in fig. 1 and fig. 2, a pressure control unit 4 is arranged between the air inlet cylinder 3 and the air duct 2, and the pressure control unit 4 can control the amount of exhaust gas passing through.
In the embodiment shown in fig. 3 and 4, the pressure control unit 4 includes a fixed cylinder 4.1, an air outlet end of the fixed cylinder 4.1 is communicated with an air inlet of the air duct, and the fixed cylinder 4.1 is rotatably connected with the rotating cylinder 4.2 through a bearing. The upper end of the fixed cylinder 4.1 is detachably connected with a motor support 4.4 through a connecting piece, a control motor 4.3 is fixed on the motor support 4.4, the output end of the control motor 4.3 extends into the fixed cylinder 4.1 and is connected with a rotating cylinder 4.2, and the control motor 4.3 can drive the rotating cylinder 4.2 to rotate around the fixed cylinder 4.1. The side surface of the fixed cylinder 4.1 is provided with an air inlet flange end surface 4.5, the side surface of the rotary cylinder 4.2 is provided with an air inlet window 4.6, and the communication area between the air inlet window 4.6 and the air inlet flange end surface 4.5 can be adjusted when the rotary cylinder 4.2 rotates.
In the embodiment shown in fig. 4, the air inlet cylinder 3 is connected to the air outlet of the air inlet flange end face 4.5, the air pressure sensor 6 is arranged at the air inlet of the air inlet cylinder 3, the air pressure sensor 6 is electrically connected with the control motor 4.3, and the control motor 4.3 can adjust the communication area between the air inlet window 4.6 and the air inlet flange end face 4.5 according to the data measured by the air pressure sensor 6.
In the embodiment shown in fig. 4, a spray nozzle 5 is arranged at a position facing to the end surface 4.5 of the air inlet flange in the air inlet cylinder 3, and the spray nozzle 5 sprays cleaning solution to the exhaust gas entering the end surface 4.5 of the air inlet flange, so as to purify harmful substances in the exhaust gas.
In the embodiment shown in fig. 1 and 2, the air outlet of the air duct 2 is connected with a booster fan 8, and the booster fan 8 actively pumps out the air in the air duct 2.
In the embodiment shown in fig. 1 and 2, a water inlet 10 is provided at the upper part of the main frame 1, the water inlet 10 is connected with each spray nozzle 5 through a spray pipe, a water collecting tank 9 is provided at the bottom of the main frame 1, a water outlet 11 is provided at the bottom of the water collecting tank 9, the water collecting tank 9 can collect sprayed washing liquid, and then the washing liquid is discharged through the water outlet 11.
The utility model discloses a theory of operation is: when the air inlet device works, waste gas enters through the air inlet cylinders 3, and the spraying nozzles 5 in the air inlet cylinders 3 spray washing liquid to the waste gas entering the end faces 4.5 of the air inlet flanges, so that harmful substances in the waste gas are purified. A pressure control unit 4 is arranged between the air inlet cylinder 3 and the air duct 2, and the pressure control unit can control the pressure and stabilize the pressure of the superior equipment. The scrubbed gas is discharged through the booster fan 8.
The above description is for the purpose of explanation and not limitation of the invention, which is defined in the claims, and any modifications may be made within the scope of the invention.
Claims (5)
1. A semiconductor cleaning equipment with pressure control function, includes main frame (1), its characterized in that: an air duct (2) is fixed in the main frame (1), a plurality of air duct air inlets are arranged on the air duct (2) side by side, an air outlet end of an air inlet cylinder (3) is connected to each air duct air inlet, and an air inlet end of the air inlet cylinder (3) extends out of the main frame (1); a pressure control unit (4) is arranged between the air inlet cylinder body (3) and the air duct (2), the pressure control unit (4) comprises a fixed cylinder (4.1), an air outlet end of the fixed cylinder (4.1) is communicated with an air inlet of the air duct, the fixed cylinder (4.1) is connected with a rotary cylinder (4.2) in a rotating mode through a bearing, the upper end of the fixed cylinder (4.1) is detachably connected with a motor support (4.4) through a connecting piece, a control motor (4.3) is fixed on the motor support (4.4), the output end of the control motor (4.3) extends into the fixed cylinder (4.1) and is connected with the rotary cylinder (4.2), the control motor (4.3) can drive the rotary cylinder (4.2) to rotate around the fixed cylinder (4.1), an air inlet flange end face (4.5) is arranged on the side face of the fixed cylinder (4.1), an air inlet window (4.6) is arranged on the side face of the rotary cylinder (4.2), and the communication area of the air inlet window (4.6) and the air inlet flange end face (4.5) can be adjusted when the rotary cylinder (4.2) rotates; and the air outlet of the air duct (2) is connected with a booster fan (8).
2. The semiconductor cleaning apparatus with pressure control function according to claim 1, wherein: the side surface of the air duct (2) is detachably connected with the observation window (7) through a connecting piece.
3. The semiconductor cleaning apparatus with pressure control function according to claim 1, wherein: connect air inlet barrel (3) gas outlet on air inlet flange terminal surface (4.5), air inlet barrel (3) air inlet position department sets up baroceptor (6), and baroceptor (6) and control motor (4.3) electricity are connected, and control motor (4.3) can be according to the intercommunication area of data adjustment air intake window (4.6) and air inlet flange terminal surface (4.5) that baroceptor (6) surveyed.
4. The semiconductor cleaning apparatus with pressure control function according to claim 1, wherein: the position of the inner surface of the air inlet cylinder body (3) facing the end surface (4.5) of the air inlet flange is provided with a spray nozzle (5), and the spray nozzle (5) sprays cleaning solution to waste gas entering the end surface (4.5) of the air inlet flange.
5. The semiconductor cleaning apparatus with pressure control function according to claim 4, wherein: the water spraying device is characterized in that a water inlet (10) is formed in the upper portion of the main frame (1), the water inlet (10) is connected with each spraying nozzle (5) through a spraying pipe, a water collecting tank (9) is formed in the bottom of the main frame (1), and a water outlet (11) is formed in the bottom of the water collecting tank (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120894477.4U CN215276611U (en) | 2021-04-27 | 2021-04-27 | Semiconductor cleaning equipment with pressure control function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120894477.4U CN215276611U (en) | 2021-04-27 | 2021-04-27 | Semiconductor cleaning equipment with pressure control function |
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| Publication Number | Publication Date |
|---|---|
| CN215276611U true CN215276611U (en) | 2021-12-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202120894477.4U Active CN215276611U (en) | 2021-04-27 | 2021-04-27 | Semiconductor cleaning equipment with pressure control function |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117524944A (en) * | 2024-01-04 | 2024-02-06 | 盛奕半导体科技(无锡)有限公司 | Multi-chamber independent pressure control device for semiconductor wet process |
-
2021
- 2021-04-27 CN CN202120894477.4U patent/CN215276611U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117524944A (en) * | 2024-01-04 | 2024-02-06 | 盛奕半导体科技(无锡)有限公司 | Multi-chamber independent pressure control device for semiconductor wet process |
| CN117524944B (en) * | 2024-01-04 | 2024-03-12 | 盛奕半导体科技(无锡)有限公司 | Multi-chamber independent pressure control device for semiconductor wet process |
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