CN215250464U

CN215250464U - Gas phase siliconizing device for carbon-ceramic friction material

Info

Publication number: CN215250464U
Application number: CN202120994330.2U
Authority: CN
Inventors: 朱献文; 朱纬纬
Original assignee: Guangzhou Sandi Investment Management Enterprise LP
Current assignee: Guangzhou Sandi Investment Management Enterprise LP
Priority date: 2021-05-11
Filing date: 2021-05-11
Publication date: 2021-12-21
Anticipated expiration: 2031-05-11

Abstract

The utility model relates to a carbon pottery combined material preparation facilities technical field discloses a carbon pottery friction material's gaseous phase siliconizing device, including reaction vessel, bracing piece and lid, reaction vessel's opening part is located to the lid, forms confined space, and reaction vessel's inside is equipped with the subregion board that is used for separating infiltration chamber and evaporation chamber, and the infiltration chamber is located between the evaporation chamber of both sides, and the subregion board is equipped with a plurality of and is used for the through-hole that feeds through infiltration chamber and evaporation chamber, and the bracing piece is striden and is located between the both sides subregion board to the supporting workpiece soaks to arrange in the infiltration chamber. Place the silicon granule in the evaporation chamber, after the silicon granule was heated to the molten condition, gaseous state silicon was in from up evaporation is followed to the evaporation chamber, and rethread through-hole gets into the infiltration chamber, and the different planes of work piece can permeate the gaseous state silicon and the reaction of partial carbon matrix of the sufficient simultaneously, and the through-hole plays the guide effect, and reaction process is more even for the carbon pottery composite component content who prepares is balanced, has advantages such as friction stability height.

Description

Gas phase siliconizing device for carbon-ceramic friction material

Technical Field

The utility model relates to a carbon pottery combined material preparation technical field especially relates to a carbon pottery friction material's gaseous phase siliconizing device.

Background

The carbon-ceramic composite material has the advantages of low density, wear resistance, high friction coefficient, stable braking, corrosion resistance, oxidation resistance, high temperature resistance, strong environmental adaptability (such as no fading of friction factors in a wet state), long service life and the like, and is a relatively ideal novel high-performance friction material.

At present, the processes for preparing the carbon-ceramic composite material mainly comprise 4 processes: a precursor impregnation-pyrolysis process (PIP), a chemical vapor infiltration process (CVI), a liquid phase siliconizing reactive sintering process (LSI), and a gas phase siliconizing reactive sintering process (GSI). The gas phase siliconizing reaction sintering process has the advantages of adjustable composition, designable performance, easy realization of post-processing and the like. The reaction of gas phase siliconizing is roughly divided into two stages: in the first stage, after silicon vapor contacts carbon fibers, the silicon vapor is adsorbed and undergoes a chemical reaction to form silicon carbide, and the surface of the fibers is wrapped to form a thin layer, and then the reaction is carried out in the next stage; and in the second stage, the reaction is a diffusion reaction of carbon and silicon in the silicon carbide layer, and along with the increase of the thickness of the silicon carbide layer and the continuous reduction of the reaction space, the reaction rate is slowed down until the reaction is stopped, and unreacted silicon matrix remains.

The silicon vapor of the existing gas phase siliconizing device is evaporated from bottom to top, namely the silicon vapor on the bottom surface of the workpiece is contacted firstly and has the largest contact amount, the reaction rate of the bottom surface of the workpiece is the fastest, and the residual silicon matrix is the largest after the reaction is stopped. The silicon infiltration amount of different positions of the workpiece is not uniform, so that the prepared carbon-ceramic composite material has the problems of non-uniform components and easy cracking in use.

SUMMERY OF THE UTILITY MODEL

The to-be-solved technical problem of the utility model is: the gas-phase siliconizing device of the carbon ceramic friction material enables silicon steam to be in more uniform contact with a workpiece, so that the prepared carbon ceramic composite material is balanced in component content and has the advantages of high friction stability and the like.

In order to solve the technical problem, the utility model provides a carbon pottery friction material's gaseous phase siliconizing device, including reaction vessel, bracing piece and lid, the lid is located reaction vessel's opening part, so that reaction vessel forms confined space, reaction vessel's inside is equipped with the subregion board that is used for separating infiltration chamber and evaporation chamber, the subregion board extends from the bottom surface toward the opening direction, the infiltration chamber is located both sides between the evaporation chamber, the subregion board is equipped with a plurality of and is used for the intercommunication the infiltration chamber with the through-hole in evaporation chamber, the bracing piece is striden and is located both sides between the subregion board to support the work piece soar arrange in the infiltration chamber.

Preferably, the inner diameter of the through hole is larger than that of the support rod, and the support rod is arranged on the through holes of the partition plates on the two sides in a spanning manner.

Preferably, the reaction vessel is provided with partition plates on the periphery inside so that the reaction vessel forms four evaporation cavities.

Preferably, two adjacent evaporation cavities are provided with partition plates.

Preferably, an included angle between the partition plate and the side wall of the reaction vessel is 45 degrees, so that the cross section of the evaporation cavity is trapezoidal.

Preferably, the through holes are distributed at the top and the middle of the partition plate.

Preferably, the height of the partition plate is smaller than that of the reaction vessel, and when the cover body is in a closed state, a gap for ventilation is formed between the partition plate and the cover body.

Preferably, the number of the support rods is two or more, the support rods are parallel to each other, and each support rod forms a support plane for supporting the workpiece.

Preferably, the reaction vessel and the cover are graphite crucibles, and the support rod is a graphite rod.

Preferably, the device further comprises a boiler, the reaction vessel and the cover body are both positioned in the boiler, the wall of the boiler is provided with an air exhaust hole, and the workpiece is a brake component of an automobile or a rail transit system.

The utility model provides a carbon pottery friction material's gaseous phase siliconizing device compares with prior art, and its beneficial effect lies in:

the utility model discloses utilize reaction vessel with the lid cooperation forms sealed reaction space inside is equipped with the subregion board, separates into it infiltration chamber and evaporation chamber, arranges the work piece in on the bracing piece, the bracing piece is striden and is located both sides between the subregion board for the work piece is arranged in with vacating the state in the infiltration chamber, places silicon particle in evaporation chamber, and silicon particle is heated to the molten condition after, forms steam, and gaseous state silicon is in evaporation chamber is from up evaporation, rethread down the through-hole gets into the infiltration chamber, the side contact reaction relative with the work piece, the not coplanar of work piece promptly can permeate the gaseous state silicon of capacity simultaneously and react with partial carbon matrix, and reaction process is more even for the carbon-ceramic composite material component content who prepares out is balanced, has advantages such as friction stability height.

Drawings

Fig. 1 is a schematic view of the internal structure of a gas phase siliconizing device for carbon-ceramic friction material according to a preferred embodiment of the present invention.

Fig. 2 is a sectional view showing a state of use of a vapor phase siliconizing apparatus for carbon-ceramic friction material according to a preferred embodiment of the present invention.

Fig. 3 is a sectional view showing another state of use of the apparatus for gas phase siliconizing carbon ceramic friction materials according to the preferred embodiment of the present invention.

In the figure: 1. a reaction vessel; 2. a support bar; 3. a cover body; 4. a permeate chamber; 5. an evaporation chamber; 6. a partition plate; 7. a through hole; 8. a workpiece; 9. silicon particles; 10. a partition plate; 11. a gap.

Detailed Description

The following detailed description of the embodiments of the present invention is provided with reference to the accompanying drawings and examples. The following examples are intended to illustrate the invention, but are not intended to limit the scope of the invention.

In the description of the present invention, it should be noted that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of the description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.

In the description of the present invention, it should be understood that the terms "connected," "connected," and "fixed" used in the present invention should be interpreted broadly, for example, as a fixed connection, a detachable connection, or an integral body; the connection can be mechanical connection or welding connection; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

As shown in fig. 1 to 3, the preferred embodiment of the present invention provides a gas phase siliconizing device for carbon ceramic friction material, which includes a reaction vessel 1, a support rod 2 and a cover body 3, the cover body 3 is covered on the opening of the reaction vessel 1, so that the reaction vessel 1 forms a sealed space, a partition plate 6 for separating a permeation cavity 4 and an evaporation cavity 5 is disposed inside the reaction vessel 1, the partition plate 6 extends from the bottom surface to the opening direction, the permeation cavity 4 is disposed on both sides between the evaporation cavities 5, the partition plate 6 is provided with a plurality of through holes 7 for communicating the permeation cavity 4 with the evaporation cavity 5, the support rod 2 spans on both sides between the partition plates 6, so as to support a workpiece 8 to be placed in the permeation cavity 4 in an empty manner.

Based on the gas phase siliconizing device with the technical characteristics, the reaction vessel 1 and the cover body 3 are matched to form a sealed reaction space, the reaction vessel 1 is internally provided with a partition plate 6 which is divided into a permeation cavity 4 and an evaporation cavity 5, a workpiece 8 is arranged on the support rod 2, the support rod 2 is arranged between the partition plates 6 at two sides in a spanning manner, so that the workpiece 8 is arranged in the permeation cavity 4 in an empty state, silicon particles 9 are arranged in the evaporation cavity 5, the silicon particles 9 are heated to a molten state to form steam, gaseous silicon is evaporated from bottom to top in the evaporation cavity 5 and enters the permeation cavity 4 through the through holes 7 to be in contact reaction with the side face opposite to the workpiece 8, namely, different planes of the workpiece 8 can be simultaneously infiltrated with sufficient gaseous silicon to react with partial carbon matrix, and the through holes 7 play a guiding role, so that the reaction process is more uniform, the prepared carbon-ceramic composite material has the advantages of balanced component content, high friction stability and the like.

The workpiece 8 is a carbon workpiece 8, and may be a ring-shaped brake disc of an automobile, a brake shoe of a high-speed train, a skid of a magnetic suspension train, or the like. During the reaction, when the bottom surface of the workpiece 8 has a large area, the bottom surface of the infiltration chamber 4 may also be placed with a small amount of silicon particles 9 so that a sufficient amount of gaseous silicon infiltrates into the bottom surface of the workpiece 8.

In this embodiment, the inner diameter of the through hole 7 is larger than the inner diameter of the support rod 2, and the support rod 2 is spanned on the through holes 7 of the partition plates 6 at two sides without additionally arranging a component for fixing the support rod 2. And can be according to the size adjustment of different work pieces 8 the position that bracing piece 2 placed, the operation is more convenient. The inner diameter of the through hole 7 is large, and in the reaction process, gaseous silicon can also enter the permeation cavity 4 through the through hole 7, so that the blockage is avoided, and the uniform permeation reaction of the side surface of the workpiece 8 is ensured.

In this embodiment, the partition plates 6 are disposed around the inside of the reaction vessel 1, so that the reaction vessel 1 forms four evaporation chambers 5, and when the area of the peripheral side surface of the workpiece 8 is large, silicon particles 9 need to be placed in all the evaporation chambers 5 around, thereby ensuring that the peripheral side surface of the workpiece 8 can perform uniform permeation reaction.

Furthermore, two adjacent evaporation chambers 5 are provided with partition plates 10, so that the messy channeling of silicon vapor in different evaporation chambers 5 is avoided, and the gaseous silicon can only be evaporated from bottom to top. The baffle 10 with the contained angle is 45 between the lateral wall of reaction vessel 1 to make the transversal personally submitting of evaporation chamber 5 is trapezoidal, is convenient for manufacture. Wherein the reaction vessel 1, the partition plate 6 and the partition plate 10 are manufactured by integral molding.

In this embodiment, the through holes 7 are distributed on the top and the middle of the partition plate 6, that is, the through holes 7 do not need to be arranged on the bottom of the partition plate 6, so as to prevent excessive gaseous silicon from entering the bottom of the infiltration chamber 4. If the area of the bottom surface of the workpiece 8 is larger, a small amount of silicon particles 9 can be placed on the bottom surface of the infiltration chamber 4 for solving the problem.

In this embodiment, the height of the partition plate 6 is smaller than that of the reaction vessel 1, and when the lid 3 is in a closed state, a gap 11 for ventilation is formed between the partition plate 6 and the lid 3. After a large amount of silicon vapor is formed, gaseous silicon can enter the permeation cavity 4 from the gap 11 and perform a permeation reaction with the top surface of the workpiece 8, so that the workpiece 8 is subjected to an all-dimensional permeation reaction, and the method has the advantages of good uniformity, short reaction time in the whole process and the like.

In this embodiment, as shown in fig. 1 and 2, when the workpiece 8 is a ring-shaped workpiece such as a brake disc, one supporting rod 2 may be used, and the ring is suspended in an empty state. As shown in fig. 3, when the workpiece 8 is in another shape that cannot be hung, the number of the support rods 2 is two or more, and the support rods 2 are arranged in parallel with each other, so that the support rods 2 form a support plane for supporting the workpiece 8, that is, the workpiece 8 is directly placed on the support plane, in this case, the support rods 2 with a smaller diameter can be selected.

In this embodiment, the reaction vessel 1 and the lid 3 are graphite crucibles, and the support rod 2 is a graphite rod. The graphite crucible and the graphite rod are stable in property and resistant to high temperature, and the workpieces 8 are carbon workpieces 8, so that the components of the carbon workpieces 8 are not easily affected.

In this embodiment, the gas-phase siliconizing device further comprises a boiler (not shown in the attached drawing) for high-temperature heating, the reaction vessel 1 and the cover body 3 are both located in the boiler, and the wall of the boiler is provided with an air extraction hole for extracting air when the boiler reaches a reaction temperature, so that the pressure in the boiler is smaller than the saturated vapor pressure of silicon, boiling evaporation of silicon is realized, and sufficient permeation is achieved. It can be understood that the prepared carbon-ceramic friction material can be used as a brake component of an automobile or a rail transit system, such as an automobile brake disc (sheet), a high-speed train brake shoe, a magnetic suspension train skid and the like.

The general operation process of the gas phase siliconizing device of the embodiment is as follows: enough silicon particles 9 are placed in the evaporation cavity 5 and the permeation cavity 4, the graphite rod is erected on the through hole 7, so that the carbon workpiece 8 is emptied in the permeation cavity 4, the cover body 3 is covered, and the whole body is conveyed into a boiler for gas phase permeation.

To sum up, the embodiment of the utility model provides a carbon pottery friction material's gaseous phase siliconizing device has following advantage: (1) the method can carry out synchronous permeation reaction on different planes of the carbon workpiece 8 in an all-around manner, and the reaction process is more uniform, so that the prepared carbon-ceramic composite material has balanced component content; (2) only a graphite part is arranged in the closed space of the reaction, so that the reaction is stable in property and high-temperature resistant, and the components of the carbon workpiece 8 are not easily influenced; (3) the carbon workpiece 8 with different shapes can be suitable, the universality is high, and the carbon workpiece can be repeatedly used.

The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of modifications and replacements can be made without departing from the technical principle of the present invention, and these modifications and replacements should also be regarded as the protection scope of the present invention.

Claims

1. The utility model provides a carbon pottery friction material's gaseous phase siliconizing device, its characterized in that, includes reaction vessel, bracing piece and lid, the lid is located reaction vessel's opening part, so that reaction vessel forms the confined space, reaction vessel's inside is equipped with the subregion board that is used for separating out infiltration chamber and evaporation chamber, the subregion board extends from the bottom surface toward the opening direction, the infiltration chamber is located both sides between the evaporation chamber, the subregion board is equipped with a plurality of and is used for the intercommunication the infiltration chamber with the through-hole in evaporation chamber, the bracing piece is striden and is located both sides between the subregion board to support the work piece soar arrange in the infiltration chamber.

2. A gas phase siliconizing device of carbon-ceramic friction material as recited in claim 1, wherein the inner diameter of the through hole is larger than the inner diameter of the support rod, and the support rod is spanned on the through holes of the partition plates at two sides.

3. A gas phase siliconizing device of carbon-ceramic friction material as recited in claim 1, wherein all the inner periphery of said reaction vessel is provided with a partition plate, so that said reaction vessel forms four evaporation cavities.

4. A gas phase siliconizing device of carbon-ceramic friction material as recited in claim 3, wherein a partition is provided between two adjacent evaporation chambers.

5. A gas-phase siliconizing device of carbon-ceramic friction material as recited in claim 4, characterized in that the included angle between the partition board and the side wall of the reaction vessel is 45 ° so as to make the cross section of the evaporation cavity trapezoidal.

6. A gas phase siliconizing device of carbon-ceramic friction material as recited in claim 1, wherein said through holes are distributed on the top and middle of said partition plate.

7. A gas phase siliconizing apparatus for carbon-ceramic friction material as recited in claim 1, wherein the height of said partition plate is smaller than the height of said reaction vessel, and a gap for ventilation is formed between said partition plate and said cover when said cover is in a closed state.

8. A gas phase siliconizing device of carbon-ceramic friction material as recited in claim 1, wherein the number of the support rods is two or more, the support rods are parallel to each other, and each support rod forms a support plane for supporting the workpiece.

9. A gas phase siliconizing device of carbon-ceramic friction material as recited in any of claims 1 to 8, characterized in that the reaction vessel and the cover are graphite crucibles, and the support rod is a graphite rod.

10. A gas phase siliconizing device of carbon-ceramic friction material as recited in claim 9, further comprising a boiler, wherein the reaction vessel and the cover body are both positioned in the boiler, the wall of the boiler is provided with a gas extraction hole, and the workpiece is a brake component of an automobile or a rail transit system.