CN215195710U - Filter material processing device for etching solution - Google Patents
Filter material processing device for etching solution Download PDFInfo
- Publication number
- CN215195710U CN215195710U CN202120652035.9U CN202120652035U CN215195710U CN 215195710 U CN215195710 U CN 215195710U CN 202120652035 U CN202120652035 U CN 202120652035U CN 215195710 U CN215195710 U CN 215195710U
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- Prior art keywords
- etching
- filter
- etching solution
- filter screen
- liquid
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- 238000005530 etching Methods 0.000 title claims abstract description 119
- 239000000463 material Substances 0.000 title claims abstract description 50
- 239000007788 liquid Substances 0.000 claims abstract description 79
- 238000004140 cleaning Methods 0.000 claims abstract description 21
- 238000001914 filtration Methods 0.000 claims abstract description 11
- 238000005192 partition Methods 0.000 claims abstract description 7
- 238000001802 infusion Methods 0.000 claims description 5
- 238000010129 solution processing Methods 0.000 claims description 4
- 239000013049 sediment Substances 0.000 abstract description 18
- 239000002893 slag Substances 0.000 abstract description 14
- 238000000034 method Methods 0.000 abstract description 12
- 230000008569 process Effects 0.000 abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 4
- 230000000694 effects Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- Filtration Of Liquid (AREA)
Abstract
The utility model discloses a device for processing filter materials by etching liquid, which comprises a filter frame, a base, an etching box and a material filter, wherein the filter frame is fixed on the base, a left support plate is fixedly welded on one side of the etching box, a right support plate is fixedly welded on the other side of the etching box, and the left support plate and the right support plate are arranged in parallel; and a partition plate is arranged in the etching box. According to the device for processing the filter material by the etching solution, when the slag materials at the upper ends of the left filter screen and the right filter screen are washed and cleaned, the plug valve is closed, the injected high-pressure water flow can wash the slag materials at the upper ends of the left filter screen and the right filter screen, the slag materials at the upper ends of the left filter screen and the right filter screen are cleaned, the disassembly and the cleaning are not needed, the use is convenient, the etching solution obtained after the filtration can be poured into the etching box for reuse, and the raw materials are saved; the whole body realizes the filtration of the sediment in the etching solution, the filtered sediment is convenient to process, the filtered etching solution can be reused, and the cost is saved.
Description
Technical Field
The utility model relates to an article etching technical field specifically is an etching liquid processing filter material device.
Background
The etching solution can generate sediment in face and solution in the etching process to make solution be dark green, further etching can be influenced to these sediments, for solving above-mentioned problem that exists, consequently need be at the in-process of etching solution etching, need real-time collector contain the solution of sediment, to the sediment processing back, pour into the solution that obtains after will handling into once more and etch, guarantee the effect of face etching promptly, make full use of etching solution simultaneously, reduce cost, for this reason, propose an etching solution processing filter material device.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide an etching solution processing filter material device has realized the filtration to deposiing in the etching solution, and the sediment after the filtration is convenient for handle, and the etching solution after the filtration can reuse, has saved the cost, has solved among the prior art inconvenient sediment to in the etching solution and has handled, deposits the problem that influences the etching effect.
In order to achieve the above object, the utility model provides a following technical scheme: a device for processing a filter material by etching liquid comprises a filter frame, a base, an etching box and a material filter, wherein the filter frame is fixed on the base, a left support plate is fixedly welded on one side of the etching box, a right support plate is fixedly welded on the other side of the etching box, and the left support plate and the right support plate are arranged in parallel; a partition plate is arranged in the etching box and divides the inside of the etching box into a left etching cavity and a right etching cavity, and filter devices are fixedly arranged on the etching boxes at the lower ends of the left etching cavity and the right etching cavity; the filter material device comprises a left filter hopper, a right filter hopper, a left conveying cylinder, a right conveying cylinder, a cleaning liquid conveying pipe, a liquid guide pipe and a liquid discharge pipe, wherein the lower end of the left filter hopper is fixedly connected with the upper end of the left conveying cylinder, a left filter screen support frame is additionally arranged inside the left filter hopper, and a left filter screen is fixedly arranged on the left filter screen support frame; the lower end of the right filter hopper is fixedly connected with the upper end of the right material conveying cylinder, a right filter screen support frame is additionally arranged inside the right filter hopper, and a right filter screen is fixedly arranged at the upper end of the right filter screen support frame; the cleaning fluid infusion tube is fixedly arranged at the liquid inlet end of the left filter funnel, the liquid outlet end of the left filter funnel is connected with the liquid inlet end of the right filter funnel through a liquid guide tube, and the liquid discharge tube is arranged at the liquid outlet end of the right filter funnel; the lower extreme fixed mounting of left defeated feed cylinder has left etching solution collecting vessel, and the lower extreme fixed mounting of right defeated feed cylinder has right etching solution collecting vessel.
Preferably, the bottom of the liquid outlet end of the cleaning liquid conveying pipe and the bottom of the liquid inlet end of the liquid guide pipe are flush with the upper end face of the left filter screen, and the bottom of the liquid outlet end of the liquid guide pipe and the bottom of the liquid inlet end of the liquid discharge pipe are flush with the upper end face of the right filter screen.
Preferably, plug valves are installed at the liquid inlet end of the left filter hopper and the liquid inlet end of the right filter hopper.
Preferably, the left etching solution collecting barrel and the right etching solution collecting barrel are arranged on the base in a placing mode, the liquid inlet end of the left etching solution collecting barrel is over against the right lower end of the left material conveying barrel, and the liquid inlet end of the right etching solution collecting barrel is over against the right lower end of the right material conveying barrel.
Preferably, the cleaning fluid infusion tube is connected with a pressure pump, and the pressure pump is externally connected with a mains supply for power supply.
Compared with the prior art, the beneficial effects of the utility model are as follows:
according to the device for processing the filter material by the etching solution, when the slag materials at the upper ends of the left filter screen and the right filter screen are washed and cleaned, the plug valve is closed, the injected high-pressure water flow can wash the slag materials at the upper ends of the left filter screen and the right filter screen, the slag materials at the upper ends of the left filter screen and the right filter screen are cleaned, the disassembly and the cleaning are not needed, the use is convenient, the etching solution obtained after the filtration can be poured into the etching box for reuse, and the raw materials are saved; the whole body realizes the filtration of the sediment in the etching solution, the filtered sediment is convenient to process, the filtered etching solution can be reused, and the cost is saved.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic structural view of an etching chamber of the present invention;
FIG. 3 is a schematic structural view of the filter media device of the present invention;
FIG. 4 is a front view of the filter media device of the present invention;
fig. 5 is a sectional view of the filter media device of the present invention.
In the figure: 1. a filter frame; 2. a base; 3. etching the box; 4. a material filter; 41. a left filter funnel; 411. a left screen support frame; 42. a right filter funnel; 421. a right screen support frame; 43. a left feed delivery cylinder; 44. a right delivery cylinder; 45. a cleaning solution delivery tube; 46. a catheter; 47. a liquid discharge pipe; 5. a left support plate; 6. a right support plate; 7. a partition plate; 8. a left etching solution collection barrel; 9. and a right etching solution collecting barrel.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-5, an etching solution processing filter material device comprises a filter frame 1, a base 2, an etching box 3 and a filter material device 4, wherein the filter frame 1 is fixed on the base 2, a left support plate 5 is fixedly welded on one side of the etching box 3, a right support plate 6 is fixedly welded on the other side of the etching box 3, and the left support plate 5 and the right support plate 6 are arranged in parallel; a partition plate 7 is arranged in the etching box 3, the partition plate 7 divides the inside of the etching box 3 into a left etching cavity and a right etching cavity, and filter devices 4 are fixedly arranged on the etching box 3 at the lower ends of the left etching cavity and the right etching cavity; the filter 4 comprises a left filter hopper 41, a right filter hopper 42, a left feed delivery cylinder 43, a right feed delivery cylinder 44, a cleaning liquid conveying pipe 45, a liquid guide pipe 46 and a liquid discharge pipe 47, wherein the lower end of the left filter hopper 41 is fixedly connected with the upper end of the left feed delivery cylinder 43, a left filter screen support frame 411 is additionally arranged inside the left filter hopper 41, and a left filter screen 412 is fixedly arranged on the left filter screen support frame 411; the lower end of the right filter hopper 42 is fixedly connected with the upper end of the right material conveying cylinder 44, a right filter screen support frame 421 is additionally arranged inside the right filter hopper 42, and a right filter screen 422 is fixedly arranged at the upper end of the right filter screen support frame 421; a cleaning liquid conveying pipe 45 is fixedly arranged at the liquid inlet end of the left filter funnel 41, the liquid outlet end of the left filter funnel 41 is connected with the liquid inlet end of the right filter funnel 42 through a liquid guide pipe 46, and a liquid discharge pipe 47 is arranged at the liquid outlet end of the right filter funnel 42; the lower end of the left material conveying cylinder 43 is fixedly provided with a left etching solution collecting barrel 8, and the lower end of the right material conveying cylinder 44 is fixedly provided with a right etching solution collecting barrel 9.
As a further aspect of the present invention: the bottom of the liquid outlet end of the cleaning liquid conveying pipe 45 and the bottom of the liquid inlet end of the liquid guide pipe 46 are flush with the upper end surface of the left filter screen 412, and the bottom of the liquid outlet end of the liquid guide pipe 46 and the bottom of the liquid inlet end of the liquid discharge pipe 47 are flush with the upper end surface of the right filter screen 422.
By adopting the technical scheme: when external cleaning liquid is input, the injected water flow can just flush the slag at the upper ends of the left filter screen 412 and the right filter screen 422, the disassembly for cleaning is not needed, and the use is convenient.
As a further aspect of the present invention: plug valves 10 are respectively arranged at the liquid inlet end of the left filter hopper 41 and the liquid inlet end of the right filter hopper 42.
By adopting the technical scheme: the plug valve 10 is adopted to control the input of the etched liquid, and before the slag on the upper ends of the left filter screen 412 and the right filter screen 422 are flushed and cleaned, the plug valve 10 needs to be closed, so that the waste of resources caused by taking away the etching liquid in the flushing process is avoided.
As a further aspect of the present invention: the left etching solution collecting barrel 8 and the right etching solution collecting barrel 9 are arranged on the base 2 in a placing mode, the liquid inlet end of the left etching solution collecting barrel 8 is over against the right lower end of the left material conveying barrel 43, and the liquid inlet end of the right etching solution collecting barrel 9 is over against the right lower end of the right material conveying barrel 44.
By adopting the technical scheme: the left etching liquid collecting barrel 8 is arranged at the lower end of the left material conveying barrel 43 right relative to the right etching liquid collecting barrel 9 in a placing mode, the right etching liquid collecting barrel 9 is arranged at the lower end of the right material conveying barrel 44 in a placing mode, and used etching liquid can be taken out when used etching liquid is treated.
As a further aspect of the present invention: the cleaning liquid infusion tube 45 is connected with a pressure pump 11, and the pressure pump 11 is externally connected with a mains supply for power supply.
By adopting the technical scheme: the impact force of the input cleaning liquid can be increased by the arranged pressure pump 11, slag at the upper ends of the left filter screen 412 and the right filter screen 422 can be fully washed away, and the cleaning effect is enhanced.
The device for processing the filter material by the etching liquid is characterized in that materials are etched and formed in the etching box 3, a large amount of sediment is generated in the etching process, the aggregation of the sediment influences the etching effect of the materials, so the sediment needs to be filtered, the filter material devices 4 are fixedly arranged on the etching boxes 3 at the lower ends of the left etching cavity and the right etching cavity, whether the etched liquid is input or not is controlled by controlling the plug valves 10, before the slag materials at the upper ends of the left filter screen 412 and the right filter screen 422 are flushed and cleaned, the plug valves 10 need to be closed, the etching liquid is prevented from being taken away in the flushing process, the resource waste is caused, when the slag materials at the upper ends of the left filter screen 412 and the right filter screen 422 are cleaned, high-pressure water flow is input through the pressure pump 11, the injected water flow can flush the slag materials at the upper ends of the left filter screen 412 and the right filter screen 422, the disassembly and cleaning are not needed, the use is convenient, the etching liquid obtained after the filtration exists in the left etching liquid collecting barrel 8 and the right etching liquid collecting barrel 9, the filtered etching solution without sediment can be poured into the etching box 3 for reuse, so that the raw materials are saved.
In summary, the following steps: the device for processing the filter material by the etching solution controls whether to add the liquid with the sediment after the etching into the filter material device 4 by controlling the switch of the plug valve 10, when the slag materials at the upper ends of the left filter screen 412 and the right filter screen 422 are washed and cleaned, the plug valve 10 is closed, high-pressure water flow is input through the pressure pump 11, the injected water flow just can wash the slag materials at the upper ends of the left filter screen 412 and the right filter screen 422, the disassembly and the cleaning are not needed, the use is convenient, the etching solution obtained after the filtering is recycled into the left etching solution collecting barrel 8 and the right etching solution collecting barrel 9, the filtered etching solution without the sediment can be poured into the etching box 3 for reuse, and the raw materials are saved; the whole body realizes the filtration of the sediment in the etching solution, the filtered sediment is convenient to process, the filtered etching solution can be reused, and the cost is saved.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (5)
1. The utility model provides an etching solution processing filter material device, includes filter stand (1), base (2), etching case (3) and strain glassware (4), its characterized in that: the filter frame (1) is fixedly arranged on the base (2), a left support plate (5) is fixedly welded on one side of the etching box (3), a right support plate (6) is fixedly welded on the other side of the etching box (3), and the left support plate (5) and the right support plate (6) are arranged in parallel; a partition plate (7) is arranged in the etching box (3), the partition plate (7) divides the inside of the etching box (3) into a left etching cavity and a right etching cavity, and material filtering devices (4) are fixedly arranged on the etching box (3) at the lower ends of the left etching cavity and the right etching cavity; the filter material device (4) comprises a left filter hopper (41), a right filter hopper (42), a left conveying cylinder (43), a right conveying cylinder (44), a cleaning liquid conveying pipe (45), a liquid guide pipe (46) and a liquid discharge pipe (47), the lower end of the left filter hopper (41) is fixedly connected with the upper end of the left conveying cylinder (43), a left filter screen support frame (411) is additionally arranged inside the left filter hopper (41), and a left filter screen (412) is fixedly arranged on the left filter screen support frame (411); the lower end of the right filter hopper (42) is fixedly connected with the upper end of the right material conveying cylinder (44), a right filter screen support frame (421) is additionally arranged inside the right filter hopper (42), and a right filter screen (422) is fixedly arranged at the upper end of the right filter screen support frame (421); the cleaning liquid infusion tube (45) is fixedly arranged at the liquid inlet end of the left filter funnel (41), the liquid outlet end of the left filter funnel (41) is connected with the liquid inlet end of the right filter funnel (42) through a liquid guide tube (46), and the liquid discharge tube (47) is arranged at the liquid outlet end of the right filter funnel (42); the lower extreme fixed mounting of left defeated feed cylinder (43) has left etching solution collecting vessel (8), and the lower extreme fixed mounting of right defeated feed cylinder (44) has right etching solution collecting vessel (9).
2. The device for processing the etching solution as recited in claim 1, wherein the bottom of the outlet end of the cleaning solution delivery pipe (45) and the bottom of the inlet end of the liquid guide pipe (46) are flush with the upper end surface of the left filter screen (412), and the bottom of the outlet end of the liquid guide pipe (46) and the bottom of the inlet end of the liquid discharge pipe (47) are flush with the upper end surface of the right filter screen (422).
3. The device for processing the filter material of the etching solution as claimed in claim 1, wherein the inlet ends of the left filter hopper (41) and the right filter hopper (42) are both provided with plug valves (10).
4. The device for processing the etching solution as recited in claim 1, wherein the left etching solution collecting barrel (8) and the right etching solution collecting barrel (9) are disposed on the base (2) in a manner of placement, a liquid inlet end of the left etching solution collecting barrel (8) is opposite to a right lower end of the left material conveying barrel (43), and a liquid inlet end of the right etching solution collecting barrel (9) is opposite to a right lower end of the right material conveying barrel (44).
5. The device for processing the filter material by the etching solution as claimed in claim 1, wherein the cleaning solution infusion tube (45) is connected with a pressure pump (11), and the pressure pump (11) is externally connected with a mains supply for supplying power.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120652035.9U CN215195710U (en) | 2021-03-31 | 2021-03-31 | Filter material processing device for etching solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120652035.9U CN215195710U (en) | 2021-03-31 | 2021-03-31 | Filter material processing device for etching solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215195710U true CN215195710U (en) | 2021-12-17 |
Family
ID=79444789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120652035.9U Expired - Fee Related CN215195710U (en) | 2021-03-31 | 2021-03-31 | Filter material processing device for etching solution |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215195710U (en) |
-
2021
- 2021-03-31 CN CN202120652035.9U patent/CN215195710U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20211217 |
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| CF01 | Termination of patent right due to non-payment of annual fee |