CN215036468U - Polishing pad for gallium arsenide polishing process - Google Patents

Abstract

The utility model relates to the technical field of polishing pads and discloses a polishing pad for gallium arsenide polishing process, wherein polypropylene thermoplastic plastic is fixedly arranged on the lower surface of high-density polyethylene, a lower surface skin polishing and grinding layer is arranged on the lower part of the polypropylene thermoplastic plastic, and a non-abrasive polishing layer is tightly attached to the lower surface of the lower surface skin polishing and grinding layer; the middle part of polishing pad body runs through and has seted up the mounting hole, and the equal fixed mounting in both sides of mounting hole has supplementary fixing device. The Kevlar fiber, the carbon fiber layer, the fluorosilicone rubber, the high-density polyethylene and the polypropylene thermoplastic plastic which are designed have high flexibility, so that the polishing pad body can be folded or rolled; the polishing pad is characterized in that an upper surface skin polishing and grinding layer, a white diamond grinding material, a lower surface skin polishing and grinding layer and a non-grinding material polishing layer are additionally arranged, so that both surfaces of the polishing pad body can play a role in polishing; the additional mounting hole and the auxiliary fixing device improve the stability of the device.

Description

Polishing pad for gallium arsenide polishing process

Technical Field

The utility model relates to a polishing pad technical field specifically is a polishing pad for gallium arsenide polishing technology.

Background

The polishing pad is also called polishing leather, polishing cloth, polishing sheet and important auxiliary materials for determining the surface quality in chemical mechanical polishing.

The common polishing pad is generally low in overall flexibility, so that the device is inconvenient to fold and fold, unstable in fixation, incapable of polishing two sides and incapable of meeting the working requirements of the polishing pad, and the polishing pad for the gallium arsenide polishing process is provided.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

The utility model provides a not enough to prior art, the utility model provides a polishing pad for gallium arsenide polishing technology possesses the whole pliability of efficient high, and the device is convenient folding to be packed up, fixed stable, can two sides advantage such as polish, and it is not high to have solved the general whole pliability of current polishing pad, leads to the inconvenient folding of device to be packed up, fixed unstable, can not two sides polish, can not satisfy the problem of polishing pad's operational requirement.

(II) technical scheme

For realizing above-mentioned whole pliability height, the device is convenient folding pack up, fixed stable, can two sides the purpose of polishing, the utility model provides a following technical scheme: a polishing pad for a gallium arsenide polishing process comprises a polishing pad body, Kevlar fibers are arranged in the middle of the inside of the polishing pad body, a carbon fiber layer is attached to the upper surface of each Kevlar fiber, fluorosilicone rubber is attached to the upper portion of each carbon fiber layer in a clinging mode, an upper surface skin polishing and grinding layer is attached to the upper surface of the fluorosilicone rubber, a white diamond abrasive is fixedly mounted on the upper portion of the upper surface skin polishing and grinding layer, high-density polyethylene is attached to the lower portion of each Kevlar fiber, polypropylene thermoplastic plastic is fixedly mounted on the lower surface of the high-density polyethylene, a lower surface skin polishing and grinding layer is mounted on the lower portion of the polypropylene thermoplastic plastic in a clinging mode, and a non-abrasive polishing layer is mounted on the lower surface of the lower skin polishing and grinding layer in a clinging mode;

the mounting hole has been run through at the middle part of polishing pad body, and the equal fixed mounting in both sides of mounting hole has supplementary fixing device, and supplementary fixing device all installs in the inside of polishing pad body, and supplementary fixing device's left side is the fixed slot, and the spring has all been installed to the inside of fixed slot, the equal fixedly connected with dead lever of the other end of spring.

Preferably, the Kevlar fiber, the carbon fiber layer, the fluorosilicone rubber, the upper surface skin polishing and grinding layer, the high-density polyethylene, the polypropylene thermoplastic plastic, the lower surface skin polishing and grinding layer and the non-abrasive polishing layer are all connected through colloid composite bonding.

Preferably, all be fixed with the shelves along from top to bottom on the dead lever left side, the equal fixed mounting in exit of fixed slot has spacing fender head, and shelves along the position, the size looks adaptation with spacing fender head.

Preferably, the top of each fixed rod is fixed with a fixed plug.

Preferably, the fixing rod penetrates through the inner wall of the polishing pad body and extends into the mounting hole.

(III) advantageous effects

Compared with the prior art, the utility model provides a polishing pad for gallium arsenide polishing technology possesses following beneficial effect:

1. according to the polishing pad for the gallium arsenide polishing process, the Kevlar fiber, the carbon fiber layer, the fluorosilicone rubber, the high-density polyethylene and the polypropylene thermoplastic plastic which are designed have high flexibility, so that the polishing pad body can be folded or rolled, the Kevlar fiber has high rigidity, and the polishing pad body can be supported, so that the polishing pad body cannot be bent during working;

2. the polishing pad for the gallium arsenide polishing process is additionally provided with the upper surface skin polishing and grinding layer, the white diamond grinding material, the lower surface skin polishing and grinding layer and the non-grinding material polishing layer, so that two sides of a polishing pad body can be polished, the upper surface skin polishing and grinding layer and the white diamond grinding material can polish gallium arsenide with rough surfaces, the lower surface skin polishing and grinding layer and the non-grinding material polishing layer can further polish the gallium arsenide, and the surface of the gallium arsenide can be polished to be smoother;

3. this a polishing pad for gallium arsenide polishing technology adds the mounting hole and the auxiliary fixture that establish for the polishing pad body can be by firm fixed, has improved the stability of device.

Drawings

FIG. 1 is a schematic view of the internal structure of the present invention;

FIG. 2 is a schematic top view of the present invention;

fig. 3 is an enlarged schematic view of the a position of the present invention.

In the figure: 1. a polishing pad body; 11. kevlar fibers; 12. a carbon fiber layer; 13. a fluorosilicone rubber; 14. polishing and grinding the upper surface skin; 15. a white diamond abrasive; 16. high density polyethylene; 17. a polypropylene thermoplastic; 18. polishing and grinding the lower surface skin; 19. an abrasive-free polishing layer; 2. mounting holes; 21. an auxiliary fixing device; 22. fixing grooves; 23. a spring; 24. fixing the rod; 25. a guard edge; 26. a limiting stop head; 27. and fixing the plug.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides a polishing pad for gallium arsenide polishing process, comprising a polishing pad body 1, kevlar fibers 11, a carbon fiber layer 12, fluorosilicone rubber 13, an upper surface polishing layer 14, a white diamond abrasive 15, high density polyethylene 16, polypropylene thermoplastic 17, a lower surface polishing layer 18, a non-abrasive polishing layer 19, a mounting hole 2, an auxiliary fixing device 21, a fixing groove 22, a spring 23, a fixing rod 24, a retaining edge 25, a spacing retaining head 26 and a fixing plug 27, wherein the middle position inside the polishing pad body 1 is kevlar fibers 11, the kevlar fibers 11 have high density, high strength, high temperature resistance and strength 5 times that of steel, and can support the polishing pad body 1, the carbon fiber layer 12 is attached to the upper surface of the kevlar fibers 11, the carbon fiber layer 12 has high toughness, the upper portion of the carbon fiber layer 12 is attached to the fluorosilicone rubber 13, the fluorosilicone rubber 13 is high-temperature resistant, high in strength and high in toughness, an upper surface leather polishing layer 14 is arranged on the upper surface of the fluorosilicone rubber 13, a white diamond grinding material 15 is fixedly arranged on the upper portion of the upper surface leather polishing layer 14, the upper surface leather polishing layer 14 and the white diamond grinding material 15 are used for roughly polishing gallium arsenide, high-density polyethylene 16 is attached and arranged on the lower portion of the Kevlar fiber 11, the high-density polyethylene 16 is good in heat resistance and high in rigidity and toughness, polypropylene thermoplastic 17 is fixedly arranged on the lower surface of the high-density polyethylene 16, the polypropylene thermoplastic 17 is high in impact resistance and toughness, a lower surface leather polishing layer 18 is arranged on the lower portion of the polypropylene thermoplastic 17, a non-abrasive polishing layer 19 is attached and arranged on the lower surface of the lower surface leather polishing layer 18, the lower surface leather polishing layer 18 and the non-abrasive polishing layer 19 are used for finely polishing gallium arsenide, and the Kevlar fiber 11 is, The carbon fiber layer 12, the fluorosilicone rubber 13, the upper surface skin polishing and grinding layer 14, the high-density polyethylene 16, the polypropylene thermoplastic plastic 17, the lower surface skin polishing and grinding layer 18 and the non-abrasive polishing layer 19 are all connected through colloid composite bonding; the middle part of the polishing pad body 1 is provided with a mounting hole 2 in a penetrating way, the mounting hole 2 is used for fixedly mounting the polishing pad body 1, two sides of the mounting hole 2 are both fixedly provided with auxiliary fixing devices 21, the auxiliary fixing devices 21 are both mounted inside the polishing pad body 1, the auxiliary fixing devices 21 are used for fixing the polishing pad body 1, the left side of the auxiliary fixing devices 21 fixed by the auxiliary mounting hole 2 is provided with a fixing groove 22, the inside of the fixing groove 22 is provided with a spring 23, the spring 23 can extrude the fixing rod 24, the other end of the spring 23 is fixedly connected with a fixing rod 24, the upper part and the lower part of the left side of the fixing rod 24 are both fixed with a baffle edge 25, the outlet of the fixing groove 22 is both fixedly provided with a limit baffle 26, the baffle edge 25 is matched with the position and the size of the limit baffle 26, the baffle edge 25 and the limit baffle 26 prevent the fixing rod 24 from being popped out by the spring 23, the top of the fixing rod 24 is both fixed with a fixing plug 27, the fixing plugs 27 are used for improving the fixing performance of the fixing rods 24, and the fixing rods 24 penetrate through the inner wall of the polishing pad body 1 and extend into the mounting holes 2.

The working principle of the device is as follows: the Kevlar fiber 11 has high density, high strength, high temperature resistance, strength 5 times of steel, can support the polishing pad body 1, the carbon fiber layer 12 has higher toughness, the fluorosilicone rubber 13 has high temperature resistance, high strength and high toughness, the high-density polyethylene 16 has good heat resistance, high rigidity and toughness, the polypropylene thermoplastic plastic 17 has high impact resistance and high toughness, so that the polishing pad body 1 can be folded or rolled, the Kevlar fiber 11 has higher rigidity, can support the polishing pad body 1, so that the polishing pad body 1 cannot be bent during working, the upper surface polishing grinding layer 14 and the white diamond grinding material 15 can grind the gallium arsenide with rough surfaces, the lower surface polishing grinding layer 18 and the non-grinding material layer 19 can further grind the gallium arsenide, so that the surface of the gallium arsenide can be ground more smoothly, mounting holes and auxiliary fixing devices, the polishing pad body can be firmly fixed, and the stability of the device is improved.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (5)

1. A polishing pad for gallium arsenide polishing process, comprising a polishing pad body (1), characterized in that: the polishing pad comprises a polishing pad body (1) and is characterized in that Kevlar fibers (11) are arranged in the middle of the inside of the polishing pad body (1), a carbon fiber layer (12) is attached to the upper surface of the Kevlar fibers (11), fluorosilicone rubber (13) is attached to the upper portion of the carbon fiber layer (12) in a clinging manner, an upper leather polishing layer (14) is attached to the upper surface of the fluorosilicone rubber (13), a white diamond abrasive (15) is fixedly mounted on the upper portion of the upper leather polishing layer (14), high-density polyethylene (16) is attached to the lower portion of the Kevlar fibers (11), polypropylene thermoplastic (17) is fixedly mounted on the lower surface of the high-density polyethylene (16), a lower leather polishing layer (18) is mounted on the lower portion of the polypropylene thermoplastic (17), and a non-abrasive polishing layer (19) is attached to the lower surface of the lower leather polishing layer (18);

the middle part of polishing pad body (1) runs through and has seted up mounting hole (2), the equal fixed mounting in both sides of mounting hole (2) has supplementary fixing device (21), and supplementary fixing device (21) are all installed in the inside of polishing pad body (1), and the left side of supplementary fixing device (21) is fixed slot (22), and spring (23) have all been installed to the inside of fixed slot (22), the equal fixedly connected with dead lever (24) of the other end of spring (23).

2. The polishing pad for use in a gallium arsenide polishing process as recited in claim 1, wherein: the Kevlar fiber (11), the carbon fiber layer (12), the fluorosilicone rubber (13), the upper surface skin polishing layer (14), the high-density polyethylene (16), the polypropylene thermoplastic plastic (17), the lower surface skin polishing layer (18) and the non-abrasive polishing layer (19) are all connected in a bonding mode through colloid compounding.

3. The polishing pad for use in a gallium arsenide polishing process as recited in claim 1, wherein: all be fixed with shelves along (25) about dead lever (24) left side, the equal fixed mounting in exit of fixed slot (22) has spacing stop (26), and shelves along (25) and the position, the size looks adaptation of spacing stop (26).

4. The polishing pad for use in a gallium arsenide polishing process as recited in claim 1, wherein: and fixed plugs (27) are fixed at the tops of the fixed rods (24).

5. The polishing pad for use in a gallium arsenide polishing process as recited in claim 1, wherein: the fixing rod (24) penetrates through the inner wall of the polishing pad body (1) and extends into the mounting hole (2).

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