CN214608782U

CN214608782U - Chemical liquid scheduling device for photoresist PR of semiconductor wafer in laboratory

Info

Publication number: CN214608782U
Application number: CN202120807063.3U
Authority: CN
Inventors: 张玉翻
Original assignee: Wuxi Deyixin Technology Co ltd
Current assignee: Wuxi Deyixin Technology Co ltd
Priority date: 2021-04-19
Filing date: 2021-04-19
Publication date: 2021-11-05
Anticipated expiration: 2031-04-19

Abstract

The utility model discloses a laboratory semiconductor wafer photoresist PR chemical liquid scheduling device, which comprises a cabinet body, wherein a plurality of supporting nets are vertically arranged in the cabinet body, the supporting nets are parallel to each other, grids on the supporting nets are rhombic grids, the rhombic grids of the supporting nets correspond to each other to form an object placing channel, and the object placing channel is inclined downwards from one side close to a cabinet door to one side far away from the cabinet door; a rhombic elastic protection cylinder is inserted into the object placing channel, and the bottle-shaped container filled with photoresist is correspondingly arranged in the elastic protection cylinder. The supporting net is a metal wire net, a plurality of rotating wheels are rotatably arranged on the metal wire of the supporting net, the outer wheel surface of each rotating wheel is an elastic rubber layer, and the outer cylinder wall of each elastic protection cylinder and the outer wheel surface of each rotating wheel are mutually contacted and pressed. The utility model discloses conveniently access the photoresist, and have good shock-absorbing capacity, can prevent that the photoresist collision from revealing.

Description

Chemical liquid scheduling device for photoresist PR of semiconductor wafer in laboratory

Technical Field

The utility model relates to a storage device technical field especially relates to laboratory semiconductor wafer photoresist PR chemical liquid scheduling device.

Background

Photoresist (PR for short) is also called Photoresist and is mainly applied to relevant processes of the Photoresist. The photoresist needs a proper storage device in the using process so as to be convenient for the scheduling of the photoresist and avoid the sliding, collision or leakage of a container for storing the photoresist, so that the device for scheduling the chemical liquid of the photoresist PR of the semiconductor wafer in the laboratory is provided.

Disclosure of Invention

The purpose of the invention is as follows: in order to overcome the not enough of existence among the prior art, the utility model provides a laboratory semiconductor wafer photoresist PR chemical liquid scheduling device conveniently accesses the photoresist, and has good shock-absorbing capacity, can prevent that the photoresist collision from revealing.

The technical scheme is as follows: in order to achieve the purpose, the utility model discloses a laboratory semiconductor wafer photoresist PR chemical liquid scheduling device, including the cabinet body, vertically in the cabinet body be provided with a plurality of supporting nets, a plurality of the supporting nets are parallel to each other, the net on the supporting net is the rhombus net, the rhombus net of a plurality of the supporting nets corresponds each other and forms the thing passageway of putting, the thing passageway of putting inclines downwards from one side near the cabinet door to one side far away from the cabinet door; a rhombic elastic protection cylinder is inserted into the object placing channel, and the bottle-shaped container filled with photoresist is correspondingly arranged in the elastic protection cylinder.

Furthermore, the supporting net is a metal wire net, a plurality of rotating wheels are rotatably arranged on the metal wire of the supporting net, the outer wheel surface of each rotating wheel is an elastic rubber layer, and the outer cylinder wall of the elastic protection cylinder and the outer wheel surface of each rotating wheel are in mutual contact pressure.

Further, be provided with the elastic cushion layer on the internal and one side inner wall that the cabinet door is relative of cabinet, an elasticity protection section of thick bamboo orientation the one end of elastic cushion layer is the blind end, just the blind end of an elasticity protection section of thick bamboo with the elastic cushion layer touches mutually and presses.

Further, the cabinet body is separated into storage chamber on upper portion and the cavity is placed to the empty bottle of lower part through the baffle, the supporting network corresponds the setting and is in store the intracavity, the below that the cavity was placed to the empty bottle is provided with the tray of placing the empty bottle.

Further, the vertical fretwork setting of baffle, one side of the cabinet body is provided with the negative pressure air pump, the negative pressure air pump pass through the exhaust tube with the inside intercommunication of the cabinet body.

Further, the cabinet door with cabinet body sealing connection, be provided with transparent observation window on the cabinet door.

Has the advantages that: the utility model discloses a laboratory semiconductor wafer photoresist PR chemical liquid scheduling device, its beneficial effect is as follows:

1) a plurality of support nets are arranged in parallel in the cabinet body, and rhombic grids on the support nets correspond to each other to form an object placing channel; the bottle-shaped containers filled with the photoresist can be prevented from colliding with each other by dividing the bottle-shaped containers into a plurality of object placing channels, the bottle-shaped containers filled with the photoresist can be prevented from sliding down by obliquely arranging the object placing channels, and the operation of storing and taking the photoresist is convenient;

2) the supporting net itself has the buffering effect, is provided with an elasticity protection section of thick bamboo in putting the thing passageway, and rotation wheel and elasticity protection section of thick bamboo on the supporting net touch each other and press, and a plurality of shock-absorbing structure mutually support, and the buffering shock attenuation is effectual, prevents to be equipped with the bottle type container of photoresist impaired because of outside striking.

Drawings

FIG. 1 is a schematic exterior structure view of a cabinet;

FIG. 2 is a schematic view of the internal structure of the cabinet;

FIG. 3 is a schematic view of an elastic cushion layer and an obliquely arranged elastic protection cylinder;

FIG. 4 is a schematic view of the rotating wheels on the support net;

fig. 5 is a schematic view of the closed end of the resilient cartridge.

Detailed Description

The present invention will be further described with reference to the accompanying drawings.

The laboratory semiconductor wafer photoresist PR chemical liquid scheduling device of attached drawings 1 to 5, including the cabinet body 1, the vertical a plurality of supporting networks 6 that are provided with in the cabinet body 1, the edge and the cabinet body 1 inner wall fixed connection of supporting network 6, a plurality of supporting network 6 is parallel to each other, net on the supporting network 6 is rhombus net 14, as shown in attached drawing 4, a plurality of rhombus net 14 of supporting network 6 corresponds each other and forms and puts thing passageway 15, it inclines downwards to the one side of keeping away from cabinet door 4 from the one side that is close to cabinet door 4 to put thing passageway 15 for the bottle type container 11 that is equipped with the photoresist is difficult for the landing in putting thing passageway 15. The elastic protective cylinder 16 with the diamond shape is inserted into the object placing channel 15, the outline of the outer wall of the elastic protective cylinder 16 corresponds to the object placing channel 15, the bottle-shaped container 11 filled with the photoresist is correspondingly arranged in the elastic protective cylinder 16, the outline of the inner wall of the elastic protective cylinder 16 is also of the diamond shape, the supporting effect is good, and the bottle-shaped container 11 filled with the photoresist is not easy to shake left and right in the elastic protective cylinder 16. The elastic protection tube 16 is made of a plastic material having a certain elastic buffering performance.

As shown in fig. 4, the supporting net 6 is a wire net, a plurality of rotating wheels 13 are rotatably disposed on the wires of the supporting net 6, an outer wheel surface of each rotating wheel 13 is an elastic rubber layer, and an outer cylinder wall of the elastic protective cylinder 16 and the outer wheel surface of each rotating wheel 13 are in contact with each other, so that a damping effect is improved.

As shown in fig. 3 and 5, an elastic cushion 12 is disposed on an inner wall of the cabinet body 1 opposite to the cabinet door 4, one end of the elastic protection cylinder 16 facing the elastic cushion 12 is a closed end, and the bottom of the bottle-shaped container 11 filled with photoresist is abutted against the inner wall of the closed end of the elastic cushion 12. The outer wall of the closed end of the elastic protection cylinder 16 is in mutual contact with the elastic cushion layer 12, and the shock absorption effect is improved.

The cabinet body 1 is separated into storage chamber 7 on upper portion and the empty bottle of lower part through the baffle and is placed chamber 8, the supporting network 6 corresponds the setting and is in store the intracavity 7, empty bottle places the below setting in chamber 8 and places tray 9 of empty bottle 10, and photoresist itself has the toxicity, can place the empty bottle 10 container of exhausting the photoresist in the tray 9, convenient management.

The vertical fretwork setting of baffle makes storage chamber 7 and empty bottle place the chamber 8 and communicates each other, one side of the cabinet body 1 is provided with negative pressure air pump 2, negative pressure air pump 2 through exhaust tube 3 with the inside intercommunication of the cabinet body 1 takes out the internal portion of cabinet to the negative pressure state, prevents that the photoresist from taking place to reveal.

The cabinet door 4 with the cabinet body 1 sealing connection, be provided with transparent observation window 5 on the cabinet door 4, conveniently observe the internal state of the cabinet body 1.

The above description is only a preferred embodiment of the present invention, and it should be noted that: for those skilled in the art, without departing from the principle of the present invention, several improvements and modifications can be made, and these improvements and modifications should also be considered as the protection scope of the present invention.

Claims

1. Laboratory semiconductor wafer photoresist PR chemical liquid scheduling device which characterized in that: the cabinet comprises a cabinet body (1), wherein a plurality of supporting nets (6) are vertically arranged in the cabinet body (1), the supporting nets (6) are parallel to each other, grids on the supporting nets (6) are rhombic grids (14), the rhombic grids (14) of the supporting nets (6) correspond to each other to form an object placing channel (15), and the object placing channel (15) is inclined downwards from one side close to a cabinet door (4) to one side far away from the cabinet door (4); a rhombic elastic protective cylinder (16) is inserted into the article placing channel (15), and the bottle-shaped container (11) filled with the photoresist is correspondingly arranged in the elastic protective cylinder (16).

2. The laboratory semiconductor wafer photoresist PR chemical liquid scheduling apparatus of claim 1, wherein: the supporting net (6) is a metal wire net, a plurality of rotating wheels (13) are arranged on the metal wire of the supporting net (6) in a rotating mode, the outer wheel surface of each rotating wheel (13) is an elastic rubber layer, and the outer cylinder wall of each elastic protection cylinder (16) and the outer wheel surface of each rotating wheel (13) are in mutual contact pressing.

3. The laboratory semiconductor wafer photoresist PR chemical liquid scheduling apparatus of claim 2, wherein: the cabinet is characterized in that an elastic cushion layer (12) is arranged on the inner wall of one side, opposite to the cabinet door (4), of the cabinet body (1), the elastic protection cylinder (16) faces towards one end of the elastic cushion layer (12) and is a closed end, and the closed end of the elastic protection cylinder (16) and the elastic cushion layer (12) are mutually pressed.

4. The laboratory semiconductor wafer photoresist PR chemical liquid scheduling device of claim 3, characterized in that: the cabinet body (1) is separated into storage chamber (7) on upper portion and empty bottle of lower part through the baffle and is placed chamber (8), supporting network (6) correspond the setting and are in store chamber (7) in, the below that empty bottle placed chamber (8) is provided with tray (9) of placing empty bottle (10).

5. The laboratory semiconductor wafer photoresist PR chemical liquid scheduling device of claim 4, characterized in that: the cabinet is characterized in that the partition plates are arranged in a vertical hollow mode, a negative pressure air pump (2) is arranged on one side of the cabinet body (1), and the negative pressure air pump (2) is communicated with the inside of the cabinet body (1) through an exhaust tube (3).

6. The laboratory semiconductor wafer photoresist PR chemical liquid scheduling device of claim 5, characterized in that: the cabinet door (4) is connected with the cabinet body (1) in a sealing mode, and a transparent observation window (5) is arranged on the cabinet door (4).