CN213023934U - Soft drying device of photoresist - Google Patents
Soft drying device of photoresist Download PDFInfo
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- CN213023934U CN213023934U CN202022439578.0U CN202022439578U CN213023934U CN 213023934 U CN213023934 U CN 213023934U CN 202022439578 U CN202022439578 U CN 202022439578U CN 213023934 U CN213023934 U CN 213023934U
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Abstract
The utility model discloses a soft drying device of photoresist relates to lithography apparatus technical field, has solved present rubber coating wafer when drying in the oven, and the rubber coating wafer is heated inhomogeneously, causes to dry incompletely for the adhesion degree at film and the bottom of the pad is not enough, and when partial wafer hot plate direct contact heating, very easily causes the wafer to burst, causes the beneath problem of yield, and its technical scheme main points are: the oven comprises an oven main body with an opening, wherein two box covers capable of sealing the opening of the oven main body are symmetrically arranged at two ends of the opening of the oven main body; the top end of the heat insulation layer is abutted against the end parts of the two box covers when the two box covers are closed; the inner wall of the bottom end of the oven and the lower end surfaces of the two box covers are respectively provided with a heater and a cooler which are positioned in the drying bin and the cooling bin; a turntable which is rotatably connected with the heat insulation layer is horizontally arranged in the oven main body; the effect of improving the yield of the product is achieved.
Description
Technical Field
The utility model relates to a lithography apparatus technical field, more specifically say, it relates to a soft drying device of photoresist.
Background
The photoresist is one of the key materials for processing fine patterns in the microelectronic technology, and particularly the development of large-scale and super-large-scale integrated circuits in recent years greatly promotes the research, development and application of the photoresist; in wafer processing, a photolithography process is crucial, and a general procedure is that a wafer is pretreated, then spin-coated, then exposed, developed, and finally removed, but soft drying of a photoresist is generally performed before exposure and development, because after spin-coating, the liquid photoresist contains 10% -30% of a solvent, which easily contaminates dust, and therefore needs to be dried at a high temperature to volatilize the solvent, and simultaneously, thin film stress caused by spin-coating is eliminated, and adhesion of the photoresist on a substrate is improved.
At present, most of wafers after being coated with glue are placed in a high-temperature oven for drying, but the drying of the wafers is greatly influenced by the drying temperature, time and the temperature rise and fall processes, the drying mode of the oven is heating from the upper part, the upper layer of a glue coating film is solidified in advance, the solvent of the inner layer is not volatilized, the drying is incomplete, and the adhesion degree of the film and a pad bottom is insufficient, so that the drying mode of placing the wafers on a hot plate for heating is realized, the wafers are heated from the bottom, and the film is solidified from the bottom, so that the drying effect is ensured.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a soft drying device of photoresist to make the rubber coating wafer be heated evenly, avoid the wafer to burst, reach the effect that improves the product yield.
The above technical purpose of the present invention can be achieved by the following technical solutions: the oven comprises an oven main body with an opening, wherein two box covers capable of sealing the opening of the oven main body are symmetrically arranged at two ends of the opening of the oven main body; the interior of the oven main body is provided with a heat insulation layer, and the interior of the oven main body is divided into a drying bin and a cooling bin through the heat insulation layer; the heat insulation layer is vertical to the bottom end of the oven main body, and the top end of the heat insulation layer is abutted against the end parts of the oven covers when the two oven covers are closed; the inner wall of the bottom end of the oven and the lower end surfaces of the two box covers are respectively provided with a heater and a cooler which are positioned in the drying bin and the cooling bin; and a turntable which is rotatably connected with the heat insulation layer is horizontally arranged in the oven main body.
By adopting the technical scheme, when the device is used, the glued wafer to be dried is placed on the rotary disc in the drying bin, after the box cover is closed, the heater starts to work, the inside of the drying bin can be heated, so that the glued wafer is dried, and in the drying process, the heater is arranged at the bottom end and the top end in the drying bin, so that the upper end surface and the lower end surface of the glued wafer are heated simultaneously, the glued wafer is heated uniformly, the upper layer of the glued film is prevented from being solidified in advance, the solvent of the inner layer is not volatilized, the drying is incomplete, the adhesion degree of the film and the bottom pad is insufficient, meanwhile, the rotary disc is made of heat insulation materials, the phenomenon that part of the glued wafer bursts is avoided, and the yield is low is avoided; simultaneously, after the drying is accomplished, rotatable carousel, the rubber coating wafer after the drying rotates to the cooling bin immediately, carries out cooling treatment to it to make the rubber coating wafer can rapid cooling, improved the practicality of yield and integrated device.
The utility model discloses further set up to: the carousel runs through to be provided with a plurality of standing grooves.
Through adopting above-mentioned technical scheme to the placing of rubber coating wafer is convenient for the two-sided of rubber coating wafer to be heated simultaneously.
The utility model discloses further set up to: the inner walls of the plurality of placing grooves all protrude outwards to form a boss located in the middle of the placing groove.
Through adopting above-mentioned technical scheme to place the rubber coating wafer on the boss in the standing groove, prevent that the rubber coating wafer from dropping, also be convenient for the rotation of carousel.
The utility model discloses further set up to: the middle part of the heat insulation layer is provided with an interlayer, the upper half part and the lower half part of the interlayer are both provided with rotating shafts fixedly connected with the rotating disc, and the rotating shaft of the lower half part of the interlayer is rotatably connected with the bottom end of the oven main body; and a rotating handle is arranged at the end part of the rotating shaft of the upper half part of the interlayer after penetrating through the interlayer.
By adopting the technical scheme, the interlayer can improve the heat insulation effect of the heat insulation layer and improve the heating and cooling effects; the rotating handle is rotated to directly drive the rotating disc to rotate, and convenience is improved.
The utility model discloses further set up to: the inner wall of the drying bin is provided with a plurality of vent holes communicated with the outside in a penetrating manner.
By adopting the technical scheme, the hot steam generated in the heating process is discharged.
To sum up, the utility model discloses following beneficial effect has: when the device is used, a gummed wafer needing drying is placed on a rotary table in a drying bin, after a box cover is closed, a heater starts to work, the interior of the drying bin can be heated, so that the gummed wafer is dried, in the drying process, the heater is arranged at the bottom end and the top end in the drying bin, so that the upper end surface and the lower end surface of the gummed wafer are heated simultaneously, the gummed wafer is heated uniformly, the upper layer of a gummed film is prevented from being solidified in advance, a solvent in the inner layer is not volatilized, the drying is not thorough, the adhesion degree of the film and the bottom of a cushion is insufficient, and meanwhile, the rotary table is made of a heat insulating material, so that the cracking of part of the gummed wafer is avoided; meanwhile, after the drying is finished, the turntable can be rotated, the dried rubber-coated wafer immediately rotates to the cooling bin, and the temperature of the rubber-coated wafer is cooled, so that the rubber-coated wafer can be rapidly cooled, and the yield and the practicability of the whole device are improved; the interlayer can improve the heat insulation effect of the heat insulation layer and improve the heating and cooling effects; the rotating handle is rotated to directly drive the rotating disc to rotate, and convenience is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
Fig. 1 is a schematic structural diagram of the whole in the embodiment of the present invention;
fig. 2 is an overall sectional view in the embodiment of the present invention.
In the figure: 11. a main body of the oven; 12. a box cover; 13. a thermal insulation layer; 14. a drying bin; 15. a cooling bin; 16. a heater; 17. a cooler; 18. a turntable; 19. a placement groove; 21. a boss; 22. an interlayer; 23. a rotating shaft; 24. and (4) a vent hole.
Detailed Description
In order to make the technical problem, technical solution and advantageous effects to be solved by the present invention more clearly understood, the following description is given in conjunction with the accompanying drawings and embodiments to illustrate the present invention in further detail.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly or indirectly connected to the other element.
It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.
Example (b): a soft drying device for photoresist comprises an oven main body 11 with an opening, as shown in fig. 1 and 2, two box covers 12 capable of sealing the opening of the oven main body 11 are symmetrically arranged at two ends of the opening of the oven main body 11; a heat insulation layer 13 is arranged inside the oven main body 11, and the inside of the oven main body 11 is divided into a drying bin 14 and a cooling bin 15 through the heat insulation layer 13; the heat insulation layer 13 is vertical to the bottom end of the oven main body 11, and the top end of the heat insulation layer 13 is abutted against the end parts of the two oven covers 12 when the two oven covers 12 are closed; the inner wall of the bottom end of the oven and the lower end surfaces of the two box covers 12 are respectively provided with a heater 16 and a cooler 17 which are positioned in the drying bin 14 and the cooling bin 15; a turntable 18 which is rotatably connected with the heat insulating layer 13 is horizontally arranged in the oven body 11. In this embodiment, the thermal insulation layer 13 is made of foam, which is low in cost and has good thermal insulation effect. When the device is used, a glued wafer needing to be dried is placed on a rotary table 18 in a drying bin 14, after a box cover 12 is closed, a heater 16 starts to work, the inside of the drying bin 14 can be heated, so that the glued wafer is dried, in the drying process, the heater 16 is arranged at the bottom end and the top end in the drying bin 14, so that the upper end surface and the lower end surface of the glued wafer are heated simultaneously, the glued wafer is heated uniformly, the upper layer of a glued film is prevented from being solidified in advance, a solvent in the inner layer is not volatilized, the drying is incomplete, the adhesion degree of the film and a cushion bottom is insufficient, meanwhile, the rotary table 18 is made of a heat insulating material, the phenomenon that part of the glued wafer bursts is avoided, and the yield is low; meanwhile, after the drying is finished, the turntable 18 can be rotated, and the dried rubber-coated wafer is immediately rotated to the cooling bin 15 to be cooled, so that the rubber-coated wafer can be rapidly cooled, and the yield and the practicability of the whole device are improved.
As shown in fig. 1 and 2, the turntable 18 is provided with a plurality of placement grooves 19. So as to facilitate the placement of the glued wafer and to facilitate the heating of both sides of the glued wafer.
As shown in fig. 1 and 2, the inner walls of the placement grooves 19 each protrude outward to form a boss 21 in the middle of the placement groove 19. So that the glued wafers are placed on the bosses 21 in the placing grooves 19, preventing the glued wafers from falling off, and also facilitating the rotation of the turntable 18.
As shown in fig. 2, the middle part of the heat insulating layer 13 is provided with an interlayer 22, the upper half part and the lower half part of the interlayer 22 are both provided with a rotating shaft 23 fixedly connected with the turntable 18, and the rotating shaft 23 at the lower half part of the interlayer 22 is rotatably connected with the bottom end of the oven main body 11; the rotating shaft 23 of the upper half part of the interlayer 22 is provided with a rotating handle at the end part after passing through the interlayer 22. The interlayer 22 can improve the heat insulation effect of the heat insulation layer 13 and improve the heating and cooling effects; the rotating handle is rotated to directly drive the rotating disc 18 to rotate, and convenience is improved.
As shown in fig. 2, a plurality of vent holes 24 communicated with the outside are formed through the inner wall of the drying compartment 14. So as to discharge the hot steam generated during the heating process.
The working principle is as follows: when the device is used, a glued wafer needing to be dried is placed on a rotary table 18 in a drying bin 14, after a box cover 12 is closed, a heater 16 starts to work, the inside of the drying bin 14 can be heated, so that the glued wafer is dried, in the drying process, the heater 16 is arranged at the bottom end and the top end in the drying bin 14, so that the upper end surface and the lower end surface of the glued wafer are heated simultaneously, the glued wafer is heated uniformly, the upper layer of a glued film is prevented from being solidified in advance, a solvent in the inner layer is not volatilized, the drying is incomplete, the adhesion degree of the film and a cushion bottom is insufficient, meanwhile, the rotary table 18 is made of a heat insulating material, the phenomenon that part of the glued wafer bursts is avoided, and the yield is low; meanwhile, after the drying is finished, the turntable 18 can be rotated, and the dried rubber-coated wafer is immediately rotated to the cooling bin 15 to be cooled, so that the rubber-coated wafer can be rapidly cooled, and the yield and the practicability of the whole device are improved.
The present embodiment is only for explaining the present invention, and it is not limited to the present invention, and those skilled in the art can make modifications to the present embodiment without inventive contribution as required after reading the present specification, but all of them are protected by patent laws within the scope of the claims of the present invention.
Claims (5)
1. The utility model provides a soft drying device of photoresist, characterized by: the oven comprises an oven main body (11) with an opening, wherein two box covers (12) capable of sealing the opening of the oven main body (11) are symmetrically arranged at two ends of the opening of the oven main body (11); a heat insulation layer (13) is arranged inside the oven main body (11), and the inside of the oven main body (11) is divided into a drying bin (14) and a cooling bin (15) through the heat insulation layer (13); the heat insulation layer (13) is vertical to the bottom end of the oven main body (11), and the top end of the heat insulation layer (13) is abutted against the end parts of the oven covers (12) when the two oven covers (12) are closed; the inner wall of the bottom end of the oven and the lower end surfaces of the two box covers (12) are respectively provided with a heater (16) and a cooler (17) which are positioned in the drying bin (14) and the cooling bin (15); and a rotary disc (18) which is rotatably connected with the heat insulation layer (13) is horizontally arranged in the oven main body (11).
2. The soft photoresist drying device of claim 1, wherein: the rotary disc (18) is provided with a plurality of placing grooves (19) in a penetrating manner.
3. The soft photoresist drying device of claim 2, wherein: the inner walls of the plurality of placing grooves (19) are all outwards protruded to form bosses (21) positioned in the middle of the placing grooves (19).
4. The soft photoresist drying device of claim 3, wherein: an interlayer (22) is arranged in the middle of the heat insulation layer (13), the upper half part and the lower half part of the interlayer (22) are both provided with a rotating shaft (23) fixedly connected with the turntable (18), and the rotating shaft (23) on the lower half part of the interlayer (22) is rotatably connected with the bottom end of the oven main body (11); the rotating shaft (23) at the upper half part of the interlayer (22) penetrates through the interlayer (22) and the end part of the interlayer is provided with a rotating handle.
5. The photoresist soft drying device according to claim 4, which is characterized in that: the inner wall of the drying bin (14) is provided with a plurality of vent holes (24) communicated with the outside in a penetrating way.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022439578.0U CN213023934U (en) | 2020-10-28 | 2020-10-28 | Soft drying device of photoresist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022439578.0U CN213023934U (en) | 2020-10-28 | 2020-10-28 | Soft drying device of photoresist |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213023934U true CN213023934U (en) | 2021-04-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022439578.0U Active CN213023934U (en) | 2020-10-28 | 2020-10-28 | Soft drying device of photoresist |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213023934U (en) |
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2020
- 2020-10-28 CN CN202022439578.0U patent/CN213023934U/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Suzhou Heyu Finance Leasing Co.,Ltd. Assignor: Suzhou lishuo Technology Co.,Ltd. Contract record no.: X2022320010030 Denomination of utility model: A soft drying device for photoresist Granted publication date: 20210420 License type: Exclusive License Record date: 20221209 |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A soft drying device for photoresist Effective date of registration: 20221210 Granted publication date: 20210420 Pledgee: Suzhou Heyu Finance Leasing Co.,Ltd. Pledgor: Suzhou lishuo Technology Co.,Ltd. Registration number: Y2022320010787 |