CN212690825U - Direct injection type crystal silicon slicer main shaft non-contact sealing structure - Google Patents
Direct injection type crystal silicon slicer main shaft non-contact sealing structure Download PDFInfo
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- CN212690825U CN212690825U CN202022118498.5U CN202022118498U CN212690825U CN 212690825 U CN212690825 U CN 212690825U CN 202022118498 U CN202022118498 U CN 202022118498U CN 212690825 U CN212690825 U CN 212690825U
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Abstract
The utility model discloses a non-contact sealing structure of a main shaft of a direct injection type crystal silicon slicing machine, which relates to the technical field of main shaft sealing, and the main point of the technical scheme is that the non-contact sealing structure comprises a main shaft outer sleeve which is sleeved outside a main shaft mandrel and is used for supporting the main shaft mandrel; the first sealing static ring is fixed on one side of the spindle outer sleeve, which is close to the end part of the spindle mandrel, and is provided with a first air supply hole; the sealing movable ring is fixed on the spindle mandrel; one side that sealed rotating ring and sealed quiet ring are close to each other forms first air curtain clearance, first air curtain clearance and external intercommunication and air curtain clearance and a sealed quiet ring gas supply hole intercommunication each other, form the air curtain of outwards blowing through high-pressure gas in first air curtain clearance for external contamination impurity is difficult to get into bearing department through the air curtain clearance.
Description
Technical Field
The utility model relates to a technical field of main shaft seal, more specifically the saying so, it relates to a direct injection formula crystal silicon slicer main shaft non-contact seal structure.
Background
Along with the development of photovoltaic trade, the reliability requirement to crystal silicon slicer is higher and higher, and wherein, the leakproofness problem of crystal silicon slicer main shaft directly influences the reliability of crystal silicon slicer. The main shaft in the crystal silicon slicing machine has the functions of supporting and rotating; the main shaft comprises a main shaft mandrel, a main shaft outer sleeve sleeved outside the main shaft mandrel and internal parts; the spindle mandrel and the spindle outer sleeve have relative rotary motion, a certain part mounting space exists between the spindle mandrel and the spindle outer sleeve, and internal parts are arranged in the part mounting space; the parts mounting space is usually provided with parts such as a bearing or a space ring and the like to realize the function of the main shaft; the spare part installation space is generally separated with the external world by seal structure, and crystal silicon slicer is at work, and the operational environment of main shaft is abominable usually, has pollution impurity such as a large amount of steam and silica flour, and these impurity pass seal structure easily and enter into the main shaft, in case these pollution impurity enter into the main shaft, will lead to the inefficacy of main shaft. The main shaft of the existing slicer is mostly damaged because of sealing failure, so that contaminated impurities enter the main shaft and internal parts are damaged, and the sealing structure of the main shaft of the crystalline silicon slicer, which is difficult to cause sealing failure, is urgently needed.
SUMMERY OF THE UTILITY MODEL
Not enough to prior art exists, the utility model aims to provide a direct injection formula crystal silicon slicer main shaft non-contact seal structure, it forms the outside air curtain that blows through high-pressure gas in the air curtain clearance for external contamination impurity is difficult to get into spare part installation space department through the air curtain clearance, thereby makes the problem that sealed inefficacy is difficult to appear through the slicer main shaft.
In order to achieve the above purpose, the utility model provides a following technical scheme: a non-contact sealing structure of a main shaft of a direct injection type crystal silicon slicing machine comprises a main shaft outer sleeve, a main shaft core shaft and a sealing ring, wherein the main shaft outer sleeve is sleeved on the outer side of the main shaft core shaft and used for supporting the main shaft core shaft;
the first sealing static ring is fixed on one side of the spindle outer sleeve, which is close to the end part of the spindle mandrel, and is provided with a first air supply hole;
the sealing movable ring is fixed on the spindle mandrel;
one side of the first sealing static ring and one side of the first sealing dynamic ring, which are close to each other, form a first air curtain gap, and the first air curtain gap is communicated with the outside and is communicated with an air supply hole of the first sealing static ring.
Through adopting above-mentioned technical scheme, let in high-pressure gas in the middle of to a sealed quiet ring gas supply hole, high-pressure gas enters into in the middle of the first air curtain clearance through a sealed quiet ring gas supply hole to form the outside air curtain that blows in the middle of the first air curtain clearance, make during external pollution impurity is difficult to enter into first air curtain clearance, more be difficult to enter into spare part installation space department through first air curtain clearance, thereby make the main shaft be difficult to the problem that sealed inefficacy appears.
The utility model discloses further set up to: the sealing static ring comprises a main body part which is fixed on the spindle outer sleeve;
the step part is positioned on one side of the main body part, which is close to the part installation space, the step part is protruded towards the direction close to the spindle mandrel, and a first moving and static ring gap is formed between the step part and the sealing moving ring;
the outside of the sealing movable ring is fixed with a sealing part arranged on one side of the step part departing from the part installation space, a first air curtain gap is arranged between the sealing part and the main body part, and the first sealing gap is communicated with the first movable and static ring gap.
Through adopting above-mentioned technical scheme, through setting up first sound ring clearance, increased contaminated impurity and got into the route that spare part installation space department will pass through to make contaminated impurity be difficult to get into spare part installation space department more.
The utility model discloses further set up to: the second sealing static ring is positioned between the step part and the sealing part, a second air curtain gap is formed between one side, close to the main body part, of the second sealing static ring and the main body part, and the second air curtain gap is communicated with the first air curtain gap;
and a second movable and static ring gap is formed between the second sealed static ring and the sealing part, the second movable and static ring gap is directly communicated with the first air curtain gap, and the second air curtain gap is directly communicated with the first sealed static ring air supply hole.
Through adopting above-mentioned technical scheme, through setting up the second air curtain clearance to be linked together the second air curtain clearance directly with a sealed quiet ring gas supply hole, thereby make high-pressure gas through in the second air curtain clearance by restriction flow direction, make high-pressure gas flow towards first air curtain clearance direction, thereby make high-pressure gas be difficult to blow in the middle of the second sound ring clearance.
The utility model discloses further set up to: and an included angle between the second moving and static ring gap and the second air curtain gap is an acute angle.
Through adopting above-mentioned technical scheme, set up the contained angle between second sound ring clearance and the second air curtain clearance to the acute angle for when high-pressure gas flowed through second air curtain clearance and second sound ring clearance intercommunication department, be difficult to enter into in the middle of the second sound ring clearance.
The utility model discloses further set up to: the second sound ring clearance is the arc setting along the cross-section of main shaft dabber axis direction, and the arc orientation is protruding near the direction of sealed quiet ring two.
Through adopting above-mentioned technical scheme, the cross-section is the arc and sets up second sound annular gap for when high-pressure gas flows through second air curtain clearance and second sound annular gap intercommunication department, be difficult to enter into in the middle of the second sound annular gap.
The utility model discloses further set up to: and one side of the second sealing static ring, which is close to the main body part, is provided with an air homogenizing groove, and the air homogenizing groove is an annular groove and is directly communicated with the second air curtain gap.
Through adopting above-mentioned technical scheme, after high-pressure gas entered into even gas tank, can make high-pressure gas along the circumferential direction evenly distributed of sealed quiet ring two in even gas tank to make the gas curtain that produces in first gas curtain clearance and the second gas curtain clearance can be more even.
The utility model discloses further set up to: the step part is provided with a static ring sewage discharge hole for discharging polluted impurities out of the first static ring gap, and the first static ring gap is communicated with the static ring sewage discharge hole; and a sewage discharge cavity is arranged between the step part and the sealing movable ring, is an annular cavity and is communicated with the first movable and static ring gap and the static ring sewage discharge hole.
Through adopting above-mentioned technical scheme, when external contaminated material enters into first sound annular gap department, contaminated material can fall into in the middle of the blowdown chamber, contaminated material in the middle of the blowdown chamber falls into in the middle of a quiet ring blowdown hole to make contaminated material more easily discharged.
The utility model discloses further set up to: the first sealing static ring and the second sealing static ring are integrated or separated, and when the first sealing static ring and the second sealing static ring are separated, the relative positions of the first sealing static ring and the second sealing static ring are fixed.
The utility model discloses further set up to: the sealing movable ring and the spindle mandrel are integrated or separated, and when the sealing movable ring and the spindle mandrel are separated, the relative positions of the sealing movable ring and the spindle mandrel are fixed.
The utility model discloses further set up to: the flange is arranged between the main shaft outer sleeve and the first sealing static ring, the flange is fixed on the main shaft outer sleeve, the first sealing static ring and the flange are integrated or separated, and when the first sealing static ring and the flange are separated, the relative position of the first sealing static ring and the flange is fixed.
To sum up, the utility model discloses compare and have following beneficial effect in prior art: the utility model discloses let in high-pressure gas in the middle of to main shaft overcoat gas supply hole, high-pressure gas passes through main shaft overcoat gas supply hole, in the middle of the first air curtain clearance is entered into to a sealed quiet ring gas supply hole to form the outside air curtain that blows in the middle of the first air curtain clearance, make during external pollution impurity is difficult to enter into first air curtain clearance, more be difficult to enter into spare part installation space department through first air curtain clearance, thereby make the main shaft be difficult to the problem that sealed inefficacy appears.
Drawings
FIG. 1 is a cross-sectional view of an embodiment embodying a first air curtain gap;
FIG. 2 is an enlarged view of portion A of FIG. 1;
FIG. 3 is a cross-sectional view of an embodiment embodying a waste chamber;
fig. 4 is an enlarged schematic view of a portion B of fig. 3.
In the figure: 1. a spindle core shaft; 2. a component mounting space; 3. a spindle jacket; 31. an air supply hole is sleeved outside the main shaft; 32. A sewage draining hole is sleeved outside the main shaft; 4. a flange; 41. a flange air supply hole; 42. a flange sewage draining hole; 5. sealing a first static ring; 51. A main body portion; 511. sealing a gas supply hole of the static ring; 52. a step portion; 521. a sewage draining hole is arranged on the static ring; 6. sealing the movable ring; 61. a sealing part; 62. a blowdown chamber; 7. a second sealing static ring; 71. a gas homogenizing groove; 8. a gasket; 9. a first dynamic and static ring gap; 91. a second dynamic and static ring gap; 92. a third dynamic and static ring gap; 10. a second air curtain gap; 101. a first air curtain gap.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the following description, together with the drawings of the present invention, clearly and completely describes the technical solution of the present invention, and based on the embodiments in the present application, other similar embodiments obtained by those skilled in the art without creative efforts shall all belong to the protection scope of the present application. In addition, directional terms such as "upper", "lower", "left", "right", etc. in the following embodiments are directions with reference to the drawings only, and thus, the directional terms are used for illustration and not for limitation of the present invention.
The present invention will be further described with reference to the accompanying drawings and preferred embodiments.
Example (b): a main shaft non-contact sealing structure of a direct injection type crystal silicon slicing machine is shown in attached figures 1 and 2 and comprises a main shaft outer sleeve 3, a flange 4, a first sealing static ring 5, a second sealing static ring 7 and a first sealing dynamic ring 6, wherein the main shaft outer sleeve 3 is sleeved on the outer side of a main shaft mandrel 1, the flange 4 is fixedly connected to the main shaft outer sleeve 3, the first sealing static ring 5 is fixedly connected to one side, away from the main shaft outer sleeve 3, of the flange 4, the first sealing dynamic ring 6 is sleeved on the outer side of the main shaft. The flange 4 is positioned on one side of the main shaft outer sleeve 3 close to the end part of the main shaft mandrel 1, and the first sealing static ring 5 is fixedly connected to one side of the flange 4 departing from the main shaft outer sleeve 3. The first sealing static ring 5 and the flange 4 can be designed integrally or separately, and when the first sealing static ring 5 and the flange 4 are designed separately, the relative positions of the first sealing static ring 5 and the flange 4 are fixed; the arrangement mode of the first sealing static ring 5 and the flange 4 comprises but is not limited to the above mode; the sealing movable ring 6 and the main shaft mandrel 1 can be designed integrally or separately, and when the sealing movable ring 6 and the main shaft mandrel 1 are designed separately, the relative positions of the sealing movable ring 6 and the main shaft mandrel 1 are fixed; the arrangement of the seal moving ring 6 and the spindle mandrel 1 includes, but is not limited to, the above.
Preferably, in the embodiment, the flange 4 is fixed on the spindle outer sleeve 3 through bolts, the first sealing static ring 5 is fixed on the flange 4 through bolts, and the movable sealing ring 6 is fixed on the spindle mandrel 1 through bolts; a component mounting space is left between the spindle shaft 1 and the spindle housing 3, and in some embodiments, a bearing or the like is disposed in the component mounting space to support the spindle shaft 1.
The first sealing static ring 5 comprises a main body part 51 and a step part 52, wherein the main body part 51 and the step part 52 are both arranged annularly and surround the main shaft; the main body 51 is fixed to the flange 4, the step 52 is located on the side of the main body 51 close to the component mounting space 2, and the step 52 is convex toward the spindle shaft 1. A first moving and static ring gap 9 is formed between one side of the step part 52 close to the movable sealing ring 6 and the movable sealing ring 6, a sealing part 61 is integrally formed on one side of the movable sealing ring 6 close to the main body part 51, the sealing part 61 is also annularly arranged, and the sealing part 61 is positioned on one side of the step part 52 away from the part mounting space 2; the second sealing static ring 7 is positioned on the side, close to the movable sealing ring 6, of the main body part 51, the second sealing static ring 7 is positioned between the stepped part 52 and the sealing part 61, and the second sealing static ring 7 is fixed on the side, close to the sealing part 61, of the stepped part 52; the first sealing static ring 5 and the second sealing static ring 7 can be designed in a split mode or an integrated mode, and when the first sealing static ring 5 and the second sealing static ring 7 are designed in a split mode, the relative positions of the first sealing static ring 5 and the second sealing static ring 7 are fixed; the arrangement mode of the first sealing static ring 5 and the second sealing static ring 7 includes but is not limited to the above mode;
preferably, in this embodiment, the second stationary seal ring 7 and the first stationary seal ring 5 are designed to be separated, and the second stationary seal ring 7 is fixed to the stepped portion 52 by bolts. A second moving and static ring gap 91 is formed between the second sealing static ring 7 and the sealing part 61, a third moving and static ring gap 92 is formed between the second sealing static ring 7 and the sealing moving ring 6, and the first moving and static ring gap 9, the third moving and static ring gap 92 and the second moving and static ring gap 91 are sequentially communicated. The second air curtain gap 10 is formed between the side of the second sealing static ring 7 close to the main body part 51 and the main body part 51, the first air curtain gap 101 is formed between the sealing part 61 and the main body part 51, and the first air curtain gap 101 and the second air curtain gap 10 are communicated with each other. The first moving and static ring gap 9, the second moving and static ring gap 91, the third moving and static ring gap 92, the first air curtain gap 101 and the second air curtain gap 10 are all annular gaps.
The spindle cover 3 is provided with a spindle cover air supply hole 31, the flange 4 is provided with a flange air supply hole 41, and the main body 51 is provided with a sealing stationary ring air supply hole 511. The spindle housing air supply hole 31, the flange air supply hole 41, and the sealing stationary ring air supply hole 511 are sequentially communicated, and the sealing stationary ring air supply hole 511 and the second air curtain gap 10 are communicated with each other.
High-pressure gas inputs main shaft overcoat gas supply hole 31 in the middle of, then high-pressure gas passes through main shaft overcoat gas supply hole 31 in proper order, flange gas supply hole 41, sealed quiet ring gas supply hole 511 enters into second air curtain clearance 10 when, then enter into in the middle of first air curtain clearance 101 through second air curtain clearance 10, finally sent out through first air curtain clearance 101, high-pressure gas forms the air curtain between first air curtain clearance 101 and second air curtain clearance 10, make external pollution impurity be difficult to enter into second sound ring clearance 91 through first air curtain clearance 101, thereby make pollution impurity be difficult to enter into spare part installation space 2 department.
First air curtain clearance 101 and second air curtain clearance 10 are arranged along the axis direction of main shaft dabber 1, and preferred, in this embodiment, the external diameter of sealed quiet ring two 7 equals the external diameter of sealing portion 61, and when high-pressure gas flowed into first air curtain clearance 101 from second air curtain clearance 10, transition that can be more smooth for high-pressure gas is difficult to flow into in the middle of second sound ring clearance 91.
The side of the second sealing static ring 7 close to the sealing part 61 is an inclined surface, and the side of the inclined surface close to the spindle mandrel 1 is inclined towards the direction close to the part installation space 2. Preferably, in this embodiment, the sections of the two inclined surfaces along any radial direction of the main shaft are parallel to each other; the two inclined planes are arranged, so that the included angle between the second movable and static ring gap 91 and the second air curtain gap 10 is an acute angle, and when high-pressure air flows through the junction of the second air curtain gap 10, the second movable and static ring gap 91 and the first air curtain gap 101, the high-pressure air is not easy to enter the second movable and static ring gap 91.
The side of the second sealing static ring 7 close to the main body part 51 is provided with an air homogenizing groove 71, and the air homogenizing groove 71 is an annular groove and is directly communicated with the second air curtain gap 10. After the high-pressure gas enters the gas uniformizing groove 71, the high-pressure gas can be uniformly distributed in the gas uniformizing groove 71 along the circumferential direction of the second sealing static ring 7, so that gas curtains generated in the first gas curtain gap 101 and the second gas curtain gap 10 can be more uniform.
Be provided with gasket 8 between main shaft overcoat 3 and the main shaft dabber 1, gasket 8 is the annular and sets up around main shaft dabber 1, and step portion 52 and sealed rotating ring 6 are close to one side and gasket 8 mutual contact of gasket 8, if the contamination impurity breaks through first air curtain clearance 101 and when entering into gasket 8 and step portion 52 and sealed rotating ring 6 contact department through the sound ring clearance, gasket 8 blocks contamination impurity as last protection.
Referring to fig. 3 and 4, the spindle sleeve 3 is provided with a spindle sleeve blowdown hole 32, the flange 4 is provided with a flange blowdown hole 42 communicated with the spindle sleeve blowdown hole 32, the step portion 52 is provided with a first stationary ring blowdown hole 521 communicated with the flange blowdown hole 42, and the first stationary ring blowdown hole 521 is communicated with the first stationary ring gap 9. Preferably, in this embodiment, the first stationary ring sewage draining hole 521 is located right below the spindle shaft 1, and the flange sewage draining hole 42 is located right below the first stationary ring sewage draining hole 521.
When the pollution impurity breaks through the first air curtain gap 101 and enters the second movable and static ring gap 91, and enters the first movable and static ring gap 9 through the second movable and static ring gap 91 and the third movable and static ring gap 92, the pollution impurity can rotate along with the sealing movable ring 6 in the first movable and static ring gap 9, when the pollution impurity rotates to the position right below the spindle mandrel 1, under the action of centrifugal force and the self gravity of the pollution impurity, the pollution impurity falls into the middle of the first sewage discharge hole 521 of the static ring, and is sent out through the flange sewage discharge hole 42 and the spindle outer sleeve sewage discharge hole 32.
A sewage discharge cavity 62 is arranged between the step part 52 and the sealing movable ring 6, the sewage discharge cavity 62 is annular and is arranged around the spindle mandrel 1, and the sewage discharge cavity 62 is communicated with the first movable and static ring gap 9. When the contamination impurity breaks through into first sound ring clearance 9, the contamination impurity can fall into in the middle of the blowdown chamber 62 from the quiet ring clearance easier more easily to the contamination impurity in the middle of the blowdown chamber 62 also falls into in the middle of the quiet ring blowdown hole 521 from the blowdown chamber 62 more easily.
The working principle of the non-contact sealing structure of the main shaft of the direct injection type crystalline silicon slicing machine when in use is as follows: high-pressure gas is through inputing in the middle of the main shaft overcoat gas supply hole 31, then high-pressure gas passes through main shaft overcoat gas supply hole 31 in proper order, flange gas supply hole 41, sealed quiet ring gas supply hole 511 enters into second air curtain clearance 10 when, then enter into in the middle of first air curtain clearance 101 through second air curtain clearance 10, finally sent out through first air curtain clearance 101, high-pressure gas forms the air curtain between first air curtain clearance 101 and second air curtain clearance 10, make external pollution impurity be difficult to enter into second sound ring clearance 91 through first air curtain clearance 101, thereby make pollution impurity be difficult to enter into spare part installation space 2 department. When the contamination impurity breaks through the second air curtain gap 10 and enters the second movable and static ring gap 91, and enters the first movable and static ring gap 9 through the second movable and static ring gap 91 and the third movable and static ring gap 92, the contamination impurity falls into the pollution discharge cavity 62 from the first movable and static ring gap 9, then falls into the first static ring pollution discharge hole 521 from the pollution discharge cavity 62, and is discharged through the flange pollution discharge hole 42 and the main shaft outer sleeve pollution discharge hole 32.
It is above only the utility model discloses a preferred embodiment, the utility model discloses a scope of protection does not only confine above-mentioned embodiment, the all belongs to the utility model discloses a technical scheme under the thinking all belongs to the utility model discloses a scope of protection. It should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The utility model provides a formula crystal silicon slicer main shaft non-contact seal structure directly which characterized in that: the spindle comprises a spindle outer sleeve, a spindle core shaft and a spindle outer sleeve, wherein the spindle outer sleeve is sleeved outside the spindle core shaft and used for supporting the spindle core shaft;
the first sealing static ring is fixed on one side of the spindle outer sleeve, which is close to the end part of the spindle mandrel, and is provided with a first air supply hole;
the sealing movable ring is fixed on the spindle mandrel;
one side of the first sealing static ring and one side of the first sealing dynamic ring, which are close to each other, form a first air curtain gap, and the first air curtain gap is communicated with the outside and is communicated with an air supply hole of the first sealing static ring.
2. The non-contact sealing structure for the spindle of the direct injection type crystalline silicon slicer as claimed in claim 1, wherein: the sealing static ring comprises a main body part which is fixed on the spindle outer sleeve;
the step part is positioned on one side of the main body part, which is close to the part installation space, the step part is protruded towards the direction close to the spindle mandrel, and a first moving and static ring gap is formed between the step part and the sealing moving ring;
the outside of the sealing movable ring is fixed with a sealing part arranged on one side of the step part departing from the part installation space, a first air curtain gap is arranged between the sealing part and the main body part, and the first sealing gap is communicated with the first movable and static ring gap.
3. The non-contact sealing structure for the spindle of the direct injection type crystalline silicon slicer as claimed in claim 2, wherein: the second sealing static ring is positioned between the step part and the sealing part, a second air curtain gap is formed between one side, close to the main body part, of the second sealing static ring and the main body part, and the second air curtain gap is communicated with the first air curtain gap;
and a second movable and static ring gap is formed between the second sealed static ring and the sealing part, the second movable and static ring gap is directly communicated with the first air curtain gap, and the second air curtain gap is directly communicated with the first sealed static ring air supply hole.
4. The non-contact sealing structure of the spindle of the direct injection type crystalline silicon slicer as claimed in claim 3, wherein: and an included angle between the second moving and static ring gap and the second air curtain gap is an acute angle.
5. The non-contact sealing structure of the spindle of the direct injection type crystalline silicon slicer as claimed in claim 3, wherein: the second sound ring clearance is the arc setting along the cross-section of main shaft dabber axis direction, and the arc orientation is protruding near the direction of sealed quiet ring two.
6. The non-contact sealing structure of the spindle of the direct injection type crystalline silicon slicer as claimed in claim 3, wherein: and one side of the second sealing static ring, which is close to the main body part, is provided with an air homogenizing groove, and the air homogenizing groove is an annular groove and is directly communicated with the second air curtain gap.
7. The non-contact sealing structure of the spindle of the direct injection type crystalline silicon slicer as claimed in any one of claims 2-6, wherein: the step part is provided with a static ring sewage discharge hole for discharging polluted impurities out of the first static ring gap, and the first static ring gap is communicated with the static ring sewage discharge hole; and a sewage discharge cavity is arranged between the step part and the sealing movable ring, is an annular cavity and is communicated with the first movable and static ring gap and the static ring sewage discharge hole.
8. The non-contact sealing structure of the spindle of the direct injection type crystalline silicon slicer as claimed in claim 3, wherein: the first sealing static ring and the second sealing static ring are integrated or separated, and when the first sealing static ring and the second sealing static ring are separated, the relative positions of the first sealing static ring and the second sealing static ring are fixed.
9. The non-contact sealing structure for the spindle of the direct injection type crystalline silicon slicer as claimed in claim 1, wherein: the sealing movable ring and the spindle mandrel are integrated or separated, and when the sealing movable ring and the spindle mandrel are separated, the relative positions of the sealing movable ring and the spindle mandrel are fixed.
10. The non-contact sealing structure for the spindle of the direct injection type crystalline silicon slicer as claimed in claim 1, wherein: the flange is arranged between the main shaft outer sleeve and the first sealing static ring, the flange is fixed on the main shaft outer sleeve, the first sealing static ring and the flange are integrated or separated, and when the first sealing static ring and the flange are separated, the relative position of the first sealing static ring and the flange is fixed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022118498.5U CN212690825U (en) | 2020-09-23 | 2020-09-23 | Direct injection type crystal silicon slicer main shaft non-contact sealing structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022118498.5U CN212690825U (en) | 2020-09-23 | 2020-09-23 | Direct injection type crystal silicon slicer main shaft non-contact sealing structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212690825U true CN212690825U (en) | 2021-03-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022118498.5U Active CN212690825U (en) | 2020-09-23 | 2020-09-23 | Direct injection type crystal silicon slicer main shaft non-contact sealing structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212690825U (en) |
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2020
- 2020-09-23 CN CN202022118498.5U patent/CN212690825U/en active Active
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