CN211644611U - Even atomizing oxidation graphite alkene film preparation facilities of film forming - Google Patents
Even atomizing oxidation graphite alkene film preparation facilities of film forming Download PDFInfo
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- CN211644611U CN211644611U CN202020232927.9U CN202020232927U CN211644611U CN 211644611 U CN211644611 U CN 211644611U CN 202020232927 U CN202020232927 U CN 202020232927U CN 211644611 U CN211644611 U CN 211644611U
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Abstract
The utility model discloses an even atomizing oxidation graphite alkene film preparation facilities of film forming, including heating platform, small-size air pump, atomizer and temperature control appearance, the atomizer bottom is provided with shower nozzle form buffer head, the buffer head bottom be equipped with the inlet port that the trachea of small-size air pump links to each other, the even top of buffer head is equipped with a plurality of ventholes, the inlet port communicates with the venthole each other. The utility model discloses an even atomizing oxidation graphite alkene film preparation facilities of film forming has that the film forming homogeneity is good, the characteristics that the suitability is strong.
Description
Technical Field
The utility model relates to a graphite oxide alkene technical field specifically indicates an even atomizing graphite oxide alkene film preparation facilities of film forming.
Background
The graphene is a hexagonal two-dimensional structure material with a honeycomb lattice structure and composed of carbon atoms, has excellent physical and chemical properties, and has a wide application prospect. The method for preparing the graphene film is more, and can be directly or indirectly prepared. The direct preparation of the graphene film is mainly a chemical vapor deposition method; the indirect preparation of the graphene film is to convert the graphene oxide film into the graphene film by means of high-temperature or chemical reduction of the graphene oxide film. Therefore, the graphene oxide film is the basis for preparing the graphene film.
The preparation method of the graphene oxide film mainly comprises a spin-coating method, a suction filtration method, a sol-gel method, an interface self-assembly method and the like. These preparation processes have the following problems: (1) the thickness of the film is thicker; (2) other chemical components exist in the film, which affects the purity of the film; (3) the waste generated in the preparation process needs to be additionally treated; (4) the preparation process is not suitable for various base materials.
Aiming at the problems that the film prepared by the process for preparing the graphene oxide film is thick in thickness and low in purity, the generated waste needs to be additionally treated and is not suitable for various base body materials, Chinese utility model patent CN207872442U discloses a device for preparing the graphene oxide film in an atomizing mode, which comprises a heating platform, a small air pump, an atomizer and a temperature controller; a protective cover with an opening at the left side is covered on the outer side of the heating platform, the heating platform is provided with a support, a heat-conducting metal sheet is fixed above the support through a bolt, and a heating ceramic sheet is clamped between the heat-conducting metal sheet and the support; the side of the atomizer is provided with an interface, a conduit is sleeved at the interface, and an opening of the conduit extends into the upper part of the heating platform in the protective cover. The utility model discloses a design simple structure atomizes graphene oxide solution through small-size air pump and atomizer, and the atomizing liquid drop will be attached to the substrate surface on the heating platform, and along with the dry substrate surface liquid drop of heating platform heating, will obtain continuous graphene oxide film on the substrate surface after the liquid drop evaporation.
However, the method has the following defects in the preparation process: if the graphene oxide solution added into the sprayer is turbid liquid, high-speed gas is sprayed into the sprayer to form gas flow impact, the graphite oxide solution forms a concentration gradient from the center of the gas flow to the outer wall of the sprayer, the sedimentation process of the graphene oxide solution is accelerated, and the concentration uniformity of the graphene oxide solution sprayed out of the sprayer is poor; meanwhile, the graphene oxide solution is sprayed on the workpiece through the guide pipe, and the graphene oxide solution droplets are extremely unevenly distributed due to airflow impact, so that the thickness uniformity of the prepared graphene oxide film is poor, and the purity of the graphene oxide film is to be improved.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing an even atomizing oxidation graphite alkene film preparation facilities of film forming has the characteristics that the film forming homogeneity is good, the suitability is strong.
The utility model discloses can realize through following technical scheme:
the utility model discloses an even atomizing oxidation graphite alkene film preparation facilities of film forming, including heating platform, small-size air pump, atomizer and temperature control appearance, the atomizer bottom is provided with shower nozzle form buffer head, and the buffer head bottom is equipped with the inlet port that links to each other with the trachea of small-size air pump, and the even top of buffer head is equipped with a plurality of ventholes, and the inlet port communicates with the venthole each other. Through the shower-nozzle-shaped buffer head, high-speed gas enters the back through the gas inlet hole and finally is ejected through the uniform gas outlet holes along the gas holes in the buffer head to generate uniform buffer effect, so that the problem that the high-speed gas directly enters the gas column inside the sprayer through the gas pipe in the prior art to impact is effectively avoided, the graphene oxide solution is uniformly stirred, suspension settlement is slowed down, the uniformity of the graphene oxide solution is improved, the influence of the non-uniformity of the concentration of the graphene oxide solution on the finally formed graphene oxide film is avoided, and the purity uniformity is more excellent; meanwhile, the mode of the built-in shower nozzle-shaped buffer head is adopted, the buffer head is combined inside the atomizer, the installation and the disassembly are convenient, the complex modification of the inner structure of the atomizer is not needed, and the applicability is better.
Further, the pipe has been cup jointed to atomizer side kneck, be provided with "Z" type buffer board in the pipe, the buffer board includes the fixed plate of "7" style of calligraphy and the lower liquid board of "7" style of calligraphy of falling, the fixed plate includes diaphragm and first buffering hang plate, lower liquid board includes bottom plate and second buffering hang plate, first buffering hang plate, second buffering hang plate, the bottom plate is the mesh setting, the fixed plate, lower liquid board is through first hang plate, the fixed formation "Z" type of second hang plate coincide. The arrangement of the buffer plate mainly buffers the sprayed graphene oxide solution droplets, so that the droplets are prevented from wholly dropping and are prevented from being uneven in size four, when the device is used, the buffer plate is fixed inside the bottom of the conduit through the fixing plate, liquid is sprayed to reach the first inclined plate and the second inclined plate, meshes of the first inclined plate and the second inclined plate can enable the droplets to disperse and seep downwards, redundant droplets flow downwards and then seep downwards, and finally drop through the lower liquid plate, the droplets are uniform in the whole dropping process, the conditions of large droplets, small droplets, local overlarge droplets or undersize cannot exist, the uniformity of the droplets dropping on a workpiece is high, and the uniformity of a formed film is effectively improved; and the buffer board of "Z" type uses modular structure, convenient dismantlement and installation, has stronger use convenience.
Furthermore, the aperture of the air inlet hole is larger than that of the air outlet hole, the aperture of the air channel communicated with the air inlet hole and the air outlet hole is gradually reduced, and the change of the aperture mainly aims to effectively improve the buffering effect and improve the concentration uniformity of the graphene oxide solution in the atomizer.
Furthermore, the top of the buffering head is circular, and the air outlets are regularly and annularly distributed at the top of the buffering head, so that the influence on the concentration of the graphene oxide solution due to position difference is avoided.
Furthermore, the first inclined plate is provided with a first fixing hole along the radial direction of the inclination, the second inclined plate is provided with a second fixing hole along the radial direction of the inclination, and the fixing bolt realizes the combination of the fixing plate and the lower liquid plate through the first fixing hole and the second fixing hole. In practical use, the first fixing hole and the second fixing hole can be fixed in a staggered mode to change the inclined flowing path of the buffer plate, and therefore the buffer effect is adjusted.
Furthermore, the transverse plate is provided with a positioning hole, and the fixing screw fixes the fixing plate on the inner wall of the conduit through the positioning hole. Through the locating hole, conveniently fix the buffer board on pipe bottom inner wall, it is more convenient to use.
Furthermore, the fixed plate and the lower liquid plate are polytetrafluoroethylene plates, so that the weight is light, the corrosion is resistant, and the assembly is convenient.
Furthermore, the buffer head is made of stainless steel, so that the buffer head has high mechanical strength, impact resistance, corrosion resistance and longer service life.
Furthermore, the aperture of the mesh of the lower liquid plate is larger than the apertures of the first inclined plate and the second inclined plate, so that the falling process of the liquid drops is facilitated.
Furthermore, a pressure reducing valve is arranged between the air inlet hole and the air pipe, the flow speed of air entering the atomizer can be adjusted by adjusting the pressure reducing valve, and the air inlet and the air pipe have high use flexibility.
The utility model relates to an even atomizing oxidation graphite alkene film preparation facilities of film forming has following beneficial effect:
the film forming uniformity is good, high-speed gas enters through the air inlet hole and then is ejected out through the uniform air outlet hole along the air hole in the buffer head after entering through the shower-nozzle-shaped buffer head to generate a uniform buffer effect, the gas column impact in the prior art that the high-speed gas directly enters the sprayer through the air pipe is effectively avoided, the graphene oxide solution is uniformly stirred, suspension settlement is slowed down, the uniformity of the graphene oxide solution is improved, the influence of the non-uniformity of the concentration of the graphene oxide solution on the thickness of the finally formed graphene oxide film is avoided, and the purity uniformity is also more excellent;
second, suitability are strong, and the mode of built-in shower nozzle form buffering head, buffering head combination formula set up inside the atomizer, and the installation is dismantled conveniently, need not to carry out complicated repacking to atomizer inner structure, has better suitability.
Drawings
Fig. 1 is a schematic structural diagram of a device for preparing a spray type graphene oxide film in the prior art;
fig. 2 is a schematic structural view of a buffer head of the spray type graphene oxide film preparation device with uniform film formation;
fig. 3 is a schematic structural view of a buffer plate of the spray type graphene oxide film preparation device with uniform film formation;
the reference numbers in the drawings include: the device comprises a small air pump 1, an air pipe 2, an atomizer 3, a temperature controller 4, a contactor 5, a bracket 6, a workpiece 7, a heat conducting metal sheet 8, a heating ceramic sheet 9, a thermocouple 10, a protective cover 11, a guide pipe 12 and a heating platform 13; the buffer head 200, an air inlet hole 201, an air outlet hole 202 and a pressure reducing valve 203; the buffer plate 300, the horizontal plate 301, the first inclined plate 302, the second inclined plate 303, the lower liquid plate 304, the positioning hole 305, the first fixing hole 306 and the second fixing hole 307.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the following provides a detailed description of the product of the present invention with reference to the embodiments and the accompanying drawings.
The utility model discloses an even atomizing oxidation graphite alkene film preparation facilities of film forming is at the improvement of the device of prior art CN207872442U atomizing preparation oxidation graphite alkene film, and the device of prior art's atomizing preparation oxidation graphite alkene film is shown as figure 1, including small-size air pump 1, trachea 2, atomizer 3, temperature controller 4, contactor 5, support 6, work piece 7, heat conduction sheetmetal 8, heating potsherd 9, thermocouple 10, safety cover 11, pipe 12, heating platform 13.
The technical scheme of the utility model is mainly characterized in that the atomizer and the conduit are improved, and other partial structures and the connection relation thereof are not changed.
The utility model provides a technical scheme of high oxidation graphite alkene film forming thickness homogeneity lies in designing the inside homogeneity that admits air of atomizer, and the core lies in that the atomizer bottom is provided with shower nozzle form buffer head 200, and the structure of buffer head 200 is shown as figure 2, and buffer head 200 bottom is equipped with the inlet port 201 that links to each other with the trachea of small-size air pump, and the even top of buffer head 200 is equipped with a plurality of ventholes 202, and inlet port 201 communicates with venthole 202 each other. The aperture of the air inlet hole 201 is larger than that of the air outlet hole 202, and the aperture of the air passage communicated with the air inlet hole 201 and the air outlet hole 202 is gradually reduced. The top of the cushion head 200 is circular and the air outlets 202 are regularly distributed annularly at the top of the cushion head 200. The buffer head 200 is made of stainless steel; a pressure reducing valve 203 is arranged between the air inlet hole 201 and the air pipe.
The utility model discloses an another scheme lies in improving to the process that graphene oxide solution liquid drop drips, the actual conditions that the pipe then the liquid drop drips through the pipe has been cup jointed to atomizer side kneck, be provided with "Z" type buffer board 300 in the pipe, its concrete structure is shown in FIG. 3, buffer board 300 includes the fixed plate of "7" style of calligraphy and falls the lower liquid board 304 of "7" style of calligraphy, the fixed plate includes diaphragm 301 and first buffering hang plate, lower liquid board 304 includes bottom plate and second buffering hang plate, first buffering hang plate, the second buffers the hang plate, the bottom plate is the mesh setting, the fixed plate, lower liquid board 304 is through first hang plate 302, the fixed formation "Z" type of second hang plate 303 coincide. The first inclined plate 302 is provided with a first fixing hole 306 along the inclined radial direction, the second inclined plate 303 is provided with a second fixing hole 307 along the inclined radial direction, and the fixing bolt realizes the combination of the fixing plate and the lower liquid plate 304 through the first fixing hole 306 and the second fixing hole 307. The transverse plate 301 is provided with a positioning hole 305, and the fixing screw fixes the fixing plate on the inner wall of the conduit through the positioning hole 305. The fixed plate and the lower liquid plate 304 are teflon plates. The aperture of the mesh of the lower liquid plate 304 is larger than the apertures of the first inclined plate 302 and the second inclined plate.
As an improved technical solution, the present invention is a targeted improvement on the prior art, and the same components, such as the present invention, without specific description, can be understood by combining with the accompanying drawings, and the present invention is not separately described or explained, but does not affect the understanding of the technical solution.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way; the present invention can be smoothly implemented by those skilled in the art according to the drawings and the above description; however, those skilled in the art should understand that changes, modifications and variations that are equivalent to those of the above-described embodiments may be made without departing from the scope of the present invention; meanwhile, any changes, modifications, evolutions, etc. of the above embodiments, which are equivalent to the actual techniques of the present invention, still belong to the protection scope of the technical solution of the present invention.
Claims (10)
1. The utility model provides an even atomizing oxidation graphite alkene film preparation facilities of film forming, includes heating platform, small-size air pump, atomizer and temperature controller, its characterized in that: the atomizer bottom is provided with shower nozzle form buffer head, the buffer head bottom be equipped with the inlet port that the trachea of small-size air pump links to each other, the even top of buffer head is equipped with a plurality of ventholes, inlet port and venthole intercommunication each other.
2. The spray type graphene oxide thin film preparation device with uniform film formation according to claim 1, characterized in that: the pipe has been cup jointed to atomizer side kneck, be provided with "Z" type buffer board in the pipe, the buffer board includes the fixed plate of "7" style of calligraphy and the lower liquid board of "7" style of calligraphy of falling, the fixed plate includes diaphragm and first buffering hang plate, lower liquid board includes bottom plate and second buffering hang plate, first buffering hang plate, second buffering hang plate, bottom plate are the mesh setting, fixed plate, lower liquid board are through first hang plate, the fixed formation "Z" type of second hang plate coincide.
3. The spray type graphene oxide thin film preparation device with uniform film formation according to claim 2, characterized in that: the aperture of the air inlet hole is larger than that of the air outlet hole, and the aperture of a gas channel communicated with the air inlet hole and the air outlet hole is gradually reduced.
4. The spray type graphene oxide thin film preparation device with uniform film formation according to claim 3, wherein: the top of the buffer head is circular, and the air outlets are regularly and annularly distributed at the top of the buffer head.
5. The spray type graphene oxide thin film preparation apparatus according to claim 4, wherein: the first inclined plate is provided with a first fixing hole along the radial direction of the inclination, the second inclined plate is provided with a second fixing hole along the radial direction of the inclination, and the fixing bolt realizes the combination of the fixing plate and the lower liquid plate through the first fixing hole and the second fixing hole.
6. The spray type graphene oxide thin film preparation device with uniform film formation according to claim 5, wherein: the transverse plate is provided with a positioning hole, and the fixing screw fixes the fixing plate on the inner wall of the guide pipe through the positioning hole.
7. The spray type graphene oxide thin film preparation apparatus according to claim 6, wherein: the fixed plate and the lower liquid plate are polytetrafluoroethylene plates.
8. The spray type graphene oxide thin film preparation apparatus according to claim 7, wherein: the buffer head is made of stainless steel.
9. The spray type graphene oxide thin film preparation apparatus according to claim 8, wherein: the aperture of the lower liquid plate mesh is larger than the apertures of the first inclined plate and the second inclined plate.
10. The spray type graphene oxide thin film preparation apparatus according to claim 9, wherein: and a pressure reducing valve is arranged between the air inlet and the air pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020232927.9U CN211644611U (en) | 2020-03-02 | 2020-03-02 | Even atomizing oxidation graphite alkene film preparation facilities of film forming |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020232927.9U CN211644611U (en) | 2020-03-02 | 2020-03-02 | Even atomizing oxidation graphite alkene film preparation facilities of film forming |
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| Publication Number | Publication Date |
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| CN211644611U true CN211644611U (en) | 2020-10-09 |
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| CN202020232927.9U Active CN211644611U (en) | 2020-03-02 | 2020-03-02 | Even atomizing oxidation graphite alkene film preparation facilities of film forming |
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