CN211339694U - System for retrieve copper in follow acid etching solution - Google Patents
System for retrieve copper in follow acid etching solution Download PDFInfo
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- CN211339694U CN211339694U CN201922302692.6U CN201922302692U CN211339694U CN 211339694 U CN211339694 U CN 211339694U CN 201922302692 U CN201922302692 U CN 201922302692U CN 211339694 U CN211339694 U CN 211339694U
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Abstract
The utility model relates to an acid contains heavy metal waste liquid treatment field, relates to a system for retrieve copper from acid etching solution, including sediment washing system, leaching system, extraction clean system and torrent electrodeposition system, sediment washing system includes through the well and sediment groove, well sediment membrane filter press, copper precipitation groove, copper precipitation thick liquids membrane filter press, pulpiness washing tank, washing formula membrane filter press that conveying pipeline connects gradually, leaching system is including leaching groove, swash plate settling tank and precision filter, extraction clean system includes one-level extraction tank, second grade extraction tank, load organic phase washing tank, regeneration organic phase washing tank, one-level reextraction tank, second grade reextraction tank, organic phase groove, regeneration organic phase washing tank, load organic phase washing tank, electricity rich liquid groove and raffinate groove, torrent electrodeposition system includes electric liquid circulation tank, Turbulence electrodeposition cell, vapour and liquid separator and air filter, the utility model discloses a technique can not only promote environmental protection, also can realize the recycle of resource simultaneously.
Description
Technical Field
The utility model relates to an acid contains heavy metal waste liquid treatment field, in particular to a system for retrieve copper in follow acid etching solution.
Background
In recent years, the electrical and electronic industry has been rapidly developed, and the yield of printed circuit boards as important components of electrical and electronic products has been increasing, but the pollution problem is also more and more prominent. In the acid etching solution of the printed circuit board, the copper content of the waste solution reaches more than 100g/L, and if the waste solution cannot be recycled well, a large amount of copper resources are lost and the environment is seriously polluted. Although the related process for electrolytically extracting copper from the etching solution has appeared at present, the following problems exist: 1. the efficiency of copper extraction by electrolysis is low, and the energy consumption is large; 2. only the electrolytic copper extraction is carried out, and the etching solution cannot be recycled; 3. the generated waste gas can pollute the environment.
The treatment methods of acidic etching solutions disclosed so far include iron substitution, extraction-electrodeposition, diaphragm electrolysis, neutralization-sedimentation, and the like.
(1) The iron displacement method (chinese patent publication No. CN 1062930a) is to replace copper in acidic etching solution by adding iron into the acidic etching waste solution with the reduction of iron higher than that of copper, and the method requires that the iron added into the waste solution is reduced iron powder or iron sheet with large specific surface area, and the displacement reaction directly occurs on the surface of iron, and produces spongy copper to wrap the surface of iron, resulting in large iron consumption, only about 70% copper product purity, low added value of the product, slow reaction in the later stage of the displacement reaction, and copper ions of about 1g/L remaining in the waste solution after the reaction, and the discharge causes pollution and waste of resources.
(2) The extraction-electrodeposition method (chinese patent publication No. CN 101125719a, chinese patent publication No. CN 202164354U, chinese patent publication No. CN 101550488A, chinese patent publication No. CN 101693997 a) extracts copper ions in the etching solution using an organic copper extractant, then back-extracts the copper ions into a copper sulfate solution using sulfuric acid, and then the copper sulfate solution enters an electrolytic bath to be electrolyzed into a copper plate, although the process can recover a high-purity copper plate, the process has many disadvantages: the acidic etching waste liquid needs to be adjusted to a pH value required by extraction by alkali (ammonia water, sodium hydroxide, sodium carbonate and the like), and the waste water after the copper product is recovered contains a large amount of ammonium ions and chloride ions, so that the discharge causes huge secondary pollution. (3) The diaphragm electrolysis method (Chinese patent publication No. CN 102286746A, Chinese patent publication No. CN 102732888A and Chinese patent publication No. CN 102321908A) is that an ion membrane is utilized to divide an electrolytic cell into an anode area and a cathode area which are independent, the copper precipitation half reaction is carried out in the cathode area to recover copper products, and the oxidation-reduction value of the acidic etching waste liquid is improved by the anode area; the diaphragm electrolysis method has the advantages that copper in the waste liquid can be recovered, the waste liquid is regenerated into new etching liquid, but the etching liquid regenerated by the method can meet the requirement of etching recycling by supplementing a large amount of acid and oxidant, the electric efficiency is low, the treatment capacity is small, meanwhile, chlorine evolution reaction can occur at the anode of the diaphragm electrolysis cell to cause secondary pollution (chlorine evolution can be avoided by releasing sulfuric acid or copper sulfate in an anode region, but the frequency of changing cylinders of the acidic waste liquid in a cathode region is increased, the volume is increased), and the diaphragm electrolysis equipment is only suitable for producing single-panel, double-panel or circuit board enterprises with low requirement on etching precision.
(4) The neutralization and sedimentation method (Chinese patent publication No. CN 101654275A and Chinese patent publication No. CN 101654276A) is to add alkali or alkaline etching solution into acidic etching solution, firstly precipitate basic copper chloride and copper hydroxide, then dissolve with acid to directly obtain copper sulfate or directly calcine to obtain copper oxide. The product obtained by treating the acidic etching solution by the method has low additional value, and the process is complicated, so that a large amount of waste water containing chlorine and ammonia nitrogen is generated.
In the prior art, some of the apparatuses commonly used in the metallurgical field for metal recovery include inclined plate clarifiers and membrane filter presses.
The inclined plate clarifying tank is a high-efficiency continuous settling device, a set or a plurality of sets of inclined plates are additionally arranged in a settling zone of a common connecting clarifying tank to form a certain angle, the intervals are reasonable, smooth thin plates are arranged in parallel, slurry to be clarified is conveyed to the bottom of the clarifying tank from a slurry inlet pipe orifice, suspension flows backwards and upwards enters the inclined plate zone to be settled and clarified, thick solid particles are discharged from the bottom of the inclined plate zone along the inclined plate zone, and clear liquid is discharged from a liquid discharge pipe on the side face of the upper part of the clarifying tank.
A diaphragm filter press is a filter press which is characterized in that a layer of elastic diaphragm plate is additionally arranged between a filter plate and filter cloth, the used filter plate is provided with diaphragm cavities on two sides, the diaphragm filter plate and the filter plate with the same shape are arranged at intervals to form filter chambers with a certain volume, and after the material filtration is finished, gas (liquid) with certain pressure is injected between the filter plate and the diaphragm to enable the diaphragm to swell and reversely press a filter cake, so that the further dehydration of the filter cake is realized, the purpose of reducing the water content of the filter cake is achieved, and the water content of the filter cake is 10-40% lower than that of the common filter.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides a system for retrieve copper from acid etching solution.
The technical scheme of the utility model is that:
a system for recovering copper from acid etching solution,
the device comprises a sediment washing system, a leaching system, an extraction and purification system and a turbulent electrodeposition system, wherein the sediment washing system comprises a neutralization sediment tank, a neutralization sediment membrane filter press, a copper precipitation tank, a copper precipitation slurry membrane filter press, a slurrying washing tank and a washing type membrane filter press which are sequentially connected through a feeding pipeline, a filter residue outlet on the bottom of the neutralization sediment membrane filter press and a filter residue outlet on the bottom of the copper precipitation slurry membrane filter press are respectively connected to the slurrying washing tank through the feeding pipeline, the slurrying washing tank is connected with the washing type membrane filter press through the feeding pipeline, a washing liquid outlet on the washing type membrane filter press is connected to a washing water rotary tank through the feeding pipeline, the washing water rotary tank is connected back to the neutralization sediment tank, an outlet on the bottom of the washing type membrane filter press is connected to the leaching tank in the leaching system through the feeding pipeline,
the leaching system also comprises an inclined plate clarifying tank and a first precision filter, wherein a leachate outlet at the bottom of the leaching tank is connected with the inclined plate clarifying tank through a feeding pipeline, a slurry outlet at the bottom of the inclined plate clarifying tank is connected back to the leaching tank through a feeding pipeline, a clear liquid outlet at the upper end of the inclined plate clarifying tank is connected with the first precision filter through a feeding pipeline, a leachate outlet on the first precision filter is connected to a first-stage extraction tank in the extraction and purification system through a feeding pipeline,
the extraction and purification system also comprises a secondary extraction tank, a loaded organic phase washing tank, a regenerated organic phase washing tank, a primary stripping tank, a secondary stripping tank, an organic phase tank, a regenerated organic phase washing tank, a loaded organic phase washing tank, an electric pregnant solution tank and a raffinate tank, wherein the primary extraction tank is connected with the secondary extraction tank, a loaded organic phase outlet on the secondary extraction tank is connected with the loaded organic phase washing tank through a feeding pipeline, a raffinate outlet on the bottom of the secondary extraction tank is connected with the raffinate tank through a feeding pipeline, an organic phase outlet on the loaded organic phase washing tank is connected with the primary stripping tank through a feeding pipeline, a washing liquid outlet on the bottom of the primary stripping tank is connected with the loaded organic phase washing tank through a feeding pipeline, a washing liquid outlet on the loaded organic phase washing tank is connected with the regenerated organic phase washing tank through a feeding pipeline, a regenerated organic phase outlet on the primary stripping tank is connected with the secondary stripping tank through a feeding pipeline, an electric rich liquid outlet on the bottom of the device is connected to an electric rich liquid tank, a regenerated organic phase outlet on the secondary stripping tank is connected with a regenerated organic phase washing tank through a feeding pipeline, an electric rich liquid outlet on the bottom of the device is connected back to the primary stripping tank through a feeding pipeline, a regenerated organic phase outlet on the regenerated organic phase washing tank is connected to an organic phase tank through a feeding pipeline, a washing liquid outlet on the bottom of the device is connected to a regenerated organic phase washing tank through a feeding pipeline, a washing liquid outlet on the regenerated organic phase washing tank is connected with a loaded organic phase washing tank through a feeding pipeline, an organic phase outlet on the organic phase tank is connected back to the primary extraction tank through a feeding pipeline,
an electric rich liquid outlet on the electric rich liquid groove is connected with a second precision filter in the turbulent flow electrodeposition system through a feeding pipeline, the turbulent flow electrodeposition system further comprises an electric effusion circulation groove, a turbulent flow electrodeposition groove, a gas-liquid separator and an air filter, the second precision filter is connected with the electric effusion circulation groove, an electric barren liquid outlet on the bottom of the electric effusion circulation groove is connected into a secondary back-extraction groove through a feeding pipeline, and the electric effusion circulation groove and the turbulent flow electrodeposition groove are connected to form a circulation loop.
Preferably, still include triple effect evaporation system, triple effect evaporation system includes one effect evaporimeter, two effect evaporimeters, three effect evaporimeters, one effect separator, two effect separator and three effect separator, the steam inlet connection steam house steward of one effect evaporimeter, one effect evaporimeter steam exit linkage one effect separator, one effect separator steam exit linkage two effect evaporimeters, connect gradually to three effect evaporimeters, filtrate inlet pipe is connected to one effect evaporimeter feed inlet, and one effect separator feed inlet is connected to the discharge gate, and two effect separator feed inlets are connected to two effect evaporimeter discharge gates, connect gradually to three effect separator, and the desiccator is connected jointly to three effect evaporimeter bottom discharge gate.
Preferably, the device also comprises a first filtrate transfer tank and a second filtrate transfer tank, wherein the first filtrate transfer tank is arranged between a discharge port of the neutralization sediment membrane filter press and a feed port of the copper precipitation tank, a first filtrate delivery pump is arranged between the discharge port of the first filtrate transfer tank and the feed port of the copper precipitation tank, the second filtrate transfer tank is arranged between a discharge port of the copper precipitation slurry membrane filter press and a feed port of the first effect evaporator, and a second filtrate delivery pump is arranged between the discharge port of the second filtrate transfer tank and the feed port of the first effect evaporator.
Preferably, still include neutralization sediment stuff pump, heavy copper thick liquids delivery pump, slurrying washing sediment stuff pump and wash water delivery pump, neutralization sediment stuff pump sets up between neutralization sediment groove discharge gate and neutralization sediment membrane filter press feed inlet, heavy copper thick liquids delivery pump sets up between heavy copper groove discharge gate and heavy copper thick liquids membrane filter press feed inlet, slurrying washing sediment stuff pump sets up between slurrying washing groove discharge gate and washing formula membrane filter press feed inlet, wash water delivery pump sets up between washing transfer groove discharge gate and neutralization sediment groove feed inlet, washing formula membrane filter press water inlet connects water pipeline.
Preferably, still include leaching pulp pump, sediment delivery pump and clear solution delivery pump, the leaching pulp pump sets up between leaching tank leachate export and swash plate clarification tank leachate import, the sediment delivery pump sets up between the thick liquid export on the swash plate clarification tank bottom and leaching tank inlet, the clear solution delivery pump sets up between clear solution export and the first precision filter inlet on swash plate clarification tank upper portion.
Preferably, still include organic phase delivery pump, raffinate delivery pump, wash water pump and electricity rich liquid delivery pump, organic phase delivery pump sets up between organic phase export of organic phase groove and one-level extraction tank feed inlet, raffinate delivery pump sets up between raffinate groove liquid outlet and leaching tank inlet, wash water pump sets up respectively between washing liquid export and the organic phase washing tank washing water inlet of load on the organic phase washing tank and between the washing liquid export and the organic phase washing tank washing liquid import of regeneration on the organic phase washing tank of load, electricity rich liquid delivery pump sets up between electricity rich liquid groove liquid outlet and second precision filter inlet.
Preferably, still include flowing back pump, circulating pump and electrodeposition tank flowing back pump, the flowing back pump sets up between electric liquid accumulation circulation tank electricity barren liquor leakage mouth and second grade strip groove inlet, the circulating pump sets up between electric liquid accumulation circulation tank electricity rich liquor leakage mouth and torrent electrodeposition tank inlet, the electrodeposition tank flowing back pump sets up between torrent electrodeposition tank liquid outlet and electric liquid accumulation circulation tank inlet.
Preferably, the neutralization slag settling tank, the copper settling tank, the slurrying washing tank, the leaching tank, the primary extraction tank, the secondary extraction tank, the loaded organic phase washing tank, the regenerated organic phase washing tank, the primary stripping tank and the secondary stripping tank are all provided with a stirrer.
Preferably, an inclined plate layer is arranged in the inclined plate clarifying tank, and the inclination of the inclined plates in the inclined plate layer is sequentially increased from the middle to two sides.
Preferably, the torrent electrodeposition tank includes 4 torrent electrodeposition units that connect side by side, the equidistance is provided with a plurality of negative plates and the positive plate of mutual interval in proper order in the electrodeposition circulation inslot, and the positive plate is more one than the negative plate, adjacent positive plate, the hydrops and torrent electrodeposition unit form the return circuit.
The utility model has the advantages that: the utility model discloses a sediment washing, leaching system, extraction purification and torrent electrodeposition and air purification system combine together, and the salt solution that produces in the processing procedure gets into triple effect evaporation system and heats the evaporation process, produces industry sodium chloride, and sour gas is unified to be collected, by air purification system centralized processing, and electrolysis cathode copper is final product, can handle 3000 tons of acid etching solution, production cathode copper 300 tons every year on average. The utility model discloses a technique can not only promote environmental protection, also can realize the recovery processing of resource simultaneously.
Drawings
FIG. 1 is a schematic view of a sediment washing system according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a leaching system in an embodiment of the present invention;
FIG. 3 is a schematic view of an extraction purification system according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a turbulent electrodeposition system in an embodiment of the present invention;
fig. 5 is a schematic view of the middle triple effect evaporation system of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
Referring to fig. 1-5, the utility model discloses a system for retrieving copper from acid etching solution, including sediment washing system, leaching system, extraction purification system and torrent electrodeposition system, sediment washing system includes neutralization sediment groove 1, neutralization sediment membrane filter press 2, copper precipitation groove 4, copper precipitation thick liquids membrane filter press 5, slurrying wash tank 7, washing formula membrane filter press 8 that connect gradually through the conveying pipeline, the filter residue export on neutralization sediment membrane filter press 2 bottom and the filter residue export on copper precipitation thick liquids membrane filter press 5 bottom are connected to slurrying wash tank 7 through the conveying pipeline respectively, slurrying wash tank 7 is connected with washing formula membrane filter press 8 through the conveying pipeline, the washing liquid export on washing formula membrane filter press 8 is connected to washing water rotary tank 9 through the conveying pipeline, washing water rotary tank 9 links back to neutralization sediment groove 1, a filter residue outlet on the bottom of the washing type membrane filter press 8 is connected to a leaching tank 10 in a leaching system through a feeding pipeline,
the leaching system also comprises an inclined plate clarifying tank 11 and a precision filter 12, a leachate outlet at the bottom of the leaching tank 10 is connected with the inclined plate clarifying tank 11 through a feeding pipeline, a slurry outlet at the bottom of the inclined plate clarifying tank 11 is connected back to the leaching tank 10 through a feeding pipeline, a clear liquid outlet at the upper end of the inclined plate clarifying tank 11 is connected with the first precision filter 12 through a feeding pipeline, a leachate outlet on the first precision filter 12 is connected to a first-stage extraction tank 19 in the extraction and purification system through a feeding pipeline,
the extraction and purification system also comprises a secondary extraction tank 20, a loaded organic phase washing tank 21, a regenerated organic phase washing tank 22, a primary stripping tank 23, a secondary stripping tank 24, an organic phase tank 28, a regenerated organic phase washing tank 27, a loaded organic phase washing tank 26, an electro-pregnant solution tank 25 and a raffinate tank 29, wherein the primary extraction tank 19 is connected with the secondary extraction tank 20, a loaded organic phase outlet on the secondary extraction tank 20 is connected with the loaded organic phase washing tank 21 through a feeding pipeline, a raffinate outlet on the bottom of the secondary extraction tank is connected with the raffinate tank 29 through a feeding pipeline, an organic phase outlet on the loaded organic phase washing tank 21 is connected with the primary stripping tank 23 through a feeding pipeline, a washing solution outlet on the bottom of the secondary extraction tank is connected with the loaded organic phase washing tank 26 through a feeding pipeline, a washing solution outlet on the loaded organic phase washing tank 26 is connected with the regenerated organic phase washing tank 22 through a feeding pipeline, the regenerated organic phase outlet on the first-stage stripping groove 23 is connected with the second-stage stripping groove 24 through a feeding pipeline, the electric rich liquid outlet on the bottom of the second-stage stripping groove is connected with the electric rich liquid groove 25, the regenerated organic phase outlet on the second-stage stripping groove 24 is connected with the regenerated organic phase washing groove 22 through a feeding pipeline, the electric rich liquid outlet on the bottom of the second-stage stripping groove is connected back to the first-stage stripping groove 23 through a feeding pipeline, the regenerated organic phase outlet on the regenerated organic phase washing groove 22 is connected to the organic phase groove 28 through a feeding pipeline, the washing liquid outlet on the bottom of the regenerated organic phase washing groove 27 is connected to the regenerated organic phase washing groove 27 through a feeding pipeline, the washing liquid outlet on the regenerated organic phase washing groove 27 is connected with the loaded organic phase washing groove 21 through a feeding pipeline, and the organic phase outlet on the organic phase groove 28,
an electric rich liquid outlet on the electric rich liquid groove 25 is connected with a second precision filter 30 in the turbulent flow electrodeposition system through a feeding pipeline, the turbulent flow electrodeposition system further comprises an electric effusion circulation groove 31, a turbulent flow electrodeposition groove 32, a gas-liquid separator 33 and an air filter 34, the second precision filter 30 is connected with the electric effusion circulation groove 31, an electric barren liquid outlet on the bottom of the electric effusion circulation groove 31 is connected into the second-stage back extraction groove 24 through a feeding pipeline, and the electric effusion circulation groove 31 is connected with the turbulent flow electrodeposition groove 32 to form a circulation loop.
Still include triple effect evaporation system, triple effect evaporation system includes one effect evaporimeter 13, two effect evaporimeter 15, three effect evaporimeter 17, one effect separator 14, two effect separator 16 and three effect separator 18, the steam inlet connection steam house steward of one effect evaporimeter 13, one effect evaporimeter 13 steam exit linkage one effect separator 14, one effect separator 14 steam exit linkage two effect evaporimeter 15, connect gradually to three effect evaporimeter 17, the filtrate inlet pipe is connected to one effect evaporimeter 13 feed inlet, and the discharge gate connects one effect separator 14 feed inlet, and one effect separator 14 discharge gate connects two effect evaporimeter 15 feed inlets, and two effect separator 16 feed inlets are connected to two effect evaporimeter 15 discharge gates, connects gradually to three effect separator 18, and three effect evaporimeter 13, 15, 17 bottom discharge gate connect the desicator jointly.
The device is characterized by further comprising a first filtrate transfer tank 3 and a second filtrate transfer tank 6, wherein the first filtrate transfer tank 3 is arranged between a discharge port of the neutralization sediment membrane filter press 2 and a feed port of the copper precipitation tank 4, a first filtrate delivery pump 36 is arranged between a discharge port of the first filtrate transfer tank 3 and a feed port of the copper precipitation tank 4, the second filtrate transfer tank 6 is arranged between a discharge port of the copper precipitation slurry membrane filter press 5 and a feed port of the first effect evaporator 13, and a second filtrate delivery pump 38 is arranged between a discharge port of the second filtrate transfer tank 6 and a feed port of the first effect evaporator 13.
Still include neutralization slurry pump 35, heavy copper thick liquids delivery pump 37, slurrying washing slurry pump 39 and wash water delivery pump 40, neutralization slurry pump 35 sets up between 1 discharge gate in neutralization sediment groove and 2 feed inlets of neutralization sediment membrane filter press, heavy copper thick liquids delivery pump 37 sets up between 4 discharge gates in heavy copper groove and 5 feed inlets of heavy copper thick liquids membrane filter press, slurrying washing slurry pump 39 sets up between 7 discharge gates in slurrying wash groove and 8 feed inlets of washing formula membrane filter press, wash water delivery pump 40 sets up between 9 discharge gates in wash water transfer groove and 1 feed inlets in neutralization sediment groove, water pipeline is connected to 8 water inlets of washing formula membrane filter press.
Still include leaching pulp pump 41, sediment delivery pump 42 and clear solution delivery pump 43, leaching pulp pump 41 sets up between leaching tank 10 leachate export and the import of the 11 leachate of swash plate clarifier tank, sediment delivery pump 42 sets up between the thick liquid export on the swash plate clarifier tank 11 bottom and leaching tank 10 inlet, clear solution delivery pump 43 sets up between the clear solution export on swash plate clarifier tank 11 upper portion and first precision filter 12 inlet.
Still include organic phase delivery pump 44, raffinate delivery pump 45, wash water pump 46 and electricity rich liquid delivery pump 47, organic phase delivery pump 44 sets up between organic phase export of organic phase groove 28 and the first-order extraction tank 19 feed inlet, raffinate delivery pump 45 sets up between raffinate cistern 29 liquid outlet and leaching tank 10 inlet, wash water pump 46 sets up respectively between washing liquid export and the load organic phase washing tank 21 washing water inlet on regeneration organic phase washing tank 27 and between the washing liquid export on the load organic phase washing tank 26 and the washing liquid import of regeneration organic phase washing tank 22, electricity rich liquid delivery pump 47 sets up between electricity rich liquid groove 25 liquid outlet and second precision filter 30 inlet.
Still include positive displacement pump 49, circulating pump 48 and electrodeposition tank positive displacement pump 47, positive displacement pump 49 sets up between electric liquid accumulation circulation tank 31 electricity barren liquor leakage mouth and second grade strip groove 24 inlet, circulating pump 48 sets up between electric liquid accumulation circulation tank 31 electricity barren liquor leakage mouth and torrent electrodeposition tank 32 inlet, electrodeposition tank positive displacement pump 47 sets up between torrent electrodeposition tank 32 outlet and electric liquid accumulation tank 31 inlet.
And stirrers are arranged on the neutralization slag precipitation tank 1, the copper precipitation tank 4, the slurrying washing tank 7, the leaching tank 10, the primary extraction tank 19, the secondary extraction tank 20, the loaded organic phase washing tank 21, the regenerated organic phase washing tank 22, the primary stripping tank 23 and the secondary stripping tank 24.
The inclined plate clarifying tank 11 is internally provided with an inclined plate layer, and the inclination of the inclined plate in the inclined plate layer is increased from the middle to two sides in sequence.
Turbulent flow electrodeposition cell 32 is including 4 turbulent flow electrodeposition units of connecting side by side, and wherein the equidistance is provided with a plurality of negative plates and the anode plate of mutual interval in proper order, and the anode plate is more one than the negative plate, adjacent anode plate, hydrops and turbulent flow electrodeposition unit form the return circuit with it.
The working principle is as follows: the acid etching solution contains a large amount of hydrochloric acid, firstly, sodium carbonate and water are added into a neutralization and residue settling tank 1 to carry out slurrying operation, then, the acid etching solution, sodium hydroxide and sodium carbonate are slowly added, the reaction tank is controlled to be always in an alkaline system in the process, the pH value of a reaction end point is controlled to be 6.0-6.5, most of copper is enabled to generate basic copper oxide precipitate, and the materials are fed into a discharge port of the neutralization and residue settling tank 1 and a neutralization and residue diaphragm filter press 2A neutralization slurry pump 35 is arranged between the openings, the neutralization slurry pump 35 conveys basic copper oxide to a neutralization sediment diaphragm filter press 2 for filtration and washing, washing water is an aqueous solution of sodium chloride, the filtered filtrate automatically flows to a first filtrate transfer tank 3, a first filtrate conveying pump 36 is arranged between a discharge opening of the first filtrate transfer tank 3 and a feed opening of a copper precipitation tank 4, the first filtrate conveying pump 36 conveys the filtrate to the copper precipitation tank 4, sodium hydroxide and sodium sulfide are added into the copper precipitation tank 4 for copper precipitation, a copper precipitation slurry conveying pump 37 is arranged between a discharge opening of the copper precipitation tank 4 and a feed opening of the copper precipitation slurry diaphragm filter press 5, the copper precipitation slurry conveying pump 37 conveys the slurry to the copper precipitation slurry diaphragm filter press 5 for filtration and washing, supernatant automatically flows to a second filtrate transfer tank 6, a second filtrate conveying pump 38 is arranged between a discharge opening of the second filtrate transfer tank 6 and a feed opening of an evaporator 13, the second filtrate delivery pump 38 delivers the clear liquid to a triple-effect evaporation system for evaporation and crystallization, the filter residue filtered by the neutralization sediment membrane filter press 2 and the copper precipitation slurry membrane filter press 5 is delivered to a slurrying washing tank 7, water is added for slurrying and washing, a slurrying washing slurry pump 39 is arranged between the discharge port of the slurrying washing tank 7 and the feed port of the washing membrane filter press 8, the slurrying washing slurry pump 39 delivers the slurrying liquid to the washing membrane filter press 8 for washing and dechlorination, the dechlorinated washing water is discharged to a washing water rotary tank 9, a washing water delivery pump 40 is arranged between the water outlet of the washing water rotary tank and the liquid inlet of the neutralization sediment tank, the washing water delivery pump 40 delivers the washing water to the neutralization sediment tank 1 for recycling, the dechlorinated copper slag is delivered to a leaching tank 10, sulfuric acid and water are added to dissolve the copper slag together with the raffinate returned by the extraction and purification system, circularly stirring and leaching by adopting a stirrer, arranging a leaching slurry pump 41 between a leaching solution outlet of the leaching tank 10 and a leaching solution inlet of the inclined plate clarifying tank 11, conveying the leaching solution into the inclined plate clarifying tank 11 by the leaching slurry pump 41 for inclined plate sedimentation, wherein the inclined plate sedimentation volume is 5m3Overflow 1m3A 3000 × 1000 × 2000PP tank, a bottom slurry delivery pump 42 is arranged between the slurry outlet on the bottom of the inclined plate clarifying tank 11 and the liquid inlet of the leaching tank 10, and the bottom slurry delivery pump 42 delivers the bottom slurry to the leaching tankA clear liquid conveying pump 43 is arranged between a clear liquid outlet at the upper part of the inclined plate clarifying tank 11 and a liquid inlet of the first precision filter 12, the clear liquid conveying pump 43 conveys the clear liquid to the first precision filter 12 for filtration, the leachate enters the first-stage extraction tank 19 and the second-stage extraction tank 20 in sequence, 2-stage extraction is carried out to obtain a loaded organic phase and raffinate, the raffinate is discharged into a raffinate tank 29, a raffinate conveying pump 45 is arranged between a liquid outlet of the raffinate tank 29 and a liquid inlet of the leaching tank 10, the raffinate conveying pump 45 conveys the raffinate into the leaching tank 10, the obtained loaded organic phase is conveyed into a loaded organic phase washing tank 21 for washing to obtain an organic phase and washing liquid, the washing liquid is discharged into a loaded organic phase washing tank 26, a washing water pump 46 is arranged between a washing liquid outlet on the loaded organic phase washing tank 26 and a washing liquid inlet of the regenerated organic phase washing tank 22, the washing water pump 46 conveys the washing liquid into the regenerated organic phase washing tank 22, the organic phase obtained in the loaded organic phase washing tank is conveyed into the primary stripping tank 23 to be mixed with the stripping agent, the mixture is stirred and kept stand, the phase separation is carried out to obtain a regenerated organic phase and a water phase, the obtained regenerated organic phase is conveyed into the secondary stripping tank 24 to be merged with the electrobarren solution returned by the turbulent electrodeposition system as the stripping agent, the regenerated organic phase and the water phase obtained by the phase separation are stirred and kept stand, the obtained organic phase is conveyed into the regenerated organic phase washing tank 22 to be washed, the obtained organic phase is discharged into the organic phase tank 28, the washing water is discharged into the regenerated organic phase washing tank 27, the organic phase conveying pump 44 is arranged between the organic phase outlet of the organic phase tank 28 and the feeding port of the primary extraction tank 19, the organic phase conveying pump 44 conveys the organic phase into the primary extraction tank 19 to be extracted circularly, and the washing water inlet of the loaded organic phase washing tank 21 is arranged between the washing water outlet of the regenerated organic phase washing tank 27 A washing water pump 46 is arranged, and the washing water pump 46 conveys the washing liquid into the loaded organic phase washing tank 21 for recycling;
the electric rich liquid obtained by the first-stage stripping tank 23 is conveyed into the electric rich liquid tank 25, an electric rich liquid conveying pump 47 is arranged between the liquid outlet of the electric rich liquid tank 25 and the liquid inlet of the second precision filter 30, the electric rich liquid conveying pump 47 conveys the electric rich liquid to the second precision filter 30 for filtering, and the stripping liquid in the second-stage stripping tank 24 is conveyed into the first-stage stripping tank 23 for recycling;
firstly, the electrobarren solution in the electrowinning circulation tank 31 is discharged into the secondary stripping tank 24 for recycling, then the electrorich solution filtered by the second precision filter 30 is discharged into the electrowinning circulation tank 31, and the electrorich solution in the electrowinning circulation tank is sent into the turbulent flow electrowinning tank through the circulation pump 48 to produce cathode copper by turbulent flow electrodeposition.
The utility model discloses a sediment washing, leaching system, extraction purification and torrent electrodeposition and air purification system combine together, and the salt solution that produces in the processing procedure gets into triple effect evaporation system and heats the evaporation process, and output industry sodium chloride, sour gas are unified to be collected, by air purification system centralized processing, and electrolysis cathode copper is final product, can handle 3000 tons of acid etching solution, production cathode copper 300 tons every year on average. The utility model discloses a technique can not only promote environmental protection, also can realize the recovery processing of resource simultaneously.
While the present invention has been described in detail with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art.
Claims (10)
1. A system for recovering copper from an acidic etching solution is characterized by comprising a sediment washing system, a leaching system, an extraction and purification system and a turbulent electrodeposition system, wherein the sediment washing system comprises a neutralization sediment tank, a neutralization sediment membrane filter press, a copper precipitation tank, a copper precipitation slurry membrane filter press, a slurrying washing tank and a washing type membrane filter press which are sequentially connected through a feeding pipeline, a filter residue outlet on the bottom of the neutralization sediment membrane filter press and a filter residue outlet on the bottom of the copper precipitation slurry membrane filter press are respectively connected to the slurrying washing tank through feeding pipelines, the slurrying washing tank is connected with the washing type membrane filter press through the feeding pipeline, a washing liquid outlet on the washing type membrane filter press is connected to a washing water rotary tank through the feeding pipeline, the washing water rotary tank is connected back to the neutralization sediment tank, a filter residue outlet on the bottom of the washing type membrane filter press is connected to a leaching tank in the leaching system through the feeding pipeline,
the leaching system also comprises an inclined plate clarifying tank and a precision filter, a leachate outlet at the bottom of the leaching tank is connected with the inclined plate clarifying tank through a feeding pipeline, a slurry outlet at the bottom of the inclined plate clarifying tank is connected back to the leaching tank through a feeding pipeline, a clear liquid outlet at the upper end of the inclined plate clarifying tank is connected with the first precision filter through a feeding pipeline, a leachate outlet on the first precision filter is connected to a first-stage extraction tank in the extraction and purification system through a feeding pipeline,
the extraction and purification system also comprises a secondary extraction tank, a loaded organic phase washing tank, a regenerated organic phase washing tank, a primary stripping tank, a secondary stripping tank, an organic phase tank, a regenerated organic phase washing tank, a loaded organic phase washing tank, an electric pregnant solution tank and a raffinate tank, wherein the primary extraction tank is connected with the secondary extraction tank, a loaded organic phase outlet on the secondary extraction tank is connected with the loaded organic phase washing tank through a feeding pipeline, a raffinate outlet on the bottom of the secondary extraction tank is connected with the raffinate tank through a feeding pipeline, an organic phase outlet on the loaded organic phase washing tank is connected with the primary stripping tank through a feeding pipeline, a washing liquid outlet on the bottom of the primary stripping tank is connected with the loaded organic phase washing tank through a feeding pipeline, a washing liquid outlet on the loaded organic phase washing tank is connected with the regenerated organic phase washing tank through a feeding pipeline, a regenerated organic phase outlet on the primary stripping tank is connected with the secondary stripping tank through a feeding pipeline, an electric rich liquid outlet on the bottom of the device is connected to an electric rich liquid tank, a regenerated organic phase outlet on the secondary stripping tank is connected with a regenerated organic phase washing tank through a feeding pipeline, an electric rich liquid outlet on the bottom of the device is connected back to the primary stripping tank through a feeding pipeline, a regenerated organic phase outlet on the regenerated organic phase washing tank is connected to an organic phase tank through a feeding pipeline, a washing liquid outlet on the bottom of the device is connected to a regenerated organic phase washing tank through a feeding pipeline, a washing liquid outlet on the regenerated organic phase washing tank is connected with a loaded organic phase washing tank through a feeding pipeline, an organic phase outlet on the organic phase tank is connected back to the primary extraction tank through a feeding pipeline,
an electric rich liquid outlet on the electric rich liquid groove is connected with a second precision filter in the turbulent flow electrodeposition system through a feeding pipeline, the turbulent flow electrodeposition system further comprises an electric effusion circulation groove, a turbulent flow electrodeposition groove, a gas-liquid separator and an air filter, the second precision filter is connected with the electric effusion circulation groove, an electric barren liquid outlet on the bottom of the electric effusion circulation groove is connected into a secondary back-extraction groove through a feeding pipeline, and the electric effusion circulation groove and the turbulent flow electrodeposition groove are connected to form a circulation loop.
2. The system for recycling copper from acid etching solution according to claim 1, further comprising a triple-effect evaporation system, wherein the triple-effect evaporation system comprises a single-effect evaporator, a double-effect evaporator, a triple-effect evaporator, a single-effect separator, a double-effect separator and a triple-effect separator, the steam inlet of the single-effect evaporator is connected with the steam header pipe, the steam outlet of the single-effect evaporator is connected with the single-effect separator, the steam outlet of the single-effect evaporator is connected with the double-effect evaporator, the single-effect evaporator is sequentially connected with the triple-effect evaporator, the feed inlet of the single-effect evaporator is connected with the filtrate feed inlet, the discharge outlet is connected with the feed inlet of the single-effect separator, the discharge outlet of the double-effect evaporator is connected with the double-effect separator, the bottom.
3. The system for recovering copper from acidic etching solution according to claim 1, further comprising a first filtrate transfer tank and a second filtrate transfer tank, wherein the first filtrate transfer tank is arranged between a discharge port of the neutralization and sedimentation membrane filter press and a feed port of the copper precipitation tank, a first filtrate delivery pump is arranged between the discharge port of the first filtrate transfer tank and the feed port of the copper precipitation tank, the second filtrate transfer tank is arranged between a discharge port of the copper precipitation slurry membrane filter press and a feed port of the first effect evaporator, and a second filtrate delivery pump is arranged between the discharge port of the second filtrate transfer tank and the feed port of the first effect evaporator.
4. The system for recovering copper from an acidic etching solution according to claim 1, further comprising a neutralization slurry pump, a copper precipitation slurry delivery pump, a slurrying washing slurry pump and a washing water delivery pump, wherein the neutralization slurry pump is arranged between a discharge port of the neutralization sludge tank and a feed port of the neutralization sludge membrane filter press, the copper precipitation slurry delivery pump is arranged between a discharge port of the copper precipitation tank and a feed port of the copper precipitation slurry membrane filter press, the slurrying washing slurry pump is arranged between a discharge port of the slurrying washing tank and a feed port of the washing membrane filter press, the washing water delivery pump is arranged between a discharge port of the washing water transfer tank and a feed port of the neutralization sludge tank, and a water inlet of the washing membrane filter press is connected with a tap water pipeline.
5. The system for recovering copper from an acidic etching solution according to claim 1, further comprising a slurry pump disposed between the leaching tank leachate outlet and the inclined plate clarifier tank leachate inlet, a bottom slurry pump disposed between the slurry outlet on the inclined plate clarifier tank bottom and the leaching tank liquid inlet, and a clear solution pump disposed between the clear solution outlet on the inclined plate clarifier tank upper portion and the first precision filter liquid inlet.
6. The system for recovering copper from an acidic etching solution according to claim 1, further comprising an organic phase transfer pump, a raffinate transfer pump, a wash water pump and an electric rich solution transfer pump, wherein the organic phase transfer pump is arranged between a discharge port of the organic phase tank and a feed port of the primary extraction tank, the raffinate transfer pump is arranged between a liquid outlet of the raffinate tank and a liquid inlet of the leaching tank, the wash water pump is respectively arranged between a wash liquid outlet on the regenerated organic phase wash tank and a wash water inlet of the loaded organic phase wash tank and between a wash liquid outlet on the loaded organic phase wash tank and a wash liquid inlet of the regenerated organic phase wash tank, and the electric rich solution transfer pump is arranged between a liquid outlet of the electric rich solution tank and a liquid inlet of the second precision filter.
7. The system for recovering copper from an acidic etching solution according to claim 1, further comprising a drain pump, a circulating pump and an electrowinning cell drain pump, wherein the drain pump is arranged between the electrowinning cell electroleaner liquid drain and the second-stage stripping cell inlet, the circulating pump is arranged between the electrowinning cell electrowinning liquid drain and the turbulent electrowinning cell inlet, and the electrowinning cell drain pump is arranged between the turbulent electrowinning cell outlet and the electrowinning cell inlet.
8. The system for recovering copper from an acidic etching solution according to claim 1, wherein the neutralization and slag precipitation tank, the copper precipitation tank, the slurrying and washing tank, the leaching tank, the primary extraction tank, the secondary extraction tank, the loaded organic phase washing tank, the regenerated organic phase washing tank, the primary stripping tank and the secondary stripping tank are respectively provided with a stirrer.
9. The system according to claim 1, wherein a sloping plate layer is provided in the sloping plate clarification tank, and the inclination of the sloping plate in the sloping plate layer increases from the middle to both sides.
10. The system for recovering copper from an acidic etching solution according to claim 1, wherein the turbulent electrodeposition tank comprises 4 turbulent electrodeposition units connected side by side, a plurality of cathode plates and anode plates which are sequentially spaced from each other are arranged in the electrodeposition circulating tank at equal intervals, the number of the anode plates is one more than that of the cathode plates, and the cathode plates, the anode plates adjacent to the cathode plates, the electrodeposition solution and the turbulent electrodeposition units form a loop.
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| CN201922302692.6U CN211339694U (en) | 2019-12-19 | 2019-12-19 | System for retrieve copper in follow acid etching solution |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112646975A (en) * | 2020-12-17 | 2021-04-13 | 紫金矿业集团股份有限公司 | Treatment method for reducing and recycling copper ore acid raffinate |
| CN113603130A (en) * | 2021-08-17 | 2021-11-05 | 湖南德邦生物科技有限公司 | Preparation method for crystal modification in basic copper chloride synthesis |
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2019
- 2019-12-19 CN CN201922302692.6U patent/CN211339694U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112646975A (en) * | 2020-12-17 | 2021-04-13 | 紫金矿业集团股份有限公司 | Treatment method for reducing and recycling copper ore acid raffinate |
| CN112646975B (en) * | 2020-12-17 | 2021-11-05 | 紫金矿业集团股份有限公司 | Treatment method for reducing and recycling copper ore acid raffinate |
| CN113603130A (en) * | 2021-08-17 | 2021-11-05 | 湖南德邦生物科技有限公司 | Preparation method for crystal modification in basic copper chloride synthesis |
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