CN210856323U - Magnetron sputtering coating equipment - Google Patents
Magnetron sputtering coating equipment Download PDFInfo
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- CN210856323U CN210856323U CN201921005002.4U CN201921005002U CN210856323U CN 210856323 U CN210856323 U CN 210856323U CN 201921005002 U CN201921005002 U CN 201921005002U CN 210856323 U CN210856323 U CN 210856323U
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Abstract
The utility model relates to a photovoltaic equipment technical field, concretely relates to magnetron sputtering coating equipment. The embodiment of the utility model provides a magnetron sputtering coating equipment, including wasing cavity and coating film cavity, wash the intracavity and be equipped with plasma belt cleaning device, the substrate adopts the plasma bombardment mode to wash, need not use organic solvent, and plasma can go deep into the interior completion cleaning task of the micropore hole of object and sunken, and whole cleaning process can accomplish in a few minutes, can make the cleaning efficiency obtain very big improvement; meanwhile, hazardous organic solvent cleaning agents are avoided, and treatment measures such as transportation, storage, discharge and the like of the cleaning solution are also avoided; and the first sample platform is provided with a plurality of, and single evacuation just can wash and the coating operation to a plurality of substrates like this, compares with the coating film of each present substrate all opens the chamber, closes the chamber, the mode of evacuation, has reduced the number of times of switch coating cavity, has improved coating film output efficiency.
Description
Technical Field
The utility model relates to a photovoltaic equipment technical field, concretely relates to magnetron sputtering coating equipment.
Background
CIGS thin film solar cells have the advantages of good stability, high photoelectric conversion efficiency, good low-light performance, and the like, and are increasingly favored by the industry. The back electrode layer of the CIGS thin film solar cell is the lowest layer of the CIGS thin film solar cell and is directly formed on a substrate, and the absorption layer material of the solar cell is directly deposited on the back electrode layer. Therefore, the back electrode layer is selected to have good ohmic contact with the absorption layer, and the interface state between the back electrode layer and the absorption layer is reduced as much as possible; meanwhile, the conductive film is used as the bottom electrode of the whole battery and plays a role in outputting the power of the battery, so that the conductive film has good conductivity.
Through a large amount of research and practical demonstration, metal Mo is the best choice for the back electrode layer of the CIGS thin-film solar cell. The Mo metal has stable physical and chemical properties, and can resist high temperature and corrosion in the preparation process of the CIGS thin film solar cell; the Mo film prepared by magnetron sputtering has glossy surface and higher reflection effect on light, and can further enhance the absorption of a CIGS absorption layer on the light; the metal Mo has low resistivity, has good ohmic contact with the CIGS layer, and can reduce the carrier recombination of Mo and the CIGS interface state, thereby improving the photoelectric conversion performance of the cell.
At present, Mo films are generally prepared by a direct-current magnetron sputtering method, and the continuous preparation process comprises the following steps: cleaning, sample conveying, vacuumizing, coating, breaking vacuum, sampling and the like; in the cleaning procedure, firstly, the surface of the substrate is washed by clean water, then the substrate is placed into a specific container and is soaked by an organic solvent for a period of time, then the surface of the glass is cleaned by the organic solvent, and then the residual organic solvent on the surface is washed by the clean water for later use; the cleaning step involves the use of organic solvent, needs to soak, wash with clear water and dry, and has the disadvantages of multiple steps, long time consumption and harm to human body after long-time contact; in addition, during continuous deposition of the film, cavity opening, cavity closing and vacuum pumping are required for sampling every time, so that the time of a coating process is prolonged, and the film preparation efficiency is very low.
SUMMERY OF THE UTILITY MODEL
The utility model discloses (one) the technical problem that solve is: the existing magnetron sputtering coating equipment needs the steps of soaking with an organic solvent, washing with clear water, drying and the like in a cleaning procedure, has multiple steps and long consumed time, is harmful to human bodies due to long-time contact with the organic solvent, and needs to open a cavity, close the cavity and vacuumize every time of sample delivery and sampling when a film is continuously deposited, so that the time of a coating procedure is prolonged, and the preparation efficiency of the film is very low.
(II) technical scheme
In order to solve the technical problem, an embodiment of the present invention provides a magnetron sputtering coating device, which includes a cleaning chamber, a coating chamber and a gate valve, wherein the cleaning chamber and the coating chamber are connected through a communication door, and the gate valve is used for opening or closing the communication door;
a first conveying mechanism, a plasma cleaning device, a sample rack and a plurality of first sample tables are arranged in the cleaning chamber, and each first sample table is used for placing one sample rack; the plurality of first sample tables can be driven by a driving mechanism to lift so as to place the sample rack on the first sample table on a first conveying mechanism;
a target material, a second conveying mechanism and a plurality of second sample tables are arranged in the coating cavity, and the target material is positioned on the lower side of the second conveying mechanism; each second sample table is used for placing one sample rack; the second sample table can be driven by the driving mechanism to lift so as to load the sample rack on the second conveying mechanism onto the second sample table;
the bearing surfaces of the first conveying mechanism and the second conveying mechanism are opposite, so that the sample rack can be transferred on the first conveying mechanism and the second conveying mechanism.
According to an embodiment of the present invention, a first supporting frame is disposed in the cleaning chamber and located above the first conveying mechanism, one end of each of the plurality of first sample stations is connected to the first supporting frame, and the plurality of first sample stations are parallel to each other and spaced apart from each other; the driving mechanism is connected with the first support frame and used for driving the first support frame to move up and down;
a second supporting frame positioned on the upper side of the second conveying mechanism is arranged in the coating chamber, one end of each of the second sample stages is connected with the second supporting frame, and the second sample stages are parallel to each other and arranged at intervals; the driving mechanism is connected with the second support frame and used for driving the second support frame to move up and down.
According to an embodiment of the present invention, the first sample stage and the second sample stage are plate-like structures.
According to an embodiment of the present invention, the first conveying mechanism includes two first chains parallel to each other, a first gap is formed between the two first chains, and the first sample stage is correspondingly located at an upper side of the first gap;
the second conveying mechanism comprises two second chains which are parallel to each other, a second gap is formed between the two second chains, and the second sample stage is located on the upper side of the second gap.
According to an embodiment of the invention, the width of the first gap equals the width of the second gap.
According to the utility model discloses an embodiment, the sample frame is including the middle body that forms the through-hole, form the mounting groove that is used for supporting the substrate on the body, be equipped with a plurality of bolts on the body, the bolt be used for with first chain and second chain cooperation.
According to the utility model discloses an embodiment, the body is the rectangular frame that the middle part formed the through-hole, rectangular frame's inboard is equipped with the mounting panel, the mounting panel with form between the frame the mounting groove.
According to the utility model discloses an embodiment, rectangular frame's relative both sides all are equipped with the bolt, the bolt perpendicular to rectangular frame.
According to an embodiment of the present invention, the sample holder further comprises a fixing bolt, the fixing bolt is connected to the body, and the fixing bolt is used for pressing the substrate onto the rectangular frame.
According to the utility model discloses an embodiment, be equipped with the locating plate on the body.
The utility model has the advantages that: the embodiment of the utility model provides a magnetron sputtering coating equipment, including wasing cavity and coating film cavity, wash the intracavity and be equipped with plasma belt cleaning device, the substrate adopts the plasma bombardment mode to wash, need not use organic solvent, and plasma can go deep into the interior completion cleaning task of the micropore hole of object and sunken, and whole cleaning process can accomplish in a few minutes, can make the cleaning efficiency obtain very big improvement; meanwhile, hazardous organic solvent cleaning agents are avoided, and treatment measures such as transportation, storage, discharge and the like of the cleaning solution are also avoided;
meanwhile, in the plasma cleaning process, the substrate is placed on the first sample table, then the first sample table is lowered to place the substrate on the first conveying mechanism for plasma cleaning, and compared with the cleaning procedures of organic solvent soaking, clear water washing and drying in the prior art, the magnetron sputtering coating equipment provided by the application has the advantages that the cleaning procedure of the substrate is simpler, and the cleaning efficiency is higher; after the substrate is cleaned in the cleaning cavity, the substrate enters the film coating cavity to be coated, the cleaned substrate does not need to be manually carried into the film coating cavity, the time required by the cleaning and film coating of the whole substrate can be saved, and the efficiency is improved; and the first sample platform is provided with a plurality of, and single evacuation just can wash and the coating operation to a plurality of substrates like this, compares with the coating film of each present substrate all need open the chamber, close the chamber, the mode of evacuation, has reduced the number of times of switch coating chamber, has improved coating film output efficiency.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic structural diagram of a magnetron sputtering coating apparatus according to an embodiment of the present application;
fig. 2 is a schematic structural diagram of a sample holder according to an embodiment of the present application.
Wherein the corresponding relations between the reference numbers and the names of the components in fig. 1 and 2 are as follows:
1. cleaning chamber, 11, first support frame, 12, first sample table, 13, sample holder, 131, body, 132, bolt, 133, fixing bolt, 134, mounting groove, 135, positioning plate, 14, chamber door, 15, first chain, 2, coating chamber, 21, second support frame, 22, second sample table, 23, second chain, 24, target, 3 and gate valve.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention more clearly understood, the present invention will be described in further detail with reference to the accompanying drawings and detailed description. It should be noted that the embodiments and features of the embodiments of the present application may be combined with each other without conflict.
As shown in fig. 1, according to an embodiment of the present application, there is provided a magnetron sputtering coating apparatus including a cleaning chamber 1, a coating chamber 2, and a gate valve 3, the cleaning chamber 1 and the coating chamber 2 being connected by a communication door, the gate valve 3 being used to open or close the communication door;
a first conveying mechanism, a plasma cleaning device, a sample rack 13 and a plurality of first sample tables 12 are arranged in the cleaning chamber 1, and each first sample table 12 is used for placing one sample rack 13; a plurality of the first sample stages 12 can be lifted and lowered by a driving mechanism to place the sample rack 13 on the first sample stage 12 on a first transport mechanism;
a target 24, a second conveying mechanism and a plurality of second sample tables 22 are arranged in the coating chamber 2, and the target 24 is positioned at the lower side of the second conveying mechanism; each second sample table 22 is used for placing one sample frame 13; the second sample table 22 can be driven by the driving mechanism to lift up and down so as to load the sample rack 13 on the second conveying mechanism onto the second sample table 22;
the carrying surfaces of the first and second transport mechanisms are opposed to each other so that the sample rack 13 can be transferred on the first and second transport mechanisms.
The embodiment of the utility model provides a magnetron sputtering coating equipment, including wasing cavity 1 and coating cavity 2, wash and be equipped with plasma belt cleaning device in the cavity 1, the substrate adopts the plasma bombardment mode to wash, need not use organic solvent, and plasma can go deep into the micropore hole of object and the sunken inside completion cleaning task, and whole washing process flow can be accomplished in a few minutes, can make the cleaning efficiency obtain very big improvement; meanwhile, hazardous organic solvent cleaning agents are avoided, and treatment measures such as transportation, storage, discharge and the like of the cleaning solution are also avoided; meanwhile, in the plasma cleaning process, only the substrate needs to be placed on the first sample table 12, then the first sample table descends to place the substrate on the first conveying mechanism for plasma cleaning, and compared with the cleaning procedures of organic solvent soaking, clear water washing and drying in the prior art, the magnetron sputtering coating equipment provided by the application has the advantages that the cleaning procedure of the substrate is simpler, and the cleaning efficiency is higher; after the substrate is cleaned in the cleaning cavity, the substrate enters the film coating cavity to be coated, the cleaned substrate does not need to be manually conveyed into the film coating cavity 2, the time required by the cleaning and film coating of the whole substrate can be saved, and the efficiency is improved; and first sample platform 12 is equipped with a plurality ofly, and single evacuation just can wash and the coating operation to a plurality of substrates like this, compares with the coating film of each present substrate all need open the chamber, close the chamber, the mode of evacuation, has reduced the number of times of switch coating cavity 2, has improved coating film output efficiency.
The cleaning and coating process of the magnetron sputtering coating equipment provided by the embodiment mainly comprises the following steps;
taking a plurality of substrates, and respectively washing the surfaces of the substrates by using clear water, wherein the substrates are preferably glass substrates in the embodiment; placing the cleaned glass substrates on sample holders 13, placing one glass substrate on each sample holder 13, and then placing the sample holders 13 on a plurality of first sample stations 12 respectively;
the vacuum bodies 131 are arranged in the cleaning chamber 1 and the coating chamber 2, and the vacuum pumps are started to pump vacuum to 1 × 10-4The door valve 3 closes the film coating chamber 2 and is not communicated with the cleaning chamber 1 at the moment below Pa; the driving mechanism drives the first sample table 12 to move, so that the sample rack 13 on the first sample table 12 at the lowest layer is arranged on the first conveying mechanism, the first conveying mechanism reciprocates and simultaneously moves to the cleaning cavityIntroducing argon gas into the chamber 1, starting a high-voltage bombardment power supply as the plasma cleaning device, and carrying out plasma cleaning on the surface of the glass substrate; opening the gate valve 3, the first transfer mechanism transferring the sample holder 13 with the cleaned glass substrate loaded thereon to the second transfer mechanism, and then closing the gate valve 3; at the moment, the sample frame 13 enters the film coating chamber 2 from the cleaning chamber 1, a thin metal Mo layer with good adhesive force is deposited under high Ar air pressure, and a thick metal Mo layer with low resistivity is deposited under low air pressure to obtain a double-layer back electrode; the driving mechanism drives the second sample table 22 to move downwards, so that the sample rack 13 with the coated substrate enters the second sample table 22 to be stored, and the driving mechanism drives the second sample table 22 to lift; and then repeating the above operations until all the substrates on the sample holder 13 are coated, taking out the glass substrate in the coating chamber 2, and finishing the cleaning and coating.
According to an embodiment of the application, a first support frame 11 is arranged in the cleaning chamber 1 and located on the upper side of the first conveying mechanism, one end of each of the plurality of first sample platforms 12 is connected with the first support frame 11, the plurality of first sample platforms 12 are parallel to each other and arranged at intervals, the first sample platforms 12 are of a plate-shaped structure, the first sample platforms 12 are parallel to the conveying surface of the first conveying mechanism, and the driving mechanism is connected with the first support frame 11 and used for driving the first support frame 11 to move up and down; a second support frame 21 positioned on the upper side of the second conveying mechanism is arranged in the coating chamber 2, one ends of a plurality of second sample stages 22 are respectively connected with the second support frame 21, the plurality of second sample stages 22 are parallel to each other and are arranged at intervals, the second sample stages 22 are of plate-shaped structures, and the second sample stages 22 are parallel to the conveying surface of the second conveying mechanism; the driving mechanism is connected with the second support frame 21 and used for driving the second support frame 21 to move up and down. In this embodiment, the first support frame 11 and the second support frame 21 are both driven by lead screw nuts, wherein the driving mechanism is a motor, the motor is connected with a lead screw through a coupler, the first support frame 11 and the second support frame 21 are respectively fixedly connected with corresponding nuts, the first support frame 11 and the second support frame 21 are driven by the lead screw nuts to move up and down, and the first support frame 11 and the second support frame 21 are both driven by a set of independent lead screw nuts.
According to an embodiment of the present invention, the first conveying mechanism includes two first chains 15 parallel to each other, a first gap is formed between the two first chains 15, and the first sample stage 12 is correspondingly located at an upper side of the first gap; the second conveying mechanism comprises two second chains 23 which are parallel to each other, a second gap is formed between the two second chains 23, and the second sample table 22 is positioned on the upper side of the second gap; first sample platform 12 is located the upside in first clearance, and when first support frame 11 drove a plurality of first sample platforms 12 and descends, first sample platform 12 can enter into first clearance in the middle of, the width of sample frame 13 is greater than the width in first clearance, sample frame 13 can fall on two this moment on first chain 15, drive sample frame 13 through two first chains 15 and remove. In this embodiment, the first conveying mechanism may also be two conveying belts parallel to each other, two first gaps are formed between the conveying belts, which can also achieve the purpose of this embodiment, and the purpose of this embodiment is not separated from the design idea of the present invention, which should belong to the protection scope of the present invention. Optionally, the first support frame 11 is located on the upper side of the cleaning chamber 1 far away from one end of the coating chamber 2, the second support frame 21 is located on the upper side of the coating chamber 2 far away from one end of the cleaning chamber 1, and the end of the cleaning chamber 1 provided with the first support frame 11 is provided with the cavity door 14, so that the cleaning chamber 1 can be opened or closed through the cavity door 14, and sampling and sample sending operations can be performed through the cavity door 14.
As shown in fig. 1 and 2, the sample holder 13 includes a body 131 having a through hole formed in the middle thereof, a mounting groove 134 for supporting a substrate is formed on the body 131, and a plurality of pins 132 are disposed on the body 131, the pins 132 being adapted to cooperate with the first chain 15 and the second chain 23; the edge of the glass substrate is lapped on the surface of the mounting groove 134, meanwhile, the coating part of the substrate corresponds to the position of the through hole, the through hole corresponds to a first gap and a second gap, and the target material 24 is positioned at the lower side of the second gap, so that when the substrate is coated in the coating chamber 2, the target material 24 positioned at the lower side of the second gap sputters Mo ions to one surface of the glass substrate facing the target material 24, and then a metal Mo layer is deposited on the substrate; wherein the plurality of pins 132 on the body 131 are matched with the chain holes on the first chain 15 and the second chain 23 to fix the sample rack 13 on the two first chains 15 or the two second chains 23, and the sample rack 13 can move synchronously with the first chains 15 and the second chains 23.
As shown in fig. 2, the body 131 is a rectangular frame with a through hole formed in the middle, an installation plate is disposed on the inner side of the rectangular frame, the installation groove 134 is formed between the installation plate and the frame, and the bottom surface of the installation groove 134 may be an inclined surface or a planar structure; preferably, as shown in fig. 2, the mounting groove 134 is a slope structure, and the edge of the substrate is lapped on the bottom surface of the mounting groove 134; as shown in fig. 2, the pins 132 are disposed on two opposite sides of the rectangular frame, the pins 132 are perpendicular to the rectangular frame, a plurality of pins 132 are disposed on two opposite sides of the rectangular frame, the plurality of pins 132 on each side are used for cooperating with one first chain 15 or one second chain 23, and the sample rack 13 can be better fixed by two rows of pins 132 cooperating with two first chains 15 and two second chains 23.
As shown in fig. 2, the sample holder 13 further comprises a fixing bolt 133, the fixing bolt 133 is connected to the body 131, and the fixing bolt 133 is used for pressing the substrate onto the rectangular frame; preferably, the fixing bolts 133 are pressing pieces, the pressing pieces are arranged at four corners of the rectangular frame, and the glass substrate is fixed on the rectangular frame through the pressing pieces, so that the substrate is more firmly fixed.
As shown in fig. 2, the positioning plate 135 is disposed on the body 131, wherein the positioning plates 135 are disposed on two opposite sides of the body 131, the positioning plate 135 is used for positioning the position of the sample rack 13, for example, a laser sensor, an infrared sensor, etc. are disposed on two sides of the conveying chain, when the sample rack 13 passes through the position, the positioning plate 135 blocks the corresponding laser sensor or infrared sensor, and at this time, it can be determined that the sample rack 13 enters the predetermined position.
The following describes the working process of the coating cleaning device provided by the embodiment of the present application with reference to the accompanying drawings.
Cleaning: taking a plurality of substrates, and respectively washing the surfaces of the substrates by using clear water, wherein the substrates are preferably glass substrates in the embodiment;
sample feeding: placing glass substrates on the sample holders 13, placing one glass substrate on each sample holder 13, placing the edge of each substrate in the mounting groove 134, fixing the substrates on the rectangular frame by using the fixing bolts 133, and continuously placing a plurality of sample holders 13 on the sample table 12 until the sample holders are fully placed;
vacuumizing, opening vacuum pumps and electromagnetic valves in the cleaning chamber 1 and the coating chamber 2, and vacuumizing to 1 × 10-4Below Pa, the gate valve 3 is closed at the moment, and the film coating chamber 2 is not communicated with the cleaning chamber 1;
cleaning: the driving mechanism drives the first supporting arm to descend until the first sample table 12 at the lowermost layer enters a first gap between the two first chains 15, at this time, the sample rack 13 falls on the two first chains 15, and meanwhile, the pin 132 at the lower end of the sample rack 13 is inserted into the chain hole on the first chain 15, so that the sample rack 13 is fixed on the two first chains 15, and at this time, the movement of the first chains 15 can drive the sample rack 13 to move along with the first chains 15; the first chain 15 drives the sample frame 13 to reciprocate, argon is introduced into the cleaning chamber 1, the plasma cleaning device is a high-voltage power supply, the high-voltage bombardment power supply is started, and plasma cleaning is carried out on the surface of the glass substrate;
film coating: opening the gate valve 3, moving the two first chains 15 towards the coating chamber 2, and transferring the sample rack 13 on the first chain 15 to the second chain 23 due to the fact that the bearing surfaces of the first chain 15 and the second chain 23 are opposite, namely, the ends of the first chain 15 and the second chain 23 which are close to each other are connected or have a small distance, and the moving directions of the first chain 15 and the second chain 23 are the same, wherein the sample rack 13 enters the coating chamber 2, and the gate valve 3 is closed; depositing a thin metal Mo layer with good adhesive force under high Ar gas pressure, and depositing a thicker metal Mo layer with low resistivity under low gas pressure to obtain a double-layer back electrode;
collecting: the driving mechanism drives the second sample table 22 to move downwards, the second sample table 22 falls into a second gap formed between the two second chains 23 until the second sample table 22 positioned at the uppermost side is positioned in the second gap, the sample rack 13 positioned on the second chains 23 enters the second sample table 22 along with the movement of the second chains 23, and at the moment, the driving mechanism drives the second support frame 21 to move upwards to complete the cleaning and coating of one substrate;
repeating the steps until all the substrates are cleaned and coated; the second support frame 21 is driven to descend, the second chain 23 moves, the sample holders 13 on the second sample stages 22 are sequentially placed on the second chain 23, the gate valve 3 is opened, the second chain 23 is driven to move continuously, the first chain 15 is driven to move at the moment, the sample holders 13 on the second chain 23 are driven to move on the first chain 15, the first chain 15 moves, the sample holders 13 on the first chain are moved to one end close to the cavity door 14 (namely, one end far away from the coating cavity 2), the cavity door 14 is opened, and the cleaned and coated substrates are taken out.
In the description of the present invention, it should be noted that the terms "upper", "lower", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, which are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; the communication may be direct, indirect via an intermediate medium, or internal to both elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art. In addition, in the description of the present invention, "a plurality" means two or more unless otherwise specified.
The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included within the protection scope of the present invention.
Claims (10)
1. A magnetron sputtering coating equipment is characterized in that: the device comprises a cleaning chamber, a coating chamber and a gate valve, wherein the cleaning chamber and the coating chamber are connected through a communication door, and the gate valve is used for opening or closing the communication door;
a first conveying mechanism, a plasma cleaning device, a sample rack and a plurality of first sample tables are arranged in the cleaning chamber, and each first sample table is used for placing one sample rack; the plurality of first sample tables can be driven by a driving mechanism to lift so as to place the sample rack on the first sample table on a first conveying mechanism;
a target material, a second conveying mechanism and a plurality of second sample tables are arranged in the coating cavity, and the target material is positioned on the lower side of the second conveying mechanism; each second sample table is used for placing one sample rack; the second sample table can be driven by the driving mechanism to lift so as to load the sample rack on the second conveying mechanism onto the second sample table;
the bearing surfaces of the first conveying mechanism and the second conveying mechanism are opposite, so that the sample rack can be transferred on the first conveying mechanism and the second conveying mechanism.
2. The magnetron sputtering coating apparatus according to claim 1, characterized in that: a first supporting frame positioned on the upper side of the first conveying mechanism is arranged in the cleaning chamber, one end of each of the first sample platforms is connected with the first supporting frame, and the first sample platforms are parallel to each other and arranged at intervals; the driving mechanism is connected with the first support frame and used for driving the first support frame to move up and down;
a second supporting frame positioned on the upper side of the second conveying mechanism is arranged in the coating chamber, one end of each of the second sample stages is connected with the second supporting frame, and the second sample stages are parallel to each other and arranged at intervals; the driving mechanism is connected with the second support frame and used for driving the second support frame to move up and down.
3. The magnetron sputtering coating apparatus according to claim 2, characterized in that: the first sample table and the second sample table are both of plate-shaped structures.
4. The magnetron sputtering coating apparatus according to claim 3, characterized in that: the first conveying mechanism comprises two first chains which are parallel to each other, a first gap is formed between the two first chains, and the first sample table is correspondingly positioned on the upper side of the first gap;
the second conveying mechanism comprises two second chains which are parallel to each other, a second gap is formed between the two second chains, and the second sample stage is located on the upper side of the second gap.
5. The magnetron sputtering coating apparatus according to claim 4, characterized in that: the first gap and the second gap have the same width, and the width of the sample holder is larger than the widths of the first gap and the second gap.
6. The magnetron sputtering coating apparatus according to claim 5, characterized in that: the sample frame comprises a body with a through hole formed in the middle, wherein a mounting groove for supporting the substrate is formed in the body, a plurality of bolts are arranged on the body, and the bolts are used for being matched with the first chain and the second chain.
7. The magnetron sputtering coating apparatus according to claim 6, characterized in that: the body is the rectangular frame that the middle part formed the through-hole, rectangular frame's inboard is equipped with the mounting panel, the mounting panel with form between the frame the mounting groove.
8. The magnetron sputtering coating apparatus according to claim 7, characterized in that: the opposite two sides of the rectangular frame are provided with the bolts, and the bolts are perpendicular to the rectangular frame.
9. The magnetron sputtering coating apparatus according to claim 7, characterized in that: the sample holder further comprises a fixing bolt, the fixing bolt is connected with the body, and the fixing bolt is used for pressing the substrate on the rectangular frame.
10. The magnetron sputtering coating apparatus according to claim 6, characterized in that: the body is provided with a positioning plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921005002.4U CN210856323U (en) | 2019-06-28 | 2019-06-28 | Magnetron sputtering coating equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201921005002.4U CN210856323U (en) | 2019-06-28 | 2019-06-28 | Magnetron sputtering coating equipment |
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| CN210856323U true CN210856323U (en) | 2020-06-26 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115354276A (en) * | 2022-07-18 | 2022-11-18 | 中国电子科技集团公司第四十八研究所 | Workpiece table for etching and sputtering |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115354276A (en) * | 2022-07-18 | 2022-11-18 | 中国电子科技集团公司第四十八研究所 | Workpiece table for etching and sputtering |
| CN115354276B (en) * | 2022-07-18 | 2024-04-26 | 中国电子科技集团公司第四十八研究所 | Workpiece table for etching and sputtering |
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