CN210529055U - Combined raw material carrier and vapor deposition coating device - Google Patents

Combined raw material carrier and vapor deposition coating device Download PDF

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Publication number
CN210529055U
CN210529055U CN201921481558.0U CN201921481558U CN210529055U CN 210529055 U CN210529055 U CN 210529055U CN 201921481558 U CN201921481558 U CN 201921481558U CN 210529055 U CN210529055 U CN 210529055U
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China
Prior art keywords
carrier
evaporation
raw material
chamber
bearing chamber
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CN201921481558.0U
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Inventor
何宝东
王凯
宋文庆
盛兆亚
张建飞
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Luxshare Electronic Technology Kunshan Ltd
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Suzhou Wotens Nano Tech Co ltd
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Abstract

A combined raw material carrier comprises a carrier with a raw material bearing chamber and an evaporation promoting device arranged on the carrier, wherein the evaporation promoting device is provided with a plurality of hollow holes which are communicated with the raw material bearing chamber and penetrate through the raw material bearing chamber from top to bottom and hole walls which separate the hollow holes. The utility model also relates to a vapor deposition coating device with the combined raw material carrier. Compared with the prior art, the utility model discloses a set up the evaporation promotion device of installing on the carrier, the evaporation promotion device absorbs the heat radiation after the carrier is heated to can carry out more even heating to the raw materials in every fretwork hole, improve evaporation rate, shorten and build the pressure time, improve coating film production efficiency.

Description

Combined raw material carrier and vapor deposition coating device
Technical Field
The utility model relates to a combined raw material carrier and vapor deposition coating device belongs to vapor deposition coating film technical field.
Background
Chemical vapor deposition (hereinafter CVD) is a process that uses gaseous substances to produce chemical reactions on solid surfaces and produce solid deposits. It mainly comprises three steps:
heating the raw material to a sublimation temperature or evaporating in an evaporation chamber to form a gaseous substance;
secondly, transferring the gaseous substances to a deposition area on the surface of the solid in a vacuum environment or by means of external power;
and (III) carrying out chemical reaction on the solid surface to generate a solid film.
The prior art generally places the feedstock in a boat-shaped, open carrier made of metal or foil, which is placed in a tubular evaporation chamber under vacuum. The CVD coating production process is divided into three stages according to the pressure change process of a deposition chamber:
and a pressure building stage: after the production process is started, the evaporation chamber, the cracking chamber and the deposition chamber which are connected with the evaporation chamber are vacuumized, and after the vacuum degree meets the process requirement, the cracking chamber is heated to the specified temperature; at the moment, the evaporation chamber starts to be heated, and heat is transferred to the carrier from the tube wall of the evaporation chamber and then is transferred to the raw material loaded in the evaporation chamber; when the temperature of the raw material reaches the sublimation temperature, the raw material is converted from a solid state into a gaseous state and is diffused to the cracking chamber and the deposition chamber; the pressure of the deposition chamber is gradually increased until the pressure required by the production process is reached, which indicates that the pressure building stage is completed.
And (3) voltage stabilization: controlling the pressure of the deposition chamber to be kept stable, and continuously generating chemical reaction of gas deposition in the deposition chamber; this stage is the main stage of the coating process.
And (3) a decompression stage: controlling the pressure of the deposition chamber to be reduced so as to finish the production process; this stage is the end stage of the production process.
The single carrier structure in the prior art as the carrier for heating raw materials mainly has the following defects:
firstly, because the heat is from carrier metal casing to the inside transmission of raw materials gradually, the material that is close to the shell reaches sublimation temperature earlier, and raw materials central point puts the temperature and has not reached sublimation temperature yet, and the gas escape who sublimes in the carrier bottom is hindered earlier, and the raw materials produces the fusion caking easily in the carrier bottom, produces "sintering" phenomenon, then makes the surface area of material reduce, and leads to the evaporation rate of material to reduce, consequently needs the long time just can accomplish the pressure build-up stage of production process.
Secondly, because the temperature field in the raw material is uneven, the sublimation reaction rate in different areas in the raw material is uneven, so that the sublimation rate fluctuation of the raw material gas is large, the deposition reaction rate is unstable in the production process, and the coating quality is affected.
In a word, the existing carrier structure can not heat the raw materials uniformly, thereby reducing the sublimation (or evaporation) efficiency of the raw materials, prolonging the pressure building stage time of the production process and reducing the production efficiency.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a higher combination raw materials carrier of production efficiency and vapor deposition coating device.
In order to achieve the above purpose, the utility model adopts the following technical scheme: a combined raw material carrier comprises a carrier with a raw material bearing chamber and an evaporation promoting device arranged on the carrier, wherein the evaporation promoting device is provided with a plurality of hollow holes which are communicated with the raw material bearing chamber and penetrate through the raw material bearing chamber from top to bottom and hole walls which separate the hollow holes.
As a further improved technical scheme of the utility model, the carrier is equipped with curved inner wall.
As a further improved technical proposal of the utility model, the evaporation promoting device is cellular.
As a further improved technical scheme of the utility model, the shape of fretwork hole is polygon, circular, oval.
As a further improved technical solution of the present invention, the evaporation accelerating means has a dimension the same as or smaller than a dimension of the top surface of the raw material holding chamber.
As a further improved technical solution of the present invention, the evaporation accelerating device is detachably mounted on the carrier.
As a further improved technical solution of the present invention, the carrier and the evaporation accelerating device are integrally formed.
As a further improved technical proposal of the utility model, the evaporation promoting device is made of metal material with good heat conduction.
As a further improved technical solution of the present invention, the ratio of the height of the carrier to the height of the evaporation accelerating device is between 1: 10 to 10: 1.
The utility model discloses still relate to a vapor deposition coating device, it includes evaporation chamber and aforementioned combination raw materials carrier, wherein combination raw materials carrier is located in the evaporation chamber.
Compared with the prior art, the utility model discloses a set up the evaporation promotion device of installing on the carrier, the evaporation promotion device absorbs the heat radiation after the carrier is heated to can carry out more even heating to the raw materials in every fretwork hole, improve evaporation rate, shorten and build the pressure time, improve coating film production efficiency.
Drawings
FIG. 1 is a schematic perspective view of a vapor deposition coating apparatus according to the present invention.
Fig. 2 is a partially exploded perspective view of fig. 1.
Fig. 3 is a front view of the composite material carrier of fig. 2.
Fig. 4 is a side view of the composite material carrier of fig. 2.
Fig. 5 is an exploded perspective view of fig. 2.
FIG. 6 is a graph showing the change of the gas pressure inside the deposition chamber in the pressurizing stage with time, compared with the prior art.
Detailed Description
Referring to fig. 1 to 5, the present invention discloses a vapor deposition coating apparatus, which includes an evaporation chamber 1 and a combined raw material carrier 2 located in the evaporation chamber 1. In one embodiment of the present invention, the vapor deposition coating device is a Chemical Vapor Deposition (CVD) coating device. The raw material is heated to sublimation temperature or vaporized in the vaporization chamber 1 to form a gaseous substance.
The composite feedstock carrier 2 comprises a carrier 3 having a feedstock-carrying chamber 30 and an evaporation-promoting device 4 mounted on the carrier 3. In the illustrated embodiment of the present invention, the carrier 3 is boat-shaped and has an arc-shaped inner wall 31 to improve the uniformity of heat transfer to the feedstock. The carrier 3 is made of a metal material with good heat conduction, such as aluminum, so as to improve the heat transfer efficiency, shorten the pressure building time and improve the production efficiency. In detail, the evaporation chamber 1 of the present embodiment has a circular opening, and the carrier 3 is boat-shaped and can be placed in the accommodating space of the evaporation chamber 1 corresponding to the circular opening.
The evaporation promoting device 4 is honeycomb-shaped and has a plurality of through holes 41 communicating with the raw material chamber 30 and penetrating vertically and a hole wall 42 separating the through holes 41. Preferably, the aperture walls 42 should be as thin as possible to accommodate more material in the apertures 41. Each aperture 41 forms a cell. The evaporation accelerating device 4 is made of a metal material with good heat conduction, such as stainless steel, so as to improve the heat transfer efficiency, shorten the pressure building time and improve the production efficiency. The shape of the through hole 41 is a polygon, a circle, an ellipse or other shapes.
The evaporation accelerating device 4 is detachably mounted on the carrier 3, and the two devices may be connected by a screw 32 (see fig. 5), or may be riveted, tightly fitted, or clamped. In some embodiments of the present invention, the carrier 3 and the evaporation accelerating device 4 may be integrally formed. The evaporation enhancing means 4 may have physical dimensions (length and width) that are the same as or smaller than the dimensions of the top surface of the material-carrying chamber 30, as desired.
The utility model discloses a carrier 3 the height with evaporation promotion device 4's the proportion of the height is between 1: 10 to 10: 1 (inclusive of end point values). Therefore, a better boosting speed and an excellent voltage stabilizing effect are achieved. In some embodiments of the present invention, the ratio of the height of the carrier 3 to the height of the evaporation accelerating device 4 is between 1: 5 to 5: 1 (inclusive of end point values). In some embodiments of the present invention, the ratio of the height of the carrier 3 to the height of the evaporation accelerating device 4 is between 1: 3 to 3: 1 (inclusive of end point values). In some embodiments of the present invention, the ratio of the height of the carrier 3 to the height of the evaporation accelerating device 4 is between 3: 5 to 5: 3 (inclusive of end point values). For example, 10: 9. 9: 8. 8: 7. 7: 6. 6: 5. 5: 4. 4: 3. 3: 2. 5: 3. 2: 1. 1: 1. 1: 2. 3: 5. 2: 3. 3: 4. 4: 5. 5: 6. 6: 7. 7: 8. 8: 9. 9: 10. thus, the boosting rate and the voltage stabilizing capability are further improved.
The utility model discloses a good back of combination raw materials carrier 2 equipment, the raw materials promotes the higher authority of device 4 from the evaporation and evenly pours into, the raw materials certainly fretwork hole 41 loads into raw materials load-bearing room 30 surpasss the raw materials of raw materials load-bearing room 30 further is located in the fretwork hole 41, the raw materials is full of the inner space of carrier 3 and evaporation promotion device 4 promptly.
The working principle of the vapor deposition coating device of the utility model is as follows:
after the tube wall of the evaporation chamber 1 is heated, the temperature rises, and the heat is transferred to the raw material through the arc-shaped inner wall 31 of the carrier 3; meanwhile, the periphery of the tube wall of the evaporation chamber 1 transfers heat to the evaporation promoting device 4 in a radiation mode, and finally transfers the heat to the raw material loaded in the evaporation promoting device. Because the inside of the evaporation chamber 1 is in a state close to vacuum, the heat transfer to the raw material by convection occupies a small percentage; the feedstock begins to sublime (or evaporate) after it is heated to a critical temperature for sublimation. The evaporation enhancing means 4 absorbs the heat radiation so that the material inside each cell thereof is heated more uniformly. In addition, the gas generated by the evaporation of the raw material under heat at the bottom of the carrier 3 greatly increases the total evaporation rate of the raw material, which is much higher than that provided by a single carrier. Therefore, the time consumed in the pressure building stage of the production process is greatly shortened, and the pressure required by the coating production can be quickly built, so that the coating production efficiency is improved.
When the powdery raw material is reduced by sublimation, the volume of the raw material is gradually reduced, the powdery raw material is gradually separated from the cell walls 42 of the cells of the evaporation promotion device 4, the heat transfer efficiency is gradually reduced, and therefore the evaporation amount provided by the evaporation promotion device 4 is gradually reduced, and the input of the evaporation gas mainly comes from the bottom of the carrier 3, so that the total gas evaporation amount is reduced. At this time, the production enters a stable coating production stage, an excessively high evaporation rate is not needed any more to reduce the phenomenon of "overshoot" of the evaporation amount caused by temperature fluctuation (i.e. the evaporation amount caused by temperature change of the evaporation chamber is rapidly increased or decreased, specifically, for example, the pressure is increased to a degree exceeding the target pressure, so that the pressure is not easy to control), and the high-precision control of the evaporation amount is easier to realize, and the coating process is ensured to be more stable.
Referring to fig. 6, a process experiment study is conducted to obtain a curve of the pressure inside the deposition chamber during the pressure build-up phase, wherein P0 is the target pressure for the coating production, curve a is the process curve of using a single carrier in the prior art, and curve B is the process curve of using the combined raw material carrier 2 designed by the present invention. It can be found that the single carrier in the prior art needs a longer time to reach the target pressure P0 because of the phenomenon such as "sintering", compared with this, the time required for the combined raw material carrier 2 to reach the target pressure P0 is shorter, that is, the time t1 for the combined raw material carrier 2 to reach the target pressure P0 of the plating production is shorter than the time t2 for the single carrier in the prior art to reach the target pressure P0 of the plating production, thereby improving the production efficiency.
Compared with the prior art, the utility model discloses the evaporation of upper strata promotes device 4 and is used for shortening the build-up pressure time, and following carrier 3 is used for improving the bearing capacity, and the gaseous supply of evaporating of mainly being responsible for the steady voltage stage simultaneously for evaporation control is more stable.
The above embodiments are only used for illustrating the present invention and not for limiting the technical solutions described in the present invention, and the understanding of the present specification should be based on the technical people in the related art, for example, the descriptions of the directions such as "front", "back", "left", "right", "up", "down", etc., although the present specification has described the present invention in detail with reference to the above embodiments, the ordinary skilled in the art should understand that the technical people in the related art can still modify or substitute the present invention, and all the technical solutions and modifications thereof that do not depart from the spirit and scope of the present invention should be covered within the scope of the claims of the present invention.

Claims (10)

1. A combined raw material carrier (2) is characterized by comprising a carrier (3) with a raw material bearing chamber (30) and an evaporation promoting device (4) installed on the carrier (3), wherein the evaporation promoting device (4) is provided with a plurality of through holes (41) which are communicated with the raw material bearing chamber (30) and penetrate through the raw material bearing chamber from top to bottom and a hole wall (42) which separates the through holes (41).
2. The composite material carrier (2) according to claim 1, wherein: the carrier (3) is provided with an arc-shaped inner wall (31).
3. The composite material carrier (2) according to claim 1, wherein: the evaporation accelerating device (4) is honeycomb-shaped.
4. The composite material carrier (2) according to claim 3, wherein: the shape of the hollow hole (41) is polygonal, circular or oval.
5. The composite material carrier (2) according to claim 1, wherein: the evaporation accelerating device (4) has the same size as the top surface of the raw material bearing chamber (30) or smaller size than the top surface of the raw material bearing chamber (30).
6. The composite material carrier (2) according to claim 1, wherein: the evaporation accelerating device (4) is detachably mounted on the carrier (3).
7. The composite material carrier (2) according to claim 1, wherein: the carrier (3) and the evaporation accelerating device (4) are of an integrally formed structure.
8. The composite material carrier (2) according to claim 1, wherein: the evaporation accelerating device (4) is made of metal material with good heat conduction.
9. The composite material carrier (2) according to any one of claims 1 to 8, wherein: the ratio of the height of the vehicle (3) to the height of the evaporation promoting device (4) is between 1: 10 to 10: 1.
10. A vapor deposition coating device is characterized in that: the vapor deposition coating apparatus comprises an evaporation chamber (1) and a combined source carrier (2) according to any one of claims 1 to 9, wherein the combined source carrier (2) is located within the evaporation chamber (1).
CN201921481558.0U 2019-09-06 2019-09-06 Combined raw material carrier and vapor deposition coating device Active CN210529055U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921481558.0U CN210529055U (en) 2019-09-06 2019-09-06 Combined raw material carrier and vapor deposition coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921481558.0U CN210529055U (en) 2019-09-06 2019-09-06 Combined raw material carrier and vapor deposition coating device

Publications (1)

Publication Number Publication Date
CN210529055U true CN210529055U (en) 2020-05-15

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921481558.0U Active CN210529055U (en) 2019-09-06 2019-09-06 Combined raw material carrier and vapor deposition coating device

Country Status (1)

Country Link
CN (1) CN210529055U (en)

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Effective date of registration: 20210218

Address after: No. 158, Jinchang Road, Jinxi Town, Kunshan City, Suzhou City, Jiangsu Province

Patentee after: LUXSHARE ELECTRONIC TECHNOLOGY (KUNSHAN) Co.,Ltd.

Address before: 215300 Building 1, 15 Jinyang Road, Huaqiao Town, Kunshan City, Suzhou City, Jiangsu Province

Patentee before: SUZHOU WOTENS NANO TECH Co.,Ltd.