CN210385391U - Multi-cavity low-temperature plasma flue gas purification device - Google Patents
Multi-cavity low-temperature plasma flue gas purification device Download PDFInfo
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- CN210385391U CN210385391U CN201920651502.9U CN201920651502U CN210385391U CN 210385391 U CN210385391 U CN 210385391U CN 201920651502 U CN201920651502 U CN 201920651502U CN 210385391 U CN210385391 U CN 210385391U
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Abstract
The application discloses multi-chamber low-temperature plasma flue gas purification device, which comprises a plurality of reaction cavities and a plurality of plasma power supplies, wherein a discharge electrode system and an earthing electrode system are arranged in each reaction cavity, the discharge electrode system and the earthing electrode system are electrically connected with the plasma power supplies, the reaction cavities are provided with a gas inlet and a gas outlet, the multi-chamber low-temperature plasma flue gas purification device also comprises a flue gas baffle door, the gas inlet and the gas outlet on the reaction cavities are respectively provided with the flue gas baffle door, and the flue gas baffle door is used for controlling the opening and closing of the gas inlet and the gas outlet; and the air inlets of the reaction cavities are communicated together to form an air inlet main flue, and the air inlet main flue is used for receiving flue gas.
Description
Technical Field
The utility model relates to a flue gas treatment field especially relates to a multicavity room low temperature plasma gas cleaning device.
Background
The rapid development of the industry and the continuous increase of production activities make the continuous deterioration of the atmospheric pollution condition become one of the ten environmental problems in the world at present. The prior technologies such as mechanical filtration, liquid adsorption, solid adsorption, electrostatic adsorption, catalytic conversion, biological adsorption and the like play an important role in treating air pollution. However, as the pollutant components are complicated and the concentration is increased, the defects of low efficiency, secondary pollution, equipment corrosion, complex process, high investment, high operating cost and the like of the technologies are gradually revealed. The low-temperature plasma flue gas purification technology is a top technology in the international environmental science and technology field, and has the remarkable advantages of low energy consumption, low investment, low operating cost, high treatment efficiency and no secondary pollution in the aspect of degrading and treating toxic and harmful waste gas.
However, the existing low-temperature plasma flue gas purification device is a single reaction chamber, when an industrial boiler runs at low load or the concentration of pollutants in flue gas of the boiler is low, a plasma power supply still needs to be kept in a starting state and cannot be stopped, so that the energy conservation and consumption reduction of the flue gas purification device cannot be realized, and meanwhile, when a fault occurs, the single chamber cannot be maintained on line.
SUMMERY OF THE UTILITY MODEL
The utility model provides a to above-mentioned problem, a multicavity room low temperature plasma gas cleaning device is proposed.
The utility model adopts the following technical scheme:
a multi-cavity low-temperature plasma flue gas purification device comprises a plurality of reaction cavities and a plurality of plasma power supplies, wherein a discharge electrode system and an earth electrode system are arranged in each reaction cavity, the discharge electrode system and the earth electrode system are electrically connected with the plasma power supplies, the reaction cavities are provided with a gas inlet and a gas outlet, the multi-cavity low-temperature plasma flue gas purification device also comprises a flue gas baffle door, the gas inlet and the gas outlet on the reaction cavities are respectively provided with the flue gas baffle door, and the flue gas baffle door is used for controlling the opening and closing of the gas inlet and the gas outlet; and the air inlets of the reaction cavities are communicated together to form an air inlet main flue, and the air inlet main flue is used for receiving flue gas.
In the device, the air inlets of a plurality of independent reaction cavities are communicated together to form an independent air inlet main flue, and the air outlet of each reaction cavity is provided with a flue gas baffle door which is used for controlling the connection and disconnection between the reaction cavities and the air inlet main flue.
When the industrial boiler normally operates under full load, the flue gas baffle doors of the gas inlets on all the reaction cavities are opened (and the flue gas baffle doors on the gas outlets are correspondingly opened), and the whole low-temperature plasma flue gas purification device also operates under full load; when the industrial boiler operates at low load or the concentration of the smoke pollutants of the boiler is low, the total amount of the smoke pollutants to be processed by the low-temperature plasma smoke purification device can be reduced, the smoke baffle doors of the air inlets on the reaction cavities (and the smoke baffle doors on the corresponding air outlets) can be closed, and the operation of the corresponding plasma power supply is stopped, so that the smoke can be discharged up to the standard, and the energy consumption of the power supply operation of the low-temperature plasma smoke purification device can be reduced.
When a component in a certain reaction cavity is in fault, the flue gas baffle door on the gas inlet and the flue gas baffle door on the gas outlet on the reaction cavity can be closed, and then the plasma power supply is closed, so that the reaction cavity can be overhauled.
This device jointly uses through the independent reaction cavity of a plurality of, makes the air inlet of every independent reaction cavity switch on and become the air inlet main flue together to all installed the flue gas damper on the air inlet of every reaction cavity and gas outlet, realized the independent work of every reaction cavity, whole device operating condition can come the regulation and control according to the volume of flue gas, the energy saving more, and can independently maintain the reaction cavity of trouble, do not influence whole reaction unit work.
The working principle of the device is that the plasma power supply generates a large amount of positive and negative ions, electrons, free radicals and active particles in the reaction cavity through the discharge electrode system and the grounding electrode system, so that pollutants in the flue gas in the reaction cavity are oxidized, reduced, adsorbed, cracked and the like to be removed.
Optionally, the gas outlets of the reaction cavities are communicated together to form a gas outlet main flue, and the gas outlet main flue is used for receiving the flue gas discharged from the gas outlet of each reaction cavity.
Optionally, the flow cross-sectional area of the air outlet main flue is gradually increased.
Optionally, the flow cross-sectional area of the air inlet main flue is gradually reduced.
Optionally, the reaction cavity is provided with an access manhole door.
The manhole door is used for facilitating maintenance of equipment in the reaction cavity by maintenance personnel.
Optionally, a drain hopper is arranged on the reaction cavity.
When the reaction cavity breaks down during operation, the temperature in the whole reaction cavity is relatively high, the emptying hopper and the manhole door need to be opened simultaneously to cool equipment in the reaction cavity, and after the temperature in the reaction cavity is reduced, maintenance personnel can maintain the reaction cavity again.
The utility model has the advantages that: the independent reaction cavities are jointly used, so that the air inlets of the independent reaction cavities are communicated together to form the air inlet main flue, the flue gas baffle door is arranged on the air inlet and the air outlet of each reaction cavity, the independent work of each reaction cavity is realized, the working state of the whole device can be adjusted and controlled according to the amount of flue gas, the energy is saved more, the fault reaction cavities can be maintained independently, and the work of the whole reaction device is not influenced.
Description of the drawings:
FIG. 1 is a front view of a multi-chamber low temperature plasma flue gas cleaning device;
fig. 2 is a side view of a multi-chamber low temperature plasma flue gas cleaning device.
The figures are numbered: 1. a reaction chamber; 2. a plasma power supply; 3. a discharge electrode system; 4. a ground electrode system; 5. a main air intake flue; 6. an air outlet main flue; 7. an air inlet; 8. an air outlet branch flue; 9. a flue gas damper door; 10. a manhole door is overhauled; 11. and (4) emptying the hopper.
The specific implementation mode is as follows:
the present invention will be described in detail with reference to the accompanying drawings.
As shown in the attached drawings 1 and 2, a multi-chamber low-temperature plasma flue gas purification device comprises a plurality of reaction chambers 1 and a plurality of plasma power supplies 2, wherein a discharge electrode system 3 and a grounding electrode system 4 are arranged in each reaction chamber 1, the discharge electrode system 3 and the grounding electrode system 4 are electrically connected with the plasma power supplies 2, an air inlet 7 and an air outlet 8 are formed in each reaction chamber 1, the multi-chamber low-temperature plasma flue gas purification device also comprises a flue gas baffle door 9, the flue gas baffle door 9 is arranged on each air inlet 7 and each air outlet 8 in each reaction chamber 1, and the flue gas baffle door 9 is used for controlling the opening and closing of the air inlet 7 and each air outlet; the air inlets 7 of the reaction cavities 1 are communicated together to form an air inlet main flue 5, and the air inlet main flue 5 is used for receiving flue gas.
In the device, air inlets 7 of a plurality of independent reaction cavities 1 are communicated together to form an independent air inlet main flue 5, a flue gas baffle door 9 is arranged on an air outlet 8 of each reaction cavity 1, and the flue gas baffle door 9 is used for controlling the opening and closing between the reaction cavities 1 and the air inlet main flue 5.
When the industrial boiler normally operates under full load, the flue gas baffle doors 9 of the gas inlets 7 on all the reaction cavities 1 are opened (and the flue gas baffle doors 9 on the gas outlets 8 are correspondingly opened), and the whole low-temperature plasma flue gas purification device also operates under full load; when the industrial boiler operates at low load or the concentration of the smoke pollutants of the boiler is low, the total amount of the smoke pollutants to be processed by the low-temperature plasma smoke purification device can be reduced, the smoke baffle doors 9 of the air inlets 7 on the reaction cavities 1 can be closed (and the smoke baffle doors 9 on the corresponding air outlets 8 are closed), and the operation of the corresponding plasma power supply 2 is stopped, so that the smoke can be discharged up to the standard, and the energy consumption of the power supply operation of the low-temperature plasma smoke purification device can be reduced.
When a component in a certain reaction cavity 1 is in fault, the flue gas baffle door 9 on the gas inlet 7 and the flue gas baffle door 9 on the gas outlet 8 on the reaction cavity 1 can be closed, and then the plasma power supply 2 is closed, so that the reaction cavity 1 can be overhauled.
This device jointly uses through the independent reaction cavity 1 of a plurality of, make the air inlet 7 of every independent reaction cavity 1 switch on and become the air inlet main flue 5 together, and all installed flue gas baffle door 9 on the air inlet 7 of every reaction cavity 1 and gas outlet 8, realize the independent work of every reaction cavity 1, whole device operating condition can come regulation and control according to the volume of flue gas, the energy saving more, and can independently maintain the reaction cavity 1 of trouble, do not influence whole reaction device work.
The working principle of the device is that the plasma power supply 2 generates a large amount of positive and negative ions, electrons, free radicals and active particles in the reaction cavity 1 through the discharge electrode system 3 and the grounding electrode system 4, so that pollutants in the flue gas in the reaction cavity 1 are oxidized, reduced, adsorbed, cracked and the like to be removed.
As shown in fig. 1 and fig. 2, the gas outlets 8 of the reaction cavities 1 are communicated together to form a gas outlet main flue 6, and the gas outlet main flue 6 is used for receiving the flue gas discharged from the gas outlets 8 of the reaction cavities 1.
As shown in fig. 1 and 2, the flow cross-sectional area of the outlet flue 6 gradually increases.
The air flow in the device during operation is as shown in fig. 2, the air flow in the air outlet main flue 6 is gradually increased from left to right, so that the air flow in the air outlet main flue 6 is gradually increased from left to right.
As shown in fig. 1 and 2, the flow cross-sectional area of the intake stack 5 gradually decreases.
The air flow in the air intake main flue 5 gradually decreases from left to right, so the flow cross-sectional area of the air intake main flue 5 gradually decreases from left to right.
As shown in fig. 1 and 2, the reaction chamber 1 is provided with a manhole door 10.
The manhole door 10 is to facilitate maintenance of the equipment in the reaction chamber 1 by maintenance personnel.
As shown in fig. 1 and 2, a drain hopper 11 is disposed on the reaction chamber 1.
When reaction chamber 1 breaks down in the work, the temperature in whole reaction chamber is higher relatively, need open evacuation fill 11 and maintenance manhole door 10 simultaneously and cool down to the equipment in the reaction chamber 1, and after the temperature in the reaction chamber reduced, the maintenance personal overhauld again.
The above only is the preferred embodiment of the present invention, not therefore the limit the patent protection scope of the present invention, all applications the equivalent structure transformation made by the contents of the specification and the drawings of the present invention is directly or indirectly applied to other related technical fields, and all the same principles are included in the protection scope of the present invention.
Claims (6)
1. A multi-cavity low-temperature plasma flue gas purification device comprises a plurality of reaction cavities and a plurality of plasma power supplies, wherein a discharge electrode system and a grounding electrode system are arranged in each reaction cavity, the discharge electrode system and the grounding electrode system are electrically connected with the plasma power supplies, and the reaction cavities are provided with a gas inlet and a gas outlet; and the air inlets of the reaction cavities are communicated together to form an air inlet main flue, and the air inlet main flue is used for receiving flue gas.
2. The multi-chamber low-temperature plasma flue gas purification device according to claim 1, wherein the gas outlets of the reaction chambers are communicated together to form a gas outlet main flue, and the gas outlet main flue is used for receiving the flue gas discharged from the gas outlet of each reaction chamber.
3. A multi-chamber low temperature plasma flue gas cleaning device according to claim 2, wherein the flow cross-sectional area of the gas outlet main flue is gradually increased.
4. A multi-chamber low temperature plasma flue gas cleaning device according to claim 1, wherein the flow cross-sectional area of the inlet main flue is gradually reduced.
5. The multi-chamber low temperature plasma flue gas cleaning device according to claim 1, wherein the reaction chamber is provided with a manhole door.
6. The multi-chamber low-temperature plasma flue gas purification device according to claim 5, wherein a drain hopper is arranged on the reaction chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920651502.9U CN210385391U (en) | 2019-05-08 | 2019-05-08 | Multi-cavity low-temperature plasma flue gas purification device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920651502.9U CN210385391U (en) | 2019-05-08 | 2019-05-08 | Multi-cavity low-temperature plasma flue gas purification device |
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| CN210385391U true CN210385391U (en) | 2020-04-24 |
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| CN201920651502.9U Expired - Fee Related CN210385391U (en) | 2019-05-08 | 2019-05-08 | Multi-cavity low-temperature plasma flue gas purification device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113413738A (en) * | 2021-05-20 | 2021-09-21 | 安徽中科大禹科技有限公司 | Multi-cavity discharge equipment |
-
2019
- 2019-05-08 CN CN201920651502.9U patent/CN210385391U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113413738A (en) * | 2021-05-20 | 2021-09-21 | 安徽中科大禹科技有限公司 | Multi-cavity discharge equipment |
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Granted publication date: 20200424 Termination date: 20210508 |
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