CN210193685U

CN210193685U - Deposition device for manufacturing ultra-low loss single mode fiber

Info

Publication number: CN210193685U
Application number: CN201921090497.5U
Authority: CN
Inventors: Xuejun Zhang; 张学军
Original assignee: Hangzhou Jinxing Tong Optical Fiber Technology Co Ltd
Current assignee: Hangzhou Jinxing Tong Optical Fiber Technology Co Ltd
Priority date: 2019-07-12
Filing date: 2019-07-12
Publication date: 2020-03-27
Anticipated expiration: 2029-07-12

Abstract

The utility model provides a deposition apparatus for making ultralow loss single mode fiber, cladding deposit reacting chamber, resistance furnace, sandwich layer deposit reacting chamber including from the top down that is equipped with in proper order, the roof opening of cladding deposit reacting chamber be equipped with first exhaust hole on the left side wall of cladding deposit reacting chamber, be equipped with inner cladding deposit blowtorch at the right side wall bottom of cladding deposit reacting chamber, and the department of firing of inner cladding deposit blowtorch establishes the right bottom side in cladding deposit reacting chamber, at quartz capsule of resistance furnace internally mounted, cladding deposit reacting chamber and cladding deposit reacting chamber between install resistance furnace. The utility model has the advantages that: the method of depositing the core layer and then dehydrating effectively solves the problem of high water peak of the optical fiber, not only can obtain the ultralow-loss optical fiber with lower loss, but also can carry out large-scale production and pay lower production cost.

Description

Deposition device for manufacturing ultra-low loss single mode fiber

Technical Field

The utility model belongs to the technical field of the fiber communication, especially, relate to a deposition apparatus for making ultralow loss single mode fiber.

Background

In the optical fiber manufacture, the attenuation of the optical fiber is mainly reduced by attenuation coefficients of 1310nm, 1383nm, 1550nm and 1625nm windows, with the continuous development of the technology, the G.652D optical fiber which is currently in common use is already a zero water peak optical fiber, the attenuation at the 1383nm window is reduced to 0.28dB/km, the attenuation at the 1310nm window is reduced to 0.32dB/km, the attenuation at the 1550nm window is reduced to 0.185dB/km, and the optical fiber is basically in an extreme level from the design and manufacture aspects. The remaining attenuation is mainly due to rayleigh scattering of the fiber material itself, and therefore, to obtain a lower attenuation single mode fiber, optimization from the core material and the cladding material of the fiber is required. In the existing process of producing optical fibers, VAD method deposition is often adopted, the problem of high water peak of the optical fibers is easy to occur, and the production quality of the optical fibers is reduced.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a prevent that the phenomenon that the optic fibre water peak is high, improve production efficiency, improve production quality's the deposition apparatus that is used for making ultralow loss single mode fiber's manufacturing method, especially be fit for in the manufacturing process of optic fibre.

The technical scheme of the utility model is that: a deposition device for manufacturing an ultra-low loss single mode fiber comprises a cladding deposition reaction chamber, a resistance furnace and a core layer deposition reaction chamber which are sequentially arranged from top to bottom, wherein the top wall of the cladding deposition reaction chamber is opened, a first exhaust hole is formed in the left side wall of the cladding deposition reaction chamber, an inner cladding deposition blowtorch is arranged at the bottom end of the right side wall of the cladding deposition reaction chamber, the fire outlet of the inner cladding deposition blowtorch is arranged at the right bottom side in the cladding deposition reaction chamber, a quartz tube is arranged inside the resistance furnace, the resistance furnace is arranged between the core layer deposition reaction chamber and the cladding deposition reaction chamber, the resistance furnace and the core layer deposition reaction chamber are sequentially communicated from top to bottom, core layer deposition of a core rod loose body product is carried out in the core layer deposition reaction chamber, the core layer enters the resistance furnace for dehydration, and a cladding layer is deposited outside the core layer in the cladding deposition reaction chamber, the exhaust ring is communicated between the resistance furnace and the core layer deposition reaction chamber, the second exhaust hole is formed in the left side wall of the core layer deposition reaction chamber, the core layer deposition blowtorch is arranged at the bottom end of the right side wall of the core layer deposition reaction chamber, the fire outlet of the core layer deposition blowtorch is arranged on the right bottom side in the core layer deposition reaction chamber, the quartz glass target rod is installed on a guide rod of VAD equipment, the lower end of the quartz glass target rod enters the cladding layer deposition reaction chamber from the top wall of the cladding layer deposition reaction chamber and sequentially penetrates through the quartz tube and the exhaust ring, and the lowest end of the quartz glass target rod is located in the core layer deposition reaction chamber.

According to the scheme, the guide rod of the VAD equipment rotates clockwise at 50 rpm.

According to the scheme, SiCl4, H2 and O2 gases are introduced into the inner cladding layer deposition blast lamp and the core layer deposition blast lamp.

According to the scheme, the bottom of the quartz glass target rod is intersected with the axis of the core layer deposition burner.

According to the scheme, the quartz tube is embedded in the resistance furnace, the inner diameter of the upper end of the quartz tube is 60-70 mm, the inner diameter of the lower end of the quartz tube is 80-90 mm, and the height of the quartz tube is 350-450 mm.

The utility model has the advantages and positive effects that: due to the adoption of the technical scheme, the device has the advantages that,

1) the problem of high water peak of the optical fiber is effectively solved by the method of depositing the core layer and then dehydrating.

2) The ultra-low loss optical fiber with lower loss can be obtained, and meanwhile, the large-scale production can be carried out, and the lower production cost is paid out.

Drawings

Fig. 1 is a schematic structural diagram of the present invention.

In the figure:

1. core rod loose product 2, inner cladding deposition blowtorch 3 and quartz tube

4. A core layer deposition blast lamp 5, a core layer deposition reaction chamber 6, an exhaust ring

7. Resistance furnace 8, cladding deposition reaction chamber

Detailed Description

A resistance furnace 7 is arranged between a core layer deposition reaction chamber 5 and a cladding layer deposition reaction chamber 8, a quartz tube 3 is arranged inside the resistance furnace 7, core layer deposition of a core rod loose body product 1 is carried out in the core layer deposition reaction chamber 5, then the core layer enters the resistance furnace 7 for dehydration in continuous growth and lifting, and a cladding layer is deposited outside the dehydrated core layer in the cladding layer deposition reaction chamber 8.

As shown in FIG. 1, the technical solution of the present invention is a deposition apparatus for manufacturing ultra-low loss single mode fiber, comprising a cladding deposition reaction chamber 8, a resistance furnace 7, and a core deposition reaction chamber 5, which are sequentially arranged from top to bottom, wherein the top wall of the cladding deposition reaction chamber 8 is open, a first exhaust hole is arranged on the left side wall of the cladding deposition reaction chamber 8, an inner cladding deposition burner 2 is arranged at the bottom end of the right side wall of the cladding deposition reaction chamber 8, the fire outlet of the inner cladding deposition burner 2 is arranged at the right bottom side in the cladding deposition reaction chamber 8, a quartz tube 3 is arranged inside the resistance furnace 7, the resistance furnace 7 is arranged between the core deposition reaction chamber 5 and the cladding deposition reaction chamber 8, the resistance furnace 7, and the core deposition reaction chamber 5 are sequentially communicated from top to bottom, the core deposition of a core rod loose product 1 is performed in the core deposition reaction chamber 5, the core layer enters a resistance furnace 7 for dehydration, a layer of cladding is deposited outside the core layer in a cladding deposition reaction chamber 8, an exhaust ring 6 is communicated between the resistance furnace 7 and the core deposition reaction chamber 5, a second exhaust hole is arranged on the left side wall of the core deposition reaction chamber 5, a core deposition blowtorch 4 is arranged at the bottom end of the right side wall of the core deposition reaction chamber 5, the fire outlet of the core deposition blowtorch 4 is arranged at the right bottom side in the core deposition reaction chamber 5, a quartz glass target rod is arranged on a guide rod of VAD equipment, the lower end of the quartz glass target rod enters the cladding deposition reaction chamber 8 from the top wall of the cladding deposition reaction chamber 8 and sequentially passes through a quartz tube 3, the exhaust ring 6 and the lowest core deposition reaction chamber 5 of the quartz glass target rod.

In this embodiment, the lead rod of the VAD apparatus is rotated clockwise at 50 rpm.

In this embodiment, SiCl4, H2, and O2 gases are introduced into the inner cladding deposition torch 2 and the core deposition torch 4.

In this example, the bottom of the quartz glass target rod intersects the axis of the core deposition torch 4.

In this embodiment, the quartz tube is embedded in the resistance furnace 7, the inner diameter of the upper end of the quartz tube 3 is 60mm to 70mm, the inner diameter of the lower end of the quartz tube 3 is 80mm to 90mm, and the height of the quartz tube 3 is 350mm to 450 mm.

The working process of the example is as follows: a core rod of an optical fiber preform is manufactured by adopting a VAD method, a quartz glass target rod 11 is arranged on a guide rod of VAD equipment and rotates clockwise at 50rpm, the bottom of the quartz glass target rod 11 is intersected with the axis of a core layer deposition blowtorch 4, SiCl4, H2 and O2 are introduced into the blowtorch for combustion, wherein the SiCl4 is 3L/min, the H2 is 24L/min, the O2 is 10L/min, and the target rod is lifted upwards at the speed of 1 mm/min. The height of the quartz tube 3 in the resistance furnace 7 is 400mm, the diameter of the opening at the upper end is 65mm, the diameter of the opening at the lower end is 75mm, after 300min, the temperature in the quartz tube 3 is increased to a set temperature, wherein the temperature at the position 100mm away from the upper end is 1350 ℃, the temperature is the highest temperature point in the tube and is decreased downwards, the temperature at the position 300mm away from the upper end is 1250 ℃,

he and Cl2 were introduced into the quartz tube 3 at a flow rate of 20L/min for He and 2L/min for Cl2, and the pressure inside the quartz tube 3 was about 45 Pa. And continuously lifting the guide rod to drive the quartz glass target rod and the core layer adhered to the quartz glass target rod to be lifted until the bottom of the quartz glass target rod 11 is 200mm away from the intersection point of the axis of the inner cladding deposition torch 2 and the guide rod, starting to supply SiCl4 gas by the inner cladding deposition torch, and simultaneously increasing the flow rates of H2 and O2, wherein the flow rate of SiCl4 is 18L/min, the flow rate of H2 is 180L/min, and the flow rate of O2 is 100L/min. Taking the operation start as the time zero point, and stopping the gas supply of the core layer deposition blowtorch after about 1400 min; he and Cl2 supply to the quartz tube 3 was stopped after about 2100min, and the furnace temperature was lowered; after about 2400min, the gas supply to the inner cladding deposition burner was stopped.

After 40 hours from the working period, a core rod loose product 1 having a weight of about 21kg, an effective length of 1200mm and an outer diameter of 280mm was obtained.

While one embodiment of the present invention has been described in detail, the description is only a preferred embodiment of the present invention, and should not be considered as limiting the scope of the present invention. All the equivalent changes and improvements made according to the application scope of the present invention should still fall within the patent coverage of the present invention.

Claims

1. A deposition apparatus for making ultra-low loss single mode optical fiber, comprising: the core layer deposition reaction chamber, the resistance furnace and the core layer deposition reaction chamber are sequentially communicated from top to bottom, the core layer deposition of the core rod loose body product is carried out in the core layer deposition reaction chamber, the core layer enters the resistance furnace for dehydration, a layer of cladding is deposited outside the core layer deposition reaction chamber, and an exhaust ring is communicated between the resistance furnace and the core layer deposition reaction chamber, the left side wall of the core layer deposition reaction chamber is provided with a second exhaust hole, the bottom end of the right side wall of the core layer deposition reaction chamber is provided with a core layer deposition blowtorch, the fire outlet of the core layer deposition blowtorch is arranged at the right bottom side in the core layer deposition reaction chamber, the quartz glass target rod is arranged on a guide rod of VAD equipment, the lower end of the quartz glass target rod enters the cladding layer deposition reaction chamber from the top wall of the cladding layer deposition reaction chamber and sequentially passes through a quartz tube and an exhaust ring, and the lowest end of the quartz glass target rod is positioned in the core layer deposition reaction chamber.

2. The deposition apparatus of claim 1, wherein the deposition apparatus is configured to produce an ultra-low loss single mode optical fiber, and wherein: the pins of the VAD apparatus rotate clockwise at 50 rpm.

3. The deposition apparatus of claim 1, wherein the deposition apparatus is configured to produce an ultra-low loss single mode optical fiber, and wherein: and SiCl4, H2 and O2 gases are introduced into the inner cladding layer deposition burner and the core layer deposition burner.

4. The deposition apparatus of claim 1, wherein the deposition apparatus is configured to produce an ultra-low loss single mode optical fiber, and wherein: the bottom of the quartz glass target rod intersects the axis of the core deposition torch.

5. The deposition apparatus of claim 1, wherein the deposition apparatus is configured to produce an ultra-low loss single mode optical fiber, and wherein: the quartz tube is embedded in the resistance furnace, the inner diameter of the upper end of the quartz tube is 60 mm-70 mm, the inner diameter of the lower end of the quartz tube is 80 mm-90 mm, and the height of the quartz tube is 350 mm-450 mm.