CN209969066U - Solar energy polycrystal silicon chip ultrasonic cleaning equipment - Google Patents
Solar energy polycrystal silicon chip ultrasonic cleaning equipment Download PDFInfo
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- CN209969066U CN209969066U CN201920765649.0U CN201920765649U CN209969066U CN 209969066 U CN209969066 U CN 209969066U CN 201920765649 U CN201920765649 U CN 201920765649U CN 209969066 U CN209969066 U CN 209969066U
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Abstract
The utility model discloses a solar energy polycrystalline silicon chip ultrasonic cleaning equipment, which comprises a frame and a water tank arranged in the frame, wherein the bottom of the water tank is horizontally provided with an ultrasonic oscillation plate, an interlayer is formed between the ultrasonic oscillation plate and the water tank, an ultrasonic generator for driving the ultrasonic oscillation plate to vibrate is arranged in the interlayer, a bubble generating mechanism facing to a conveying mechanism is arranged in the water tank, and the bubble generating mechanism can blow bubbles to the solar energy polycrystalline silicon chip on the conveying mechanism, compared with the prior art, the utility model utilizes the frame positioned at the two ends of the water tank to be directly assembled in each production line, the silicon chip in the processes of dephosphorization silicon glass processing and cutting processing can be smoothly conveyed into the water tank through the conveying mechanism, the continuous conveying and cleaning are completed, the silicon chip is prevented from being independently contained by a mechanical claw and a cleaning basket, and the silicon chip can be directly conveyed into the water tank to be ultrasonically cleaned by the conveying mechanism, has the advantages of convenient use and high cleaning efficiency.
Description
[ technical field ] A method for producing a semiconductor device
The utility model relates to a technical field of solar energy polycrystal silicon chip processing equipment especially relates to a solar energy polycrystal silicon chip ultrasonic cleaning equipment.
[ background of the invention ]
With the popularization and development of semiconductor materials, people have higher and higher requirements on the quality and specification of silicon wafers, and in the process of cleaning the silicon wafers, ultrasonic cleaning technology is favored by companies at home and abroad due to the excellent cleaning effect of the ultrasonic cleaning technology. By utilizing the ultrasonic cleaning technology, the ultrasonic frequency is swept to and fro within a reasonable range in the cleaning process to drive the cleaning liquid to form fine backflow, so that the dirt of the workpiece is quickly taken away from the surface of the workpiece while being stripped by the ultrasonic, and the cleaning efficiency is greatly improved.
The utility model discloses a utility model with application number CN201621479685.3 discloses a novel polycrystal silicon chip cleaning machine, including shell, ultrasonic wave sculpture groove, ultrasonic wave alkali wash tank and ultrasonic wave descaling bath, the shell outer wall has been seted up and has been returned the washing mouth, and returns the washing mouth lower extreme and be provided with the liquid feeding board, the shell right side is fixed with the PLC controller, the inside guide rail that is fixed with of shell, and guide rail and slider sliding connection, the slider lower extreme is connected with the telescopic link, and the telescopic link other end is fixed with the gripper, the gripper passes through the handle and washs the basket fixed, and washs the basket left and right sides and has seted up feed inlet and discharge gate respectively, it is provided with the transposition board to wash the basket lower extreme, the transposition board passes through slide rail and shell sliding connection, and ultrasonic wave sculpture groove, ultrasonic wave alkali wash tank and ultrasonic wave descaling bath. The silicon wafer is required to be cleaned in the phosphorosilicate glass removing and cutting processes, but the structure that the silicon wafer is conveyed by the mechanical claw and the cleaning basket cannot be applied to the production line of the phosphorosilicate glass removing and cutting processes, the processing efficiency is low, and the defect of poor cleaning effect exists.
[ Utility model ] content
The utility model aims at solving the problem among the prior art, providing a solar energy polycrystalline silicon piece ultrasonic cleaning equipment, can assemble in the production line of dephosphorization silicate glass processing and cutting process to improve the cleaning performance.
For realizing the above-mentioned purpose, the utility model provides a solar energy polycrystal silicon chip ultrasonic cleaning equipment, including frame and the basin of setting in the frame, the frame extends outwards from the both ends level of basin, the basin is located the center of frame and undercut forms the chamber that holds that is used for holding the washing liquid, the frame is improved level and is equipped with the conveying mechanism who is used for carrying solar energy polycrystal silicon chip, conveying mechanism undercut enters into hold in the chamber, basin bottom level is equipped with the ultrasonic oscillation board, form the intermediate layer between ultrasonic oscillation board and the basin, be equipped with the drive in the intermediate layer ultrasonic generator of ultrasonic oscillation board vibration, be equipped with in the basin and take place the mechanism towards conveying mechanism's bubble, bubble emergence mechanism can to solar energy polycrystal silicon chip on the conveying mechanism blows out the bubble.
Preferably, the conveying mechanism comprises a horizontal section and a cleaning section, the horizontal section is located on the rack, the cleaning section is located in the containing cavity and is lower than the horizontal section in height, the horizontal section is connected with the cleaning section through a transition section which is obliquely arranged, and the solar polycrystalline silicon wafers on the horizontal section can enter the containing cavity after being conveyed through the transition section.
Preferably, the horizontal section, the cleaning section and the transition section respectively comprise a plurality of conveying rollers transversely arranged on the rack and the water tank, two conveying belts are tensioned on the conveying rollers of the horizontal section and the cleaning section, two transition belts are tensioned on the conveying rollers of the transition section, and the interval between the two conveying belts is larger than the interval between the two transition belts.
Preferably, the bubble generation mechanism comprises a plurality of bubble tubes arranged above the conveying mechanism and an inflator pump connected with the bubble tubes, a gap for the solar polycrystalline silicon wafer to pass through is formed between the bubble tubes and the conveying mechanism, and bubble holes facing the gap are formed in the bubble tubes.
Preferably, a water inlet and a water outlet which are communicated with the accommodating cavity are formed in the water tank.
The utility model has the advantages that: compared with the prior art, the utility model discloses the frame that the utilization is located the basin both ends can directly assemble in each production line, can carry the silicon chip in dephosphorization silicate glass processing and the cutting process to the basin smoothly through conveying mechanism in, accomplishes continuous transport and washing, avoids utilizing gripper and the independent splendid attire silicon chip of washing basket, utilizes this conveying mechanism to make the silicon chip directly enter into the basin and carries out ultrasonic cleaning, has convenient to use, advantage that the cleaning efficiency is high.
The features and advantages of the present invention will be described in detail by embodiments with reference to the accompanying drawings.
[ description of the drawings ]
Fig. 1 is a schematic structural diagram of the present invention;
fig. 2 is a schematic structural diagram of the conveying mechanism of the present invention;
in the figure: 1-a frame, 2-a water tank, 3-an accommodating cavity, 4-an ultrasonic oscillation plate, 5-an interlayer, 6-an ultrasonic generator, 7-a horizontal section, 8-a cleaning section, 9-a transition section, 10-a conveying roller, 11-a conveying belt, 12-a transition belt, 13-a bubble tube, 14-a bubble hole, 15-a water inlet and 16-a water outlet.
[ detailed description ] embodiments
Referring to fig. 1 and 2, the utility model discloses a frame 1 and basin 2 of setting in frame 1, frame 1 extends outwards from the both ends level of basin 2, basin 2 is located the center of frame 1 and undercut forms the chamber 3 that holds that is used for holding the washing liquid, frame 1 is improved level and is equipped with the conveying mechanism who is used for carrying solar energy polycrystalline silicon piece, conveying mechanism undercut enters into hold in the chamber 3, 2 bottom levels in basin are equipped with ultrasonic oscillation plate 4, form intermediate layer 5 between ultrasonic oscillation plate 4 and the basin 2, be equipped with the drive in the intermediate layer 5 ultrasonic generator 6 of ultrasonic oscillation plate 4 vibration, be equipped with the bubble generation mechanism towards conveying mechanism in the basin 2, bubble generation mechanism can to solar energy polycrystalline silicon piece on the conveying mechanism blows out the bubble. The structure that the bubble generating mechanism is combined with the ultrasonic generator 6 utilizes the vibration generated by the ultrasonic generator 6 and the bubbles generated by the bubble generating mechanism to promote the flow of the cleaning liquid in the water tank 2 and increase the contact area of the cleaning liquid and the solar silicon wafer, thereby improving the cleaning efficiency.
Specifically, conveying mechanism is including being located horizontal segment 7 on frame 1 and being located the washing section 8 of basin 2, it is less than to wash the section and be located and hold chamber 3 and its height, be connected through the changeover portion 9 that the slope set up between horizontal segment 7 and the washing section 8, solar energy polycrystalline silicon piece on the horizontal segment 7 can enter into and hold chamber 3 after the changeover portion 9 is carried. The device can be smoothly assembled in a production line for removing phosphorosilicate glass and cutting by using the horizontal section 7 on the frame 1, and the solar polycrystalline silicon wafer is smoothly conveyed into the water tank 2 by using the transition section 9 to be cleaned and conveyed out.
Specifically, the horizontal section 7, the cleaning section 8 and the transition section 9 respectively include a plurality of conveying rollers 10 transversely arranged on the rack 1 and the water tank 2, two conveying belts 11 are tensioned on the conveying rollers 10 of the horizontal section 7 and the cleaning section 8, two transition belts 12 are tensioned on the conveying rollers 10 of the transition section 9, and the interval between the two conveying belts 11 is larger than the interval between the two transition belts 12. All conveying rollers 10 in the horizontal section 7, the cleaning section 8 and the transition section 9 are connected together by the tension transmission of the transition belt 12 and the conveying belt 11, and the horizontal section 7, the cleaning section 8 and the transition section 9 can be driven to move by only one driving source after the structure is adopted. An air drying fan facing the transition section 9 is arranged on the frame 1.
Specifically, the bubble generation mechanism comprises a plurality of bubble tubes 13 arranged above the conveying mechanism and an inflator pump connected with the bubble tubes 13, a gap for the solar polycrystalline silicon wafer to pass through is formed between the bubble tubes 13 and the conveying mechanism, and bubble holes 14 facing the gap are formed in the bubble tubes 13.
Specifically, a water inlet 15 and a water outlet 16 which are communicated with the accommodating cavity 3 are arranged in the water tank 2.
The above-mentioned embodiment is right the utility model discloses an explanation, it is not right the utility model discloses a limited, any right the scheme after the simple transform of the utility model all belongs to the protection scope of the utility model.
Claims (5)
1. The utility model provides a solar energy polycrystalline silicon piece ultrasonic cleaning equipment, includes frame (1) and basin (2) of setting in frame (1), its characterized in that: frame (1) outwards extends from the both ends level of basin (2), basin (2) are located the center of frame (1) and undercut and form holding chamber (3) that are used for holding the washing liquid, frame (1) is improved level and is equipped with conveying mechanism who is used for carrying solar energy polycrystalline silicon piece, conveying mechanism undercut enters into hold in chamber (3), basin (2) bottom level is equipped with ultrasonic oscillation board (4), form intermediate layer (5) between ultrasonic oscillation board (4) and basin (2), be equipped with the drive in intermediate layer (5) ultrasonic generator (6) of ultrasonic oscillation board (4) vibration, be equipped with the bubble generation mechanism towards conveying mechanism in basin (2), bubble generation mechanism can to solar energy polycrystalline silicon piece on the conveying mechanism blows out the bubble.
2. The ultrasonic cleaning device for the solar polycrystalline silicon wafers according to claim 1, characterized in that: conveying mechanism is including horizontal segment (7) that is located frame (1) and washing section (8) that is located basin (2), it is located and holds chamber (3) and its highly be less than to wash section (7), transition section (9) through the slope setting between horizontal segment (7) and the washing section (8) are connected, solar energy polycrystalline silicon piece on horizontal segment (7) can enter into and hold chamber (3) after transition section (9) are carried.
3. The ultrasonic cleaning device for the solar polycrystalline silicon wafers as set forth in claim 2, wherein: the horizontal section (7), the cleaning section (8) and the transition section (9) comprise a plurality of conveying rollers (10) which are transversely arranged on the rack (1) and the water tank (2), two conveying belts (11) are tensioned on the conveying rollers (10) of the horizontal section (7) and the cleaning section (8), two transition belts (12) are tensioned on the conveying rollers (10) of the transition section (9), and the interval between the two conveying belts (11) is larger than the interval between the two transition belts (12).
4. The ultrasonic cleaning device for the solar polycrystalline silicon wafers according to claim 1, characterized in that: the bubble generation mechanism comprises a plurality of bubble tubes (13) arranged above the conveying mechanism and an inflator pump connected with the bubble tubes (13), a gap for the solar polycrystalline silicon wafer to pass through is formed between the bubble tubes (13) and the conveying mechanism, and bubble holes (14) facing the gap are formed in the bubble tubes (13).
5. The ultrasonic cleaning device for the solar polycrystalline silicon wafers according to claim 1, characterized in that: a water inlet (15) and a water outlet (16) which are communicated with the containing cavity (3) are arranged in the water tank (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920765649.0U CN209969066U (en) | 2019-05-24 | 2019-05-24 | Solar energy polycrystal silicon chip ultrasonic cleaning equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920765649.0U CN209969066U (en) | 2019-05-24 | 2019-05-24 | Solar energy polycrystal silicon chip ultrasonic cleaning equipment |
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| Publication Number | Publication Date |
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| CN209969066U true CN209969066U (en) | 2020-01-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201920765649.0U Active CN209969066U (en) | 2019-05-24 | 2019-05-24 | Solar energy polycrystal silicon chip ultrasonic cleaning equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111890585A (en) * | 2020-06-17 | 2020-11-06 | 安徽一路明光电科技有限公司 | Silicon wafer cutting and cleaning mechanism for LED |
| CN113649353A (en) * | 2021-08-18 | 2021-11-16 | 江苏金安电气有限公司 | Rapid raw material cleaning device for insulating transformer bushing production and working method thereof |
| CN114038938A (en) * | 2021-10-13 | 2022-02-11 | 天合光能(宿迁)光电有限公司 | Pad point design process applied to solar cell screen printing |
-
2019
- 2019-05-24 CN CN201920765649.0U patent/CN209969066U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111890585A (en) * | 2020-06-17 | 2020-11-06 | 安徽一路明光电科技有限公司 | Silicon wafer cutting and cleaning mechanism for LED |
| CN113649353A (en) * | 2021-08-18 | 2021-11-16 | 江苏金安电气有限公司 | Rapid raw material cleaning device for insulating transformer bushing production and working method thereof |
| CN114038938A (en) * | 2021-10-13 | 2022-02-11 | 天合光能(宿迁)光电有限公司 | Pad point design process applied to solar cell screen printing |
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