CN209947800U - Wafer cleaning and drying equipment - Google Patents
Wafer cleaning and drying equipment Download PDFInfo
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- CN209947800U CN209947800U CN201920623141.7U CN201920623141U CN209947800U CN 209947800 U CN209947800 U CN 209947800U CN 201920623141 U CN201920623141 U CN 201920623141U CN 209947800 U CN209947800 U CN 209947800U
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Abstract
The utility model provides a wafer cleaning and drying device, which comprises a cleaning tank, a cleaning mechanism and a drying mechanism; a plurality of cleaning cups for placing wafers are fixed in the cleaning tank, wafer taking and placing openings are formed in the top ends of the cleaning cups, a plurality of water outlet holes are distributed in the bottom plate of the cleaning cups, cleaning pipes which are spirally arranged are arranged on the inner walls of the cleaning cups, the bottom ends of the cleaning pipes penetrate through the bottom plate of the cleaning cups and extend into the cleaning tank, and a plurality of nozzles are distributed on the cleaning pipes; the cleaning mechanism comprises a plurality of water supply pipes, the water supply pipes are respectively detachably connected with the bottom ends of the cleaning pipes of the cleaning cups, and a water supply pump is arranged on each water supply pipe; the drying mechanism comprises a ring pipe, a plurality of air supply pipes and an induced duct, one ends of the air supply pipes are detachably connected with the bottom ends of the cleaning pipes of the cleaning cups respectively, a fan is arranged on the air supply pipe, the other ends of the air supply pipes are connected with the ring pipe, and the ring pipe is connected with a hot air generating device through the induced duct. The utility model discloses wash integrative setting of drying, simple structure, convenient to use washs, and it is effectual to dry.
Description
Technical Field
The utility model relates to a quartz crystal syntonizer produces technical field, especially relates to a wafer washs drying equipment.
Background
After the quartz crystal oscillator wafer is subjected to the working procedures of cutting, grinding and the like in the early stage, various organic or inorganic pollutants are adhered to the surface, and the existence of the pollutants hinders the normal vibration of the quartz crystal wafer. The quartz wafer needs to be cleaned by the processes of potassium dichromate sulfate solution, pure water ultrasonic wave, alcohol ultrasonic wave, etc., because the number of wafers to be cleaned is large and the volume of the wafer is small, large-scale, batch cleaning of the wafer is difficult.
SUMMERY OF THE UTILITY MODEL
Based on the technical problem who exists among the background art, the utility model provides a wafer washs drying equipment.
The utility model provides a wafer cleaning and drying device, which comprises a cleaning tank, a cleaning mechanism and a drying mechanism; wherein:
the top end of the cleaning tank is provided with an opening, the top end of the side wall of the cleaning tank is provided with a water inlet pipe, and the bottom end of the side wall of the cleaning tank is provided with a water outlet pipe; a plurality of cleaning cups for placing wafers are fixed in the cleaning tank, wafer taking and placing openings are formed in the top ends of the cleaning cups, a plurality of water outlet holes are distributed in the bottom plate of the cleaning cups, cleaning pipes which are spirally arranged are arranged on the inner walls of the cleaning cups, the bottom ends of the cleaning pipes penetrate through the bottom plate of the cleaning cups and extend into the cleaning tank, and a plurality of nozzles are distributed on the cleaning pipes;
the cleaning mechanism comprises a plurality of water supply pipes, the water supply pipes are respectively detachably connected with the bottom ends of the cleaning pipes of the cleaning cups, and a water supply pump is arranged on each water supply pipe;
the drying mechanism comprises a ring pipe, a plurality of air supply pipes and an induced duct, one ends of the air supply pipes are detachably connected with the bottom ends of the cleaning pipes of the cleaning cups respectively, a fan is arranged on the air supply pipe, the other ends of the air supply pipes are connected with the ring pipe, and the ring pipe is connected with a hot air generating device through the induced duct.
Preferably, the top end of the cleaning tank is provided with a sealing cover which is connected with the cleaning tank in a matched manner and seals the cleaning tank, and the sealing cover is provided with an air outlet.
Preferably, a water level sensor is arranged on a section of the cleaning pipe located outside the cleaning cup, a water inlet valve and a water outlet valve are respectively arranged on the water inlet pipe and the water outlet pipe, and the water level sensor is connected with the water inlet valve and the water outlet valve and controls the opening degree of the water inlet valve and the water outlet valve.
Preferably, be equipped with the back shaft of vertical arrangement in the washing tank, a plurality of washing cups use the back shaft to be the circumference distribution as the center in the washing tank, and the washing cup passes through the connecting piece and is connected with the back shaft.
Preferably, still include driving motor, the back shaft bottom is connected with the washing tank rotation, and driving motor's output shaft is connected with the back shaft and is used for driving the back shaft to rotate.
Preferably, the connecting piece includes head rod and second connecting rod, head rod one end is equipped with the constant head tank that extends to its central direction from its terminal surface with back shaft fixed connection and its other end, second connecting rod one end and washing cup fixed connection, the second connecting rod other end stretches into in the constant head tank and this end both sides all are equipped with spacing hole, the constant head tank both sides all are equipped with the connecting hole, the downthehole clearance fit of connecting has the gag lever post, gag lever post one end stretches into spacing downthehole and its other end is equipped with spacing platform, be equipped with reset spring between spacing platform and the head rod, reset spring one end is connected with spacing platform and its other end is connected with the head rod.
The utility model provides a wafer cleaning and drying device, when in work, a water supply pipe is connected with a cleaning pipe, the connection between the air supply pipe and the cleaning pipe is disconnected, a sealing cover is opened, adding the wafer to be cleaned into each cleaning cup, closing the water outlet valve and opening the water inlet valve, adding the cleaning solution into the cleaning tank, when the water level sensor detects that the water level reaches the position of the water level sensor, the water control valve is opened, the plurality of water pumps work to respectively introduce cleaning liquid into the plurality of cleaning pipes, the nozzles on the cleaning pipes simultaneously spray the cleaning liquid to the wafer to clean the wafer, after the cleaning is finished, the water inlet valve is closed, the cleaning liquid in the cleaning tank is discharged by the water outlet pipe, then the water outlet valve is closed, the connection between the water supply pipe and the cleaning pipe is broken, the air supply pipe and the cleaning pipe are connected simultaneously, the sealing cover is covered, the plurality of fans work to respectively introduce hot air into the plurality of cleaning pipes, and the plurality of nozzles blow hot air to the wafers in the cleaning cup for drying. The utility model discloses wash integrative setting of drying, simple structure, convenient to use washs, and it is effectual to dry, and the water in the washing tank keeps flowing, takes away the filth, promotes the cleaning performance.
Drawings
Fig. 1 is a schematic structural view of a wafer cleaning and drying apparatus provided by the present invention;
fig. 2 is the utility model provides a structural schematic diagram of connecting piece among wafer cleaning and drying equipment.
Detailed Description
Referring to fig. 1 and 2, the utility model provides a wafer cleaning and drying device, which comprises a cleaning tank 1, a driving motor, a cleaning mechanism and a drying mechanism; wherein:
the top end of the cleaning tank 1 is opened, a sealing cover 13 which is connected with the cleaning tank 1 in a matched mode and used for sealing the cleaning tank 1 is arranged at the top end of the cleaning tank 1, an air outlet is formed in the sealing cover 13, a water inlet pipe 6 is arranged at the top end of the side wall of the cleaning tank 1, and a water outlet pipe 7 is arranged at the bottom end. A plurality of washing cups 2 for placing wafers are fixed in the washing tank 1, the top end of each washing cup 2 is provided with a wafer taking and placing port 3, a plurality of water outlet holes are distributed in the bottom plate of each washing cup, the inner wall of each washing cup 2 is provided with a washing pipe 4 in a spiral arrangement, the bottom end of each washing pipe 4 penetrates through the bottom plate of each washing cup 2 and extends into the corresponding washing tank 1, a plurality of nozzles 5 are distributed on each washing pipe 4, each washing pipe 4 is located at one section of the outside of each washing cup 2 and is provided with a water level sensor, a water inlet pipe 6 and a water outlet pipe 7, a water outlet valve is arranged on each water outlet pipe 7.
The wiper mechanism includes a plurality of delivery pipes 8, and a plurality of delivery pipes 8 can be dismantled with the scavenge pipe 4 bottom of a plurality of washing cups 2 respectively and be connected, is equipped with working shaft 9 on the delivery pipe 8.
Drying mechanism includes that toroidal tube 10, a plurality of air feed pipe 11 and induced duct 12, and a plurality of air feed pipe 11 one end can be dismantled with the 4 bottoms of the scavenge pipe of a plurality of washing cups 2 respectively and be connected, is equipped with fan 22 on the air feed pipe 11, and a plurality of air feed pipe 11 other ends all are connected with toroidal tube 10, and toroidal tube 10 passes through induced duct 12 and is connected with hot-blast generating device.
When the utility model works, the water supply pipe 8 is connected with the cleaning pipe 4, the connection between the air supply pipe 11 and the cleaning pipe 4 is disconnected, the sealing cover 13 is opened, adding the wafer to be cleaned into each cleaning cup 2, closing the water outlet valve and opening the water inlet valve, adding the cleaning solution into the cleaning tank 1, when the water level sensor detects that the water level reaches the position of the water level sensor, the water control valve is opened, the plurality of water pumps 9 work to respectively introduce cleaning liquid into the plurality of cleaning pipes 4, the nozzles 5 on the cleaning pipes 4 simultaneously spray the cleaning liquid to the wafer to clean the wafer, after the cleaning is finished, the water inlet valve is closed, the cleaning liquid in the cleaning tank 1 is discharged by the water outlet pipe, then the water outlet valve is closed, the connection between the water supply pipe 6 and the cleaning pipe is disconnected, the air supply pipe 11 and the cleaning pipe 4 are connected, the sealing cover 13 is covered, the plurality of fans 22 work to respectively introduce hot air into the plurality of cleaning pipes 4, and the plurality of nozzles 5 simultaneously blow hot air to the wafers in the cleaning cup 2 for drying.
In this embodiment, be equipped with the back shaft 14 of vertical arrangement in washing tank 1, back shaft 14 bottom is rotated with washing tank 1 and is connected, and a plurality of washing cups 2 use back shaft 14 to be the circumference distribution as the center in washing tank 1, and washing cup 2 passes through the connecting piece and is connected with back shaft 14. An output shaft of the driving motor is connected with the supporting shaft 14 for driving the supporting shaft 14 to rotate. After the cleaning is finished, the water supply pipe 8 is disconnected from the cleaning pipe 4, then the driving motor drives the supporting shaft 14 to rotate, and the supporting shaft 14 drives the cleaning cup 2 to rotate, so that liquid attached to the wafer in the cleaning cup 2 is thrown away, and the drying effect is improved.
In this embodiment, the connecting piece includes head rod 15 and second connecting rod 16, head rod 15 one end and 14 fixed connection of back shaft and its other end are equipped with from its terminal surface to its central direction extension constant head tank 17, second connecting rod 16 one end and washing cup 2 fixed connection, the second connecting rod 16 other end stretches into in the constant head tank 17 and this end both sides all are equipped with spacing hole 18, constant head tank 17 both sides all are equipped with the connecting hole, the downthehole clearance fit of connecting has spacing pole 19, 19 one end of gag lever post stretches into in spacing hole 18 and its other end is equipped with spacing platform 20, be equipped with reset spring 21 between spacing platform 20 and the head rod 15, reset spring 21 one end is connected with spacing platform 20 and its other end is connected with head rod 15. After the cleaning and drying are finished, the sealing cover 13 is opened, the limiting rod 19 is pulled out to be separated from the limiting hole 18, then the second connecting rod 16 is separated from the positioning groove 17, the cleaning cup 2 is taken away, and the wafer is unloaded.
The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.
Claims (6)
1. A wafer cleaning and drying device is characterized by comprising a cleaning tank (1), a cleaning mechanism and a drying mechanism; wherein:
the top end of the cleaning tank (1) is opened, the top end of the side wall of the cleaning tank (1) is provided with a water inlet pipe (6), and the bottom end of the side wall of the cleaning tank is provided with a water outlet pipe (7); a plurality of cleaning cups (2) for placing wafers are fixed in the cleaning tank (1), a wafer taking and placing opening (3) is formed in the top end of each cleaning cup (2), a plurality of water outlet holes are formed in the bottom plate of each cleaning cup, a cleaning pipe (4) which is spirally arranged is arranged on the inner wall of each cleaning cup (2), the bottom end of each cleaning pipe (4) penetrates through the bottom plate of each cleaning cup (2) and extends into the cleaning tank (1), and a plurality of nozzles (5) are distributed on each cleaning pipe (4);
the cleaning mechanism comprises a plurality of water supply pipes (8), the plurality of water supply pipes (8) are respectively detachably connected with the bottom ends of the cleaning pipes (4) of the plurality of cleaning cups (2), and a water supply pump (9) is arranged on each water supply pipe (8);
the drying mechanism comprises a ring pipe (10), a plurality of air supply pipes (11) and an induced air pipe (12), one ends of the air supply pipes (11) are detachably connected with the bottom ends of cleaning pipes (4) of a plurality of cleaning cups (2) respectively, a fan (22) is arranged on each air supply pipe (11), the other ends of the air supply pipes (11) are connected with the ring pipe (10), and the ring pipe (10) is connected with a hot air generating device through the induced air pipe (12).
2. The wafer cleaning and drying apparatus according to claim 1, wherein the top end of the cleaning tank (1) is provided with a sealing cover (13) which is connected with the cleaning tank in a matching manner and seals the cleaning tank, and the sealing cover (13) is provided with an air outlet.
3. The wafer cleaning and drying device according to claim 1, wherein a water level sensor is disposed on a section of the cleaning tube (4) located outside the cleaning cup (2), the water inlet tube (6) and the water outlet tube (7) are respectively provided with a water inlet valve and a water outlet valve, and the water level sensor is connected with the water inlet valve and the water outlet valve and controls the opening degree of the water inlet valve and the water outlet valve.
4. The wafer cleaning and drying apparatus according to any of claims 1-3, wherein a supporting shaft (14) is vertically arranged in the cleaning tank (1), a plurality of cleaning cups (2) are circumferentially distributed in the cleaning tank (1) with the supporting shaft (14) as a center, and the cleaning cups (2) are connected with the supporting shaft (14) through a connecting member.
5. The wafer cleaning and drying device according to claim 4, further comprising a driving motor, wherein the bottom end of the supporting shaft (14) is rotatably connected with the cleaning tank (1), and an output shaft of the driving motor is connected with the supporting shaft (14) for driving the supporting shaft (14) to rotate.
6. The wafer cleaning and drying apparatus according to claim 4, wherein the connecting member comprises a first connecting rod (15) and a second connecting rod (16), one end of the first connecting rod (15) is fixedly connected to the supporting shaft (14) and the other end thereof is provided with a positioning slot (17) extending from the end surface thereof toward the center thereof, one end of the second connecting rod (16) is fixedly connected to the cleaning cup (2), the other end of the second connecting rod (16) extends into the positioning slot (17) and both sides of the end are provided with limiting holes (18), both sides of the positioning slot (17) are provided with connecting holes, a limiting rod (19) is movably fitted in the connecting holes, one end of the limiting rod (19) extends into the limiting hole (18) and the other end thereof is provided with a limiting platform (20), a return spring (21) is provided between the limiting platform (20) and the first connecting rod (15), one end of the return spring (21) is connected to the limiting platform (20) and the other end thereof is connected to.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920623141.7U CN209947800U (en) | 2019-04-30 | 2019-04-30 | Wafer cleaning and drying equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920623141.7U CN209947800U (en) | 2019-04-30 | 2019-04-30 | Wafer cleaning and drying equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209947800U true CN209947800U (en) | 2020-01-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920623141.7U Active CN209947800U (en) | 2019-04-30 | 2019-04-30 | Wafer cleaning and drying equipment |
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| Country | Link |
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| CN (1) | CN209947800U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111383965A (en) * | 2020-03-04 | 2020-07-07 | 天霖(张家港)电子科技有限公司 | Rotary type washing and drying device |
| CN111632927A (en) * | 2020-06-09 | 2020-09-08 | 杭州藏储科技有限公司 | Casting cleaning equipment capable of achieving all-dimensional cleaning and drying |
-
2019
- 2019-04-30 CN CN201920623141.7U patent/CN209947800U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111383965A (en) * | 2020-03-04 | 2020-07-07 | 天霖(张家港)电子科技有限公司 | Rotary type washing and drying device |
| CN111632927A (en) * | 2020-06-09 | 2020-09-08 | 杭州藏储科技有限公司 | Casting cleaning equipment capable of achieving all-dimensional cleaning and drying |
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