CN209923428U - Device for preparing porous thermal barrier coating by adopting low-temperature plasma - Google Patents
Device for preparing porous thermal barrier coating by adopting low-temperature plasma Download PDFInfo
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- CN209923428U CN209923428U CN201920759006.5U CN201920759006U CN209923428U CN 209923428 U CN209923428 U CN 209923428U CN 201920759006 U CN201920759006 U CN 201920759006U CN 209923428 U CN209923428 U CN 209923428U
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Abstract
The utility model discloses an adopt low temperature plasma preparation porotic thermal barrier coating's device and method mainly use in the coating preparation on injection mold die cavity surface. The device comprises a plasma reaction cavity, a high-voltage power supply, a three-dimensional moving platform for placing the insert, a preheating table, a precursor sample pool, a pore-forming agent sample pool, a gas circuit controller, a gas bottle, a vacuum pump, a high-voltage electrode, a ground electrode, a reaction chamber and a substrate to be processed. Discharging is generated between the high-voltage electrode and the ground electrode through a high-voltage power supply, carrier gas and exciting gas are introduced to form discharging plasma, the precursor and the pore-forming agent in the solution are respectively sent into a plasma reaction cavity by the carrier gas, and a porous thermal barrier coating is formed on the surface of the substrate under the action of the plasma. The utility model has the advantages that: the reaction of high-energy electrons or active free radicals on the surface of the substrate is utilized, so that a series of problems caused by the sudden temperature drop generated when the plasma contacts the surface of the substrate in the high-temperature plasma spraying process are avoided.
Description
Technical Field
The utility model relates to an adopt low temperature plasma preparation porousness thermal barrier coating's device belongs to mould surface treatment technical field.
Background
The production of injection molded articles generally places different functional and performance demands on the mold depending on the article of different shape, performance, and use. In the face of the harsh working environment of the mold, it is necessary to plate a coating on the surface of the mold cavity to meet the performance requirements of the mold. The application of the thermal barrier coating to the surface of the mold cavity is a new direction, and can play roles in protecting the mold, prolonging the service life of the mold, improving the fluidity of the melt, delaying the cooling time of the melt, keeping a higher and stable temperature in the mold cavity and the like.
Common mold surface treatment processes include Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), salt bath coating, build-up welding, plasma thermal spray, and the like. However, PVD and CVD techniques require operation under vacuum, which increases reaction costs; other surface treatment technologies also have the problems of long reaction time, harsh use conditions and the like. Plasma thermal spraying has the advantages of low cost, mass production, almost no limitation on spraying materials and substrates, high bonding strength between the coating and the substrate and the like in the preparation aspect of the coating, but the conventional thermal spraying technology adopts arc plasma, and the principle is that input powder is melted at high temperature and then sprayed on the substrate. The method has a series of problems of over-high porosity, overheating of the coating, excessive thermal stress generated by too large temperature difference between the plasma and the substrate, and coating cracking caused by sudden drop of the plasma temperature from extremely high temperature to room temperature.
Chinese patent CN 102534457 a discloses a method for preparing a thermal barrier coating structure. The invention relates to a method for preparing a thermal barrier coating on the surface of a base material by utilizing a plasma-physical vapor deposition technology. The working environment requires a chamber pressure of less than 1kPa, which imposes a limitation on the working environment and increases costs. Chinese patent CN 109023205 a discloses a method for spray coating thermal barrier coating by supersonic flame. The method comprises the steps of firstly preparing a bonding layer by supersonic flame spraying, then adding a heat stabilizer into a heat-resisting agent, uniformly mixing, and then carrying out different-path powder feeding thermal spraying with a healing agent to obtain the crack self-healing thermal barrier coating. However, the fuel consumption of the supersonic flame spraying is high, and the cost is high. Chinese patent CN 109023201A discloses a thermal barrier coating with a double-layer gradient structure and a preparation process thereof. The double-layer gradient structure provided by the invention realizes the combination of a new material/a new structure, and breaks through the reverse restriction relation of the thickness of a single material coating on the heat insulation capability and the service life, thereby ensuring the synergistic design of high heat insulation, long service life and high temperature resistance of the novel structure. The preparation process of the coating needs to prepare two layered heat insulation layers, the second layered heat insulation layer is formed by stacking N sub-layers, and the spraying parameters are adjusted in the preparation process so that the heat conductivity of each sub-layer is sequentially reduced from inside to outside and the heat insulation temperature of each layer is ensured to be the same. These conditions are difficult to realize in the process, the operation steps are complicated, and the cost is high. Chinese patent CN 108950461A discloses a preparation method of a thermal barrier coating suitable for the surface of an iron-based high-temperature alloy. The method comprises the steps of firstly carrying out agglomeration treatment on a nano feeding material, then carrying out cleaning and preheating treatment on an iron substrate, then preparing an adhesive layer, remelting the adhesive layer, spraying a ceramic layer, and finally carrying out heat treatment on the prepared coating. The method needs a large amount of time to prepare the nano feeding material, 5-7 times of reciprocating spraying is needed for remelting the bonding layer, and 8-11 times of reciprocating spraying is needed for Yttrium Stabilized Zirconia (YSZ) coating. The steps are complicated and the cost is high. The method only aims at the iron-based alloy, and the universality is not strong. Chinese patent CN 107699840 a discloses a preparation method of a porous zirconia thermal barrier coating. The method directly adopts 8YSZ powder for spraying, and the melting effect of the powder in the plasma torch is poor; in addition, the method directly mixes the organic pore-forming agent with the 8YSZ powder, which easily causes the phenomenon that the pore-forming agent is decomposed before reaching the surface of the substrate, thus causing low pore-forming efficiency and increasing cost. Chinese patent CN 109023315A discloses a preparation method of a high-bonding-strength thermal barrier coating on the surface of a titanium alloy. The method adopts the combination of a sol-gel method and a laser cladding technology to prepare the coating on the surface of the titanium alloy matrix. The method is complex to operate, and the laser cladding technical equipment is expensive and has high cost.
SUMMERY OF THE UTILITY MODEL
Aiming at the problems, the invention provides a low-temperature plasma spraying device which solves the problems of surface failure of a mold cavity and the like caused by a severe working environment by spraying a thermal barrier coating on the surface of a mold. Unlike high temperature plasma, low temperature plasma utilizes energetic electrons and active radicals to decompose liquid precursor fragments and react on the surface of the substrate, thus not having the problems caused by the temperature shock. The method has simple structure and low cost, and is easy for large-scale production.
The utility model aims to provide an adopt low temperature plasma preparation porousness thermal barrier coating's device and method.
The purpose of the utility model can be realized through the following technical scheme:
the utility model discloses a high voltage power supply produces between high voltage electrode and ground electrode and discharges, lets in carrier gas and excitation gas formation plasma and discharges, and the carrier gas is sent into plasma reaction chamber respectively with precursor and pore-forming agent in the solution, forms porose thermal barrier coating at the base member surface reaction under plasma's effect.
The utility model relates to an adopt low temperature plasma preparation porose thermal barrier coating's device, including plasma reaction chamber, high voltage power supply, three-dimensional moving platform, preheating stage, precursor sample cell, pore-forming agent sample cell, gas circuit controller, gas bottle, vacuum pump, high voltage electrode, ground electrode, reacting chamber and treat the processing base member. The plasma reaction cavity comprises a high-voltage electrode and a ground electrode; the reaction chamber is composed of a plasma reaction cavity, a three-dimensional moving platform and a preheating table. The high-voltage power supply is connected with the high-voltage end of the plasma reaction cavity, the working gas is respectively conveyed to the precursor sample pool and the pore-forming agent sample pool through the gas bottle, and the gas flow is controlled by the gas circuit controller. Plasma is generated between the high-voltage electrode and the ground electrode, and the precursor and the pore-forming agent are simultaneously fed into the plasma reaction chamber through two paths of gases.
The vacuum pump is connected with the reaction chamber.
The substrate to be processed is placed on a pre-heating stage, which is placed on a three-dimensional moving platform.
The utility model relates to an adopt low temperature plasma preparation porousness thermal barrier coating's device's concrete implementation step as follows:
step 1, cleaning the surface of a substrate to be processed;
firstly, cleaning the surface of a matrix by using dilute hydrochloric acid with the mass fraction of 5%, and then cleaning by using NaOH solution with the mass fraction of 10%;
step 2, preparing a solution precursor and a pore-forming agent solution;
ZrClO with the configuration of 1mol/L2The solution is used as a solution precursor for low-temperature plasma spraying, and a saturated sodium bicarbonate solution is prepared and used as a pore-forming agent;
step 3, placing the matrix to be processed on a three-dimensional moving platform, adjusting the matrix to a proper position and angle, and preheating the matrix;
step 4, vacuumizing the reaction chamber (if atmospheric plasma spraying is adopted, the operation is not needed);
step 5, opening an air source, and adjusting the air flow;
and 6, turning on the high-voltage power supply, adjusting power supply parameters and carrying out plasma discharge.
And 3, continuously adjusting the position and the angle of the three-dimensional moving platform.
The three-dimensional moving platform in the step 3 can preheat the substrate, wherein the preheating temperature is 200-300 ℃, and the preheating time is 5-10 minutes.
And 5, regulating the flow of the carrier gas Ar carrying the solution precursor to be 1-70L/min, and regulating the flow of the carrier gas Ar carrying the pore-forming agent to be 1-40L/min.
The high voltage power supply in step 6 can be a direct current power supply, a radio frequency power supply, an alternating current power supply, a pulse power supply and the like.
The solution precursor axially enters from the rear end of the plasma torch, and the pore-forming agent radially enters from the front end of the plasma torch.
The shape of the electrode can be designed according to actual needs so as to meet the requirement of processing surfaces with any shapes.
The utility model has the advantages that: the high-energy electrons or active free radicals are utilized to react on the surface of the substrate, so that a series of problems caused by the sudden temperature drop generated when the plasma contacts the surface of the substrate in the high-temperature plasma spraying process are avoided; the device is simple, has strong operability and easy realization, can be used for preparing coatings on the surfaces of various material matrixes and has low cost; the solution precursor is adopted for spraying, so that the spraying efficiency is high; the porosity of the coating can be adjusted by the feeding amount of the pore-forming agent; the thermal barrier coating with low thermal conductivity can be effectively prepared on the surface of the cavity of the injection mold.
Drawings
FIG. 1 is a schematic diagram of an apparatus for preparing a porous thermal barrier coating using low temperature plasma.
In the figure: 1-a plasma reaction cavity, 2-a high-voltage power supply, 3-a three-dimensional moving platform, 4-a preheating table, 5-a precursor sample pool, 6-a pore-forming agent sample pool, 7-a gas circuit controller, 8-a gas bottle, 9-a vacuum pump, 10-a high-voltage electrode, 11-a ground electrode, 12-a reaction chamber and 13-a substrate to be processed.
Detailed Description
A device for preparing a porous thermal barrier coating by adopting low-temperature plasma is shown in figure 1 and comprises a plasma reaction cavity 1, a high-voltage power supply 2, a three-dimensional moving platform 3, a preheating table 4, a precursor sample cell 5, a pore-forming agent sample cell 6, a gas circuit controller 7, a gas bottle 8, a vacuum pump 9, a high-voltage electrode 10, a ground electrode 11, a reaction chamber 12 and a substrate 13 to be processed. The steps of the specific embodiment of the porous thermal barrier coating prepared by the device are as follows:
step 1, cleaning and pretreating the surface of a substrate to be processed:
firstly, cleaning the surface of a matrix to be processed 13 by using dilute hydrochloric acid with the mass fraction of 5%, and then cleaning by using NaOH solution with the mass fraction of 10%;
step 2, preparing a solution precursor and a pore-forming agent solution:
ZrClO with the configuration of 1mol/L2The solution is used as a precursor of the solution sprayed by low-temperature plasma, and a saturated sodium bicarbonate solution is prepared to be used as a pore-forming agent and respectivelyAre arranged in a precursor sample cell 5 and a pore-forming agent sample cell 6;
step 3, placing the matrix to be processed on a three-dimensional moving platform 3, adjusting the matrix to a proper position and angle, and preheating the matrix by a preheating table 4 at the preheating temperature of 250 ℃ for 5 minutes; if low-pressure plasma spraying is adopted, the vacuum pump 9 is started to vacuumize the reaction chamber 12;
step 4, opening a valve of the gas bottle 8, and adjusting the gas flow through the gas path controller 7:
the flow rate of the carrier gas Ar carrying the solution precursor is adjusted to be 35L/min, the flow rate of the carrier gas Ar carrying the pore-forming agent is adjusted to be 25L/min, and the precursor and the pore-forming agent are simultaneously fed into the plasma reaction chamber 1;
step 5, turning on the high-voltage power supply 2, adjusting the voltage to 10kV, the frequency to 1500Hz and the pulse width to 500ns, and generating plasma between the high-voltage electrode 10 and the ground electrode 11 for coating preparation;
and 6, testing the porosity and the heat conductivity coefficient of the prepared thermal barrier coating.
Claims (4)
1. A device for preparing a porous thermal barrier coating by adopting low-temperature plasma is characterized in that: the device comprises a plasma reaction cavity, a high-voltage power supply, a three-dimensional moving platform, a preheating table, a precursor sample pool, a pore-forming agent sample pool, a gas circuit controller, a gas bottle, a vacuum pump, a high-voltage electrode, a ground electrode, a reaction chamber and a substrate to be processed;
the plasma reaction cavity comprises a high-voltage electrode and a ground electrode; the reaction chamber consists of a plasma reaction cavity, a three-dimensional moving platform and a preheating table; the high-voltage power supply is connected with the high-voltage end of the plasma reaction cavity, the working gas is respectively conveyed to the precursor sample pool and the pore-forming agent sample pool through the gas bottle, and the gas flow is controlled by the gas path controller; generating plasma between the high-voltage electrode and the ground electrode, and simultaneously feeding the precursor and the pore-forming agent into a plasma reaction cavity through two paths of gases; the vacuum pump is connected with the reaction chamber; the substrate to be processed is placed on a pre-heating stage, which is placed on a three-dimensional moving platform.
2. The apparatus for preparing a porous thermal barrier coating using low temperature plasma according to claim 1, wherein: the high voltage power supply can be a direct current power supply, a radio frequency power supply, an alternating current power supply and a pulse power supply.
3. The apparatus for preparing a porous thermal barrier coating using low temperature plasma according to claim 1, wherein: the solution precursor axially enters from the rear end of the plasma torch, and the pore-forming agent radially enters from the front end of the plasma torch.
4. The apparatus for preparing a porous thermal barrier coating using low temperature plasma according to claim 1, wherein: configuration of ZrClO2The solution is used as a precursor of the solution sprayed by low-temperature plasma, and a saturated sodium bicarbonate solution is prepared to be used as a pore-forming agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201920759006.5U CN209923428U (en) | 2019-05-24 | 2019-05-24 | Device for preparing porous thermal barrier coating by adopting low-temperature plasma |
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| CN201920759006.5U CN209923428U (en) | 2019-05-24 | 2019-05-24 | Device for preparing porous thermal barrier coating by adopting low-temperature plasma |
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| CN209923428U true CN209923428U (en) | 2020-01-10 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110042371A (en) * | 2019-05-24 | 2019-07-23 | 北京化工大学 | A kind of device and method using low temperature plasma preparation porosity thermal barrier coating |
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- 2019-05-24 CN CN201920759006.5U patent/CN209923428U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110042371A (en) * | 2019-05-24 | 2019-07-23 | 北京化工大学 | A kind of device and method using low temperature plasma preparation porosity thermal barrier coating |
| CN110042371B (en) * | 2019-05-24 | 2023-10-20 | 北京化工大学 | Device and method for preparing porous thermal barrier coating by adopting low-temperature plasma |
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