CN209571393U - Acid corrosion removes the jig of silicon wafer surface damage - Google Patents
Acid corrosion removes the jig of silicon wafer surface damage Download PDFInfo
- Publication number
- CN209571393U CN209571393U CN201920599838.5U CN201920599838U CN209571393U CN 209571393 U CN209571393 U CN 209571393U CN 201920599838 U CN201920599838 U CN 201920599838U CN 209571393 U CN209571393 U CN 209571393U
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- rotating turret
- silicon wafer
- workbench
- jig
- placing groove
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Abstract
The utility model relates to semiconductor machining jig technical fields, the specially jig of acid corrosion removal silicon wafer surface damage, including workbench, the surface of workbench offers placing groove, the inside of placing groove is placed with Silicon Wafer, the surface of workbench is provided with support frame, the surface of support frame is connected with elevating lever, the surface of elevating lever is provided with connecting rod, the bottom of connecting rod is provided with bracelet, and the bottom surface of elevating lever offers rotation slot, rotation slot is internally provided with link block, link block is fixed on the top surface of rotating turret, rotating turret is internally provided with containing liquid chamber, and the bottom of rotating turret is provided with cleaning cotton, workbench is internally provided with waste liquid storehouse；Have the beneficial effect that the utility model proposes the jig of acid corrosion removal silicon wafer surface damage wiping damaged to silicon wafer surface by rotatable and flexible rotating turret cooperation cleaning cotton repair, it is simple and convenient, and remediation efficiency is high.
Description
Technical field
The utility model relates to semiconductor machining jig correlative technology fields, specially acid corrosion removal silicon wafer surface damage
The jig of wound.
Background technique
Silicon Wafer is that element silicon is purified (99.999%), and long silicon crystal bar is made followed by by these pure silicons, becomes
The material for manufacturing the crystalline semiconductor of integrated circuit is ground by photomechanical production, polishing, and the programs such as slice melt polysilicon
Monocrystalline silicon crystal bar is pulled out, wafer very thin one by one is then cut into；
In the prior art, the surface of Silicon Wafer is easily damaged in process, and traditional mode uses acidic liquid
To its surface wipes, damage is eliminated, but when practical operation, worker holds Silicon Wafer on the other hand, and another hand holding tool is to silicon wafer
Circle wiping easily leads to Silicon Wafer rupture, and wipes low efficiency；And as the acidic liquid under Silicon Wafer water clock is not easy to recycle.
Utility model content
The purpose of this utility model is to provide the jigs of acid corrosion removal silicon wafer surface damage, to solve above-mentioned background
The problem of being proposed in technology.
To achieve the above object, the utility model provides the following technical solutions: acid corrosion removes silicon wafer surface damage
Jig, including workbench, the surface of the workbench offer placing groove, and the inside of the placing groove is placed with Silicon Wafer, work
The surface for making platform is provided with support frame, and the surface of support frame as described above is connected with elevating lever, and the surface of the elevating lever is provided with company
Extension bar, the bottom of the connecting rod is provided with bracelet, and the bottom surface of elevating lever offers rotation slot, and the inside of the rotation slot is set
It is equipped with link block, the link block is fixed on the top surface of rotating turret, and the rotating turret is internally provided with containing liquid chamber, and rotates
The bottom of frame is provided with cleaning cotton, and workbench is internally provided with waste liquid storehouse, offers leakage between the waste liquid storehouse and placing groove
Fluid apertures.
Preferably, support frame as described above includes upright bar and top plate, and upright bar is fixed between top plate and workbench, and upright bar is arranged
There are four, four upright bars are respectively distributed to four corners of workbench.
Preferably, the elevating lever includes sleeve and guide rod, and guide rod is fixed on the bottom surface of top plate, and guide rod
The other end is plugged on sleeve inner, and extension spring is provided between guide rod and sleeve, and the L-shaped rod-like structure of connecting rod connects
Extension bar is fixed on the outer wall of casing, and bracelet is in circular ring structure.
Preferably, the rotation slot and link block are in T-shaped circular cylinder structure, and rotation slot limits link block
Position, rotating turret are in T-shaped column structure, and the bottom surface of rotating turret offers placing groove, offers between placing groove and containing liquid chamber
Infusion hole, cleaning cotton are in the inside of placing groove, and the surface of rotating turret offers liquid injection port, and the inside of liquid injection port is plugged with plug
Head, and the surface of rotating turret is fixed with handle, and the surface insertion of rotating turret is equipped with ball.
Preferably, the inclined bottom surface setting in the waste liquid storehouse, the surface of workbench is provided with drain pipe, the bottom surface in waste liquid storehouse
In drain pipe side, height is low.
Compared with prior art, the utility model has the beneficial effects that
1. the utility model proposes the jig of acid corrosion removal silicon wafer surface damage turn by rotatable and flexible
Moving frame cooperates cleaning cotton to damage wiping reparation to silicon wafer surface, simple and convenient, and remediation efficiency is high；
2. the utility model proposes acid corrosion removal silicon wafer surface damage jig placing groove lower part be arranged waste liquid
Storehouse opens up liquid-leaking nozzle between waste liquid storehouse and placing groove, convenient for recycling to the acidic liquid after using, and is concentrated and is arranged by perfusion tube
Enter in processing equipment.
Detailed description of the invention
FIG. 1 is a schematic structural view of the utility model；
Fig. 2 is structure enlargement diagram at A in Fig. 1.
In figure: workbench 1, Silicon Wafer 3, support frame 4, elevating lever 5, connecting rod 6, bracelet 7, rotation slot 8, connects placing groove 2
Connect block 9, rotating turret 10, containing liquid chamber 11, cleaning cotton 12, waste liquid storehouse 13.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Fig. 1 to Fig. 2 is please referred to, the utility model provides a kind of technical solution: Silicon Wafer 3 is placed on 1 surface of workbench
In the placing groove 2 opened up, the support frame 4 of 2 surface of placing groove welding plays traction action, the support rod of support frame 4 to elevating lever 5
Weld together with top plate, and the guide rod of elevating lever is welded on the bottom surface of top plate, arm passes through and is welded on 6 bottom end of connecting rod
Bracelet 7, then arm pushes, and band moving sleeve glides along guide rod, while being bonded in the stretching between guide rod and sleeve
Spring is in tensile state, and elevating lever 5 is easy to implement the height adjustment of rotating turret 10；
It holds and is welded on the handle on 10 surface of rotating turret, handle is provided with multiple, and circumferentially shape is arranged in and turns multiple handles
On the surface of moving frame 10, rotating turret 10 is rotated, the cleaning cotton 12 of 10 bottom of rotating turret during rotation wipes 3 surface of Silicon Wafer
Wipe, pull out the chock plug on 10 surface of rotating turret, from liquid injection port to containing liquid chamber 11 inside inject acidic liquid, acidic liquid is through infusion hole
Cleaning cotton 12 is flowed to, and cleaning cotton 12 is soaked, convenient for cleaning cotton 12 to 3 surface damage reparation of Silicon Wafer；
In 10 rotation process of rotating turret, the link block 9 at 10 top of rotating turret is welded in 8 inner rotation of rotation slot, is avoided
Rotating turret 10 falls off, and the ball on 10 surface of rotating turret reduces the abrasion between rotating turret 10 and placing groove 2；
The acidic liquid of 3 surface water clock of Silicon Wafer enters inside waste liquid storehouse 13 through liquid-leaking nozzle, the acidity inside waste liquid storehouse 13
Liquid is flowed along the ramped bottom surface in waste liquid storehouse 13 to drain pipe, opens drain pipe and acid pickle is discharged into processing unit at concentration
Reason.
Working principle: in actual work, Silicon Wafer 3 being placed in placing groove 2, the support frame 4 of 2 surface of placing groove welding
Traction action is played to elevating lever 5, the support rod and top plate of support frame 4 weld together, and the guide rod of elevating lever is welded on
On the bottom surface of top plate, arm passes through the bracelet 7 for being welded on 6 bottom end of connecting rod, and then arm pushes, and band moving sleeve is along guide rod
It glides, while being bonded in the extension spring between guide rod and sleeve and being in tensile state, elevating lever 5 is easy to implement rotating turret 10
Height adjustment；Then the handle for being welded on 10 surface of rotating turret is held, rotating turret 10, the cleaning cotton of 10 bottom of rotating turret are rotated
12, during rotation to 3 surface wipes of Silicon Wafer, pull out the chock plug on 10 surface of rotating turret, from liquid injection port to containing liquid chamber 11 inside
Acidic liquid is injected, acidic liquid flows to cleaning cotton 12 through infusion hole, and cleaning cotton 12 is soaked, convenient for cleaning cotton 12 to silicon wafer
3 surface damage reparations of circle；In 10 rotation process of rotating turret, the link block 9 for being welded on 10 top of rotating turret turns inside rotation slot 8
It is dynamic, avoid rotating turret 10 from falling off, and the ball on 10 surface of rotating turret reduces the abrasion between rotating turret 10 and placing groove 2；Silicon wafer
The acidic liquid of 3 surface water clocks of circle enters inside waste liquid storehouse 13 through liquid-leaking nozzle, and the acidic liquid inside waste liquid storehouse 13 is along waste liquid
The ramped bottom surface in storehouse 13 is flowed to drain pipe, and acid pickle is discharged into processing unit by unlatching drain pipe to be focused on.
While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art,
It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired
Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.
Claims (5)
1. acid corrosion removes the jig of silicon wafer surface damage, including workbench (1), it is characterised in that: the workbench (1)
Surface offers placing groove (2), and the inside of the placing groove (2) is placed with Silicon Wafer (3), and the surface of workbench (1) is provided with
Support frame (4), the surface of support frame as described above (4) are connected with elevating lever (5), and the surface of the elevating lever (5) is provided with connecting rod
(6), the bottom of the connecting rod (6) is provided with bracelet (7), and the bottom surface of elevating lever (5) offers rotation slot (8), and described turn
Dynamic slot (8) are internally provided with link block (9), and the link block (9) is fixed on the top surface of rotating turret (10), the rotating turret
(10) be internally provided with containing liquid chamber (11), and the bottom of rotating turret (10) is provided with cleaning cotton (12), the inside of workbench (1)
It is provided with waste liquid storehouse (13), offers liquid-leaking nozzle between the waste liquid storehouse (13) and placing groove (2).
2. the jig of acid corrosion removal silicon wafer surface damage according to claim 1, it is characterised in that: support frame as described above
It (4) include upright bar and top plate, upright bar is fixed between top plate and workbench (1), and there are four upright bar settings, four upright bar difference
It is distributed in four corners of workbench (1).
3. the jig of acid corrosion removal silicon wafer surface damage according to claim 1, it is characterised in that: the elevating lever
It (5) include sleeve and guide rod, guide rod is fixed on the bottom surface of top plate, and the other end of guide rod is plugged on sleeve inner,
Extension spring, connecting rod (6) L-shaped rod-like structure are provided between guide rod and sleeve, connecting rod (6) is fixed on casing
On outer wall, bracelet (7) is in circular ring structure.
4. the jig of acid corrosion removal silicon wafer surface damage according to claim 1, it is characterised in that: the rotation slot
(8) and link block (9) is in T-shaped circular cylinder structure, and rotation slot (8) limits link block (9), rotating turret (10)
In T-shaped column structure, the bottom surface of rotating turret (10) offers placing groove, offers between placing groove and containing liquid chamber (11) defeated
Fluid apertures, cleaning cotton (12) are in the inside of placing groove, and the surface of rotating turret (10) offers liquid injection port, the inside grafting of liquid injection port
There is chock plug, and the surface of rotating turret (10) is fixed with handle, and the surface insertion of rotating turret (10) is equipped with ball.
5. the jig of acid corrosion removal silicon wafer surface damage according to claim 1, it is characterised in that: the waste liquid storehouse
(13) inclined bottom surface setting, the surface of workbench (1) are provided with drain pipe, and the bottom surface of waste liquid storehouse (13) is in drain pipe side height
It spends low.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920599838.5U CN209571393U (en) | 2019-04-29 | 2019-04-29 | Acid corrosion removes the jig of silicon wafer surface damage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920599838.5U CN209571393U (en) | 2019-04-29 | 2019-04-29 | Acid corrosion removes the jig of silicon wafer surface damage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209571393U true CN209571393U (en) | 2019-11-01 |
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ID=68336452
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920599838.5U Active CN209571393U (en) | 2019-04-29 | 2019-04-29 | Acid corrosion removes the jig of silicon wafer surface damage |
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| CN (1) | CN209571393U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112547603A (en) * | 2020-11-13 | 2021-03-26 | 马鞍山锲恒精密组件科技有限公司 | Semiconductor wafer surface cleaning device |
-
2019
- 2019-04-29 CN CN201920599838.5U patent/CN209571393U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112547603A (en) * | 2020-11-13 | 2021-03-26 | 马鞍山锲恒精密组件科技有限公司 | Semiconductor wafer surface cleaning device |
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