CN209442655U - Graphene film transfer device - Google Patents
Graphene film transfer device Download PDFInfo
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- CN209442655U CN209442655U CN201920038866.XU CN201920038866U CN209442655U CN 209442655 U CN209442655 U CN 209442655U CN 201920038866 U CN201920038866 U CN 201920038866U CN 209442655 U CN209442655 U CN 209442655U
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- graphene film
- transfer device
- film transfer
- chamber
- target substrate
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Abstract
The utility model provides a kind of graphene film transfer device, graphene film is transferred to target substrate.Graphene film transfer device includes shell, etching and cleaning assembly and wriggling component.Shell includes the first water inlet and the first water outlet, and enclosure interior forms vacuum cavity.Etching is set in vacuum cavity with cleaning assembly, including chamber and limitting casing.Chamber includes the second water inlet and the second water outlet, is respectively communicated in the first water inlet and the first water outlet.Limitting casing is suspended in the indoor liquid of chamber, and limitting casing forms a confinement, and graphene film is set in confinement, and target substrate is set to the bottom of chamber.Wriggling component is used to control the flow velocity of liquid disengaging.Wherein, as liquid level moves down, graphene film is transferred to target substrate.
Description
Technical field
The utility model relates generally to graphene film transfer field, in particular to a kind of graphene film
Transfer device.
Background technique
Graphene is a kind of six side's honeycomb two dimensional crystal materials being made of sp2 hydbridized carbon atoms.Because it is with excellent
The properties such as optics, electricity, calorifics, mechanics and receive significant attention, for example have in fields such as transparent conductive electrode, heat managements
Broad application prospect.
Before chemical vapour deposition technique has a wide range of applications due to it can prepare large area continuous high-quality graphene film
Scape.The substrate that this method uses at present is mainly copper foil, but in practical applications, it usually needs transfers graphene to other mesh
It marks in substrate, to use the transfer device of graphene film.
In the prior art, graphene film transfer mainly passes through polymer (PMMA) transfer method, but in transfer process, often
It is commonly present since the presence of bubble in transfer process leads to that etching is clean, PMMA cannot be completely removed and fishing for graphene
It is easy to operate improper in thin-film process, the problems such as causing graphene film damaged, and then cause graphene transfer of low quality.Cause
This, proposes that a kind of new graphene transfer device is particularly important.
Above- mentioned information are only used for reinforcing the understanding to the background of the utility model disclosed in the background technology part, because
This it may include the information not constituted to the prior art known to persons of ordinary skill in the art.
Utility model content
One main purpose of the utility model is to overcome at least one defect of the above-mentioned prior art, provides a kind of stone
Black alkene film-transferring device, to solve the problems, such as the bubble introduced in transfer process existing in the prior art.
To realize above-mentioned purpose of utility model, the utility model adopts the following technical solution:
One aspect according to the present utility model provides a kind of graphene film transfer device, to graphene is thin
For film transfer to target substrate, the graphene film transfer device includes shell, etching and cleaning assembly and wriggling component.Shell
Body includes the first water inlet and the first water outlet, and the enclosure interior forms vacuum cavity；Etching is set to described with cleaning assembly
In vacuum cavity, including chamber and limitting casing.Chamber includes the second water inlet and the second water outlet, is respectively communicated in described the
One water inlet and first water outlet；Limitting casing is suspended in the indoor liquid of the chamber, and the limitting casing forms a confinement, institute
Graphene film is stated in the confinement, the target substrate is set to the bottom of the chamber；Wriggling component is for controlling institute
State the flow velocity that liquid passes in and out the chamber；Wherein, as liquid level moves down, the graphene film moves to the target substrate.
An embodiment according to the present utility model, the graphene film transfer device includes vacuum pump, the vacuum
Pump is connected to the shell by pipe, the enclosure interior is formed the vacuum cavity.
An embodiment according to the present utility model, the wriggling component include the first peristaltic pump and the second peristaltic pump, institute
The first peristaltic pump is stated set on first water inlet side, second peristaltic pump is set to first water outlet side.
The replacing velocity of an embodiment according to the present utility model, first peristaltic pump and second peristaltic pump is
30-60mL/min。
An embodiment according to the present utility model, when performing etching step, the liquid is sodium peroxydisulfate；Work as progress
When cleaning step, the liquid is deionized water.
An embodiment according to the present utility model, the concentration of the sodium peroxydisulfate are 0.8-1.2mol/L.
An embodiment according to the present utility model, the limitting casing are rounded or square.
An embodiment according to the present utility model, the target substrate are set to the underface of the limitting casing, the mesh
The area for marking substrate is greater than or equal to the area of the confinement.
An embodiment according to the present utility model, the intracorporal pressure of vacuum chamber are less than 100Pa.
An embodiment according to the present utility model, second water outlet is close to the cavity bottom.
As shown from the above technical solution, exist the advantages of the graphene film transfer device of the utility model with good effect
In:
Graphene film transfer device provided by the utility model includes shell, etching and cleaning assembly and wriggling group
Part, enclosure interior form vacuum cavity, and graphene film is set in limitting casing, and can be moved down with liquid level and be transferred to target substrate.
Accordingly, it since etching and cleaning process all carry out under vacuum conditions, under the action of negative pressure, effectively reduces in transfer process
The bubble of introducing.In addition, graphene film is slowly equably fallen in target substrate as liquid level moves down, avoids and shifted
Fold occurs in journey.
Detailed description of the invention
Its example embodiment is described in detail by referring to accompanying drawing, above and other feature and advantage of the utility model will
It becomes readily apparent from.
Fig. 1 is a kind of schematic diagram of graphene film transfer device shown according to an illustrative embodiments.
Fig. 2 is the top view according to etching and cleaning assembly shown in an illustrative embodiments.
Wherein, the reference numerals are as follows:
100, shell
101, the first water inlet；
102, the first water outlet
103, vacuum cavity
200, etching and cleaning assembly
210, chamber
211, the second water inlet
212, the second water outlet
220, limitting casing
221, confinement
300, wriggling component
310, the first peristaltic pump
320, the first hose
330, the second peristaltic pump
340, the second hose
400, vacuum pump
Specific embodiment
Example embodiment is described more fully with reference to the drawings.However, example embodiment can be with a variety of shapes
Formula is implemented, and is not understood as limited to embodiment set forth herein；On the contrary, thesing embodiments are provided so that this is practical new
Type will be full and complete, and the design of example embodiment is comprehensively communicated to those skilled in the art.It is identical in figure
Appended drawing reference indicates same or similar structure, thus the detailed description that will omit them.
Although the term of relativity is used in this specification, for example, "upper", "lower" come describe a component of icon for
The relativeness of another component, but these terms are in this manual merely for convenient, for example, with reference to the accompanying drawings described in
Exemplary direction.It is appreciated that, if making it turn upside down the device overturning of icon, the component described in "upper" will
The component in "lower" can be become.Term of other relativities, such as "top", "bottom" etc. also make have similar meaning.Term " one
It is a ", " one ", "the" and " described " to indicate there are one or more elements/component part/etc.；Term " comprising " and " tool
Have " to indicate the open meaning being included and refer to that the element/component part/in addition to listing can also deposit other than waiting
Other element/component part/etc.；Term " first ", " second ", " third " and " the 4th " etc. is only used as label, no
It is the quantity limitation to its object.
Referring to Fig. 1, representatively illustrating the graphene film transfer dress that can embody the utility model principle in Fig. 1
It sets.In the illustrative embodiments, the utility model proposes graphene film transfer device be to be shifted with graphene film
It is illustrated for target substrate.It is filled those skilled in the art should understand that graphene film is shifted
It sets and is applied to other field, and a variety of remodeling, addition, substitution, deletion or other variations are made to following specific embodiments,
It is still within the protection scope of the present utility model.
Wherein, Fig. 1 is a kind of schematic diagram of graphene film transfer device shown according to an illustrative embodiments.Figure
2 be the top view according to etching and cleaning assembly shown in an illustrative embodiments.
Below with reference to above-mentioned attached drawing, to the utility model proposes graphene film transfer device each chief component
Structure, connection type and functional relationship be described in detail.
As depicted in figs. 1 and 2, in the present embodiment, graphene film transfer device is to shift graphene film
To target substrate, including shell 100, etching and cleaning assembly 200 and wriggling component 300.
Shell 100 includes the first water inlet 101 and the first water outlet 102, forms vacuum cavity 103 inside shell 100.Its
In, following vacuum pumps 400 can be used in the formation of vacuum environment in shell 100, can also use vacuum generator or this field
Well known device/technology.
Etching is set in vacuum cavity 103 with cleaning assembly 200, and etching includes chamber 210 and limit with cleaning assembly 200
Position frame 220.There is liquid, chamber 210 includes the second water inlet 211 and the second water outlet 212, the second water inlet inside chamber 210
Mouth 211 is connected to the first water inlet 101, and the second water outlet 212 is connected to the first water outlet 102, for example, mode of communicating can
Using corrosion-resistant hose.Limitting casing 220 is suspended in liquid, and forms a confinement 221, and graphene film is set in confinement 221, mesh
Mark the bottom that substrate is set to chamber 210.Wherein, target substrate may include silicon wafer, quartz, glass, ceramics or other materials
Substrate.
Wriggling component 300 can be set in the outside of shell 100, for controlling the flow velocity of liquid disengaging.
Wherein, after the completion of etch step and cleaning step, as liquid level moves down, graphene film decline, until transfer
To target substrate.
Graphene film transfer device provided by the utility model, when in use, by the graphene film Jing Guo pre-treatment
It is placed in the confinement 221 of limitting casing 220, performs etching step.Meanwhile vacuum environment is formed inside shell 100.It carves at room temperature
After a certain period of time, former base bottom disappears substantially for erosion.Then, deionized water is provided into chamber 210, and is mentioned by wriggling component 300
Deionized water is replaced into the remaining etching liquid of etch step for power.After the completion of displacement, stop the supply of deionized water, opens the
One water outlet 102.Finally, as liquid level moves down, graphene film decline is transferred to target substrate.Due to etching and cleaning step
Suddenly it all carries out under vacuum conditions, the effect of negative pressure under vacuum can effectively reduce the bubble introduced in transfer process.
Wherein, the pre-treatment of graphene film can be used such as under type:
The stone that continuous area is at least 80*80mm is generated in the copper foil surface of 25 μ m-thicks with conventional chemical vapor method
Black alkene film.Pass through spin coater one layer of PMMA film of spin coating on the surface of graphene later.Spin coater revolving speed is adjustable to 1000-
6000r/min.90W oxygen plasma etch 5-10min is finally used, and then removes the graphene at the back side.
In the present embodiment, as shown in Figure 1, wriggling component 300 may include the first peristaltic pump 310 and the second peristaltic pump
330, the first peristaltic pump 310 is set to 101 side of the first water inlet, and the second peristaltic pump 330 is set to 102 side of the first water outlet.The
One peristaltic pump 310 can be connected to the first water inlet 101 by the first hose 320, and the second peristaltic pump 330 can be soft by second
Pipe 340 is connected to the second water inlet 211.After the completion of etch step, by the effect of the first peristaltic pump 310, by deionized water
It is pumped into the first water inlet 101, hence into chamber 210, and by the effect of the second peristaltic pump 330, by remaining etching
Liquid pump goes out the first water outlet 102.By the collective effect of the first peristaltic pump 310 and the second peristaltic pump 330, will be carved with deionized water
It is clean to lose liquid displacement.
Further, in the present embodiment, the replacing velocity of the first peristaltic pump 310 and second peristaltic pump 330 is
30-60mL/min。
Further, in the present embodiment, the etching liquid in etch step can be sodium peroxydisulfate, sodium peroxydisulfate it is dense
Degree can be 0.8-1.2mol/L, such as 0.9mol/L, 1mol/L, 1.2mol/L etc..
Further, in the present embodiment, limitting casing 220 can be rounded or square, corresponding 220 shape of limitting casing
At confinement 221 can be rounded or square.
Further, in the present embodiment, in order to be fully transferred to graphene film in target substrate, guarantee graphite
The transfer integrity degree of alkene, the area of target substrate may be greater than or equal to confinement 221 area.
Further, in the present embodiment, the pressure in vacuum cavity 103 can be less than 100Pa.
Further, as shown in Figure 1, in the present embodiment, during guaranteeing cleaning step, deionized water can
Remaining etching liquid is excluded clean, the second water outlet 212 is closer to the bottom of chamber 210, after the completion of avoiding cleaning step, chamber
Etching liquid is also remained in room 210.
Further, in the present embodiment, shell 100, etching with cleaning assembly 200 (chamber 210 and limitting casing 220)
It can be made of inert material, such as ceramics etc., guarantee that above-mentioned component does not react with etching liquid.
It should be noted here that being shown in attached drawing and the graphene film transfer device described in the present specification is only to adopt
With an example of the principles of the present invention.Those skilled in the art should be clearly understood that the utility model
Principle be not limited only to show in attached drawing or specification described in device any details or any part.
Below by taking former base bottom is copper foil, target substrate is silicon wafer as an example, transfer dress provided by the utility model is described in detail
The course of work set:
Processed graphene film is placed at 221 position of confinement of limitting casing 220, includes 1mol/L in chamber 210
The etching liquid of sodium peroxydisulfate, sealing transfer device simultaneously vacuumize, and make the intracorporal pressure of chamber lower than 100Pa.Copper foil is etched at room temperature
Substrate is no less than 30 minutes.Since shell 100 is vacuum environment, no obvious bubble is generated.
When being etched to no copper foil substrate residual, deionized water is replaced into the remaining etching liquid of etch step by peristaltic pump,
The replacing velocity of peristaltic pump is 30-60mL/min, and guarantees the replacing velocity one of the first peristaltic pump 310 and the second peristaltic pump 330
It causes, time swap is at least 1h.After being replaced, the peristaltic velocity of the second peristaltic pump 330 is adjusted to maximum flow rate, first wriggles
The peristaltic velocity of pump 310 is adjusted to zero.With moving down for liquid level, limitting casing 220 and graphene film move down together with liquid level, finally
Graphene is smooth to be fallen on a silicon substrate.
The graphene for being placed on silicon base takes out, and dries 12h in vacuum drying chamber, then dry 30 under infrared light irradiation
Minute, 150 DEG C are heated 30 minutes.Last reusable heat acetone removes the PMMA of graphene surface.
In conclusion due to the etching and cleaning process of graphene film transfer device provided by the utility model be all
It is carried out under vacuum environment, under the action of negative pressure, effectively reduces the bubble introduced in transfer process.In addition, as liquid level moves down,
Graphene film is slowly equably fallen in target substrate, avoids and fold occurs in transfer process.
It should be appreciated that the utility model be not limited in its application to this specification proposition component detailed construction and
Arrangement.The utility model can have other embodiments, and can realize and execute in many ways.Aforementioned change
Shape form and modification are fallen in the scope of the utility model.It should be appreciated that this reality of this disclosure and restriction
It is mentioned or all alternative groups of two or more apparent independent features with the novel text and/or drawings that extend to
It closes.All these different combinations constitute multiple alternative aspects of the utility model.Embodiment described in this specification is said
The best mode for becoming known for realizing the utility model is illustrated, and those skilled in the art will be enable practical new using this
Type.
Claims (10)
1. a kind of graphene film transfer device, graphene film is transferred to target substrate, which is characterized in that the stone
Black alkene film-transferring device includes:
Shell, including the first water inlet and the first water outlet, the enclosure interior form vacuum cavity；
Etching and cleaning assembly are set in the vacuum cavity, comprising:
Chamber, including the second water inlet and the second water outlet, second water inlet are connected to first water inlet, and described
Two water outlets are connected to first water outlet；
Limitting casing is suspended in the indoor liquid of the chamber, and the limitting casing forms a confinement, and the graphene film is set to described
In confinement, the target substrate is set to the bottom of the chamber；
Wriggling component passes in and out the flow velocity of the chamber for controlling the liquid；
Wherein, as liquid level moves down, the graphene film is transferred to the target substrate.
2. graphene film transfer device according to claim 1, which is characterized in that the graphene film transfer device
Including vacuum pump, the vacuum pump is connected to the shell by pipe, the enclosure interior is formed the vacuum cavity.
3. graphene film transfer device according to claim 1, which is characterized in that the wriggling component includes first compacted
Dynamic pump and the second peristaltic pump, first peristaltic pump are set to first water inlet side, and second peristaltic pump is set to described
First water outlet side.
4. graphene film transfer device according to claim 3, which is characterized in that first peristaltic pump and described
The replacing velocity of two peristaltic pumps is 30-60mL/min.
5. graphene film transfer device according to claim 1, which is characterized in that described when performing etching step
Liquid is sodium peroxydisulfate；When carrying out cleaning step, the liquid is deionized water.
6. graphene film transfer device according to claim 5, which is characterized in that the concentration of the sodium peroxydisulfate is
0.8-1.2mol/L。
7. graphene film transfer device according to claim 1-6, which is characterized in that the limitting casing is in circle
Shape or square.
8. graphene film transfer device according to claim 1-6, which is characterized in that the target substrate is set
In the underface of the limitting casing, the area of the target substrate is greater than or equal to the area of the confinement.
9. graphene film transfer device according to claim 1-6, which is characterized in that in the vacuum cavity
Pressure be less than 100Pa.
10. graphene film transfer device according to claim 1-6, which is characterized in that second water outlet
Mouth is close to the cavity bottom.
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|---|---|---|---|
| CN201920038866.XU CN209442655U (en) | 2019-01-09 | 2019-01-09 | Graphene film transfer device |
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| CN201920038866.XU CN209442655U (en) | 2019-01-09 | 2019-01-09 | Graphene film transfer device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112794317A (en) * | 2021-01-18 | 2021-05-14 | 刘春龙 | Graphene vacuum sealing and transferring device |
-
2019
- 2019-01-09 CN CN201920038866.XU patent/CN209442655U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112794317A (en) * | 2021-01-18 | 2021-05-14 | 刘春龙 | Graphene vacuum sealing and transferring device |
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