CN208308668U - A kind of quartz glass deposition furnace - Google Patents
A kind of quartz glass deposition furnace Download PDFInfo
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- CN208308668U CN208308668U CN201820162073.4U CN201820162073U CN208308668U CN 208308668 U CN208308668 U CN 208308668U CN 201820162073 U CN201820162073 U CN 201820162073U CN 208308668 U CN208308668 U CN 208308668U
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Abstract
The utility model is the cvd furnace about a kind of high uniformly quartz glass of large scale, including plane furnace roof, furnace body, sedimentation basin, deposition substrate, deposition basic rod, rotation and jacking system, wherein deposition substrate is connect with sedimentation basin；Deposition basic rod is connect with deposition substrate；Rotation is connect with jacking system with deposition basic rod, and rotation drives deposition substrate movement by deposition basic rod with jacking system；Reactive combustion device combiner, the reactive combustion device combiner includes multiple reactive combustion devices, point centered on the center of definition combiner, using the central point as origin, is drawn and justified as radius using origin to the distance of reactive combustion device, at least two default circles are obtained, it is each to preset on round circumference at least provided with a reactive combustion device.Large scale, high uniform quartz glass have been prepared using device provided by the utility model, met demand of each field to quartz glass high uniformity.
Description
Technical field
The utility model belongs to quartz glass production technical field, more particularly to a kind of high uniform quartz glass of large scale
And preparation method thereof and device.
Background technique
Currently, the direct preparation process of quartz glass mainly has electric smelting, gas refining, chemical vapor deposition and plasma chemical gas
Mutually deposition etc..Wherein, large size and high quality quartz glass relies primarily on chemical vapor deposition process preparation.Currently, chemical gas
Phase depositing operation mainly has horizontal and vertical two kinds of deposition methods.Due to horizontal chemical vapour deposition technique can not produce large scale,
The quartz glass of high weight is cut or polish jade with an emery wheel, and furnace temperature is low, energy consumption is high and low efficiency, gradually replaced vertical chemical vapor deposition.It is existing
Have in vertical chemical vapour deposition technique, mainly by hydrogen and oxygen are burnt in the burner generate vapor after with combustion
Gaseous silicon reaction generates silica dioxide granule in burner feeder pipe, and silica dioxide granule is deposited directly to shape on basic rod
It is cut or polish jade with an emery wheel at quartz glass.Process is cut or polish jade with an emery wheel in deposition quartz glass, the centrifugal force and gravity cut or polish jade with an emery wheel by the quartz glass of high-temperature fusion,
The quartz glass of center deposition is forced gradually to spread and growth and shaping to edge, to obtain larger-diameter quartz glass stone roller.
And in order to guarantee the stable formation of quartz glass stone roller, the deposition method inevitable requirement deposited weight surface there are certain temperature gradient,
Else if center is consistent with edge temperature, the flowing that glass metal at high temperature can be unlimited causes quartz glass stone roller that can not shape.
Therefore, synthetic quartz glass is deposited using this method, regardless of how many a burners are arranged, is required to the temperature gradient of depositional plane extremely
Less at 200 DEG C or more.
The center that the temperature gradient of depositional plane can be such that quartz glass cuts or polish jade with an emery wheel to edge structure there are larger difference, such as quartz glass
The hydroxy radical content of glass is gradually decreased along center to edge, which results in the refractive index of quartz glass, density equal distribution are uneven, into
And influence the structural homogeneity in the depositional plane direction of quartz glass.Meanwhile using the gravity pouring machine of direction manufacture quartz glass stone roller
Reason is forced gradually to be formed to edge diffusion from center by centrifugal force and gravity, i.e., entire depositional plane is normal state point
There is stratiform phenomenon, have seriously affected its vertical structure uniformity in cloth form, the genesis analysis for causing quartz glass to be cut or polish jade with an emery wheel.Therefore,
All there is the non-uniform phenomenon of structure using the quartz glass stone roller of this method manufacture, and then the peacekeeping for influencing quartz glass is three-dimensional
The performances such as optical homogeneity, stress, finally destroy the imaging of the fields precision optical systems such as space flight, nuclear technology, precision instrument
Quality.
Utility model content
The main purpose of the utility model is that provide a kind of large scale high uniformly quartz glass deposition furnace and method, institute
Technical problems to be solved have been to provide a kind of quartz glass deposition furnace, using device provided by the utility model, can be prepared into
To large scale, high uniform quartz glass, it is uniform to quartz glass height, low to meet the fields such as space flight, nuclear technology, precision instrument
The demand of stress, thus more suitable for practical.
It the purpose of this utility model and solves its technical problem and adopts the following technical solutions to realize.
According to the utility model proposes a kind of quartz glass deposition furnace, the cvd furnace include plane furnace roof, furnace body,
Sedimentation basin, deposition substrate, deposition basic rod, rotation and jacking system, wherein deposition substrate is connect with sedimentation basin；Deposition basis
Bar is connect with deposition substrate；The rotation is connect with jacking system with the deposition basic rod, the rotation and lifting
System drives deposition substrate movement by deposition basic rod；Reactive combustion device combiner, the reactive combustion device combination section
Part includes multiple reactive combustion devices, point centered on the center of combiner is defined, using the central point as origin, with original
The distance of point to reactive combustion device is that radius draws circle, obtains at least two default circles, is at least arranged on each circumference for presetting circle
There is a reactive combustion device.
It the purpose of this utility model and solves its technical problem also following technical measures can be used to further realize.
Preferably, a kind of quartz glass deposition furnace above-mentioned, further includes auxiliary burner.
Preferably, a kind of quartz glass deposition furnace above-mentioned, with the sequence of radius from small to large, the default circle is at least
The first default circle, the second default circle including successively arranging, described first presets the reactive combustion device provided circumferentially about of circle
Quantity less than second preset circle reactive combustion device provided circumferentially about quantity.
Preferably, a kind of quartz glass deposition furnace above-mentioned, with the sequence of radius from small to large, the default circle is at least
The first default circle, the second default circle and third including successively arranging preset circle, and definition second presets the radius and first of circle in advance
If the difference of the radius of circle is the first value, the difference for defining the radius that third presets the radius of circle and second presets circle is second value, institute
The first value stated is greater than second value.
Preferably, a kind of quartz glass deposition furnace above-mentioned, the reactive combustion device combiner are fixed on described
At plane furnace roof.
Preferably, a kind of quartz glass deposition furnace above-mentioned, wherein being provided with buffer layer outside the sedimentation basin.
Preferably, a kind of quartz glass deposition furnace above-mentioned, wherein the material of the buffer layer is quartz sand or fire resisting
Material.
Preferably, a kind of quartz glass deposition furnace above-mentioned, wherein being provided with fixed protective case outside the buffer layer.
It the purpose of this utility model and solves its technical problem also the following technical solution is employed to realize.
According to the utility model proposes a kind of quartz glass preparation method, including, will according to preparation facilities above-mentioned
Siliceous unstrpped gas or the silicon-containing material gas containing doped chemical are passed through in the flame of reactive combustion device, generate nano-silica
Silicon carbide particle or nanometer silicon dioxide particle containing doped chemical, and be deposited in the sedimentation basin of rotation；Sedimentation basin is located at heavy
Above product matrix, depositing base drives sedimentation basin to be rotated, and the silica dioxide granule generated is made uniformly to sink in the horizontal direction
It accumulates and melts to form quartz glass stone roller；Depositing base moves down in vertical direction, and the silica dioxide granule generated is made to hang down
Histogram deposits upwards and melts to form quartz glass stone roller；Repeatedly, the quartz glass is obtained.
It the purpose of this utility model and solves its technical problem also following technical measures can be used to further realize.
Preferably, the preparation method of a kind of quartz glass above-mentioned, wherein the speed that the depositing base moves down
For 0.1-50mm/h；Alternatively, the speed of depositing base rotation is that 1-100 turns/min；Alternatively, depositing temperature is 1500-2000 DEG C.
By above-mentioned technical proposal, the utility model proposes the high uniformly quartz glass deposition furnace of large scale, at least have
Following advantages:
1, the utility model provides a kind of device that can prepare large scale, high uniformly quartz glass.
Preparation facilities provided by the utility model is sedimentation basin, the nanometer silicon dioxide particle of generation is reacted, in cvd furnace
Interior deposition simultaneously melts, and forms quartz glass stone roller, and the setting of sedimentation basin can effectively prevent quartz glass stone roller unlimited during the deposition process
Flowing outward, it is difficult to form.Meanwhile in device provided by the utility model, it is provided with a circle buffer layer outside sedimentation basin, prevents from dropping
Warm process quartz glass and sedimentation basin expansion are inconsistent, and quartz glass is caused to crack.And fixed protection is provided with outside buffer layer
Set, for fixing sedimentation basin, prevents quartz glass swell in high-temperature deposition process.
Using device provided by the utility model, large scale, high uniform quartz glass can be prepared, meet boat
It, the fields such as nuclear technology, precision instrument are high to quartz glass uniformly, the demand of low stress.The ruler for the quartz glass being prepared
Very little to can be, diameter is not less than the large scale of 50mm, high uniform quartz glass stone roller not less than 600mm, thickness.
2, the utility model provides a kind of reactive combustion device combiner, passes through the number of reactive combustion device in combiner
Amount and position arrangement can make to react the silica dioxide granule cloth generated when preparing silica dioxide granule using the combiner
Full entire depositional plane completes uniform, the synchronous deposition in horizontal direction, by centrifugal force and gravity when avoiding single burner deposition
Glass structure is destroyed when making quartz glass from center to edge-diffusion, and then influences the uniformity of quartz glass.
It 3, further include auxiliary burner in the high uniformly quartz glass deposition furnace of large scale provided by the utility model, auxiliary
Burner mainly improves the temperature in stone roller face, reduces the temperature gradient in stone roller face, and then further dioxy of the melt deposition on stone roller face
The generation for the defects of silicon carbide particle is completely melt particle sufficiently, avoids raw meal particulate and bubble.
The above description is merely an outline of the technical solution of the present invention, in order to better understand the skill of the utility model
Art means, and can be implemented in accordance with the contents of the specification, below on the preferred embodiment of the present invention and the accompanying drawings in detail
It describes in detail bright as after.
Detailed description of the invention
Fig. 1 is the schematic diagram of quartz glass deposition furnace provided by the embodiment of the utility model.
Wherein, 1 burner (entirely reactive combustion device；Alternatively, a part is reactor burner, another part is auxiliary
Combustion-supporting burner), 2 quartz glass stone roller, 3 plane furnace roofs, 4 exhaust outlets, 5 furnace bodies, 6 sedimentation basins, 7 buffer layers (filling quartz sand, or
Person other refractory materials), 8 fixed protective cases, 9 refractory brickworks, 10 deposition substrates, 11 deposition basic rods, 12 rotations are with lifting
System.
Fig. 2 is reactive combustion device sub-assembly schematic diagram provided by the embodiment of the utility model.
Fig. 3 is another schematic diagram of reactive combustion device sub-assembly provided by the embodiment of the utility model.
Specific embodiment
Further to illustrate that the utility model is the technical means and efficacy reaching predetermined purpose of utility model and being taken,
Below in conjunction with attached drawing and preferred embodiment, to according to the utility model proposes large scale high uniformly quartz glass deposition furnace and side
Method, specific embodiment, structure, feature and its effect, detailed description is as follows.In the following description, a different " implementation
What example " or " embodiment " referred to is not necessarily the same embodiment.In addition, special characteristic, structure or spy in one or more embodiments
Point can be combined by any suitable form.
Embodiment 1
Present embodiments provide a kind of high uniformly quartz glass deposition furnace of large scale.As shown in Figure 1.
Preparation facilities provided in this embodiment includes cvd furnace, and sedimentation basin 6 is provided in deposition；Deposition substrate 10, and it is heavy
The connection of product pond；Basic rod 11 is deposited, is connect with deposition substrate；Rotation and jacking system 12 are connect with deposition basic rod, described
Rotation drives deposition substrate movement by deposition basic rod with jacking system；Reactive combustion device combiner, the reaction combustion
Burner combiner includes multiple reactive combustion devices, point centered on the center of combiner is defined, with the central point
It for origin, is drawn and is justified as radius using origin to the distance of reactive combustion device, obtain at least two default circles, each circumference for presetting circle
On at least provided with a reactive combustion device.
It include sedimentation basin in device provided in this embodiment, quartz glass stone roller has been more than its flowing temperature due to depositing temperature
Degree, it is difficult to form, can unlimited flowing outward, the setting of sedimentation basin limits the flowing of quartz glass, for quartz glass stone roller at
Type provides mold.Preferably, the material of the sedimentation basin can be aluminium oxide, zirconium oxide or zircon English etc..Preferably, it sinks
Product substrate 10 matches with 5 size of burner hearth, as shown in Figure 1, preventing cool ambient air from entering in burner hearth, reduces fire box temperature, together
When can enter burner hearth to avoid introduced contaminants, guarantee the purity of quartz glass.
Embodiment 2
Auxiliary burner is further includeed in quartz glass deposition furnace provided in this embodiment.
Auxiliary burner is used for silica dioxide granule of the melt deposition on quartz glass stone roller face, melts particle sufficiently,
The generation for the defects of avoiding raw meal particulate and bubble.Preferably, the temperature that auxiliary burner provides is 800-2000 DEG C, further
, the auxiliary burner is arranged at plane furnace roof together with reactive combustion device.The utility model does not limit auxiliary combustion
The quantity of device, it is preferred that the quantity of auxiliary burner can be 1-20.
Embodiment 3
A kind of reactive combustion device combiner is present embodiments provided, the combiner includes multiple reactive combustions
Device defines point centered on the center of combiner, using the central point as origin, with origin to reactive combustion device away from
Justify from being drawn for radius, obtains at least two default circles, each preset on the circumference of circle at least provided with a reactive combustion device.
Present embodiments providing one kind includes multiple reactive combustion device combiners." default circle " therein is virtually to tie
Structure, for determining position of multiple reactive combustion devices in combiner.Multiple reactive combustion devices during the deposition process, same to stepping
The deposition of row silica makes that more reactive combustion device is distributed on entire depositional plane, guarantees that each point does not leave the combustion of flame
Burner reduces the temperature difference of depositional plane, meanwhile, it ensure that the uniformity consistency of silica dioxide granule distribution, make two that reaction generates
Silicon oxide particle is covered with entire depositional plane, completes uniform, the synchronous deposition in horizontal direction, leans on when avoiding single burner deposition
Centrifugal force and gravity destroy glass structure when making quartz glass from center to edge-diffusion.And the utility model passes through combination section
The arrangement of reactive combustion device position in part makes to be both provided with one or more reactive combustion devices on each default circle, in deposition base
In the case that body rotates, the deposition route of the reactive combustion device on each default circle is circle, and multiple reactive combustion devices are then formed
Multiple circles.With the increase of default radius of circle, the quantity of the upper reactive combustion device of default circle can be increased, it is default to solve large radius
The more silica dioxide granules of deposition needed on circle just can guarantee entire depositional plane it is uniform with it is smooth.Meanwhile the combiner
The site of the silica dioxide granule of deposition is more accurate, improves the structural homogeneity for the quartz glass stone roller being prepared.It is preferred that
, the reactive combustion device outlet in the reactive combustion device combiner is vertical with deposition plate, deposits silicon dioxide vertical
On deposition plate.
As shown in Fig. 2, being provided at least one reactive combustion device 1 on each default circle.It should be noted that this is practical
The novel position to reactive combustion device on default circle is with no restrictions, it is preferred that multiple burners on single default circle are uniform
It is distributed on the default circle.
Preferably, the every increase 50-200mm of diameter of quartz glass stone roller increases 1-2 default circles, and is arranged on default circle
The quantity of reactive combustion device increase 1-5.
Embodiment 4
The present embodiment further provides a kind of arrangement mode of reactive combustion device in reactive combustion device combiner.
In the present embodiment, silica dioxide granule can be realized by increasing the method for presetting the upper reactive combustion device quantity of circle
Deposition in the horizontal plane.
With the sequence of radius from small to large, the default circle is preset including at least the default circle of successively arrangement first, second
Circle, the described first quantity for presetting the reactive combustion device provided circumferentially about of circle preset the provided circumferentially about of circle less than second
The quantity of reactive combustion device.
For example, as shown in figure 3, default circle includes the first default circle 112 of default circle 111, second, the default circle 113 of third, the
Setting is there are two reactive combustion device 101,102 on one default circle, on the second default circle setting there are three reactive combustion device 103,
104,105, third presets setting on circle, and there are four reactive combustion devices 106,107,108,109.
It should be noted that arrangement mode of the present embodiment in order to illustrate reactive combustion device in combiner, may omit
The default circle in part.In practical applications, the quantity of circle can be preset by increase, round radius is preset in adjustment, it is default to increase
The modes such as quantity of reactive combustion device on circle, obtain different combinations, to realize silica dioxide granule in the heavy of horizontal plane
Product.
Preferably, the difference of adjacent two radiuses for presetting circle is 50-200mm.
Embodiment 5
The present embodiment further provides a kind of arrangement mode of reactive combustion device in reactive combustion device combiner.
In the present embodiment, it can realize that silica dioxide granule exists by the way that the distance between adjacent two default circles are gradually reduced
Deposition on horizontal plane.Preferably, the quantity for the reactive combustion device being arranged on adjacent two default circles can be identical.
With the sequence of radius from small to large, the default circle is preset including at least the default circle of successively arrangement first, second
The difference of the default circle of round and third, the radius that the radius of circle is preset in definition second and first presets circle is the first value, and it is pre- to define third
If the radius of circle and second presets the difference of round radius as second value, first value is greater than second value.
It should be noted that portion is omitted in order to illustrate the arrangement mode of reactive combustion device in combiner in the present embodiment
Divide default circle.In practical applications, the modes such as the quantity of circle, the radius for adjusting default circle are preset by increasing, obtained different
Combination, to realize silica dioxide granule in the deposition of horizontal plane.
Embodiment 6
The present embodiment further provides a kind of positioning device of reactive combustion device.
According to position of multiple reactive combustion devices in default circle, the positioning device of reactive combustion device is set, it will be multiple
Reactive combustion device is fixed.
Preferably, which can be one or more circular shaped supports.According to virtual multiple default circle settings
Corresponding multiple circular shaped supports can further be connected multiple supporting elements by connecting elements, so that multiple reactions are fired
Burner becomes an entirety, is convenient for practical application.Specifically, the connection of the connecting elements and supporting element is to be detachably connected, with
Convenient for connecting different supporting elements, the reactive combustion device combiner of various combination is obtained.
Embodiment 7
The present embodiment further provides the positioning device of another reactive combustion device.
The positioning device of reactive combustion device provided in this embodiment is linear supporting element.
Specifically, the type that the reactive combustion device being located on different default circles can be arranged in a straight line, passes through one or more
Linear supporting element positions reactive combustion device.
Embodiment 8
Present embodiments provide a kind of position of reactive combustion device combiner.As shown in Figure 1, the cvd furnace includes
The plane furnace roof 3 at the top of cvd furnace is constituted, and, the furnace body 5 of cvd furnace side is constituted, the reactive combustion device combiner is solid
At the plane furnace roof.
Embodiment 9
It include buffer layer and fixed protective case in device provided in this embodiment.As shown in Figure 1, the buffer layer 7
It is arranged outside sedimentation basin, further, fixed protective case 8 is provided with outside buffer layer.The setting of buffer layer can effectively prevent cooling down
The expansion of quartz glass and sedimentation basin is inconsistent in the process causes quartz glass to crack.Fixation protective case outside buffer layer plays solid
The effect for determining sedimentation basin prevents quartz glass swell in high-temperature deposition process.Meanwhile in the prior art, sedimentation basin is usually
Disposably, the buffer layer in the utility model can be shape varistructure, can be used for the buffering of the sedimentation basin of different size,
In this way, the stone of different size and shape can be prepared in the case where being changed without fixed protective case, changing buffer layer shape
English glass stone roller.Alternatively, the shape invariance of fixed protective case, also can be set buffer layer of different shapes, to be used for different size
The preparation of quartz glass stone roller.
Embodiment 10
A kind of preparation method of quartz glass is present embodiments provided, including, it, will be siliceous using preparation facilities above-mentioned
Unstrpped gas or silicon-containing material gas containing doped chemical are passed through in the flame of reactive combustion device, generate nano silica
Grain or the nanometer silicon dioxide particle containing doped chemical, and be deposited in the sedimentation basin of rotation；Sedimentation basin is located at depositing base
Top, depositing base drive sedimentation basin to be rotated, and melt the silica dioxide granule generated uniform deposition and in the horizontal direction
Change forms quartz glass stone roller；Depositing base moves down in vertical direction, makes the silica dioxide granule generated in vertical direction
Upper deposition simultaneously melts to form quartz glass stone roller；Repeatedly, the quartz glass is obtained.
Preferably, the speed that the depositing base moves down is 0.1-50mm/h；Alternatively, the speed of depositing base rotation
Degree is that 1-100 turns/min；Alternatively, depositing temperature is 1500-2000 DEG C.Depositing temperature can by reactive combustion device combiner or
Part reactive combustion device, part auxiliary burner supply.
It in the preparation method of quartz glass provided by the utility model, can be, reactive combustion device does not move completely, deposition
Matrix does continuous slowly decline movement, keeps the outlet of reactive combustion device constant with the distance between depositing base.
The utility model can be by controlling each feeding quantity for presetting the reactive combustion device on round circumference, or control
Reactive combustion device quantity on each circumference for presetting circle, guarantees the planarization and uniformity of entire depositional plane silica.It is logical
Often, if control feeding quantity, should control along radial direction from center to edge, the feeding quantity of reactive combustion device successively increases
Add, wherein the reactive combustion device feeding quantity closer to center is smaller, the reactive combustion device feeding quantity at edge is maximum；If control is every
Number of burners on a circumference should then be controlled from center to edge along radial direction, reaction combustion on the same circumference
The quantity of burner successively increases, wherein the quantity of reactive combustion device is fewer on the circumference at center, on the circumference at edge
Reactive combustion device quantity is most.
Preferably, the silicon-containing material after the raw material can gasify, alternatively, the mixing of silicon-containing material and doped raw material
Object.Further, silicon-containing material gas is SiCl4, silane, organosilan, at least one in organosiloxane and polysiloxanes
Kind；The doped raw material include boron, aluminium Al, fluorine F, iron Fe, titanium Ti, cerium Ce, calcium Ca, magnesium Mg, sodium Na, potassium K, barium Ba, yttrium Y,
At least one of lanthanum La, zirconium Zr, germanium Ge compound.
Embodiment 11
Present embodiments provide a kind of large scale high uniformly quartz glass deposition furnace and method, wherein preparation facilities such as Fig. 1
It is shown.
First by SiCl4After material gasification, it is passed through reactive combustion device combiner 1 by a certain percentage (by 8 default circles
Composition, the quantity of each default upper reactive combustion device of circle is followed successively by 1,1,2,2,3,3,4,4) in all reactive combustion devices
Heart feeder pipe adjusts the SiCl of each reactive combustion device by mass flow controller4Raw material gas flow is 20g/min, and
The flow for keeping the fuel such as hydrogen and oxygen in each reactive combustion device is respectively that 120L/min, 80L/min carry out burner,
SiCl4Unstrpped gas chemically reacts in burned flame, forms silica dioxide granule；The outlet of reactive combustion device and deposition
Substrate 10 is vertical.
The silica dioxide granule formed in oxyhydrogen flame is gradually deposited in the deposition substrate 10 of rotation, and deposition substrate is
Quartz glass substrate；Deposition plate and sedimentation basin diameter are 1200mm；Deposition process deposition plate is with the speed uniform descent of 3mm/h；
Sedimentation time is 100 hours, and the large scale quartz glass stone roller 2 that diameter is 1200mm, thickness is 300mm is prepared.It is obtained to above-mentioned
The large scale quartz glass stone roller obtained carries out the heat treatment such as fine annealing, round as a ball, milling, flat stone mill, grinding and polishing and cold working
After process, the quartz glass shaped blank sheet of Φ 1000mm × 200mm is made.It is detected using planar laser interferometer above-mentioned at parison
The optical homogeneity of piece is 2.5 × 10-6(clear aperture is Φ 600mm).Existing deposition is not only substantially better than on specification
The quartz glass stone roller of preparation process production, and the key technical index such as optical homogeneity are increased dramatically.
Embodiment 12
Present embodiments provide a kind of large scale high uniformly quartz glass deposition furnace and method, wherein preparation facilities such as Fig. 1
It is shown.
First by octamethylcy-clotetrasiloxane (D4)、TiCl4After material gasification, it is passed through reactive combustion device group by a certain percentage
Close component 1 (be made of 8 default circles, the quantity of each default upper reactive combustion device of circle is followed successively by 1,1,2,2,3,3,4,4)
The center feeder pipe of all reactive combustion devices adjusts the D of each reactive combustion device by mass flow controller4And TiCl4Raw material
Gas flow is 20g/min and 1.5g/min, and the flow of the fuel such as hydrogen and oxygen in each reactive combustion device is kept to distinguish
Burner, D are carried out for 120L/min, 80L/min4And TiCl4Unstrpped gas chemically reacts in burned flame, is formed
The silica dioxide granule of Doped with Titanium；The outlet of reactive combustion device is vertical with deposition substrate 10.
The Doped with Titanium silica dioxide granule formed in oxyhydrogen flame is gradually deposited in the deposition substrate 10 of rotation, is sunk
Product substrate is quartz glass substrate；Deposition plate and sedimentation basin diameter are 1200mm；；Deposition process deposition plate is with the speed of 3mm/h
Uniform descent；Sedimentation time is 100 hours, and the large scale that diameter is 1200mm, thickness is 300mm is prepared and mixes titanium quartz glass
Stone roller 2.To the large scale of above-mentioned acquisition mix titanium quartz glass stone roller carry out the heat treatment such as round as a ball, milling, flat stone mill, grinding and polishing and
After process is cold worked, the quartz glass shaped blank sheet of Φ 1000mm × 200mm is made.It is 4 by its coefficient of expansion of sample detection
×10-8/ DEG C, the difference of the coefficient of expansion is 1 × 10 within the scope of entire Φ 1000mm bore-8/ DEG C, the coefficient of expansion and the coefficient of expansion
Uniformity is substantially better than the quartz glass of prior art preparation.
In the above-described embodiments, it all emphasizes particularly on different fields to the description of each embodiment, there is no the portion being described in detail in some embodiment
Point, reference can be made to the related descriptions of other embodiments.
It is understood that the correlated characteristic in above-mentioned apparatus can be referred to mutually.In addition, in above-described embodiment " the
One ", " second " etc. is and not represent the superiority and inferiority of each embodiment for distinguishing each embodiment.
Numberical range described in the utility model includes numerical value all within the scope of this, and including any within the scope of this
The value range of two values composition.
Technical characteristic in the utility model claims and/or specification can be combined, and a combination thereof mode is unlimited
The combination obtained in claim by adduction relationship.Group is carried out by the technical characteristic in claim and/or specification
Close obtained technical solution and the protection scope of the utility model.
The above descriptions are merely preferred embodiments of the present invention, not makees in any form to the utility model
Limitation, any simple modification, equivalent change and modification made by the above technical examples according to the technical essence of the present invention,
It is still within the scope of the technical solutions of the present invention.
Claims (6)
1. a kind of quartz glass deposition furnace, it is characterised in that:
The cvd furnace includes plane furnace roof, furnace body, sedimentation basin, deposition substrate, deposits basic rod, rotation and jacking system,
Wherein, buffer layer is provided with outside the sedimentation basin；
Fixed protective case is provided with outside the buffer layer；
Deposition substrate is connect with sedimentation basin；
Deposition basic rod is connect with deposition substrate；
The rotation is connect with jacking system with the deposition basic rod, and the rotation and jacking system pass through deposition base
Plinth bar drives deposition substrate movement；
Reactive combustion device combiner, the reactive combustion device combiner include multiple reactive combustion devices, define combination section
Point centered on the center of part using the central point as origin, is drawn as radius using origin to the distance of reactive combustion device and is justified,
At least two default circles are obtained, it is each to preset on round circumference at least provided with a reactive combustion device.
2. a kind of quartz glass deposition furnace according to claim 1, it is characterised in that:
It further include auxiliary burner.
3. a kind of quartz glass deposition furnace according to claim 1, it is characterised in that:
With the sequence of radius from small to large, the default circle includes at least the default circle of first successively to arrange, the second default circle,
Described first to preset the quantity of the reactive combustion device provided circumferentially about of circle provided circumferentially about anti-less than the second default circle
Answer the quantity of burner.
4. a kind of quartz glass deposition furnace according to claim 1, it is characterised in that:
With the sequence of radius from small to large, the default circle includes at least the default circle of first successively to arrange, the second default circle
Circle is preset with third,
Define second preset circle radius with first preset circle radius difference be the first value, define third preset circle radius and
Second difference for presetting the radius of circle is second value, and first value is greater than second value.
5. a kind of quartz glass deposition furnace according to claim 1, it is characterised in that:
The reactive combustion device combiner is fixed at the plane furnace roof.
6. a kind of quartz glass deposition furnace according to claim 1, it is characterised in that:
The material of the buffer layer is refractory material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201820162073.4U CN208308668U (en) | 2018-01-30 | 2018-01-30 | A kind of quartz glass deposition furnace |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820162073.4U CN208308668U (en) | 2018-01-30 | 2018-01-30 | A kind of quartz glass deposition furnace |
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