CN207845496U - A kind of high transmission muted color double-silver low-emissivity coated glass - Google Patents

A kind of high transmission muted color double-silver low-emissivity coated glass Download PDF

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CN207845496U
CN207845496U CN201721634031.8U CN201721634031U CN207845496U CN 207845496 U CN207845496 U CN 207845496U CN 201721634031 U CN201721634031 U CN 201721634031U CN 207845496 U CN207845496 U CN 207845496U
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glass
high transmission
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熊建
宋宇
黄家鸿
江维
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Xianning CSG Energy Saving Glass Co Ltd
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Xianning CSG Energy Saving Glass Co Ltd
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Abstract

The utility model provides a kind of high transmission muted color double-silver low-emissivity coated glass, including glass substrate layer G and film plating layer, and film plating layer includes 13 film layers conformed to successively outward from glass substrate layer, and wherein first layer is SiNxLayer, the second layer are ZnSnO layers, third layer ZnO layer, and the 4th layer is Ag layers, and layer 5 is NiCr layers, layer 6 TixSiyNzLayer, layer 7 SiNxLayer, the 8th layer is ZnSnO layers, and the 9th layer is ZnO layer, and the tenth layer is Ag layers, and eleventh floor is NiCr layers, and Floor 12 is TixSiyNzLayer, the 13rd layer is SiNxLayer, each film plating layer are plated in by way of magnetron sputtering on glass substrate layer successively.The utility model glass has many advantages, such as transmitance height, resistance to oxidation.

Description

A kind of high transmission muted color double-silver low-emissivity coated glass
Technical field
The utility model belongs to magnetron sputtering technology field, is related to a kind of double silver low-emissivity coateds of high transmission muted color Glass.
Background technology
As a kind of excellent construction material, glass has the function of light transmission, wind-proof snow, quilt due to its good permeability It is widely used in building.With the development of modern science and technology level, glass is endowed various new intensions, wherein low-E glass With its color beautiful and generous, preferable texture and excellent energy conservation characteristic, in building curtain wall field by extensive use. Low-E glass is also known as low emissivity glass, is often used magnetron sputtering method and deposits a nanometer film layer in glass substrate surface, and then changes The optics of glass, electricity, performance mechanically and chemically etc., reach the purpose of decoration, energy-saving and environmental protection.
As energy saving building material, the energy conservation characteristic of low-E glass compared with simple glass and heat-reflection coated glass, Low-E glass has high reflectivity to far infrared radiation.Indoor temperature can be kept to stablize, reduce building heating or refrigeration Energy consumption plays very outstanding effect of energy.And high-transparency Low-E glass is while ensureing excellent heat-insulating property With higher transmission of visible light, so daylighting effect is good, it is suitable for the high-permeability of north cold area and part region Building, prominent natural lighting effect.
The shortcomings that prior art:
1) existing high double-silver low-emissivity coated glass transmitance thoroughly is still difficult to meet customer need.
2) the existing high generally existing oxidative resistance of double silverskin systems thoroughly is poor, monolithic holding time short problem.
Invention content
The purpose of this utility model is the existing above problem in view of the prior art, and it is double to provide a kind of high transmission muted color Silver low-radiation coated glass, technical problem to be solved in the utility model are to improve plated film how by the design of film plating layer Glass transmitance, oxidation resistance.
The purpose of this utility model can be realized by following technical proposal:A kind of double silver low radiation platings of high transmission muted color Film glass, including glass substrate layer and film plating layer, the film plating layer include ten conformed to successively outward from the glass substrate layer Three film layers, wherein first layer SiNxLayer, the second layer be ZnSnO layer, third layer is ZnO layer, the 4th layer be Ag layers, the 5th Layer is NiCr layers, layer 6 TixSiyNzLayer, layer 7 SiNxLayer, the 8th layer is ZnSnO layers, and the 9th layer is ZnO layer, the Ten layers are Ag layers, and eleventh floor is NiCr layers, and Floor 12 is TixSiyNzLayer, the 13rd layer is SiNxLayer.
A kind of high transmission muted color double-silver low-emissivity coated glass, which is characterized in that the glass substrate layer is light transmittance Up to 90% or more high transparent glass.
A kind of high transmission muted color double-silver low-emissivity coated glass, which is characterized in that the first layer, the second layer, third Layer is the first dielectric combination layer, and the 4th layer is low radiation functions layer, and layer 5 is the first block protective layer, and layer 6 is mixed for titanium Miscellaneous crystallite protective layer, layer 7, the 8th layer, the 9th layer be the second dielectric combination layer, the tenth layer be low radiation functions layer, the tenth One layer is the second block protective layer, and Floor 12 is titanium doped crystallite protective layer, and the 13rd layer is third dielectric layer.
Since the art of this patent film layer transmitance is higher, the product chambers produced using common white glass basis piece are observed slightly outside Green, product appearance is neutral gray when being produced using high transparent glass as substrate.
The utility model advantage:
1, single transmittance > 80%
2, appearance color is neutrality, wherein penetrating color a* ∈ [- 4, -3], b* ∈ [1,2];Glass surface color a* ∈ [- 1,0], B* ∈ [- 7, -6];Film surface color a* ∈ [- 7, -6], b* ∈ [1,3];Glass surface low-angle color a* ∈ [- 2, -1], b* ∈ [- 8, -7].
3, oxidation resistent susceptibility is good, and experiment is placed in workshop, and the time is more than 70 hours (humidity >=70%, temperature >=20 DEG C).
4, photo-thermal function admirable, actual measurement mean heat transfer coefficient be 1.67, shading coefficient 0.48.
Description of the drawings
Fig. 1 is this high transmission muted color double-silver low-emissivity coated glass layer structure schematic diagram.
In figure, G, glass substrate layer;1, first layer;2, the second layer;3, third layer;4, the 4th layer;5, layer 5;6, Six layers;7, layer 7;8, the 8th layer;9, the 9th layer;10, the tenth layer;11, eleventh floor;12, Floor 12;13, the ten three Layer.
Specific implementation mode
It is specific embodiment of the utility model and in conjunction with attached drawing below, the technical solution of the utility model is made further Description, but the utility model is not limited to these examples.
As shown in Figure 1, this high transmission muted color double-silver low-emissivity coated glass includes glass substrate layer G and film plating layer, plating Film layer is compounded with 13 film layers from glass substrate layer successively outward, and wherein first layer 1 is SiNxLayer, the second layer 2 are ZnSnO Layer, third layer 3 are ZnO layer, and the 4th layer 4 is Ag layers, and layer 55 is NiCr layers, and layer 66 is TixSiyNzLayer, layer 77 For SiNxLayer, the 8th layer 8 is ZnSnO layers, and the 9th layer 9 is ZnO layer, and the tenth layer 10 is Ag layers, and eleventh floor 11 is NiCr layers, Floor 12 12 is TixSiyNzLayer, the 13rd layer 13 is SiNxLayer.Glass substrate layer G be light transmittance up to 90% or more height Saturating glass.First layer 1, the second layer 2, third layer 3 are the first dielectric combination layer, and the 4th layer 4 is low radiation functions layer, layer 5 5 be the first block protective layer, layer 66 be titanium doped crystallite protective layer, layer 77, the 8th layer 8, the 9th layer 9 for second electricity be situated between Matter combination layer, the tenth layer 10 is low radiation functions layer, and eleventh floor 11 is the second block protective layer, and Floor 12 12 is titanium doped Crystallite protective layer, the 13rd layer 13 is third dielectric layer.
A kind of high transmission muted color double-silver low-emissivity coated glass, preparation method include the following steps:
1), magnetron sputtering film layer;
A, magnetron sputtering first layer 1:
Target quantity:Exchange rotary target 3~4;Target is configured to sial (SiAl);Process gas ratio:Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 18~20nm;
B, the magnetron sputtering second layer 2:
Target quantity:Exchange rotary target 2~3;Target is configured to zinc-tin (ZnSn);Process gas ratio:Argon gas and oxygen The ratio of gas, argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 7~8nm;
C, magnetron sputtering third layer 3:
Target quantity:Exchange rotary target 1~2;Target is configured to zinc-aluminium (ZnAl);Process gas ratio:Argon gas and oxygen The ratio of gas, argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 15~6nm;
D, the 4th layer 4 of magnetron sputtering:
Target quantity:Direct current planar target 1;Target is configured to silver-colored (Ag);Process gas:Pure argon, sputtering pressure be 2~ 3×10-3mbar;Coating film thickness is 7~7.5nm;
E, magnetron sputtering layer 55:
Target quantity:Exchange rotary target 1;Target is configured to nickel chromium triangle (NiCr);Process gas:Pure argon, sputtering pressure For 2~3 × 10-3mbar;Coating film thickness is 0.1~0.5nm;
F, magnetron sputtering layer 66:
Target quantity:Exchange rotary target 1;Target is configured to titanium doped silicon ceramics;Process gas ratio:Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 5:1, sputtering pressure is 2~3 × 10-3mbar;Coating film thickness is 5~6nm;
G, magnetron sputtering layer 77:
Target quantity:Exchange rotary target 3~5;Target is configured to sial (SiAl);Process gas ratio:Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 42~44nm;
H, the 8th layer 8 of magnetron sputtering:
Target quantity:Exchange rotary target 2~3;Target is configured to zinc-tin (ZnSn);Process gas ratio:Argon gas and oxygen The ratio of gas, argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 18~20nm;
I, the 9th layer 9 of magnetron sputtering:
Target quantity:Exchange rotary target 2~3;Target is configured to zinc-aluminium (ZnAl);Process gas ratio:Argon gas and oxygen The ratio of gas, argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 27~29nm;
J, the tenth layer 10 of magnetron sputtering:
Target quantity:Exchange rotary target 1;Target is configured to silver-colored (Ag);Process gas ratio:Pure oxygen, sputtering pressure be 2~ 3×10-3mbar;Coating film thickness is 4~4.5nm;
The tenth layer 10 of magnetron sputtering can also be:
Target quantity:Direct current planar target 1;Target is configured to silver-colored (Ag);Process gas ratio:Pure oxygen, sputtering pressure be 2~ 3×10-3mbar;Coating film thickness is 5.5~6nm;
K, magnetron sputtering eleventh floor 11:
Target quantity:Exchange rotary target 1;Target is configured to nickel chromium triangle (NiCr);Process gas:Straight argon, sputtering pressure 2 ~3 × 10-3mbar;Coating film thickness is 0.2~0.4nm;
L, magnetron sputtering Floor 12 12:
Target quantity:Exchange rotary target 1;Target is configured to titanium doped silicon ceramics;Process gas ratio:Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 2~3 × 10-3mbar;;Coating film thickness is 5~6nm;
M, magnetron sputtering Floor 12 13:
Target quantity:Exchange rotary target 4~6;Target is configured to sial (SiAl);Process gas ratio:Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar;Coating film thickness is 42~43nm;
2), for the control of film plating layer overall thickness between 200~210nm, sputtering chamber is driven walking speed control in 4.5-5.0m/min.
Since the art of this patent film layer transmitance is higher, the product chambers produced using common white glass basis piece are observed slightly outside Green, product appearance is neutral gray when being produced using high transparent glass as substrate.
The specific embodiments described herein are merely examples of the spirit of the present invention.The utility model institute Belonging to those skilled in the art can make various modifications or additions to the described embodiments or using similar Mode substitute, but without departing from the spirit of the present application or beyond the scope of the appended claims.

Claims (3)

1. a kind of high transmission muted color double-silver low-emissivity coated glass, which is characterized in that including glass substrate layer G and film plating layer, The film plating layer includes 13 film layers conformed to successively outward from the glass substrate layer G, and wherein first layer (1) is SiNx Layer, the second layer (2) be ZnSnO layer, third layer (3) be ZnO layer, the 4th layer (4) be Ag layers, layer 5 (5) be NiCr layers, the 6th Layer (6) is TixSiyNzLayer, layer 7 (7) are SiNxLayer, the 8th layer (8) be ZnSnO layer, the 9th layer (9) be ZnO layer, the tenth layer (10) it is Ag layers, eleventh floor (11) is NiCr layers, and Floor 12 (12) is TixSiyNzLayer, the 13rd layer (13) are SiNxLayer.
2. a kind of high transmission muted color double-silver low-emissivity coated glass according to claim 1, which is characterized in that the glass Glass substrate layer G be light transmittance up to 90% or more high transparent glass.
3. a kind of high transmission muted color double-silver low-emissivity coated glass according to claim 1 or 2, which is characterized in that institute It is the first dielectric combination layer to state first layer (1), the second layer (2), third layer (3), and the 4th layer (4) are low radiation functions layer, the Five layers (5) are the first block protective layer, and layer 6 (6) is titanium doped crystallite protective layer, layer 7 (7), the 8th layer of (8), nine Layer (9) is the second dielectric combination layer, and the tenth layer (10) are low radiation functions layer, and eleventh floor (11) is that the second blocking is protected Layer, Floor 12 (12) are titanium doped crystallite protective layer, and the 13rd layer (13) are third dielectric layer.
CN201721634031.8U 2017-11-28 2017-11-28 A kind of high transmission muted color double-silver low-emissivity coated glass Active CN207845496U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108002711A (en) * 2017-11-28 2018-05-08 咸宁南玻节能玻璃有限公司 A kind of high transmission muted color double-silver low-emissivity coated glass and preparation method
CN110436794A (en) * 2019-08-16 2019-11-12 镇江爱豪科思电子科技有限公司 A kind of energy-saving solar control film glass and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108002711A (en) * 2017-11-28 2018-05-08 咸宁南玻节能玻璃有限公司 A kind of high transmission muted color double-silver low-emissivity coated glass and preparation method
CN110436794A (en) * 2019-08-16 2019-11-12 镇江爱豪科思电子科技有限公司 A kind of energy-saving solar control film glass and preparation method thereof

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