CN207130364U - A kind of controllable liquid phase epitaxy film preparation device of thickness - Google Patents
A kind of controllable liquid phase epitaxy film preparation device of thickness Download PDFInfo
- Publication number
- CN207130364U CN207130364U CN201720965539.XU CN201720965539U CN207130364U CN 207130364 U CN207130364 U CN 207130364U CN 201720965539 U CN201720965539 U CN 201720965539U CN 207130364 U CN207130364 U CN 207130364U
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- China
- Prior art keywords
- stove
- liquid phase
- phase epitaxy
- preparation device
- outer layer
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- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The utility model discloses a kind of controllable liquid phase epitaxy film preparation device of thickness of liquid phase epitaxy film preparation device technical field,Including outer layer stove and seed crystal stalk,The left and right sides is mounted on heater in the inner chamber of the outer layer stove,Equal hot-blast stove is installed in the inner chamber of the outer layer stove,The intracavity bottom of the hot-blast stove is provided with fire resisting seat,Crucible is installed at the top of the fire resisting seat,It is described to be mounted on fixed block at left and right sides of the inner chamber of hot-blast stove,The bottom of the fixed block is provided with hydraulic cylinder,The bottom of the hydraulic cylinder is provided with rotating seat,The left side outer wall of outer right wall and the left side pedestal of the right side pedestal is mounted on electric rotating machine,The utility model is by increasing loading cartridge,Uniformly raw material can be applied on limit slab by rotating,Film is set uniformly to prepare,And it can avoid influenceing and excluding caused by gravity because material quantity excessively causes the error of appearance,The thickness of film is set more intuitively to be controlled.
Description
Technical field
Liquid phase epitaxy film preparation device technical field is the utility model is related to, outside the controllable liquid phase of specially a kind of thickness
Prolong film preparation device.
Background technology
Liquid phase epitaxy (LPE) is by separating out solid matter in solution and being deposited on the method that monocrystalline thin layer is generated on substrate.
And the liquid phase epitaxy film preparation device that a kind of existing Application No. CN201120551449.9 thickness is controllable, pass through regulation
Rotating speed revolving force carrys out the thickness of adjusting film, in the case where calculating gravity, while rotation regulation thickness difficulty is larger, and meeting
Because gravity has error, so needing to improve this.
Utility model content
The purpose of this utility model is to provide a kind of thickness controllable liquid phase epitaxy film preparation device, above-mentioned to solve
The problem of thickness proposed in background technology can not be precisely controlled.
To achieve the above object, the utility model provides following technical scheme：A kind of controllable liquid phase epitaxy film of thickness
Preparation facilities, including outer layer stove and seed crystal stalk, the left and right sides is mounted on heater in the inner chamber of the outer layer stove, described outer
Equal hot-blast stove is installed, the intracavity bottom of the hot-blast stove is provided with fire resisting seat, the top of the fire resisting seat in the inner chamber of layer stove
Portion is provided with crucible, described that fixed block, the bottom installation of the fixed block are mounted at left and right sides of the inner chamber of hot-blast stove
There is a hydraulic cylinder, the bottom of the hydraulic cylinder is provided with rotating seat, and the rotating seat includes pedestal, outside the right side of the right side pedestal
The left side outer wall of wall and the left side pedestal is mounted on electric rotating machine, the output end left side of the right side electric rotating machine and left side
Run through the outer wall of adjacent side pedestal, the output end left side of the right side electric rotating machine on the right side of the output end of the electric rotating machine
Rotary shaft is respectively connected with the right side of the output end of the left side electric rotating machine, switch block, the switch block are plugged with the rotary shaft
Bottom connecting pole is installed, support beam is installed between connecting pole described in two groups, finite Thick, institute are welded in the support beam
The top that seed crystal stalk is arranged on outer layer stove is stated, and the seed crystal stalk runs through the top exterior walls of outer layer stove, the bottom of the seed crystal stalk
Substrate is connected with, cutting plate is installed on the outer wall of the substrate.
Preferably, the cutting plate groove to match with cutting plate is offered at the top of the limit slab.
Preferably, the joint place of the fire resisting seat and crucible is provided with electric heater.
Preferably, the length of the connecting pole and the internal diameter size of equal hot-blast stove match.
Preferably, the cutting plate, which is less than on the outer wall of substrate bottom position, uniformly offers through hole.
Compared with prior art, the beneficial effects of the utility model are：The utility model, can be with by increasing loading cartridge
Uniformly raw material is applied on limit slab by rotating, film is uniformly prepared, and the shadow caused by gravity can be avoided
Ring and exclude, because material quantity excessively causes the error of appearance, to make the thickness of film more intuitively be controlled.
Brief description of the drawings
Fig. 1 is the utility model structure diagram；
Fig. 2 is that the utility model limits slab top view；
Fig. 3 is this practical rotating seat structure schematic diagram.
In figure：1 outer layer stove, 2 heaters, 3 equal hot-blast stoves, 4 fire resisting seats, 5 crucibles, 6 fixed blocks, 7 hydraulic cylinders, 8 rotations
Seat, 81 pedestals, 82 electric rotating machines, 83 rotary shafts, 84 switch blocks, 9 connecting poles, 10 support beams, 11 limit slabs, 12 seed crystal stalks, 13 linings
Bottom, 14 cutting plates.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the embodiment of the utility model is carried out
Clearly and completely describing, it is clear that described embodiment is only the utility model part of the embodiment, rather than whole
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are not under the premise of creative work is made
The every other embodiment obtained, belong to the scope of the utility model protection.
Fig. 1-3 are referred to, the utility model provides a kind of technical scheme：A kind of controllable liquid phase epitaxy film preparation of thickness
Device, including outer layer stove 1 and seed crystal stalk 12, the left and right sides is mounted on heater 2 in the inner chamber of the outer layer stove 1, described
Equal hot-blast stove 3 is installed, the intracavity bottom of the hot-blast stove 3 is provided with fire resisting seat 4, the fire resisting in the inner chamber of outer layer stove 1
The top of seat 4 is provided with crucible 5, described to be mounted on fixed block 6, the fixed block 6 at left and right sides of the inner chamber of hot-blast stove 3
Bottom hydraulic cylinder 7 is installed, the bottom of the hydraulic cylinder 7 is provided with rotating seat 8, and the rotating seat 8 includes pedestal 81, right side
The left side outer wall of the outer right wall of the pedestal 81 and the left side pedestal 81 is mounted on electric rotating machine 82, the right side rotation
Run through the outer wall of adjacent side pedestal 81 on the left of the output end of motor 82 and on the right side of the output end of the left side electric rotating machine 82,
Rotary shaft is respectively connected with the left of the output end of the right side electric rotating machine 82 and on the right side of the output end of the left side electric rotating machine 82
83, be plugged with switch block 84 in the rotary shaft 83, the bottom of the switch block 84 is provided with connecting pole 9, connecting pole 9 described in two groups it
Between support beam 10 is installed, finite Thick 11 is welded in the support beam 10, the seed crystal stalk 12 is arranged on the top of outer layer stove 1
Portion, and the seed crystal stalk 12 runs through the top exterior walls of outer layer stove 1, the bottom of the seed crystal stalk 12 is connected with substrate 13, the lining
Cutting plate 14 is installed on the outer wall at bottom 13.
Wherein, the top of the limit slab 11 offers the cutting plate groove to match with cutting plate 14, can be controlled by cutting plate 14
The area of film and the thickness of control film, the joint place of the fire resisting seat 4 and crucible 5 is provided with electric heater, Flashmelt system
The raw material of standby film, the length of the connecting pole 9 and the internal diameter size of equal hot-blast stove 3 match, and connecting pole can be achieved and drive limit
The rotation of slab 11, prevents feeding of the substrate 13 in crucible 5, and the cutting plate 14 is less than on the outer wall of the bottom position of substrate 13
It is even to offer through hole, unnecessary raw material can be discharged by through hole.
Operation principle：After the utility model drives the feeding of substrate 13 by seed crystal stalk 12, electric rotating machine 82 is opened, drives rotation
Rotating shaft 83 and the rotation of switch block 84, connecting pole 9, support beam 10 and limit slab 11 is then driven to go to the downside of substrate 13, then
Shrink the rising that hydraulic cylinder 7 drives limit slab 11, by shrinking the distance of hydraulic cylinder 7, calculate substrate 13 with limit slab 11 away from
From, the thickness of specific film is determined, and the size of film is controlled by cutting plate 14, the raw material under molten condition is fully full of
In cutting plate 14, then the raw material having more is extruded by through hole by rotating seed crystal stalk 12, and raw material is smoothened, is reduced because of gravity
The influence brought.
While there has been shown and described that embodiment of the present utility model, for the ordinary skill in the art,
It is appreciated that these embodiments can be carried out with a variety of changes in the case where not departing from principle of the present utility model and spirit, repaiied
Change, replace and modification, the scope of the utility model are defined by the appended claims and the equivalents thereof.
Claims (5)
1. a kind of controllable liquid phase epitaxy film preparation device of thickness, including outer layer stove (1) and seed crystal stalk (12), its feature exist
In：The left and right sides is mounted on heater (2) in the inner chamber of the outer layer stove (1), is installed in the inner chamber of the outer layer stove (1)
There is equal hot-blast stove (3), the intracavity bottom of the hot-blast stove (3) is provided with fire resisting seat (4), the top peace of the fire resisting seat (4)
It is described to be mounted on fixed block (6) at left and right sides of the inner chamber of hot-blast stove (3) equipped with crucible (5), the fixed block (6)
Bottom is provided with hydraulic cylinder (7), and the bottom of the hydraulic cylinder (7) is provided with rotating seat (8), and the rotating seat (8) includes pedestal
(81), the left side outer wall of the outer right wall of the right side pedestal (81) and the left side pedestal (81) is mounted on electric rotating machine
(82), run through on the left of the output end of the right side electric rotating machine (82) and on the right side of the output end of the left side electric rotating machine (82)
The outer wall of adjacent side pedestal (81), the output end left side of the right side electric rotating machine (82) and the left side electric rotating machine (82)
Output end on the right side of be respectively connected with rotary shaft (83), switch block (84) is plugged with the rotary shaft (83), the switch block (84)
Bottom is provided with connecting pole (9), and support beam (10) is provided between connecting pole (9) described in two groups, is welded on the support beam (10)
Finite Thick (11) is connect, the seed crystal stalk (12) is arranged on the top of outer layer stove (1), and the seed crystal stalk (12) runs through outer layer stove
(1) top exterior walls, the bottom of the seed crystal stalk (12) are connected with substrate (13), are provided with and cut on the outer wall of the substrate (13)
Plate (14).
A kind of 2. controllable liquid phase epitaxy film preparation device of thickness according to claim 1, it is characterised in that：The limit
The cutting plate groove to match with cutting plate (14) is offered at the top of slab (11).
A kind of 3. controllable liquid phase epitaxy film preparation device of thickness according to claim 1, it is characterised in that：It is described resistance to
Fiery seat (4) and the joint place of crucible (5) are provided with electric heater.
A kind of 4. controllable liquid phase epitaxy film preparation device of thickness according to claim 1, it is characterised in that：The company
The length and the internal diameter size of equal hot-blast stove (3) for connecing post (9) match.
A kind of 5. controllable liquid phase epitaxy film preparation device of thickness according to claim 1, it is characterised in that：It is described to cut
Plate (14), which is less than on the outer wall of substrate (13) bottom position, uniformly offers through hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720965539.XU CN207130364U (en) | 2017-08-03 | 2017-08-03 | A kind of controllable liquid phase epitaxy film preparation device of thickness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720965539.XU CN207130364U (en) | 2017-08-03 | 2017-08-03 | A kind of controllable liquid phase epitaxy film preparation device of thickness |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207130364U true CN207130364U (en) | 2018-03-23 |
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ID=61640637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720965539.XU Expired - Fee Related CN207130364U (en) | 2017-08-03 | 2017-08-03 | A kind of controllable liquid phase epitaxy film preparation device of thickness |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207130364U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112160024A (en) * | 2020-09-02 | 2021-01-01 | 中国电子科技集团公司第十一研究所 | Graphite boat for multi-sheet type film vertical liquid phase epitaxy, growth device and growth method |
| CN113073383A (en) * | 2021-03-12 | 2021-07-06 | 电子科技大学 | Substrate clamp for growing garnet single-side thick film by liquid phase epitaxial method |
-
2017
- 2017-08-03 CN CN201720965539.XU patent/CN207130364U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112160024A (en) * | 2020-09-02 | 2021-01-01 | 中国电子科技集团公司第十一研究所 | Graphite boat for multi-sheet type film vertical liquid phase epitaxy, growth device and growth method |
| CN112160024B (en) * | 2020-09-02 | 2021-12-17 | 中国电子科技集团公司第十一研究所 | Graphite boat for multi-sheet type film vertical liquid phase epitaxy, growth device and growth method |
| CN113073383A (en) * | 2021-03-12 | 2021-07-06 | 电子科技大学 | Substrate clamp for growing garnet single-side thick film by liquid phase epitaxial method |
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180323 Termination date: 20180803 |
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| CF01 | Termination of patent right due to non-payment of annual fee |