CN207099468U - A kind of otpical leaf and casting of electronic device - Google Patents

A kind of otpical leaf and casting of electronic device Download PDF

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Publication number
CN207099468U
CN207099468U CN201720183301.1U CN201720183301U CN207099468U CN 207099468 U CN207099468 U CN 207099468U CN 201720183301 U CN201720183301 U CN 201720183301U CN 207099468 U CN207099468 U CN 207099468U
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layer
otpical leaf
utility
model
thickness
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赵长涛
罗富华
王继厚
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BYD Co Ltd
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BYD Co Ltd
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Abstract

The utility model provides a kind of otpical leaf, and the otpical leaf includes:The simultaneously substrate containing strain line, and plate first medium layer, absorbed layer, second dielectric layer and the ink layer set successively positioned at substrate strain line face;The first medium layer is identical with the Coating Materials of second dielectric layer and for selected from least one of five oxidation Tritanium/Trititaniums, niobium pentaoxide, titanium dioxide, zirconium dioxide;The absorbed layer is the silicon dioxide layer containing aluminium.In the utility model, by the absorbed layer set between first medium layer and second dielectric layer, membranous layer stability, tolerance can be effectively improved.The utility model additionally provides a kind of electronic equipment housing, and the casting of electronic device includes successively from the inside to the outside:Housing base material and otpical leaf, the housing base material are connected with otpical leaf by adhesive.

Description

A kind of otpical leaf and casting of electronic device
Technical field
It the utility model is related to a kind of otpical leaf and casting of electronic device.
Background technology
, it is necessary to which plating has a decoration coating of specific color in existing thin slice decoration technology, Spanish furnish film layer is usual By Ti3O5、Nb2O5、TiO2、ZrO2、SiO2Formed Deng material plating.But adhesive force of these materials on thin slice is generally poor, film The adhesion of interlayer and the compactness of film layer are all more low, and demand is generally unattainable in tolerance test.
The content of the invention
The utility model is intended at least solve one of above-mentioned technical problem to a certain extent or provided at a kind of useful Business selection.
Therefore, a purpose of the present utility model is to propose a kind of otpical leaf, the otpical leaf includes:Simultaneously contain The substrate of strain line, and plate first medium layer, absorbed layer, second dielectric layer and the ink set successively on substrate strain line face Layer;The first medium layer is identical with the Coating Materials of second dielectric layer and for selected from five oxidation Tritanium/Trititaniums, niobium pentaoxide, dioxy Change at least one of titanium, zirconium dioxide;The absorbed layer is the silicon dioxide layer containing aluminium.
Another purpose of the present utility model be propose a kind of electronic equipment housing, the casting of electronic device from it is interior to Include successively outside:Housing base material and otpical leaf, the housing base material and otpical leaf are described optically thin by optics gemel connection Piece is the otpical leaf in the utility model.
Otpical leaf provided by the utility model has sandwich construction, and the adhesive force and consistency of interlayer, which have, substantially to be carried Rise, the absorbed layer especially set in first medium layer and second medium interlayer, stability and the tolerance of film layer can be obviously improved Property.
Additional aspect and advantage of the present utility model will be set forth in part in the description, partly by from following description In become obvious, or by it is of the present utility model practice recognize.
Brief description of the drawings
Of the present utility model above-mentioned and/or additional aspect and advantage will in the description from combination accompanying drawings below to embodiment Become obvious and be readily appreciated that, wherein:
Fig. 1 is the otpical leaf sectional view of the utility model one embodiment;
Fig. 2 is the otpical leaf sectional view of another embodiment of the utility model;
Fig. 3 is the casting of electronic device sectional view of the utility model one embodiment.
Embodiment
Embodiment of the present utility model is described below in detail, the example of the embodiment is shown in the drawings, wherein from beginning Same or similar element is represented to same or similar label eventually or there is the element of same or like function.Below by ginseng The embodiment for examining accompanying drawing description is exemplary, it is intended to for explaining the utility model, and it is not intended that to the utility model Limitation.
The utility model proposes a kind of otpical leaf 100, as shown in figure 1, being a schematic diagram of the present utility model.Institute Stating otpical leaf 100 includes:The simultaneously substrate 101 containing strain line, and plate the first medium layer set successively positioned at substrate strain line face 102nd, absorbed layer 103, second dielectric layer 104 and ink layer 105;The first medium layer 102 and the plated film of second dielectric layer 104 Material is identical and for selected from least one of five oxidation Tritanium/Trititaniums, niobium pentaoxide, titanium dioxide, zirconium dioxide;The absorption Layer is the silicon dioxide layer containing aluminium.The otpical leaf is used to be fitted in transparent shell, on glass shell, can improve housing Appearance.
According to one embodiment of the present utility model, the thickness of the substrate 101 is 50-300 μm.The substrate 101 is Substrate commonly used in the art, it is specifically as follows glass substrate, polyethylene terephthalate(PET)Substrate, makrolon (PC)Substrate, polyethylene(PE)Substrate, thermoplastic polyurethane(TPU)Substrate, polyvinyl chloride(PVC)At least one of substrate.
According to one embodiment of the present utility model, the thickness of the first medium layer 102 is 5-50nm.Described first is situated between Matter layer 102 can be by five oxidation Tritanium/Trititaniums(Ti3O5), niobium pentaoxide(Nb2O5), titanium dioxide(TiO2), zirconium dioxide(ZrO2) At least one of material be made.
According to one embodiment of the present utility model, the thickness of the absorbed layer 103 is 5-50nm.The absorbed layer 103 It is made of mixing material, the adhesion of film layer can be effectively improved, film layer consistency can be effectively increased, it is stable improves film layer Property.When containing Al and Si elements simultaneously in the absorbed layer 103, the raising of film layer compactness and adhesive force can be advantageous to.Institute Plated film acquisition can be carried out with SiO2 and Al2O3 by stating absorbed layer 103.
According to one embodiment of the present utility model, the thickness of the second dielectric layer 104 is 5-50nm.Described second is situated between Matter layer 104 is by five oxidation Tritanium/Trititaniums(Ti3O5), niobium pentaoxide(Nb2O5), titanium dioxide(TiO2), zirconium dioxide(ZrO2)In At least one material is made.
According to one embodiment of the present utility model, the thickness of the ink layer 105 is 8-40 μm, and the ink layer is Ink is protected, can be avoided polluting with protection film layer.The ink layer is ink conventional in the art, is specifically as follows solvent-borne type At least one of ink, UV ink.
According to one embodiment of the present utility model, also plating is provided with oxygen between the second dielectric layer 104 and ink layer 105 Change aluminium lamination 106, the alumina layer thickness is 1-5nm.The alumina layer has reinforcement effect, and it is stable to effectively improve film layer Property, while oxidation of the outside air for film layer can be obstructed, further improve film layer tolerance.The alumina layer 106 can be with It is attached to by vacuum evaporation mode in second dielectric layer 104.
There is the otpical leaf 100 provided in the utility model film layer to consolidate, non-explosive film, compact spy between film layer Point, can be by being obtained on substrate 101 by the corresponding optical film of PVD mode plating.Concrete operation method can be: (1)Substrate 101 is surface-treated;(2)Plated in the evaporation of the surface vacuum of substrate 101 and plate first medium layer 102 successively, inhaled Receive layer 103, second dielectric layer 104;(3)Silk-screen:In step(2)Silk-screen at least one layer ink layer 105 on described optical thin film.
The step(1)In to substrate 101 carry out be surface-treated purpose be to form strain line, make the optics after the complete film layer of plating Thin slice can have more abundant decorative effect.The surface treatment method is surface treatment method conventional in the art, such as UV At least one of transfer, laser engraving, CNC engravings.
According to one embodiment of present invention, in step(2)Second dielectric layer 104 after plating alumina layer 106.
The utility model additionally provides a kind of electronic equipment housing 200, such as Fig. 3.The casting of electronic device is from the inside to the outside Include successively:Housing base material 201, otpical leaf 100;The housing base material 201 and otpical leaf 100 pass through connection.The shell The material of body base material 201 is glass shell, makrolon(PC)Housing, polyethylene(PE)At least one of housing.The glue Glutinous agent is OCA optical cements.
Otpical leaf provided by the utility model has good a consistency and tolerance, the adhesive force between each film layer Greatly promote, effectively increase the service life of product.
Embodiment 1
1st, by transparent thickness to transfer UV tree lace textures on 100 μm of PET sheet materials, the texture is that line footpath is 0.2mm, 5 μ m thicks, is cleaned up, and keeps membrane surface clean;
2nd, put into thin slice in vacuum coating equipment, pass through vacuum evaporation coating machine(South Korea's one machine of Korea Spro/Ф 1350)It is evacuated to 1 ×10-4Torr or so or more, Ion Cleaning is carried out, and carry out evaporation coating.Plated film order is first medium material(Material TiO2, oxygenation pressurize is 8 × 10-5Torr;Coating film thickness 30nm), absorbed layer(SiO2:Al2O3=9:1;Coating film thickness is 20nm)、 Second dielectric layer(Material:TiO2, oxygenation pressurize is 8 × 10-5Torr, coating film thickness 25nm), back-up coat AL2O3(6nm);
3rd, thin slice is passed through, otpical leaf sample S1 is prepared with two layers of ink of half tone silk-screen of 380 mesh, masking light.
Embodiment 2
According to the step in embodiment 1, in addition to not plating alumina layer, other are same as Example 1, and optics is prepared Chip sample S2.
Comparative example 1
According to the step in embodiment 1, in addition to not plating absorbed layer, other are same as Example 1.It is prepared optically thin Piece sample DS1.
Performance test:
1st, hundred lattice adhesive force are tested
According to standard《The scratch test of GB/T9286-1998 paint and varnish paint films》Middle adhesion test method is right S1-S2 and DS1 are tested.Adhesive force is descending to be labeled as successively:5B、4B、3B、2B、1B、0B.Test result is shown in Table 1.
2nd, anti-wear performance is tested
1)Prepare 3 parts of RKF 10K(Yellow cone)With 1 part of RKK15P(Green pyramid), common 15L, it is added to vibration Friction device(ROSLER, model R180/530 TE-30, frequency are 50 ± 0.5Hz, and amplitude is 1.65 ± 0.1mm)Grinding groove It is interior;
2)With in pipette, extract FC120 10ml to grinding groove, and add 0.5L water;
3)0.5L water is added in grinding groove;In test process 0.5L water and 10ml FC120 are added every 30min;
4)Each sample S1-S2 and DS1 are arranged in complete machine, vibration friction testing equipment is put into and is tested, each sample Check once within every 1 hour, record meets standard(Continuous sawtooth abrasion is no more than 10mm(Sawtooth defines:Linear abrasion region has two Between 1-1.5mm, width does not receive individual above position width more than 1.5mm);Point abrasion is no more than 1.5mm*1.5mm;1mm* 1mm ~ 1.5mm*1.5mm is no more than 2;Below 1mm*1mm disregards)Maximum duration.Test result is shown in Table 1.
3rd, scraping and wiping resistance performance is tested
With special steel wool(Steel wool model:#0000, producer:Bon Star STEEL WOOL)Apply the negative of 1kgf Carry, testing pressure head area is 2*2cm, is rubbed back and forth on sample S1-S2 and DS1 surfaces with 40 times/min speed, records nothing The maximum times of obvious cut, wherein, one way stroke is 40mm, and round trip is designated as 1 time.Test result is shown in Table 1.
4th, salt spraytest
It is continuously right using the NaCl solution that pH value is 6.8,5wt% in the closed environment that temperature is 35 DEG C, humidity is 90% Sample S1-S2 and DS1 surfaces carry out brine spray;After testing certain time, sample appearance is checked;Then 38 DEG C of temperature is used Water carries out soft flushing, and sample is checked after 2 hours with non-dust cloth wiped clean, room temperature, and record film layer outward appearance is no different Often, outward appearance is without significant change(Such as corrosion, discoloration and surface-treated layer peel off)Maximum duration.Test result is shown in Table 1.
Table 1:
The otpical leaf obtained by can be seen that in above-mentioned test result by the utility model has what is significantly improved Adhesive force and decay resistance.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show The description of example " or " some examples " etc. means specific features, structure, material or the spy for combining the embodiment or example description Point is contained at least one embodiment or example of the present utility model.In this manual, to the schematic table of above-mentioned term State and be not necessarily referring to identical embodiment or example.Moreover, specific features, structure, material or the feature of description can be Combined in an appropriate manner in any one or more embodiments or example.
Although embodiment of the present utility model has been shown and described above, it is to be understood that above-described embodiment is Exemplary, it is impossible to it is interpreted as not departing from the utility model to limitation of the present utility model, one of ordinary skill in the art Principle and objective in the case of above-described embodiment can be changed in the scope of the utility model, change, replace and Modification.

Claims (9)

1. a kind of otpical leaf, it is characterised in that the otpical leaf includes:The simultaneously substrate containing strain line, and positioned at substrate First medium layer, absorbed layer, second dielectric layer and the ink layer set is plated successively in strain line face;The first medium layer and second medium The Coating Materials of layer is identical and is one kind in five oxidation Tritanium/Trititaniums, niobium pentaoxide, titanium dioxide, zirconium dioxide;It is described Absorbed layer is the silicon dioxide layer containing aluminium.
2. otpical leaf according to claim 1, it is characterised in that the thickness of the substrate is 50-300 μm.
3. otpical leaf according to claim 1, it is characterised in that the thickness of the first medium layer is 5-50nm.
4. otpical leaf according to claim 1, it is characterised in that the thickness of the absorbed layer is 5-50nm.
5. otpical leaf according to claim 1, it is characterised in that the thickness of the second dielectric layer is 5-50nm.
6. otpical leaf according to claim 1, it is characterised in that the ink film thickness is 8-40 μm.
7. otpical leaf according to claim 1, it is characterised in that be provided between the second dielectric layer and ink layer Alumina layer.
8. otpical leaf according to claim 7, it is characterised in that the thickness of the alumina layer is 1-5nm.
9. a kind of electronic equipment housing, it is characterised in that the casting of electronic device includes successively from the inside to the outside:Housing base material and Otpical leaf;The housing base material and otpical leaf pass through optics gemel connection;The otpical leaf is any one of claim 1-8 The otpical leaf.
CN201720183301.1U 2017-02-28 2017-02-28 A kind of otpical leaf and casting of electronic device Active CN207099468U (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109874253A (en) * 2019-03-26 2019-06-11 Oppo广东移动通信有限公司 Shell and preparation method thereof and electronic equipment
CN110191604A (en) * 2019-06-27 2019-08-30 Oppo广东移动通信有限公司 Housing unit and preparation method thereof, electronic equipment
CN110290657A (en) * 2019-06-27 2019-09-27 Oppo广东移动通信有限公司 Housing unit and preparation method thereof and electronic equipment
CN110370854A (en) * 2019-07-23 2019-10-25 Oppo广东移动通信有限公司 Decorative membrance, housing unit and electronic equipment
CN113043782A (en) * 2021-04-19 2021-06-29 抚州联创恒泰光电有限公司 Decorative sheet and manufacturing method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109874253A (en) * 2019-03-26 2019-06-11 Oppo广东移动通信有限公司 Shell and preparation method thereof and electronic equipment
CN110191604A (en) * 2019-06-27 2019-08-30 Oppo广东移动通信有限公司 Housing unit and preparation method thereof, electronic equipment
CN110290657A (en) * 2019-06-27 2019-09-27 Oppo广东移动通信有限公司 Housing unit and preparation method thereof and electronic equipment
CN110370854A (en) * 2019-07-23 2019-10-25 Oppo广东移动通信有限公司 Decorative membrance, housing unit and electronic equipment
CN113043782A (en) * 2021-04-19 2021-06-29 抚州联创恒泰光电有限公司 Decorative sheet and manufacturing method thereof

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