CN206854263U - A kind of synchrotron radiation optical element carbon distribution cleaning device - Google Patents
A kind of synchrotron radiation optical element carbon distribution cleaning device Download PDFInfo
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- CN206854263U CN206854263U CN201720619170.7U CN201720619170U CN206854263U CN 206854263 U CN206854263 U CN 206854263U CN 201720619170 U CN201720619170 U CN 201720619170U CN 206854263 U CN206854263 U CN 206854263U
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Abstract
The utility model provides a kind of synchrotron radiation optical element carbon distribution cleaning device, including vacuum cavity；Radio-frequency signal generator, vacuum pump set, vacuum meter and the rga device connected with the vacuum cavity, the radio-frequency signal generator include inductive type radio-frequency power supply and plasma generator；The liquid nitrogen purification device connected with the radio-frequency signal generator；And the gas container connected by mass flowmenter with the liquid nitrogen purification device.The present apparatus is simple in construction, and cleaning efficiency is high, will not produce any damage to optical element, can meet optical element carbon distribution on-line cleaning problem in Synchrotron Radiation, can also be applied to other types of vacuum carbon distribution and clean.
Description
Technical field
It the utility model is related to a kind of vacuum carbon distribution cleaning device, more particularly to a kind of synchrotron radiation optical element carbon distribution
Cleaning device.
Background technology
Synchrotron radiation light beam line is placed in a set of optical vacuum system between storage rings and experiment centre, and it is mainly used in point
Light, monochrome and focus on specific wavelength synchrotron radiation light and be transferred to experiment centre.Optical element is its core component, such as in soft X
Optical band is using more changing various speculums, the focus lamp in the direction of light and spot size；Select photon energy
Grating etc..Therefore, optical element performance quality determines the luminous flux and resolution capability of bunch, so as to also determine experimental work
Quality and efficiency.
The irradiation pollution of optical element surface is the main reason for light beam line efficiency of transmission declines.It is fine through X-ray absorption
It is graphite mould carbon that structure, which can measure pollutant, and it can cause luminous flux of the photon energy more than carbon absorption side (about 250eV)
Heavy losses, while also reduce energy resolution because pollutant increases veiling glare.The best method for avoiding carbon to pollute in principle
To obtain the ultra-high vacuum environment without hydrocarbon group, such vacuum system is difficult to realize, pollution problem thus be difficult to avoid that.
For most synchrotron radiation optics elements, because the requirements such as its enormous size, face shape, roughness are very high, detection
Difficulty is big and involves great expense.It is if not only uneconomical but also because of optical element using the simple method for changing pollution optical element
Accurately reset the recovery with (super) high vacuum and waste the substantial amounts of time.In addition, it is only interim effective to replace, particularly exist
100-10eV wave bands are occurred again using pollution after a period of time, so it is each synchronous spoke that cleaning is carried out to optical element carbon distribution
Injection device has to one of key issue solved.
External each Synchrotron Radiation has developed several dirty available for synchrotron radiation optics element carbon by effort for many years
The method of cleaning is contaminated, general principle is reacted using ozone and carbon distribution, generates CO2Or CO discharge cavitys, so as to remove carbon distribution,
Reach the purpose of cleaning.
Studied for many years through external synchrotron radiation expert, it is understood that light beam line optical element surface pollution sources are graphite mould carbon.
Common minimizing technology is discharged to be oxidized for carbon monoxide or carbon dioxide, so as to reach the purpose of cleaning.Oxidation material
Using ozone, ozone is unstable, is extremely easy in decomposition decomposition at normal temperatures, decomposes rapidly at 200 DEG C.It is more stronger than the oxidisability of oxygen,
The half-life period of ozone is only 20~50min.Because ozone is unstable, easy decomposition, in general product can not be used as to store, therefore need
Manufacture at the scene.
The cleaning method of development abroad mainly has direct-current discharge, radio frequency discharge, uviol lamp and synchrotron radiation light irradiation etc..
Wherein charging method and synchrotron radiation light method are not required to open mirrored cabinet, need to be only passed through oxygen by interface, keep certain low
Vacuum.
Direct-current discharge is between optical element and relative electrode plus the DC disruptive voltage of more than one hectovolts, electrode and light
Learn and discharged between element support frame and tank wall so that partial vacuum room turns into oxygen plasma source, so as to realize to surface
The cleaning of carbon distribution；Optical element participates in electric discharge when DC electrode discharges, therefore is easily damaged optical element surface and occurs secondary
Pollution.
The ultraviolet light of low pressure ultraviolet mercury lamp energy while launch wavelength 254nm and 185nm, the luminous energy of 185nm length ultraviolet light
Oxygen (O2) in air can be resolved into ozone (O3) by amount；And the light energy of the ultraviolet light of 254nm wavelength can resolve into O3
O2 and active oxygen (O), this photosensitized oxidation course of reaction is carried out continuously, smelly under the irradiation of both short wave ultraviolet lights
Oxygen constantly can be generated and decomposed, and active oxygen atom will be generated constantly, and more and more, due to active oxygen atom (O)
There is strong oxidation, the carbon distribution oxidation generation carbon monoxide or carbon dioxide of optical element surface can be realized cleaning
Purpose.Ultraviolet light is then that placement uviol lamp, this method are entered in atmospheric environment at away from optical element surface several millimeters
OK.Because 185nm light penetration power is relatively low in air, very strong ozone concentration gradient around uviol lamp be present, so cleaning speed
Dependent on the surface distance of uviol lamp to optical element, general fluorescent tube need to be arranged on the position away from optical surface 5-10mm, with up to
To best cleaning performance.
Radio frequency method (RF) is that radio-frequency voltage is added in a pair of electrodes, and the oxygen that producing arc discharge makes to be passed through, which ionizes, to be produced
Chemical reaction generation carbon monoxide or carbon dioxide occur for the carbon distribution of oxygen atom, oxygen atom and optical element surface, so as to reach
The effect of cleaning.The advantages of this method is that the plasma that radio frequency discharge excites produces low energy ion, low energy ion pair
Optical element produces less infringement and pollution；Electrode may be mounted at vacuum cavity (i.e. mirrored cabinet) outside, avoid sputtering sedimentation
Introduce secondary pollution.
Application preferably at most produces ozone on-line cleaning using capacitive radio frequency discharge plasma method at present, such as South Korea's Pu item
Light source, German Bessy II, Singapore's light source etc., this method do not have to open mirrored cabinet, and cleaning process is controllable, while will not be to optics
Element surface produces damage, but capacitor type radio-frequency power supply caloric value is big, if scavenging period is oversize, it is possible to because generating heat conference
Damage is produced to the coating of optical element surface.
Utility model content
For above-mentioned the deficiencies in the prior art, the purpose of this utility model is, there is provided a kind of improved synchrotron radiation is used
Optical element carbon distribution cleaning device, to realize efficient, the lossless cleaning to optical element.
To achieve these goals, the utility model provides a kind of synchrotron radiation optical element carbon distribution cleaning device, bag
Include：
Vacuum cavity；
Radio-frequency signal generator, vacuum pump set, vacuum meter and the rga device connected with the vacuum cavity, this is penetrated
Frequency generator includes inductive type radio-frequency power supply and plasma generator；
The liquid nitrogen purification device connected with the radio-frequency signal generator；And
The gas container connected by mass flowmenter with the liquid nitrogen purification device.
Further, the quantity of the gas container is two, fills oxygen and argon gas respectively.
Further, the mass flowmenter and vacuum meter are connected with a mass flow controller respectively.
Further, the inductive type radio-frequency power supply is connected with a radio-frequency power supply controller.
Further, the vacuum pump set is separately mounted to the diagonal bits of the vacuum cavity with the radio-frequency signal generator
Put.
Further, the residual gas analyzer is set adjacent to the vacuum pump set.
In summary, the utility model can be by the mixed gas of purge gas by mass flowmenter, vacuum meter and vacuum pump set
Ratio, gas flow and cleaning air pressure adjustment are to optimum value, so as to reach optimal cleaning effect；It can be protected by liquid nitrogen purification device
The purity of purge gas is demonstrate,proved, so as to prevent the moisture that mixes in gas and other impurity from producing secondary damage to optical element；It is logical
Cross monitoring of the residual gas analyzer to residue carbon elements in vacuum cavity and can determine that the optimal clean time.The letter of present apparatus structure
Single, cleaning efficiency is high, will not produce any damage to optical element, can meet that optical element carbon distribution exists in Synchrotron Radiation
Line cleans problem, can also be applied to other types of vacuum carbon distribution and clean.
Brief description of the drawings
Fig. 1 is a kind of structural representation of synchrotron radiation optical element carbon distribution cleaning device of the utility model.
Including：1- vacuum cavities；2- gas containers；3- mass flowmenters；4- liquid nitrogen purification devices；5- radio frequencies occur
Device；6- vacuum pump sets；7- rga devices；8- vacuum meters.
Embodiment
Below in conjunction with the accompanying drawings, preferred embodiment of the present utility model is provided, and is described in detail, makes to be better understood when
Function of the present utility model, feature.
A kind of synchrotron radiation optical element carbon distribution cleaning device of the present utility model is as shown in figure 1, including being sequentially communicated
Gas container 2, mass flowmenter 3, liquid nitrogen purification device 4, radio-frequency signal generator 5 and vacuum cavity 1, in addition to and vacuum cavity
Vacuum pump set 6, rga device 7 and the vacuum meter 8 of 1 connection.Wherein, gas container 2 has two, fills respectively high-purity
Degree oxygen and argon gas two-way purge gas, oxygen and argon gas two-way gas are connected by pipeline with mass flowmenter 3 respectively.Hydrogen
With argon gas can also be used as mixed gas be used for synchrotron radiation optics element carbon distribution cleaning, but hydrogen in ionization process if
It may explode if pressure control is improper, therefore typically be rarely employed, especially on-line cleaning.Mass flowmenter 3 can pass through
Control air velocity adjusts the air pressure in mixture ratio and vacuum cavity 1, and mass flowmenter 3 is by pipeline by mixed gas
Input liquid nitrogen purification device 4.
The moisture and other impurity that liquid nitrogen purification device 4 primarily to prevent mixes in gas produce two to optical element
Secondary damage, and purified treatment is carried out to it before gas enters vacuum cavity 1.Concrete scheme is to lead to purge gas by pipeline
Enter liquid nitrogen cooling tank, oily under ultralow temperature, the impurity such as water can solidify rapidly, so as to reach the effect of purification, liquid nitrogen purification device 4
By pipeline by mixed gas input radio frequency generator 5.Due to oxygen purity >=99.999% in purge gas, purity of argon
>=99.9997%, conventional gas cleaning plant has not had catharsis, so the utility model is used according to condensation
Liquid nitrogen purification device 4 made of principle, it can farthest ensure the purity of purge gas.
Radio-frequency signal generator 5 mainly includes radio-frequency power supply and plasma generator (preferably GV10x plasma generators), wherein
Radio-frequency power supply is 10W~100W continuously adjustabes using inductive type radio-frequency power supply, output frequency 13.56MHZ, power output,
This equipment biggest advantage is exactly that efficiency high, caloric value are low, while will not produce emission of ions, therefore secondary dirt is also not present
The possibility of dye.There is a kind of capacitor type radio-frequency power supply in addition, this radio-frequency power supply once used in cleaning experiment before, but
Efficiency is too low caused by ozone, only 1/the tens of inductive type radio-frequency current efficiency, and scavenging period is long, and caloric value
It is larger, therefore the utility model is abandoned.GV10x plasma generators produce the effect of plasma used by radio-frequency signal generator 5
Rate is higher, and will not produce secondary damage to cleaning exemplar, is initially applied to the carbon distribution cleaning of electron microscope, this and this
The carbon distribution Cleaning principle of utility model is identical, therefore also is adapted for the cleaning applied to synchrotron radiation optics element.
The power output of radio-frequency power supply can be adjusted by a radio-frequency power supply controller, be verified by many experiments, it is determined that
Optimal radio frequency power output is 70W or so, and the gas after ionization is input in vacuum cavity 1 by radio-frequency signal generator 5.This is also
On-line cleaning provides power output reference value.
Vacuum cavity 1 is designed according to the actual conditions of line station mirrored cabinet, and material is used by process vacuum chamber body 1
Stainless steel, this is also the main material that current synchrotron radiation vacuum cavity 1 uses, be designed as size for 1200mm × 400mm ×
400mm, be designed with vacuum cavity 1 diameter about 100mm observation window and for radio-frequency signal generator 5, vacuum pump set 6, true
Sky meter 8 and the flange-interface of residual gas analyzer docking, 100mm observation windows are to be easy to observe vacuum in cleaning process
Actual cleaning process in cavity 1, prevents unexpected generation.
Vacuum pump set 6 is arranged on the diagonal position of vacuum cavity 1 with radio-frequency signal generator 5, so can farthest protect
The ozone and the carbon distribution on optical mirror plane surface of card ionization generation react, and improve the efficiency of cleaning；The installation of residual gas analyzer
Close to vacuum pump set 6, so collection analysis most effectively can be carried out to residual gas；Vacuum meter 8 is used to monitor vacuum cavity 1
Interior air pressure, ensure the balance of the interior air-flow of vacuum cavity 1.Vacuum pump set 6 is used for maintaining the vacuum environment in cleaning process, whole
In individual cleaning process, the air pressure in vacuum cavity 1 is maintained at 5 × 10-3~5 × 10-2Between mbar, belong to low vacuum environment, it is right
The pumping speed and efficiency requirements of vavuum pump are not very high, but need to maintain a low vacuum environment, common dry pump can
Meet to require.
In whole cleaning process, first have to allocate suitable source of the gas parameter, wherein mixture ratio, gas flow and clear
Gas washing pressure is to influence three important parameters of cleaning efficiency, in order to obtain optimal cleaning program, it is necessary to take a collar ring phase
The experimental program of button：Mixture ratio is controlled with gas flow, after determining mixture ratio, according to the barometer reading of vacuum meter 8,
The gas flow of oxygen and argon gas is adjusted simultaneously, so as to reach the purpose of regulation air pressure.The control of the flow of oxygen and argon gas is logical
Cross one to be connected to the mass flow controller of mass flowmenter and vacuum meter to realize, the flow per gas all the way is all adjustable
, adjustable precision is about 0.5%, the continuously adjustabe in the range of 0sccm~20sccm.By controlling the stream per gas all the way
Measure to control the air rate in vacuum cavity 1, verified by many experiments, the ratio of oxygen and argon gas is maintained at about 10:1 is left
When right, cleaning performance is optimal, and the minimum of oxygen and argon gas is more once set to 13 in experimentation:1, maximum ratio is once set to 5:1,
But cleaning performance is all relatively poor；The total flow of oxygen and argon gas be less than 5sccm, more than 2sccm when, cleaning air pressure can protect
Hold 5 × 10-3~5 × 10-2Between mbar, in this pressure range, scavenging period is minimum.After the determination of source of the gas parameter, then
By adjusting radio-frequency power supply controller, the optimal radio frequency power output of radio-frequency power supply is determined；By residual gas analyzer to true
The monitoring of residue carbon elements in cavity body 1, determines the optimal clean time.
Below, offline and online two kinds of cleaning ways will be combined, the utility model will be described further.
(1) offline cleaning experiment
The optical element of synchrotron radiation, typically all requirements such as enormous size, face shape, roughness are very high, and cost is very high
It is expensive, even if surface is polluted by carbon distribution, equally it is of great rarity.Therefore when carrying out offline cleaning experiment, small size can be had made to order in advance
Cleaning exemplar, and carbon film is plated on surface, to simulate synchrotron radiation by carbon-fouled optical element.
Offline cleaning experiment is achieved by the steps of：
1) exemplar is cleaned to prepare
Experiment sample material for cleaning is monocrystalline silicon, has two kinds of dimensions of Φ 20mm and Φ 30mm, in order to more
True simulation synchrotron radiation light element, has strict demand to the face type and roughness of monocrystalline silicon exemplar, and will be to optics
Surface carries out gold-plated processing, it is gold-plated after roughness requirements it is identical with the speculum that bunch actually uses.Its important technological parameters
It is as follows：Surface precision：Better than λ/20 (p-v)；Roughness：RMS≤0.3nm；50nm thick gold membranes.
In order to obtain reliable cleaning parameterses, it is necessary to contaminated to simulate synchrotron radiation optics element to cleaning exemplar plating carbon
Situation, according to the documents and materials of correlation, carbon film thickness plan plating tri- kinds of specifications of 10nm, 20nm, 50nm.In order that cleaning process is more
Add intuitively, when plate carbon processing, half region is only plated to part exemplar, second half region covered, so in cleaning process
Middle can intuitively finds out cleaning performance.
2) optimal mixture ratio, gas flow and the determination for cleaning air pressure
In terms of source of the gas, mixture ratio, gas flow and cleaning air pressure are three important parameters for influenceing cleaning efficiency,
They also interact each other.Mixture ratio is controlled with gas flow, is determined jointly with mixture ratio and flow clear
Gas washing pressure, the carbon content in tail gas is detected to determine the effect of cleaning finally by residual gas analyzer, obtains complete set
Source of the gas cleaning parameterses.
The control of the flow of oxygen and argon gas is realized by mass flow controller, is all per gas flow all the way
Adjustable, adjustable precision is 0.5%.The air rate of cavity is controlled by controlling per the flow of gas all the way, by continuous
Ground adjusts mixture ratio, and the ratio that finally found that oxygen and argon gas is 10:It is optimal mixture ratio when 1.
In whole cleaning process, cavity can maintain the state of a low vacuum, and cleaning air pressure is also one in terms of source of the gas
Individual critically important factor, can directly affect cleaning performance, and the regulation to air pressure is mainly by adjusting mixture ratio and gas stream
Amount is realized.After mixture ratio is determined, by adjusting cleaning air pressure to the increase and decrease in proportion of gas flow, by clear
The monitoring of carbon content in washing tail-gas, it is determined that optimal cleaning air pressure should be maintained at 5 × 10-3~5 × 10-2Between mbar.
3) influence of the mirror putting position to cleaning efficiency
When implementing, the mirror shapes size of on-line cleaning and their positions in mirror image are different, therefore are carrying out
During cleaning experiment, it is necessary to as far as possible in artificial line station mirror actual conditions.Because experiment exemplar size is all smaller, therefore need
Will to cleaning exemplar difference modes of emplacement when cleaning data carry out experimental study, as side is put, minute surface is upward, it is downward when purgative gas
Body enters the influence to cleaning performance, scavenging period such as the position of mirrored cabinet, direction.By test of many times, it finally found that exemplar leans on
Gas outlet is nearer, that is, the bleed position closer to vacuum pump set 6, cleaning speed are faster.
4) determination of optimal RF input power
Output frequency is 13.56MHZ GV10x plasma generators, and its plasma-generation efficiency is higher, and
Secondary damage will not be produced to cleaning exemplar, be initially applied to the carbon distribution cleaning of electron microscope, this and product of the present utility model
Carbon Cleaning principle is identical, therefore also is adapted for the cleaning applied to synchrotron radiation optics element.Its power output can be by penetrating
Frequency power controller is adjusted, by repeatedly adjustment, it is determined that optimal radio frequency power output is 70W or so.
5) determination of scavenging period
Scavenging period is a composite factor, and it is the direct parameter for evaluating cleaning efficiency, while is also to determine that source of the gas is joined
Number, evaluation criterion when radio-frequency power supply power and mirror putting position, it is the thickness for plating carbon to determine scavenging period direct factor in addition
Degree.Therefore after determination source of the gas parameter, radio-frequency power supply power is determined, for different plating carbon thicknesses, the mirrors of different putting positions
Son determines the different time, it is necessary to by monitoring of the residual gas analyzer to carbon content in cleaning tail gas.
6) destructive test
Cleaning process must assure that ozone will not damage the surface of cleaning exemplar, using only Gold plated Layer, not plate carbon also
Experiment exemplar, is passed through ozone for a long time, by measuring the surface roughness of exemplar, to examine gold plate to have in ozone environment
Not damaged.Mirrored cabinet inwall is usually stainless steel, and such material can form one layer of protection after by ozone oxidation on surface
Film, therefore structural destruction will not be formed.Optical element substrate is generally monocrystalline silicon, as the protective oxide layer on surface and
Substantial damage will not be caused.In mirrored cabinet in addition to various metals, also various control cables, the metal wire of cable passes through
Organic matter insulating covering is isolated with the vacuum environment of mirrored cabinet.Pre-Ozonation on Organic Matter has very strong oxidisability, and it is therefore possible to destroy
Insulated hull examines destructiveness of the ozone to insulated hull, it is necessary to carry out prolonged destructive test.The failure criteria of optical element
Whether the standard of being turned to is become with measurement cleaning sample surface roughness；The damage of cable insulation wrapper is then visually judged with microexamination
For standard.
7) wash result
It is determined that the cleaning parameterses such as optimal mixture ratio, gas flow, cleaning air pressure, power output are, it is necessary to carry out a large amount of
Experiment.Table 1 show the experimental data of two different carbon film thickness samples：
Table 1
In order to judge whether cleaning process can produce damage to optical element surface, three exemplars are randomly selected, clear
Its surface roughness is tested respectively before and after washing, as shown in table 2：
Table 2
Before and after cleaning in terms of the test result of roughness cleaning process to the surface roughness affect of optical element and little,
Because each sampled point is different, and the cleaning process time is longer, and the dust of surface accumulation can also produce necessarily to roughness
Influence.
(2) on-line cleaning is tested
On-line cleaning experimental applications on SSRF grenz ray light beam line, it is necessary to clean optical element mirrored cabinet (as
Vacuum cavity 1) on configure special flange-interface, for installing radio-frequency signal generator 5, vacuum pump set 6 and rga
Diagonal position of the flange-interface of instrument, radio-frequency signal generator 5 and vacuum pump set 6 in mirrored cabinet.Purge gas and liquid nitrogen cooling device
Can be according to cleaning requirement shift position.
The parameters such as the mixture ratio that is obtained according to experiment case study 1, gas flow, cleaning air pressure, power output are to this practicality
New each several part device is adjusted, and then the optical element of pollution is cleaned.Due to the experiment exemplar of offline cleaning
It is more much smaller than the exemplar of on-line cleaning, thus the time of on-line cleaning to extend, pass through remnants in specific cleaning process
Gas analyzer monitors exhaust outlet concentration of carbon to judge whether cleaning is completed.
After cleaning terminates, by the test of the flux index to light beam line, demonstrate on-line cleaning and substantially eliminate optics
The carbon distribution of element surface, luminous flux are improved.Table 3 is in identical beam intensity, identical slit opening, identical light
Under grid scale, the changing value of luminous flux before and after the optical element cleaning obtained by detector.
Table 3
| Can area | Energy | Gap | Flux before cleaning | Flux after cleaning | Flux improves after cleaning |
| Fe | 723 | 82.5 | 2.20E-06 | 3.92E-06 | 78% |
| 670 | 79.7 | 2.10E-06 | 3.27E-06 | 56% | |
| O | 543 | 72.9 | 1.67E-06 | 2.98E-06 | 79% |
| N | 410 | 65.8 | 8.26E-07 | 1.97E-06 | 138% |
| C | 296 | 58.8 | 7.70E-08 | 2.23E-07 | 190% |
| 284 | 57.8 | 4.69E-08 | 8.27E-08 | 76% |
In terms of the wash result tested from offline cleaning experiment and on-line cleaning, it is believed that the utility model is to optical element
Carbon distribution cleaning be safely and effectively.
It the foregoing is only of the present utility model and be preferable to carry out case, be not limited to the utility model, although
The utility model is described in detail with reference to foregoing case study on implementation, for those skilled in the art, it is still
Technical scheme described in foregoing each case study on implementation can be modified, or which part technical characteristic is equally replaced
Change.All any modification, equivalent substitution and improvements within the spirit and principles of the utility model, made etc., it should be included in this
Within the protection domain of utility model.
Claims (6)
- A kind of 1. synchrotron radiation optical element carbon distribution cleaning device, it is characterised in that including：Vacuum cavity；Radio-frequency signal generator, vacuum pump set, vacuum meter and the rga device connected with the vacuum cavity, radio frequency hair Raw device includes inductive type radio-frequency power supply and plasma generator；The liquid nitrogen purification device connected with the radio-frequency signal generator；AndThe gas container connected by mass flowmenter with the liquid nitrogen purification device.
- 2. synchrotron radiation according to claim 1 optical element carbon distribution cleaning device, it is characterised in that the gas holds The quantity of device is two, fills oxygen and argon gas respectively.
- 3. synchrotron radiation according to claim 1 optical element carbon distribution cleaning device, it is characterised in that the quality stream Gauge and the vacuum meter are connected with a mass flow controller respectively.
- 4. synchrotron radiation according to claim 1 optical element carbon distribution cleaning device, it is characterised in that the inductive type Radio-frequency power supply is connected with a radio-frequency power supply controller.
- 5. synchrotron radiation according to claim 1 optical element carbon distribution cleaning device, it is characterised in that the vacuum machine Group is separately mounted to the diagonal position of the vacuum cavity with the radio-frequency signal generator.
- 6. synchrotron radiation according to claim 1 optical element carbon distribution cleaning device, it is characterised in that the residual gas Body analyzer is set adjacent to the vacuum pump set.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111069187A (en) * | 2019-12-27 | 2020-04-28 | 安徽富乐德科技发展有限公司 | Automatic laser cleaning equipment and method for OLED organic evaporation equipment |
| CN112531180A (en) * | 2019-09-17 | 2021-03-19 | 全球能源互联网研究院有限公司 | Method for removing anode carbon deposit of flat-plate battery |
-
2017
- 2017-05-31 CN CN201720619170.7U patent/CN206854263U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112531180A (en) * | 2019-09-17 | 2021-03-19 | 全球能源互联网研究院有限公司 | Method for removing anode carbon deposit of flat-plate battery |
| CN111069187A (en) * | 2019-12-27 | 2020-04-28 | 安徽富乐德科技发展有限公司 | Automatic laser cleaning equipment and method for OLED organic evaporation equipment |
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