CN206848690U - A kind of high uniformity LED parallel exposing machine light-source systems - Google Patents
A kind of high uniformity LED parallel exposing machine light-source systems Download PDFInfo
- Publication number
- CN206848690U CN206848690U CN201720073645.7U CN201720073645U CN206848690U CN 206848690 U CN206848690 U CN 206848690U CN 201720073645 U CN201720073645 U CN 201720073645U CN 206848690 U CN206848690 U CN 206848690U
- Authority
- CN
- China
- Prior art keywords
- light
- led
- lamp bead
- ultraviolet
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model discloses a kind of high uniformity LED directional lights ultraviolet exposure machine light-source system, wrap the machinery and control system of the source of parallel light module being made up of the ultraviolet LED lamp bead and corresponding collimation lens ultraviolet LED of array arrangement, support light source module group or sample movement, light source module group and sample relative motion in x y two dimensional surfaces when the machinery and control system make exposure, its movement locus is uniformly distributed and the minimum repeat unit of outermost covering light source module group.The utility model drastically increases the exposure uniformity using mobile rotary system and its source of parallel light module, while causes exposure intensity raising because reducing the light source angle of divergence, improves exposure quality, solves because break caused by resolution ratio is inconsistent phenomena such as；The directional light that the utility model also helps multi-wavelength realizes uniform exposure, so as to adapt to different ink, photoresistance.
Description
Technical field
The present invention relates to optical system and ultraviolet LED exposure light source technical field, more particularly to a kind of high uniformity LED
Directional light ultraviolet exposure machine light-source system.
Background technology
In the micro Process such as microelectronics, micro-optics, wiring board field, ultraviolet parallel exposing machine is to realize that high accuracy processing is multiple
The important equipment of system.Figure equidimension on mask plate is transferred to mask by parallel exposing machine by directional light photoetching process
On photoresistance below version, then it is further diverted into again by corroding or etching on substrate.
Parallel exposing machine generally use ultraviolet is as lighting source.Mercury lamp is used in traditional parallel exposing machine
Light source, mercury lamp have high pressure, high temperature and the shortcomings that containing poisonous mercury.The life-span of mercury lamp generally only has or so 1000 hours, because
This, after 1-2 months, then needs to replace primary source, maintenance cost is high.The energy consumption of ultraviolet mercury lamp is larger, use cost
It is high.There was only about 20% energy production ultraviolet in its input energy, and it is the visible energy to have 20%, 40% is heat, Er Qieqi
Luminescence band is more;Meanwhile the switch life of mercury lamp is limited, just light intensity keeps stable after a period of time of turning on light, in order to keep it
Light stability, exposure also keeps state of turning on light in time in use, further increases its energy consumption.Mercury lamp is due to shortwave
The radiation of long ultraviolet can have the ozone of harmfulness.2013, global more than 140 individual countries and regions were reached common understanding, and
Presided over and signed by United Nations Environment Programme《Minamata pact》, limit control and discharge capacity plan of the every profession and trade to mercury composition.Using
New energy-conserving and environment-protective ultraviolet source substitutes traditional UV Exposing Lamp, and oneself is imperative.Ultraviolet LED (the pole of luminescence-utraviolet two
Pipe) it is fast-developing in recent years, compared with mercury lamp, have long lifespan, energy-conservation, spectral line it is narrow, it is not mercurous, do not produce ozone, moment opens
Close, the advantage such as stability is good, attract attention in ultraviolet exposure machine is applied and be progressively applied.
Light ray parallel degree and the uv energy uniformity are two most important technical indicators of uv-exposure light source and exposure machine.
In effective exposure area of exposure machine, the depth of parallelism of ultraviolet, energy uniformity etc. determine the precision and uniformity of exposure.
The depth of parallelism is better, lines that more can be thinner in transfer mask version, obtains higher exposure accuracy.It is because optical exposure illuminates
Irradiation level of uniting is uneven, causes line weight uneven, the resolving power in entire plate is inconsistent, or has the hair of phenomena such as broken string
Raw, this does not allow in the production process of PCB or liquid crystal display；The uv energy uniformity is higher conversely speaking, then
Line weight is more uniform.
Because single ultraviolet LED lamp bead luminous power is very low, to reach with the power density needed for large area exposure, it is necessary to
Multiple lamp beads work simultaneously.Simultaneously as the lighting angle of LED lamp bead is wider, its luminous often center intensity is higher, more toward two
Side luminous intensity is lower.When use optical design is lighted and is changed into directional light, the uniformity of irradiation intensity is often difficult to
Ensure, it is necessary to particularly design.
CN105301910A discloses a kind of ultraviolet LED light source structure and parallel exposing machine.Utilize the portion of mercury lamp light source
Path-splitting.Its technical method is using during upgrading in existing exposure machine, but the characteristics of do not give full play to LED, the arrangement of LED light face
More concentrate, cooling requirements are higher, and light intensity is also by larger restriction.
CN104749889A discloses a kind of ultraviolet LED photohead, and its is simple in construction, and cost is low.But characteristics of optical path is based on,
The region area that the technology can provide uniform parallel light is relatively limited.
CN103513518B discloses a kind of ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine.
The technology is realized directional light by collimation lens, is passed through square using the collimation ultraviolet LED light source for being arranged in order multirow equidistant arrangement
The battle array arrangement position relatively low to the intensity of light source compensates, so as to improve the uniformity of exposure.The technology can realize large area
Directional light.But when improving due to the depth of parallelism, lighting angle narrows, uniformity compensation is more difficult, and the uniformity can decline.Therefore need
The technical scheme of the uniformity and the depth of parallelism is preferably taken into account, to adapt to require higher application.
Further, since LED lamp bead glow peak is narrow, wavelength is single, and prior art is to different ink and photoresistance adaptability
It is bad.
The content of the invention
In order to overcome the above-mentioned deficiencies of the prior art, it is purple it is an object of the invention to provide a kind of high uniformity LED directional lights
Outer exposure machine light-source system.
The present invention also aims to provide a kind of high uniformity LED directional light ultraviolet exposure machines for providing multi-wavelength combination
Light-source system, it is single to solve LED light source wavelength, the problem of to different ink and bad photoresistance adaptability.
To achieve the above objectives, the technical solution adopted in the present invention is：
A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system, including by array arrangement ultraviolet LED lamp bead and
The source of parallel light module of corresponding collimation lens ultraviolet LED composition, the machinery of support light source module group or sample movement and control are
Light source module group and sample relative motion in x-y two dimensional surfaces, its movement locus are equal when system, the machinery and control system make exposure
Even distribution and the minimum repeat unit of outermost covering light source module group.
Preferably, parallel half-angle is less than or equal to 3 ° after the collimated collimated of light that LED lamp bead is sent.
Ultraviolet LED lamp bead is arranged for multiple lines and multiple rows, and ultraviolet LED is arranged on the intersection point of ranks, in addition to light source border, each
Identical ultraviolet LED is both provided with ranks intersection point;Preferably, ultraviolet LED lamp bead array form square grid array or
Hexagonal close-packed array.Or ultraviolet LED lamp bead is that the close heap dot matrix of hexagonal is arranged, whole array rectangularity, the first row lamp bead row
Cloth order repeats for ABC, under the second portable lighter pearl arrangement order is repeated for CAB or BCA is repeated, and C is located among lastrow AB just
Side, odd-numbered line repeat the first row arrangement, and even number line repeats the first row arrangement；Above-mentioned ABC respectively represents a kind of different wavelength range
Lamp bead, at least two is different from another wavelength in ABC；Preferably, the A is 365nm wave bands（±5nm）Lamp bead, B are
385nm wave bands（±5nm）Lamp bead, A are 405nm wave bands（±5nm）.
Preferably, the ultraviolet LED light source panel periphery is provided with the parallel speculum of light direction parallel with LED.
Preferably, the light source module group and sample track of relative motion in x-y two dimensional surfaces are approximately more during exposure
Group Archimedes spiral, can be specifically described as：
As 2NT≤t<During (2N+1) T, N=0,1,2 ...,
x=vtcos(ωt)
y=vtsin(ωt)
As (2N+1) T≤t<During (2N+2) T, N=0,1,2 ...,
x=(vT-vt)cos(ωt)
Y=(vT-vt) sin (ω t),
Wherein vT is the angle that helical center rotates to farthest distance, ω T for single Archimedes spiral, when exposing total
Between texpMore than 2T；It is further preferred that half of the vT not less than the most long diagonal length of the minimum repeat unit of light source, ω T are
More than 720 °, and expose total time texp≥4T。
Preferably, the diameter of the collimation lens on the array LED is less than 4cm.
Preferably, the part to be exposed is 40-100cm apart from parallel light lens apical side height.
Compared with the prior art, technical scheme has following advantage：
Light source is arranged according to certain array period, and the relative movement orbit of light source and exposed sample is uniformly distributed, and is filled
Divide the minimum repeat unit for covering light source module group, it is along moving curve to make total irradiation intensity that any point is subject in exposed sample
Integrated intensity, drastically increase the exposure uniformity, the depth of parallelism and the mutual lance of the uniformity for solving LED directional light area sources
The problem of shield, exposure quality is improved, solved because break caused by resolution ratio is inconsistent phenomena such as.
Parallel light area can be extended by repeat unit, it is easy to accomplish extensive parallel light；Meanwhile using area source shape
Formula, generated heat relative distribution, and radiating is easily achieved, and cost is relatively low.
The directional light of multi-wavelength is spatially overlapping to realize uniformity Shi Shifen difficulties, passes through the moving integration of light exposure
Splendid uniformity can be realized, so as to adapt to different ink, photoresistance.
Preferred embodiments of the present invention are used along Archimedes spiral moving integration, are easy to accurately realize by program, parameter
Adjustment is simple, strong adaptability, in the time for exposure motion track can repeatedly cycle repetition, pole can be realized under different exposure time
High uniformity.
Brief description of the drawings
The schematic perspective view of the nearly parallel light source modules of Fig. 1.
The light source dot matrix arrangement schematic diagram of Fig. 2 embodiments 1.
Fig. 3 is parallel light lens schematic diagram.
Fig. 4 is a kind of slide rail combination that light source module group is supported in the present invention.
Fig. 5 is a kind of preferable light source and a part for sample relative movement orbit of the present invention, is approximately multigroup A Ji
Mead helical.
Fig. 6 is the light source dot matrix arrangement schematic diagram of a variety of band combinations in embodiment 3.
Embodiment
In order that the object, technical solutions and advantages of the present invention are more clearly understood, describe in detail with reference to embodiments.
It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not intended to limit the present invention.
Embodiment 1：
A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system, it includes nearly parallel light source module 1, and
The Mechatronic Systems 2 for carrying and controlling light source module group 1 to move.Refer to Fig. 1.Fig. 1 show the solid of nearly parallel light source module
View.Light source module group 1 mainly includes the ultraviolet LED lamp bead 101 of array arrangement（Blocked in Fig. 1 by lens）, with a pair of lamp bead 1
The secondary lens 102 answered, MCPCB 103, and cooling platform 104.Ultraviolet LED lamp bead 101 is welded on MCPCB 103, is passed through
MCPCB 103 wiring and thereon bonding wire connection realize linked with external drive power supply；Ultraviolet LED lamp bead 101 with it is secondary
Mirror 102 corresponds, and with the precise match of secondary lens 102, so as to realize nearly directional light；MCPCB 103 is consolidated by screw
On fixed cooling platform 104 again.There is heat-conducting silicone grease to improve radiating between MCPCB and cooling platform.Cooling platform is provided with fin
Radiating, or fin combination wind-cooling heat dissipating, or water-cooling.
Ultraviolet LED lamp bead 101 arranges for the array of multiple lines and multiple rows.Spacing between row and row（Line space）It is equal, row with
Spacing between row（Column pitch）Also it is equal；Line space be able to can not also be waited with column pitch with equal；Angle between ranks is
Any angle.Ultraviolet LED is arranged on the intersection point of ranks, and in addition to light source border, luminous ripple is both provided with each ranks intersection point
Section and the approximately uniform ultraviolet LED of brightness.Because the arrangement of ultraviolet LED lamp bead 101 is cycle arrangement, module can be marked off most
Small repeat unit.
Preferred scheme one, as shown in Fig. 2 line space is equal with column pitch, angle is 60 degree between ranks, and it is close to form hexagonal
Pile structure.The minimum repeat unit of this preferred scheme is respectively 105.
Preferred scheme two, line space is equal with column pitch, and angle is 90 degree between ranks, forms square lattice structure.
Ultraviolet LED lamp bead 101 encapsulates for the LED of quartzy or resistance to ultraviolet silica-gel lens encapsulation.Preferably, ultraviolet LED lamp bead
101 lighting angle is 60 degree, 90 degree or 120 degree.One or more ultraviolet LED cores are packaged with ultraviolet LED lamp bead 101
Piece；Preferably, a UV LED chip is encapsulated, directional light can so be better achieved.
As shown in figure 3, it is additionally provided with secondary lens 102 in each ultraviolet LED lamp bead 101.Secondary lens shown in Fig. 3
102 realize directional light using the refraction reflection of light, and the design is only a kind of common parallel light lens design or pure
The convex lens of refraction, or other designs.By the secondary lens 102, the light that LED light sources 101 are sent can be changed into flat
Row light, parallel half-angle are less than 3 °.The bottom surface of secondary lens 102 is most wide close to LED, its top surface.Preferably, lens top surface is that diameter is small
In 4cm circle.Secondary lens 102 are fixed in the garden type groove of lens carrier, and lens carrier bottom is provided with screw hole, passes through screw
Hole is fixed on cooling platform 104 through MCPCB 103.The secondary lens can according to need using quartz glass, acrylic
Or other uvioresistant optics glass systems into.For the sake of simplicity, lens carrier, MCPCB 103, cooling platform 104 be not specific in figure 3
Draw.
MCPCB 103 is one or more pieces, and LED lamp bead 101 is by MCPCB 103 wiring and is welded on PCB pads
Electric wire realize connection in series-parallel and be connected with drive circuit.
Speculum can be set in the ultraviolet LED light source panel periphery, and its reflecting surface is strictly parallel with the clearance of parallel light center,
The defects of can having further compensated for light source face plate edge under-exposure by speculum, increase can exposure area.
Part to be exposed is 20cm-100cm with parallel light lens top surface distance, it is preferable that its distance is 40 ~ 60cm.Herein
Under distance, single lamp bead irradiates a diameter of about 5cm according to 3 ° of parallel half-angle, more bigger than lens, more close by lens
Arrangement, adjacent lamps pearly-lustre are overlapping by force, it is easy to accomplish preferable uniformity.
The Mechatronic Systems 2 for carrying and controlling light source module group to move includes at least one set of line slideway, one group of line slideway by
In an X line slide rail 201, sliding surface 202 and Y line slide rails 203, the sliding surface 204 of two dimensional surface, and the driving of X, Y slide rail
Motor and transmission device.Referring to Fig. 4, it is combined for a kind of slide rail of the present embodiment（Transmission dress is not drawn into for the sake of simple in figure
Put）, two of which X line slide rails 201 are fixed by screws on base 3, pass through 4 sliding surfaces 202 and two slide rails of Y-direction
203 are connected, and have 4 sliding surfaces 204 on two slide rails 203 of Y-direction.The cooling platform 104 of light source module group is fixed by screws in Y
On 4 sliding surfaces 204 in direction.So light source panel can be achieved whole in two dimensional surface under the combination of X and Y-direction guide rail
Body is synchronous slidably, without the rotation around Z-direction occurs.Motor and biography are both provided with X-direction and Y-direction guide rail
Dynamic device.The motor power transmission shaft of X-direction and four sliding blocks of belt drive X-direction are synchronized with the movement, the motor of Y-direction
Power transmission shaft and four sliding blocks of belt drive Y-direction are synchronized with the movement, and then drive source of parallel light module is overall to be moved in X/Y plane,
Any time X, Y-direction motion state can be by controlling X, Y motor to set respectively.
Light source module group relative sample motion track is programmable to be realized, it planar makees reciprocal curvilinear motion.It is exposed
The radiation flux being subject on sample is radiosity and to be integrated with the residence time at this immediately below difference on area source.
After the rolling average of the technical program, total radiant flux uniformity greatly improves.
Preferably, its movement locus is approximately multigroup Archimedes spiral, refer to Fig. 5, and it is a kind of excellent for the present invention's
The light source of choosing and a part for sample relative movement orbit, are approximately multigroup Archimedes spiral.It is described in detail below：
... ... formula (1)
Wherein vT is the angle that helical center rotates to farthest distance, ω T for single Archimedes spiral, when exposing total
Between texpMore than 2T.
Bold portion shown in Fig. 5 is 2NT≤t<The movement locus of part during (2N+1) T, helical from origin by
Step outwards expansion；Dotted portion represents (2N+1) T≤t<Movement locus during (2N+2) T, helical progressively to contract and return to
Origin.Preferably, vT is not less than the half of the most long diagonal length of the minimum repeat unit of light source, and ω T are more than 720 °, and
Expose total time texp≥4T.Pass through above optimum condition, because light illumination has certain continuity in spatial distribution, the song
The track that line is inswept does not repeat, and 2 circles is at least rotated in cycle T, and radially have preferably homogenization equidistantly to external expansion
Effect.According to simulation result, for the light distribution of initial uniform degree position 85%, the uniformity can be lifted to more than 98%.
The ultraviolet LED exposure machine can also include two respectively positioned at the light source erecting bed of exposure table top upper-lower position
Face, both are relatively fixed by connector, and are uniformly supported by one group of slip bocks system.Light source luminescent above is face-down, up and down
There is optical glass table top light source keeping parallelism, centre, table top carrying sample and mask etc., had between table top and upper and lower light-emitting area
Gap, light source movement and sample is facilitated to move into and take out.It is two-sided to the progress of PCB plates to expose simultaneously by the way of double-sided exposure
Light, it can further improve operating efficiency.
Embodiment 2:
It is with the difference of embodiment 1, the LED lamp bead is multi-chip package.4 chip packages are such as used, in single package
In integrate 4 kinds of different wavelength chip, such as 365nm, 380nm, 395nm, 420nm.Combined by multi-wavelength and logical
The control that every kind of wavelength chip applies electric current is crossed, is adapted to different types of photosensitive-ink and photoresistance.
Embodiment 3
The present embodiment is different from the arrangement form for being different only in that lamp bead of embodiment 1.
Similar to Example 1, ultraviolet LED lamp bead arranges for the array of multiple lines and multiple rows, and each LED lamp bead is located at the lattice of array
Point on.As different from Example 1, the LED emission wavelengths of diverse location are not approximately the same on array, but form different ripples
The ultraviolet LED lamp bead combination of section.
Preferably, as shown in fig. 6, it is 3 kinds of lamp beads（Hereinafter referred to as lamp bead A, lamp bead B, lamp bead C）Combination, formed hexagonal
Close pile structure.Wherein the peak wavelengths of lamp bead A 1011 are near 365nm, and the peak wavelengths of lamp bead B 1012 are lamp bead near 385nm
The peak wavelengths of C 1013 are near 405nm.The first row lamp bead arranges order as ABC repetitions, and the second portable lighter pearl arrangement order is CAB
Repeat, and C is located at underface among lastrow AB, the row of odd number three repeats the first row arrangement, and even number line repeats the first row arrangement.
In addition to edge, whole light source panel is considered as Hexagon cell and arranged according to the hexagonal close heap form cycle.In the present embodiment,
Minimum repeat unit dotted line as shown in Figure 5 encloses regular hexagon, and the centre distance of adjacent lamp bead is R, then it is longer diagonal
Line is 2R.This preferred scheme light source module group relative sample motion track is formula（1）Described Archimedes spiral.Work as vT>
During R, minimum repeat unit is just completely covered in the area that helical is inswept, so as to realize fabulous exposition uniformity.
The present embodiment is adapted to more type photoresistances, ink by the combination of multi-wavelength's lamp bead.Different wave length lamp bead
Luminous intensity setting further can also be optimized according to light ancestral, ink type.The combination of different wave length, binding curve move
It is dynamic average, can effectively solve different wave length ultraviolet LED lamp bead standoff distance farther out, and parallel angular is smaller, only leads to lamp
The overlapping of pearl shadow surface is unable to reach the problem of different wave length irradiation intensity is all uniform, you can to meet wavelength combination, spoke simultaneously
According to the requirement of the uniformity, parallel angular.
The embodiment of the present invention and preferred scheme greatly carry using curve movement is average with special solid matter polygon mode
The high exposure uniformity and premised on reducing light source dispersion angle, is avoided because optical exposure illumination system irradiation level is uneven,
Cause line weight uneven, the resolution ratio in entire plate is inconsistent, or has the generation of phenomena such as broken string, passes through this light source system
Unite the ultraviolet exposure machine that is applied to, in the angle of light source, exposition uniformity, and exposing material in the requirement of light source characteristic all
There is great raising.
Only it is the preferred embodiment of the present invention above in association with the embodiment described by accompanying drawing, and not to the guarantor of the present invention
The restriction of scope is protected, any improvement done based on spirit of the invention all ought to be within the scope of the present invention.
Claims (11)
- A kind of 1. high uniformity LED directional lights ultraviolet exposure machine light-source system, it is characterised in that：Including by the ultraviolet of array arrangement The machinery of the source of parallel light module of LED lamp bead and corresponding collimation lens ultraviolet LED composition, support light source module group or sample movement Light source module group and sample relative motion in x-y two dimensional surfaces when making exposure with control system, the machinery and control system, it is transported Dynamic rail mark is uniformly distributed and the minimum repeat unit of outermost covering light source module group.
- 2. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 1, it is characterised in that LED Parallel half-angle is less than or equal to 3 ° after the collimated collimated of light that pearl sends.
- 3. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 1, it is characterised in that ultraviolet LED lamp bead is arranged for multiple lines and multiple rows, and ultraviolet LED is arranged on the intersection point of ranks, in addition to light source border, on each ranks intersection point It is provided with identical ultraviolet LED.
- 4. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 3, it is characterised in that ultraviolet LED lamp bead forms square grid array or hexagonal close-packed array.
- 5. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 1, it is characterised in that：It is ultraviolet LED lamp bead is that the close heap dot matrix of hexagonal is arranged, and whole array rectangularity, the first row lamp bead arrangement order is that ABC is repeated, the second row Lamp bead arrangement order is that CAB is repeated or BCA is repeated, and C is located at immediately below lastrow AB centres, and odd-numbered line repeats the first row row Cloth, even number line repeat the arrangement of the second row；Above-mentioned ABC respectively represents a kind of lamp bead of different wavelength range, in ABC at least two with it is another A kind of wavelength is different.
- 6. high uniformity LED directional lights ultraviolet exposure machine light-source system as claimed in claim 5, it is characterised in that：The A is 365nm wave bands (± 5nm) lamp bead, B are 385nm wave bands (± 5nm) lamp bead, and C is 405nm wave bands (± 5nm) lamp bead.
- 7. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 1, it is characterised in that described Ultraviolet LED light source panel periphery is provided with the parallel speculum of light direction parallel with LED.
- 8. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 1, it is characterised in that exposure Shi Suoshu light source module groups and sample track of relative motion in x-y two dimensional surfaces are approximately multigroup Archimedes spiral, can be had Body is described as：As 2NT≤t<(2N+1) T, N=0,1, when 2 ...,X=vt cos (ω t), y=vtsin (ω t)；As (2N+1) T≤t<(2N+2) T, N=0,1, when 2 ...,X=(vT-vt) cos (ω t), y=(vT-vt) sin (ω t)；Wherein vT is the angle that helical center rotates to farthest distance, ω T for single Archimedes spiral, exposes total time texpMore than 2T.
- 9. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 8, it is characterised in that vT is not Less than the half of the most long diagonal length of the minimum repeat unit of light source, ω T are more than 720 °, and expose total time texp≥ 4T。
- 10. according to the high uniformity LED directional light ultraviolet exposure machine light-source systems described in claim 6, it is characterised in that the battle array The diameter of collimation lens on row LED is less than 4cm.
- 11. high uniformity LED directional lights ultraviolet exposure machine light-source system according to claim 1, it is characterised in that wait to expose Light part is 40-100cm apart from parallel light lens apical side height.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720073645.7U CN206848690U (en) | 2017-01-21 | 2017-01-21 | A kind of high uniformity LED parallel exposing machine light-source systems |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720073645.7U CN206848690U (en) | 2017-01-21 | 2017-01-21 | A kind of high uniformity LED parallel exposing machine light-source systems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206848690U true CN206848690U (en) | 2018-01-05 |
Family
ID=60790529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720073645.7U Active CN206848690U (en) | 2017-01-21 | 2017-01-21 | A kind of high uniformity LED parallel exposing machine light-source systems |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206848690U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773549A (en) * | 2017-01-21 | 2017-05-31 | 南京新趋势光电有限公司 | A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system |
| JP2019515330A (en) * | 2016-04-08 | 2019-06-06 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | How to reduce line swell |
| CN112606388A (en) * | 2020-11-30 | 2021-04-06 | 深圳市创想三维科技有限公司 | Photocuring 3D printer |
-
2017
- 2017-01-21 CN CN201720073645.7U patent/CN206848690U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019515330A (en) * | 2016-04-08 | 2019-06-06 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | How to reduce line swell |
| CN106773549A (en) * | 2017-01-21 | 2017-05-31 | 南京新趋势光电有限公司 | A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system |
| CN106773549B (en) * | 2017-01-21 | 2024-02-27 | 南京新趋势光电有限公司 | High-uniformity LED parallel light ultraviolet exposure machine light source system |
| CN112606388A (en) * | 2020-11-30 | 2021-04-06 | 深圳市创想三维科技有限公司 | Photocuring 3D printer |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106773549A (en) | A kind of high uniformity LED directional lights ultraviolet exposure machine light-source system | |
| CN206848690U (en) | A kind of high uniformity LED parallel exposing machine light-source systems | |
| CN103592821B (en) | Novel LED (light-emitting diode) light source system for ultraviolet exposure machine | |
| US10321637B2 (en) | Lighting device, for instance for greenhouse lighting, and corresponding method of use | |
| CN101457901A (en) | Light field controlling means and illuminating apparatus employing the light field controlling means | |
| EP2189708A1 (en) | A directive illumination energy-saving led light and method for manufacturing the same | |
| JP2011044348A (en) | Lighting fixture and lighting system | |
| CN101319760A (en) | Illumination system | |
| CN102135254A (en) | LED (Light Emitting Diode) lamp structure with bigger illumination angle | |
| WO2010115347A1 (en) | Led illumination lamp | |
| CN205844740U (en) | A kind of ultraviolet LED exposure module | |
| CN102434802A (en) | LED (Light-emitting Diode) tubing lamp | |
| CN202274316U (en) | LED (Light-emitting diode) lamp with convex light source | |
| KR102155319B1 (en) | lighting apparatus based on fluorescent printed reflector | |
| CN202065730U (en) | Light-emitting diode lamp configuration with illumination angle | |
| JP3169011U (en) | Light emitting diode lamp | |
| CN206247132U (en) | A kind of luminous outdoor advertising Projecting Lamp of multi-angle | |
| CN103104845A (en) | Light-emitting diode (LED) illuminating apparatus | |
| JP5916800B2 (en) | LED lighting fixtures | |
| KR102155320B1 (en) | Lighting apparatus based on fluorescent printed type PCB substrate | |
| CN208014733U (en) | A kind of deep ultraviolet LED light source inorganic encapsulated structure | |
| CN202946977U (en) | Light source module | |
| CN201228874Y (en) | Luminous system | |
| TWI582334B (en) | All week LED bulb lights | |
| CN203277495U (en) | All light beam angle luminescence LED light source module |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |