Optical monitoring system multiwindow device
Technical field
It the utility model is related to film recovery technique field, more particularly to optical monitoring system multiwindow device.
Background technology
Market prior art is single window type, and optical monitoring system can only be by the way of the optical monitoring of monochromatic light road.City
Field prior art is single window type, and optical monitoring system can only be by the way of the optical monitoring of monochromatic light road, only can be to plated film base
The point of one radius of plate is monitored, and monitoring ratio of precision is relatively low, causes substrate film coating film thickness uniformity control accuracy poor, plated film
Product yield is than relatively low.
The present invention devises optical monitoring system multiwindow device, and the device can be same applied to multi-pass optical monitoring system
When the multiple radiuses of substrate are monitored, and can be according to the strong and weak analysis uniform film thickness of each radius point optical signal in coating process
Property, amendment in real time and control are carried out to the film thickness uniformity of each radius point eventually through OMS.Substantially increase optical monitoring precision
With the uniformity of thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve a quantity
Level, plated film yield improve 2-3 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, stably,
It is adapted to promote the use of.
Utility model content
In order to overcome defect present in background technology, the utility model solves technical scheme used by its technical problem
It is:Optical monitoring system multiwindow device, including OMS light source incidences window, vacuum chamber chamber vacuum room door and OMS light sources receive
Window, one end of the vacuum chamber cavity are provided with OMS light source incidence windows, and the other end of the vacuum chamber cavity is provided with vacuum chamber
Door, the door for vacuum chamber are provided with OMS light sources and receive window, and the OMS light source incidences window and OMS light sources receive window same
On straight line, the number that the OMS light source incidences window and OMS light sources receive window is respectively two.
Optical monitoring system multiwindow device involved by the utility model, the device are applied to multi-pass optical monitoring system
System can be monitored to the multiple radiuses of substrate simultaneously, and can be according to the strong and weak analysis thickness of each radius point optical signal in coating process
Uniformity, amendment in real time and control are carried out to the film thickness uniformity of each radius point eventually through OMS.Substantially increase optical monitoring
The uniformity of precision and thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve one
The order of magnitude, plated film yield improve 2-3 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, steady
It is fixed, it is adapted to promote the use of.
Brief description of the drawings
The utility model is further illustrated with reference to the accompanying drawings and examples.
Fig. 1 is the structural representation of the utility model optical monitoring system multiwindow device;
Wherein:1st, OMS light source incidences window;2nd, vacuum chamber cavity;3rd, door for vacuum chamber;4th, OMS light sources receive window;5、
OMS light source incidences direction;6th, OMS light sources receive direction.
Embodiment
The utility model is described in further detail presently in connection with accompanying drawing.Accompanying drawing is simplified schematic diagram, only to show
Meaning mode illustrates basic structure of the present utility model, therefore it only shows the composition relevant with the utility model.
Specific embodiment, referring to Fig. 1, optical monitoring system multiwindow device, including OMS light source incidences window 1, vacuum
The door for vacuum chamber 3 of chamber body 2 and OMS light sources receive window 4, and one end of the vacuum chamber cavity 2 is provided with OMS light source incidences window 1,
The other end of the vacuum chamber cavity 2 is provided with door for vacuum chamber 3, and the door for vacuum chamber 3 is provided with OMS light sources and receives window 4, described
OMS light source incidences window 1 and OMS light sources receive window 4 on same straight line, the OMS light source incidences window 1 and OMS light
The number that source receives window 4 is respectively two.
In coating process, the OMS light sources of the optical monitoring system multiwindow device(White light or laser)Enter from OMS light sources
The different radii that direction 5 is transmitted through the coated basal plate of vacuum chamber inside cavity by OMS light source incidences window 1 is penetrated, through OMS light
Source receives window and received from OMS light sources reception direction 6 by OMS reception devices, and Real-time Feedback is carried out to OMS to each road optical signal
Analysis, the thickness of each different radii point is judged according to each light signal strength, and the film thickness uniformity of each radius point is entered by OMS
Row amendment in real time and control.
Optical monitoring system multiwindow device involved by the utility model, the device are applied to multi-pass optical monitoring system
System can be monitored to the multiple radiuses of substrate simultaneously, and can be according to the strong and weak analysis thickness of each radius point optical signal in coating process
Uniformity, amendment in real time and control are carried out to the film thickness uniformity of each radius point eventually through OMS.Substantially increase optical monitoring
The uniformity of precision and thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve one
The order of magnitude, plated film yield improve 2-3 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, steady
It is fixed, it is adapted to promote the use of.
Obviously, above-described embodiment is only intended to clearly illustrate example, and is not the restriction to embodiment.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of change or
Change.There is no necessity and possibility to exhaust all the enbodiments.And the obvious change thus extended out or
Among changing still in the protection domain of the invention.