CN206706200U - Optical monitoring system multiwindow device - Google Patents

Optical monitoring system multiwindow device Download PDF

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Publication number
CN206706200U
CN206706200U CN201720335790.8U CN201720335790U CN206706200U CN 206706200 U CN206706200 U CN 206706200U CN 201720335790 U CN201720335790 U CN 201720335790U CN 206706200 U CN206706200 U CN 206706200U
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CN
China
Prior art keywords
optical monitoring
oms
monitoring system
multiwindow
window
Prior art date
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Expired - Fee Related
Application number
CN201720335790.8U
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Chinese (zh)
Inventor
王静辉
郑燕飞
邓琪
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Sunny Optoelectronic Technology Anhui Co ltd
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Individual
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Anticipated expiration legal-status Critical

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  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

It the utility model is related to film recovery technique field, more particularly to optical monitoring system multiwindow device.The optical monitoring system multiwindow device, including OMS light source incidences window, vacuum chamber chamber vacuum room door and OMS light sources receive window.Optical monitoring system multiwindow device involved by the utility model, which is applied to multi-pass optical monitoring system, to be monitored simultaneously to the multiple radiuses of substrate, and amendment in real time and control can be carried out to the film thickness uniformity of each radius point eventually through OMS according to the strong and weak analysis film thickness uniformity of each radius point optical signal in coating process.Substantially increase optical monitoring precision and the uniformity of thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve an order of magnitude, and plated film yield improves 23 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, stably, is adapted to promote the use of.

Description

Optical monitoring system multiwindow device
Technical field
It the utility model is related to film recovery technique field, more particularly to optical monitoring system multiwindow device.
Background technology
Market prior art is single window type, and optical monitoring system can only be by the way of the optical monitoring of monochromatic light road.City Field prior art is single window type, and optical monitoring system can only be by the way of the optical monitoring of monochromatic light road, only can be to plated film base The point of one radius of plate is monitored, and monitoring ratio of precision is relatively low, causes substrate film coating film thickness uniformity control accuracy poor, plated film Product yield is than relatively low.
The present invention devises optical monitoring system multiwindow device, and the device can be same applied to multi-pass optical monitoring system When the multiple radiuses of substrate are monitored, and can be according to the strong and weak analysis uniform film thickness of each radius point optical signal in coating process Property, amendment in real time and control are carried out to the film thickness uniformity of each radius point eventually through OMS.Substantially increase optical monitoring precision With the uniformity of thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve a quantity Level, plated film yield improve 2-3 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, stably, It is adapted to promote the use of.
Utility model content
In order to overcome defect present in background technology, the utility model solves technical scheme used by its technical problem It is:Optical monitoring system multiwindow device, including OMS light source incidences window, vacuum chamber chamber vacuum room door and OMS light sources receive Window, one end of the vacuum chamber cavity are provided with OMS light source incidence windows, and the other end of the vacuum chamber cavity is provided with vacuum chamber Door, the door for vacuum chamber are provided with OMS light sources and receive window, and the OMS light source incidences window and OMS light sources receive window same On straight line, the number that the OMS light source incidences window and OMS light sources receive window is respectively two.
Optical monitoring system multiwindow device involved by the utility model, the device are applied to multi-pass optical monitoring system System can be monitored to the multiple radiuses of substrate simultaneously, and can be according to the strong and weak analysis thickness of each radius point optical signal in coating process Uniformity, amendment in real time and control are carried out to the film thickness uniformity of each radius point eventually through OMS.Substantially increase optical monitoring The uniformity of precision and thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve one The order of magnitude, plated film yield improve 2-3 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, steady It is fixed, it is adapted to promote the use of.
Brief description of the drawings
The utility model is further illustrated with reference to the accompanying drawings and examples.
Fig. 1 is the structural representation of the utility model optical monitoring system multiwindow device;
Wherein:1st, OMS light source incidences window;2nd, vacuum chamber cavity;3rd, door for vacuum chamber;4th, OMS light sources receive window;5、 OMS light source incidences direction;6th, OMS light sources receive direction.
Embodiment
The utility model is described in further detail presently in connection with accompanying drawing.Accompanying drawing is simplified schematic diagram, only to show Meaning mode illustrates basic structure of the present utility model, therefore it only shows the composition relevant with the utility model.
Specific embodiment, referring to Fig. 1, optical monitoring system multiwindow device, including OMS light source incidences window 1, vacuum The door for vacuum chamber 3 of chamber body 2 and OMS light sources receive window 4, and one end of the vacuum chamber cavity 2 is provided with OMS light source incidences window 1, The other end of the vacuum chamber cavity 2 is provided with door for vacuum chamber 3, and the door for vacuum chamber 3 is provided with OMS light sources and receives window 4, described OMS light source incidences window 1 and OMS light sources receive window 4 on same straight line, the OMS light source incidences window 1 and OMS light The number that source receives window 4 is respectively two.
In coating process, the OMS light sources of the optical monitoring system multiwindow device(White light or laser)Enter from OMS light sources The different radii that direction 5 is transmitted through the coated basal plate of vacuum chamber inside cavity by OMS light source incidences window 1 is penetrated, through OMS light Source receives window and received from OMS light sources reception direction 6 by OMS reception devices, and Real-time Feedback is carried out to OMS to each road optical signal Analysis, the thickness of each different radii point is judged according to each light signal strength, and the film thickness uniformity of each radius point is entered by OMS Row amendment in real time and control.
Optical monitoring system multiwindow device involved by the utility model, the device are applied to multi-pass optical monitoring system System can be monitored to the multiple radiuses of substrate simultaneously, and can be according to the strong and weak analysis thickness of each radius point optical signal in coating process Uniformity, amendment in real time and control are carried out to the film thickness uniformity of each radius point eventually through OMS.Substantially increase optical monitoring The uniformity of precision and thickness.This optical monitoring system(OMS)The application of multiwindow device makes optical monitoring precision improve one The order of magnitude, plated film yield improve 2-3 times, and the optical monitoring system multiwindow apparatus structure is reasonable in design, easy to install and use, steady It is fixed, it is adapted to promote the use of.
Obviously, above-described embodiment is only intended to clearly illustrate example, and is not the restriction to embodiment.It is right For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of change or Change.There is no necessity and possibility to exhaust all the enbodiments.And the obvious change thus extended out or Among changing still in the protection domain of the invention.

Claims (1)

1. optical monitoring system multiwindow device, including OMS light source incidence windows(1), vacuum chamber cavity(2)Door for vacuum chamber(3) Window is received with OMS light sources(4), it is characterised in that:The vacuum chamber cavity(2)One end be provided with OMS light source incidence windows (1), the vacuum chamber cavity(2)The other end be provided with door for vacuum chamber(3), the door for vacuum chamber(3)OMS light sources are provided with to receive Window(4), the OMS light source incidences window(1)Window is received with OMS light sources(4)On same straight line, the OMS light sources Incidence window(1)Window is received with OMS light sources(4)Number be respectively two.
CN201720335790.8U 2017-03-31 2017-03-31 Optical monitoring system multiwindow device Expired - Fee Related CN206706200U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720335790.8U CN206706200U (en) 2017-03-31 2017-03-31 Optical monitoring system multiwindow device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720335790.8U CN206706200U (en) 2017-03-31 2017-03-31 Optical monitoring system multiwindow device

Publications (1)

Publication Number Publication Date
CN206706200U true CN206706200U (en) 2017-12-05

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CN201720335790.8U Expired - Fee Related CN206706200U (en) 2017-03-31 2017-03-31 Optical monitoring system multiwindow device

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113355646A (en) * 2021-06-10 2021-09-07 西华师范大学 Film monitoring preparation device and method based on multi-source co-evaporation technology

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113355646A (en) * 2021-06-10 2021-09-07 西华师范大学 Film monitoring preparation device and method based on multi-source co-evaporation technology

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Effective date of registration: 20180607

Address after: 5# building, Chengdu machinery and electronics Pioneer Park, Lianpu Road, Zhengpu port new area, Ma'anshan, Anhui

Patentee after: SUNNY OPTOELECTRONIC TECHNOLOGY (ANHUI) CO.,LTD.

Address before: 215000 C 202 202, innovation and Technology Park, No. 17, Song Xian Chau lane, Pingjiang District, Suzhou, Jiangsu

Co-patentee before: Zheng Yanfei

Patentee before: Wang Jinghui

Co-patentee before: Deng Qi

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20171205

CF01 Termination of patent right due to non-payment of annual fee