CN206304929U - 一种等离子体聚合涂层装置 - Google Patents
一种等离子体聚合涂层装置 Download PDFInfo
- Publication number
- CN206304929U CN206304929U CN201621296613.5U CN201621296613U CN206304929U CN 206304929 U CN206304929 U CN 206304929U CN 201621296613 U CN201621296613 U CN 201621296613U CN 206304929 U CN206304929 U CN 206304929U
- Authority
- CN
- China
- Prior art keywords
- vacuum chamber
- discharge
- placing articles
- porous electrode
- coating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621296613.5U CN206304929U (zh) | 2016-11-30 | 2016-11-30 | 一种等离子体聚合涂层装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621296613.5U CN206304929U (zh) | 2016-11-30 | 2016-11-30 | 一种等离子体聚合涂层装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN206304929U true CN206304929U (zh) | 2017-07-07 |
Family
ID=59251029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201621296613.5U Active CN206304929U (zh) | 2016-11-30 | 2016-11-30 | 一种等离子体聚合涂层装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN206304929U (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106622824A (zh) * | 2016-11-30 | 2017-05-10 | 无锡荣坚五金工具有限公司 | 一种等离子体聚合涂层装置 |
CN112981374A (zh) * | 2019-12-18 | 2021-06-18 | 江苏菲沃泰纳米科技股份有限公司 | 镀膜设备及其镀膜方法 |
US11332829B2 (en) | 2016-11-30 | 2022-05-17 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
US11339477B2 (en) * | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
-
2016
- 2016-11-30 CN CN201621296613.5U patent/CN206304929U/zh active Active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106622824A (zh) * | 2016-11-30 | 2017-05-10 | 无锡荣坚五金工具有限公司 | 一种等离子体聚合涂层装置 |
WO2018098980A1 (zh) * | 2016-11-30 | 2018-06-07 | 江苏菲沃泰纳米科技有限公司 | 一种等离子体聚合涂层装置 |
US10424465B2 (en) | 2016-11-30 | 2019-09-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus |
US11332829B2 (en) | 2016-11-30 | 2022-05-17 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
US11339477B2 (en) * | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
CN112981374A (zh) * | 2019-12-18 | 2021-06-18 | 江苏菲沃泰纳米科技股份有限公司 | 镀膜设备及其镀膜方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106622824B (zh) | 一种等离子体聚合涂层装置 | |
CN206304929U (zh) | 一种等离子体聚合涂层装置 | |
EP3540093B1 (en) | Planetary rotary shelf device for nano-coating apparatus | |
CN108203090B (zh) | 一种石墨烯的制备方法 | |
CN1812687A (zh) | 大气压射频放电高速冷等离子体阵列发生器 | |
CN104918402A (zh) | 一种常压高压协同射频辉光射流放电的装置及其放电方法 | |
CN110337170B (zh) | 一种基于电流驱动技术反场位形结构的高密度等离子体射流发生装置 | |
CN103945627A (zh) | 一种手持式大面积低温等离子体发生装置 | |
CN205071427U (zh) | 简易大气压冷等离子体发生器 | |
CN103882412A (zh) | 采用等离子体射流制备高阻隔薄膜的方法 | |
JP2000510910A (ja) | 容器の内面を処理する方法及び装置 | |
CN113817999B (zh) | 一种用于制备压电陶瓷的真空镀膜设备 | |
CN110035594B (zh) | 基于介质阻挡放电等离子体的材料改性装置、***及方法 | |
CN110527988A (zh) | 异质结太阳能电池在线连续镀膜设备及进行镀膜的方法 | |
CN202205700U (zh) | 一种颗粒状材料表面低温等离子体处理装置 | |
CN201742637U (zh) | 大气压介质阻挡空气冷等离子体射流装置 | |
CN100484361C (zh) | 基于缩放通道结构的大气压放电冷等离子体发生器及阵列 | |
CN102746524A (zh) | 一种材料表面低温等离子体改性方法及其装置 | |
CN202103932U (zh) | 一种磁场增强的等离子体枪 | |
CN206215404U (zh) | 一种多源小功率低温等离子体聚合涂层装置 | |
CN102505447A (zh) | 大气压低温射频等离子体连续处理纤维表面的装置及方法 | |
CN2075655U (zh) | 双室旋转磁控溅射镀膜机 | |
CN202030820U (zh) | 一种用于生成材料薄膜的源装置 | |
CN200976707Y (zh) | 基于缩放通道结构的大气压放电冷等离子体发生器及阵列 | |
CN2870384Y (zh) | 一种常压气体放电装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180112 Address after: Yuqi Industrial Park East Ring Road 214183 Jiangsu city of Wuxi Province Patentee after: Jiangsu Feiwotai Nano Technology Co. Ltd. Address before: Jiangsu province Wuxi city Huishan District Qi Zhen Yu Yuqi Industrial Park East Ring Road Patentee before: Wuxi RJ Industries Co., Ltd. |
|
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: No.182, East Ring Road, Yuqi supporting area, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee after: Jiangsu feiwotai nanotechnology Co.,Ltd. Address before: 214183 East Ring Road, Yuqi Industrial Park, Wuxi City, Jiangsu Province Patentee before: Jiangsu Favored Nanotechnology Co.,Ltd. |