CN206301763U - A kind of continual and steady monocrystalline silicon piece cleaning device - Google Patents
A kind of continual and steady monocrystalline silicon piece cleaning device Download PDFInfo
- Publication number
- CN206301763U CN206301763U CN201621335851.2U CN201621335851U CN206301763U CN 206301763 U CN206301763 U CN 206301763U CN 201621335851 U CN201621335851 U CN 201621335851U CN 206301763 U CN206301763 U CN 206301763U
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- tank
- water
- cleaning device
- monocrystalline silicon
- continual
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Abstract
The utility model discloses a kind of continual and steady monocrystalline silicon piece cleaning device, including the first tank, second tank, 3rd tank, 4th tank, 5th tank, 6th tank, 7th tank, 8th tank, heater is provided with each tank, each heater is individually connected with heater temperature control plate, water-cooled block is equipped with inside 3rd tank and the 4th tank, fin is equipped with the outside of the 3rd tank and the 4th tank, water tank, liquid delivery pump, and the water-cooled block and fin, water tank, liquid delivery pump passes sequentially through liquid delivery tube order and is connected.The utility model has the advantages that stabilization, lasting cleaning as a kind of monocrystalline silicon piece cleaning device.
Description
Technical field
The utility model is related to monocrystalline silicon cleaning equipment field, more particularly to a kind of continual and steady cleaning monocrystalline silicon dress
Put.
Background technology
The cleaning device that cleaning silicon chip is used is provided with eight tanks, and heater is provided with each tank, and by heater
Temperature control plate controls water temperature.Carried out in order from the first groove to the 8th groove during cleaning, it is generally the case that to ensure cleaning performance, the
The temperature of cleaning solution needs to be set in 45~60 DEG C in three grooves and the 4th groove, because the water in the 3rd groove and the 4th groove is added with cleaning
Agent and because cleaning device and its heater are successively work, can cause the 3rd groove and the, it is necessary to remain in an unchanged state
Water temperature in four grooves is gradually increasing and more than 60 DEG C, causes silicon chip surface to aoxidize, and forms waste product.If now by heater temperature
Control plate closes heater, stops heating, and heater temperature control plate cannot show the temperature of the 3rd groove and the 4th trough inner water, make behaviour
Making personnel can not grasp very well, so as to influence the normal wash of silicon chip.
In the patent of Publication No. 202034357U:A kind of monocrystalline silicon piece cleaning device, including the first tank, the second water
Groove, the 3rd tank, the 4th tank, the 5th tank, the 6th tank, the 7th tank, the 8th tank, are provided with heating in each tank
Device, each heater is individually connected with heater temperature control plate, it is characterised in that be respectively equipped with the 3rd tank and the 4th tank
Cool water circulating pipe, hopper is respectively equipped with the side of the 3rd tank and the 4th tank, and cool water circulating pipe is connected with hopper
Connect.Heat in tank is absorbed by cool water circulating pipe, tank is lowered the temperature with water, but after continuous firing certain hour,
Coolant-temperature gage in hopper can be heated up with the increase for absorbing heat, and its cooling effect then can be reduced slowly, or even invalid.From
And can not accomplish not closing heater continuous firing.
Therefore it provides a kind of monocrystalline silicon piece cleaning device that can stablize continuous firing, just becomes urgently to be resolved hurrily in the industry
Problem.
Utility model content
To solve the problems, such as that background technology is mentioned, the utility model proposes following technical scheme:
A kind of continual and steady monocrystalline silicon piece cleaning device, including the first tank, the second tank, the 3rd tank, the 4th water
Groove, the 5th tank, the 6th tank, the 7th tank, the 8th tank, heater is provided with each tank, each heater with plus
Hot device temperature control plate is individually connected, and water-cooled block is equipped with inside the 3rd tank and the 4th tank, in the 3rd tank and the 4th water
Groove outside is equipped with fin, water tank, liquid delivery pump, and the water-cooled block and fin, water tank, liquid delivery pump lead to successively
Liquid delivery tube order is crossed to be connected.
Preferably, described fin outside is provided with some radiating tubes, increases radiating effect.
Preferably, described water-cooled block is metal derby of the inside with water channel, is made up of copper or aluminium, increases heat absorption effect
Really.
Preferably, described water-cooled block cross section is flat ellipse, increases endotherm area.
The utility model has an advantageous effect in that:Heat in tank is absorbed by water-cooled block, liquid conveying is delivered to
Temperature is reduced in cold water in pipe;And by fin, by the heat transfer of liquid delivery tube reclaimed water to outside, therefore, tool
Have the advantages that sustainable stabilization carries out cleaning.
Brief description of the drawings:
Fig. 1 is overall structure diagram of the present utility model.
Wherein:The tanks of 1- first, the tanks of 2- second, the tanks of 3- the 3rd, the tanks of 4- the 4th, the tanks of 5- the 5th, the water of 6- the 6th
Groove, the tanks of 7- the 7th, the tanks of 8- the 8th, 9- heaters, 10- heater temperature control plates, 11- water-cooled blocks, 12- liquid delivery tubes, 13-
Fin, 14- water tanks, 15- liquid delivery pumps, 16- radiating tubes.
Specific embodiment
In order that those skilled in the art more fully understands the technical solution of the utility model, below to the utility model
It is described further:
A kind of continual and steady monocrystalline silicon piece cleaning device, including the first tank 1, the second tank 2, the 3rd tank the 3, the 4th
Tank 4, the 5th tank 5, the 6th tank 6, the 7th tank 7, the 8th tank 8, are provided with heater 9 in each tank, and each adds
Hot device 9 is individually connected with heater temperature control plate 10, and water-cooled block 11 is equipped with inside the 3rd tank 3 and the 4th tank 4,
Three tanks 3 and the outside of the 4th tank 4 are equipped with fin 13, water tank 14, liquid delivery pump 15, and the water-cooled block 11 and radiating
Piece 13, water tank 14, liquid delivery pump 15 pass sequentially through the order of liquid delivery tube 12 and are connected.
Preferably, the described outside of fin 13 is provided with some radiating tubes 16, increases radiating effect.
Preferably, described water-cooled block 11 is metal derby of the inside with water channel, is made up of copper or aluminium, increases heat absorption
Effect.
Preferably, the described cross section of water-cooled block 11 is flat ellipse, increases endotherm area.
Some one exemplary embodiments of the present utility model only are described by way of explanation above, undoubtedly, for
One of ordinary skill in the art, in the case of without departing from spirit and scope of the present utility model, can be with a variety of
Mode is modified to described embodiment.Therefore, above-mentioned accompanying drawing and description are inherently illustrative, should not be construed as
Limitation to the utility model claims.
Claims (4)
1. a kind of continual and steady monocrystalline silicon piece cleaning device, including the first tank, the second tank, the 3rd tank, the 4th tank,
5th tank, the 6th tank, the 7th tank, the 8th tank, heater is provided with each tank, each heater and heater
Temperature control plate is individually connected, it is characterised in that:Be equipped with water-cooled block inside 3rd tank and the 4th tank, in the 3rd tank and
4th tank outside is equipped with fin, water tank, liquid delivery pump, and the water-cooled block and fin, water tank, liquid delivery pump
Liquid delivery tube order is passed sequentially through to be connected.
2. a kind of continual and steady monocrystalline silicon piece cleaning device according to claim 1, it is characterised in that:Described radiating
Piece outside is provided with some radiating tubes.
3. a kind of continual and steady monocrystalline silicon piece cleaning device according to claim 1, it is characterised in that:Described water-cooled
Block is metal derby of the inside with water channel, is made up of copper or aluminium.
4. a kind of continual and steady monocrystalline silicon piece cleaning device according to claim 1 or 3, it is characterised in that:Described
Water-cooled block cross section is flat ellipse.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621335851.2U CN206301763U (en) | 2016-12-07 | 2016-12-07 | A kind of continual and steady monocrystalline silicon piece cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621335851.2U CN206301763U (en) | 2016-12-07 | 2016-12-07 | A kind of continual and steady monocrystalline silicon piece cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN206301763U true CN206301763U (en) | 2017-07-04 |
Family
ID=59213290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201621335851.2U Expired - Fee Related CN206301763U (en) | 2016-12-07 | 2016-12-07 | A kind of continual and steady monocrystalline silicon piece cleaning device |
Country Status (1)
Country | Link |
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CN (1) | CN206301763U (en) |
-
2016
- 2016-12-07 CN CN201621335851.2U patent/CN206301763U/en not_active Expired - Fee Related
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170704 Termination date: 20181207 |
|
CF01 | Termination of patent right due to non-payment of annual fee |