CN206188406U - A device for handling polycrystalline silicon by -product sediment thick liquid - Google Patents
A device for handling polycrystalline silicon by -product sediment thick liquid Download PDFInfo
- Publication number
- CN206188406U CN206188406U CN201621254734.3U CN201621254734U CN206188406U CN 206188406 U CN206188406 U CN 206188406U CN 201621254734 U CN201621254734 U CN 201621254734U CN 206188406 U CN206188406 U CN 206188406U
- Authority
- CN
- China
- Prior art keywords
- slurry
- bed reactor
- heat exchanger
- thick liquid
- pipeline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Silicon Compounds (AREA)
Abstract
The utility model discloses a device for handling polycrystalline silicon by -product sediment thick liquid, including thick liquid attitude bed reactor, thick liquid attitude bed reactor outer wall be provided with sediment thick liquid feed inlet and HCl raw material feed port, thick liquid attitude bed reactor bottom is through pipeline intercommunication waste material jar, thick liquid attitude bed reactor top through pipeline and the first storage tank intercommunication that has first heat exchanger, thick liquid attitude bed reactor outside is equipped with and presss from both sides the cover. The utility model discloses a dedicated system who handles polycrystal white residue thick liquid gives first place to with thick liquid attitude bed reactor, simple structure, design scientific and reasonable for handle sediment thick liquid in the polycrystalline silicon production process, can turn into the raw materials for production chlorosilane with having activated silica flour in the sediment thick liquid, realize that the silica flour utilizes the maximize, the perfect closed circulation of polycrystalline silicon production.
Description
Technical field
The utility model belongs to photovoltaic industry technical field, more particularly to a kind of for processing polysilicon by-product slurry
Device.
Background technology
At present, photovoltaic industry production polysilicon prevailing technology is improved Siemens, is produced in production of polysilicon a large amount of
By-produced tetrachlorosilane, now main processing means are to be translated into production of polysilicon original by cold hydrogenation or hot hydrogenation process
Material trichlorosilane.In production of polysilicon, the production process of chlorosilane, in its corresponding reaction unit and purification process not
Produce chlorosilane slurry with can avoiding (primary solids impurity is silica flour (including chlorine hydrogenation apparatus maintenance material returned silica flour)；Liquid group
It is divided into silicon tetrachloride, trichlorosilane, polysilane and metal chloride etc.).Cold hydrogenation slurry has neither part nor lot in fluid bed
The less silica flour of particle diameter of reaction, discharges, its silicon without peroxidating for containing after chilling again after being separated through cyclone separator
Powder still has certain activity.
In the prior art, the common method to slurry treatment will be contained in slurry using drying equipment or vacuum drum equipment
Some chlorosilanes carry out heating evaporation or are recovered by filtration (or being directly hydrolyzed), remaining dense slurry (water capacity 5%-
60%) neutralisation treatment then is carried out with milk of lime or soda lime, follow-up waste residue and wastewater treatment system is entered with slag liquid after treatment
System carries out outer row after being processed.This kind of processing mode not only results in the waste of the certain active silica flour contained in slurry, leads
A large amount of wastes of material are caused, the production cost of polysilicon is increased；And directly discharge will increase the pressure of subsequent handling, to ring
Border adversely affects.It is therefore desirable to active silica flour is carried out into recycling.The synthesis of traditional trichlorosilane
Method can be reacted by silica flour with hydrogen chloride (or chlorine and hydrogen)：
Its main reaction equation is：Si+3HCl→SiHCl3(trichlorosilane)+H2
In the building-up process of trichlorosilane, under different temperature and pressures, silicon tetrachloride as by-product and dichloro can be generated
Dihydro silicon.Its side reaction is：Si+4HCl→SiCl4(silicon tetrachloride)+2H2；Si+4HCl→SiH2Cl2(dichlorosilane)+H2。
Silica flour is exothermic reaction with hcl reaction generation trichlorosilane, reaction need to only be heated in the starting stage.Later stage is root
According to reaction product controlling reaction temperature, waste heat need to be shifted.
The components such as silicon tetrachloride as by-product, the dichlorosilane of synthesizing trichlorosilane can be by cold hydrogenation or anti-disproportionation device
It is converted into production of polysilicon raw material trichlorosilane.Activated silica in polycrystalline silicon slurry is converted into the chlorine such as trichlorosilane, silicon tetrachloride
Silane can realize maximally utilizing for silicon power raw material, reduce material loss, realize cost efficiency, reduce environmental protection pressure.
The main mode of production of current trichlorosilane be using two kinds of forms of ebullated bed and fixed bed, but both yields all compared with
Low, high energy consumption, investment is big, the shortcomings of pollute high, and the also chlorosilane containing liquid in polycrystalline silicon slurry, it is impossible to use ebullated bed
Or fixed bed is processed the silica flour in slurry.
Utility model content
Technical problem to be solved in the utility model is to provide in a kind for the treatment of polysilicon production process using slurry bed system
The high-efficient treatment device of slurry.
Utility model is in order to solve the above technical problems, thinking of the present utility model is as follows：
The utility model need to be processed the silica flour in slurry using the reactor of solid-liquid-gas three-phase coexistence.Slurry bed system
Reactor is a kind of gas -liquid -solid three -phase reactor, and its is relatively simple for structure.Reactor body structure is by reactor shell, gas
Distributor, heat production coil pipe etc. are constituted.Inside reactor is full of bubbling slurries (reactant or inert media), raw material during normal production
After the distribution grid of gas (reactant is not involved in the gas such as inert gas of reaction) reacted device, entered in the form of bubbling and filled
Expire in the reactor of slurries, reacted in the particle surface for suspending.Slurries in this reactor are issued in the drive of gas
Capable circulation is conigenous, even if under relatively low gas velocity, the gas in slurries can also reach dispersion and mixed effect well with solid,
And be conducive to the heat transfer of system in course of reaction, improve the conversion ratio of reaction.Therefore production of polysilicon mistake is processed using slurry bed system
Slurry not only invests small in journey, takes up an area less, consumes energy small, and can accomplish to be recycled the silica flour in slurry, in slurry
The chlorosilane for containing reclaimed, maximization is accomplished to reduce material loss, and cost efficiency is environment-friendly.
The specific technical scheme of the utility model is as follows：
The device of slurry in a kind of utilization slurry bed system treatment polysilicon production process, including paste state bed reactor, it is described
Paste state bed reactor outer wall is provided with slurry charging aperture and HCl material inlets, and the paste state bed reactor bottom passes through pipeline
Connection waste tank, described paste state bed reactor top is connected by pipeline with the first storage tank with First Heat Exchanger, described
Heat-exchanger rig is provided with outside paste state bed reactor.
Wherein, described paste state bed reactor inside is provided with demister by apical position, for processing paste state bed reactor
The foam that interior reaction mass is produced.
Heat-exchanger rig is provided with outside the paste state bed reactor, the heat-exchanger rig is preferably chuck or coil pipe, but not
It is limited to chuck or coil pipe, as long as the device of the utility model heat transfer effect can be realized.
Wherein, described slurry charging aperture is 1~5, and described HCl material inlets are 1~5, and are ensured at least
There is a slurry charging aperture to be located at the upper end of other slurry charging apertures and all HCl material inlets, while ensureing at least one
Individual HCl material inlets are located at the lower end of other HCl charging apertures and all slurry charging apertures.Using the purpose of this kind of layout pattern
It is to be beneficial to being fully contacted and reacting complete for slurry and gas.
Preferably, at least one HCl material inlet is arranged on the paste state bed reactor bottom.
For example, slurry charging aperture can select 2, HCl material inlets can select 3, and have a HCl raw material to enter
Material mouth is located at paste state bed reactor bottom, and 5 charging apertures are respectively slurry charging aperture, HCl material inlets, HCl under upper
Material inlet, slurry charging aperture, HCl material inlets, slurry charging aperture can respectively from slurry bed system with HCl material inlets
The different directions of reactor enter inside reactor, and certain the utility model is not limited to a kind of this layout pattern of charging aperture,
Any layout pattern for being conducive to raw material to be fully contacted and react is all within protection domain of the present utility model.
Wherein, described the first storage tank with First Heat Exchanger, its First Heat Exchanger top connects tail gas by pipeline
Processing unit, the gas not coagulated by heat exchanger on a small quantity (including a small amount of chlorosilane, hydrogen chloride or Cl2, nitrogen, hydrogen) and pass through this
Passage enters exhaust gas processing device, is discharged after being processed.
Wherein, described the first storage tank with First Heat Exchanger, its First Heat Exchanger top passes through pipeline and compressor
Connection is back to HCl material inlets again, and this purpose for setting is to reclaim the HCl in on-condensible gas or Cl2, work as reaction
When raw material is HCl, HCl is reclaimed, when reaction raw materials are Cl2When, reclaim Cl2。
Wherein, described preposition second heat exchanger of the first storage tank with First Heat Exchanger, at the top of paste state bed reactor
Gas reclaims chlorosilane as far as possible by two-stage heat-exchange system.
Used as a kind of implementation of the present utility model, at least one slurry charging aperture is by pipeline and evaporator or turns
Drum connection.Described slurry is by after evaporator or drum filter treatment, entering back into paste state bed reactor.
Used as a kind of implementation of the present utility model, at least one slurry charging aperture is by pipeline and flash distillation tower bottom
Connection, flash column top is connected by pipeline with the second storage tank with the 3rd heat exchanger, and its 3rd heat exchanger top is by pipe
Road connects exhaust gas processing device, and chlorosilane liquid produced is collected in flash column top by pipeline, and flash column lower section is provided with material inlet.
Preferably, described preposition 4th heat exchanger of the second storage tank with the 3rd heat exchanger, other at the top of flash column are by two
Level heat-exchange system can avoid chlorosilane gas coagulate be discharged.Wherein, described flash column can be packed tower or dividing plate
Tower, described flash column can also be replaced with flash tank or other equipment that there is flash distillation to remove liquid, it is also possible to realize same effect
Really.
Wherein, the refrigerant of above-mentioned heat exchanger can be selected from recirculated water, ethylene glycol, liquefied ammonia or freon.It is further preferred that
Described First Heat Exchanger and the refrigerant of the 3rd heat exchanger are ethylene glycol or freon, -0 DEG C of ice-forming processes outside pipes -30 DEG C, outlet
- 20 DEG C of temperature -10 DEG C, -5 DEG C -300 DEG C of material import and export temperature.The second described heat exchanger and the refrigerant of the 4th heat exchanger are
Recirculated water, ethylene glycol, liquefied ammonia or freon, inlet temperature are -30 DEG C -20 DEG C, and outlet temperature is 0 DEG C -200 DEG C.Described slurry
The cooling medium of state bed external heat-exchanging device is selected from, recirculated water, ethylene glycol, liquefied ammonia or freon.
Using the technique of slurry in said apparatus treatment polysilicon production process, by catalyst and polysilicon production process
Middle slurry, and/or cold hydrogenation maintenance material returned silica flour are passed through slurry charging aperture, and HCl raw materials are passed through into HCl material inlets simultaneously,
The temperature that cooling medium controls paste state bed reactor is passed through by circulation in heat-exchanger rig, the chlorosilane gas that reaction is obtained lead to
Cross paste state bed reactor top duct to enter the first storage tank with First Heat Exchanger condensed is the collection of liquid silane, fixed gas
Body is processed by pipeline emptying, and reacted waste material is deposited on paste state bed reactor bottom, is periodically expelled to waste tank.
Wherein, described catalyst is one or more in copper chloride, stannous chloride, aluminium chloride and stannic chloride.It is described
Catalyst can be used alone above-mentioned catalyst, or by above-mentioned Catalyst Adsorption on carrier, for example adsorb activated carbon,
Silica or three dichloroxides.The consumption of described catalyst is catalytic amount, and preferable amount is account for slurry feedstock quality 0%
~80%.
Further, the catalyst amount accounts for the 1% of slurry feedstock quality.
Slurry in polysilicon production process described in the utility model, its moisture content is about 30~96wt%.
Wherein, when the moisture content of slurry in polysilicon production process is 30wt%~96wt%, evaporation can in advance be first passed through
Device or rotary drum are processed, and reclaim a part of chlorosilane, and the slurry moisture content after treatment is 5wt%~60wt%.
Wherein, when the moisture content of slurry in polysilicon production process is 30wt%~96wt%, flash distillation can in advance be first passed through
Tower or flash tank are processed, and the slurry moisture content after treatment is 20wt%~90wt%.
Wherein, slurry feeding flash column is flashed under the conditions of 10kpa-150kpa, 15-60 DEG C in polysilicon production process,
Chlorosilane gaseous substance after flash distillation is condensed by heat exchanger and enters chlorosilane storage tank, and the solid-liquid component after flash distillation is deposited on flash distillation
Tower bottom enters the slurry charging aperture of paste state bed reactor.Chlorosilane in slurry raw material can be reclaimed by flash column.
Wherein, slurry (or by slurry of above-mentioned pretreatment), and/or cold hydrogen in catalyst and polysilicon production process
Change maintenance material returned silica flour, after can mixing again simultaneously enter one or more slurry charging apertures, it is also possible to part mixing or not
Mixing enters in paste state bed reactor from multiple slurry charging apertures respectively.
Wherein, described HCl raw materials can use Cl2Raw material is replaced.
Wherein, described cooling medium is recirculated water.
Wherein, at 200-500 DEG C, initial reaction stage need to be by reaction for the reaction temperature control of described paste state bed reactor
Device is heated carrys out controlling reaction temperature, when reaction carry out when then by controlling chuck in recirculated water come controlling reaction temperature.
The reaction pressure normal pressure of described paste state bed reactor, low pressure, high pressure all may be used.
Wherein, the mass ratio that HCl and Si elements in reaction raw materials are controlled in paste state bed reactor is (1~10)：1.It is described
HCl raw materials Cl2When raw material is replaced, Cl in control reaction raw materials in paste state bed reactor2With the mass ratio of Si elements for (1~
10)：1.
Wherein, the slurry medium selection in paste state bed reactor is in a liquid state and is heated and do not decompose between 300-600 DEG C, with
The nonreactive organic matter such as hydrogen chloride, silica flour, metal chloride or inorganic matter, such as：Fat hydrocarbon or fatty amines etc..It is described
Fat hydrocarbon can be paraffin, described fatty amines can be the tertiary amines such as trihexylamine.Wherein, in production process, slurry
The liquid level of the slurry medium in bed reactor needs to be kept for no more the 2/3 of device height.
To increase the cycle of operation of whole technological process, need periodically to be not involved in reactor to be arranged outside the solid matter of reaction
Into waste tank with pending.Be not involved in reaction material be mainly oxidized silica flour or metal chloride, can by its with
Slurry medium is recycled recycling after being separated for other purposes (such as fire proofing tile), slurry medium.
Silica flour active in slurry can be converted into by raw materials for production chlorosilane by above-mentioned paste state bed reactor, it is real
Existing silica flour is using maximization.
Chlorosilane described in the utility model, including trichlorosilane, silicon tetrachloride, dichlorosilane etc..
Beneficial effect：It is of the present utility model treatment polycrystalline silicon slurry device based on paste state bed reactor, simple structure,
Design science rationally, for processing polysilicon production process in slurry not only invest small, take up an area few, consume energy small, and can accomplish
Silica flour in slurry is recycled, to slurry in the chlorosilane for containing reclaim, maximization accomplish reduce material damage
Consumption, cost efficiency is environment-friendly.Polycrystalline silicon slurry, energy are processed using the device for the treatment of polycrystalline silicon slurry of the present utility model
It is enough that silica flour active in slurry is converted into raw materials for production chlorosilane (trichlorosilane, silicon tetrachloride, dichlorosilane etc.),
Realize silica flour using maximization；The chlorosilane having in slurry is reclaimed.
Brief description of the drawings
Fig. 1 is the schematic device of embodiment 1.
Fig. 2 is the schematic device of embodiment 2.
Specific embodiment
The utility model is described in detail below in conjunction with the accompanying drawings.
Embodiment 1
As shown in figure 1, a kind of utilization slurry bed system processes the device of slurry in polysilicon production process, including slurry reactor
Device 2, the described outer wall of paste state bed reactor 2 is provided with slurry charging aperture and HCl material inlets, the paste state bed reactor 2
By pipeline communication waste tank 9, the described top of paste state bed reactor 2 is by pipeline and with First Heat Exchanger first for bottom
Storage tank 5 is connected, and heat-exchanger rig 10 is provided with outside the paste state bed reactor 2, and the heat-exchanger rig is chuck.
Wherein, the described inside of paste state bed reactor 2 is provided with demister 7 by apical position, for processing slurry reactor
The foam that reaction mass is produced in device.
Wherein, described slurry charging aperture is 2, and described HCl material inlets are 3, and have a HCl raw material to enter
Material mouth is located at the bottom of paste state bed reactor 2, and 5 charging apertures are respectively slurry charging aperture, HCl material inlets, HCl from top to bottom
Material inlet, slurry charging aperture, HCl material inlets.Slurry charging aperture can respectively from slurry bed system with HCl material inlets
The different directions of reactor enter inside reactor, it is also possible to enter inside reactor from same direction.
Wherein, described the first storage tank 5 with First Heat Exchanger, its First Heat Exchanger top is big with the external world by pipeline
Gas is connected.A small amount of gas (including a small amount of chlorosilane, hydrogen chloride or Cl not coagulated by heat exchanger2, nitrogen, hydrogen) and it is logical by this
Discharge in road.Its First Heat Exchanger top is connected with compressor 8 by pipeline and be back to again HCl material inlets, this mesh for setting
Be to reclaim the HCl in on-condensible gas or Cl2, when reaction raw materials are HCl, HCl is reclaimed, when reaction raw materials are Cl2
When, reclaim Cl2.Wherein, described preposition second heat exchanger 6 of the first storage tank 5 with First Heat Exchanger, paste state bed reactor 2
The gas at top by two-stage heat-exchange system can avoid chlorosilane gas coagulate be discharged.
Wherein, the refrigerant of described First Heat Exchanger is ethylene glycol or freon.The refrigerant of the second described heat exchanger is
Condensed water, ethylene glycol or freon.The refrigerant of described chuck is condensed water.
Embodiment 2
As shown in Fig. 2 it is substantially similar with the device of embodiment 1, except that, it is provided with outside paste state bed reactor 2 and is changed
Thermal 10, the heat-exchanger rig is coil pipe, and described slurry charging aperture is 3, and described HCl material inlets are 3, and
Two of which slurry charging aperture is connected by pipeline with the bottom of flash column 1, and another slurry charging aperture is used to send into catalyst
And/or cold hydrogenation maintenance material returned silica flour.The top of flash column 1 is connected by pipeline with the second storage tank 3 with the 3rd heat exchanger, its
3rd heat exchanger top is connected by pipeline with ambient atmosphere, and chlorosilane liquid produced, flash column are collected in the top of flash column 1 by pipeline
1 lower section is provided with material inlet.Preferably, described preposition 4th heat exchanger 4 of the second storage tank 3 with the 3rd heat exchanger,
Other of the top of flash column 1 can avoid chlorosilane gas from not coagulating being discharged by two-stage heat-exchange system.Wherein, the described 3rd
The refrigerant of heat exchanger is ethylene glycol or freon.The refrigerant of the 4th described heat exchanger is condensed water, ethylene glycol or freon.
Embodiment 3
Using the technique of slurry in the device treatment polysilicon production process shown in Fig. 1 or Fig. 2, by catalyst and polycrystalline
Slurry, and/or cold hydrogenation maintenance material returned silica flour are passed through slurry charging aperture in silicon production process, and it is former that HCl raw materials are passed through into HCl simultaneously
Material charging aperture, the temperature that cooling medium controls paste state bed reactor, the chlorosilane that reaction is obtained are passed through by circulation in chuck
It is the collection of liquid silane that gas enters the first storage tank with First Heat Exchanger condensed by paste state bed reactor top duct,
On-condensible gas is processed by pipeline emptying, and reacted waste material is deposited on paste state bed reactor bottom, is periodically expelled to waste tank.
Wherein, described catalyst is one or more in copper chloride, stannous chloride, aluminium chloride and stannic chloride.It is described
Catalyst can be used alone above-mentioned catalyst, or by above-mentioned Catalyst Adsorption on carrier, for example adsorb activated carbon,
Silica or alundum (Al2O3).The consumption of described catalyst is catalytic amount, and preferable amount is to account for raw material slurry quality 0.1%
~80%.
Slurry in polysilicon production process described in the utility model, its moisture content is about 30~96wt%.
Wherein, when the moisture content of slurry in polysilicon production process is 30wt%~96wt%, evaporation can in advance be first passed through
Device or rotary drum are processed, and reclaim a part of chlorosilane, and the slurry moisture content after treatment is 5wt%~60wt%.
Wherein, when the moisture content of slurry in polysilicon production process is 30wt%~96wt%, flash distillation can in advance be first passed through
Tower or flash tank or packed tower or partitioned column treatment, the slurry moisture content after treatment is 20wt%~90wt%.
Wherein, slurry feeding flash column is flashed under the conditions of 10kpa-150kpa, 15-60 DEG C in polysilicon production process,
Chlorosilane gaseous substance after flash distillation is condensed by heat exchanger and enters chlorosilane storage tank, and the solid-liquid component after flash distillation is deposited on flash distillation
Tower bottom enters the slurry charging aperture of paste state bed reactor.Chlorosilane in slurry raw material can be reclaimed by flash column.
Wherein, slurry (or by slurry of above-mentioned pretreatment), and/or cold hydrogen in catalyst and polysilicon production process
Change maintenance material returned silica flour, after can mixing again simultaneously enter one or more slurry charging apertures, it is also possible to part mixing or not
Mixing enters in paste state bed reactor from multiple slurry charging apertures respectively.
Wherein, described HCl raw materials can use Cl2Raw material is replaced.
Wherein, at 200-500 DEG C, initial reaction stage need to be by reaction for the reaction temperature control of described paste state bed reactor
Device is heated carrys out controlling reaction temperature, when reaction carry out when then by controlling chuck in condensed water come controlling reaction temperature.
The reaction pressure normal pressure of described paste state bed reactor, low pressure, high pressure all may be used.
Wherein, the mass ratio that HCl and Si elements in reaction raw materials are controlled in paste state bed reactor is (1~10)：1.It is described
HCl raw materials Cl2When raw material is replaced, Cl in control reaction raw materials in paste state bed reactor2With the mass ratio of Si elements for (1~
10)：1.
To increase the cycle of operation of whole technological process, need periodically to be not involved in reactor to be arranged outside the solid matter of reaction
Into waste tank with pending.Be not involved in reaction material be mainly oxidized silica flour or metal chloride, can by its with
Slurry medium is recycled recycling after being separated for other purposes (such as fire proofing tile), slurry medium.
Slurry medium selection in paste state bed reactor is in a liquid state and is heated and do not decompose between 300-600 DEG C, with chlorination
The nonreactive organic matter such as hydrogen, silica flour, metal chloride or inorganic matter, such as：Fat hydrocarbon or fatty amines etc..Described fat
Fat hydro carbons is paraffin, and described fatty amines are the tertiary amines such as trihexylamine.Wherein, in production process, in paste state bed reactor
The liquid level of slurry medium needs to be kept for no more the 2/3 of device height.
In order to further verify the beneficial effect that the utility model device and process bands are come, spy devises test example 1-5, its
In processing step with embodiment 3, the slurry medium and catalyst of selection are as shown in the table, then determine each test example
Chlorosilane conversion ratio, the results are shown in Table 1：
Table 1
Wherein, the quality accounting of activated silica is 0.5% -5% in charging slurry.As fully visible, using of the present utility model
Device processes polycrystalline silicon slurry so that chlorosilane conversion ratio reaches more than 50%, reduces material waste loss, and realization was produced
Cost efficiency in journey.
Claims (10)
1. a kind of device for processing polysilicon by-product slurry, it is characterised in that described including paste state bed reactor (2)
Paste state bed reactor (2) outer wall is provided with slurry charging aperture and HCl material inlets, and paste state bed reactor (2) bottom leads to
Piping connects waste tank (9), and described paste state bed reactor (2) top is by pipeline and the first storage with First Heat Exchanger
Tank (5) is connected, and heat-exchanger rig (10) is provided with outside the paste state bed reactor (2).
2. the device for processing polysilicon by-product slurry according to claim 1, it is characterised in that described slurry bed system
Inside reactor (2) demister (7) is provided with by apical position；The heat-exchanger rig (10) is chuck or coil pipe.
3. the device for processing polysilicon by-product slurry according to claim 1, it is characterised in that described slurry is entered
Material mouth is 1~5, and described HCl material inlets are 1~5, and ensures that at least one slurry charging aperture is located at other slags
The upper end of slurry charging aperture and all HCl material inlets, while ensureing that at least one HCl material inlet is located at other HCl
The lower end of charging aperture and all slurry charging apertures.
4. the device for processing polysilicon by-product slurry according to claim 3, it is characterised in that at least one
HCl material inlets are arranged on the paste state bed reactor (2) bottom.
5. the device for processing polysilicon by-product slurry according to claim 1, it is characterised in that described with
First storage tank (5) of one heat exchanger, its First Heat Exchanger top connects exhaust gas processing device by pipeline.
6. the device for processing polysilicon by-product slurry according to claim 5, it is characterised in that described with
First storage tank (5) of one heat exchanger, its First Heat Exchanger top is connected with compressor (8) by pipeline and be back to again HCl raw materials
Charging aperture.
7. the device for processing polysilicon by-product slurry according to claim 1 or 5 or 6, it is characterised in that described
Preposition second heat exchanger (6) of the first storage tank (5) with First Heat Exchanger.
8. the device for processing polysilicon by-product slurry according to claim 1 or 3, it is characterised in that at least
Individual slurry charging aperture is connected by pipeline with flash column (1) bottom, and flash column (1) top is by pipeline and carries the 3rd heat exchanger
The second storage tank (3) connection, its 3rd heat exchanger top connects with exhaust gas processing device by pipeline, leads to above flash column (1)
Piping collects chlorosilane liquid produced, and flash column (1) lower section is provided with material inlet.
9. the device for processing polysilicon by-product slurry according to claim 8, it is characterised in that described flash column
(1) replaced with flash tank；Described preposition 4th heat exchanger (4) of the second storage tank (3) with the 3rd heat exchanger.
10. the device for processing polysilicon by-product slurry according to claim 1 or 3, it is characterised in that at least
Individual slurry charging aperture is connected by pipeline with evaporator or drum filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621254734.3U CN206188406U (en) | 2016-11-18 | 2016-11-18 | A device for handling polycrystalline silicon by -product sediment thick liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621254734.3U CN206188406U (en) | 2016-11-18 | 2016-11-18 | A device for handling polycrystalline silicon by -product sediment thick liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206188406U true CN206188406U (en) | 2017-05-24 |
Family
ID=58727555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621254734.3U Active CN206188406U (en) | 2016-11-18 | 2016-11-18 | A device for handling polycrystalline silicon by -product sediment thick liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206188406U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108069428A (en) * | 2016-11-18 | 2018-05-25 | 江苏中能硅业科技发展有限公司 | For handling the device and technique of polysilicon by-product slurry |
| CN108275655A (en) * | 2018-01-17 | 2018-07-13 | 大连金鑫设备有限公司 | Polysilicon waste residue environmental protection and public nuisance free processing system and processing method |
| CN111072033A (en) * | 2020-01-19 | 2020-04-28 | 中国恩菲工程技术有限公司 | Pretreatment system and method for chlorosilane residual liquid |
| CN113772677A (en) * | 2021-09-30 | 2021-12-10 | 四川永祥新能源有限公司 | Cracking reaction column and cracking process for byproduct chlorosilane high-boiling-point substances in polycrystalline silicon production |
-
2016
- 2016-11-18 CN CN201621254734.3U patent/CN206188406U/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108069428A (en) * | 2016-11-18 | 2018-05-25 | 江苏中能硅业科技发展有限公司 | For handling the device and technique of polysilicon by-product slurry |
| CN108069428B (en) * | 2016-11-18 | 2023-10-10 | 江苏中能硅业科技发展有限公司 | Device and process for treating polysilicon byproduct slag slurry |
| CN108275655A (en) * | 2018-01-17 | 2018-07-13 | 大连金鑫设备有限公司 | Polysilicon waste residue environmental protection and public nuisance free processing system and processing method |
| CN108275655B (en) * | 2018-01-17 | 2023-07-25 | 大连华鹏工程技术服务有限公司 | Environment-friendly pollution-free treatment system and treatment method for polycrystalline silicon waste residues |
| CN111072033A (en) * | 2020-01-19 | 2020-04-28 | 中国恩菲工程技术有限公司 | Pretreatment system and method for chlorosilane residual liquid |
| CN111072033B (en) * | 2020-01-19 | 2023-05-12 | 中国恩菲工程技术有限公司 | Pretreatment system and method for chlorosilane residual liquid |
| CN113772677A (en) * | 2021-09-30 | 2021-12-10 | 四川永祥新能源有限公司 | Cracking reaction column and cracking process for byproduct chlorosilane high-boiling-point substances in polycrystalline silicon production |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN206188406U (en) | A device for handling polycrystalline silicon by -product sediment thick liquid | |
| CN101143723B (en) | Modified method and device for preparing trichlorosilane and multicrystal silicon | |
| CN102234117B (en) | A kind of method for hydrolysis of the material containing hydrolyzable halogen atom | |
| CN102030329B (en) | Polycrystalline silicon producing device and process | |
| CN101279735A (en) | Production method and apparatus for trichlorosilane | |
| CN103449449B (en) | Prepare method and the equipment thereof of trichlorosilane | |
| CN105797543A (en) | SiHCl3 synthetic tail gas treatment device | |
| CN102502646B (en) | Equipment and method for preparing polysilicon by fast circulating fluidized bed-based chemical vapor deposition | |
| CN204058313U (en) | A kind of apparatus system recycling chlorosilane slag slurry raffinate | |
| CN103382032A (en) | Preparation method for trichlorosilane from silicon tetrachloride | |
| CN102786055A (en) | Method and device for heat utilization in polycrystalline silicon production process | |
| CN103449448B (en) | Equipment for purification trichlorosilane | |
| CN103449446B (en) | Method for preparing trichlorosilane | |
| CN102923716A (en) | Process for producing trichlorosilane through inverse disporportionation of dichlorosilane | |
| CN102020282A (en) | Method for producing trichlorosilane by using silicon tetrachloride | |
| CN103449440B (en) | Equipment for preparing polycrystalline silicon | |
| CN105060297B (en) | A kind of method and device for producing silicochloroform | |
| CN108069428B (en) | Device and process for treating polysilicon byproduct slag slurry | |
| CN102897770B (en) | A kind of hydrogenation of silicon tetrachloride is improved one's methods and device | |
| CN201136791Y (en) | Device for conversing silicon tetrachloride to be trichlorosilane by hydrochlorination process | |
| CN104891499B (en) | Technological method for preparing polysilicon by silane method | |
| CN103482630B (en) | Prepare the method for polysilicon | |
| CN103449447B (en) | Prepare the equipment of trichlorosilane | |
| CN101481114A (en) | Method for recycling polysilicon by-product silicon tetrachloride | |
| CN102557045A (en) | Method and device for producing white carbon black and carbon tetrachloride by adopting plasma process |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |