CN205880498U - Photoresistance supply system - Google Patents
Photoresistance supply system Download PDFInfo
- Publication number
- CN205880498U CN205880498U CN201620829127.9U CN201620829127U CN205880498U CN 205880498 U CN205880498 U CN 205880498U CN 201620829127 U CN201620829127 U CN 201620829127U CN 205880498 U CN205880498 U CN 205880498U
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- China
- Prior art keywords
- photoresistance
- surge tank
- supply system
- drain pipe
- bottle
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- 239000007788 liquid Substances 0.000 claims abstract description 15
- 238000005452 bending Methods 0.000 claims description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 6
- 229910052756 noble gas Inorganic materials 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 2
- 235000013547 stew Nutrition 0.000 abstract 2
- 230000035939 shock Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 241001466460 Alveolata Species 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- Separation By Low-Temperature Treatments (AREA)
Abstract
The utility model discloses a photoresistance supply system, a serial communication port, photoresistance supply system includes: the photoresistance bottle is including photoresistance inner bag, air inlet, drain pipe, the buffer tank, the input pipeline, the input pipeline with the drain pipe of photoresistance bottle links to each other, output pipeline, output pipeline is located the buffer tank below, exhaust duct, exhaust duct is located the buffer tank top, wherein, the input pipeline is the U type, exhaust duct links to each other with air exhaust device, air exhaust device is in form the negative pressure on the buffer tank photoresistance liquid level, U type input pipeline makes the photoresistance flow into the buffer tank with the more stable state of the littleer velocity of flow, does benefit to the photoresistance discharge bubble that stews, reduces the shock effect to the photoresistance that stews simultaneously, and air exhaust device forms the negative pressure on buffer tank photoresistance liquid level, make the bubble in the photoresistance discharge from the photoresistance sooner more comprehensively.
Description
Technical field
This utility model relates to the technical field of liquid supply, is specifically related to a kind of photoresistance supply system.
Background technology
In liquid crystal display manufacture process, need to pattern etching of developing on light blockage coating to glass substrate.
Fig. 1 is the structural representation of light blockage coating feeding mechanism in prior art, and described light blockage coating feeding mechanism includes
Photoresistance bottle 100, surge tank 200, the photoresistance inner bag 101 holding photoresistance is installed, above photoresistance bottle 100 in described photoresistance bottle 100
There are air inlet 102, drain pipe 103, ventilated in photoresistance bottle 100 body by air inlet 102, extrude photoresistance inner bag 101, by going out
Photoresistance is extruded by liquid pipe 103.Surge tank 200 includes input channel 201, output channel 202, input channel 201 and drain pipe 103
Being connected, make photoresistance enter 200, output channel 202 is connected, by light blockage coating to glass substrate with being coated with lathe nozzle at quarter.
Described photoresistance inner bag 101 needs to open when mounted, and inevitable air can be mixed in photoresistance inner bag, goes out simultaneously
Liquid pipe 103 also exposes in atmosphere, and air can be caused to be mixed in the photoresistance of drain pipe 103, causes producing in photoresistance bubble.As
Shown in Fig. 2, when photoresistance inner bag 101 uses the later stage, the gas in photoresistance and photoresistance inner bag 101 mixes the most in a large number and is squeezed by nitrogen
Pressure output.And existing surge tank 200 volume is 100 milliliters, within every 2 minutes, mended by input channel 201 according to board coating speed
Once, fluid infusion time interval is too short for liquid, it is impossible to be completely exhausted out by the bubble of the photoresistance in surge tank.
It is applied on glass substrate by nozzle through output channel 202 containing alveolate photoresistance, the disappearance of pattern can be caused, lead
Cause scrapping or doing over again of product, waste substantial amounts of material resources manpower.And need shutdown to carry out row's bubble, waste photoresistance, and need engineering
Teacher's substantial amounts of time and energy, cause the increase of production cost.
Utility model content
In view of this, this utility model provides a kind of photoresistance supply system, under conditions of low cost, it is ensured that in photoresistance
Bubble is completely exhausted out, and improves product yield and photoresistance utilization rate.
A kind of photoresistance supply system that this utility model embodiment provides, it is characterised in that described photoresistance supply system bag
Include: photoresistance bottle, including photoresistance inner bag, air inlet, drain pipe；Surge tank；Input channel, described input channel and described photoresistance bottle
Drain pipe be connected；Output channel, described output channel is positioned at below described surge tank；Discharge duct, described discharge duct position
Above described surge tank；Wherein, described input channel is U-shaped, and described discharge duct is connected with air extractor, described in bleed dress
Put formation negative pressure in described surge tank.
Further, described photoresistance bottle includes described photoresistance inner bag, described air inlet, described drain pipe, in described photoresistance
Bag is arranged in described photoresistance bottle, and described photoresistance bottle is provided above described air inlet, described drain pipe, by described air inlet
In described photoresistance bottle, logical noble gas, extrudes described photoresistance inner bag, and described drain pipe one end, in described photoresistance inner bag, is passed through
Photoresistance is discharged by described drain pipe.
Further, described noble gas is nitrogen.
Further, described input channel includes feed liquor part, bending part, dispensing parts, and described feed liquor part is from upper
By connecting described bending part in top is passed through described surge tank on described surge tank under and, connect after described bending part bends
Connecing described dispensing parts, described dispensing parts is arranged in described surge tank from bottom to top.
Further, described feed liquor part, described bending part, described dispensing parts, at least one includes multiple
Kink.
Further, described feed liquor part, described bending part, described dispensing parts, at least one is twist.
Further, also include detecting device, controlling processing means, on described detection device is arranged in described surge tank
Top end face, detects pressure in described surge tank, and pressure information feeds back to described control processing means, described control processing means
Connect described air extractor, control described air extractor to ensure negative pressure according to described pressure information.
Further, described detection device is air pressure induction apparatus.
Further, described air extractor is air pump.
Further, also include that liquidometer, described liquidometer go up top end face in being arranged at described surge tank.
By increasing the volume of surge tank, photoresistance is made to have sufficiently long time of repose in surge tank so that bubble is discharged,
Use U-shaped input channel, make photoresistance flow into surge tank, beneficially photoresistance with the state that less flow velocity is more stable and stand discharge gas
Bubble, reduces the impact impact standing photoresistance simultaneously, increases air extractor and form negative pressure on surge tank photoresistance liquid level, make light
Bubble in resistance is the most more comprehensively discharged from photoresistance.
Accompanying drawing explanation
By description to this utility model embodiment referring to the drawings, of the present utility model above-mentioned and other mesh
, feature and advantage will be apparent from, in the accompanying drawings:
Fig. 1 is the structural representation of light blockage coating feeding mechanism in prior art；
Fig. 2 is the structural representation of the another kind of state of light blockage coating feeding mechanism in prior art；
Fig. 3 is the structural representation of photoresistance supply system of the present utility model；
Fig. 4 is the structural representation of another kind of surge tank of the present utility model；
Fig. 5 is the structural representation of another surge tank of the present utility model；
Detailed description of the invention
Below based on embodiment, this utility model is described, but this utility model is not restricted to these to be implemented
Example.In below details of the present utility model being described, detailed describe some specific detail sections.To people in the art
The description not having these detail sections for Yuan can also understand this utility model completely.
Additionally, it should be understood by one skilled in the art that accompanying drawing is provided to descriptive purpose provided herein, and
Accompanying drawing is not necessarily drawn to scale.
Unless the context clearly requires otherwise, otherwise entire disclosure is similar with " including ", " comprising " in claims etc.
Word should be construed to the implication that comprises rather than exclusive or exhaustive implication；It is to say, be containing of " including but not limited to "
Justice.
In description of the present utility model, in description of the present utility model, except as otherwise noted, " multiple " are meant that
Two or more.
Fig. 3 is the structural representation of photoresistance supply system of the present utility model.Described photoresistance supply system includes photoresistance bottle
100, surge tank 300, input channel 301, output channel 302, discharge duct 303.
Described photoresistance bottle 100 includes that photoresistance inner bag 101, air inlet 102, drain pipe 103, described photoresistance inner bag 101 are installed
In described photoresistance bottle 100, described photoresistance bottle 100 is provided above described air inlet 102, described drain pipe 103, described in go out liquid
, in described photoresistance inner bag 101, being ventilated body by described air inlet 102 in described photoresistance bottle 100 in pipe 103 one end, extrudes institute
State photoresistance inner bag 101, by described drain pipe 103, photoresistance is discharged.
Described gas is noble gas.
Described noble gas is nitrogen.
Described input channel 301 is connected with the drain pipe 103 of described photoresistance bottle 100, and described output channel 302 is positioned at described
Below surge tank 300, described output channel 302 is carved lathe nozzle be connected with being coated with, by light blockage coating to glass substrate, and described row
Feed channel 303 is positioned at above described surge tank 300, and described exhaustor 303 is connected with air extractor (not shown).
Described input channel 301 is U-shaped, including feed liquor part 311, bending part 321, dispensing parts 331, described feed liquor
Part 311 connects described bending part 321, warp in being passed through described surge tank 300 by top on described surge tank 300 from top to bottom
Connecting described dispensing parts 331 after the bending of described bending part 321, described dispensing parts 331 arranges described buffering from bottom to top
In tank.Photoresistance enters the described surge tank 300 U-shaped road along described input channel 301 from top to bottom by described input channel 301
After the flowing of footpath, the described surge tank of bottom-up inflow 300.With the prior art input channel 201 in Fig. 2 make photoresistance directly under
And the difference of the upper described surge tank of inflow 200 is, photoresistance has longer flowing stroke in described input channel 301, its stream
Dynamic speed can be gradually reduced, and can flow into described surge tank 300 with the state that less flow velocity is more stable, reduce standing photoresistance
Impact impact.
Described exhaustor 303 is connected with air extractor, and described air extractor is bled, at described surge tank 300 photoresistance liquid level
Upper formation negative pressure, makes the bubble in photoresistance the most more comprehensively discharge from photoresistance.
Can also include detecting device (not shown), controlling processing means (not shown), described detection device
In being arranged on described surge tank 300, upper top end face, detects described surge tank 300 photoresistance liquid level pressure, pressure information is fed back to
Described control processing means, described control processing means connects described air extractor, takes out according to the control of described pressure information
Device of air is to ensure negative pressure.
Described air extractor is air pump.
Described detection device is air pressure induction apparatus.
Can also include that liquidometer (not shown), described liquidometer go up top end face in being arranged at described surge tank 300,
Detect described photoresistance liquid level, make photoresistance liquid level there is space with top end face on described surge tank.
Described surge tank 300 volume is not less than 1500 milliliters.The increase of surge tank 300 volume, makes the photoresistance can be described
Stand the longer time in surge tank 300, enable the bubble in photoresistance sufficiently to separate out.
Fig. 4 is the structural representation of another kind of surge tank of the present utility model, and described input channel 301 is U-shaped, including entering
Liquid part 311, bending part 321, dispensing parts 331, in described feed liquor part 311, bending part 321 and dispensing parts 331,
At least one includes multiple kink, and photoresistance is buffered through described kink, and photoresistance can be more steady with less flow velocity
Fixed state flows into described surge tank, reduces the impact impact standing photoresistance.
Fig. 5 is the structural representation of another surge tank of this utility model, and described input channel 301 is U-shaped, including feed liquor
Part 311, bending part 321, dispensing parts 331, in described feed liquor part 311, bending part 321 and dispensing parts 331, extremely
Few one of them and twist, photoresistance flows in described input channel 301 longer flowing stroke, and can be to photoresistance
Sufficiently buffering so that it is the described surge tank of more stable inflow 300, reduces the impact impact standing photoresistance.
This utility model by increase surge tank volume, make photoresistance have sufficiently long time of repose in surge tank so that
Bubble is discharged, and uses U-shaped input channel, makes photoresistance flow into surge tank, beneficially photoresistance with the state that less flow velocity is more stable quiet
Put discharge bubble, reduce the impact impact standing photoresistance simultaneously, increase air extractor and formed on surge tank photoresistance liquid level
Negative pressure, makes the bubble in photoresistance the most more comprehensively discharge from photoresistance.
The foregoing is only preferred embodiment of the present utility model, be not limited to this utility model, for this area
For technical staff, this utility model can have various change and change.All institutes within spirit of the present utility model and principle
Any modification, equivalent substitution and improvement etc. made, within should be included in protection domain of the present utility model.
Claims (10)
1. a photoresistance supply system, it is characterised in that described photoresistance supply system includes:
Photoresistance bottle (100), including photoresistance inner bag (101), air inlet (102), drain pipe (103)；
Surge tank (300)；
Input channel (301), described input channel (301) is connected with the drain pipe (103) of described photoresistance bottle (100)；
Output channel (302), described output channel (302) is positioned at described surge tank (300) lower section；
Discharge duct (303), described discharge duct (303) is positioned at described surge tank (300) top；
Wherein, described input channel is U-shaped, and described discharge duct (303) is connected with air extractor, and described air extractor is described
Negative pressure is formed in surge tank (300).
A kind of photoresistance supply system the most according to claim 1, it is characterised in that described photoresistance bottle (100) includes described
Photoresistance inner bag (101), described air inlet (102), described drain pipe (103), described photoresistance inner bag (101) is arranged on described photoresistance
Bottle (100) in, described photoresistance bottle (100) is provided above described air inlet (102), described drain pipe (103), by described enter
QI KOU (102) is logical noble gas in described photoresistance bottle (100), extrudes described photoresistance inner bag (101), described drain pipe (103)
Photoresistance, in described photoresistance inner bag (101), is discharged by one end by described drain pipe (103).
A kind of photoresistance supply system the most according to claim 2, it is characterised in that described noble gas is nitrogen.
A kind of photoresistance supply system the most according to claim 1, it is characterised in that described input channel (301) include into
Liquid part (311), bending part (321), dispensing parts (331), described feed liquor part (311) is from top to bottom by described surge tank
(300) upper top connects described bending part (321) in being passed through described surge tank (300), bends through described bending part (321)
The described dispensing parts of rear connection (331), described dispensing parts (331) is arranged in described surge tank (300) from bottom to top.
A kind of photoresistance supply system the most according to claim 4, it is characterised in that described feed liquor part (311), described curved
(321), described dispensing parts (331) are divided in folding part, and at least one includes multiple kink.
A kind of photoresistance supply system the most according to claim 4, it is characterised in that described feed liquor part (311), described curved
(321), described dispensing parts (331) are divided in folding part, and at least one is twist.
A kind of photoresistance supply system the most according to claim 1, it is characterised in that also include detecting device, control processes
Device, described detection device is upper top end face in being arranged on described surge tank (300), detects described surge tank (300) interior pressure, will
Pressure information feeds back to described control processing means, and described control processing means connects described air extractor, according to described pressure
Information controls described air extractor to ensure negative pressure.
A kind of photoresistance supply system the most according to claim 7, it is characterised in that described detection device is air pressure sensing
Device.
A kind of photoresistance supply system the most according to claim 1, it is characterised in that described air extractor is air pump.
A kind of photoresistance supply system the most according to claim 1, it is characterised in that also include liquidometer, described liquidometer
Upper top end face in being arranged at described surge tank (300).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620829127.9U CN205880498U (en) | 2016-08-03 | 2016-08-03 | Photoresistance supply system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620829127.9U CN205880498U (en) | 2016-08-03 | 2016-08-03 | Photoresistance supply system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205880498U true CN205880498U (en) | 2017-01-11 |
Family
ID=57701161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620829127.9U Active CN205880498U (en) | 2016-08-03 | 2016-08-03 | Photoresistance supply system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205880498U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107045269A (en) * | 2017-03-15 | 2017-08-15 | 惠科股份有限公司 | Developing and bubble discharging device and developing machine |
| CN113655691A (en) * | 2020-05-12 | 2021-11-16 | 长鑫存储技术有限公司 | Extrusion device, photoresist supply system and photoresist supply method |
-
2016
- 2016-08-03 CN CN201620829127.9U patent/CN205880498U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107045269A (en) * | 2017-03-15 | 2017-08-15 | 惠科股份有限公司 | Developing and bubble discharging device and developing machine |
| CN107045269B (en) * | 2017-03-15 | 2019-09-20 | 惠科股份有限公司 | Developing and bubble discharging device and developing machine |
| CN113655691A (en) * | 2020-05-12 | 2021-11-16 | 长鑫存储技术有限公司 | Extrusion device, photoresist supply system and photoresist supply method |
| CN113655691B (en) * | 2020-05-12 | 2023-06-27 | 长鑫存储技术有限公司 | Extrusion device, photoresist supply system and photoresist supply method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Patentee after: InfoVision Optoelectronics(Kunshan)Co.,Ltd. Address before: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Patentee before: Infovision Optoelectronics (Kunshan) Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |