CN205613356U - Aluminium oxide polish configuration device - Google Patents
Aluminium oxide polish configuration device Download PDFInfo
- Publication number
- CN205613356U CN205613356U CN201620061718.6U CN201620061718U CN205613356U CN 205613356 U CN205613356 U CN 205613356U CN 201620061718 U CN201620061718 U CN 201620061718U CN 205613356 U CN205613356 U CN 205613356U
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- China
- Prior art keywords
- configuration device
- polishing solution
- filter
- solution according
- alumina
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- Expired - Fee Related
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The utility model discloses an aluminium oxide polish configuration device, the device adds the mouth including material bucket, agitating unit, particle size grading device, filter equipment, supersound pond, PH test mouth and the auxiliary material that is used for preparing the aluminium oxide polish, the material bucket is arranged in above the supersound pond, be equipped with PH test mouth, auxiliary material interpolation mouth on the lid of material bucket, connect polishing powder particle size grading device and its bottom is equipped with the discharge gate of taking filter equipment. The inside of material bucket is equipped with the agitator. The utility model discloses an aluminium oxide polish configuration device can improve production efficiency and product quality, improves wafer surface finish quality.
Description
Technical field
The utility model relates to a kind of polishing powder processing production equipment, and specifically the utility model relates to aluminum oxide polishing
Liquid configures device.
Background technology
As precision machined chemical Mechanical Polishing Technique (CMP), CMP effect is had very important by the performance of polishing fluid
Impact, the especially uniformity of polish abrasive particle diameter and the degree of scatter of abrasive material directly control the clearance of burnishing surface and bright and clean
Degree, the polish abrasive of uniform particle sizes can obtain more preferable polishing speed and accurately fine smooth surface, therefore to polish abrasive
The research that such as aluminum oxide, carborundum, diamond etc. carry out configuring device is extremely important.
Being currently used for polishing fluid configuration device does not also have and perfect, and abrasive material dispersion is generally divided into: stirring and stirring add super
Sound.The grain diameter grading device of abrasive material is a lot, and such as Chinese patent CN1053565A discloses a kind of sharp turn jet powder size and divides
Level method and device, this device utilizes jet deflection screening principle and cross-flow screening principle, is suitable for the sieve of the particle of 1-100 μm
Point, the scope of application is also narrower.
Content of the invention
The purpose of this utility model is to provide a kind of alumina polishing solution configuration device, and this device is possible not only to make oxidation
Aluminium powder is fully dispersed, grain size grading and finished product filter, and flexible structure, is easily changed.
The utility model is achieved through the following technical solutions:
Utilize alumina polishing solution adapting device configuration high-quality alumina polishing solution, including alumina polishing solution configuration dress
Put, it is characterised in that this device includes material barrel, agitating device, grain diameter grading device, filter, ultrasonic pond, PH test port
Add mouth with auxiliary material.Described material barrel is placed in inside ultrasonic pond, and bottom is connected with filter, and inside includes agitating device,
Top connects grain diameter grading device, PH test port and auxiliary material and adds mouth.Described material barrel be used for storing polish abrasive slurry and
Slurry is carried out scattered container by stirring with ultrasonic；PH test port on described material barrel lid and auxiliary material add mouth and use respectively
Alumina polishing solution PH is monitored and needs the charge door of the auxiliary material adding in polishing fluid preparation process in material barrel.Institute
State ultrasonic pond for ultrasonic wave is converted into mechanical oscillation, thus ultrasonic disperse is carried out to alumina polishing solution in size barrel；Institute
State grain diameter grading device to include polishing powder input port and connect the polishing powder delivery outlet of pump, for the primary screen to abrasive size
Point；Described filter includes filter core and filter pump, and filter core micro-pore diameter can be changed according to polishing powder particle diameter, is used for aluminum oxide
Polishing fluid finished product filters.Described discharging opening is fixed on filter device end, and discharging opening is fixed by screws in filter device end
End, it is simple to dismounting, described ultrasonic pond includes ultrasonic transducer and liquid tank, and discharging opening is offered in described ultrasonic pond bottom.
The beneficial effects of the utility model are as follows:
Of the present utility model utilize grain diameter grading device, ultrasonic pond, agitating device and filter complete to aluminum oxide throw
Light liquid configures, and owing to being provided with grain diameter grading device device, makes abrasive size homogeneous, improves polished surface quality；Due to ultrasonic
Pond and agitating device, make polishing powder particle fully dispersed in a solvent, it is to avoid agglomeration occur.In addition, discharge outlet is arranged
Having filter, progressive one avoids the appearance of particulate matter big in polishing fluid；Additionally, filter fills flexible, readily accessible, can
To require to change filter according to different-grain diameter.
Brief description
Fig. 1 is alumina polishing solution of the present utility model configuration apparatus structure schematic diagram；
Description of reference numerals:
1. ultrasonic pond 2. filter 3. discharging opening 4. motor 5. socket 6.PH test port 7. auxiliary material adds mouth 8.
Polishing powder charge door 9. grain diameter grading device 10. material barrel 11. agitator 12 centrifugal pump
Detailed description of the invention
Describe detailed description of the invention of the present utility model below in conjunction with the accompanying drawings in detail.
Alumina polishing solution configures device, as it is shown in figure 1, comprise 1. ultrasonic pond 2. filter 3. discharging opening 4. electricity
Machine 5. socket 6.PH test port 7. auxiliary material adds mouth 8. polishing powder charge door 9. grain diameter grading device 10. material barrel 11.
Agitator.Described aluminum oxide polishing powder is transported in material barrel 10 carry out grain size grading, described material by grain diameter grading device 9
Bucket 10 is positioned at the inside in ultrasonic pond 1, and described agitator is positioned at material barrel 10, PH test port 6, and auxiliary material adds mouth 7 and is fixed on thing
On charging basket lid, described filter 2 is fixed on before discharging opening 3.The filter 2 being fixed by screws on discharging opening 3
Different purpose filter core can be selected according to polishing powder particle diameter, as 1250 mesh, 2500 mesh and 12500 mesh.
The utility model grain diameter grading device, ultrasonic pond and agitating device, improve polishing powder uniform particle diameter and polishing fluid
Dispersiveness, its operation principle is as follows: is carried out grain size grading (removing big particle diameter) by grain diameter grading device to polishing powder, is added by pump
Being added in material barrel, other auxiliary materials add mouth admixture charging basket by auxiliary material, and ultrasonic pond is converted into often by ultrasonic transducer
The second high-frequency mechanical vibrations of tens of thousands of times, form ultrasonic wave in WATER AS FLOW MEDIUM, in the way of malleation and negative pressure high-frequency replace and change
In water, density interphase ground forward directed radiation is propagated, and makes constantly to produce countless tiny bubbles in water and constantly ruptures, and this phenomenon claims
Be " cavitation effect ".1000 atmospheric pressure above instantaneous pressure can be formed during bubbles burst, produce a series of blast release
Go out huge energy, to around forming enormous impact, thus polishing fluid in material barrel is constantly impacted, it is to avoid polishing powder
Reuniting in the local of particulate, adds agitating device simultaneously thus ensure alumina polishing solution dispersiveness and homogeneity.After dispersion terminates
First pass through filter and pass through discharging opening again.
Using method of the present utility model is as follows: opens grain diameter grading device 9 and is classified polishing powder, utilizes centrifugal pump
12 are transported to the polishing powder of uniform particle diameter in material barrel 10, add mouth 7 by auxiliary material and add solvent and auxiliary material, open simultaneously and stir
Mix device 11 and ultrasonic pond, make polishing powder and solvent fully merge, disperse.After end, alumina polishing solution first passes through filter
2, discharged by discharging opening 3 and be collected.
Above the specific embodiment of the present invention is described in detail, but described content has been only the preferable enforcement of the present invention
Example, it is impossible to be considered the practical range for limiting the present invention.All equalizations made according to the present patent application scope change and improve
Deng all should still belong within the patent covering scope of the present invention.
Claims (7)
1. alumina polishing solution configuration device, it is characterised in that this device include material barrel, agitating device, grain diameter grading device,
Filter, ultrasonic pond, PH test port and auxiliary material add mouth；Described material barrel is placed in inside ultrasonic pond, and bottom was connected with
Filter device, inside includes agitating device, and top connects grain diameter grading device, PH test port and auxiliary material and adds mouth.
2. alumina polishing solution according to claim 1 configuration device, it is characterised in that: also include being positioned above material barrel
Motor and socket.
3. alumina polishing solution according to claim 1 configuration device, it is characterised in that: described filter includes filter core
And pump, filter core micro-pore diameter can be changed according to abrasive size.
4. alumina polishing solution according to claim 1 configuration device, it is characterised in that: described agitating device includes stirring
Axle, impeller, motor and socket.
5. alumina polishing solution according to claim 1 configuration device, it is characterised in that: described grain diameter grading device includes
Polishing powder input port and the polishing powder delivery outlet connecting pump.
6. alumina polishing solution according to claim 1 configuration device, it is characterised in that: the ultrasonic wave in described ultrasonic pond
Frequency is 20～200kHz.
7. alumina polishing solution according to claim 1 configuration device, it is characterised in that: other abrasive materials can also be applied to
Configuration, including list, polycrystalline diamond polishing fluid, cerium oxide polishing slurry, boron carbide lapping liquid, carborundum lapping liquid, zirconium oxide
Lapping liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620061718.6U CN205613356U (en) | 2016-01-15 | 2016-01-15 | Aluminium oxide polish configuration device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620061718.6U CN205613356U (en) | 2016-01-15 | 2016-01-15 | Aluminium oxide polish configuration device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205613356U true CN205613356U (en) | 2016-10-05 |
Family
ID=57034774
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620061718.6U Expired - Fee Related CN205613356U (en) | 2016-01-15 | 2016-01-15 | Aluminium oxide polish configuration device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205613356U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106926138A (en) * | 2017-03-23 | 2017-07-07 | 大连理工大学 | A kind of continuous real-time monitoring device of polishing fluid performance |
| CN108687669A (en) * | 2018-05-10 | 2018-10-23 | 太原理工大学 | A kind of liquid circulating apparatus of ultrasonic cavitation auxiliary stirring Magnetorheologicai polishing liquid |
| CN109294450A (en) * | 2018-11-26 | 2019-02-01 | 厦门大学 | A kind of mechanical dispersion process for mixed polishing solution |
| CN110339620A (en) * | 2019-08-14 | 2019-10-18 | 东北大学 | A kind of polishing fluid circulating purification processing unit |
| CN110681303A (en) * | 2019-11-27 | 2020-01-14 | 湖南大合新材料有限公司 | Polishing solution preparation device |
-
2016
- 2016-01-15 CN CN201620061718.6U patent/CN205613356U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106926138A (en) * | 2017-03-23 | 2017-07-07 | 大连理工大学 | A kind of continuous real-time monitoring device of polishing fluid performance |
| CN106926138B (en) * | 2017-03-23 | 2019-02-12 | 大连理工大学 | A kind of continuous real-time monitoring device of polishing fluid performance |
| CN108687669A (en) * | 2018-05-10 | 2018-10-23 | 太原理工大学 | A kind of liquid circulating apparatus of ultrasonic cavitation auxiliary stirring Magnetorheologicai polishing liquid |
| CN109294450A (en) * | 2018-11-26 | 2019-02-01 | 厦门大学 | A kind of mechanical dispersion process for mixed polishing solution |
| CN110339620A (en) * | 2019-08-14 | 2019-10-18 | 东北大学 | A kind of polishing fluid circulating purification processing unit |
| CN110681303A (en) * | 2019-11-27 | 2020-01-14 | 湖南大合新材料有限公司 | Polishing solution preparation device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161005 Termination date: 20200115 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |