CN205485275U - Volume to volume nanometer impression equipment that does not have remaining layer - Google Patents
Volume to volume nanometer impression equipment that does not have remaining layer Download PDFInfo
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- CN205485275U CN205485275U CN201620273593.3U CN201620273593U CN205485275U CN 205485275 U CN205485275 U CN 205485275U CN 201620273593 U CN201620273593 U CN 201620273593U CN 205485275 U CN205485275 U CN 205485275U
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Abstract
The utility model provides a volume to volume nanometer impression equipment that does not have remaining layer, this equipment of includes transmission device, coating machine structure, impression mechanism, curing mechanism, transmission device includes two sets of feeding rollers / receipts material roller, and first group will treat impression liquid polymer thing and deliver to impression mechanism and carry away remaining layer polymer that another group is used for receiving the shaping solidification polymer in the impression mechanism, during template roller separation in twining film and the impression mechanism on feeding roller / receipts material roller, the polymer is torn, and remaining layer polymer advances along with the film, and remaining polymer just in time is full of template roller pattern totally, accomplish the polymer of peeling off on remaining layer in template roller below rotatory during to the top, receives curing mechanism's effect and curing molding, and when template roller during with top membrane separator, curing molding's polymer is followed the film completely and is god forward, obtains not having remnants' layer pattern. The utility model discloses can be in succession, high -efficient, does not cheaply have a remaining layer nanometer yardstick pattern and shift.
Description
Technical field
This utility model relates to a kind of nano impression equipment, a kind of continuous nano-imprinting apparatus that can dispel remnant layer.
Background technology
Nano impression is a kind of high efficiency method manufacturing nano-device, has the feature of low cost, high yield, low cost.Nanometer embossing mainly includes hot padding, Microcontact printing and ultraviolet stamping three kinds at present.Volume to volume nanometer embossing can be with nano-pattern continuous embossed on large-area elastic film, and relatively conventional technology productivity is greatly improved.In traditional impressing, large-area impressing needs to apply the biggest external force, and this external force can be destroyed template and make template and sample adhere to each other.In volume to volume nanometer embossing, required embossing force is greatly reduced, and the separation process of template and sample is stripping process, and strength is less, and defect is less.
But, for volume to volume nanometer embossing, the control for remnant layer is the most extremely difficult.For this defect of volume to volume nanometer embossing, this patent proposes a kind of volume to volume nano-imprinting apparatus without remnant layer, can realize without remnant layer, continuous, the figure transfer of high yield, high-resolution, low cost relative to Conventional nano stamping technique.
Summary of the invention
In order to overcome volume to volume nanometer embossing to control the difficulty of remnant layer, the utility model proposes a kind of volume to volume nano-imprinting apparatus without remnant layer, not only realize imprinting without remnant layer, also retains volume to volume and imprint continuous, the feature of high yield, low cost.The nano-imprinting apparatus of volume to volume without remnant layer of the present utility model both can imprint thermoset copolymer material can also imprint ultraviolet photoresist polymeric material.
A kind of without remnant layer volume to volume nano-imprinting apparatus, it is characterised in that this nano-imprinting apparatus includes:
A kind of without remnant layer volume to volume nano-imprinting apparatus, this nano-imprinting apparatus includes:
Transmission mechanism, including two groups of feed roller/material receiving rollers, one of which is positioned at the lower section of another group；Often organize and on feed roller/material receiving roller, be all wound with one group of thin film to be imprinted；Two groups of thin film reverse transfer to be imprinted；This transmission mechanism is in order to control material to be imprinted along specific direction, with specific speed transmission；
Coating mechanism, after being positioned at lower section feed roller, including point gum machine, anilox roll and lining roller；Point gum machine is positioned at the front upper place of anilox roll, exports liquid polymer to anilox roll；Anilox roll and lining roller are in arranging mutually extruding up and down, middle by the thin film to be imprinted transmitted from feed roller, and the two mating reaction makes the liquid polymer to be imprinted of output in point gum machine be evenly applied on thin film to be imprinted；
Eindruckwerk, after being positioned at coating mechanism, is provided with the pressure roller compressed above and below the template roller of pattern to be transferred, at least two and template roller including a top layer；Two groups of thin film to be imprinted pass between pressure roller and template roller respectively, thus by imprint patterns on the polymeric material being positioned on thin film to be imprinted；
Curing mechanism, is positioned at above eindruckwerk, makes the polymeric material solidified forming above template roller；Wherein,
It is positioned at the feed roller/material receiving roller of the lower section of eindruckwerk, liquid polymer to be imprinted is delivered to eindruckwerk, and carries away remnant layer polymer；It is positioned at the feed roller/material receiving roller of the top of eindruckwerk, for receiving the shaping solidification polymer on eindruckwerk；Ensure that the pattern obtained retains without remnant layer.
Described transmission mechanism also includes help roll, and help roll is often being organized between feed roller and material receiving roller and compressed above and below template roller, often organizes thin film to be imprinted for tensioning.
Described coating mechanism, the some glue speed of point gum machine is controlled, and the contact pressure between anilox roll and lining roller is controlled, to realize manipulating the polymer thickness of coating.
Described curing mechanism is thermal source, for the nano impression of thermoset copolymer material.
Described curing mechanism is ultraviolet source, for the nano impression of ultraviolet photoresist polymeric material.
In this utility model running, stamping structure is arranged above curing mechanism, and lower section is not affected by curing mechanism；Below template roller, polymer becomes liquid always, and when thin film separates with template roller, polymer is torn, and remnant layer polymer advances with thin film, and remaining polymer is just completely filled with template roller pattern；Complete below template roller the polymer that remnant layer peels off rotate to above time, the curing molding by the effect of curing mechanism, when template roller and top thin film separation, the polymer of curing molding is followed thin film completely and is advanced, and obtains the pattern without remnant layer.
This utility model provides the benefit that:
The technology that this utility model application volume to volume is continuous embossed, compared with stamping technique direct with tradition, greatly improves production efficiency, reduces production cost；Additionally, this utility model can solve to control present in common volume to volume stamping technique the difficulty of remnant layer thickness；Therefore this utility model can carry out shifting without remnant layer nanoscale patterns continuously, efficiently.This utility model is applied in the production of optics, the precision of components and parts, transmittance can be effectively improved, reduce deviation.
Accompanying drawing explanation
Fig. 1 is overall structure schematic diagram of the present utility model；
Fig. 2 position workflow diagram of the present utility model.
In figure: 1,10 is feed roller；2 is point gum machine；3 is anilox roll；4 is lining roller；5,8,11,14 is help roll；6,13 is pressure roller；7 is template roller；9,15 is material receiving roller；12 is curing mechanism.
Detailed description of the invention
Below in conjunction with the accompanying drawings, the utility model is described in further detail.
This utility model provides a kind of volume to volume nano-imprinting apparatus without remnant layer, and its overall structure sees Fig. 1, including: transmission mechanism, coating mechanism, eindruckwerk, curing mechanism.
Described transmission mechanism includes two groups of feed roller/material receiving rollers and corresponding help roll；Feed roller 1 and material receiving roller 9 coordinate, and liquid polymer to be imprinted is delivered to below template roller 7 embossed region and reclaims remnant layer polymer；Feed roller 10 and material receiving roller 15 coordinate, with template roller 7 above curing area compress, receive the cured polymer without remnant layer.
This transmission mechanism also includes help roll 5,8,11,14, lays respectively on whole transmission route, and these help rolls ensure that thin film remains tensioning state in whole technological process.Described coating mechanism includes that point gum machine 2, anilox roll 3 and lining roller 4, anilox roll 3 and lining roller 4 mating reaction make the liquid polymer of output in point gum machine 2 be evenly applied on thin film；By controlling the some glue speed of point gum machine 2, the pressure between anilox roll 3 and lining roller 4, the polymer thickness of coating can be regulated.
After described eindruckwerk is positioned at coating mechanism, including template roller 7, pressure roller 6,13, template roller 7 outer layer is pattern to be transferred；Template roller 7 rotates counterclockwise, and under the cooperation of pressure roller 6, is in close contact with lower section polymer and makes polymer be full of pattern, and when near help roll 8, remnant layer polymer is stripped and advances with thin film, the remaining pattern being just full of；Template roller 7 curing area up, and pressure roller 13 coordinates and top film compression, now polymer be just full of pattern without remaining and under the effect of curing mechanism 12 curing molding, subsequently without the shaped polymer of remnant layer with the advance of top thin film.
Described polymer can use thermoset copolymer material, it would however also be possible to employ ultraviolet photoresist polymeric material.
Described curing mechanism 12 is thermal source when using thermoset copolymer material；It is ultraviolet source when using ultraviolet photoresist polymeric material.
Workflow of the present utility model sees Fig. 2；Feed roller 1 carries thin film to coating mechanism, and coating mechanism the most uniformly coats liquid polymer；Liquid polymer is in close contact formation pattern at eindruckwerk and template roller, and polymer is separated into two parts therewith, and residual polymer moves on thin film until being reclaimed by material receiving roller 9, and another part is just filled up completely with the pattern on template roller；When suitable when, feed roller 10 carries thin film and is in close contact to eindruckwerk, the polymer that template roller shapes and thin film, and curing mechanism 12 makes polymer solidify, it is subsequently cured shaped polymer to be fully adhered on thin film, follows thin film and be advanced until and received by material receiving roller 15.
In sum, a kind of volume to volume nano-imprinting apparatus without remnant layer that the utility model proposes, can realize continuously, at a high speed, nano graph cheap, high-resolution transfer, the most prominent is remnant layer that this utility model can synchronize to dispel in moulding process, it is achieved the pattern without remnant layer shifts.Therefore, this utility model not only increases the production efficiency of nano-imprint process, also substantially increases the quality of impressing product.
Described above it is merely exemplary for this utility model; and it is nonrestrictive; the understanding of those of ordinary skill in the art; in the case of the spirit and scope limited without departing from claim; change can be made according to the disclosure above content, modify or equivalence, but fall within protection domain of the present utility model.
Claims (5)
1. one kind without remnant layer volume to volume nano-imprinting apparatus, it is characterised in that this nano-imprinting apparatus includes:
Transmission mechanism, including two groups of feed roller/material receiving rollers, one of which is positioned at the lower section of another group；Often organize on feed roller/material receiving roller
All it is wound with one group of thin film to be imprinted；Two groups of thin film reverse transfer to be imprinted；This transmission mechanism in order to control material to be imprinted along
Specific direction, with specific speed transmit；
Coating mechanism, after being positioned at lower section feed roller, including point gum machine, anilox roll and lining roller；Before point gum machine is positioned at anilox roll
Top, exports liquid polymer to anilox roll；Anilox roll and lining roller are in arranging mutually extruding up and down, middle by passing from feed roller
The thin film to be imprinted come, the two mating reaction makes the liquid polymer to be imprinted of output in point gum machine be evenly applied to thin film to be imprinted
On；
Eindruckwerk, after being positioned at coating mechanism, including a top layer be provided with the template roller of pattern to be transferred, at least two with
The pressure roller compressed above and below template roller；Two groups of thin film to be imprinted pass between pressure roller and template roller respectively, thus will figure
Case is stamped on the polymeric material being positioned on thin film to be imprinted；
Curing mechanism, is positioned at above eindruckwerk, makes the polymeric material solidified forming above template roller；Wherein,
It is positioned at the feed roller/material receiving roller of the lower section of eindruckwerk, liquid polymer thing to be imprinted is delivered to eindruckwerk, and carries away
Remnant layer polymer；It is positioned at the feed roller/material receiving roller of the top of eindruckwerk, for receiving the shaping solidification polymerization on eindruckwerk
Thing；Ensure that the pattern obtained retains without remnant layer.
2. as claimed in claim 1 without remnant layer volume to volume nano-imprinting apparatus, it is characterised in that: described transmission mechanism also wraps
Including help roll, help roll is often being organized between feed roller and material receiving roller and is being compressed above and below template roller, every for tensioning
Organize thin film to be imprinted.
3. as claimed in claim 1 without remnant layer volume to volume nano-imprinting apparatus, it is characterised in that: described coating mechanism, point
The point glue speed of glue machine is controlled, and the contact pressure between anilox roll and lining roller is controlled, to realize carrying out the polymer thickness of coating
Manipulation.
4. the nano-imprinting apparatus of volume to volume without remnant layer as described in any one of claims 1 to 3, it is characterised in that: described solid
Change mechanism is thermal source, for the nano impression of thermoset copolymer material.
5. the nano-imprinting apparatus of volume to volume without remnant layer as described in any one of claims 1 to 3, it is characterised in that: described solid
Change mechanism is ultraviolet source, for the nano impression of ultraviolet photoresist polymeric material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620273593.3U CN205485275U (en) | 2016-04-05 | 2016-04-05 | Volume to volume nanometer impression equipment that does not have remaining layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620273593.3U CN205485275U (en) | 2016-04-05 | 2016-04-05 | Volume to volume nanometer impression equipment that does not have remaining layer |
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| CN205485275U true CN205485275U (en) | 2016-08-17 |
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| CN201620273593.3U Expired - Fee Related CN205485275U (en) | 2016-04-05 | 2016-04-05 | Volume to volume nanometer impression equipment that does not have remaining layer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107863492A (en) * | 2017-12-19 | 2018-03-30 | 武汉船用电力推进装置研究所（中国船舶重工集团公司第七二研究所） | A kind of preparation method and coating unit of ultrathin composite lithium anode |
-
2016
- 2016-04-05 CN CN201620273593.3U patent/CN205485275U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107863492A (en) * | 2017-12-19 | 2018-03-30 | 武汉船用电力推进装置研究所（中国船舶重工集团公司第七二研究所） | A kind of preparation method and coating unit of ultrathin composite lithium anode |
| CN107863492B (en) * | 2017-12-19 | 2020-08-25 | 武汉船用电力推进装置研究所（中国船舶重工集团公司第七一二研究所） | Preparation method of ultrathin composite metal lithium cathode |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160817 Termination date: 20170405 |
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| CF01 | Termination of patent right due to non-payment of annual fee |