CN204865533U - Gas treating system - Google Patents
Gas treating system Download PDFInfo
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- CN204865533U CN204865533U CN201520534632.6U CN201520534632U CN204865533U CN 204865533 U CN204865533 U CN 204865533U CN 201520534632 U CN201520534632 U CN 201520534632U CN 204865533 U CN204865533 U CN 204865533U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
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Abstract
The utility model relates to a gas treating system. This gas treating system includes: be used for producing the low temperature plasma device of active particle, have the air inlet, be used for adsorbing the adsorption equipment of processing to gas, adsorption equipment passes through the pipeline with the low temperature plasma device and links to each other, be used for carrying out oxidation treatment and absorbing the biological oxidation absorbing device who handles gas, biological oxidation absorbing device passes through the pipeline with adsorption equipment and links to each other, and biological oxidation absorbing device has the gas outlet, wherein, the gas of treating the purification is through air inlet entering low temperature plasma device, more in proper order through adsorption equipment and biological oxidation absorbing device to discharge in the gas outlet. Above -mentioned gas treating system has better purifying effect and has that the running cost is lower, easy to carry out, is difficult for causing advantage such as secondary pollution.
Description
Technical field
The utility model relates to field of environment engineering technology, particularly relates to a kind of gas purge system.
Background technology
The regions such as sewage treatment plant, sewage pumping station, refuse landfill, garbage transfer station can produce a large amount of foul smell in the running, pollute air.
At present absorption method, absorption process (comprising the absorption plant of water-soluble gas and the absorption plant to water-insoluble gas), Production by Catalytic Combustion Process, biological method and plasma technology etc. are mainly contained to the processing method of foul smell.These methods can remove foul smell to a certain extent, reach the object of Purge gas, but when embody rule, have that operating cost is high, clean-up effect is not ideal enough, not easily implement, easily cause secondary pollution problems.
Such as, for absorption method, because the adsorption capacity of adsorbent is limited, operating cost is high, and adsorbent reactivation process easily causes secondary pollution to environment.For absorption process, this method is relatively simple, but easily causes secondary pollution.For Production by Catalytic Combustion Process, be applicable to and the process of incendive foul smell larger containing concentration, investment and operating cost higher.For biological method, filter out the microorganism fungus kind difficulty with efficient and applicable specific foul smell comparatively large, the time cycle is very long.
Utility model content
Based on this, be necessary to provide that a kind of to have better clean-up effect, operating cost lower, easy to implement and not easily cause the gas purge system of secondary pollution.
A kind of gas purge system, comprising:
For generation of the low-temperature plasma device of active particle, there is air inlet;
For carrying out the adsorbent equipment of adsorption treatment to gas, described adsorbent equipment is connected by pipeline with described low-temperature plasma device; And
For carrying out oxidation processes to gas and absorbing the biological oxidation absorption plant processed, described biological oxidation absorption plant is connected by pipeline with described adsorbent equipment, and described biological oxidation absorption plant has gas outlet;
Wherein, gas to be clean enters described low-temperature plasma device through described air inlet, more successively through described adsorbent equipment and described biological oxidation absorption plant, and discharge in described gas outlet.
Wherein in an embodiment, described gas purge system also comprises gas and water separator, and described gas and water separator is connected with described air inlet, and wherein, gas to be clean enters described air inlet through described gas and water separator.
Wherein in an embodiment, described gas purge system also comprises at least one in following feature:
Described gas purge system also comprises air-introduced machine and discharge blower fan, and described air-introduced machine is connected with described gas and water separator, and described discharge blower fan is connected with described gas outlet; And
Described gas and water separator is moisture trap or freezing type drier.
Wherein in an embodiment, described adsorbent equipment is activated-carbon device.
Wherein in an embodiment, described active particle comprises hydroxyl radical free radical, negative oxygen ion, ozone and hydroperoxyl radical, and wherein, the concentration of the ozone from the gas that described adsorbent equipment exports is less than or equal to 5ppm.
Wherein in an embodiment, described low-temperature plasma device comprises low temperature plasma generation cavity, pole plate, power supply, automatic commutator and controller, described pole plate is located in described low temperature plasma generation cavity, described power supply is electrically connected with described pole plate, for powering to described pole plate, described automatic commutator is connected with described power electric, for carrying out both positive and negative polarity commutation to described pole plate, described controller is electrically connected with described automatic commutator, is used to indicate described automatic commutator work.
Wherein in an embodiment, described pole plate indentation, described pole plate is graphite electrode plate.
Wherein in an embodiment, described power supply is direct current mixing power supply, described direct current mixing power supply can export the electric current of three quefrencys, is respectively low-frequency current, electric current of intermediate frequency source and high frequency electric, wherein, the frequency of described low-frequency current is 300 ~ 1000Hz, voltage is 20 ~ 200V, and the frequency of described electric current of intermediate frequency is 1000 ~ 5000Hz, and voltage is 20 ~ 300V, the frequency of described high frequency electric is 5000 ~ 57000Hz, and voltage is 20 ~ 400V.
Wherein in an embodiment, described biological oxidation absorption plant comprises tower body and spray assemblies;
Described tower body is connected by pipeline with described adsorbent equipment, and described gas outlet is arranged on described tower body, is provided with the packing layer for microorganism colonization in described tower body;
Described spray assemblies comprises water tank and spray thrower; Described water tank is located at outside described tower body, and described water tank is used for taking up spray liquid; Described spray thrower is located in described tower body, and described spray thrower is connected by pipeline with described water tank, for the spray liquid taken up in described water tank is sprayed to described packing layer;
Wherein, the gas entered in described tower body passes described packing layer, processes, then discharge from described gas outlet to carry out oxidation processes with absorption.
Wherein in an embodiment, described spray assemblies also comprises water pump, described water pump is positioned at outside described tower body, and described water pump is connected with described tower body by pipeline, described water pump is connected with described water tank by pipeline, and described water pump is used for will in the Liquid transfer that be deposited in described tower body to described water tank.
The active particle that low-temperature plasma device produces changes the chemical property of foul smell, toxic and harmful by modes such as oxidation, chain rupture and decomposition, makes the gas molecule being difficult to purify be transformed into easy-to-handle material.Such as, by H
2the reducibility gas such as S are oxidized to SO
3etc. the material being easy to be only absorbed by the water; The phenyl ring of gas containing phenyl ring is opened, connects oxygen atom, and then under the collision, oxidation of active particle, resolve into that molecular weight is little, toxicity is little, the material of water-soluble increase.
The operation principle of low-temperature plasma device determines it and has the features such as versatility, purification object be extensive, but is in a dynamic process when its operation principle also determines its Purge gas simultaneously, there is unstable situation.Gas through low-temperature plasma device process is proceeded to biological oxidation absorption plant, can be oxidized further it by the decomposition of microorganism, arrive the object of further purification.
And the ozone usually containing larger concentration in the active particle that low-temperature plasma device produces, and ozone has sterilization functions, can by the microorganism killing in biological oxidation absorption plant.The adsorbent equipment be located between low-temperature plasma device and biological oxidation absorption plant effectively can eliminate unreacted active particle completely, to control the concentration of the active particle entered in the gas in biological oxidation absorption plant.Meanwhile, adsorbent equipment has certain effect in Purge gas.
Above-mentioned gas cleaning system, when Purge gas, adopts low-temperature plasma device, adsorbent equipment and biological oxidation absorption plant to purify gas successively.Three kinds of purifiers coordinate, thus make above-mentioned gas cleaning system have better clean-up effect relative to traditional gas purge system.And above-mentioned gas cleaning system also to have operating cost lower, easy to implement and not easily cause the advantages such as secondary pollution.
Accompanying drawing explanation
Fig. 1 is the structural representation of the gas purge system of an embodiment;
Fig. 2 is the flow chart of the method for this gas purge system Purge gas of employing of an embodiment.
Detailed description of the invention
For the ease of understanding the utility model, below with reference to relevant drawings to gas purge system of the present utility model and adopt the method for this gas purge system Purge gas to be described more fully.Preferred embodiment of the present utility model is given in accompanying drawing.But the utility model can realize with multiple different form, is not limited to embodiment described herein.On the contrary, provide the object of these embodiments be make the understanding of disclosure of the present utility model more comprehensively thorough.
It should be noted that, when element is called as " being fixed on " another element, directly can there is element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may there is centering elements simultaneously.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present utility model understand usually.The object of the term used in description of the present utility model herein just in order to describe specific embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise arbitrary and all combinations of one or more relevant Listed Items.
As shown in Figure 1, the gas purge system 10 of an embodiment, comprises air-introduced machine 100, gas and water separator 200, low-temperature plasma device 300, adsorbent equipment 400, biological oxidation absorption plant 500 and discharge blower fan 600.
Air-introduced machine 100 is connected with gas and water separator 200, for being introduced into gas to be clean in gas and water separator 200.Concrete, air-introduced machine 100 is connected by pipeline with gas and water separator 200.
Gas and water separator 200 is connected with the air inlet of low-temperature plasma device 300, for being introduced in low-temperature plasma device 300 by the gas after gas and water separator 200 processes.Concrete, gas and water separator 200 is connected by pipeline with the air inlet of low-temperature plasma device 300.
Gas and water separator 200 can be moisture trap or freezing type drier.
Wherein, (1) gas-liquid separator is commonly called as oil water separator again, the equipment isolating droplet or drop from gas, also can isolate the particle of solid from gas while precipitation of liquid droplets, the gas after being separated is made to become anhydrous, dustless gas, play the effect of Purge gas, also can withdrawal liquid, play the effect of Product recycling.The major technique of gas-liquid separator is centrifugal separation technology, gas is different from the density of liquid, liquid together with gas and vapor permeation whirlwind flowing time, the centrifugal force that liquid is subject to is greater than gas, liquid has the tendency of centrifugation, final liquid is attached to and is separated on wall, and pools together downwards in the effect of gravity, then is discharged by delivery pipe.In other words, gas is when rotating, and drop trickle in gas phase is thrown on wall by import high velocity air, collision rift lose kinetic energy and with turn to gas separaion.
Concrete, in the present embodiment, separator parameter is: 1. separation accuracy: 20 ~ 0.01 microns; 2. separative efficiency: 90 ~ 100%; 3. initial drop: 1 ~ 30Kpa; 4. operating pressure: 0.01 ~ 45.0MPa; 5. operating temperature :-100 ~ 300 DEG C.
(2) freezing type drier has used physical principle, and the moisture in compressed air is refrigerated to below dew point, makes it the dried-air drier of separating out from air.Be limited to the freezing point temperature of water, its dew-point temperature can close to 0 degree in theory, actual conditions, and good freeze drier dew-point temperature is generally at about 5 degree.In the present embodiment, normal temperature air inlet type is adopted, intake air temperature 40 DEG C, admission pressure 0.1 ~ 0.3Mpa.
Under general condition, moisture trap operating cost is lower, and freezing type drier operating cost is higher.In the present embodiment, gas and water separator 200 is preferably moisture trap.Gas and water separator 200 also comprises collector 210, is provided with discharging tube (not shown) bottom gas and water separator 200, and the free end of discharging tube is positioned at collector 210.
In the present embodiment, gas to be clean is foul smell.Gas source to be clean is in sewage treatment plant, sewage pumping station, refuse landfill or garbage transfer station, and wherein, foul smell mainly comprises H
2s, CH
3sH, (CH
3)
2s, (CH
3)
2s
2and NH
3.Because these places can not arrange special exhaust gas centralized feed channel usually, therefore, the flow velocity of the gas entered in low-temperature plasma device 300 can be controlled by arranging air-introduced machine 100, thus adjust processing time or the reaction time of each device, and then gas purge system 10 is made to have good clean-up effect.Be appreciated that in other embodiments, gas purge system 10 also can be used for processing the waste gas produced in the production process such as doctorization, petrochemical industry.Owing to usually can arrange special exhaust gas centralized feed channel in the production process such as doctorization, petrochemical industry, now, air-introduced machine 100 can be default.
The particle of the trickle drop in gas to be clean and solid can remove by gas and water separator 200 in advance, make the gas that gas to be clean becomes anhydrous, dustless, thus the operating efficiency of the active particle in follow-up low-temperature plasma device 300 can be improved.Be appreciated that in other embodiments, when the trickle drop in gas to be clean and the particle of solid can be ignored, gas and water separator 200 can be default.
Flow velocity is slower, and the reaction time is longer, and more fully, the clean-up effect of low-temperature plasma device 300 is better.But flow velocity is excessively slow, the speed of Purge gas can be caused excessively slow, actual application requirement can not be met.In the present embodiment, the flow velocity controlling the gas entered in low-temperature plasma device 300 is 6m/s ~ 12m/s, is preferably 8m/s.
Low-temperature plasma device 300, for generation of active particle, has air inlet (not shown), and gas to be clean enters low-temperature plasma device 300 through air inlet.Wherein, active ion can carry out oxidation processes, chain rupture process and resolution process to gas to be clean.The active particle that low-temperature plasma device 300 produces changes the chemical property of foul smell, toxic and harmful by modes such as oxidation, chain rupture and decomposition, makes the gas molecule being difficult to purify be transformed into easy-to-handle material.Such as, by H
2the reducibility gas such as S are oxidized to SO
3etc. the material being easy to be only absorbed by the water.The phenyl ring of gas containing phenyl ring is opened, connects oxygen atom, and then under the collision, oxidation of active particle, resolve into that molecular weight is little, toxicity is little, the material of water-soluble increase.
In the present embodiment, low-temperature plasma device 300 comprises low temperature plasma generation cavity (not shown), pole plate (not shown), power supply (not shown), automatic commutator (not shown) and controller (not shown).Pole plate is located in low temperature plasma generation cavity.Power supply is electrically connected with pole plate, for powering to pole plate.Automatic commutator is connected with power electric, for carrying out both positive and negative polarity commutation according to certain frequency to pole plate.Controller is electrically connected with automatic commutator, is used to indicate automatic commutator work.Concrete, in the present embodiment, controller is electrically connected with automatic commutator by contactor.
Further, in the present embodiment, pole plate indentation, pole plate adopts conductive metal material or inactive, conductive material to make.
Further, in the present embodiment, gas to be clean has corrosivity, and the pole plate adopting inactive, conductive material to make has longer service life.Concrete, in the present embodiment, pole plate is graphite electrode plate.
Further, in the present embodiment, power supply is direct current mixing power supply, and direct current mixing power supply can export the electric current of three quefrencys, is respectively low-frequency current, electric current of intermediate frequency source and high frequency electric.Wherein, the frequency of low-frequency current is 300 ~ 1000Hz, and voltage is 20 ~ 200V; The frequency of electric current of intermediate frequency is 1000 ~ 5000Hz, and voltage is 20 ~ 300V; The frequency of high frequency electric is 5000 ~ 57000Hz, and voltage is 20 ~ 400V.
Further, in the present embodiment, controller is single-chip microcomputer.Be appreciated that controller also can be programmable controller (PLC).
When above-mentioned low-temperature plasma device 300 works, pole plate produces high energy electron (1 ~ 10eV).Under the effect of electric field, high energy electron collides other molecule (O
2and H
2o) produce hydroxyl radical free radical, negative oxygen ion, ozone and hydroperoxyl radical, key reaction process comprises:
e+O
2→O(3P)+O(3P)+e
e+H
2O→OH·+H·+e
O
2+(H
2O)+H
2O→HO
3 ++O
2+OH·
Adsorbent equipment 400 is connected by pipeline with low-temperature plasma device 300, for carrying out adsorption treatment to gas.Adsorbent equipment 400 can adsorb foul smell, active particle etc., removes the foul smell in gas to be clean further, reduces the concentration of the active particle the gas exported from adsorbent equipment 400 simultaneously.And when gas flow is through pipeline between adsorbent equipment 400 and low-temperature plasma device 300, active particle can continue to purify gas.
In the present embodiment, active particle comprises hydroxyl radical free radical, negative oxygen ion, ozone and hydroperoxyl radical.Because the work influence of concentration to biological oxidation absorption plant 500 entering the ozone in biological oxidation absorption plant 500 is larger.In the present embodiment, adsorbent equipment 400 can adsorb foul smell, active particle etc., to make to be less than or equal to 5ppm from the concentration of the ozone the gas of adsorbent equipment 400 output, thus the impact of ozone on the microorganism in biological oxidation absorption plant 500 can be ignored.
Low-temperature plasma device 300 under different conditions, there is certain difference in the ratio of the hydroxyl radical free radical produced, negative oxygen ion, ozone and hydroperoxyl radical, and hydroxyl radical free radical, negative oxygen ion, ozone and hydroperoxyl radical isoreactivity particle and foul smell are when reacting, the ratio of consumption also can there are differences.Therefore, the concentration of the ozone in the gas of discharging from low-temperature plasma device 300 is in dynamic range.Therefore, in actual process, the volume size of adsorbent equipment 400, need to obtain according to concrete technology debugging by charcoal amount etc.And in the present embodiment, low-temperature plasma device 300 coordinates with adsorbent equipment 400, the concentration of the ozone entered in the gas in biological oxidation absorption plant 500 can be made to be less than or equal to 5ppm.
Further, in the present embodiment, adsorbent equipment 400 is activated-carbon device.Adsorbent equipment 400 comprises adsorption tanks and is filled in the active carbon in adsorption tanks.Active carbon can be Alveolate activated carbon capable, granular active carbon or NACF.
Biological oxidation absorption plant 500 is connected by pipeline with adsorbent equipment 400, and it has gas outlet (not shown), processes with absorption for carrying out oxidation processes to gas.Purified gas is discharged through gas outlet.
In the present embodiment, biological oxidation absorption plant 500 comprises tower body 510 and spray assemblies 520.
Tower body 510 is connected by pipeline with adsorbent equipment 400, and gas outlet is arranged on tower body 510, is provided with the packing layer (not shown) for microorganism colonization, forms microbial film to make microorganism on packing layer in tower body 510.
Spray assemblies 520 comprises spray thrower 522, water tank 524, water pump (not shown) and pH meter (not shown).Spray thrower 522 is located in tower body 510 (on the inwall at tower body 510 top), and water tank 524 is located at outside tower body 510, for taking up spray liquid.And spray thrower 522 is connected by pipeline with water tank 524, for the spray liquid of splendid attire in water tank 524 is sprayed to packing layer.The gas entered in tower body 510 passes packing layer, processes, then discharge from the gas outlet of biological oxidation absorption plant 500 to carry out being oxidized and to absorb.Wherein, microorganism carries out oxidation processes to the gas entered in tower body 510, and to be adsorbed on packing layer spray liquid to the gas entered in tower body 510 and to carry out absorption process, will by H
2the SO that the Substance Transformations such as S obtain
2, SO
3absorb Deng solable matter.
Water pump is positioned at outside tower body 510, and water pump is connected with tower body 510 by pipeline, and water pump is connected with water tank 524 by pipeline, water pump be used for will the Liquid transfer that be deposited in tower body 510 in water tank 524.Water tank 524 forms a water circulation system by water pump and tower body 510, thus the spray liquid in water tank 524 can be made to obtain utilizing the most fully, reduces gas purification cost.Be appreciated that in other embodiments, water pump can be default.
Sulfide in gas to be clean finally can be converted into sulfate ion, thus makes the liquid be deposited in tower body 510 be acid, and then makes the spray liquid in water tank 524 in acid.In order to make microorganism, there is good living environment and prevent biological oxidation absorption plant 500 by acid corrosion, in the present embodiment, in water tank 524, being provided with pH meter (not shown).PH meter is for detecting the pH value of the spray liquid of splendid attire in water tank 524.
Because the place such as sewage treatment plant, sewage pumping station is typically provided with second pond.Purify waste water treatment plant, sewage pumping station etc. place produce foul smell time, can directly with second pond as the water tank 524 in gas purge system 10.A water tank 524 also can be provided, and make it be connected by pipeline with second pond, be supplied water to it by second pond.In the present embodiment, microorganism is oxygen consumption microorganism, and the COD (ChemicalOxygenDemand, COD) of the water in second pond needs to be more than or equal to 500mg/L.
Do not having in second pond situation, such as, when the foul smell that disposal of refuse landfill yard or garbage transfer station produce, can splendid attire mass fraction be the glucose solution of 5% ~ 20% in water tank 524.Now, can also nutrition adder (not shown) be set on water tank 524.When being loaded with clear water in water tank 524, in water tank 524, add quantitative glucose by nutrition adder, to obtain the glucose solution that mass fraction is 5% ~ 20%.
When the pH value of the spray liquid in water tank 524 is less than 6, change the spray liquid (remove the spray liquid in water tank 524, then add new spray liquid in water tank 524) in water tank 524.Dispose of sewage in the process of foul smell that treatment plant or sewage pumping station produce in gas purge system 10, when the pH value of the spray liquid in water tank 524 is less than 6, spray liquid in water tank 524 all can be delivered to sewage disposal system front end, through sewage disposal system process.Then supplement water inlet from second pond, or prepare with clear water and glucose the glucose solution that mass fraction is 5% ~ 20%.
Further, in the present embodiment, biological oxidation absorption plant 500 also comprises thermoregulator and temperature detector.The outside of tower body 510 is located at by thermoregulator, and is installed on tower body 510, and thermoregulator is for regulating the temperature in tower body 510.Temperature detector is located in tower body 510, for detecting the temperature in tower body 510.When the temperature in tower body 510 is not within the scope of the optimum growth temp of microorganism, serviceability temperature adjuster regulates the temperature in tower body 510.
Discharge blower fan 600 is arranged at the gas outlet place of biological oxidation absorption plant 500.Discharge blower fan 600 coordinates with air-introduced machine 100 flow velocity controlling the gas entered in gas purge system 10, thus adjusts processing time or the reaction time of each device.
As shown in Figure 2, in the present embodiment, a kind of method adopting above-mentioned gas cleaning system Purge gas is also provided, comprises the steps:
Step S610, is introduced into gas to be clean in low-temperature plasma device through air inlet.
In the present embodiment, gas source to be clean is in sewage treatment plant, sewage pumping station, refuse landfill or garbage transfer station.Gas to be clean is introduced in low-temperature plasma device by air-introduced machine.Low-temperature plasma device is for generation of active particle, and active particle comprises hydroxyl radical free radical, negative oxygen ion, ozone and hydrogen base free radical etc.Active particle is utilized to carry out oxidation processes, chain rupture process and resolution process to gas to be clean.
When in gas to be clean, the concentration of moisture is larger, before gas to be clean is introduced into low-temperature plasma device, also comprise, by air-introduced machine, gas to be clean is introduced into gas and water separator, introduce again in low-temperature plasma device after gas and water separator process, to avoid moisture on the impact of the start of low-temperature plasma device.
Step S620, is introduced into the gas exported from low-temperature plasma device in adsorbent equipment.
Adsorbent equipment is used for carrying out adsorption treatment to gas.Adsorbent equipment can adsorb foul smell, active particle etc., removes the foul smell in gas to be clean further, reduces the concentration of the active particle the gas exported from adsorbent equipment simultaneously.In the present embodiment, adsorbent equipment controls to be less than or equal to 5ppm from the concentration of the ozone the gas of adsorbent equipment output.Adsorbent equipment is activated-carbon device.
Step S630, is introduced into the gas exported from adsorbent equipment in biological oxidation absorption plant.
In the present embodiment, biological oxidation absorption plant comprises tower body and spray assemblies.Tower body is connected by pipeline with adsorbent equipment, and gas outlet is arranged on tower body, is provided with the packing layer for microorganism colonization in tower body.Spray assemblies comprises water tank, spray thrower, water pump and pH meter.Water tank is located at outside tower body, and water tank is used for taking up spray liquid.Spray thrower is located in tower body, and spray thrower is connected by pipeline with water tank, for the spray liquid taken up in water tank is sprayed to packing layer.Water pump is positioned at outside tower body, and water pump is connected with tower body by pipeline, and water pump is connected with water tank by pipeline, water pump be used for will the Liquid transfer that be deposited in tower body in water tank.PH meter is installed in water tank, for detecting the pH value of the spray liquid taken up in water tank.
Packing layer is formed with microbial film.In the present embodiment, microorganism is oxygen consumption microorganism.
Taken up spray liquid in water tank, spray liquid to be mass fraction be 5% ~ 20% glucose solution or second pond in solution, wherein, the COD of the solution in second pond is more than or equal to 500mg/L.
The spray mode of spray thrower is batch (-type), and the spray parameter of spray thrower is: sprayed 3 ~ 10 minutes every 1 hour, spraying intensity is 300 ~ 1000 ls/h.
When the pH value of the liquid in water tank is less than 6, change the spray liquid in water tank.
Step S640, discharges the gas exported from biological oxidation absorption plant through gas outlet.
In the present embodiment, the gas exported from biological oxidation absorption plant is discharged by discharge blower fan, directly enters in air.Be appreciated that in other enforcement sides, also the gas exported from biological oxidation absorption plant can be entered in gas tank.
The operation principle of low-temperature plasma device 300 determines it and has the features such as versatility, purification object be extensive, but is in a dynamic process when its operation principle also determines its Purge gas simultaneously, there is unstable situation.The gas processed through low-temperature plasma device 300 is proceeded to biological oxidation absorption plant 500, can be oxidized further it by the decomposition of microorganism, arrive the object of further purification.
And the ozone usually containing larger concentration in the active particle that low-temperature plasma device 300 produces, and ozone has sterilization functions, can by the microorganism killing in biological oxidation absorption plant 500.The adsorbent equipment 400 be located between low-temperature plasma device 300 and biological oxidation absorption plant 500 effectively can eliminate unreacted active particle completely, to control the concentration of the active particle entered in the gas in biological oxidation absorption plant 500.Meanwhile, adsorbent equipment 400 has certain effect in Purge gas.
Above-mentioned gas cleaning system 10, when Purge gas, adopts low-temperature plasma device 300, adsorbent equipment 30 and biological oxidation absorption plant 500 pairs of gases to purify successively.Three kinds of purifiers coordinate, thus make above-mentioned gas cleaning system 10 have better clean-up effect relative to traditional gas purge system.And above-mentioned gas cleaning system 10 also to have operating cost lower, easy to implement and not easily cause the advantages such as secondary pollution.
Be below specific embodiment part:
(1) gas source to be clean is in airport Xin An six road, Bao'an, Shenzhen sewage pumping station, comprises H
2s, CH
3sH, (CH
3)
2s, (CH
3)
2s
2and NH
3etc. multiple foul smell.In the present embodiment, mainly H is monitored
2s and NH
3these two kinds of more typical foul smell.
(2) in low-temperature plasma device, gas to be clean is filled with flow velocity 8m/s.Wherein, the H in gas to be clean
2s and NH
3concentration be respectively 50mg/L and 20mg/L, detect H
2the instrument of S concentration is BWGasAlertQuattro four-in-one gas detecting instrument (QT-series), detects NH
3the instrument of concentration is BWGasAlertExtreme pure gas detector (GAXT-series, model: GAXT-A-DL, range: 0 ~ 100ppm).
(3) to insufflation gas in low-temperature plasma device after 10 minutes, detect the concentration of the ozone in the gas of adsorbent equipment output, wherein, the concentration of ozone is 3.5ppm, the instrument detecting ozone concentration is BWGasAlertExtreme pure gas detector (GAXT-series, model: GAXT-G-DL, range: 0 ~ 100ppm)
(4) temperature in biological oxidation absorption plant is 37 DEG C, packing layer is formed with oxygen consumption microbial film; Using second pond as water tank (COD is for 620mg/L), the spray parameter of spray thrower is: sprayed 5 minutes every 1 hour, spraying intensity 500 ls/h.
(5) gas at the air outlet place of discharge blower fan 600 is detected, wherein, H
2s and NH
3concentration be respectively 0.03mg/L and 0.9mg/L, detect H
2s and NH
3the instrument of concentration is the same.
By converting, H
2the relative clearance of S is 99.9%, NH
3relative clearance be 95.5%.
The above embodiment only have expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (10)
1. a gas purge system, is characterized in that, comprising:
For generation of the low-temperature plasma device of active particle, there is air inlet;
For carrying out the adsorbent equipment of adsorption treatment to gas, described adsorbent equipment is connected by pipeline with described low-temperature plasma device; And
For carrying out oxidation processes to gas and absorbing the biological oxidation absorption plant processed, described biological oxidation absorption plant is connected by pipeline with described adsorbent equipment, and described biological oxidation absorption plant has gas outlet;
Wherein, gas to be clean enters described low-temperature plasma device through described air inlet, more successively through described adsorbent equipment and described biological oxidation absorption plant, and discharge in described gas outlet.
2. gas purge system according to claim 1, it is characterized in that, described gas purge system also comprises gas and water separator, and described gas and water separator is connected with described air inlet, wherein, gas to be clean enters described air inlet through described gas and water separator.
3. gas purge system according to claim 2, is characterized in that, described gas purge system also comprises at least one in following feature:
Described gas purge system also comprises air-introduced machine and discharge blower fan, and described air-introduced machine is connected with described gas and water separator, and described discharge blower fan is connected with described gas outlet; And
Described gas and water separator is moisture trap or freezing type drier.
4. gas purge system according to claim 1, is characterized in that, described adsorbent equipment is activated-carbon device.
5. gas purge system according to claim 1, is characterized in that, described active particle comprises hydroxyl radical free radical, negative oxygen ion, ozone and hydroperoxyl radical, and wherein, the concentration of the ozone from the gas that described adsorbent equipment exports is less than or equal to 5ppm.
6. gas purge system according to claim 1, it is characterized in that, described low-temperature plasma device comprises low temperature plasma generation cavity, pole plate, power supply, automatic commutator and controller, described pole plate is located in described low temperature plasma generation cavity, described power supply is electrically connected with described pole plate, power for giving described pole plate, described automatic commutator is connected with described power electric, for carrying out both positive and negative polarity commutation to described pole plate, described controller is electrically connected with described automatic commutator, is used to indicate described automatic commutator work.
7. gas purge system according to claim 6, is characterized in that, described pole plate indentation, and described pole plate is graphite electrode plate.
8. gas purge system according to claim 6, it is characterized in that, described power supply is direct current mixing power supply, and described direct current mixing power supply can export the electric current of three quefrencys, be respectively low-frequency current, electric current of intermediate frequency source and high frequency electric, wherein, the frequency of described low-frequency current is 300 ~ 1000Hz, and voltage is 20 ~ 200V, the frequency of described electric current of intermediate frequency is 1000 ~ 5000Hz, voltage is 20 ~ 300V, and the frequency of described high frequency electric is 5000 ~ 57000Hz, and voltage is 20 ~ 400V.
9. gas purge system according to claim 1, is characterized in that, described biological oxidation absorption plant comprises tower body and spray assemblies;
Described tower body is connected by pipeline with described adsorbent equipment, and described gas outlet is arranged on described tower body, is provided with the packing layer for microorganism colonization in described tower body;
Described spray assemblies comprises water tank and spray thrower; Described water tank is located at outside described tower body, and described water tank is used for taking up spray liquid; Described spray thrower is located in described tower body, and described spray thrower is connected by pipeline with described water tank, for the spray liquid taken up in described water tank is sprayed to described packing layer;
Wherein, the gas entered in described tower body passes described packing layer, processes, then discharge from described gas outlet to carry out oxidation processes with absorption.
10. gas purge system according to claim 9, it is characterized in that, described spray assemblies also comprises water pump, described water pump is positioned at outside described tower body, and described water pump is connected with described tower body by pipeline, described water pump is connected with described water tank by pipeline, and described water pump is used for will in the Liquid transfer that be deposited in described tower body to described water tank.
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| CN201520534632.6U CN204865533U (en) | 2015-07-21 | 2015-07-21 | Gas treating system |
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| CN201520534632.6U CN204865533U (en) | 2015-07-21 | 2015-07-21 | Gas treating system |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105983291A (en) * | 2016-06-14 | 2016-10-05 | 江苏赛欧环保设备有限公司 | Waste gas treatment system of chemical sewage station |
| CN106268256A (en) * | 2016-08-30 | 2017-01-04 | 中山市禾钜金属制品有限公司 | A kind of industrial waste gas plasma treatment process |
| CN106310867A (en) * | 2016-08-17 | 2017-01-11 | 宁波大发化纤有限公司 | Device for treating vacuum calcining waste gas and treatment method |
| CN106362577A (en) * | 2015-07-21 | 2017-02-01 | 深圳市明鑫高分子技术有限公司 | Gas purification system and method for purifying gas by using gas purification system |
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2015
- 2015-07-21 CN CN201520534632.6U patent/CN204865533U/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106362577A (en) * | 2015-07-21 | 2017-02-01 | 深圳市明鑫高分子技术有限公司 | Gas purification system and method for purifying gas by using gas purification system |
| CN105983291A (en) * | 2016-06-14 | 2016-10-05 | 江苏赛欧环保设备有限公司 | Waste gas treatment system of chemical sewage station |
| CN106310867A (en) * | 2016-08-17 | 2017-01-11 | 宁波大发化纤有限公司 | Device for treating vacuum calcining waste gas and treatment method |
| CN106268256A (en) * | 2016-08-30 | 2017-01-04 | 中山市禾钜金属制品有限公司 | A kind of industrial waste gas plasma treatment process |
| CN106268256B (en) * | 2016-08-30 | 2019-01-11 | 中山市禾钜金属制品有限公司 | A kind of industrial waste gas plasma treatment process |
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