CN204747023U - LED wafer automatic cleaning machine - Google Patents
LED wafer automatic cleaning machine Download PDFInfo
- Publication number
- CN204747023U CN204747023U CN201520438098.9U CN201520438098U CN204747023U CN 204747023 U CN204747023 U CN 204747023U CN 201520438098 U CN201520438098 U CN 201520438098U CN 204747023 U CN204747023 U CN 204747023U
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- storehouse
- conveyer belt
- led wafer
- entrance
- outlet
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- 238000004140 cleaning Methods 0.000 title claims abstract description 62
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 73
- 229910052757 nitrogen Inorganic materials 0.000 claims description 42
- 239000000919 ceramic Substances 0.000 claims description 14
- 150000002829 nitrogen Chemical class 0.000 claims description 12
- 238000003491 array Methods 0.000 claims description 2
- 239000000969 carrier Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 3
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 1
- GBIHOLCMZGAKNG-UHFFFAOYSA-N flucythrinate Chemical compound C=1C=C(OC(F)F)C=CC=1C(C(C)C)C(=O)OC(C#N)C(C=1)=CC=CC=1OC1=CC=CC=C1 GBIHOLCMZGAKNG-UHFFFAOYSA-N 0.000 abstract 1
- 238000007517 polishing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The application discloses LED wafer automatic cleaning machine, its characterized in that includes: the feeding box, once wash storehouse, secondary and wash storehouse, the clean storehouse of nitrogen gas, feed back box, extracting jaw, pay -off and press from both sides and the conveyer belt. The utility model provides a traditional LED wafer factory after the chemical polishing process, take artifical clear mode, problem that inefficiency and yields are low.
Description
Technical field
The utility model relates to mechanical field, and specifically, the utility model relates to a kind of LED wafer automatic rinser.
Background technology
Light emitting diode (Light-EmittingDiode is called for short LED) is a kind of is the semi-conductor electronic device of luminous energy by electric energy conversion.
At present, the fast development of domestic LED chip industry, chip sale market trend is ripe, and chip rate of gross profit continues to drop, and how to promote brightness and to reduce costs the Main Means becoming improving product competitiveness.
, enhance productivity, a certain procedure that completes high-quality and efficient in the unit interval is also a kind of mode reduced costs, and replaces artificial poor efficiency operation to be the trend of the times of LED manufacturing with intelligent machine equipment meanwhile.
Tradition LED wafer factory is after chemical polishing operation, and take artificial clean mode, efficiency is low and yields is low.
How to solve the low and problem that yields is low of above-mentioned artificial clean LED wafer efficiency, just become technical problem urgently to be resolved hurrily.
Utility model content
The utility model relates to a kind of LED wafer automatic rinser, to solve traditional LED wafer factory after chemical polishing operation, takes artificial clean mode, the low and problem that yields is low of efficiency.
For solving the problems of the technologies described above, the utility model provides a kind of LED wafer automatic rinser, it is characterized in that, comprising: charging box, once clean storehouse, secondary cleaning storehouse, nitrogen cleans storehouse, feed back box, extracting jaw, feed clamp and conveyer belt, wherein,
Described charging box, is rectangular configuration, is provided with outlet, holds at least 1 LED wafer, and the getting on the right track of the outlet of this charging box and described conveyer belt is connected above position and is also provided with described extracting jaw;
Describedly once clean storehouse, for rotating cylinder shape, be provided with outlet and entrance, this once cleans in storehouse the hairbrush being provided with band shower nozzle, this entrance once cleaning storehouse is connected with getting on the right track of described conveyer belt, and this outlet of once cleaning storehouse is connected with the lower railway of described conveyer belt;
Described secondary cleaning storehouse, for rotating cylinder shape, be provided with outlet and entrance, in this secondary cleaning storehouse, be provided with the hairbrush of band shower nozzle, the entrance in this secondary cleaning storehouse is connected with getting on the right track of described conveyer belt, and the outlet in this secondary cleaning storehouse is connected with the lower railway of described conveyer belt;
Described nitrogen cleans storehouse, for rotating cylinder shape, be provided with outlet and entrance, this nitrogen cleans in storehouse and is provided with nitrogen gun, the entrance that this nitrogen cleans storehouse is connected with getting on the right track of described conveyer belt, and the outlet that this nitrogen cleans storehouse is connected with the lower railway of described conveyer belt;
Described feed back box, is rectangular configuration, is provided with entrance, holds at least 1 LED wafer carrier, and the entrance of this feed back box is connected with the lower railway of described conveyer belt above position and is also provided with described feed clamp;
Described conveyer belt, be made up of upper and lower two tracks, once clean storehouse, secondary cleaning storehouse and nitrogen described in described upper and lower two tracks are separately positioned on and clean both sides, storehouse, getting on the right track of described conveyer belt is connected with the outlet of described charging box, and the lower railway of described conveyer belt is connected with the entrance of described feed back box;
Described charging box, once clean storehouse, secondary cleaning storehouse, nitrogen cleans storehouse and feed back box arrays from left to right in two interorbitals up and down of described conveyer belt.
Further, wherein, be provided with at least 2 in described charging box to each other apart from identical plastic septum, in this charging box, hold the ceramic disk of at least 3 described LED wafer of carrying.
Further, wherein, be provided with at least 2 in described feed back box to each other apart from identical plastic septum, in this feed back box, hold at least 3 described LED wafer carriers.
Relative to the mode of artificial clean LED wafer of the prior art, advantage of the present utility model is:
(1) a kind of LED wafer automatic rinser described in the utility model, can save the human cost of cleaning process 2/3rds.As manufacturer produces 100,000 per month, monthly then can save human cost 30,000 yuan, LED wafer cleaning process yields improves 5%-15% simultaneously.
(2) a kind of LED wafer automatic rinser described in the utility model, clean replacement with machine automatization and clean manually, improve production efficiency, reduce production cost, efficiency is high and yields is high.
Accompanying drawing explanation
Accompanying drawing described herein is used to provide further understanding of the present application, and form a application's part, the schematic description and description of the application, for explaining the application, does not form the improper restriction to the application.In the accompanying drawings:
Fig. 1 is a kind of LED wafer automatic rinser structural representation described in the utility model.
Detailed description of the invention
As employed some vocabulary to censure specific components in the middle of description and claim.Those skilled in the art should understand, and hardware manufacturer may call same assembly with different noun.This specification and claims are not used as with the difference of title the mode distinguishing assembly, but are used as the criterion of differentiation with assembly difference functionally." comprising " as mentioned in the middle of description and claim is in the whole text an open language, therefore should be construed to " comprise but be not limited to "." roughly " refer to that in receivable error range, those skilled in the art can solve the technical problem within the scope of certain error, reach described technique effect substantially.In addition, " couple " word and comprise directly any and indirectly electric property coupling means at this.Therefore, if describe a first device in literary composition to be coupled to one second device, then represent described first device and directly can be electrically coupled to described second device, or be indirectly electrically coupled to described second device by other devices or the means that couple.Description subsequent descriptions is implement the better embodiment of the application, and right described description is for the purpose of the rule that the application is described, and is not used to the scope limiting the application.The protection domain of the application is when being as the criterion depending on the claims person of defining.
Below in conjunction with accompanying drawing, the application is described in further detail, but not as the restriction to the application.
Embodiment 1
As shown in Figure 1, be a kind of LED wafer automatic rinser described in the present embodiment 1, comprise: charging box 1, once cleaning storehouse 2, secondary cleaning storehouse 3, nitrogen clean storehouse 4, feed back box 5, extracting jaw 6, feed clamp 7 and conveyer belt 8, wherein,
Described charging box 1 is rectangular configuration, is provided with outlet 11, holds at least 1 LED wafer carrier, and the getting on the right track of the outlet 11 of this charging box 1 and described conveyer belt 8 is connected above position and is also provided with described extracting jaw 6;
Described once cleaning storehouse 2, for rotating cylinder shape, be provided with outlet 22 and entrance 21, this once cleans in storehouse 2 hairbrush being provided with band shower nozzle, this entrance 21 once cleaning storehouse 2 is connected with described getting on the right track of conveyer belt 8, and this outlet 22 of once cleaning storehouse 2 is connected with the lower railway of described conveyer belt 8;
Described secondary cleaning storehouse 3, for rotating cylinder shape, be provided with outlet 32 and entrance 31, the hairbrush of band shower nozzle is provided with in this secondary cleaning storehouse 3, the entrance 31 in this secondary cleaning storehouse 3 is connected with described getting on the right track of conveyer belt 8, and the outlet 32 in this secondary cleaning storehouse 3 is connected with the lower railway of described conveyer belt 8;
Described nitrogen cleans storehouse 4, for rotating cylinder shape, be provided with outlet 42 and entrance 41, this nitrogen cleans in storehouse 4 and is provided with nitrogen gun, the entrance 41 that this nitrogen cleans storehouse 4 is connected with described getting on the right track of conveyer belt 8, and the outlet 42 that this nitrogen cleans storehouse 4 is connected with the lower railway of described conveyer belt 8;
Described feed back box 5 is rectangular configuration, is provided with entrance 51, holds at least 1 LED wafer carrier, and the entrance 51 of this feed back box 5 is connected with the lower railway of described conveyer belt 8 above position and is also provided with described feed clamp 7;
Described conveyer belt 8, be made up of upper and lower two tracks, once clean storehouse 2, secondary cleaning storehouse 3 described in described upper and lower two tracks are separately positioned on and clean both sides, storehouse 4 with nitrogen, getting on the right track of described conveyer belt 8 is connected with the outlet 11 of described charging box 1, and the lower railway of described conveyer belt 8 is connected with the entrance 51 of described feed back box 5;
Described charging box 1, once cleaning storehouse 2, secondary cleaning storehouse 3, nitrogen clean storehouse 4 and array from left to right in two interorbitals up and down of described conveyer belt 8 with feed back box 5.
Embodiment 2
As shown in Figure 1, on the basis of embodiment 1, a kind of LED wafer automatic rinser described in the present embodiment 2, comprising: charging box 1, once cleaning storehouse 2, secondary cleaning storehouse 3, nitrogen clean storehouse 4, feed back box 5, extracting jaw 6, feed clamp 7 and conveyer belt 8, wherein,
Described charging box 1, for rectangular configuration, be provided with outlet 11, hold at least 1 LED wafer carrier, the getting on the right track of the outlet 11 of this charging box 1 and described conveyer belt 8 is connected above position and is also provided with described extracting jaw 6, further, be provided with at least 2 in described charging box 1 to each other apart from identical plastic septum, in this charging box 1, hold the ceramic disk of at least 3 described carrying LED wafer;
Described once cleaning storehouse 2, for rotating cylinder shape, be provided with outlet 22 and entrance 21, this once cleans in storehouse 2 hairbrush being provided with band shower nozzle, this entrance 21 once cleaning storehouse 2 is connected with described getting on the right track of conveyer belt 8, and this outlet 22 of once cleaning storehouse 2 is connected with the lower railway of described conveyer belt 8;
Described secondary cleaning storehouse 3, for rotating cylinder shape, be provided with outlet 32 and entrance 31, the hairbrush of band shower nozzle is provided with in this secondary cleaning storehouse 3, the entrance 31 in this secondary cleaning storehouse 3 is connected with described getting on the right track of conveyer belt 8, and the outlet 32 in this secondary cleaning storehouse 3 is connected with the lower railway of described conveyer belt 8;
Described nitrogen cleans storehouse 4, for rotating cylinder shape, be provided with outlet 42 and entrance 41, this nitrogen cleans in storehouse 4 and is provided with nitrogen gun, the entrance 41 that this nitrogen cleans storehouse 4 is connected with described getting on the right track of conveyer belt 8, and the outlet 42 that this nitrogen cleans storehouse 4 is connected with the lower railway of described conveyer belt 8;
Described feed back box 5, for rectangular configuration, be provided with entrance 51, hold the ceramic disk of at least 1 carrying LED wafer, the entrance 51 of this feed back box 5 is connected with the lower railway of described conveyer belt 8 above position and is also provided with described feed clamp 7, further, be provided with at least 2 in described feed back box 5 to each other apart from identical plastic septum, in this feed back box 5, hold the ceramic disk of at least 3 described carrying LED wafer;
Described conveyer belt 8, be made up of upper and lower two tracks, once clean storehouse 2, secondary cleaning storehouse 3 described in described upper and lower two tracks are separately positioned on and clean both sides, storehouse 4 with nitrogen, getting on the right track of described conveyer belt 8 is connected with the outlet 11 of described charging box 1, and the lower railway of described conveyer belt 8 is connected with the entrance 51 of described feed back box 5;
Described charging box 1, once cleaning storehouse 2, secondary cleaning storehouse 3, nitrogen clean storehouse 4 and array from left to right in two interorbitals up and down of described conveyer belt 8 with feed back box 5.
Embodiment 3
The present embodiment is the Application Example of the utility model patent.
A kind of LED wafer automatic rinser described in the present embodiment 3, comprising: charging box 1, once cleaning storehouse 2, secondary cleaning storehouse 3, nitrogen clean storehouse 4, feed back box 5, extracting jaw 6, feed clamp 7 and conveyer belt 8.
Working method of the present utility model is:
Described LED wafer is got getting on the right track of described conveyer belt 8 by the outlet 11 of described charging box 1 by described extracting jaw 6, once cleans the entrance 21 in storehouse 2 described in the ceramic disk of described carrying LED wafer is sent to by the getting on the right track of described conveyer belt 8;
After once cleaning the entrance 21 in storehouse 2 described in the ceramic disk of described carrying LED wafer is sent to by the getting on the right track of described conveyer belt 8, the described band shower nozzle hairbrush once cleaning storehouse 2 senses the ceramic disk of described carrying LED wafer, automatic that cleaning medicine liquid spray is surperficial at the ceramic disk of described carrying LED wafer, then pass through the rotation of hairbrush and the ceramic disk cleaning this carrying LED wafer that rubs.The outlet 22 of LED wafer after once having cleaned through described once cleaning storehouse 2 is sent to the entrance 31 in described secondary cleaning storehouse 3 by the lower railway of described conveyer belt 8;
The lower railway of described conveyer belt 8 by described once cleaned after LED wafer be sent to the entrance 31 in described secondary cleaning storehouse 3 after, the band shower nozzle hairbrush in described secondary cleaning storehouse 3 senses described LED wafer, the ceramic disk of the carrying LED wafer after once having cleaned described in automatically deionized water being sprayed at, then clean this LED wafer by the rotation of hairbrush with friction.The outlet 32 of LED wafer after secondary cleaning completes through described secondary cleaning storehouse 3 is sent to by getting on the right track of described conveyer belt 8 entrance 41 that described nitrogen cleans storehouse 4;
The ceramic disk of the carrying LED wafer after described secondary cleaning being completed that gets on the right track of described conveyer belt 8 is sent to after described nitrogen cleans the entrance 41 in storehouse 4, the nitrogen gun that described nitrogen cleans storehouse 4 senses described LED wafer, automatically nitrogen is sprayed on described secondary cleaning complete after the ceramic disk of carrying LED wafer, then to be purged by the rotation of nitrogen gun and this LED wafer dry.LED wafer after nitrogen has cleaned enters the lower railway of described conveyer belt 8 through the outlet 42 that described nitrogen cleans storehouse 4;
The ceramic disk of the carrying LED wafer after described nitrogen has cleaned by described feed clamp 7 gets the entrance 51 of described feed back box 5 from the lower railway of described conveyer belt 8.
Relative to the mode of artificial clean LED wafer of the prior art, advantage of the present utility model is:
(1) a kind of LED wafer automatic rinser described in the utility model, can save the human cost of cleaning process 2/3rds.As manufacturer produces 100,000 per month, monthly then can save human cost 30,000 yuan, LED wafer cleaning process yields improves 5%-15% simultaneously.
(2) a kind of LED wafer automatic rinser described in the utility model, clean replacement with machine automatization and clean manually, improve production efficiency, reduce production cost, efficiency is high and yields is high.
Above-mentioned explanation illustrate and describes some preferred embodiments of the application, but as previously mentioned, be to be understood that the application is not limited to the form disclosed by this paper, should not regard the eliminating to other embodiments as, and can be used for other combinations various, amendment and environment, and can in application contemplated scope described herein, changed by the technology of above-mentioned instruction or association area or knowledge.And the change that those skilled in the art carry out and change do not depart from the spirit and scope of the application, then all should in the protection domain of the application's claims.
Claims (3)
1. a LED wafer automatic rinser, is characterized in that, comprising: charging box, once clean storehouse, secondary cleaning storehouse, nitrogen cleans storehouse, feed back box, extracting jaw, feed clamp and conveyer belt, wherein,
Described charging box, is rectangular configuration, is provided with outlet, holds at least 1 LED wafer, and the getting on the right track of the outlet of this charging box and described conveyer belt is connected above position and is also provided with described extracting jaw;
Describedly once clean storehouse, for rotating cylinder shape, be provided with outlet and entrance, this once cleans in storehouse the hairbrush being provided with band shower nozzle, this entrance once cleaning storehouse is connected with getting on the right track of described conveyer belt, and this outlet of once cleaning storehouse is connected with the lower railway of described conveyer belt;
Described secondary cleaning storehouse, for rotating cylinder shape, be provided with outlet and entrance, in this secondary cleaning storehouse, be provided with the hairbrush of band shower nozzle, the entrance in this secondary cleaning storehouse is connected with getting on the right track of described conveyer belt, and the outlet in this secondary cleaning storehouse is connected with the lower railway of described conveyer belt;
Described nitrogen cleans storehouse, for rotating cylinder shape, be provided with outlet and entrance, this nitrogen cleans in storehouse and is provided with nitrogen gun, the entrance that this nitrogen cleans storehouse is connected with getting on the right track of described conveyer belt, and the outlet that this nitrogen cleans storehouse is connected with the lower railway of described conveyer belt;
Described feed back box, is rectangular configuration, is provided with entrance, holds at least 1 LED wafer carrier, and the entrance of this feed back box is connected with the lower railway of described conveyer belt above position and is also provided with described feed clamp;
Described conveyer belt, be made up of upper and lower two tracks, once clean storehouse, secondary cleaning storehouse and nitrogen described in described upper and lower two tracks are separately positioned on and clean both sides, storehouse, getting on the right track of described conveyer belt is connected with the outlet of described charging box, and the lower railway of described conveyer belt is connected with the entrance of described feed back box;
Described charging box, once clean storehouse, secondary cleaning storehouse, nitrogen cleans storehouse and feed back box arrays from left to right in two interorbitals up and down of described conveyer belt.
2. LED wafer automatic rinser according to claim 1, is characterized in that, is provided with at least 2 to each other apart from identical plastic septum in described charging box, holds the ceramic disk of at least 3 described LED wafer of carrying in this charging box.
3. LED wafer automatic rinser according to claim 1, is characterized in that, is provided with at least 2 to each other apart from identical plastic septum in described feed back box, holds at least 3 described LED wafer carriers in this feed back box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520438098.9U CN204747023U (en) | 2015-06-24 | 2015-06-24 | LED wafer automatic cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520438098.9U CN204747023U (en) | 2015-06-24 | 2015-06-24 | LED wafer automatic cleaning machine |
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| Publication Number | Publication Date |
|---|---|
| CN204747023U true CN204747023U (en) | 2015-11-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520438098.9U Expired - Fee Related CN204747023U (en) | 2015-06-24 | 2015-06-24 | LED wafer automatic cleaning machine |
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| CN (1) | CN204747023U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109633220A (en) * | 2019-01-29 | 2019-04-16 | 江阴佳泰电子科技有限公司 | A kind of pre- purging formula wafer probe platform |
| TWI726617B (en) * | 2020-02-13 | 2021-05-01 | 大陸商北京爍科精微電子裝備有限公司 | Device for cleaning wafer |
| CN114289355A (en) * | 2021-11-19 | 2022-04-08 | 杭州中欣晶圆半导体股份有限公司 | Film forming system and film forming method for reducing adsorption of particles on surface of wafer |
-
2015
- 2015-06-24 CN CN201520438098.9U patent/CN204747023U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109633220A (en) * | 2019-01-29 | 2019-04-16 | 江阴佳泰电子科技有限公司 | A kind of pre- purging formula wafer probe platform |
| CN109633220B (en) * | 2019-01-29 | 2021-08-24 | 江阴佳泰电子科技有限公司 | Pre-blowing and washing type wafer probe station |
| TWI726617B (en) * | 2020-02-13 | 2021-05-01 | 大陸商北京爍科精微電子裝備有限公司 | Device for cleaning wafer |
| CN114289355A (en) * | 2021-11-19 | 2022-04-08 | 杭州中欣晶圆半导体股份有限公司 | Film forming system and film forming method for reducing adsorption of particles on surface of wafer |
| CN114289355B (en) * | 2021-11-19 | 2023-02-03 | 杭州中欣晶圆半导体股份有限公司 | Film forming system and film forming method for reducing adsorption of particles on surface of wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151111 |