CN204515731U - Touch-screen and conducting film thereof - Google Patents

Touch-screen and conducting film thereof Download PDF

Info

Publication number
CN204515731U
CN204515731U CN201520189687.8U CN201520189687U CN204515731U CN 204515731 U CN204515731 U CN 204515731U CN 201520189687 U CN201520189687 U CN 201520189687U CN 204515731 U CN204515731 U CN 204515731U
Authority
CN
China
Prior art keywords
electrode pattern
conductive layer
insulating regions
conducting film
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn - After Issue
Application number
CN201520189687.8U
Other languages
Chinese (zh)
Inventor
张晟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanchang Ofilm Display Tech Co ltd
Nanchang OFilm Tech Co Ltd
OFilm Group Co Ltd
Anhui Jingzhuo Optical Display Technology Co Ltd
Original Assignee
Nanchang Ofilm Display Tech Co ltd
Nanchang OFilm Tech Co Ltd
Shenzhen OFilm Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanchang Ofilm Display Tech Co ltd, Nanchang OFilm Tech Co Ltd, Shenzhen OFilm Tech Co Ltd filed Critical Nanchang Ofilm Display Tech Co ltd
Priority to CN201520189687.8U priority Critical patent/CN204515731U/en
Application granted granted Critical
Publication of CN204515731U publication Critical patent/CN204515731U/en
Withdrawn - After Issue legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Position Input By Displaying (AREA)

Abstract

A kind of conducting film comprises base material, multiple electrode pattern, conductive test portion and contact conductor.Multiple electrode pattern is spaced and is located on visible area, and each electrode pattern is latticed, and the two ends of each electrode pattern are respectively first end and the second end, and conductive test portion is also in latticed.When detect each electrode pattern whether conducting time, can one end of detector probe be snapped in the conductive test portion of the first end being positioned at electrode pattern, the other end of detector probe be snapped on the contact conductor of the second end being positioned at electrode pattern.Because the mesh-density in conductive test portion is greater than the mesh-density of electrode pattern, so when detector probe is overlapped in conductive test portion, reduce the probability that detector probe directly snaps into the white space of grid element center, without the need to additionally finding check point by magnifier, because this reducing the difficulty of operation and improve detection efficiency, and then effectively reduce production cost.A kind of touch-screen of this conducting film of application is provided simultaneously.

Description

Touch-screen and conducting film thereof
Technical field
The utility model relates to technical field of touch control, particularly relates to a kind of touch-screen and conducting film thereof.
Background technology
Touch-screen is the inductive arrangement that can accept the input signals such as touch.Touch-screen imparts the brand-new looks of information interaction, is extremely attractive brand-new information interaction equipment.The development of touch screen technology causes the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
Key components in touch-screen comprise nesa coating.Nesa coating has satisfactory electrical conductivity, has the film material of higher light transmittance at visible light wave range.Therefore, it is widely used in contact panel, and in the field such as flat pannel display, photovoltaic device and electromagnetic screen, has the extremely wide market space at present.
Existing nesa coating is with ITO (Indium Tin Oxides, tin indium oxide) be formed on insulating substrate by the technique of vacuum coating, patterned etch, nesa coating is attached on transparent glass panel by adhesive layer again, thus forms touch-screen.But the price of indium is high and belong to scarce resource, cause ITO with high costs, and on insulating substrate, the technological process of whole plating ITO patterned etch again can waste a large amount of ITO, it will increase production cost undoubtedly greatly.Therefore, emerging at present wire netting lattice nesa coating is the following equivalent material of the ITO nesa coating be expected.
Detect nesa coating conduction region metal grill whether conducting time, naked eyes cannot ensure that detector probe is just overlapped on the mesh lines of metal grill, therefore need by magnifier to find the check point of metal grill to be detected, and the difficulty of operation can be increased so undoubtedly and reduce detection efficiency, and then production cost is caused to increase.
Utility model content
Based on this, be necessary for the problems referred to above, a kind of touch-screen and the conducting film thereof that can reduce production cost are provided.
A kind of conducting film, comprising:
Base material, the non-visible area comprising visible area and arrange around described visible area;
Multiple electrode pattern, multiple electrode pattern is spaced and is located on described visible area, and each electrode pattern is latticed, and the two ends of each electrode pattern are respectively first end and the second end;
Conductive test portion, be positioned at the first end of described electrode pattern, described conductive test portion is latticed, and the mesh-density in described conductive test portion is greater than the mesh-density of described electrode pattern, and the mesh lines in described conductive test portion is connected with the mesh lines of described electrode pattern; And
Contact conductor, is positioned at the second end of described electrode pattern, and is electrically connected with described electrode pattern, and described contact conductor is positioned at described non-visible area.
Wherein in an embodiment, described electrode pattern comprises multiple first electrode pattern and multiple second electrode pattern, described first electrode pattern and described second electrode pattern mutually insulated, each first electrode pattern extends along the first dimension direction in two-dimensional coordinate system, and multiple described first electrode pattern is spaced along the two-dimensional directional in two-dimensional coordinate system; Each second electrode pattern extends along the two-dimensional directional in two-dimensional coordinate system, and multiple described second electrode pattern is spaced along the first dimension direction in two-dimensional coordinate system.
Wherein in an embodiment, multiple described first electrode pattern and multiple described second electrode pattern form conductive layer, and the quantity of described conductive layer is one deck.
Wherein in an embodiment, described base material has first surface and the second surface relative with described first surface, and described conductive layer is directly formed at described first surface; Or
Described first surface is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described conductive layer is formed in described groove; Or
Described first surface offers groove, and the mesh lines of described conductive layer is formed in described groove.
Wherein in an embodiment, multiple first electrode pattern forms the first conductive layer, and multiple second electrode pattern forms the second conductive layer, the first conductive layer and the second conductive layer mutually insulated.
Wherein in an embodiment, described first conductive layer and described second conductive layer are positioned at the same surface of described base material, and described first conductive layer is directly formed at a surface of described base material; Or
A wherein surface of described base material is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described first conductive layer is formed in described groove; Or
A wherein surface of described base material offers groove, and the mesh lines of described first conductive layer is formed in described groove;
Described second conductive layer is stacked to be arranged on described first conductive layer, and described second conductive layer and described first conductive layer mutually insulated.
Wherein in an embodiment, the second surface that described base material has first surface and is oppositely arranged with described first surface, described first conductive layer is directly formed at the first surface of described base material; Or
Described first surface is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described first conductive layer is formed in described groove; Or
Described first surface offers groove, and the mesh lines of described first conductive layer is formed in described groove;
Described second conductive layer is directly formed at the second surface of described base material; Or
Described second surface is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described second conductive layer is formed in described groove; Or
Described second surface offers groove, and the mesh lines of described second conductive layer is formed in described groove.
Wherein in an embodiment, described first conductive layer and described second conductive layer are provided with insulating regions, insulating regions on described first conductive layer is surrounded entirely by described first electrode pattern or part is surrounded, insulating regions on described second conductive layer is surrounded entirely by described second electrode pattern or part is surrounded, described insulating regions is provided with in latticed conductive grid, the Nodes fracture of the mesh lines of described insulating regions, to ensure the mesh lines mutually insulated of described insulating regions.
Wherein in an embodiment, the quantity of the insulating regions on each first electrode pattern and each the second electrode pattern is respectively one, and this insulating regions is surrounded entirely by described first electrode pattern or the second electrode pattern; Or
Insulating regions on each first electrode pattern and each the second electrode pattern is multiple, and the area equation of each insulating regions, multiple described insulating regions is spaced, and insulating regions is surrounded entirely by described first electrode pattern or the second electrode pattern; Or
Insulating regions on each first electrode pattern and each the second electrode pattern is multiple, and the area of insulating regions reduces gradually along the direction near first end and/or the second end, and insulating regions is surrounded by the first electrode pattern or the second electrode pattern portion.
Wherein in an embodiment, described contact conductor is solid lead-in wire; Or
Described contact conductor is latticed, and the mesh-density of described contact conductor is greater than the mesh-density of described electrode pattern.
A kind of touch-screen, comprising:
Conducting film as described in above any one; And
Cover plate, is arranged on described conducting film.
Above-mentioned conducting film at least has the following advantages:
When detect each electrode pattern whether conducting time, can one end of detector probe be snapped in the conductive test portion of the first end being positioned at electrode pattern, the other end of detector probe be snapped on the contact conductor of the second end being positioned at electrode pattern.Because the mesh-density in conductive test portion is greater than the mesh-density of electrode pattern, so when detector probe is overlapped in conductive test portion, reduce the probability that detector probe directly snaps into the white space of grid element center, without the need to additionally finding check point by magnifier, because this reducing the difficulty of operation and improve detection efficiency, and then effectively reduce production cost.
Above-mentioned touch-screen because apply above-mentioned conducting film, therefore also have without the need to extra by magnifier to find check point, because of this reducing the difficulty of operation and improve detection efficiency, and then the advantage of effective reduction production cost.
Accompanying drawing explanation
Fig. 1 is the vertical view of conducting film in the first embodiment;
Fig. 2 is the partial enlarged drawing at A place in Fig. 1;
Fig. 3 is the partial enlarged drawing at A place in Fig. 1 in another embodiment;
Fig. 4 is the cut-open view along B-B line in Fig. 1;
Fig. 5 is the cut-open view along B-B line in Fig. 1 in another embodiment;
Fig. 6 is again the cut-open view along B-B line in Fig. 1 in an embodiment;
Fig. 7 is the vertical view of conducting film in the second embodiment;
Fig. 8 is the vertical view of conducting film in the 3rd embodiment;
Fig. 9 is the cut-open view along C-C line in Fig. 8;
Figure 10 is the cut-open view along C-C line in Fig. 8 in another embodiment;
Figure 11 is the vertical view of conducting film in the 4th embodiment;
Figure 12 is the vertical view of conducting film in the 5th embodiment.
Embodiment
For enabling above-mentioned purpose of the present utility model, feature and advantage become apparent more, are described in detail embodiment of the present utility model below in conjunction with accompanying drawing.Set forth a lot of detail in the following description so that fully understand the utility model.But the utility model can be much different from alternate manner described here to implement, those skilled in the art can when doing similar improvement without prejudice to when the utility model intension, and therefore the utility model is by the restriction of following public concrete enforcement.
Term as used herein " vertical ", " level ", "left", "right" and similar statement just for illustrative purposes, do not represent it is unique embodiment.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present utility model understand usually.The object of the term used in instructions of the present utility model herein just in order to describe specific embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise arbitrary and all combinations of one or more relevant Listed Items.
Touch-screen in one embodiment, comprises conducting film 100 and cover plate, and cover plate is arranged on conducting film 100.Cover plate is generally rectangular configuration, and the material of cover plate can be glass.Referring to Fig. 1 to Fig. 4, is the conducting film 100 in the first embodiment.Conducting film 100 comprises base material 110, conductive layer 120, conductive test portion 130 and contact conductor 140.
The non-visible area (figure does not mark) that base material 110 comprises visible area (figure does not mark) and arranges around visible area.Base material 110 is generally rectangular plate-like structure, and the material of base material 110 is isolation material.The second surface 110b that base material 110 has first surface 110a and is oppositely arranged with first surface 110a.
Conductive layer 120 is arranged on base material 110, and specific in present embodiment, conductive layer 120 is directly formed at the first surface 110a of base material 110 by the mode of plated film after etching, and the quantity of conductive layer 120 is one deck.Conductive layer 120 comprises multiple spaced electrode pattern 121, and each electrode pattern 121 is in latticed, and each electrode pattern 121 is positioned at visible area.Refer to Fig. 2, the grid of electrode pattern 121 can be the geometric configuration of rule, and refer to Fig. 3, the grid of electrode pattern 121 also can be irregular geometric configuration.Such as, the grid of electrode pattern 121 can be square, rectangle, hexagon or circle; Certainly, also can be irregular geometric configuration as shown in Figure 3.
The two ends of each electrode pattern 121 are respectively first end 1211 and the second end 1212.Specific in present embodiment, the profile of electrode pattern 121 is list structure, and each electrode pattern 121 extends along the first dimension direction in two-dimensional coordinate system, and multiple electrode pattern 121 is spaced along the two-dimensional directional in two-dimensional coordinate system.
Conductive test portion 130 is positioned at the first end 1211 of electrode pattern 121, and conductive test portion 130 is also in latticed, and the mesh-density in conductive test portion 130 is greater than the mesh-density of electrode pattern 131.The mesh lines in conductive test portion 130 is connected with the mesh lines of electrode pattern 121, to realize electrical connection.Contact conductor 140 is positioned at the second end 1212 of electrode pattern 121, and is electrically connected with electrode pattern 121, and contact conductor 140 is positioned at non-visible area.Contact conductor 140 can be solid lead-in wire, can be also latticed contact conductor, and when for latticed contact conductor, the mesh-density of contact conductor 140 is greater than the mesh-density of electrode pattern 121.
Above-mentioned touch-screen and conducting film 100 thereof at least have the following advantages:
When each electrode pattern 121 detecting conductive layer 120 whether conducting time, one end of detector probe can be snapped in the conductive test portion 130 of the first end 1211 being positioned at electrode pattern 121, the other end of detector probe be snapped on the contact conductor 140 of the second end 1212 being positioned at electrode pattern 121.Because the mesh-density in conductive test portion 130 is greater than the mesh-density of electrode pattern 121, so when detector probe is overlapped in conductive test portion 130, reduce the probability that detector probe directly snaps into the white space of grid element center, without the need to additionally finding check point by magnifier, because this reducing the difficulty of operation and improve detection efficiency, and then effectively reduce production cost.
Refer to Fig. 5, specific in this embodiment, conducting film 100 only comprises one deck conductive layer 120, and conductive layer 120 is arranged on base material 110.Particularly, by first offering groove on substrate 110, and then in groove filled conductive material, form latticed electrode pattern, multiple electrode pattern forms conductive layer 120.
Refer to Fig. 6, specific in this embodiment, conducting film 100 is only one deck conductive layer 120, is also provided with and impresses glue-line 130 between conductive layer 120 and base material 110.First impression glue-line 130 is formed at first surface 111 glue coating of base material 110, and then offer groove at impression glue-line 130 away from the surface of first surface 111, filled conductive material in groove, forms latticed electrode pattern again, and multiple electrode pattern forms conductive layer 120.
Referring to Fig. 7, is the set-up mode of conducting film 200 in the second embodiment.Specific in this embodiment, conducting film 200 only comprises one deck conductive layer, and conductive layer 220 comprises multiple electrode pattern 221.Electrode pattern 221 comprises multiple first electrode pattern 221a and multiple second electrode pattern 221b, the first electrode pattern 221a and the second electrode pattern 221b mutually insulated, and the second electrode pattern 221b is formed by the mode of putting up a bridge.First electrode pattern 221a and the second electrode pattern 221b is also in latticed (not shown latticed in Fig. 5, the contour shape of the first electrode pattern and the second electrode pattern is only shown), first electrode pattern 221a and the second electrode pattern 221b comprises conducting block 21 and contiguous block 22, and the two ends of contiguous block 22 are connected on conducting block 21 respectively.
Each first electrode pattern 221a extends along the first dimension direction in two-dimensional coordinate system, and multiple first electrode pattern 221a is spaced along the two-dimensional directional in two-dimensional coordinate system.Each second electrode pattern 221b extends along the two-dimensional directional in two-dimensional coordinate system, and multiple second electrode pattern 221b is spaced along the first dimension direction in two-dimensional coordinate system.The second end that the first end of the first electrode pattern 221a is provided with conductive test portion 230, first electrode pattern 221a is provided with contact conductor 240.The second end that the first end of the second electrode pattern 221b is provided with conductive test portion 230, second electrode pattern 221b is provided with contact conductor 240.Conductive test portion 230 is also in latticed, and the mesh-density in conductive test portion 230 is greater than the mesh-density of the first electrode pattern 221a and the second electrode pattern 221b.
In other embodiment, conductive layer comprises the first conductive layer and second conductive layer of mutually insulated, and the first conductive layer comprises multiple first electrode pattern, and the second conductive layer comprises multiple second electrode pattern.
Referring to Fig. 8 to Fig. 9, is the conducting film 300 in the 4th embodiment.Conducting film 300 comprises base material 310, first conductive layer 320 and the second conductive layer 330.Base material 310 is insulating substrate.First conductive layer 320 and the second conductive layer 330 mutually insulated.First conductive layer 320 comprises multiple first electrode pattern 321, second conductive layer 330 and comprises multiple second electrode pattern (not shown).Each first electrode pattern 321 extends along the first dimension direction in two-dimensional coordinate system, and multiple first electrode pattern 321 is spaced along the two-dimensional directional in two-dimensional coordinate system.Each second electrode pattern extends along the two-dimensional directional in two-dimensional coordinate system, and multiple second electrode pattern is spaced along the first dimension direction in two-dimensional coordinate system.
First conductive layer 320 and the second conductive layer 330 are positioned at the same surface of base material 310, such as first surface 311 or second surface 312.Specific in present embodiment, first conductive layer 320 and base material 310 are directly also provided with and impress glue-line 340, by offering groove at impression glue-line 340 away from the surface of first surface 311, filled conductive material forms latticed first electrode pattern 321 in a groove again, and multiple first electrode pattern 321 forms the first conductive layer 320.
Certainly, in other embodiments, the first conductive layer 320 directly can be formed at a surface of base material 310, and such as the first conductive layer 320 is directly formed at a surface of base material 310 by the mode that plated film etches.Or, can also by directly offering groove on a surface of base material 310, then filled conductive material forms latticed first electrode pattern 321 in groove, multiple first electrode pattern 321 forms the first conductive layer 320.
Second conductive layer 330 is stacked to be arranged on the first conductive layer 320, and the second conductive layer 330 and the first conductive layer 320 mutually insulated.Specific in present embodiment, another impression glue-line 340 is formed by being first coated with one deck glue on impression glue-line 340 and the first conductive layer 320 again, then on this impression glue-line 340, groove is offered, in groove, filled conductive material is to form latticed second electrode pattern again, and multiple second electrode pattern forms the second conductive layer 330.
Refer to Figure 10, in another embodiment along the cut-open view of the C-C line in Fig. 8, in this embodiment, conducting film 300 comprises base material 310, two-layer impression glue-line 320, first conductive layer 330 and the second conductive layer 340.The second surface 312 that base material 310 has first surface 311 and is oppositely arranged with first surface 311.Two-layer impression glue-line 320 is formed at first surface 311 and second surface 312 respectively, and two-layer impression glue-line 320 offers groove respectively, then filled conductive material in groove respectively, forms latticed first conductive layer 330 and the second conductive layer 340.
Certainly, in other embodiments, the mode that the first conductive layer 330 can be etched by plated film is directly formed at first surface 311.Or, groove can also be offered by first at the first surface 311 of base material 310, then filled conductive material forms the first conductive layer 330 in groove, is conducive to the thickness reducing conducting film 300.
Certainly, in other embodiment, the mode that the second conductive layer 340 also can be etched by plated film is directly formed at second surface 312.Or, groove can also be offered by first at the second surface 312 of base material 310, then filled conductive material forms the second conductive layer 340 in groove, is conducive to the thickness reducing conducting film 300.
Please again consult Fig. 8, first conductive layer 320 and the second conductive layer 330 are provided with insulating regions 350, insulating regions 350 on first conductive layer 320 is surrounded entirely by the first electrode pattern 321, and the insulating regions 350 on the second conductive layer 330 is surrounded entirely by the second electrode pattern.Insulating regions 350 is also provided with in latticed conductive grid, and the Nodes fracture of the mesh lines of insulating regions 350, to ensure the mesh lines mutually insulated of insulating regions 350.
In order to not increase the natural capacity of conductive layer, therefore to ensure that the surface area of the first electrode pattern 321 and the second electrode pattern is a specific fixed value, but surround by complete in the first electrode pattern 321 and the second electrode pattern or be partly surrounded by insulating regions 350, when the length of the first electrode pattern 321 and the second electrode pattern is certain, the width of the first electrode pattern 321 and the second electrode pattern can be increased, therefore between adjacent two the first electrode patterns 321 and adjacent two the second electrode patterns spacing reduce, the spacing be decreased between adjacent two the first electrode patterns 321 and between adjacent two the second electrode patterns can reduce optical contrast, therefore the natural capacity of whole conductive layer can not both be increased, optical contrast can be reduced again.
In the present embodiment, the quantity of the insulating regions 350 on each first electrode pattern 321 is one (as shown in Figure 8), and this insulating regions 350 is surrounded entirely by the first electrode pattern 321.The quantity of the insulating regions 350 on each second electrode pattern is also one, and this insulating regions 350 is surrounded entirely by the second electrode pattern.
Refer to Figure 11, in the 4th embodiment, the insulating regions 450 of each the first electrode pattern 421 is multiple, and the area equation of each insulating regions 450, multiple insulating regions 450 is spaced, and insulating regions 450 is surrounded (as shown in figure 11) entirely by the first electrode pattern 421.The insulating regions of each the second electrode pattern is multiple, and the area equation of each insulating regions, multiple insulating regions is spaced, and insulating regions is surrounded entirely by the second electrode pattern.
Refer to Figure 12, in the 5th embodiment, the insulating regions 550 of each the first electrode pattern 521 is multiple, and the area of insulating regions 550 reduces gradually along the direction near first end or the second end, insulating regions 550 is surrounded (as shown in figure 12) by the first electrode pattern 521 part.The insulating regions of each the second electrode pattern is multiple, and the area of insulating regions reduces gradually along the direction near first end or the second end, and insulating regions is surrounded by the second electrode pattern portion.Certainly, in other embodiments, the area of insulating regions 550 also can reduce along the direction near first end and the second end gradually.
The above embodiment only have expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.

Claims (11)

1. a conducting film, is characterized in that, comprising:
Base material, the non-visible area comprising visible area and arrange around described visible area;
Multiple electrode pattern, multiple electrode pattern is spaced and is located on described visible area, and each electrode pattern is latticed, and the two ends of each electrode pattern are respectively first end and the second end;
Conductive test portion, be positioned at the first end of described electrode pattern, described conductive test portion is latticed, and the mesh-density in described conductive test portion is greater than the mesh-density of described electrode pattern, and the mesh lines in described conductive test portion is connected with the mesh lines of described electrode pattern; And
Contact conductor, is positioned at the second end of described electrode pattern, and is electrically connected with described electrode pattern, and described contact conductor is positioned at described non-visible area.
2. conducting film according to claim 1, it is characterized in that, described electrode pattern comprises multiple first electrode pattern and multiple second electrode pattern, described first electrode pattern and described second electrode pattern mutually insulated, each first electrode pattern extends along the first dimension direction in two-dimensional coordinate system, and multiple described first electrode pattern is spaced along the two-dimensional directional in two-dimensional coordinate system; Each second electrode pattern extends along the two-dimensional directional in two-dimensional coordinate system, and multiple described second electrode pattern is spaced along the first dimension direction in two-dimensional coordinate system.
3. conducting film according to claim 2, is characterized in that, multiple described first electrode pattern and multiple described second electrode pattern form conductive layer, and the quantity of described conductive layer is one deck.
4. conducting film according to claim 3, is characterized in that, described base material has first surface and the second surface relative with described first surface, and described conductive layer is directly formed at described first surface; Or
Described first surface is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described conductive layer is formed in described groove; Or
Described first surface offers groove, and the mesh lines of described conductive layer is formed in described groove.
5. conducting film according to claim 2, is characterized in that, multiple first electrode pattern forms the first conductive layer, and multiple second electrode pattern forms the second conductive layer, the first conductive layer and the second conductive layer mutually insulated.
6. conducting film according to claim 5, is characterized in that, described first conductive layer and described second conductive layer are positioned at the same surface of described base material, and described first conductive layer is directly formed at a surface of described base material; Or
A wherein surface of described base material is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described first conductive layer is formed in described groove; Or
A wherein surface of described base material offers groove, and the mesh lines of described first conductive layer is formed in described groove;
Described second conductive layer is stacked to be arranged on described first conductive layer, and described second conductive layer and described first conductive layer mutually insulated.
7. conducting film according to claim 5, is characterized in that, the second surface that described base material has first surface and is oppositely arranged with described first surface, and described first conductive layer is directly formed at the first surface of described base material; Or
Described first surface is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described first conductive layer is formed in described groove; Or
Described first surface offers groove, and the mesh lines of described first conductive layer is formed in described groove;
Described second conductive layer is directly formed at the second surface of described base material; Or
Described second surface is formed with impression glue-line, and described impression glue-line offers groove, and the mesh lines of described second conductive layer is formed in described groove; Or
Described second surface offers groove, and the mesh lines of described second conductive layer is formed in described groove.
8. the conducting film according to claim 6 or 7, it is characterized in that, described first conductive layer and described second conductive layer are provided with insulating regions, insulating regions on described first conductive layer is surrounded entirely by described first electrode pattern or part is surrounded, insulating regions on described second conductive layer is surrounded entirely by described second electrode pattern or part is surrounded, described insulating regions is provided with in latticed conductive grid, the Nodes fracture of the mesh lines of described insulating regions, to ensure the mesh lines mutually insulated of described insulating regions.
9. conducting film according to claim 8, is characterized in that, the quantity of the insulating regions on each first electrode pattern and each the second electrode pattern is respectively one, and this insulating regions is surrounded entirely by described first electrode pattern or the second electrode pattern; Or
Insulating regions on each first electrode pattern and each the second electrode pattern is multiple, and the area equation of each insulating regions, multiple described insulating regions is spaced, and insulating regions is surrounded entirely by described first electrode pattern or the second electrode pattern; Or
Insulating regions on each first electrode pattern and each the second electrode pattern is multiple, and the area of insulating regions reduces gradually along the direction near first end and/or the second end, and insulating regions is surrounded by the first electrode pattern or the second electrode pattern portion.
10. conducting film according to claim 1, is characterized in that, described contact conductor is solid lead-in wire; Or
Described contact conductor is latticed, and the mesh-density of described contact conductor is greater than the mesh-density of described electrode pattern.
11. 1 kinds of touch-screens, is characterized in that, comprising:
As the conducting film in claim 1 to 10 as described in any one; And
Cover plate, is arranged on described conducting film.
CN201520189687.8U 2015-03-31 2015-03-31 Touch-screen and conducting film thereof Withdrawn - After Issue CN204515731U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201520189687.8U CN204515731U (en) 2015-03-31 2015-03-31 Touch-screen and conducting film thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201520189687.8U CN204515731U (en) 2015-03-31 2015-03-31 Touch-screen and conducting film thereof

Publications (1)

Publication Number Publication Date
CN204515731U true CN204515731U (en) 2015-07-29

Family

ID=53713682

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520189687.8U Withdrawn - After Issue CN204515731U (en) 2015-03-31 2015-03-31 Touch-screen and conducting film thereof

Country Status (1)

Country Link
CN (1) CN204515731U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106155381A (en) * 2015-03-31 2016-11-23 深圳欧菲光科技股份有限公司 Touch screen and conducting film thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106155381A (en) * 2015-03-31 2016-11-23 深圳欧菲光科技股份有限公司 Touch screen and conducting film thereof
CN106155381B (en) * 2015-03-31 2024-03-15 安徽精卓光显技术有限责任公司 Touch screen and conductive film thereof

Similar Documents

Publication Publication Date Title
CN103412667B (en) Touch panel and touch display device
CN203658975U (en) Touch control panel
CN105549801A (en) Capacitive touch screen and dual-layer electrode structure thereof
CN102736760B (en) Single-face structure of touch control panel and preparation method thereof
CN104347155A (en) Transparent conducting film
CN202887131U (en) Touch electrode device
CN103631427A (en) Touch electrode device
CN206312114U (en) Touch-screen and its suspension touch control component
CN102654806A (en) Touch control panel and manufacturing method thereof
CN103984435A (en) Touch panel capable of reducing frame area
CN105448386A (en) Touch control element and conducting film thereof
CN103809797A (en) Touch electrode device
CN102645997B (en) Touch control panel and touch point distinguishing method of touch control panel
CN204515731U (en) Touch-screen and conducting film thereof
CN203520349U (en) Design of touch panel
CN203217513U (en) Touch display screen and touch display device
CN102279686B (en) Capacitive touch panel and method for manufacturing same
CN203366286U (en) Monolayer multi-point touch control screen and monolayer multi-point conductive film thereof
CN204480197U (en) A kind of conducting film and metal grill touch sensor
CN203386170U (en) Single-layer multi-point type touch screen and single-layer multi-point type touch conducting film thereof
CN203376989U (en) Transparent conductive film
CN103927031A (en) Touching control structure
CN204515732U (en) Touch-screen and conducting film thereof
CN106155381B (en) Touch screen and conductive film thereof
CN103176683A (en) Touch screen electric conduction bridging

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: Ophiguang Group Co.,Ltd.

Patentee after: Nanchang OFilm Tech. Co.,Ltd.

Patentee after: Nanchang Ofilm Display Tech Co.,Ltd.

Address before: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: OFilm Tech Co.,Ltd.

Patentee before: Nanchang OFilm Tech. Co.,Ltd.

Patentee before: Nanchang Ofilm Display Tech Co.,Ltd.

CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: OFilm Tech Co.,Ltd.

Patentee after: Nanchang OFilm Tech. Co.,Ltd.

Patentee after: Nanchang Ofilm Display Tech Co.,Ltd.

Address before: 518106 Oufeiguang Science Park, Huafa Section of Songbai Highway, Gongming Town, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: Shenzhen OFilm Tech Co.,Ltd.

Patentee before: Nanchang OFilm Tech. Co.,Ltd.

Patentee before: Nanchang Ofilm Display Tech Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20210518

Address after: 231323 Building 1, precision electronics industrial park, Hangbu Town, Shucheng County, Lu'an City, Anhui Province

Patentee after: Anhui jingzhuo optical display technology Co.,Ltd.

Address before: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: Ophiguang Group Co.,Ltd.

Patentee before: Nanchang OFilm Tech. Co.,Ltd.

Patentee before: Nanchang Ofilm Display Tech Co.,Ltd.

AV01 Patent right actively abandoned
AV01 Patent right actively abandoned
AV01 Patent right actively abandoned

Granted publication date: 20150729

Effective date of abandoning: 20240315

AV01 Patent right actively abandoned

Granted publication date: 20150729

Effective date of abandoning: 20240315