CN204451422U - Anti-reflection anti-fingerprint lamination - Google Patents
Anti-reflection anti-fingerprint lamination Download PDFInfo
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- CN204451422U CN204451422U CN201520022504.3U CN201520022504U CN204451422U CN 204451422 U CN204451422 U CN 204451422U CN 201520022504 U CN201520022504 U CN 201520022504U CN 204451422 U CN204451422 U CN 204451422U
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- reflection
- sio
- glass substrate
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- 230000003666 anti-fingerprint Effects 0.000 title claims abstract description 58
- 238000003475 lamination Methods 0.000 title claims abstract description 21
- 239000011521 glass Substances 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 24
- 239000000853 adhesive Substances 0.000 abstract description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 87
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- 239000007789 gas Substances 0.000 description 15
- 239000008367 deionised water Substances 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 10
- 239000010955 niobium Substances 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 8
- 229910021641 deionized water Inorganic materials 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000007888 film coating Substances 0.000 description 6
- 238000009501 film coating Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000004062 sedimentation Methods 0.000 description 4
- -1 siloxanes Chemical class 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000009504 vacuum film coating Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 235000019504 cigarettes Nutrition 0.000 description 2
- 230000000536 complexating effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000002045 lasting effect Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
The utility model relates to a kind of anti-reflection anti-fingerprint lamination, comprises glass substrate, and is formed in anti-reflection film, the SiO on glass substrate one surface successively
2transition zone and anti-fingerprint film.Anti-fingerprint film in this is anti-reflection anti-fingerprint lamination has good adhesive force, can prevent anti-fingerprint film from peeling off from glass substrate, increase the service life.
Description
Technical field
The utility model relates to a kind of optical laminated, particularly a kind of anti-reflection anti-fingerprint lamination be applied on electronic product.
Background technology
At present, the screen of capacitance touching control electronic product (as mobile phone, panel computer etc.) all needs to be coated with AR film and AF film in screen surface substantially.AR (Anti-Reflect) is antireflective film, also claims anti-reflection film.AF (Anti-Fingerprint) film is anti-fingerprint film.
Antireflective film is current most widely used general, a kind of optical thin film that output is maximum, and its major function reduces or eliminate the reverberation of the optical element surfaces such as lens, prism, level crossing, thus increase the light transmission capacity of these elements.In order to realize the larger lifting of light permeable rate, be generally by being coated with one or more layers AR film on the glass substrate of screen.The method at present realizing preparing AR film at glass baseplate surface mainly contains three kinds: chemical vapour deposition (CVD) (CVD); Sol-gel; Physical vapour deposition (PVD) (as vacuum evaporation, magnetron sputtering etc.).
The glass baseplate surface of screen very easily pollute by the fingerprint of the dirt in the external world and user, therefore, the long-term cleannes keeping glass baseplate surface, and the concern of removing that fingerprint that its surface adheres to and this technology of dirt are more and more subject to people relatively easily.AF film is a kind of film simultaneously with hydrophobicity and these two kinds of characteristics of oleophobic property, based on good hydrophobicity and oleophobic property, AF film not easily adheres to extraneous dust and dirt, and when adhering to dirt and fingerprint, also has the characteristic more easily removing Superficial Foreign Body.But generally, the adhesive force between AF film and glass substrate is generally poor, easily peel off from glass baseplate surface, and film surface flatness and membrane uniformity are all difficult to hold.
Utility model content
Based on this, be necessary to provide a kind of anti-reflection anti-fingerprint lamination that can reach the effect that vision is anti-reflection and feel is smooth for above-mentioned defect.
A kind of anti-reflection anti-fingerprint lamination, comprises glass substrate, and is formed in anti-reflection film, the SiO on glass substrate one surface successively
2transition zone and anti-fingerprint film.
Wherein in an embodiment, described anti-reflection film is the MgF of individual layer
2film.
Wherein in an embodiment, described anti-reflection film is multi-layer film structure, comprises a SiO stacked successively
2film, Nb
2o
5film and the 2nd SiO
2film.
Wherein in an embodiment, a described SiO
2the thickness of film is 10-20nm, described Nb
2o
5the thickness of film is 10-20nm, described 2nd SiO
2the thickness of film is 10-20nm.
Wherein in an embodiment, described SiO
2transition region thickness is 15 ~ 20nm.
Wherein in an embodiment, described anti-fingerprint film thickness is 15 ~ 20nm.
Anti-fingerprint film in above-mentioned anti-reflection anti-fingerprint lamination because forming SiO between anti-fingerprint film and the coating of glass substrate
2transition zone and have good adhesive force, can prevent anti-fingerprint film from peeling off from the coating of glass substrate, increase the service life.
Accompanying drawing explanation
The structural representation of the anti-reflection anti-fingerprint lamination that Fig. 1 provides for an embodiment;
The structural representation of the anti-reflection anti-fingerprint lamination that Fig. 2 provides for another embodiment.
Detailed description of the invention
For the ease of understanding the utility model, below with reference to relevant drawings, the utility model is described more fully.First-selected embodiment of the present utility model is given in accompanying drawing.But the utility model can realize in many different forms, is not limited to embodiment described herein.On the contrary, the object of these embodiments is provided to be make to disclosure of the present utility model more thoroughly comprehensively.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present utility model understand usually.The object of term used in the description herein just in order to describe specific embodiment, is not intended to be restriction the utility model.
As shown in Figure 1, the anti-reflection anti-fingerprint lamination that an embodiment provides comprises glass substrate 10, and the anti-reflection film 20 prepared on the surface at glass substrate 10 1 successively, transition zone (also or cushion) 30 and anti-fingerprint film 40.
In the present embodiment, glass substrate 10 can be the glass of silicate glass or similar material, and glass substrate 10 can through chemical treatment, with the intensity of reinforced glass substrate 10.
In the present embodiment, anti-reflection film 20 is the MgF of individual layer
2film.Anti-reflection film 20 increases the light penetration of glass substrate 10, when this anti-reflection anti-fingerprint lamination is applied to the screen of the electronic product such as mobile phone, panel computer, can improve the display effect of screen.
In the present embodiment, transition zone 30 is SiO
2layer, thickness is 15 ~ 20nm.Transition zone 30 can increase the adhesive force between anti-fingerprint film 40 and glass substrate 10 (being specially the anti-reflection film 20 on glass substrate 10) to a certain extent, slow down anti-fingerprint film 40 from glass substrate 10 sur-face peeling, be conducive to the service life extending anti-fingerprint film 40.
In the present embodiment, anti-fingerprint film 40 is a kind of high polymer layers, and thickness is 15 ~ 20nm, has stronger hydrophobic, fuel shedding quality, and therefore dirty the and fingerprint trace very easily wiped clean of electronic product screen surface, keeps smooth sense of touch.
The preparation method of anti-reflection anti-fingerprint lamination described in the utility model, its concrete steps are as follows:
A, chooses glass substrate, after it is cleaned, and drying for standby;
B, by glass substrate and Coating Materials MgF
2compound puts into vacuum coating equipment, adopts magnetron sputtering method to realize forming MgF at glass baseplate surface plated film
2coating is also the anti-reflection film 20 in Fig. 1, to MgF after completing
2coating carries out the process of high vacuum heat drying;
C, by the glass substrate of step B process, and siloxanes puts into vacuum coating equipment, at MgF
2coating surface is coated with SiO
2namely cushion, also form the transition zone 30 in Fig. 1;
D, puts into vacuum coating equipment, at SiO by the glass substrate of step C process with for the formation of the material of anti-fingerprint film 40
2cushion is coated with anti-fingerprint film, forms the anti-fingerprint film 40 in Fig. 1.
As the further improvement of above-mentioned preparation method, the cleaning to glass substrate described in above-mentioned steps A adopts wet chemical flush process (such as RCA cleaning) to clean, specific as follows:
(1) acetone ultrasonic cleaning, the time is 5 ~ 10min, to remove glass baseplate surface grease etc.;
(2) EtOH Sonicate cleaning, the time is 2 ~ 5min, to remove glass baseplate surface residual acetone;
(3) washed with de-ionized water, the time is 2 ~ 5min, to remove glass baseplate surface residual ethanol;
(4) glass substrate is placed in 1# liquid (sulfuric acid: H
2o
2=3:1, mass ratio, lower with) in 110 ~ 130 DEG C boil and wash, until H
2o
2volatilize completely, solution emits white cigarette, to remove glass baseplate surface major part organic matter;
(5) deionized water rinsing, the time is 10 ~ 15min;
(6) glass substrate is placed in 2# liquid (ammoniacal liquor: H
2o
2: H
2o=1:1:6) in, 75 ~ 85 DEG C are boiled and wash, and the time is 10 ~ 20min, utilizes ammoniacal liquor complexing removal heavy metal impurity;
(7) deionized water rinsing, the time is 5 ~ 10min;
(8) glass substrate is placed in 3# liquid (HCl:H
2o
2: H
2o=1:1:6) in, 75 ~ 85 DEG C are boiled and wash, and boil to H
2o
2volatilize completely, remove the metal ion of glass baseplate surface;
(9) deionized water rinsing, the time is 5 ~ 10min;
(10) hydrofluoric acid glass substrate being placed in 10% boils to be washed, and the time is 5 ~ 10s, removes glass baseplate surface oxide layer;
(11) deionized water rinsing, the time is 20min;
(12) glass substrate after cleaning utilizes infrared lamps to dry in nitrogen atmosphere, and the time is 1 ~ 2 hour, saves backup after oven dry in nitrogen atmosphere.
As the further improvement of above-mentioned technology, above-mentioned steps B specifically: adopt MgF
2compound target, purity is 99.99%, MgF during sputter coating
2compound target is 10cm apart from the distance of glass substrate.Suction to pressure is 3.0 × 10
-4pa, sputtering pressure is 2Pa, and working gas is argon gas, and gas flow is 50cm
3/ min, underlayer temperature is 350 DEG C, radio-frequency power supply power is 150W, with argon gas pre-sputtering more than target material surface 20min before plated film, to remove oxide and other impurity of target material surface, then argon gas is passed into, after aura is stable, open baffle plate, rotational substrate rotating disk, put substrate spatter film forming in aura, sputtering time controls as 2h.
As the further improvement of above-mentioned technology, above-mentioned steps C specifically: being evacuated to pressure is 1.0 × 10
-3pa, then insufflation gas flow is 120cm
3silicone oil to the vacuum indoor pressure of/min is 1.0 × 10
-3~ 1.0 × 10
-1between Pa, lasting EF power is the SiO that 8000W starts to deposit siloxanes Pintsch process
x, sedimentation time is 35 ~ 40s, obtains the SiO that thickness is 15 ~ 20nm
xcushion, passes through O after having deposited
2glow discharge, to SiO
xcushion etches, the SiO that peel adhesion is poor
xwith supplementary O
2form SiO
2cushion.
As the further improvement of above-mentioned technology, above-mentioned steps D specifically: SiO
2after cushion completes, being evacuated to pressure is 1.0 × 10
-5pa, heater current is promoted to 270A by 0A in 60s, starts to deposit anti-fingerprint film, and sedimentation time controls, for 90s, to obtain the anti-fingerprint film that thickness is 15 ~ 20nm.
Please refer to the drawing 2, embodiment in the anti-reflection anti-fingerprint lamination that another embodiment of the utility model provides and Fig. 1 is similar, comprise glass substrate 10, and the anti-reflection film 21 prepared on the surface at glass substrate 10 1 successively, transition zone (also or cushion) 30 and anti-fingerprint film 40.Difference is, this anti-reflection film 21 is multi-layer film structure, comprises a SiO stacked successively
2film 211, Nb
2o
5film 212 and the 2nd SiO
2film 213.A wherein SiO
2the thickness of film 211 is about 10-20nm, Nb
2o
5the thickness of film 212 is about 10-20nm, the 2nd SiO
2the thickness of film 213 is about 10-20nm.
The preparation method of above-mentioned anti-reflection anti-fingerprint lamination, its concrete steps are as follows:
A, chooses glass substrate, after it is cleaned, and drying for standby;
B, chooses SiO
2target, carries out Vacuum Deposition the one SiO to glass substrate in vacuum film coating chamber
2film, to a SiO after completing
2film coating carries out the process of high vacuum heat drying; At a SiO in vacuum film coating chamber
2film coating carries out Nb
2o
5plated film, to Nb after completing
2o
5film coating carries out the process of high vacuum heat drying; At Nb in vacuum film coating chamber
2o
5film coating carries out the 2nd SiO
2film plated film, to the 2nd SiO after completing
2film coating carries out the process of high vacuum heat drying; So far on glass baseplate surface, anti-reflection film is formed;
C, puts into vacuum coating equipment by the glass substrate of step B process and siloxanes, is coated with SiO on anti-reflection film surface
2cushion;
D, puts into vacuum coating equipment, at SiO by the glass substrate of step C process with for the formation of the material of anti-fingerprint film 40
2cushion is coated with anti-fingerprint film, forms the anti-fingerprint film 40 in Fig. 2.
As the further improvement of above-mentioned technology, the cleaning to glass substrate described in above-mentioned steps A adopts RCA cleaning to clean, specific as follows:
(1) acetone ultrasonic cleaning, the time is 5 ~ 10min, to remove glass baseplate surface grease etc.;
(2) EtOH Sonicate cleaning, the time is 2 ~ 5min, to remove glass baseplate surface residual acetone;
(3) washed with de-ionized water, the time is 2 ~ 5min, to remove glass baseplate surface residual ethanol;
(4) glass substrate is placed in 1# liquid (sulfuric acid: H
2o
2=3:1) in 110 ~ 130 DEG C boil and wash, until H
2o
2volatilize completely, solution emits white cigarette, to remove glass baseplate surface major part organic matter;
(5) deionized water rinsing, the time is 10 ~ 15min;
(6) substrate is placed in 2# liquid (ammoniacal liquor: H
2o
2: H
2o=1:1:6) in, 75 ~ 85 DEG C are boiled and wash, and the time is 10 ~ 20min, utilizes ammoniacal liquor complexing removal heavy metal impurity;
(7) deionized water rinsing, the time is 5 ~ 10min;
(8) glass substrate is placed in 3# liquid (HCl:H
2o
2: H
2o=1:1:6) in, 75 ~ 85 DEG C are boiled and wash, and boil to H
2o
2volatilize completely, remove the metal ion of glass baseplate surface;
(9) deionized water rinsing, the time is 5 ~ 10min;
(10) hydrofluoric acid glass substrate being placed in 10% boils to be washed, and the time is 5 ~ 10s, removes glass baseplate surface oxide layer;
(11) deionized water rinsing, the time is 20min;
(12) glass substrate after cleaning utilizes infrared lamps to dry in nitrogen atmosphere, and the time is 1 ~ 2 hour, saves backup after oven dry in nitrogen atmosphere.
As the further improvement of above-mentioned technology, above-mentioned steps B specifically: adopt SiO
2as target, purity is 99.99%, and target diameter is 11.5cm, SiO during sputter coating
2target is 5.5cm apart from the distance of glass substrate.Coating chamber vacuum is 1.0 × 10
-3pa, sputtering pressure is 1.2Pa, and working gas is oxygen and argon gas mist, and oxygen and argon flow amount are respectively 88cm
3/ min and 132cm
3/ min, the two intrinsic standoff ratio is 2:5.Radio-frequency power supply power is 1kW.With argon gas pre-sputtering more than target material surface 20min before plated film, to remove oxide and other impurity on surface, then pass into oxygen, after aura is stable, opens baffle plate, rotational substrate rotating disk, put substrate spatter film forming in aura.In deposition process, utilize mask to do membrane-substrate step on the glass substrate, the thickness of film uses Alpha-Step IQ step instrument to measure, and records when thickness is about 10-20nm and stops plated film.
Then, adopt metal niobium as target, purity is 99.9%, and the distance of target and glass substrate is 12cm, and sputtering power is 3.98kW, and the air pressure in sputtering chamber, initial vacuum is 2.0 × 10
-4pa, using argon gas as working gas in sputter procedure, oxygen is as reacting gas, and vacuum pressure is 0.2Pa.The flow of argon gas and oxygen is 100cm
3/ min, carries out more than pre-sputtering 20min with argon gas to target material surface before each deposit film, to remove oxide and other impurity on surface, then pass into oxygen, after aura is stable, open baffle plate, rotational substrate rotating disk, puts substrate spatter film forming in aura, obtains the Nb shown in Fig. 2
2o
5film 212.The time of deposit film is 25 ~ 30s, and the thickness of film is about 10-20nm.
2nd SiO
2the process that is coated with of film and a SiO
2the process that is coated with of film is substantially identical, and its thicknesses of layers controls to be about 10-20nm.
As the further improvement of above-mentioned technology, above-mentioned steps C specifically: being evacuated to pressure is 1.0 × 10
-3pa, then insufflation gas flow is 120cm
3silicone oil to the vacuum indoor pressure of/min is 1.0 × 10
-3~ 1.0 × 10
-1between Pa, lasting EF power is the SiO that 8000W starts to deposit siloxanes Pintsch process
x, sedimentation time is 35 ~ 40s, obtains the SiO that thickness is 15 ~ 20nm
xcushion, passes through O after having deposited
2glow discharge, to SiO
xcushion etches, the SiO that peel adhesion is poor
xwith supplementary O
2form SiO
2cushion.
As the further improvement of above-mentioned technology, above-mentioned steps D specifically: SiO
2after cushion completes, being evacuated to pressure is 1.0 × 10
-5pa, heater current is promoted to 270A by 0A in 60s, starts to deposit anti-fingerprint film, and sedimentation time controls, for 90s, to obtain the anti-fingerprint film that thickness is 15 ~ 20nm.
Compared with prior art, the beneficial effects of the utility model are:
1. the utility model adopts MgF
2monofilm and SiO
2| Nb
2o
5| SiO
2multi-layer film structure two kinds of modes carry out design anti-reflection film, and the anti-reflection film of preparation has good antireflective effect.
2. the utility model is taked to be coated with SiO at anti-reflection film coating surface
2cushion, improves the coating adhesion between anti-fingerprint film for touch screen and glass substrate, slows down anti-fingerprint rete and peels off from glass substrate coating surface, is conducive to the service life extending anti-fingerprint film.
3. the anti-fingerprint film that the utility model provides is a kind of high molecular polymer, has stronger hydrophobic, fuel shedding quality, and therefore dirty the and fingerprint trace very easily wiped clean on the contact panel surface of electronic product, keeps smooth sense of touch.
Above embodiment only have expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (6)
1. an anti-reflection anti-fingerprint lamination, is characterized in that comprising glass substrate, and is formed in anti-reflection film, the SiO on glass substrate one surface successively
2transition zone and anti-fingerprint film.
2. anti-reflection anti-fingerprint lamination according to claim 1, is characterized in that, described anti-reflection film is the MgF of individual layer
2film.
3. anti-reflection anti-fingerprint lamination according to claim 1, it is characterized in that, described anti-reflection film is multi-layer film structure, comprises a SiO stacked successively
2film, Nb
2o
5film and the 2nd SiO
2film.
4. anti-reflection anti-fingerprint lamination according to claim 3, is characterized in that, a described SiO
2the thickness of film is 10-20nm, described Nb
2o
5the thickness of film is 10-20nm, described 2nd SiO
2the thickness of film is 10-20nm.
5. anti-reflection anti-fingerprint lamination according to claim 1, is characterized in that, described SiO
2transition region thickness is 15 ~ 20nm.
6. anti-reflection anti-fingerprint lamination according to claim 1, is characterized in that, described anti-fingerprint film thickness is 15 ~ 20nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520022504.3U CN204451422U (en) | 2015-01-13 | 2015-01-13 | Anti-reflection anti-fingerprint lamination |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520022504.3U CN204451422U (en) | 2015-01-13 | 2015-01-13 | Anti-reflection anti-fingerprint lamination |
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| Publication Number | Publication Date |
|---|---|
| CN204451422U true CN204451422U (en) | 2015-07-08 |
Family
ID=53658362
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|---|---|---|---|
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| Country | Link |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105403942A (en) * | 2015-12-02 | 2016-03-16 | 利达光电股份有限公司 | Blue-glass infrared cutoff filter and film plating method thereof |
| CN105835465A (en) * | 2015-01-13 | 2016-08-10 | 南昌欧菲光学技术有限公司 | Antireflective anti-fingerprint laminate and manufacturing method thereof |
| CN106564228A (en) * | 2016-10-27 | 2017-04-19 | 广东星弛光电科技有限公司 | Preparation method of anti-reflection, anti-scratching and fingerprint-proof mobile phone glass view-window protective screen |
-
2015
- 2015-01-13 CN CN201520022504.3U patent/CN204451422U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105835465A (en) * | 2015-01-13 | 2016-08-10 | 南昌欧菲光学技术有限公司 | Antireflective anti-fingerprint laminate and manufacturing method thereof |
| CN105403942A (en) * | 2015-12-02 | 2016-03-16 | 利达光电股份有限公司 | Blue-glass infrared cutoff filter and film plating method thereof |
| CN105403942B (en) * | 2015-12-02 | 2019-03-08 | 利达光电股份有限公司 | A kind of smalt cutoff filter and its film plating process |
| CN106564228A (en) * | 2016-10-27 | 2017-04-19 | 广东星弛光电科技有限公司 | Preparation method of anti-reflection, anti-scratching and fingerprint-proof mobile phone glass view-window protective screen |
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