CN204440008U - The conjunction beam system that optical mask chromium plate is repaired - Google Patents
The conjunction beam system that optical mask chromium plate is repaired Download PDFInfo
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- CN204440008U CN204440008U CN201520017324.6U CN201520017324U CN204440008U CN 204440008 U CN204440008 U CN 204440008U CN 201520017324 U CN201520017324 U CN 201520017324U CN 204440008 U CN204440008 U CN 204440008U
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Abstract
The utility model belongs to the photomechanical manufacturing equipment technical field in figure line face, aims to provide the conjunction beam system that a kind of optical mask chromium plate is repaired, and comprises and closes bundle assembly, polarization beam splitter and light path turnover assembly.The utility model, by arranging in order to the first beam splitting arrangement of the black defect of repairing photomask chromium plate and the second beam splitting arrangement in order to fill up white defect on same equipment platform, and the P-polarisation allowing the first beam splitting arrangement send is gone out by the direct transmission of polarization beam splitter, the S-polarisation also allowing the second beam splitting arrangement send is reflected from the same optical axis of P-polarisation by this polarization beam splitter and goes out, like this, P-polarisation can be realized and S-polarisation penetrates from same optical axis, and via the process of same light path turnover assembly, finally be irradiated on optical mask chromium plate, thus, repairing and/or mending of an optical mask chromium plate all can complete on this conjunction beam system, cost savings manpower and man-hour, also a saving the area occupied of equipment to a certain extent.
Description
Technical field
The utility model belongs to the photomechanical manufacturing equipment technical field in figure line face, relates to the conjunction beam system that a kind of photomask is repaired, and particularly relates to a kind of repairing optical mask chromium plate and conjunction beam system that the technology of mending integrates.
Background technology
As everyone knows, photomask a kind ofly forms light tight image in the Graphic transitions instrument of glass or quartz material base material or masterplate, has now been widely used in the technical field such as chip manufacturing, LCD, PCB.Common photomask mainly contains the classifications such as chromium plate, dry plate, relief printing plate, liquid relief printing plate, but all primarily of substrate and light-proof material two-component composition.For optical mask chromium plate, substrate is made up of the quartz glass of high-purity, antiradar reflectivity, low thermal coefficient of expansion usually, and its light non-transmittable layers is the layers of chrome being plated in thick about 0.1um below glass by the method for sputtering.Inevitably, in the manufacturing process of optical mask chromium plate, due to the impact of the factors such as technique, equipment, environment, the deficiency such as black defect and/or white defect can be there is in the optical mask chromium plate produced for the first time, wherein, for design configuration, so-called black defect refers to there is unnecessary layers of chrome and the light tight region that produces in substrate regions sputtering, accordingly, so-called white defect refers to and lacks layers of chrome in layers of chrome graphics field and the transmission region formed.
In prior art, for overcoming these defects, usually, the equipment repairing optical mask chromium plate with one is needed to gasify unnecessary layers of chrome with repairing photomask chromium plate to black defect laser, accordingly, need another to mend the equipment dialogue defect laser chemistry assistant depositing layers of chrome of optical mask chromium plate to fill up optical mask chromium plate, also, this two procedures of repairing and mend of optical mask chromium plate needs to have come with two different equipment respectively.But, usually, an optical mask chromium plate can have black defect and white defect simultaneously, like this, in the process of repairing optical mask chromium plate, two the different equipment of repairing and mend just needing to use optical mask chromium plate process, and understandably, this just needs an optical mask chromium plate upper and lower twice laser altogether on two distinct devices, obviously, not only labor intensive, also expends man-hour, and the area in whole processing procedure shared by equipment is also larger.
Utility model content
The purpose of this utility model is the conjunction beam system providing a kind of optical mask chromium plate to repair, two procedures of repairing and mend in order to solve existing optical mask chromium plate needs to realize respectively and the labor intensive caused and man-hour with two different equipment, and the technical matters that the area that jointly takies of two equipment is larger.
For solving the problems of the technologies described above, the technical solution adopted in the utility model is: provide the conjunction beam system that a kind of optical mask chromium plate is repaired, this conjunction beam system comprises closing restraints assembly, and described conjunction bundle assembly comprises launching the first beam splitting arrangement of the first beam splitting light and the second beam splitting arrangement in order to launch the second beam splitting light;
This system also comprises polarization beam splitter, in order to directly through described first beam splitting light, and in order to reflect described second beam splitting light and to make the optical axis of the described second beam splitting light reflected be positioned at same axis with the optical axis of the described first beam splitting light appeared from described polarization beam splitter;
This system also comprises light path turnover assembly, and the described first beam splitting light penetrated from described polarization beam splitter in order to auxiliary transmission or described second beam splitting light are to make to be irradiated to optical mask chromium plate.
Further, described first beam splitting arrangement comprise the first laser instrument and in order to adjust the light that described first laser instrument is launched polarization direction to form the first wave plate of described first beam splitting light; Described second beam splitting arrangement comprise second laser and in order to adjust the light that described first laser instrument is launched polarization direction to form the second wave plate of described second beam splitting light.
Further, described first beam splitting arrangement also comprises the first catoptron in order to described first beam splitting light to be reflexed to described polarization beam splitter.
Further, described first beam splitting light is vertically injected and polarization beam splitter described in printing opacity back to front, described second beam splitting light is turned left by the right side and is vertically injected described polarization beam splitter, after described polarization beam splitter reflection, penetrate described polarization beam splitter back to front.
Further, described light path turnover assembly comprises the second catoptron, the first spectroscope, variable gap, the second spectroscope, the 3rd spectroscope and reaction chamber in turn, and the described first beam splitting light penetrated through described polarization beam splitter or described second beam splitting light are irradiated on this optical mask chromium plate through described second catoptron, the first spectroscope, variable gap, the second spectroscope, the 3rd spectroscope and reaction chamber successively.
Further, this conjunction beam system also comprises indirect illumination assembly, described indirect illumination assembly comprise in turn launching the first illuminating ray the first pointolite, in order to this first illuminating ray of transmission the first lens, in order to reflect this first illuminating ray the 3rd catoptron and in order to this first illuminating ray to be transmitted through described 3rd spectroscopical second lens.
Further, this conjunction beam system also comprises guidance lighting assembly, described guidance lighting assembly comprise in turn launching the second illuminating ray second point light source and in order to this second illuminating ray to be transmitted through described first spectroscopical 3rd lens.
Further, this conjunction beam system also comprises micro-imaging assembly, described micro-imaging assembly comprises imager in turn, in order to described first illuminating ray that reflects the 4th catoptron in described first illuminating ray or described second illuminating ray to described imager and go out from described second dichroic mirror in order to transmission or described second illuminating ray to the 4th lens described 4th catoptron.
Further, described polarization beam splitter is polarization splitting prism.
Further, described first beam splitting light is P-polarisation, and described second beam splitting light is S-polarisation.
Compared with prior art, the beneficial effect of the conjunction beam system that the optical mask chromium plate that the utility model provides is repaired is:
By both having arranged the first beam splitting arrangement of the black defect in order to repairing photomask chromium plate on same equipment platform, second beam splitting arrangement of the white defect filling up optical mask chromium plate is also set, and the P-polarisation allowing the first beam splitting arrangement send is gone out by the direct transmission of polarization beam splitter (as polarization splitting prism), the S-polarisation also allowing the second beam splitting arrangement send is reflected from the same optical axis of above-mentioned P-polarisation by this polarization beam splitter and goes out, like this, P-polarisation can be realized and S-polarisation penetrates from same optical axis, and via the process of same light path turnover assembly, finally be irradiated on optical mask chromium plate, thus, repairing and/or mending of an optical mask chromium plate all can complete on this conjunction beam system, cost savings manpower and man-hour, also a saving the area occupied of equipment to a certain extent.
Accompanying drawing explanation
Fig. 1 is the planar structure schematic diagram of the conjunction beam system that in the utility model embodiment, optical mask chromium plate is repaired;
Fig. 2 is the conjunction light principle schematic optical axis of P-polarisation and S-polarisation being incorporated into the solid on same straight line of polarization beam splitter in the conjunction beam system that in the utility model embodiment, optical mask chromium plate is repaired;
Fig. 3 is the vertical view of Fig. 2;
Fig. 4 is the planar structure simplified schematic diagram of the conjunction bundle assembly of the conjunction beam system that in the utility model embodiment, optical mask chromium plate is repaired;
Fig. 5 is the planar structure simplified schematic diagram of the indirect illumination assembly of the conjunction beam system that in the utility model embodiment, optical mask chromium plate is repaired;
Fig. 6 is the planar structure simplified schematic diagram of the guidance lighting assembly of the conjunction beam system that in the utility model embodiment, optical mask chromium plate is repaired;
Fig. 7 is the planar structure simplified schematic diagram of the micro-imaging assembly of the conjunction beam system that in the utility model embodiment, optical mask chromium plate is repaired;
Label in accompanying drawing is as follows:
0 optical mask chromium plate;
1 closes bundle assembly, 11 first beam splitting arrangements, 111 first laser instruments, 1,111 first beam splitting light, 112 first wave plates, 113 first catoptrons;
12 second beam splitting arrangements, 121 second lasers, 1,211 second beam splitting light, 122 second wave plates;
2 polarization beam splitter;
3 light path turnover assembly, 31 second catoptrons, 32 first spectroscopes, 33 variable gaps, 34 second spectroscopes, 35 pipe mirrors, 36 the 3rd spectroscopes, 37 object lens, 38 reaction chambers;
4 indirect illumination assemblies, 41 first pointolites, 42 first lens, 43 the 3rd catoptrons, 44 second lens;
5 guidance lighting assemblies, 51 second point light sources, 52 the 3rd lens;
6 micro-imaging assemblies, 61 imagers, 62 the 4th catoptrons, 63 the 4th lens.
Embodiment
In order to make technical matters to be solved of the present utility model, technical scheme and advantage clearly understand, below in conjunction with drawings and Examples, the utility model is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the utility model, and be not used in restriction the utility model.
Below in conjunction with concrete accompanying drawing, realization of the present utility model is described in detail.
It should be noted that, when parts are called as " being fixed on " or " being arranged at " another parts, it can directly on another parts or may there are parts placed in the middle simultaneously.When parts are known as " being connected to " another parts, it can be directly connected to another parts or may there are parts placed in the middle simultaneously.
Also it should be noted that, the corresponding same or analogous parts of same or analogous label in the accompanying drawing of the utility model embodiment, in description of the present utility model, it will be appreciated that, if have term " on ", D score, " left side ", orientation or the position relationship of the instruction such as " right side " are based on orientation shown in the drawings or position relationship, only the utility model and simplified characterization for convenience of description, instead of indicate or imply that the device of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore, the term of position relationship is described only for exemplary illustration in accompanying drawing, the restriction to this patent can not be interpreted as, for the ordinary skill in the art, the concrete meaning of above-mentioned term can be understood as the case may be.
As shown in Fig. 1 ~ Fig. 7, it is the conjunction beam system of a kind of optical mask chromium plate repairing that the utility model one preferred embodiment provides.
As shown in Fig. 1 ~ Fig. 7, the conjunction beam system that this optical mask chromium plate is repaired comprises closing restraints assembly 1, this conjunction bundle assembly 1 comprises the first beam splitting arrangement 11 and the second beam splitting arrangement 12, it should be noted that, in fact, according to the difference of the light that the first beam splitting arrangement 11 and the second beam splitting arrangement 12 are launched, first beam splitting arrangement 11 can in order to fill up white defect, accordingly, second beam splitting arrangement 12 can in order to repair black defect, but usually, particularly in the present embodiment, first beam splitting arrangement 11 mainly falls with gasification the black defect that unnecessary layers of chrome carrys out repairing photomask chromium plate 0 in order to launch the first beam splitting light 1111, accordingly, second beam splitting arrangement 12 is main in order to launch the second beam splitting light 1211 with chemical assistant depositing layers of chrome to fill up the white defect of optical mask chromium plate 0, thus, also this conjunction beam system will be introduced for this kind of situation herein.
In the present embodiment, penetrate for ease of the first beam splitting light 1111 and the second beam splitting light 1211 are incorporated on same optical axis, this system also comprises polarization beam splitter 2, wherein, first beam splitting light 1111 can directly through polarization beam splitter 2, moreover, second beam splitting light 1211 penetrates after polarization beam splitter 2 reflects again, and the optical axis that the second beam splitting light 1211 penetrates after reflection is positioned at same axis with the optical axis of the first beam splitting light 1111 appeared from polarization beam splitter 2, like this, first beam splitting light 1111 and the second beam splitting light 1211 can be incorporated on same optical axis.
In addition, in the present embodiment, the the first beam splitting light 1111 penetrated from polarization beam splitter 2 for ease of auxiliary transmission or the second beam splitting light 1211 all can be irradiated to optical mask chromium plate 0 to make them, indispensablely, this system also comprises light path turnover assembly 3, understandably, the the first beam splitting light 1111 sent through polarization beam splitter 2 can be irradiated on optical mask chromium plate 0 through this light path turnover assembly 3, accordingly, the second beam splitting light 1211 also can be irradiated on optical mask chromium plate 0 through this light path turnover assembly 3.
Also understandably, after first beam splitting light 1111 or the second beam splitting light 1211 send from polarization beam splitter 2 not only can common optical pathways turnover assembly 3, also can share other parts in this conjunction beam system, obviously, the reparation of optical mask chromium plate 0 and the operation filled up can be incorporated in this conjunction beam system in this way.Wherein, about the first beam splitting light 1111 and the second beam splitting light 1211 close the schematic diagram of bundle as shown in Figures 2 and 3.
It should be noted that, in the present embodiment, preferably, the first beam splitting light 1111 is parallel polarized light (being called for short P-polarisation), and the second beam splitting light 1211 is orthogonal polarized light (being called for short S-polarisation), and polarization beam splitter 2 is polarization splitting prism.
Further, as shown in Figure 1 and Figure 4, in the preferred embodiment that the utility model provides, first beam splitting arrangement 11 comprises the light (as linearly polarized laser) that the first laser instrument 111 and the first wave plate 112, first laser instrument 111 launch can form the first beam splitting light 1111 (as P-polarisation) after the first wave plate 112 adjusts polarization direction.Again as shown in Figure 1 and Figure 4, second beam splitting arrangement 12 comprises second laser 121 and the second wave plate 122, and the light (as linearly polarized laser) that second laser 121 is launched can form the second beam splitting light 1211 (as S-polarisation) after the second wave plate 122 adjusts polarization direction.
Wherein, in the present embodiment, preferably, first wave plate 112 and the second wave plate 122 are zero-order half-wave sheet, and the first wave plate 112 is identical with the second wave plate 122, understandably, in the present embodiment, only the linearly polarized laser that the first laser instrument 111 sends can be adjusted to P-polarisation to suitable position by the zero-order half-wave sheet that need adjust on the first beam splitting arrangement, in like manner, only the linearly polarized laser that second laser 121 sends can be adjusted to S-polarisation to suitable position by the zero-order half-wave sheet that need adjust on the second beam splitting arrangement.
Further, as shown in Figure 1 and Figure 4, in the preferred embodiment that the utility model provides, for ease of being directed on polarization beam splitter 2 by adjusting the P-polarisation behind polarization direction through the first wave plate 112, first beam splitting arrangement 11 also comprises the first catoptron 113, like this, the first beam splitting light 1111 (as P-polarisation) is direct through polarization beam splitter 2 after the first catoptron 113 reflects.In the present embodiment, the second beam splitting light 1211 (as S-polarisation) formed after adjusting polarization direction by the second wave plate 122 directly reflects through polarization beam splitter 2.
Specifically in the present embodiment, again as shown in Figure 1 and Figure 4, preferably, first beam splitting light 1111 is vertically injected and printing opacity polarization beam splitter 2 back to front, second beam splitting light 1211 is turned left by the right side and is vertically injected polarization beam splitter 2, penetrates polarization beam splitter 2 back to front, be also after polarization beam splitter 2 reflects, second beam splitting light 1211 is after polarization beam splitter 2 reflects, and the turnover of its optical axis has 90 °.It should be noted that, the deflection angle of the first catoptron 113 and the second catoptron 31 can be determined according to the installation site of each parts of reality, also be, in whole debug process, in time adjust the position of the first catoptron 113 by actual needs, finally make the first beam splitting light 1111 of being sent by polarization beam splitter 2 and the optical axis both the second beam splitting light 1211 to unify.
Further, as shown in Figure 1 and Figure 4, in the preferred embodiment that the utility model provides, light path turnover assembly 3 comprises the second catoptron 31, first spectroscope 32, variable gap 33, second spectroscope 34, the 3rd spectroscope 36 and reaction chamber 38 in turn, and the first beam splitting light 1111 penetrated through polarization beam splitter 2 or the second beam splitting light 1211 are irradiated on this optical mask chromium plate 0 through the second catoptron 31, first spectroscope 32, variable gap 33, second spectroscope 34, the 3rd spectroscope 36 and reaction chamber 38 successively.It should be noted that, specifically in the present embodiment, preferably, between the second spectroscope 34 and the 3rd spectroscope 36, be also provided with pipe mirror 35, between the 3rd spectroscope 36 and reaction chamber 38, be also provided with object lens 37.
Also it should be noted that, in the present embodiment, by time adjusting the size in the gap of variable gap 33, in time can regulate the distribution of the first beam splitting light 1111 or the second beam splitting light 1211, to adapt to the region repaired or fill up.In addition, when filling up white defect, need the chromium metallic compound of the gaseous state providing certain flow in reaction chamber 38 for photochemistry assistant depositing layers of chrome, but when repairing black defect, reaction chamber 38 is only an optical channel.
Further, as shown in Figure 1 and Figure 5, in the preferred embodiment that the utility model provides, this conjunction beam system also comprises indirect illumination assembly 4, wherein, this indirect illumination assembly 4 comprises the first pointolite 41, first lens 42, the 3rd catoptron 43 and the second lens 44 in turn.For ease of for optical mask chromium plate 0 reparation or fill up illumination be provided, the first illuminating ray (not shown) that first pointolite 41 is launched successively after the process of the first lens 42, the 3rd catoptron 43 and the second lens 44, then reflects via the 3rd spectroscope 36 and is finally irradiated on this optical mask chromium plate 0.
Specifically in the present embodiment, first pointolite 41 is a LED point light source, the first illuminating ray (not shown) that this LED point light source sends is through after the first lens 42, reflected by the 3rd catoptron 43 again, then after appeared by the second lens 44, reflect finally by the 3rd spectroscope 36, enter in object lens 37, and be irradiated on optical mask chromium plate 0 by reaction chamber 38, and reflected by optical mask chromium plate 0, realize the effect to optical mask chromium plate 0 illumination with this.
Further, as shown in figures 1 to 6, in the preferred embodiment that the utility model provides, this conjunction beam system also comprises guidance lighting assembly 5, it should be noted that, usually because of the black defect on optical mask chromium plate 0 or white defect area occupied smaller, thus, for ease of aiming at the white defect that the black defect that need repair maybe needs to fill up, this guidance lighting assembly 5 is main in order to indicate the first beam splitting light 1111 or the particular location of the second beam splitting light 1211 on optical mask chromium plate 0.
Again as shown in figures 1 to 6, in the present embodiment, this guidance lighting assembly 5 comprises second point light source 51 and the 3rd lens 52 in turn, for ease of indicating black defect on optical mask chromium plate 0 or white defect, the second illuminating ray (not shown) that second point light source 51 is launched is successively after the 3rd lens 52 process, enter into variable gap 33 via the first spectroscope 32 reflection again, and finally image on this optical mask chromium plate 0.
Specifically in the present embodiment, second point light source 51 is a LED point light source, the second illuminating ray (not shown) that this LED point light source sends is through after the 3rd lens 52, through after variable gap 33 after directly reflecting via the first spectroscope 32, again sequentially through the second spectroscope 34, pipe mirror 35, the 3rd spectroscope 36, object lens 37 and reaction chamber 38, and final irradiation is imaged onto on optical mask chromium plate 0.
Further, as shown in Figure 1 and Figure 7, in the preferred embodiment that the utility model provides, for ease of finding the particular location of black defect or white defect, and in time check to the reparation situation of black defect or check dialogue defect fill up situation, this conjunction beam system also comprises micro-imaging assembly 6, wherein, this micro-imaging assembly 6 comprises imager 61 in turn, 4th catoptron 62 and the 4th lens 63, obviously, the first illuminating ray (not shown) that first pointolite 41 is launched and the second illuminating ray (not shown) that second point light source 51 is launched all from optical mask chromium plate 0 successively through reaction chamber 38, 3rd spectroscope 36, second spectroscope 34, 4th lens 63 and the 4th catoptron 62, and finally image on imager 61.
Specifically in the present embodiment, the first illuminating ray (not shown) that first pointolite 41 is launched and the second illuminating ray (not shown) that second point light source 51 sends are all from axis reflector optical mask chromium plate 0 after going out, in turn through reaction chamber 38, object lens 37, the 3rd spectroscope 36, pipe mirror 35 to reflect to be irradiated to the 4th lens 63 from the second spectroscope 34, by the 4th lens 63 transmission, after going out, warp is reflected by the 4th catoptron 62, and enter in imager 61, finally image on imager 61.In the present embodiment, preferably, this imager 61 is CCD camera.
The foregoing is only preferred embodiment of the present utility model, be not limited to the utility model.For a person skilled in the art, the utility model can have various modifications and variations.All within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within right of the present utility model.
Claims (10)
1. the conjunction beam system of optical mask chromium plate repairing, is characterized in that: comprise and close bundle assembly, described conjunction bundle assembly comprises launching the first beam splitting arrangement of the first beam splitting light and the second beam splitting arrangement in order to launch the second beam splitting light;
This system also comprises polarization beam splitter, in order to directly through described first beam splitting light, and in order to reflect described second beam splitting light and to make the optical axis of the described second beam splitting light reflected be positioned at same axis with the optical axis of the described first beam splitting light appeared from described polarization beam splitter;
This system also comprises light path turnover assembly, and the described first beam splitting light penetrated from described polarization beam splitter in order to auxiliary transmission or described second beam splitting light are to make to be irradiated to optical mask chromium plate.
2. the conjunction beam system repaired of optical mask chromium plate as claimed in claim 1, is characterized in that: described first beam splitting arrangement comprise the first laser instrument and in order to adjust the light that described first laser instrument is launched polarization direction to form the first wave plate of described first beam splitting light; Described second beam splitting arrangement comprise second laser and in order to adjust the light that described first laser instrument is launched polarization direction to form the second wave plate of described second beam splitting light.
3. the conjunction beam system of optical mask chromium plate repairing as claimed in claim 2, is characterized in that: described first beam splitting arrangement also comprises the first catoptron in order to described first beam splitting light to be reflexed to described polarization beam splitter.
4. the conjunction beam system of optical mask chromium plate repairing as claimed in claim 3, it is characterized in that: described first beam splitting light is vertically injected and polarization beam splitter described in printing opacity back to front, described second beam splitting light is turned left by the right side and is vertically injected described polarization beam splitter, after described polarization beam splitter reflection, penetrate described polarization beam splitter back to front.
5. the conjunction beam system that the optical mask chromium plate as described in claim 3 or 4 is repaired, it is characterized in that: described light path turnover assembly comprises the second catoptron, the first spectroscope, variable gap, the second spectroscope, the 3rd spectroscope and reaction chamber in turn, and the described first beam splitting light penetrated through described polarization beam splitter or described second beam splitting light are irradiated on this optical mask chromium plate through described second catoptron, the first spectroscope, variable gap, the second spectroscope, the 3rd spectroscope and reaction chamber successively.
6. the conjunction beam system of optical mask chromium plate repairing as claimed in claim 5, it is characterized in that: this conjunction beam system also comprises indirect illumination assembly, described indirect illumination assembly comprise in turn launching the first illuminating ray the first pointolite, in order to this first illuminating ray of transmission the first lens, in order to reflect this first illuminating ray the 3rd catoptron and in order to this first illuminating ray to be transmitted through described 3rd spectroscopical second lens.
7. the conjunction beam system of optical mask chromium plate repairing as claimed in claim 6, it is characterized in that: this conjunction beam system also comprises guidance lighting assembly, described guidance lighting assembly comprise in turn launching the second illuminating ray second point light source and in order to this second illuminating ray to be transmitted through described first spectroscopical 3rd lens.
8. the conjunction beam system of optical mask chromium plate repairing as claimed in claim 7, it is characterized in that: this conjunction beam system also comprises micro-imaging assembly, described micro-imaging assembly comprise imager in turn, in order to described first illuminating ray that reflects the 4th catoptron in described first illuminating ray or described second illuminating ray to described imager and go out from described second dichroic mirror in order to transmission or described second illuminating ray to the 4th lens described 4th catoptron.
9. the conjunction beam system that the optical mask chromium plate as described in any one of claim 1 to 8 is repaired, is characterized in that: described polarization beam splitter is polarization splitting prism.
10. the conjunction beam system that the optical mask chromium plate as described in any one of claim 1 to 8 is repaired, it is characterized in that: described first beam splitting light is P-polarisation, described second beam splitting light is S-polarisation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520017324.6U CN204440008U (en) | 2015-01-09 | 2015-01-09 | The conjunction beam system that optical mask chromium plate is repaired |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201520017324.6U CN204440008U (en) | 2015-01-09 | 2015-01-09 | The conjunction beam system that optical mask chromium plate is repaired |
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| CN204440008U true CN204440008U (en) | 2015-07-01 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107678244A (en) * | 2017-09-26 | 2018-02-09 | 深圳清溢光电股份有限公司 | A kind of pellicle mask LCVD patch systems |
| CN109488892A (en) * | 2017-09-12 | 2019-03-19 | 法雷奥照明公司 | For obtaining the method for closing the form lighting device different from form is opened |
| CN112171051A (en) * | 2019-07-03 | 2021-01-05 | Hb技术有限公司 | Laser repairing device and method for eliminating lens chromatic aberration |
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2015
- 2015-01-09 CN CN201520017324.6U patent/CN204440008U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109488892A (en) * | 2017-09-12 | 2019-03-19 | 法雷奥照明公司 | For obtaining the method for closing the form lighting device different from form is opened |
| CN107678244A (en) * | 2017-09-26 | 2018-02-09 | 深圳清溢光电股份有限公司 | A kind of pellicle mask LCVD patch systems |
| CN112171051A (en) * | 2019-07-03 | 2021-01-05 | Hb技术有限公司 | Laser repairing device and method for eliminating lens chromatic aberration |
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