CN204391146U - A kind of wet-method etching device - Google Patents
A kind of wet-method etching device Download PDFInfo
- Publication number
- CN204391146U CN204391146U CN201520127894.0U CN201520127894U CN204391146U CN 204391146 U CN204391146 U CN 204391146U CN 201520127894 U CN201520127894 U CN 201520127894U CN 204391146 U CN204391146 U CN 204391146U
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- CN
- China
- Prior art keywords
- outage
- drain pipe
- wet
- etching device
- circulating pump
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- Expired - Fee Related
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a kind of wet-method etching device, comprise reservoir, texturing slot and circulating pump, in described texturing slot, be provided with at least 2 drain pipes, and one end of drain pipe is communicated with reservoir by circulating pump; Described drain pipe is provided with a plurality of outage along its length, and is greater than the quantity of the outage of adjacent circulation pump one end away from the quantity of the outage of circulating pump one end.The utility model is by arranging many discharging tubes and outage, and make each several part fluid pressure consistent by the quantity of outage with position arrangement, liquid is mixed more mix, the uniformity of effective increase liquid circulation, improve matte uniformity, Reducing thickness effectively between control Dao Yu road, reduces, because corroding the aberration and efficiency fluctuation that instability causes, to achieve significant effect.
Description
Technical field
The utility model relates to solar cell and manufactures field, is specifically related to a kind of wet-method etching device.
Background technology
Conventional fossil fuel approach exhaustion day by day, in all sustainable energies, solar energy is undoubtedly the most clean, the most general and most potential alternative energy source of one.Photovoltaic generation is one of generation technology of most sustainable development desired characteristics.At present, in all solar cells, silicon solar cell is one of solar cell obtaining business promotion on a large scale, this is because silicon materials have very abundant reserves in the earth's crust, the solar cell of other types compared by silicon solar cell simultaneously, has excellent electric property and mechanical performance.In the development of following photovoltaic technology, along with the further raising of silicon solar cell photoelectric properties, the further reduction of silicon materials price, silicon solar cell will occupy consequence at photovoltaic art.In the development of following photovoltaic technology, along with the further raising of silicon solar cell photoelectric properties and the further reduction of silicon materials price, the human cost of equipment is particularly important, and the efficiency optimizing the cell piece technological process of production will become one of key means of controlling cost.
In existing solar cell preparation technology, wet-method texturing manufacturing process is the first step, and this processing step is the sunken light suede structure in order to form antiradar reflectivity, improves the utilance of sunlight.Existing wet-method etching device mainly comprises reservoir, texturing slot and circulating pump, reservoir and texturing slot are disposed adjacent, and on the sidewall of reservoir, be provided with multiple fluid groove port, circulating pump is utilized to be drained into texturing slot by the reactant liquor of reservoir from liquid outlet, the transmission (namely relying on the pressure of circulating pump to push away liquid forward) of realization response liquid.
But, practical application finds, because fluid groove port is arranged on the rear of texturing slot, the moiety concentrations of the reactant liquor in fluid process in texturing slot differs greatly, before causing texturing slot, post-reacted degree is uneven, this not only can cause Reducing thickness to change greatly, wayward, and easily causes aberration because corroding uneven.
Therefore, develop a kind of wet-method etching device, improve the uniformity of making herbs into wool, Reducing thickness is changed less, and reduce because corroding the uneven aberration caused, obviously there is positive realistic meaning.
Summary of the invention
The purpose of this utility model is to provide a kind of wet-method etching device.
To achieve the above object of the invention, the technical solution adopted in the utility model is: a kind of wet-method etching device, comprises reservoir, texturing slot and circulating pump, is provided with at least 2 drain pipes in described texturing slot, and one end of drain pipe is communicated with reservoir by circulating pump;
Described drain pipe is provided with a plurality of outage along its length, and is greater than the quantity of the outage of adjacent circulation pump one end away from the quantity of the outage of circulating pump one end.
Above, one end of described drain pipe is communicated with reservoir by circulating pump, and the reactant liquor namely in reservoir squeezes into drain pipe by circulating pump, then enters in texturing slot through outage.The quantity of outage is consistent in order to ensure each several part fluid pressure with position arrangement, liquid is mixed and more mixes, finally reach the object improving making herbs into wool uniformity.
Preferably, the quantity of described drain pipe is 4 ~ 6, and drain pipe is distributed in texturing slot.Preferably, the quantity of drain pipe is 5.
Preferably, described drain pipe is provided with along its length the parallel outage of 2 rows.
Preferably, the outage in drain pipe radial direction is uniformly distributed, and the spacing between adjacent drainage hole is less than or equal to 12.5 mm.
In technique scheme, the angle between the plane at described outage place and horizontal plane is more than or equal to 60 degree and is less than 90 degree.
In technique scheme, the aperture of described outage is 1 ~ 3 mm.Preferably 2 mm.
Preferably, the quantity of the described outage away from circulating pump one end is 2 times of the quantity of the outage of adjacent circulation pump one end.
In technique scheme, the caliber of described drain pipe is 15 ~ 25 mm.
Because technique scheme is used, the utility model compared with prior art has following advantages:
1. the utility model devises a kind of wet-method etching device, by arranging many discharging tubes and outage, and make each several part fluid pressure consistent by the quantity of outage with position arrangement, liquid is mixed more mix, the uniformity of effective increase liquid circulation, improves matte uniformity, the Reducing thickness effectively between control Dao Yu road, reduce, because corroding the aberration and efficiency fluctuation that instability causes, to achieve significant effect;
2. the utility model effectively can increase the uniformity of liquid circulation, can also reduce energy consumption simultaneously, reduce the use amount of chemicals, thus greatly saved cost, have positive realistic meaning;
3. structure of the present utility model is simple, and be easy to preparation, cost is lower, is suitable for applying.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model embodiment one.
Fig. 2 is the A portion enlarged drawing of Fig. 1.
Wherein: 1, reservoir; 2, texturing slot; 3, drain pipe; 4, outage.
Embodiment
Below in conjunction with drawings and Examples, the utility model is further described:
Embodiment one:
Shown in Fig. 1 ~ 2, a kind of wet-method etching device, comprises reservoir 1, texturing slot 2 and circulating pump, be provided with 5 drain pipes 3, and one end of drain pipe is communicated with in described texturing slot with reservoir by circulating pump;
Described drain pipe is provided with along its length a plurality of outage 4, and is greater than the quantity of the outage of adjacent circulation pump one end away from the quantity of the outage of circulating pump one end.
Described 5 drain pipes are distributed in texturing slot.The overall length of every root drain pipe is 2.9 m, and the caliber of described drain pipe is 20 mm.
Described drain pipe is provided with along its length the parallel outage of 2 rows.Along drain pipe length direction, the quantity away from end outage is 36, and the quantity near end outage is 18.Angle between the plane at described outage place and horizontal plane is more than or equal to 60 degree.The aperture of described outage is 2 mm.Outage in drain pipe radial direction is uniformly distributed, and the spacing between adjacent drainage hole is 10 mm.
Above, one end of described drain pipe is communicated with reservoir by circulating pump, and the reactant liquor namely in reservoir squeezes into drain pipe by circulating pump, then enters in texturing slot through outage.The quantity of outage is consistent in order to ensure each several part fluid pressure with position arrangement, liquid is mixed and more mixes, finally reach the object improving making herbs into wool uniformity.
Claims (8)
1. a wet-method etching device, comprise reservoir (1), texturing slot (2) and circulating pump, it is characterized in that: be provided with at least 2 drain pipes (3) in described texturing slot, and one end of drain pipe is communicated with reservoir by circulating pump;
Described drain pipe is provided with along its length a plurality of outage (4), and is greater than the quantity of the outage of adjacent circulation pump one end away from the quantity of the outage of circulating pump one end.
2. wet-method etching device according to claim 1, is characterized in that: the quantity of described drain pipe is 4 ~ 6, and drain pipe is distributed in texturing slot.
3. wet-method etching device according to claim 1, is characterized in that: described drain pipe is provided with along its length the parallel outage of 2 rows.
4. wet-method etching device according to claim 3, it is characterized in that: the outage in drain pipe radial direction is uniformly distributed, and the spacing between adjacent drainage hole is less than or equal to 12.5mm.
5. wet-method etching device according to claim 3, is characterized in that: the angle between the plane at described outage place and horizontal plane is more than or equal to 60 degree and is less than 90 degree.
6. wet-method etching device according to claim 1, is characterized in that: the aperture of described outage is 1 ~ 3 mm.
7. wet-method etching device according to claim 1, is characterized in that: the quantity of the described outage away from circulating pump one end is 2 times of the quantity of the outage of adjacent circulation pump one end.
8. wet-method etching device according to claim 1, is characterized in that: the caliber of described drain pipe is 15 ~ 25 mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520127894.0U CN204391146U (en) | 2015-03-05 | 2015-03-05 | A kind of wet-method etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520127894.0U CN204391146U (en) | 2015-03-05 | 2015-03-05 | A kind of wet-method etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204391146U true CN204391146U (en) | 2015-06-10 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520127894.0U Expired - Fee Related CN204391146U (en) | 2015-03-05 | 2015-03-05 | A kind of wet-method etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204391146U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018201283A1 (en) * | 2017-05-02 | 2018-11-08 | 优信电子（香港）有限公司 | Solar panel cleaning apparatus |
-
2015
- 2015-03-05 CN CN201520127894.0U patent/CN204391146U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018201283A1 (en) * | 2017-05-02 | 2018-11-08 | 优信电子（香港）有限公司 | Solar panel cleaning apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150610 Termination date: 20170305 |
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| CF01 | Termination of patent right due to non-payment of annual fee |