CN204241988U - Photoresistance pre-baking oven heter temperature control device - Google Patents
Photoresistance pre-baking oven heter temperature control device Download PDFInfo
- Publication number
- CN204241988U CN204241988U CN201420635826.0U CN201420635826U CN204241988U CN 204241988 U CN204241988 U CN 204241988U CN 201420635826 U CN201420635826 U CN 201420635826U CN 204241988 U CN204241988 U CN 204241988U
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- hot plate
- temperature
- well heater
- cavity
- photoresistance
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Abstract
The utility model relates to a kind of photoresistance pre-baking oven heter temperature control device, refer to that one is used in the pre-baking oven heating arrangement of photoresistance on liquid crystal indicator (LCD) processing procedure especially, the hot plate of heating region can be made to reach samming, with improving product quality and production qualification rate.It formed primarily of cavity, well heater, hot plate and temperature inductor, this cavity is a tank shape, be positioned at above support baseboard and be provided with well heater, and can heat hot plate, and in this hot plate, be provided with a plurality of temperature inductor, to detect the temperature in each region of hot plate, recycle temperature that each temperature inductor detects as with reference to value, to adjust the temperature of well heater, making hot plate central authorities, ring limit or hold the temperature on limit consistent, can reach thermally equivalent by being positioned over the glass substrate that hot plate toasts.
Description
Technical field
The utility model relates to a kind of photoresistance pre-baking oven heter temperature control device, and it utilizes a plurality of temperature inductor, makes the homogeneous temperature of hotplate surface consistent to adjust well heater.
Background technology
Press, glass substrate is the main processing procedure raw material of liquid crystal indicator (TFT-LCD), the female glass be commonly called as exactly or plain glass, it is a kind of high-accuracy transparent electronic component, role is like being wafer in semiconductor industry in liquid crystal indicator (TFT-LCD) industry for glass, and therefore liquid crystal indicator (TFT-LCD) industry is to the requirement almost Perfect of glass baseplate surface precision.
Secondly, the processing procedure of liquid crystal indicator (TFT-LCD) utilizes two pieces of alkali-free glass substrates respectively, in alkali-free glass substrate surface structure dress chromatic color filter and IC circuit, and by glass baseplate surface through dry-etching, by red, blue, green three primary colors and black build in glass surface with fine structure, become chromatic color filter, IC driving circuit then utilizes manufacture of semiconductor, again cmos circuit is built in glass surface, the function of glass substrate is the loading material as chromatic color filter and IC driving circuit, and liquid crystal indicator (TFT-LCD) processing procedure needs vacuum evaporation and etching, so glass substrate, the corrosion of strong acid and strong base must be stood, the processing environment of high temperature, and very accurate surface smoothness and plane waviness must be possessed.
Therefore, glass substrate each flow process is in the fabrication process very meticulous, wherein, after smearing photoresistance liquid, need through overbaking by chemical substance volatilizations such as emulsion and photoresistance liquid, now, shown in Fig. 1, when this substrate 1 toasts, before this substrate 1 was placed on hot plate 11, rely on the temperature of hot plate 11 that the chemical substance on glass substrate 1 surface is volatilized again, in the process, 70 ~ 150 DEG C about Celsius of its temperatures as high, and the thermal source of hot plate 11 comes from the well heater 12 of bottom, this well heater 12 is then arranged on below hot plate 11 with 1 ~ 15 region, make hot plate 11 central authorities, the temperature can kept in balance in ring limit or end limit as far as possible, but, although hot plate 11 has arranged 1 ~ 15 region carry out control temperature, but still samming cannot be kept in bake process, add that the temperature of each adjacent area can interfere with each other, make cured effect not good, and affect the production quality of liquid crystal indicator.
In view of this, inventor improves for heating arrangement especially, and research and development are a kind of relies on input multimetering temperature to make single heating device can carry out more accurate temperature to control, to promote the temperature control precision in heating region, can carry out faster returning back in setting range when heating region is in temperature departure setting value, to increase the uniform temperature of hot plate, and improve production qualification rate, showing is a desirable structure for photoresistance pre-baking oven hot plate heating property performance boost and the improvement of control mode.
Utility model content
The improvement that the heating properties that the utility model relates to pre-its well heater of baking oven of a kind of photoresistance promotes, refer to that one is used in the pre-baking oven of photoresistance on liquid crystal indicator (LCD) processing procedure especially, the hot plate of heating region can be made to reach samming, with improving product production qualification rate.
For achieving the above object, the technical solution adopted in the utility model is:
A kind of photoresistance pre-baking oven heter temperature control device, it is primarily of cavity, well heater, hot plate and temperature inductor formed, this cavity is tank shape, bottom is provided with a support baseboard, top end face utilizes upper cover plate to be closed into a heating space, and this cavity side is provided with entrance, for inserting glass substrate, exhaust outlet is offered at the arbitrary side of this cavity, and this support baseboard is provided with well heater, it utilizes heating wire to produce thermal source, and a hot plate is set on the heaters, this hot plate is the sheet metal with thermal conductivity, it is characterized in that: this hot plate is divided into and has a plurality of little subregion, it is projected on the hot plate back side by a plurality of independently well heater and produces, make well heater distinctly can carry out independent heating to each little subregion, and a plurality of temperature inductor is provided with in each little subregion or in the well heater of corresponding little subregion, to detect the temperature of the hot plate in each little subregion, and whether adjust the heating of well heater with this reference data.
In described photoresistance pre-baking oven heter temperature control device: this hot plate is divided into 16 to 60 little subregions, is provided with corresponding well heater separately bottom the little subregion of hot plate.
When carrying out baking operation in the pre-baked furnace cavity of photoresistance, first glass substrate is inserted in cavity by entrance, then entrance is closed, cavity is made to form an enclosure space, only retain the exhaust outlet of side, so that air circulation, and be positioned at the hot plate of cavity, heating by well heater, it is made to reach the temperature of about 70 ~ 150 DEG C, glass substrate is carried out heating and makes the solvent in photoresistance volatilize, when after baking a period of time, the temperature of each little subregion of this hot plate has change slightly, in general, be positioned at the temperature of hot plate central authorities usually above end limit, and easily cause the inequality of being heated of glass substrate, the samming now maintaining hot plate is quite important, although hot plate to be divided into the temperature and improving that multi-portion heating can reach little subregion, but adjust for the temperature of the little subregion of hot plate, then need to rely on a plurality of temperature inductors arranged in well heater or hot plate, it to detect the temperature in the hot plate of well heater covering scope, then this well heater is made can to finely tune temperature in this covering scope, the temperature in little subregion corresponding on hot plate is made to reach thermally equivalent, effective improving product production qualification rate.
Accompanying drawing explanation
Fig. 1 is the diagrammatic cross-section of existing baking glass substrate;
Fig. 2 is stereographic map of the present utility model;
Fig. 3 is three-dimensional exploded view of the present utility model;
Fig. 4 is another enforcement illustration of the utility model;
Diagrammatic cross-section when Fig. 5 is the utility model baking;
Fig. 6 is the schematic diagram that the utility model uses;
Fig. 7 is the schematic diagram that the utility model multizone uses.
Description of reference numerals: (prior art) 1-substrate; 11-hot plate; 12-well heater; (the utility model) 2-cavity; 20-upper cover plate; 201-support baseboard; 202-exhaust outlet; 203-entrance; 21-well heater; 22-hot plate; The little subregion of 221-; 23-temperature inductor; 3-glass substrate.
Embodiment
First, refer to Fig. 2 and coordinate shown in Fig. 3, it is primarily of cavity 2, hot plate 22, well heater 21 and temperature inductor 23 formed, this cavity 2 is tank shape, be positioned at bottom and be provided with support baseboard 201, top end face then utilizes upper cover plate 20 to be closed into a heating space, be positioned at cavity 2 side and be provided with entrance 203, for inserting glass substrate 3, and offer exhaust outlet 202 in arbitrary side, and well heater 21 is provided with above support baseboard 201, it utilizes heating wire to produce thermal source, a hot plate 22 is placed again on well heater 21, well heater 21 is made to be arranged on hot plate 22 back side with a plurality of autonomous device, and hot plate 22 is for having the sheet metal of thermal conductivity, and rely on the quantity of well heater 21 to be projected in hot plate 22 back side, and form a plurality of little subregion 221, well heater 21 can be utilized to heat hot plate 22 with partitioned mode, especially well heater 21 is all that independently temperature controls, so the temperature of each little subregion 221 can distinctly set, especially a plurality of temperature inductor 23 is set in hot plate 22 and each little subregion 221 thereof, the temperature of diverse location in each little subregion 221 can be detected, and whether adjust the heating of well heater 21 with this reference data, and this temperature inductor 23 also can be arranged in well heater 21, please refer to Fig. 4, this well heater 21 arranges with the quantity of the little subregion 221 of corresponding hot plate 22, the quantity that its each little subregion 221 is arranged is more than one.
When carrying out baking operation in cavity 2, please still consult Fig. 5 and coordinate shown in Fig. 6, first glass substrate 3 is inserted in cavity 2 by entrance 203, then entrance 203 is closed by (please look back shown in Fig. 4), cavity 2 is made to form an enclosure space, only retain the exhaust outlet 202 of side, so that air circulates, and be positioned at hot plate 22 the heating by well heater 21 of cavity 2, it is made to reach 70 ~ 150 DEG C about Celsius, to make it volatilize the photoresistance solvent on glass substrate 3 surface, when after baking a period of time, shown in Fig. 7, the temperature of each little subregion 221 of this hot plate 22 has change slightly, in general, be positioned at the temperature of little subregion 221 central authorities usually above end limit, and easily cause the inequality of being heated of glass substrate 3, the samming now maintaining little subregion 221 is quite important, although little for well heater subregion 221 to be divided into the temperature and improving that multi-region (16th to 60 district) heating can reach little subregion 221, but control for the temperature of the little subregion 221 of hot plate 22, the a plurality of inductors 23 relying on each little subregion 221 to arrange then are needed to adjust, it is arranged in well heater 21 or in the little subregion 221 of hot plate, and be distributed in the region on ring limit or end limit, to detect little subregion 221 in central authorities, the temperature on ring limit or end limit, and capture the numerical value of each temperature inductor 23, a temperature is obtained again after calculation, now, again according to the temperature of this its corresponding well heater 21 of little subregion 221 of fine tune temperature calculated, the temperature on each little subregion 221 of hot plate 22 is impelled to reach thermally equivalent, the quality of effective lifting glass substrate 3, the heating property of effective lifting glass substrate 3 and production qualification rate, the generation of further reduction disqualification rate.
In sum, the utility model is that in hot plate or below it, each little subregion arranges a plurality of temperature inductor, rely on the temperature detected of temperature inductor to adjust the heter temperature of this little subregion again, each little subregion is made to reach samming, and each little subregion is all that independently temperature controls, so temperature can distinctly set, and the integral surface of hot plate can be made all can to reach homogeneous heating, make the baking temperature of the glass substrate be positioned on hot plate quite consistent, can not be too high or too low, to reach best usefulness.
Claims (2)
1. a photoresistance pre-baking oven heter temperature control device, it is primarily of cavity, well heater, hot plate and temperature inductor formed, this cavity is tank shape, bottom is provided with a support baseboard, top end face utilizes upper cover plate to be closed into a heating space, and this cavity side is provided with entrance, for inserting glass substrate, exhaust outlet is offered at the arbitrary side of this cavity, and this support baseboard is provided with well heater, it utilizes heating wire to produce thermal source, and a hot plate is set on the heaters, this hot plate is the sheet metal with thermal conductivity, it is characterized in that: this hot plate is divided into and has a plurality of little subregion, it is projected on the hot plate back side by a plurality of independently well heater and produces, make well heater distinctly can carry out independent heating to each little subregion, and a plurality of temperature inductor is provided with in each little subregion or in the well heater of corresponding little subregion, to detect the temperature of the hot plate in each little subregion.
2. photoresistance according to claim 1 pre-baking oven heter temperature control device, is characterized in that: this hot plate is divided into 16 to 60 little subregions, is provided with corresponding well heater separately bottom the little subregion of hot plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420635826.0U CN204241988U (en) | 2014-10-29 | 2014-10-29 | Photoresistance pre-baking oven heter temperature control device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420635826.0U CN204241988U (en) | 2014-10-29 | 2014-10-29 | Photoresistance pre-baking oven heter temperature control device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204241988U true CN204241988U (en) | 2015-04-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420635826.0U Expired - Fee Related CN204241988U (en) | 2014-10-29 | 2014-10-29 | Photoresistance pre-baking oven heter temperature control device |
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| Country | Link |
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| CN (1) | CN204241988U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117193434A (en) * | 2023-11-08 | 2023-12-08 | 广州市赛思达机械设备有限公司 | Heating method, device, equipment and medium of commercial box-type electric oven |
-
2014
- 2014-10-29 CN CN201420635826.0U patent/CN204241988U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117193434A (en) * | 2023-11-08 | 2023-12-08 | 广州市赛思达机械设备有限公司 | Heating method, device, equipment and medium of commercial box-type electric oven |
| CN117193434B (en) * | 2023-11-08 | 2024-01-30 | 广州市赛思达机械设备有限公司 | Heating method, device, equipment and medium of commercial box-type electric oven |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150401 Termination date: 20171029 |