CN203930768U - Contact panel - Google Patents
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- CN203930768U CN203930768U CN201420312248.7U CN201420312248U CN203930768U CN 203930768 U CN203930768 U CN 203930768U CN 201420312248 U CN201420312248 U CN 201420312248U CN 203930768 U CN203930768 U CN 203930768U
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Abstract
The utility model provides a kind of contact panel, it comprises one first electrode layer and a second electrode lay, this first electrode layer and the second electrode lay comprise respectively a plurality of the first electrode arrays that are arranged in parallel in a first direction and a plurality of the second electrode array being arranged in parallel in second direction, one first electrode array comprises a plurality of the first conductive units and a plurality of the first wire-connecting, between the first conductive unit on the first electrode array, by a plurality of the first wire-connectings, connect in a first direction, one second electrode array comprises a plurality of the second conductive units and a plurality of the second wire-connecting, between the second conductive unit on one second electrode array, by a plurality of the second wire-connectings, in second direction, connect, the first electrode layer and the second electrode lay are nano-silver thread conductive layer, complementary setting between the first conductive unit and the second conductive unit.This contact panel can effectively reduce the existing mist degree problem of nano-silver thread.
Description
[technical field]
The utility model relates to touch technology field, particularly a kind of contact panel.
[background technology]
At traditional intelligence mobile phone, in the capacitance type touch-control panel of iphone etc., the material of touch-control electrode is generally tin indium oxide (referred to as ITO).The transmittance of ITO is very high, and electric conductivity is better.But the progressively increase along with contact panel size, while being particularly applied to 15 cun of above panels, the defect of ITO is more and more outstanding, wherein the most obvious defect is exactly that the surface resistance of ITO is excessive, expensive, cannot guarantee electric conductivity that large touch panel is good and enough sensitivity, also cannot be applicable to the constantly development trend of low priceization of electronic product.
In addition, in manufacture method, ITO originally needs vacuum chamber, higher depositing temperature and/or high annealing temperature to obtain high conductance, causes the integral manufacturing cost of ITO very expensive.And, a little less than ito thin film is highly brittle, even also very easy destroyed in the bending that runs into less physical stress, under the tide of the emerging produce market therefore emerging gradually at wearable device, ITO material can not have been dealt with the demand in market as conductive material and be eliminated gradually.
In view of ITO exist expensive, resistance is high, complex process, anti-damage poor performance, the shortcoming such as optical appearance is not good enough, contact panel industry is developed more fast, so, we really need to find in a hurry a kind of new material and substitute ITO, at this moment, industry has to sight to invest the material that another kind substitutes ITO: nano-silver thread (silver nano wires is called for short SNW).SNW is a kind of of the current maturation the most of many ITO equivalent material.Nano-silver thread has the good electric conductivity of silver, due to the size effect of its Nano grade, makes it have excellent light transmission and flexible resistance simultaneously, therefore can be used as and preferably substitutes ITO as the material of touch-control electrode.
Yet because the reflecting rate of nano-silver thread is higher, while adopting nano-silver thread conducting film as touch-control electrode, contact panel visually there will be white mist phenomenon, SNW from human eye more close to, reflective more obvious, mist degree problem is also just more outstanding.Particularly, in two-layer electrode structure, when two-layer electrode material is SNW, this mist degree problem can be even more serious.
Generally speaking, the appearance of nano-silver thread conductive material has brought dawn to contact panel industry, but how to overcome the mist degree problem that nano-silver thread exists, and is also worth industry further to be studied.
[utility model content]
For overcoming existing nano-silver thread, substitute the serious problem of mist degree that ITO exists as new conductive material, the utility model provides a kind of new-type contact panel.
The utility model provides a kind of contact panel, this contact panel comprises: one first electrode layer, it is laid on first substrate, this first electrode layer comprises a plurality of the first electrode arrays that are arranged in parallel in a first direction, this first electrode array comprises a plurality of the first conductive units and a plurality of the first wire-connecting, between this first conductive unit, by the plurality of the first wire-connecting, connect in a first direction, the first adjacent conductive unit defines one first vacancy section between two; One the second electrode lay, be laid on second substrate, this the second electrode lay comprises a plurality of the second electrode arrays that are arranged in parallel in second direction, this second electrode array comprises a plurality of the second conductive units and a plurality of the second wire-connecting, between this second conductive unit, by the plurality of the second wire-connecting, in second direction, connects; This first electrode layer and this second electrode lay are nano-silver thread conductive layer, and described the second conductive unit is positioned at the vertical projection district of the first vacancy section on the second electrode lay.
Preferably, shape complementarity between the second conductive unit and the first conductive unit.
Preferably, described the first electrode layer is than the more close touch control operation face of the second electrode lay, and the area of described the second conductive unit is greater than the area of described the first conductive unit.
Preferably, described the second conductive unit area is A, and described the first conductive unit area is B, 1.5≤A/B≤8.
Preferably, described first substrate is cover plate, and described cover plate comprises a touch control operation face and an element installed surface, and described the first electrode layer is laid on described element installed surface.
Preferably, more comprise a cover plate, described cover plate comprises a touch control operation face and element installed surface, and described first substrate is between described element installed surface and described second substrate.
Preferably, described the first electrode layer is between described first substrate and described second substrate, and described the second electrode lay is located at described second substrate away from a side of described element installed surface.
Preferably, described the first electrode layer and described the second electrode lay both sides can arrange adhesion promoting layer, levelling blanket, one or more layers among optical match layer, adhesion promoting layer, levelling blanket, two or three layers of homonymy or heteropleural that can be arranged on the first electrode layer or the second electrode lay among optical match layer, optical match layer, between adhesion promoting layer and levelling blanket three, position is interchangeable.
Preferably, between described first substrate and institute's second substrate, by laminating layer, fit, the refractive index of this laminating layer is 1.52-1.79.
Preferably, described nano-silver thread conductive layer comprises a matrix and is distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, and the thickness of described nano-silver thread conductive layer is 50nm-200nm, and refractive index is 1.35-1.8.
Preferably, described the first electrode layer and the second electrode lay are connected to flexible PCB by bilateral cabling, and this cabling material is nano-silver thread conductive layer and one-body molded be connected the first electrode layer or the second electrode lay with this cabling.
Preferably, the second adjacent conductive unit defines one second vacancy section between two, in the first vacancy section and the second vacancy section, is provided with compensating electrode, and this compensating electrode is nano-silver thread conductive layer.
Preferably, the mutual UNICOM of compensating electrode between two first electrode arrays or between two second electrode arrays or independently of one another setting.
Compared with prior art, the touch-control electrode of the utility model contact panel is by nano-silver thread solution coat is become after nano-silver thread conductive layer, through PROCESS FOR TREATMENT, forms.Between nano-silver thread, by overlap joint, form conductive network, it is low that nano-silver thread has price as touch-control electrode conductive material, resistance is low, the flexible advantage such as good, especially nano-silver thread conductive layer is very thin, it can using differential profiles as bearing bed, and it makes the touch for panel thinner possibility that becomes that becomes to a certain extent.Importantly in the present embodiment, the first conductive unit and the second conductive unit do not have overlapping region between the vertical projection in same level respectively, the second conductive unit is positioned at the vertical projection district of the first vacancy section on the second electrode lay, and the first conductive unit is positioned at the vertical projection district of the second vacancy section on the first electrode layer.Be light when through contact panel, at most only can pass one deck nano-silver thread conductive layer, can effectively reduce the mist degree problem that nano-silver thread produces like this.Best mode is the complementary setting of the first electrode layer and the second electrode lay, and the positive Overlay from contact panel, is equivalent to realize with one deck electrode the configuration of two-layer electrode.Like this, when light passes contact panel, only through one deck electrode layer, medium refraction index remains unchanged substantially, and distribution of light is relatively even, and it can effectively reduce refraction and the scattering of light, thereby reduce the mist degree of nano-silver thread, improve light transmission, make contact panel have good optical appearance.
Especially, in the present embodiment, the area of the second conductive unit is more than or equal to the area of the first conductive unit, meeting under the state of this condition, the second conductive unit can shield the undesired signal that shows module from contact panel below effectively, and it is further promoted contact panel touch-control precision and touch-control degree of stability.
The in the situation that of the first electrode layer and the complementary setting of the second electrode lay, the requirement that it is very high to the precision of technique, especially in the situation that the live width of the first electrode array or the second electrode array is very little, the electrode pattern of traditional ITO conductive material made is difficult to reach this accuracy requirement, even if can, it must adopt gold-tinted technique, gold-tinted manufacturing process is complicated, equipment cost is high, it has hindered the realization of touch-control electrode complementation to a certain extent, and touch-control electrode adopts nano-silver thread conductive layer in the present embodiment, it can adopt simple coating or transfer printing process to replace conventional I TO gold-tinted technique meeting under prerequisite of precision, when it has simplified the manufacture craft of contact panel, equipment cost reduces, it makes more manufacturing enterprise can enter contact panel manufacturing industry.
[accompanying drawing explanation]
Fig. 1 is the cross section structure schematic diagram of the utility model nano-silver thread film.
Fig. 2 is the floor map of the utility model nano-silver thread film.
Fig. 3 is the utility model the first embodiment contact panel layer structure schematic diagram.
Fig. 4 is the utility model the first embodiment contact panel layer structure exploded perspective view, and this contact panel comprises one first electrode layer and a second electrode lay.
Fig. 5 is the floor map of the first electrode layer in Fig. 4, and this first electrode layer comprises a plurality of the first electrode arrays.
Fig. 6 is the planar structure schematic diagram of the first electrode layer and the second electrode lay Overlay in Fig. 4.
Fig. 7 is the Wiring structure schematic diagram of the first electrode layer in Fig. 5.
Fig. 8 is the structural representation of the distressed structure one of the one the first electrode arrays in Fig. 5.
Fig. 9 is the structural representation of another distressed structure of the one the first electrode arrays in Fig. 5.
Figure 10 is the utility model the second embodiment contact panel layer structure schematic diagram.
Figure 11 is the utility model the second embodiment contact panel layer structure exploded perspective view.
Figure 12 is the utility model the 3rd embodiment contact panel layer structure schematic perspective view, and this contact panel comprises one first electrode layer and a second electrode lay, on this first electrode layer, is provided with the first compensating electrode.
Figure 13 is the floor map of the first electrode layer in Figure 12.
Figure 14 is the first electrode layer distressed structure one floor map in Figure 12.
Figure 15 is the floor map of the first electrode layer and the second electrode lay Overlay in Figure 14.
Figure 16 is the first electrode layer distressed structure two floor map in Figure 12.
Figure 17 is the floor map of the first electrode layer and the second electrode lay Overlay in Figure 16.
Figure 18 is the first electrode layer distressed structure three floor map in Figure 12.
Figure 19 is the first electrode layer distressed structure four floor map in Figure 12.
Figure 20 is the utility model the 4th embodiment contact panel layer structure schematic diagram, and it further comprises an adhesion promoting layer.
Figure 21 is the layer structure schematic diagram of the utility model the 5th embodiment tetra-contact panels, and it further comprises a levelling blanket.
Figure 22 is the layer structure schematic diagram of the utility model the 6th embodiment contact panel, and it further comprises an optical match layer.
Figure 23 is the layer structure schematic diagram of the utility model the 7th embodiment contact panel, and it further comprises an adhesion promoting layer, a levelling blanket and an optical match layer.
[embodiment]
In order to make the purpose of this utility model, technical scheme and advantage are clearer, below in conjunction with accompanying drawing and embodiment, the utility model are further elaborated.Should be appreciated that specific embodiment described herein is only in order to explain the utility model, and be not used in restriction the utility model.
Refer to Fig. 1 and Fig. 2, it is the structural representation that dissects of nano-silver thread conductive film 800, it comprises substrate 807 and is produced on the nano-silver thread conductive layer 805 on substrate 807, nano-silver thread conductive layer 805 comprises the many nano-silver threads 801 that are embedded in matrix 803, and nano-silver thread 801 is arranged in matrix 803 and mutually overlaps and form conductive network.Nano-silver thread 801 (silver nano wires, abbreviation SNW) line length is 10-300 μ m, preferred 20-100 μ m, best its length 20-50 μ m, the wire diameter of nano-silver thread 801 (live width in other words) is less than 500nm or is less than 200nm, 100nm, be preferably and be less than 50nm, and its length breadth ratio ratio of wire diameter (line length with) is greater than 10, is preferably greater than 50, more preferably greater than 100.
Substrate 807 is generally transparent insulation material, can be glass, polyimide (Polyimide, PI), polymethylmethacrylate (PMMA), polycarbonate (PC), polyethylene terephthalate (PET) etc., but not as limit.
Silver is silvery white metal under general state, and is opaque material, and electric conductivity is splendid.And silver is while making nano-silver thread 801, nano-silver thread 801 has good transmittance and splendid electric conductivity, can be good at applying to the touch-control electrode of contact panel.
Matrix 803 refers to that the solution containing nano-silver thread 801 is being arranged on substrate 807 through methods such as coatings, after heating, drying makes volatile material volatilization, stays the non-nano silver line material on substrate 807.Nano-silver thread 801 scatters or embeds wherein, forms conductive network, and part nano-silver thread 801 is outstanding from matrix 803 materials.Nano-silver thread 801 relies on matrix 803 to form nano-silver thread conductive layer 805, and matrix 803 can protect nano-silver thread 801 to avoid burn into
The impact of the external environments such as wearing and tearing.
The thickness of nano-silver thread conductive layer 805 is about 10nm-5 μ m, is preferably 20nm-1 μ m, and more excellent is 50nm-200nm.In certain embodiments, the refractive index of nano-silver thread conductive layer 805 is 1.3-2.5, and more excellent is 1.35-1.8.
Solution containing nano-silver thread 801 refers to, nano-silver thread 801 is dispersed in specific solvent and the aaerosol solution that forms, and this solvent can be water, aqueous solution, organic solvent, inorganic solvent, solion, saline solns, supercritical fluid, oil or its potpourri etc.In this solvent, also contain other adjuvant, as spreading agent, surfactant, crosslinking chemical, wetting agent or thickening agent, but not as limit.
In addition, can, by selecting suitable matrix 803 materials to adjust the optical characteristics of nano-silver thread conductive layer 805, particularly solve mist degree problem.For example, matrix 803 can be adjusted into refractive index, component and certain thickness with expectation, can effectively reduce reflection loss, dazzle impact, mist degree.
Mist degree refers to cloud or the muddy outward appearance causing due to nano-silver thread 801 surface light diffusion in nano-silver thread conductive layer 805.The mist degree problem of screen can cause in the situation that outdoor scene light irradiates, and screen reflection light intensity is strong, can make user not see screen in the time of serious.
The transmittance of nano-silver thread conductive layer 805 or sharpness can limiting by following parameter quantitative: transmittance and mist degree.Transmittance refers to that, by the number percent of the incident light of medium transmission, the transmittance of nano-silver thread conductive layer 805 is at least 90%, even can be up to 91%-95%.Mist degree is light diffusing index, and mist degree refers to be separated in incident light and the quantity number percent of the light of scattering in the process of transmission.Transmittance is the character of light transmission medium to a great extent, different with it, and mist degree is often relevant with product, and the unevenness of the imbedded particle in surfaceness and medium or component causes typically.In embodiment of the present utility model, mist degree can not surpass 3%, even can reach and be no more than 1.5%.
Refer to Fig. 3 and Fig. 4, the contact panel 10 of the first embodiment of the present utility model from top to bottom (in all embodiments, the position determiners such as upper and lower, left and right only limit to the relative position in given view, but not absolute position) comprise a upper substrate 11, one first electrode layer 13, one the second electrode lay 16, the first electrode layer 13 and the second electrode lay 16 take shape in respectively first substrate 14 upper surfaces and second substrate 17 upper surfaces, and first substrate 14 is respectively the bearing bed of the first electrode layer 13 and the second electrode lay 16 with second substrate 17.Between first substrate 14 and second substrate 17, by a laminating layer 15, realize laminatings between the two, laminating layer 15 has dielectricity, and it is by the setting of insulating of the first electrode layer 13 and the second electrode lay 16.Upper substrate 11 upper surfaces are the surface of contact of pointer or finger, and the lower surface of second substrate 17 can be for depending on demonstration module.
Upper substrate 11 can be regarded as the touch cover plate on our traditional contact panel 10, so-called cover plate comprises a touch control operation face and an element installed surface, its touch control operation face carries out touch control operation for finger or pointer etc., element installed surface is for installing touch-control electrode member or showing module etc., upper substrate 11 materials can be glass, tempered glass, sapphire, PEEK (polyetheretherketone polyetheretherketone), PI (Polyimide polyimide), PET (polyethylene terephthalate polyethylene terephthalate), PC (polycarbonate polycarbonate), PES (polyethylene glycol succinate, PMMA (polymethylmethacrylate polymethylmethacrylate) and arbitrarily both materials such as compound.
The first electrode layer 13 is nano-silver thread conductive layer 805 with the second electrode lay 16.
Laminating layer 15 can be selected OCA (optical lens gelatin, Optical ClearAdhesive) or LOCA (liquid optical lens gelatin, Liquid Optical ClearAdhesive).Especially, in order to optimize the light effect of contact panel 10, laminating layer 15 is a high refractive index layer, its refractive index is 1.52-1.79, be preferably 1.7 so that the second electrode lay 16 and/or the first electrode layer 13 that adopt nano-silver thread conductive layer 805 to make mist degree can be reduced to below 5%, the best can be reduced to 3%, 2%, 1.5%.
The material of first substrate 14 and/or second substrate 17 can be that flexible parent metal can be also rigid substrate, as glass, tempered glass, sapphire glass, PI (polyimide), PC (polycarbonate), polyethersulfone (PES), polymethylmethacrylate (PMMA), acryl, acrylic nitrile-butadiene-styrene (ABS), polyamide (PA), polybenzimidazoles polybutylene (PB), polybutylene terephthalate (PBT), polyester (PE), polyetheretherketone (PEEK), polyetherimide (PEI), polyetherimide, tygon (PE), polyethylene terephthalate (PET), polystyrene (PS), teflon (PTFE), polyurethane (PU), Polyvinylchloride (PVC) etc.
Refer to Fig. 5 and Fig. 6, the first electrode layer 13 comprises first electrode array 131 of a plurality of (hereinafter to be referred as directions X) in a first direction parallel equidistant arrangement.The first electrode array 131 comprises a plurality of the first conductive units 133, the first conductive unit 133 is rhombus, between the first conductive unit 133, by a plurality of the first wire-connectings 135, realize series connection, between the first adjacent between two conductive unit 133, comprise one first vacancy section 137.
The second electrode lay 16 comprises second electrode array 161 of a plurality of (hereinafter to be referred as Y-direction) parallel equidistant arrangements in second direction equally, the second electrode array 161 comprises a plurality of the second conductive units 163, the second conductive unit 163 is rhombus, between the second conductive unit 163, by a plurality of the second wire-connectings 165, realize series connection, between the second adjacent between two conductive unit 163, comprise one second vacancy section 167.X and Y-direction quadrature in the present embodiment, but X and Y angle angle are not construed as limiting.
The first electrode array 131 and the second electrode array 161 are respectively nano-silver conductive layer 805 by laser-induced thermal etching, after patterning, form, and also can adopt other etching mode, as gold-tinted technique, the etching of electric arc high-frequency induction etc.Also can be by nano-silver thread solution by printing, volume to volume (Roll-to-Roll), impression mode directly forms.First electrode layer 13 of take is below done a narration as example to the technique of touch-control electrode, and the first electrode layer 13 manufacture crafts are as follows:
Step 1: nano-silver thread 801 solution coat, on the surface of first substrate 14, are formed to nano-silver thread conductive layer 805.This coating method can but be not defined as ink-jet, broadcast sowing intaglio printing, letterpress, flexo, nano impression, serigraphy, scraper for coating, slit type coating (slot die coating), rotary coating, bar-shaped coating, cylinder coating, the coating of line rod, dip coated.
Step 2: 805 etchings of nano-silver thread conductive layer are formed to corresponding nano-silver thread 801 electrode patterns by laser, because nano-silver thread conductive layer 805 has embedded many nano-silver threads 801 in residuite 803, part nano-silver thread 801 one end are positioned at matrix 803 inside, the other end is raised in matrix 803 top layers, in laser technique, Ear Mucosa Treated by He Ne Laser Irradiation is on nano-silver thread conductive layer 805, because laser penetrates matrix 803 completely, and cannot penetrate non-transparent nano-silver thread 801 completely, the nano-silver thread 801 that is raised in matrix 803 surfaces is vaporized after receiving the energy of Ear Mucosa Treated by He Ne Laser Irradiation, leave plural nanoscale passage (not shown), simultaneously, be positioned at 801 gasifications of 803 layers of inner nano-silver thread of matrix by leaving matrix 803 by described plural nanoscale channel transfer, like this, just can in nano-silver thread conductive layer 805, etch corresponding conduction region---the first electrode array 131 regions and non-conductive district be the first vacancy section 137 one by one, the first vacancy section 137 is not complete hollow out, just the SNW in this region is vaporized, remaining matrix 803 only.Owing to also remaining with matrix 803 in the first vacancy section 137, it makes the material of material in the first vacancy section 137 and the first electrode array 131 comparatively approaching, its refractive index is also close, therefore, it makes the optical effect performance of whole contact panel 10 better, when having overcome light and having injected contact panel 10, the problem that light is inhomogeneous and touch-control electrode pattern appears in one's mind causing because interface material refractive index difference is large.Certainly, in forming the process of the first electrode layer 13 patterns, also can directly the first vacancy section 137 be etched away completely, the nano-silver thread conductive layer 805 in the first vacancy section 132 is completely etched, without matrix 803, exists.Also can only nano-silver thread 801 laser-induced thermal etchings in the first vacancy section 132 and the first conductive unit 133 joining edges be fallen, only leave matrix 803, be about to the first conductive unit 133 and the first vacancy section 137 electrical isolation.
From the front of contact panel 10, look over, the first conductive unit 133 on the first electrode layer 13 and the second conductive unit 163 on the second electrode lay 16 be the vertical projection zero lap region on its parallel surface respectively, the first conductive unit 133 is just arranged in the second vacancy section 167, the second conductive unit 163 is positioned at the vertical projection district of the first vacancy section 137 on the second electrode lay 16, and the first conductive unit 133 is positioned at the vertical projection district of the second vacancy section 167 on the first electrode layer 13.The shape of the first conductive unit 133 is according to adjacent between two determined the second vacancy section 167 shape settings of the second conductive unit 163, and namely the first conductive unit 133 and the second conductive unit 163 complementations arrange.Like this, the second conductive unit 163 is also just arranged in the first vacancy section 137.From the positive Overlay of contact panel 10, be equivalent to realize with one deck nano-silver conductive layer 805 configuration of two-layer electrode.
The first conductive unit 133 and the complementary setting of the second conductive unit 163, the area of supposing the second conductive unit 163 is A, 133 area of the first conductive unit is B, the area of the second conductive unit 163 is more than or equal to the area of the first conductive unit 133, be A >=B, best, 1≤A/B≤25, preferably 1.2≤A/B≤18, are particularly preferably 1.5≤A/B≤8 or A/B=4.When the area of the second conductive unit 163 is more than or equal to the area of the first conductive unit 133, the second conductive unit 163 can shield the undesired signal that shows module from contact panel 10 belows effectively.Meet 1≤A/B≤25 or condition under, its shield effectiveness is very good.In satisfied 1.5≤A/B≤8 or A/B=4, its shield effectiveness is best.
Refer to Fig. 7, the utility model contact panel 10 also comprises the cabling 139 that is communicated with touch-control electrode and external flexible circuits plate (being called for short FPC), this sentences the first electrode layer 13 and describes (the second electrode lay 16 is applicable equally) for example, cabling 139 is electrically connected to FPC by the first electrode array 131, employing in the present embodiment be bilateral cabling 139: cabling 139 comprises the first cabling 1391 and the second cabling 1393, the first cabling 1391 and the second cabling 1393 places are at grade and be connected in the first electrode array 131 two ends, the first cabling 1391 and second cabling 1393 other ends are all electrically connected to FPC, namely same the first electrode array 131 has passed through the first cabling 1391 and the second cabling 1393 has been connected to FPC, it adopts bilateral cabling 139 can strengthen signal transmission, attenuated signal decay, one of them fracture of the first cabling 1391 and the second cabling 1393 simultaneously, contact panel 10 also still can be realized signal transmission.
The first cabling 1391 and the second cabling 1393 width are approximately 10um-35um, two first cablings 1391, two second cabling 1393 line-spacings are 10um-35um, therefore width and the spacing of cabling 1042 are all smaller, around shared region is very little at the second electrode lay 16 and the first electrode layer 13 for cabling 139, at contact panel 10 areas constant in the situation that, it makes can touch area area change, when cabling 139 materials adopt nano-silver thread conductive layer 805 transparent conductive material such as grade, the both sides of upper substrate 11 apply without doing the cabling 139 that frame covers peripheral region, it can increase touch area, cabling 139 area decreases, therefore upper substrate 11 at least can be made Rimless design in both sides, cabling 139 regions level off to the fringe region of upper substrate 11, user not too can arrive by touch-control, Rimless contact panel 10 makes user visually openr, increasing user experiences.Cabling 139 can with the first electrode layer 13 or the one-body molded making of the second electrode lay 16, in same procedure, adopt same process make to form.
Compared with prior art, the touch-control electrode of the utility model contact panel 10 is by nano-silver thread solution coat is become after nano-silver thread conductive layer 805, through PROCESS FOR TREATMENT, forms.Between nano-silver thread 801, by overlap joint, form conduction network, it is low that nano-silver thread 801 has price as touch-control electrode conductive material, resistance is low, the flexible advantage such as good, especially nano-silver thread conductive layer 805 is very thin, it can using differential profiles as bearing bed, and it makes the contact panel 10 thinner possibility that becomes that becomes to a certain extent.Importantly in the present embodiment the first conductive unit 133 and the second conductive unit 163 respectively the vertical projection on same parallel surface there is no overlapping region, the second conductive unit 163 is positioned at the vertical projection district of the first vacancy section 137 on the second electrode lay 16, and the first conductive unit 133 is positioned at the vertical projection district of the second vacancy section 167 on the first electrode layer 13.Be light when through contact panel 10, at most only can pass one deck nano-silver thread conductive layer 805, can effectively reduce the mist degree problem that nano-silver thread 801 produces like this.Best mode is that the first electrode layer 13 arranges with the second electrode lay 16 is complementary, and the positive Overlay from contact panel 10, is equivalent to realize with one deck electrode the configuration of two-layer electrode.Like this, when light passes contact panel 10, only through one deck electrode layer, medium refraction index remains unchanged substantially, distribution of light is relatively even, and it can effectively reduce refraction and the scattering of light, thereby reduces the mist degree of nano-silver thread 801, improve light transmission, make contact panel 10 have good optical appearance.
Especially, in the present embodiment, the area of the second conductive unit 163 is more than or equal to the area of the first conductive unit 133, meeting under the state of this condition, the second conductive unit 163 can shield the undesired signal that shows module from contact panel 10 belows effectively, and it is further promoted contact panel 10 touch-control precision and touch-control degree of stability.
In the situation that the first electrode layer 13 arranges with the second electrode lay 16 is complementary, the requirement that it is very high to the precision of technique, especially in the situation that the live width of the first electrode array 131 or the second electrode array 161 is very little, the electrode pattern of traditional ITO conductive material made is difficult to reach this accuracy requirement, even if can, it must adopt gold-tinted technique, gold-tinted manufacturing process is complicated, equipment cost is high, it has hindered the realization of touch-control electrode complementation to a certain extent, and touch-control electrode adopts nano-silver thread conductive layer 805 in the present embodiment, it can adopt simple coating or transfer printing process to replace conventional I TO gold-tinted technique meeting under prerequisite of precision, when it has simplified the manufacture craft of contact panel 10, equipment cost reduces, it makes more manufacturing enterprise can enter contact panel 10 manufacturing industry.
Generally speaking, contact panel 10 optical appearance in the present embodiment are good, low cost of manufacture, and the advantage such as touch-control sensitivity is good, it has extraordinary industrial prospect.
The present embodiment can also comprise following distortion:
The first electrode layer 13 can be arranged on upper surface or the lower surface of first substrate 14, and/or the second electrode lay 16 also can be arranged on upper surface or the lower surface of second substrate 17.Due to nano-silver thread 801 from human eye more close to, reflective more obvious, mist degree problem is also just more outstanding, therefore, guaranteeing under the situation of touch-control sensitivity, preferably, the first electrode layer 13 is arranged on the lower surface of first substrate 14, the second electrode lay 16 is arranged on the lower surface of second substrate 17, namely when upper substrate 11 is cover plate, first substrate 14 is between described element installed surface and described second substrate 17, the first electrode layer 13 is between described first substrate 14 and described second substrate 17, described the second electrode lay 16 is located at described second substrate 17 away from a side of described element installed surface.
Refer to Fig. 8, the distressed structure one of the first electrode array 131 is as follows: this first electrode array 231 comprises two inductor electrode arrays 232, article two, inductor electrode array 232 one end are electrically connected, a plurality of the first conductive units 233 in inductor electrode array 232, by the first wire-connecting 235 series connection, comprise one first vacancy section 237 between the first adjacent conductive unit 233 between two equally.Because one first electrode array 231 comprises two inductor electrode arrays 232, therefore, even wherein one because broken string phenomenon appears in the reason such as static, first electrode array 231 at its place still can normally be worked.
The number of the inductor electrode array 232 that wall scroll the first electrode array 231 comprises is not limited to one or two, and it can also be many.
Refer to Fig. 9, another distressed structure of the first electrode array 131 is provided with a plurality of the first wire-connectings 335 on the basis of its distortion one between two inductor electrode arrays 332, and this first wire-connecting 335 is serially connected with two first conductive units 333 adjacent in Y-direction.
The shape of the first conductive unit 133,233,333 is not limited to the rhombus described in the present embodiment, and it can be also other arbitrary shapes such as rectangle, triangle, hexagon, polygon, waveform or irregular figure.The distressed structure of the first electrode array 131 is equally applicable to the second electrode array 161.In the utility model all about the pattern of the first electrode layer 13 and/or the second electrode lay 16 in the past any direction extend.
The first electrode layer 13 and the second electrode lay 16 one of them material can choice for use other materials, as tin indium oxide (Indium Tin Oxide, ITO), tin-antiomony oxide (Antimony Doped Tin Oxide, ATO), indium zinc oxide (Indium Zinc Oxide, IZO), any one material or the different materials combination arbitrarily in zinc oxide aluminum (Aluminum ZincOxide, AZO), poly-ethylenedioxy thiophene (PEDOT), electrically conducting transparent macromolecular material, Graphene or carbon nano-tube.In the present embodiment best, the first electrode layer 13 choice for use ITO materials, the second electrode lay 16 adopts nano-silver thread conductive layer 805.Because the mist degree problem of nano-silver thread 801 is more serious, and there is not this problem in ITO, therefore, ITO material is made in to upper strata near touch surface, nano-silver thread conductive layer 805 is made in lower floor away from touch surface, and it solves the mist degree problem of nano-silver thread 801 to a certain extent.
Cabling 139 can also adopt opaque conductive material, at cabling 139, near touch control operation face side printing one deck decorative layer (figure does not look), opaque cabling is override, and makes contact panel 10 integral body more attractive in appearance and can not feel that cabling is in disorder.
Decorative layer can be selected ink, photoresistance, and non-conductive metal, the compound substances such as PC-PMMA, these materials are opaque, and when it can be used for covering cabling 139 or contact panel 10 other assemblies, contact panel 10 is for there being frame contact panel 10.
Refer to Figure 10 and Figure 11, the difference part of the contact panel 20 of the second embodiment of the present utility model and the first embodiment contact panel 10 is only: this first electrode layer 23 is set directly at the lower surface of upper substrate 21, that is to say, it is with respect to the first embodiment, the present embodiment removes the first substrate of the first electrode layer 23 24, using upper substrate 21 as the adhesion layer of the first electrode layer 23.
The second electrode lay 26 can be arranged on upper surface or the lower surface of second substrate 27.
Refer to Figure 12 and Figure 13, the difference part of the contact panel 40 of the 3rd embodiment of the present utility model and the first embodiment contact panel 10 or embodiment bis-contact panels 20 is only: these contact panel 40 first electrode layers 43 further comprise a plurality of the first compensating electrodes 438, the second electrode lay 46 further comprises a plurality of the second compensating electrodes 468, this first compensating electrode 438 is laid on first substrate 44, it is on the first electrode layer 43 between the first conductive unit 433 in formed the first vacancy section 437, zero lap region between the first conductive unit 433 and the first compensating electrode 438, between the first conductive unit 433 and the first compensating electrode 438, connect and be provided with suitable spacing, best, the first compensating electrode 438 is according to the shape setting of the first vacancy section 438, i.e. the first compensating electrode 438 and the first conductive unit 433 complementations.The first mutual UNICOM of compensating electrode 438 in a plurality of the first vacancy sections 437 between two first electrode arrays 431.The area of the first compensating electrode 438 is less than the area of the second conductive unit 463, same, and the area of the second compensating electrode 468 is less than the area of the first conductive unit 433.The first compensating electrode 438 and the second compensating electrode 468 thickness are consistent with the first electrode layer 43 and the second electrode lay 46 respectively.
The first compensating electrode 438 can when carry out the first electrode array 431 production process on first substrate 44, be laid and be formed by identical production technology simultaneously.
The first compensating electrode 438 and the second compensating electrode 468 materials and the first electrode layer 43 are consistent with the material of the second electrode lay 46, and it is nano-silver thread conductive layer 805.The first compensating electrode 438 and the second compensating electrode 468 be nano-silver conductive layer 805 by laser-induced thermal etching, after patterning, form, also can adopt other etching mode, as gold-tinted technique, the etching of electric arc high-frequency induction etc.Also can be by nano-silver thread solution by printing, volume to volume (Roll-to-Roll), impression mode directly forms.
Compared with prior art, on the first vacancy section 438 on the first electrode array 431 of contact panel 40 and the second vacancy section 467 on the second electrode array 461, corresponding compensating electrode can be set: the first compensating electrode 438 and the second compensating electrode 468, the material of compensating electrode is identical with the material of touch-control electrode.The setting of this compensating electrode is consistent the material of the zones of different at interface, touch-control electrode place, it has overcome when light passes contact panel, easily be subject to the impact of different interfaces material refractive index, cause touch-control electrode pattern easily to appear the problem with the inhomogeneous grade of light luminance in one's mind, it makes contact panel 40 have preferably optical appearance.
Refer to Figure 14 and Figure 15, the first compensating electrode 438 can also comprise distressed structure one, this variant embodiment and its difference are only: separate between a plurality of the first compensating electrodes 538 between two first electrode arrays 531, there is no each other UNICOM, a plurality of the second compensating electrodes 568 between two second electrode arrays 561 are also separate.
Refer to Figure 16 and Figure 17, the first compensating electrode 438 can also comprise distressed structure two, this variant embodiment and its difference are only: the size of the first compensating electrode 638 is greater than the area of the second conductive unit 663, same, the area of the second compensating electrode 668 is greater than the area of the first conductive unit 633, from the front of capacitance type touch-control panel 40, look over, adjacent the first compensating electrode 638 and the second compensating electrode 668 comprise an overlapping region 670, this variant embodiment also can be greater than at the area that guarantees the first compensating electrode 638 area of the second conductive unit 663, the area of the second compensating electrode 668 is greater than in the situation of area of the first conductive unit 633, adjacent the first compensating electrode 638 and the second compensating electrode 668 are set to not have to the situation of overlapping region 670.
Refer to Figure 18, the first compensating electrode 438 can also comprise distressed structure three, and this variant embodiment and the first compensating electrode 438 distressed structure two differences are only: mutual UNICOM between the first compensating electrode 738 between two first electrode arrays 731.
Refer to Figure 19, the first compensating electrode 438 can also comprise distressed structure four, and this variant embodiment and its difference are only: this first compensating electrode 838 is arranged in the overlapping region 870 of the first vacancy section 837 and the second vacancy section 867.
The first compensating electrode 438,538,638,738,838 can be also tin indium oxide (Indium Tin Oxide, ITO), tin-antiomony oxide (Antimony Doped TinOxide, ATO), indium zinc oxide (Indium Zinc Oxide, IZO), zinc oxide aluminum (Aluminum Zinc Oxide, AZO), poly-ethylenedioxy thiophene (PEDOT), electrically conducting transparent macromolecular material, Graphene or carbon nano-tube etc.Best, the first compensating electrode 438,538,638,738,838 materials and the first electrode layer 43 are consistent.
The structure of the first compensating electrode 438 and variant embodiment thereof and technique are equally applicable to the second compensating electrode 468, and production firm arranges the first compensating electrode 438 and/or the second compensating electrode 468 as required.
Refer to Figure 20, difference at the utility model the 4th embodiment contact panel 50 and the first embodiment contact panel 10 or the second embodiment contact panel 20 or the 3rd embodiment contact panel 40 is only: between first substrate 54 and the first electrode layer 53, and an adhesion promoting layer 581 is set between second substrate 57 and the second electrode lay 56, therefore contact panel 50 comprises a upper substrate 51 from top to bottom, one first electrode layer 53, one adhesion promoting layer 581, one first substrate 54, one laminating layer 55, one the second electrode lay 56, another adhesion promoting layer 581 and a second substrate 57, so that adhesion promoting layer 581 to be set between first substrate 54 and the first electrode layer 53, adhesion promoting layer 581 is described to (the same applicable following narration of adhesion promoting layer 581 is set between second substrate 57 and the second electrode lay 56) below: the first electrode layer 53 is attached on first substrate 54, when first substrate 54 is having mercy on property flexible base, board, first substrate 54 allows on the wherein surface that comprehensively covers first substrate 54 that the first electrode layer 53 cannot be good owing to being heated or producing deformation during temperature variation, between the first electrode layer 53 and first substrate 54, apply one deck adhesion promoting layer 581, being configured to of adhesion promoting layer 581 reduces flexible base plate and in film forming manufacturing process, produces the degree of warpage, strengthen the adhesion between nano-silver thread conductive layer 805 and first substrate 54.
The material of described adhesion promoting layer 581 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistance etc., include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene, pentacene, polyhenylene ether (PPE), polyparaphenylene's acetylene (PPV), poly-3, 4-ethylidene dioxy fen (PEDOT), polystyrolsulfon acid (PSS), poly-3-hexyl thiophene (P3HT), poly-3-octyl group thiophene (P3OT), polyether sulphone, poly-C-61-butyric acid-methyl esters (PCBM), poly-[2-methoxyl-5-(2-ethyl-own oxygen base)-1, 4-phenylene ethylene] (MEH-PPV), silicon nitride, the materials such as silicon dioxide or their combination in any.
Described adhesion promoting layer 581 is coated in first substrate 54 tops with the form of fluid, and described fluid can be: water, aqueous solution, solion, supercritical fluid, plasma, oil or their combination in any.Include but not limited to: water, acetone, ethyl acetate, ethanol, butyl acetate, amylalcohol, phenolics, alkyd resin, NaOH, isopropyl ether (i-propyl ether), isopropyl alcohol, methyl ethyl ketone (or MEK), methyl formate, methyl n-butyric acie ester, normal butyl alcohol, octane, sherwood oil, propyl alcohol or their combination in any.Surfactant, spreading agent, stabilizing agent or bonding agent also can be included in fluid.
The method that described adhesion promoting layer 581 fluids are coated in first substrate 54 tops comprises: sputter, electrostatic spraying, reverse roll coating, groove type coating, slit type coating, impression, hot transfer printing, (meyer rod) coating of Meyer rod, spin coating, serigraphy, photogravure, offset printing, hectographic printing, ink jet printing, intaglio printing, or their combination in any.
Compared with prior art; owing to being often accompanied by the variation of temperature in film forming manufacturing process; and have larger expansion coefficient during for flexible base plate when first substrate 54; in the process that heats up, lowers the temperature, often have significant volume change; thereby the warpage or the distortion that make pliability first substrate 54 produce the second bending direction; and then cause and expose or the problem of poor focusing; being configured to of adhesion promoting layer 581 reduces flexible base plate and in film forming manufacturing process, produces the degree of warpage, strengthens the adhesion between nano-silver thread conductive layer 805 and base material.
Adhesion promoting layer 581 is except being coated on first substrate 54 with fluid form, it itself can also be the form of solid film, by the adhesion promoting layer 581 to solid film formula, with the form of heating roll extrusion etc., be directly covered in first substrate 54 tops, at this moment the material of adhesion promoting layer 581 includes but not limited to: polyvinyl butyral (PVB), polyvinyl alcohol (PVA) (PVA), polycarbonate (PC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), viscose paper etc.
In the distortion of this Trackpad panel 50, can only adhesion promoting layer 581 be set on first substrate 54, or only adhesion promoting layer 581 be set on second substrate 57.
Refer to Figure 21, the difference of the utility model the 5th embodiment contact panel 60 and the first embodiment contact panel 10 or the second embodiment contact panel 20 or the 3rd embodiment contact panel 40 is only: in the present embodiment, contact panel 60 arranges a levelling blanket 683 on the first electrode layer 63 and the second electrode lay 66, therefore, contact panel comprises a upper substrate 61 from top to bottom, one levelling blanket 683, one first electrode layer 63, one first substrate 64, one laminating layer 65, another levelling blanket 683 and a second electrode lay 66 and a second substrate 67, so that levelling blanket 683 to be set on the first electrode layer 63, levelling blanket 683 is described to (the same applicable following narration of levelling blanket 683 is set on the second electrode lay 66) below: adopt the first electrode layer 13 of nano-silver thread conductive layer 805 materials to be coated on after first substrate 64 upper surfaces, part nano-silver thread is the outstanding phenomenon being upturned that forms from matrix 803 materials, the flatness of whole the first electrode layer 63 is poor, in addition, between the nano-silver thread 801 of matrix 803 inside, also can exist and upwarp phenomenon, its overlap joint is unstable, by apply levelling blanket 683 on the first electrode layer 63, and after rolling technology is processed, thereby can make the overlap joint area between nano-silver thread 801 increase the conductance of raising nano-silver thread 801 and reach good surface smoothness.Described levelling blanket 683 is positioned at above the first electrode layer 63, or preferred, and the first electrode layer 63 is partially submerged in levelling blanket 683 on thickness direction.
The material of described levelling blanket 683 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistance etc., include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene, pentacene, polyhenylene acetylene (PPE), polyphenylene ethylene (PPV), poly-3, 4-ethylidene dioxy fen (PEDOT), polystyrolsulfon acid (PSS), poly-3-hexyl thiophene, (P3HT), poly-3-octyl group thiophene (P3OT), poly-(aryl ether sulfone), poly-C-61-butyric acid-methyl esters (PCBM), poly-[2-methoxyl-5-(2-ethyl-own oxygen base)-1, 4-phenylene ethylene] (MEH-PPV), silicon nitride, silicon dioxide, Deng material or their combination in any.
Described levelling blanket 683 can be coated in by the form of fluid the first electrode layer 63 tops of nano-silver thread 801, and described fluid can comprise: water, aqueous solution, solion, supercritical fluid, plasma, oil or their combination in any.Include but not limited to: water, acetone, ethyl acetate, ethanol, butyl acetate, amylalcohol, phenolics, alkyd resin, NaOH, isopropyl ether (i-propyl ether), isopropyl alcohol, methyl ethyl ketone (or MEK), methyl formate, methyl n-butyric acie ester, normal butyl alcohol, octane, sherwood oil, propyl alcohol or their combination in any.Surfactant, spreading agent, stabilizing agent or bonding agent also can be included in fluid.
Levelling blanket refractive index is 1.1-1.6, and preferably, levelling blanket 683 is comprised of the blooming of at least 2 layers, and wherein the refractive index of one deck blooming is 1.1-1.6, and the refractive index of another layer of blooming is 1.8-2.7.
Method and adhesion promoting layer 581 that described levelling blanket 683 is coated in the first electrode layer 63 tops with fluid form are basic identical.
Compared with prior art, the touch-control electrode conductivity that surface is provided with the contact panel 60 of levelling blanket 683 promotes, and can obtain good surface smoothness.
It is upper outside that levelling blanket 683 is coated on the first electrode layer 63 divided by fluid form, it can be also the form of solid film, be that 683 of levelling blankets can be by being directly covered in the first electrode layer 63 tops to the form of solid film heating roll extrusion, at this moment the material of levelling blanket 683 includes but not limited to: polyvinyl butyral (PVB), polyvinyl alcohol (PVA) (PVA), polycarbonate (PC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), viscose paper etc.
In the distortion of this Trackpad panel 60, can only levelling blanket 683 be set on first substrate 64, or only levelling blanket 683 be set on second substrate 67.
Refer to Figure 22, the difference of the utility model the 6th embodiment contact panel 60 and the first embodiment contact panel 10 or the second embodiment contact panel 20 or the 3rd embodiment contact panel 40 is only: in the present embodiment, contact panel 70 is between the first electrode layer 73 and first substrate 74, and an optical match layer 785 is set between the second electrode lay 76 and second substrate 77, therefore contact panel comprises a upper substrate 71 from top to bottom, one first electrode layer 73, one optical match layer 785, one first substrate 74, one laminating layer 75, one the second electrode lay 76, another optical match layer 785 and a second substrate 77.The optical match layer 785 of take below between the first electrode layer 73 and first substrate 74 describes (same applicable following narration of optical match layer 785 is set between second substrate 77 and the second electrode lay 76) to optical match layer 785 as example: nano-silver thread 801 exists certain mist degree problem, in order to make whole contact panel 70 reach best display effect, this variant embodiment arranges optical match layer 785 between the first electrode layer 73 of contact panel 70 and first substrate 74, this optical match layer 785 is the blooming of one deck low-refraction, it can reduce the reflection of nano-silver thread, described low-refraction is that refractive index is less than 1.6, preferably 1.1~1.6, be specially 1.1, 1.25, 1.32, 1.38, 1.46, 1.50, 1.52.The optical film thickness of optical match layer 785 is for being less than or equal to 1/4 wavelength odd-multiple.In this enforcement mode of texturing, increase after an optical match layer 785, the mist degree of described the first electrode layer 13 can be reduced to 5% left and right, is preferably less than 3%, 2%, 1.5%.
Optical match layer 785 can be organism or inorganics, or organic and inorganic mixed coating.Si oxide for example, chloro-fluoride, magnesium fluoride, silicon dioxide, lithium fluoride, sodium fluoride, magnesium oxide, silicate, polyurethane, PMMA, PVA, PVP, organosilicon, fluoropolymer, acryl resin, acryl resin+silicon stone nano particle.
The generation type of optical match layer 785 can be physical deposition, chemogenic deposit, vacuum coating, printing, spraying, flexo, nano impression, serigraphy, scraper for coating, rotary coating, bar-shaped coating, cylinder coating, the coating of line rod, any mode such as dip coated.
Compared with prior art, it is better that surface is provided with contact panel 70 optical appearance of optical match layer 785.
The position of described optical match layer 785 and the first electrode layer 73 can exchange; be that optical match layer 785 can be arranged on the first electrode layer 73; when optical match layer 785 is above the first electrode layer 73; can be used as protective seam simultaneously; prevent nano-silver thread oxidation, corrosion etc. is directly exposed to outer series of problems.
Refer to Figure 23, the difference of the utility model the 7th embodiment contact panel 80 and the first embodiment contact panel 10 or the second embodiment contact panel 20 or the 3rd embodiment contact panel 40 is only: between the first electrode layer 83 and first substrate 84, be provided with adhesion promoting layer 881, the first electrode layer 83 is provided with an optical match layer 885 and a levelling blanket 883 near touch control operation face one side, and levelling blanket 883 is between the first electrode layer 83 and optical match layer 885.Between the second electrode lay 86 and second substrate 87, be provided with another adhesion promoting layer 881, the second electrode lay 86 is provided with another optical match layer 885 and another levelling blanket 883 near touch control operation face one side, and levelling blanket 883 is between the second electrode lay 86 and optical match layer 885.
In the present embodiment, first substrate 84 can be only chosen in or second substrate 87 arranges one deck adhesion promoting layer 881, one deck optical match layer 885 and one deck levelling blanket 883.
Production firm can select adhesion promoting layer 881 as required, within one or more layers among optical match layer 885 and levelling blanket 883 all belongs to protection domain of the present utility model.In addition, adhesion promoting layer 881 and/or levelling blanket 883 can be also optical match layers 885, have characteristic and the effect of optical match layer 285.
The foregoing is only preferred embodiment of the present utility model, not in order to limit the utility model, all any modifications of doing within principle of the present utility model, are equal to and replace and within improvement etc. all should comprise protection domain of the present utility model.
Claims (13)
1. a contact panel, it is characterized in that, this contact panel comprises: one first electrode layer, it is laid on first substrate, this first electrode layer comprises a plurality of the first electrode arrays that are arranged in parallel in a first direction, this first electrode array comprises a plurality of the first conductive units and a plurality of the first wire-connecting, between this first conductive unit, by the plurality of the first wire-connecting, connects in a first direction, and the first adjacent conductive unit defines one first vacancy section between two;
One the second electrode lay, be laid on second substrate, this the second electrode lay comprises a plurality of the second electrode arrays that are arranged in parallel in second direction, this second electrode array comprises a plurality of the second conductive units and a plurality of the second wire-connecting, between this second conductive unit, by the plurality of the second wire-connecting, in second direction, connects;
This first electrode layer and this second electrode lay are nano-silver thread conductive layer, and described the second conductive unit is positioned at the vertical projection district of the first vacancy section on the second electrode lay.
2. contact panel as claimed in claim 1, is characterized in that: shape complementarity between the second conductive unit and the first conductive unit.
3. contact panel as claimed in claim 1, is characterized in that, described the first electrode layer is than the more close touch control operation face of the second electrode lay, and the area of described the second conductive unit is greater than the area of described the first conductive unit.
4. contact panel as claimed in claim 3, is characterized in that, described the second conductive unit area is A, and described the first conductive unit area is B, 1.5≤A/B≤8.
5. contact panel as claimed in claim 1, is characterized in that, described first substrate is cover plate, and described cover plate comprises a touch control operation face and an element installed surface, and described the first electrode layer is laid on described element installed surface.
6. contact panel as claimed in claim 1, is characterized in that, more comprises a cover plate, and described cover plate comprises a touch control operation face and element installed surface, and described first substrate is between described element installed surface and described second substrate.
7. contact panel as claimed in claim 6, is characterized in that, described the first electrode layer is between described first substrate and described second substrate, and described the second electrode lay is located at described second substrate away from a side of described element installed surface.
8. contact panel as claimed in claim 1, it is characterized in that: described the first electrode layer and described the second electrode lay both sides can arrange adhesion promoting layer, levelling blanket, one or more layers among optical match layer, adhesion promoting layer, levelling blanket, two or three layers of homonymy or heteropleural that can be arranged on the first electrode layer or the second electrode lay among optical match layer, optical match layer, between adhesion promoting layer and levelling blanket three, position is interchangeable.
9. contact panel as claimed in claim 1, is characterized in that: between described first substrate and institute's second substrate, by laminating layer, fit, the refractive index of this laminating layer is 1.52-1.79.
10. contact panel as claimed in claim 1, it is characterized in that: described nano-silver thread conductive layer comprises a matrix and is distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the thickness of described nano-silver thread conductive layer is 50nm-200nm, and refractive index is 1.35-1.8.
11. contact panels as claimed in claim 1, it is characterized in that: described the first electrode layer and the second electrode lay are connected to flexible PCB by bilateral cabling, this cabling material is nano-silver thread conductive layer and one-body molded be connected the first electrode layer or the second electrode lay with this cabling.
12. contact panels as claimed in claim 1, is characterized in that: the second adjacent conductive unit defines one second vacancy section between two, in the first vacancy section and the second vacancy section, are provided with compensating electrode, and this compensating electrode is nano-silver thread conductive layer.
13. contact panels as claimed in claim 12, is characterized in that: the mutual UNICOM of compensating electrode between two first electrode arrays or between two second electrode arrays or independently of one another setting.
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CN201420312248.7U CN203930768U (en) | 2014-06-12 | 2014-06-12 | Contact panel |
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CN201420312248.7U CN203930768U (en) | 2014-06-12 | 2014-06-12 | Contact panel |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105138201A (en) * | 2015-09-08 | 2015-12-09 | 昆山龙腾光电有限公司 | Capacitive touch display panel |
CN105224150A (en) * | 2014-06-12 | 2016-01-06 | 宸鸿科技(厦门)有限公司 | Contact panel |
WO2016101516A1 (en) * | 2014-12-26 | 2016-06-30 | 京东方科技集团股份有限公司 | Touch panel and display apparatus |
CN106325578A (en) * | 2015-07-10 | 2017-01-11 | 宸鸿科技(厦门)有限公司 | Pressure sensing touch panel |
-
2014
- 2014-06-12 CN CN201420312248.7U patent/CN203930768U/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105224150A (en) * | 2014-06-12 | 2016-01-06 | 宸鸿科技(厦门)有限公司 | Contact panel |
CN105224150B (en) * | 2014-06-12 | 2019-03-01 | 宸鸿科技(厦门)有限公司 | Touch panel |
WO2016101516A1 (en) * | 2014-12-26 | 2016-06-30 | 京东方科技集团股份有限公司 | Touch panel and display apparatus |
US9817532B2 (en) | 2014-12-26 | 2017-11-14 | Boe Technology Group Co., Ltd. | Touch panel and display device |
CN106325578A (en) * | 2015-07-10 | 2017-01-11 | 宸鸿科技(厦门)有限公司 | Pressure sensing touch panel |
CN106325578B (en) * | 2015-07-10 | 2023-07-25 | 宸鸿科技(厦门)有限公司 | Pressure sensing touch panel |
CN105138201A (en) * | 2015-09-08 | 2015-12-09 | 昆山龙腾光电有限公司 | Capacitive touch display panel |
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