CN203782235U - Etching device of wet etching machine - Google Patents
Etching device of wet etching machine Download PDFInfo
- Publication number
- CN203782235U CN203782235U CN201320833748.0U CN201320833748U CN203782235U CN 203782235 U CN203782235 U CN 203782235U CN 201320833748 U CN201320833748 U CN 201320833748U CN 203782235 U CN203782235 U CN 203782235U
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- China
- Prior art keywords
- rectangular duct
- etching
- rectangular
- pipelines
- feed flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005530 etching Methods 0.000 title claims abstract description 42
- 238000001039 wet etching Methods 0.000 title claims abstract description 14
- 239000007921 spray Substances 0.000 claims abstract description 20
- 238000004891 communication Methods 0.000 claims description 3
- 230000003247 decreasing effect Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 13
- 239000007788 liquid Substances 0.000 abstract description 11
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Abstract
The utility model discloses an etching device of a wet etching machine. The etching device comprises a liquid supply main pipeline and at least two groups of concentric rectangular pipelines, and is characterized in that each group of the rectangular pipeline is connected to the liquid supply main pipeline through a liquid supply branch pipe; the rectangular pipelines are fixed on a supporting frame through a rotatable bend; and a plurality of spray devices are uniformly distributed on the rectangular pipelines. By arranging the spray devices in an annular form as well as controlling different flow pressures on the various rectangular pipelines and different swings of a connecting rod through corresponding valves, etching rates of a substrate in various regions are controlled, so as to achieve purposes of controlling a line width, improving a slope angle and enhancing etching uniformity; and therefore, a substrate etching yield is improved.
Description
Technical field
The utility model relates to a kind of etching system, particularly a kind of relative unit for wet etching.
Background technology
Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display, TFT-LCD) is current common lcd products, and in its production process, wet-etching technology is an extremely important link..
Wet etching is to utilize mix acid liquor to carry out etching to the unlapped metal of glass surface PR, thereby forms needed metal pattern.Therefore the quality of wet etching directly affects the quality of product.
At present, at TFT-LCD, produce in wet-etching technology, etch rate, live width, homogeneity, the angle of gradient are to weigh the standard of etching quality.But in actual production process, these key parameters can not reach the standard that we envision.In actual production process, this etching mode due to wet etching, when substrate carries out etching in etching apparatus, medicine liquid spray flows out from substrate surrounding after substrate, cause the liquid replacement rate liquid replacement rate fast and in the middle of substrate of substrate surrounding slow, cause the fast of substrate surrounding partial etching and substrate middle portion etching slow, finally cause that whole base plate carving and corrosion is inhomogeneous, live width differs, the angle of gradient is bad etc. bad, and this bad product yield that directly has influence on.It is pointed out that along with the large scale development of glass substrate is this bad just obvious all the more.
In view of this, special the utility model that proposes.
Utility model content
The purpose of this utility model is to provide a kind of etching system for wet etching machine, to solve the defects such as existing etching machine etching is inhomogeneous, live width differs, angle of slope is bad.
For achieving the above object, the utility model adopts following technical scheme:
A kind of wet etching machine etching device, comprise feed flow total pipeline and at least two group concentric rectangles pipelines, it is characterized in that: every group of rectangular duct is all connected to feed flow house steward via a feed flow arm, and is fixed on bracing frame by rotatable elbow uniform a plurality of spray equipments on rectangular duct.
Wherein, each feed flow arm is provided with metering valve.This valve is for adjusting the flow pressure of each rectangular duct feed flow, to reach the effect of selective etch; It is pointed out that this metering valve can be throttling valve, coordinate corresponding discharge meter and pressure warning unit, reach the object of automatically precisely controlling; In addition, if by this valve of switch, also can realize selectivity and mend the object of carving, bad to solving, verify that new etching liquid test texts is obvious.
In order to obtain more preferably etching effect, etching device described in the utility model, on the symmetry axis position of rectangular duct, being provided with at least one can drive link, makes the etching device swing spray of both direction in length and breadth, can further improve etching homogeneity, etching rate etc.
Wherein, the fixed form of rectangular duct and connecting rod can select prior art disclosed multiple, as the symmetry axis position at rectangular duct, and the corresponding position of connecting rod is respectively equipped with spacer being bolted etc., be specially those skilled in the art and grasp, the utility model is not particularly limited this.
Etching device described in the utility model, described spray equipment comprises the shower extending vertically downward from rectangular duct and is located at the nozzle of shower end, shower equal in length, or from the center of rectangular duct outside increasing or decreasing successively, form whole class concave arc shape or convex arc shaped, be conducive to form better spraying effect.
Etching device described in the utility model, described rectangular duct is square or rectangular (being rectangular duct).Every group of rectangular duct all arranges rotatable elbow on four angles, and rectangular duct below diagonal positions intersection is provided with two bracing frames, and the symmetry axis position of rectangular duct top is provided with two connecting rods that can drive all rectangular ducts.
The utility model is not made restriction to the concrete layout structure of spray equipment, and those skilled in the art make one's options and adjust the quantity of spray equipment, spacing, shape etc. according to actual processing object, and the utility model is not particularly limited this.
Etching device described in the utility model, described rectangular duct is 3～8 groups of equidistant concentric rectangles pipelines that arrange.Preferably 4 groups.Concrete setting can be according to real needs.
Etching device described in the utility model is connected with controlling elements, and drive link makes spray equipment axial wobble.Rectangular duct is connected and composed through rotatable elbow by more piece arm, and channel bend is fixed on bracing frame, for supporting whole rectangular duct.Channel bend is internal communication and with the channel bend of swivel joint, so that the inner conducting of each rectangular duct, and can be so that each subtube axial rotation.
During use, liquid liquid self-feeding total pipeline, and then is sprayed onto and on glass substrate, is carried out etching by the spray equipment on distribution rectangular duct to each group concentric rectangles pipeline through feed flow arm feed flow.In feed flow process, by metering valve, adjust the flow pressure of each distribution rectangular duct feed flow, to reach the effect of selective etch.
The utility model wet etching machine etching device, by the distribution of etching homogeneity is designed, employing meets the spray equipment that etching homogeneity feature distributes, and the difference of controlling flow pressure on each rectangular duct by metering valve, reach the object of selective etch, thereby reach, improve the bad objects such as etching is inhomogeneous, live width differs, the angle of gradient is bad.In addition, it is to be noted that the utility model is not only applied to etching technics, the cleaning that is applied in substrate is the same can reach the object of improving cleaning performance; Equally, be applied in peel off, the technique such as development is also like this.
Accompanying drawing explanation
Fig. 1 the utility model device stereographic map;
Fig. 2 the utility model device vertical view;
Fig. 3 the utility model device frontview;
Main element Reference numeral:
1: feed flow total pipeline 2: feed flow arm
3: metering valve 4: circulating line
5: connecting rod 6: elbow
7: bracing frame 8: spray equipment.
Embodiment
Embodiment 1
Wet etching machine etching device as shown in Figure 1-Figure 3, comprise feed flow total pipeline 1 and 4 groups of concentric rectangles pipelines 4,: every group of rectangular duct 4 is all connected to feed flow house steward 1 via a feed flow arm 2, rectangular duct 4 is fixed on bracing frame 7 by rotatable elbow 6, uniform a plurality of spray equipments 8 on rectangular duct 4.
Wherein, on each feed flow arm, be equipped with metering valve 3, this valve is for adjusting the flow pressure of each rectangular duct 4 feed flow, to reach the effect of selective etch.In the present embodiment, rectangular duct 4 is four groups of equidistant concentric rectangles pipelines that arrange, every group of rectangular duct 4 all arranges rotatable elbow 6 on four angles, rectangular duct 4 below diagonal positions intersections are provided with two bracing frame 7(and are connected with rectangular duct 4 by elbow 6), the symmetry axis position of rectangular duct 4 tops is provided with two connecting rods 5 that can drive all rectangular ducts.Elbow 6 is internal communication and with the channel bend of swivel joint, so that the inner conducting of each rectangular duct 4, and can be so that each subtube axial rotation.
Described in the present embodiment, spray equipment 8 comprises the shower extending vertically downward from rectangular duct and is located at the nozzle of shower end, and the length of shower outwards increases progressively successively from the center of rectangular duct.
During use, liquid liquid self-feeding total pipeline 1, and then is sprayed onto and on glass substrate, is carried out etching by the spray equipment 8 on distribution rectangular duct to each group concentric rectangles pipeline 4 through feed flow arm 2 feed flows.In feed flow process, by metering valve 2, adjust the flow pressure of each distribution rectangular duct feed flow, to reach the effect of selective etch.In addition, the etching device described in the present embodiment is connected with controlling elements, and drive link 5 makes the etching device swing spray of both direction in length and breadth, further improves etching homogeneity, etching rate etc.
Embodiment 2
Compare with embodiment 1, distinctive points is only, in the present embodiment, rectangular duct 4 is 5 groups of equidistant concentric rectangles pipelines that arrange, and in spray equipment 8, the length of shower is outwards successively decreased successively from the center of rectangular duct.
Above embodiment is only for illustrating the utility model; and be not limitation of the utility model; the those of ordinary skill in relevant technologies field; in the situation that not departing from spirit and scope of the present utility model; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present utility model, and scope of patent protection of the present utility model should be defined by the claims.
Claims (9)
1. a wet etching machine etching device, comprise feed flow total pipeline and at least two group concentric rectangles pipelines, it is characterized in that: every group of rectangular duct is all connected to feed flow house steward via a feed flow arm, and is fixed on bracing frame by rotatable elbow uniform a plurality of spray equipments on rectangular duct.
2. device according to claim 1, is characterized in that: each feed flow arm is provided with metering valve.
3. device according to claim 1, is characterized in that: the symmetry axis position of described rectangular duct is provided with at least one connecting rod that can drive all rectangular ducts.
4. according to the device described in claim 1 or 3, it is characterized in that: described spray equipment comprises the shower extending vertically downward from rectangular duct and is located at the nozzle of shower end, shower equal in length, or from the center of rectangular duct outside increasing or decreasing successively.
5. device according to claim 1, it is characterized in that: every group of rectangular duct all arranges rotatable elbow on four angles, rectangular duct below diagonal positions intersection is provided with two bracing frames, and the symmetry axis position of rectangular duct top is provided with two connecting rods that can drive all rectangular ducts.
6. according to the device described in claim 1 or 3, it is characterized in that: described rectangular duct is 3～8 groups of equidistant concentric rectangles pipelines that arrange.
7. device according to claim 6, is characterized in that: described rectangular duct is 4 groups of equidistant concentric rectangles pipelines that arrange.
8. device according to claim 1, is characterized in that: described rotatable elbow is internal communication and with the bend elbow of selecting joint.
9. according to the device described in claim 1 or 3, it is characterized in that, described device is connected with controlling elements, and drive link makes spray equipment axial wobble.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320833748.0U CN203782235U (en) | 2013-12-17 | 2013-12-17 | Etching device of wet etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320833748.0U CN203782235U (en) | 2013-12-17 | 2013-12-17 | Etching device of wet etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203782235U true CN203782235U (en) | 2014-08-20 |
Family
ID=51318440
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320833748.0U Expired - Fee Related CN203782235U (en) | 2013-12-17 | 2013-12-17 | Etching device of wet etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203782235U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104979246A (en) * | 2015-06-19 | 2015-10-14 | 深圳市华星光电技术有限公司 | Spray assembly and wet etching apparatus with same |
-
2013
- 2013-12-17 CN CN201320833748.0U patent/CN203782235U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104979246A (en) * | 2015-06-19 | 2015-10-14 | 深圳市华星光电技术有限公司 | Spray assembly and wet etching apparatus with same |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140820 |