CN203606624U - Cleaning device for exposure table of lithography machine - Google Patents
Cleaning device for exposure table of lithography machine Download PDFInfo
- Publication number
- CN203606624U CN203606624U CN201320729766.4U CN201320729766U CN203606624U CN 203606624 U CN203606624 U CN 203606624U CN 201320729766 U CN201320729766 U CN 201320729766U CN 203606624 U CN203606624 U CN 203606624U
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- cleaning device
- moving member
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Abstract
The utility model discloses a cleaning device for an exposure table of a lithography machine. The cleaning device comprises an operation rod and a movable part connected with the operation rod; a concave cavity is formed in a position, close to the bottom of the exposure table, of the movable part; the concave cavity is connected with a nitrogen source or a clean and dry air source through an air inlet pipe and is connected with a vacuumizing device through an air outlet pipe. According to the cleaning device disclosed by the utility model, the fundamental principle of blowing for one time and absorbing for one time is adopted; contamination particles on the exposure table of the lithography machine are blown through nitrogen blowing force; then, particles are absorbed away in vacuum through the other end; the operation difficulty of operators in a narrow space is reduced; furthermore, the damage rate of precise parts is reduced; in addition, the cleaning efficiency is improved; the purpose of cleaning effectively and safely is realized.
Description
Technical field
The utility model relates to technical field of manufacturing semiconductors, belongs to especially a kind of device of clean litho machine exposure desk.
Background technology
In the various processing technologys of semiconductor devices, photoetching (photolithography) is one of them important step, this step utilization exposes and is developed on photoresist layer and portrays geometric figure structure, then by etching technics, the figure on photomask is transferred on substrate.For litho machine equipment, exposure desk is the important Working position that determines photoetching process quality, if there is impurity or dirt on exposure desk, can directly affect so the effect of exposure, therefore,, in the time speckling with dirt on silicon wafer exposure platform, need to clean in time exposure desk.
At present, the mode of clean exposure desk mainly contains two kinds, a kind of is the supporting burnisher that uses producer to provide, this instrument is in T shape, comprise the cleaning head (transverse part of T shape instrument) of being made by soft rubber and the bar portion being connected with cleaning head (vertical part of T shape instrument), when use, cleaning head is directly contacted with exposure desk, thereby impurity particle is sticked on soft rubber and realizes and cleaning, another kind is manually to adopt the direct wiping exposure desk of non-dust cloth.
But exposure desk is usually located at the inside of litho machine, operating space is narrow and small, and around exposure desk, be provided with more precise part, if misoperation clean time, not only can not thoroughly clean exposure desk, but also may damage other parts or injury operating personnel.
Utility model content
The technical problems to be solved in the utility model is to provide a kind of cleaning device for photo-etching machine exposal platform, and convenient operation not only can clean exposure desk effectively, and can not damage exposure desk precise part around.
For solving the problems of the technologies described above, cleaning device for photo-etching machine exposal platform of the present utility model, the moving member that comprises a control lever, is connected with described control lever, described moving member has a cavity near the bottom of exposure desk, described cavity is connected with a source nitrogen or clean dry air-source by a draft tube, is connected with a vacuum extractor by an escape pipe.
Wherein, described moving member has an air admission hole and a venthole, and one end of described air admission hole is connected with cavity, and the other end is connected with draft tube, and one end of described venthole is connected with cavity, and the other end is connected with escape pipe.
Preferably, the top of described moving member has a latch closure, and the end of described control lever is connected on latch closure.
Further, the material of described draft tube is Teflon.Described moving member is made up of ceramic material.
The ultimate principle of a suction is blown in the utility model employing one, by the nitrogen power of blowing, the impurity particle on photo-etching machine exposal platform is blown afloat, then siphon away particle by other end vacuum, not only reduce the operation easier of operator in small space, reduce the damage probability of precise part, and improved cleaning efficiency, realize the cleaning purpose of highly effective and safe.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is principle schematic of the present utility model.
Wherein description of reference numerals is as follows:
1 is control lever; 2 is moving member; 3 is draft tube; 4 is escape pipe; 5 is latch closure; 6 is cavity; 7 is air admission hole; 8 is venthole; 9 is exposure desk.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the utility model is described in further detail.
The cleaning device for photo-etching machine exposal platform that the utility model provides, as shown in Figure 1, the moving member 2 that comprises a control lever 1, is connected with described control lever 1, as shown in Figure 2, moving member 2 has a cavity 6 near the bottom of exposure desk 9, described cavity 6 is connected with a source nitrogen or clean dry air-source (not shown) by a draft tube 3, is connected with a vacuum extractor (not shown) by an escape pipe.
Wherein, moving member 2 has an air admission hole 7 and a venthole 8, and one end of described air admission hole 7 is connected with cavity 6, and the other end is connected with draft tube 3, and one end of described venthole 8 is connected with cavity 6, and the other end is connected with escape pipe 4.
As shown in Figure 1, the top of moving member 2 has a latch closure 5, and the end of control lever 1 is connected on latch closure 5.
Further, the material of draft tube 3 is Teflons, and moving member 2 is made up of ceramic material.
While utilizing this device to clean exposure desk, operator utilizes control lever 1 that the moving member 2 being connected with control lever 1 is moved around on exposure desk 9, as shown in Figure 2, by the nitrogen power of blowing, the impurity particle on photo-etching machine exposal platform is blown afloat, and then by the vacuum extractor of opposite side, impurity particle is siphoned away, clean rear disconnection source nitrogen and vacuum extractor.
The ultimate principle of a suction is blown in the utility model employing one, has not only reduced the operation easier of operator in small space, has reduced the damage probability of precise part, and has improved cleaning efficiency, has realized the cleaning purpose of highly effective and safe.
By specific embodiment, the utility model is had been described in detail above, but these not form restriction of the present utility model.In the situation that not departing from the utility model principle; those skilled in the art can make many distortion and improvement to position shape, the air inlet source etc. of shape and size, air admission hole and the venthole of moving member shape of the present utility model, cavity, and these also should be considered as protection domain of the present utility model.
Claims (5)
1. the cleaning device for photo-etching machine exposal platform, it is characterized in that: the moving member that comprises a control lever, is connected with described control lever, described moving member has a cavity near the bottom of exposure desk, described cavity is connected with a source nitrogen or clean dry air-source by a draft tube, is connected with a vacuum extractor by an escape pipe.
2. the cleaning device for photo-etching machine exposal platform according to claim 1, it is characterized in that: described moving member has an air admission hole and a venthole, one end of described air admission hole is connected with cavity, the other end is connected with draft tube, one end of described venthole is connected with cavity, and the other end is connected with escape pipe.
3. the cleaning device for photo-etching machine exposal platform according to claim 1, is characterized in that: the top of described moving member has a latch closure, the end of described control lever is connected on latch closure.
4. the cleaning device for photo-etching machine exposal platform according to claim 1, is characterized in that: the material of described draft tube is Teflon.
5. the cleaning device for photo-etching machine exposal platform according to claim 1, is characterized in that: described moving member is made up of ceramic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320729766.4U CN203606624U (en) | 2013-11-18 | 2013-11-18 | Cleaning device for exposure table of lithography machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320729766.4U CN203606624U (en) | 2013-11-18 | 2013-11-18 | Cleaning device for exposure table of lithography machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203606624U true CN203606624U (en) | 2014-05-21 |
Family
ID=50719288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320729766.4U Expired - Fee Related CN203606624U (en) | 2013-11-18 | 2013-11-18 | Cleaning device for exposure table of lithography machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203606624U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110161808A (en) * | 2019-05-09 | 2019-08-23 | 上海华力微电子有限公司 | Grating scale cleaning device and method, litho machine |
-
2013
- 2013-11-18 CN CN201320729766.4U patent/CN203606624U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110161808A (en) * | 2019-05-09 | 2019-08-23 | 上海华力微电子有限公司 | Grating scale cleaning device and method, litho machine |
| CN110161808B (en) * | 2019-05-09 | 2022-02-22 | 上海华力微电子有限公司 | Grating scale cleaning device and method and photoetching machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140521 Termination date: 20151118 |
|
| EXPY | Termination of patent right or utility model |