CN203534124U - Drying device for polycrystalline silicon wafer cleaning and texturing machine - Google Patents
Drying device for polycrystalline silicon wafer cleaning and texturing machine Download PDFInfo
- Publication number
- CN203534124U CN203534124U CN201320596770.8U CN201320596770U CN203534124U CN 203534124 U CN203534124 U CN 203534124U CN 201320596770 U CN201320596770 U CN 201320596770U CN 203534124 U CN203534124 U CN 203534124U
- Authority
- CN
- China
- Prior art keywords
- air
- silicon wafer
- texturing machine
- drying
- drying device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
The utility model discloses a drying device for a polycrystalline silicon wafer cleaning and texturing machine. The drying device for the polycrystalline silicon wafer cleaning and texturing machine comprises an air supplying duct which is used for drying of the cleaning and texturing machine. The drying device further comprises a shell, wherein an air inlet and an air outlet are formed in the two sides of the shell respectively, an air blower is arranged at the position of the air inlet, the air outlet is communicated with the air supplying duct, an electrical heated tube is arranged in the shell and is vertically placed between the air inlet and the air outlet, and a high-efficiency air filter is arranged between the electrical heated tube and the air blower. According to the drying device for the polycrystalline silicon wafer cleaning and texturing machine, the air blower is used for pumping air in a workshop, and hot wind is formed through electric heating of the air and is used for drying silicon wafers; due to the fact that the silicon wafer cleaning and texturing workshop is a 100000-class dust-free workshop, air in the workshop can meet the preliminary condition of silicon wafer drying; due to the fact that the high-efficiency air filter is arranged in the shell, the degree of purity of the air is further improved, and the surfaces of the silicon wafers can not be polluted by the generated hot wind; compared with a traditional drying method that nitrogen equipment is used for dying, the drying device for the polycrystalline silicon wafer cleaning and texturing machine has the advantages that the drying effect is guaranteed, and production cost is greatly reduced.
Description
Technical field
The utility model relates to semi-conducting material manufacture field, is specifically related to a kind of polysilicon chip cleaning and texturing machine drying unit.
Background technology
Silicon chip is needing to carry out cleaning and texturing through after a series of procedure, the object of cleaning is to eliminate each pollutant that is adsorbed on silicon chip surface, making herbs into wool is on its surface, to make suede structure can reduce surperficial sunshine reflection, and the clean level of cleaning directly affects yield rate and the reliability of cell piece.The cleaning and texturing of silicon chip is realized on cleaning machine, configures some technology grooves position on cleaning machine, and after the manual material loading of user, overall process is completed the technical process such as burn into cleaning by mechanical driving device.
After completing cleaning and texturing in silicon wafer cleaning tank, carried away liquid level, then enter baking operation, existing cleaning machine adopts nitrogen drying silicon chip mostly, and not only equipment involves great expense, and huge to the consumption of nitrogen while using, this has increased the production cost of enterprise greatly.
Summary of the invention
The utility model discloses a kind of polysilicon chip cleaning and texturing machine drying unit, utilize air to be dried silicon chip, when guaranteeing drying effect, greatly saved production cost.
Compared to the prior art the utility model has the following advantages:
Polysilicon chip cleaning and texturing machine drying unit, comprise cleaning and texturing machine oven dry air supply duct, described drying unit comprises that both sides offer respectively the housing of air inlet and air outlet, described air inlet place is provided with an air blast, described air outlet is communicated with described air supply duct, in described housing, be provided with electrothermal tube, described electrothermal tube is vertically arranged between described air inlet and described air outlet, between described electrothermal tube and described air blast, is provided with high efficiency particle air filter.
The further improvement project of the utility model is that described high efficiency particle air filter is Partitionless air filter.
Compared to the prior art the utility model has the following advantages:
The air that the utility model utilizes air blast to extract in workshop forms hot blast and then dries silicon chip through electrical heating again, because the workshop of silicon chip cleaning and texturing is 100,000 grades of dust-free workshops, therefore the air in workshop meets the preliminary condition of drying silicon chip, add the utility model and in housing, be provided with high efficiency particle air filter, further improve the degree of purity of air, the hot blast producing can not pollute silicon chip surface, the utility model is compared the drying mode of in the past using nitrogen gas preparing, when guaranteeing drying effect, greatly reduces production cost.
Accompanying drawing explanation
Fig. 1 is the utility model structural representation.
The specific embodiment
Polysilicon chip cleaning and texturing machine drying unit as shown in Figure 1, comprise cleaning and texturing machine oven dry air supply duct 3, drying unit comprises that both sides offer respectively the housing 1 of air inlet 11 and air outlet 12, air inlet 11 places are provided with an air blast 2, air outlet 12 is communicated with air supply duct 3, in described housing 1, be provided with electrothermal tube 4, electrothermal tube 4 is to be vertically located between air inlet 11 and air outlet 12.The air that the utility model utilizes air blast to extract in workshop forms hot blast and then dries silicon chip through electrical heating again, greatly reduces production cost.
Further, between electrothermal tube 4 and air blast 2, be provided with high efficiency particle air filter 5.High efficiency particle air filter 5 in the present embodiment is Partitionless air filter, can further improve the degree of purity of air used.
Claims (2)
1. polysilicon chip cleaning and texturing machine drying unit, comprise cleaning and texturing machine oven dry air supply duct (3), it is characterized in that: described drying unit comprises that both sides offer respectively the housing (1) of air inlet (11) and air outlet (12), described air inlet (11) locates to be provided with an air blast (2), described air outlet (12) is communicated with described air supply duct (3), in described housing (1), be provided with electrothermal tube (4), described electrothermal tube (4) is vertically arranged between described air inlet (11) and described air outlet (12), between described electrothermal tube (4) and described air blast (2), be provided with high efficiency particle air filter (5).
2. polysilicon chip cleaning and texturing machine drying unit as claimed in claim 1, is characterized in that: described high efficiency particle air filter (5) is Partitionless air filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320596770.8U CN203534124U (en) | 2013-09-26 | 2013-09-26 | Drying device for polycrystalline silicon wafer cleaning and texturing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320596770.8U CN203534124U (en) | 2013-09-26 | 2013-09-26 | Drying device for polycrystalline silicon wafer cleaning and texturing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203534124U true CN203534124U (en) | 2014-04-09 |
Family
ID=50420322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320596770.8U Expired - Fee Related CN203534124U (en) | 2013-09-26 | 2013-09-26 | Drying device for polycrystalline silicon wafer cleaning and texturing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203534124U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106669317A (en) * | 2015-11-06 | 2017-05-17 | 江苏大信环境科技有限公司 | Electric heating device of bag-type dust remover |
| CN107957184A (en) * | 2017-10-25 | 2018-04-24 | 无锡琨圣科技有限公司 | A kind of polysilicon chip cleaning and texturing machine drying unit |
-
2013
- 2013-09-26 CN CN201320596770.8U patent/CN203534124U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106669317A (en) * | 2015-11-06 | 2017-05-17 | 江苏大信环境科技有限公司 | Electric heating device of bag-type dust remover |
| CN107957184A (en) * | 2017-10-25 | 2018-04-24 | 无锡琨圣科技有限公司 | A kind of polysilicon chip cleaning and texturing machine drying unit |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203534124U (en) | Drying device for polycrystalline silicon wafer cleaning and texturing machine | |
| CN104970429A (en) | Grape drying machine | |
| CN203680959U (en) | Double-glass photovoltaic module laminating machine | |
| CN204329530U (en) | A kind of convection current jet-stream wind air drier | |
| CN204696138U (en) | A kind of drying unit of solar cell polycrystalline etching device | |
| CN206787212U (en) | A kind of tea drying device | |
| CN204179068U (en) | For the wet-method etching equipment of silicon chip | |
| CN206596337U (en) | A kind of electrical equipment heat abstractor | |
| CN105220424A (en) | Flash drying machine | |
| CN204438735U (en) | A kind of porcelain base drying unit | |
| CN204949457U (en) | Grape drying -machine | |
| CN205092226U (en) | Wet etching equipment for silicon wafer | |
| CN202993754U (en) | Industrial oven with modified structure | |
| CN204494778U (en) | A kind of pneumoelectric heating device for interchanging | |
| CN206858620U (en) | A kind of cable mechanical refining device | |
| CN209588646U (en) | A kind of efficient slot type drying structure | |
| CN104051574B (en) | The one graphite boat that makes moist removes moisture technique | |
| CN104058588B (en) | Super glass wool exports Quick cooling equipment at production line | |
| CN202853291U (en) | Textile drying machine | |
| CN202057158U (en) | Silicon carbide drying system | |
| CN203478857U (en) | Drying device for feed raw material | |
| CN202166294U (en) | Device for increasing drying temperature of inlet air | |
| CN203346645U (en) | Cheese drying machine | |
| CN205641844U (en) | Novel production of dull polish borosilicate glass microwave stone or metal plate for standing a stove on as a precaution against fire device | |
| CN204944138U (en) | Heparin tube drying unit |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140409 Termination date: 20170926 |