CN203480207U - Spiral airflow dynamic gas lock for extreme ultraviolet lithography machine - Google Patents
Spiral airflow dynamic gas lock for extreme ultraviolet lithography machine Download PDFInfo
- Publication number
- CN203480207U CN203480207U CN201320482568.2U CN201320482568U CN203480207U CN 203480207 U CN203480207 U CN 203480207U CN 201320482568 U CN201320482568 U CN 201320482568U CN 203480207 U CN203480207 U CN 203480207U
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- China
- Prior art keywords
- air flow
- spout
- spiral air
- stack shell
- extreme ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001900 extreme ultraviolet lithography Methods 0.000 title abstract description 7
- 239000007789 gas Substances 0.000 claims description 52
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims description 4
- 238000007664 blowing Methods 0.000 abstract description 5
- 239000012535 impurity Substances 0.000 abstract description 5
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000003344 environmental pollutant Substances 0.000 description 4
- 231100000719 pollutant Toxicity 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320482568.2U CN203480207U (en) | 2013-08-08 | 2013-08-08 | Spiral airflow dynamic gas lock for extreme ultraviolet lithography machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320482568.2U CN203480207U (en) | 2013-08-08 | 2013-08-08 | Spiral airflow dynamic gas lock for extreme ultraviolet lithography machine |
Publications (1)
Publication Number | Publication Date |
---|---|
CN203480207U true CN203480207U (en) | 2014-03-12 |
Family
ID=50228509
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201320482568.2U Expired - Lifetime CN203480207U (en) | 2013-08-08 | 2013-08-08 | Spiral airflow dynamic gas lock for extreme ultraviolet lithography machine |
Country Status (1)
Country | Link |
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CN (1) | CN203480207U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103365119A (en) * | 2013-08-08 | 2013-10-23 | 中国科学院光电研究院 | Dynamic gas lock for spiral gas flow |
CN104597115A (en) * | 2015-02-12 | 2015-05-06 | 中国科学院光电研究院 | Vacuum acquisition device for EUV irradiation material test system and corresponding test method |
CN106094444A (en) * | 2016-06-03 | 2016-11-09 | 中国科学院光电研究院 | A kind of dynamic gas for extreme ultra violet lithography is locked |
CN114698216A (en) * | 2021-03-04 | 2022-07-01 | 台湾积体电路制造股份有限公司 | Extreme ultraviolet source, method for improving asymmetric deposition, and radiation source |
-
2013
- 2013-08-08 CN CN201320482568.2U patent/CN203480207U/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103365119A (en) * | 2013-08-08 | 2013-10-23 | 中国科学院光电研究院 | Dynamic gas lock for spiral gas flow |
CN104597115A (en) * | 2015-02-12 | 2015-05-06 | 中国科学院光电研究院 | Vacuum acquisition device for EUV irradiation material test system and corresponding test method |
CN104597115B (en) * | 2015-02-12 | 2019-03-19 | 中国科学院光电研究院 | The vacuum acquirement device and corresponding detection method of test system for extreme ultraviolet radiation material |
CN106094444A (en) * | 2016-06-03 | 2016-11-09 | 中国科学院光电研究院 | A kind of dynamic gas for extreme ultra violet lithography is locked |
CN106094444B (en) * | 2016-06-03 | 2017-11-10 | 中国科学院光电研究院 | A kind of dynamic gas for extreme ultra violet lithography is locked |
CN114698216A (en) * | 2021-03-04 | 2022-07-01 | 台湾积体电路制造股份有限公司 | Extreme ultraviolet source, method for improving asymmetric deposition, and radiation source |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200825 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200825 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 100094, No. 9 Deng Nan Road, Beijing, Haidian District Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20140312 |