CN203405625U - Half pentaprism reticle structure - Google Patents
Half pentaprism reticle structure Download PDFInfo
- Publication number
- CN203405625U CN203405625U CN201320330673.4U CN201320330673U CN203405625U CN 203405625 U CN203405625 U CN 203405625U CN 201320330673 U CN201320330673 U CN 201320330673U CN 203405625 U CN203405625 U CN 203405625U
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- Prior art keywords
- pentaprism
- half pentaprism
- graticule
- flat glass
- backlight
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Abstract
The utility model discloses a half pentaprism reticle structure and aims to provide the half pentaprism reticle structure which achieves that an aiming graticule and a half pentaprism can be produced separately, so as to reduce production difficulty and raise production efficiency. The half pentaprism reticle structure includes a pentaprism (1) and a backlight (2) used for providing an irradiation source for the pentaprism (1), a flat glass reticle (3) is arranged between the pentaprism (1) and the backlight (2), and the flat glass reticle (3) is provided with a graticule (4) facing to an end face of the pentaprism (1). The half pentaprism reticle structure can be applied to the field of gunsight.
Description
Technical field
The utility model relates to alignment clamp field, particularly relates to a kind of half pentaprism graticule structure in alignment clamp.
Background technology
At present, half pentaprism and roof prism are by the inverted image optical element that extensively should take aim at as prism rifle, and in the production run of alignment clamp, the particularly production of double pentaprism, there is particularly strict technical requirement, the smooth finish and the corner angle angle that comprise half pentaprism surface, its slight error all can badly influence the end product quality of alignment clamp.Under prior art, division line is all directly to process on half pentaprism, add man-hour first at a half pentaprism plated surface skim, for example chromium plating film, aluminium film or silverskin, processing during division line main method have: (1) chemical method for etching, with the method for chemical corrosion, on half pentaprism, carve aiming graticule, this method must basis separately graticule offer many moulds, production cost is high, and the production cycle is long; (2) laser engraving method, with ultraviolet light or laser engraving machine, on the minute surface of half pentaprism, carve division line, this method does not need to offer mould, but processing error easily appears in this method, and after error, be difficult to compensation, even cause whole half pentaprism to be scrapped.Generally speaking, chemical method for etching no matter, or laser engraving method, it is long that chemical method for etching is made the preparatory period that the mould such as mask plate needs in earlier stage, both directly on half pentaprism, process division line, inevitably cause scrapping of half pentaprism, the cost of single half pentaprism is relatively high.Should be noted that, these directly process the method for division line line on half pentaprism, all be easy to affect smooth finish or the corner angle angle on half pentaprism surface, so we should reduce as far as possible and on half pentaprism, carry out again or repeatedly processing, guarantee end product quality.
Utility model content
Technical problem to be solved in the utility model is to overcome the deficiencies in the prior art, and a kind of half pentaprism graticule structure that aiming graticule and half pentaprism are separated to production, reduce production difficulty and enhance productivity is provided.
The technical scheme that the utility model adopts is: the utility model comprises half pentaprism and backlight, described backlight provides radiation source for described half pentaprism, between described half pentaprism and described backlight, be provided with flat glass graticule, on described flat glass graticule, on the end face of described half pentaprism, be provided with division line.
Preferably, on described flat glass graticule, be provided with plated film, on described plated film, etch the described graticule graticule of hollow out.
The beneficial effects of the utility model are: because the utility model comprises half pentaprism and backlight, described backlight provides radiation source for described half pentaprism, between described half pentaprism and described backlight, be provided with flat glass graticule, on described flat glass graticule, on the end face of described half pentaprism, be provided with division line; Directly etching or engraving division line on flat glass graticule of the utility model, even if there is defective products to produce, cost allowance is relatively little, geometric configuration is also simple, easily processing location.Therefore, it is separated with half pentaprism that the utility model has been realized graticule graticule, avoided again or repeatedly processing on described half pentaprism, guaranteed the quality of half pentaprism, also reduced production difficulty, thereby greatly enhanced productivity, met the growth requirement of large-scale production simultaneously.
Accompanying drawing explanation
Fig. 1 is blast structural representation of the present utility model;
Fig. 2 is that light path of the present utility model is moved towards schematic diagram.
Embodiment
As shown in Figure 1, a complete alignment clamp includes objective lens 5, eyepiece group 6 and half pentaprism graticule structure, and the utility model relates to a kind of half pentaprism graticule structure, it comprises half pentaprism 1 and backlight 2, described backlight 2 provides radiation source for described half pentaprism 1, between described half pentaprism 1 and described backlight 2, be provided with flat glass graticule 3, on described flat glass graticule 3, on the end face of described half pentaprism 1, be provided with division line 4, described division line 4 is as aiming at graticule.Therefore, the utility model has been realized the separation of produced of described half pentaprism 1 and aiming graticule 4, avoided reprocessing on described half pentaprism 1 or the technique of processing repeatedly, reduced production and processing difficulty and guaranteed the quality of described half pentaprism 1, also made production efficiency greatly improve.Moreover, division line 4 production difficulties on described flat glass graticule 3 are little, even if processing error causes scrapping, its cost also reduces greatly than the cost of scrapping described half pentaprism 1, and want to change graticule graticule and can realize by changing described flat glass graticule 3, without described half pentaprism 1 of processing.
In addition, on described flat glass graticule 3, be provided with plated film, on described plated film, etch the described division line 4 of hollow out, that is to say that on described flat glass graticule 3, only having the region at described division line 4 places is transmission region, thereby greatly improved the sharpness of described graticule graticule 4, made to aim at effect better.
As shown in Figure 2, for light path of the present utility model is moved towards schematic diagram, when aiming at, aimed at the light of thing through described objective lens 5, half pentaprism 1 described in light directive after refraction, in the division line 4 of flat glass graticule 3 described in directive after refraction repeatedly, then reaches eyepiece 7 through refraction repeatedly, last light is injected human eye, reaches aiming graticule is arranged on to same texts on described half pentaprism 1.Thus, people can accurately aim at by the utility model.
The utility model is widely used in alignment clamp field.
Claims (2)
1. one and half pentaprism graticule structures, comprise half pentaprism (1) and backlight (2), described backlight (2) provides radiation source for described half pentaprism (1), it is characterized in that: between described half pentaprism (1) and described backlight (2), be provided with flat glass graticule (3), described flat glass graticule (3) is above provided with division line (4) on the end face of described half pentaprism (1).
2. a kind of half pentaprism graticule structure according to claim 1, is characterized in that: on described flat glass graticule (3), be provided with plated film, on described plated film, after etching or engraving, form described division line (4).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320330673.4U CN203405625U (en) | 2013-06-08 | 2013-06-08 | Half pentaprism reticle structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320330673.4U CN203405625U (en) | 2013-06-08 | 2013-06-08 | Half pentaprism reticle structure |
Publications (1)
Publication Number | Publication Date |
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CN203405625U true CN203405625U (en) | 2014-01-22 |
Family
ID=49941555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201320330673.4U Expired - Lifetime CN203405625U (en) | 2013-06-08 | 2013-06-08 | Half pentaprism reticle structure |
Country Status (1)
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CN (1) | CN203405625U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107401953A (en) * | 2017-08-29 | 2017-11-28 | 湖北华中光电科技有限公司 | A kind of passive graduation lighting device and graduation prism |
CN108549144A (en) * | 2018-06-26 | 2018-09-18 | 杭州隆硕科技有限公司 | Rangefinder optical system and telescopic range finder |
-
2013
- 2013-06-08 CN CN201320330673.4U patent/CN203405625U/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107401953A (en) * | 2017-08-29 | 2017-11-28 | 湖北华中光电科技有限公司 | A kind of passive graduation lighting device and graduation prism |
CN108549144A (en) * | 2018-06-26 | 2018-09-18 | 杭州隆硕科技有限公司 | Rangefinder optical system and telescopic range finder |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term |
Granted publication date: 20140122 |
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CX01 | Expiry of patent term |