CN202905659U - Matching device and plasma processing equipment - Google Patents
Matching device and plasma processing equipment Download PDFInfo
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- CN202905659U CN202905659U CN 201220524313 CN201220524313U CN202905659U CN 202905659 U CN202905659 U CN 202905659U CN 201220524313 CN201220524313 CN 201220524313 CN 201220524313 U CN201220524313 U CN 201220524313U CN 202905659 U CN202905659 U CN 202905659U
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Abstract
The utility model discloses a matching device and plasma processing equipment. The matching device comprises a current adjusting network used for adjusting current in a radio frequency power supply input induction coil. The current adjusting network comprises n fixed capacitors and n on-off controllers, wherein an mth fixed capacitor and an mth on-off controller are in series connection to form an mth capacitor network unit, n capacitor network units are in parallel connection to obtain a capacitor parallel network, n on-off controllers are selectively turned on to adjust a capacitance value of the capacitor parallel network, and the current in the induction coil is adjusted, wherein n is an integer larger than 2, and m is an integer between 1 and n. The matching device has the advantages of short time of adjusting current, high matching efficiency, a long service life and low operation cost.
Description
Technical field
The utility model relates to microelectronics technology, particularly a kind of dual output impedance matching box and plasma processing device.
Background technology
Inductive coupling plasma generator is by inductance-coupled coil radio-frequency power to be transferred in the reaction chamber, obtains plasma so that reacting gas ionizes.As everyone knows, the impedance mismatch in the output impedance of radio-frequency power supply and the reaction chamber between the plasma load easily causes the waste of radio-frequency power.For this reason, need between radio-frequency power supply and inductance-coupled coil, adaptation be set.As shown in Figure 1, be the schematic diagram of inductive coupling plasma generator.Between radio-frequency power supply 1 and inductance-coupled coil 3, be provided with adaptation 2, can make the output impedance of radio-frequency power supply and the impedance conjugate impedance match between the plasma load by adaptation 2.
Progress along with technology, association area is had higher requirement to working ability and the machining accuracy of inductive coupling plasma generator, have higher requirement such as the density of plasma, uniformity, stability etc., surpass the machining accuracy of the large substrate of 300mm to satisfy size.
For this reason, person skilled has been developed Double-output matcher.Fig. 2 is the theory diagram of another kind of inductive coupling plasma generator.As shown in Figure 2, Double-output matcher 2 ' is arranged between radio-frequency power supply 1 and the inductance-coupled coil 3, and being provided with inductive coupler coils 3a, the 3b of two parallel connections in the outside of reaction chamber 4, each inductive coupler coils is connected with the output of Double-output matcher 2 '.
Double-output matcher 2 ' comprises impedance transducer 21 ', impedance matching network 22 ', electric current regulating networks 23 ', controller 24 ' and current sensor 25 '.Wherein, impedance transducer 21 ' is connected in the transmission line, for detection of the input impedance of impedance matching network (impedance of the input impedance of impedance matching network for looking back from the impedance matching network input), and input impedance is transferred to controller 24 '.Controller 24 ' obtains the impedance adjustment amount through calculating, and regulates the input impedance of impedance matching network 22 ' according to the impedance adjustment amount, thereby makes the output impedance of radio-frequency power supply and the impedance conjugate impedance match between the plasma load.
As shown in Figure 3, be the structure chart of electric current regulating networks.Electric current regulating networks 23 ' comprise inductance L 1, the first capacitor C 1 and the second capacitor C 2, and the first capacitor C 1 and the second capacitor C 2 are variable capacitance.Wherein, then inductance L 1 and 1 series connection of the first capacitor C are connected in parallel between the first inductive coupler coils 3a and the second inductive coupler coils 3b; The second capacitor C 2 is in parallel with the second inductive coupler coils 3b.Can regulate electric current in inductive coupler coils 3a, the 3b by the capacitance of regulating the first capacitor C 1 and the second capacitor C 2.Current sensor 25 ' is connected between electric current regulating networks 23 ' and the inductive coupler coils 3, for detection of the current value in inductive coupler coils 3a, the 3b, and the inductive coupler coils 3a that detects, the current value in the 3b is sent to controller 24 '.Current value in the inductive coupler coils 3a that controller 24 ' detects according to current sensor 25 ', the 3b and the current value of user preset obtain the regulated quantity of the first capacitor C 1 and the second capacitor C 2, and regulate the capacitance of the first capacitor C 1 and the second capacitor C 2 according to the regulated quantity of the first capacitor C 1 and the second capacitor C 2, thereby regulate the electric current in inductive coupler coils 3a, the 3b, and then make the electric current of the first inductive coupler coils 3a and the second inductive coupler coils 3b reach required current ratio value.
As from the foregoing, Double-output matcher not only can make the output impedance of radio-frequency power supply and the impedance matching between the plasma load, and can regulate the interior electric current of inductive coupler coils, thus current amplitude is evenly distributed, and then make being evenly distributed of the interior plasma density of reaction chamber.Yet in actual use, owing to the electric current regulating networks are realized by variable capacitance, so the time that electric current is regulated is long.In addition, because variable capacitance is moving component, not only need periodic maintenance, and in adjustment process, easily damage, thereby affect useful life of Double-output matcher.
The utility model content
For solving the aforementioned problems in the prior, the utility model provides a kind of adaptation and plasma processing device, and it is short that its electric current is regulated the time, and long service life.
For achieving the above object, the utility model provides a kind of adaptation, comprises the electric current regulating networks, and described electric current regulating networks are used for regulating the electric current in the radio-frequency power supply input induction coil, and described electric current regulating networks comprise: n fixed capacity and n on-off controller,
Wherein, m described fixed capacity connected with m described on-off controller and formed m capacitance network unit, with n the described capacitance network unit Capacitance parallel connection network that obtains in parallel, with the optionally conducting and regulate the capacitance of described Capacitance parallel connection network of n described on-off controller, thereby regulate the electric current in the described induction coil, wherein, n is the integer greater than 2, and m is the integer between 1 to n.
Wherein, described electric current regulating networks comprise the first output and the second output, connect respectively the first induction coil and the second induction coil;
Described electric current regulating networks also comprise inductance and the first electric capacity, are connected in parallel on after described inductance and described the first capacitances in series between described the first output and described the second output; One end of described Capacitance parallel connection network is connected other end ground connection with described the second output;
By regulating the capacitance of described Capacitance parallel connection network, regulate the current value in described the first induction coil and described the second induction coil.
Wherein, described electric current regulating networks comprise the first output and the second output, connect respectively the first induction coil and the second induction coil;
Described electric current regulating networks also comprise inductance and the second electric capacity, described inductance be connected in parallel between described the first output and described the second output after described Capacitance parallel connection network is connected; One end of described the second electric capacity is connected other end ground connection with described the second output;
By regulating the capacitance of described Capacitance parallel connection network, regulate the current value in described the first induction coil and described the second induction coil.
Wherein, described electric current regulating networks comprise the first output and the second output, connect respectively the first induction coil and the second induction coil;
Described electric current regulating networks comprise inductance and two described Capacitance parallel connection networks, described inductance be connected in parallel between described the first output and described the second output after one of them described Capacitance parallel connection network is connected; One end of another described Capacitance parallel connection network is connected other end ground connection with described the second output;
By regulating the capacitance of described Capacitance parallel connection network, regulate the current value in described the first induction coil and described the second induction coil.
Wherein, also comprise:
Current controller, the current value in the described induction coil that is used for setting according to the user calculates the capacitance of described Capacitance parallel connection network, and according to the capacitance of described Capacitance parallel connection network with n optionally conducting of described on-off controller.
Wherein, also comprise:
Current sensor be used for monitoring the current value in the described induction coil, and the current value in the described induction coil that will monitor is sent to described current controller.
Wherein, described on-off controller is relay or diode.
Wherein, also comprise:
Impedance matching network is used for making the impedance matching between radio-frequency power supply and the load;
Impedance transducer is for detection of the voltage on the radio-frequency transmission line, electric current, forward power and backward power;
Impedance controller is used for obtaining the impedance adjustment amount according to the voltage on the described radio-frequency transmission line, electric current, forward power and backward power;
Performance element is used for regulating the input impedance of described impedance matching network according to described impedance adjustment amount, thereby makes the impedance matching between radio-frequency power supply and the load.
The invention provides a kind of plasma processing device, comprise radio-frequency power supply, adaptation, induction coil and reaction chamber, described induction coil is arranged on the outside of described reaction chamber and is connected with described radio-frequency power supply, described radio-frequency power supply provides radio-frequency power by described induction coil in described reaction chamber, described adaptation is arranged between described radio-frequency power supply and the described induction coil, and described adaptation adopts described adaptation provided by the invention.
The utlity model has following beneficial effect:
The adaptation that the utility model provides comprises by n fixed capacity and n the Capacitance parallel connection network that on-off controller forms, and n fixed capacity is in parallel, on-off controller of series connection that each fixed capacity is corresponding, by on-off controller n fixed capacity selectivity is communicated with and the capacitance of control capacittance parallel network, thereby change the impedance of Capacitance parallel connection network, and then the electric current in the adjusting induction coil, this can shorten the time that adaptation is regulated electric current, improve the efficient of coupling, and long service life, can prolong maintenance period, thereby reduce operating cost.
The plasma processing device that the utility model provides, because the adaptation that adopts the utility model to provide, it comprises by n fixed capacity and n the Capacitance parallel connection network that on-off controller forms, n fixed capacity is in parallel, on-off controller of series connection that each fixed capacity is corresponding, by on-off controller n fixed capacity selectivity is communicated with and the capacitance of control capacittance parallel network, thereby change the impedance of Capacitance parallel connection network, and then the electric current in the adjusting induction coil, this can shorten the time that adaptation is regulated electric current, thereby improve the efficient of plasma processing device, and long service life, can prolong maintenance period, thereby reduce the operating cost of plasma processing device.
Description of drawings
Fig. 1 is the schematic diagram of inductive coupling plasma generator;
Fig. 2 is the theory diagram of another kind of inductive coupling plasma generator;
Fig. 3 is the structure chart of electric current regulating networks;
Fig. 4 is the schematic diagram of the utility model the first embodiment adaptation;
The schematic diagram of the another kind of adaptation that Fig. 5 provides for the utility model the second embodiment;
The schematic diagram of the another kind of adaptation that Fig. 6 provides for the utility model the 3rd embodiment;
Fig. 7 is the theory diagram of the utility model the 4th embodiment plasma processing device.
Embodiment
For making those skilled in the art understand better the technical solution of the utility model, below in conjunction with accompanying drawing adaptation and the plasma processing device that the utility model provides is described in detail.
Fig. 4 is the schematic diagram of the utility model the first embodiment adaptation.As shown in Figure 4, adaptation 2 is arranged between radio-frequency power supply 1 and the induction coil 3, and induction coil 3 is sent in the reaction chamber 4 by the radio-frequency power of induction coil 3 with radio-frequency power supply 1 near the arranged outside of reaction chamber 4.
As shown in Figure 4, electric current regulating networks 23 comprise inductance L, the first capacitor C 1 and Capacitance parallel connection network 23a ', inductance L is connected with the first capacitor C 1, then be connected in parallel between the first output terminals A and the second output B, an end that is inductance L is connected with the first output terminals A, the other end of inductance L is connected with the first capacitor C 1, and the other end of the first capacitor C 1 is connected with the second output B.The end of Capacitance parallel connection network 23a ' is connected other end ground connection with the second output B.
Capacitance parallel connection network 23a ' comprises five fixed capacity C23a, C23b, C23c, C23d, C23e and five relay K 23a, K23b, K23c, K23d, K23e, fixed capacity is connected first then in parallel with relay, namely the first fixed capacity C23a connects with the first relay K 23a and forms the first capacitance network unit, the second fixed capacity C23b connects with the second relay K 23b and forms the second capacitance network unit, the 3rd fixed capacity C23c connects with the 3rd relay K 23c and forms the 3rd capacitance network unit, the 4th fixed capacity C23d connects with the 4th relay K 23d and forms the 4th capacitance network unit, and the 5th fixed capacity C23e connects with the 5th relay K 23e and forms the 5th capacitance network unit; The first capacitance network unit, the second capacitance network unit, the 3rd capacitance network unit, the 4th capacitance network unit and the 5th capacitance network unit are in parallel, thereby form Capacitance parallel connection network 23a '.With five relay K 23a, K23b, K23c, K23d, K23e optionally conducting can regulate the capacitance of whole Capacitance parallel connection network 23a ', thereby can regulate the current value in the induction coil 3.
Preferably, adaptation also comprises:
Wherein, the first current sensor 25a is connected between first output terminals A and the first induction coil 3a of electric current regulating networks 23, is used for measuring the current value in the first induction coil 3a.The second current sensor 25b is connected between the second output B and the second induction coil 3b of electric current regulating networks 23, is used for measuring the current value in the second induction coil 3b.
The signal output part of current controller 24b is connected with the signal end of relay K 23a, K23b, K23c, K23d, K23e.The current ratio value that current controller 24b sets according to the user, directly calculate the value of the variable capacitance that can realize this current ratio, and output control signal, the conducting of control relay K23a, K23b, K23c, K23d, K23e or disconnection, so that Capacitance parallel connection network 23a ' exports corresponding capacitance, thereby change the current value in the first induction coil 3a and the second induction coil 3b, and make the current value in the first induction coil 3a and the second induction coil 3b reach the required current ratio value of user.
The first current sensor 25a and the second current sensor 25b are arranged between electric current regulating networks 23 and the induction coil 3, wherein, the first current sensor 25a is connected between first output terminals A and the first induction coil 3a of electric current regulating networks 23, and the second current sensor 25b is connected between the second output B and the second induction coil 3b of electric current regulating networks 23.The first current sensor 25a and the second current sensor 25b are respectively applied to monitor the current value in the first induction coil 3a and the second induction coil 3b, and with the current value input current controller 24b that senses.
During use, the user is according to the current ratio value in actual process requirement setting the first induction coil 3a and the second induction coil 3b, current controller 24b obtains the capacitance of electric current regulating networks 23 according to the current ratio value of setting, and according to the capacitance of these electric current regulating networks 23 with optionally conducting of relay, so that the ratio of the current value in the first induction coil 3a and the second induction coil 3b reaches default current ratio value.
In the first embodiment, adaptation also comprises impedance transducer 21, impedance matching network 22, impedance controller 24a and performance element (not shown).Impedance matching network 21 and electric current regulating networks 23 are connected on the radio-frequency transmission line, are used for making the impedance matching between radio-frequency power supply 1 and the load 4.
The signal input part of impedance controller 24a is connected with impedance transducer 21, be used for receiving the input variables such as voltage, electric current, forward power and backward power that impedance transducer 21 obtains, and obtain the impedance adjustment amount of impedance matching network 21 according to input variables such as the voltage on the radio-frequency transmission line, electric current, forward power and backward powers.
Performance element is used for regulating the input impedance of impedance matching network.Particularly, performance element receives the impedance adjustment amount of impedance controller 24a, and regulates the input impedance of impedance matching network 22 according to the impedance adjustment amount, thereby makes the impedance matching between radio-frequency power supply 1 and the load.In the present embodiment, load is the plasma load in the reaction chamber 4.
The schematic diagram of the another kind of adaptation that Fig. 5 provides for the utility model the second embodiment.As shown in Figure 5, adaptation comprises impedance transducer 21, impedance matching network 22, electric current regulating networks 23, impedance controller 24a, current controller 24b and current sensor 25.
Electric current regulating networks 23 are provided with two outputs, i.e. the first output terminals A and the second output B, the first output terminals A be connected output B respectively with the first induction coil 3a be connected induction coil 3b and be connected.
Electric current regulating networks 23 comprise inductance L, Capacitance parallel connection network 23b ' and the second capacitor C 2.Wherein, be connected in parallel between the first output terminals A and the second output B after inductance L and the Capacitance parallel connection network 23b ' series connection, namely, one end of inductance L is connected with the first output terminals A, the other end of inductance L is connected with Capacitance parallel connection network 23b ', and the other end of Capacitance parallel connection network 23b ' is connected with the second output B.One end of the second capacitor C 2 is connected other end ground connection with the second output B.
Capacitance parallel connection network 23b ' comprises five fixed capacity C23a, C23b, C23c, C23d, C23e and five diode D23a, D23b, D23c, D23d, D23e, fixed capacity is connected first then in parallel with diode, namely the first fixed capacity C23a connects with the first diode D23a and forms the first capacitance network unit, the second fixed capacity C23b connects with the second diode D23b and forms the second capacitance network unit, the 3rd fixed capacity C23c connects with the 3rd diode D23c and forms the 3rd capacitance network unit, the 4th fixed capacity C23d connects with the 4th diode D23d and forms the 4th capacitance network unit, and the 5th fixed capacity C23e connects with the 5th diode D23e and forms the 5th capacitance network unit; The first capacitance network unit, the second capacitance network unit, the 3rd capacitance network unit, the 4th capacitance network unit and the 5th capacitance network unit are in parallel, thereby form Capacitance parallel connection network 23b '.With five diode D23a, D23b, D23c, D23d, the D23e capacitance that optionally conducting can control capacittance parallel network 23b ', thereby can regulate current value in the induction coil 3.
In a second embodiment, other structure except electric current regulating networks 23 is identical with the first embodiment, does not repeat them here.
The schematic diagram of the another kind of adaptation that Fig. 6 provides for the utility model the 3rd embodiment.As shown in Figure 6, adaptation comprises impedance transducer 21, impedance matching network 22, electric current regulating networks 23, impedance controller 24a, current controller 24b and current sensor 25.
The impedance matching network 22 that the 3rd embodiment provides is provided with two outputs, i.e. the first output terminals A and the second output B, the first output terminals A be connected output B respectively with the first induction coil 3a be connected induction coil 3b and be connected.
Electric current regulating networks 23 comprise inductance L, the first Capacitance parallel connection network 23a ' and the second Capacitance parallel connection network 23b '.Be connected in parallel between the first output terminals A and the second output B after inductance L and the first Capacitance parallel connection network 23a ' series connection, namely, one end of inductance L is connected with the first output terminals A, the other end of inductance L is connected with the first Capacitance parallel connection network 23a ', and the other end of the first Capacitance parallel connection network 23a ' is connected with the second output B.The end of the second Capacitance parallel connection network 23b ' is connected other end ground connection with the second output B.
The described Capacitance parallel connection network of first Capacitance parallel connection network 23a ' employing the first embodiment 23a ', the described Capacitance parallel connection network of second Capacitance parallel connection network 23b ' employing the second embodiment 23b '.
In the 3rd embodiment, other structure except electric current regulating networks 23 is identical with the second embodiment with the first embodiment, does not repeat them here.
Need to prove, in the above-described embodiments, the electric current regulating networks are provided with five fixed capacities and five relays, and namely Capacitance parallel connection network 23a ' is provided with five fixed capacities and five relays, yet the utility model is not limited to this.The utility model Capacitance parallel connection network also can arrange n fixed capacity and n relay, each fixed capacity is connected with a relay, namely m fixed capacity connected with m relay and formed m capacitance network unit, wherein, n is the integer greater than 2, m is the integer between 1 to n, thereby obtains n capacitance network unit, and n capacitance network unit is in parallel.During use, obtain the capacitance of Capacitance parallel connection network according to the required current value of user, can make the Capacitance parallel connection network obtain required capacitance certain several optionally conducting in n the relay.
Also it should be noted that, the adaptation that above-described embodiment provides is the capacitance of regulating electric current regulating networks 23 by optionally conducting diode or relay, yet the utility model is not limited to this.The utility model also can adopt other on-off controller that is similar to diode or relay to regulate the capacitance of electric current regulating networks 23.
The adaptation that above-described embodiment provides in actual use can be according to the electric capacity of the required definite setting of adjustable range and the minimal adjustment interval fixed capacity of user.For example, if the adjustable range of customer requirements electric current regulating networks is 50～150pf, control interval is 5pf, so, six fixed capacities can be set, and the electric capacity of six fixed capacities is respectively 5pf, 10pf, 20pf, 20pf, 50pf and 100pf.The capacitance of electric current regulating networks is regulated in 50～150pf scope with the interval of 5pf.
The adaptation that the utility model provides comprises by n fixed capacity and n the Capacitance parallel connection network that on-off controller forms, and n fixed capacity is in parallel, on-off controller of series connection that each fixed capacity is corresponding, by on-off controller n fixed capacity selectivity is communicated with and the capacitance of control capacittance parallel network, thereby change the impedance of Capacitance parallel connection network, and then regulate the electric current in the induction coil.During use, only need with on-off controller optionally conducting can regulate electric current in the induction coil, therefore can shorten the time that adaptation is regulated electric current, improve the efficient of adaptation.In addition, for tunable capacitor, the long service life of fixed capacity can prolong maintenance period, thereby reduces operating cost.
The 4th embodiment provides a kind of plasma processing device, as shown in Figure 7, is the theory diagram of the utility model the 4th embodiment plasma processing device.Plasma processing device comprises radio-frequency power supply 71, adaptation 72, induction coil 73 and reaction chamber 74, induction coil 73 is arranged on the outside of reaction chamber 74 and is connected with radio-frequency power supply 71, radio-frequency power supply 71 provides radio-frequency power by induction coil 73 in reaction chamber 74, adaptation 72 is arranged between radio-frequency power supply and the induction coil, the adaptation that described adaptation above-described embodiment provides.
The plasma processing device that the 4th embodiment provides, because the adaptation that adopts the utility model to provide, can shorten adaptation and regulate the time of electric current, thereby improve the efficient of plasma processing device, and long service life, can prolong maintenance period, thereby reduce the operating cost of plasma processing device.
Be understandable that, above execution mode only is the illustrative embodiments that adopts for principle of the present utility model is described, yet the utility model is not limited to this.For those skilled in the art, in the situation that do not break away from spirit of the present utility model and essence, can make various modification and improvement, these modification and improvement also are considered as protection range of the present utility model.
Claims (9)
1. an adaptation comprises the electric current regulating networks, and described electric current regulating networks are used for regulating the electric current in the radio-frequency power supply input induction coil, it is characterized in that, described electric current regulating networks comprise: n fixed capacity and n on-off controller,
Wherein, m described fixed capacity connected with m described on-off controller and formed m capacitance network unit, with n the described capacitance network unit Capacitance parallel connection network that obtains in parallel, with the optionally conducting and regulate the capacitance of described Capacitance parallel connection network of n described on-off controller, thereby regulate the electric current in the described induction coil, wherein, n is the integer greater than 2, and m is the integer between 1 to n.
2. adaptation according to claim 1 is characterized in that, described electric current regulating networks comprise the first output and the second output, connects respectively the first induction coil and the second induction coil;
Described electric current regulating networks also comprise inductance and the first electric capacity, are connected in parallel on after described inductance and described the first capacitances in series between described the first output and described the second output; One end of described Capacitance parallel connection network is connected other end ground connection with described the second output;
By regulating the capacitance of described Capacitance parallel connection network, regulate the current value in described the first induction coil and described the second induction coil.
3. adaptation according to claim 1 is characterized in that, described electric current regulating networks comprise the first output and the second output, connects respectively the first induction coil and the second induction coil;
Described electric current regulating networks also comprise inductance and the second electric capacity, described inductance be connected in parallel between described the first output and described the second output after described Capacitance parallel connection network is connected; One end of described the second electric capacity is connected other end ground connection with described the second output;
By regulating the capacitance of described Capacitance parallel connection network, regulate the current value in described the first induction coil and described the second induction coil.
4. adaptation according to claim 1 is characterized in that, described electric current regulating networks comprise the first output and the second output, connects respectively the first induction coil and the second induction coil;
Described electric current regulating networks comprise inductance and two described Capacitance parallel connection networks, described inductance be connected in parallel between described the first output and described the second output after one of them described Capacitance parallel connection network is connected; One end of another described Capacitance parallel connection network is connected other end ground connection with described the second output;
By regulating the capacitance of described Capacitance parallel connection network, regulate the current value in described the first induction coil and described the second induction coil.
5. adaptation according to claim 1 is characterized in that, also comprises:
Current controller, the current value in the described induction coil that is used for setting according to the user calculates the capacitance of described Capacitance parallel connection network, and according to the capacitance of described Capacitance parallel connection network with n optionally conducting of described on-off controller.
6. adaptation according to claim 5 is characterized in that, also comprises:
Current sensor be used for monitoring the current value in the described induction coil, and the current value in the described induction coil that will monitor is sent to described current controller.
7. adaptation according to claim 1 is characterized in that, described on-off controller is relay or diode.
8. adaptation according to claim 1 is characterized in that, also comprises:
Impedance matching network is used for making the impedance matching between radio-frequency power supply and the load;
Impedance transducer is for detection of the voltage on the radio-frequency transmission line, electric current, forward power and backward power;
Impedance controller is used for obtaining the impedance adjustment amount according to the voltage on the described radio-frequency transmission line, electric current, forward power and backward power;
Performance element is used for regulating the input impedance of described impedance matching network according to described impedance adjustment amount, thereby makes the impedance matching between radio-frequency power supply and the load.
9. plasma processing device, comprise radio-frequency power supply, adaptation, induction coil and reaction chamber, described induction coil is arranged on the outside of described reaction chamber and is connected with described radio-frequency power supply, described radio-frequency power supply provides radio-frequency power by described induction coil in described reaction chamber, described adaptation is arranged between described radio-frequency power supply and the described induction coil, it is characterized in that, described adaptation adopts the described adaptation of claim 1-8 any one.
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| CN 201220524313 CN202905659U (en) | 2012-10-12 | 2012-10-12 | Matching device and plasma processing equipment |
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| CN 201220524313 CN202905659U (en) | 2012-10-12 | 2012-10-12 | Matching device and plasma processing equipment |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104244559A (en) * | 2014-09-02 | 2014-12-24 | 清华大学 | Plasma source device |
| CN104332379A (en) * | 2014-09-02 | 2015-02-04 | 清华大学 | Plasma discharging device |
| CN108012401A (en) * | 2016-10-28 | 2018-05-08 | 北京北方华创微电子装备有限公司 | RF impedance matching process, adaptation and semiconductor processing device |
| CN108122724A (en) * | 2016-11-30 | 2018-06-05 | 朗姆研究公司 | General non-intrusion type room impedance measurement system and correlation technique |
| CN108353493A (en) * | 2016-01-22 | 2018-07-31 | Spp科技股份有限公司 | Plasma control apparatus |
| CN110867362A (en) * | 2018-08-27 | 2020-03-06 | 北京北方华创微电子装备有限公司 | Radio frequency structure, process chamber and plasma generation method |
| CN110911262A (en) * | 2019-11-12 | 2020-03-24 | 北京北方华创微电子装备有限公司 | Inductively coupled plasma system |
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2012
- 2012-10-12 CN CN 201220524313 patent/CN202905659U/en not_active Expired - Lifetime
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104244559A (en) * | 2014-09-02 | 2014-12-24 | 清华大学 | Plasma source device |
| CN104332379A (en) * | 2014-09-02 | 2015-02-04 | 清华大学 | Plasma discharging device |
| CN108353493A (en) * | 2016-01-22 | 2018-07-31 | Spp科技股份有限公司 | Plasma control apparatus |
| CN108353493B (en) * | 2016-01-22 | 2020-05-19 | Spp科技股份有限公司 | Plasma control device |
| CN108012401A (en) * | 2016-10-28 | 2018-05-08 | 北京北方华创微电子装备有限公司 | RF impedance matching process, adaptation and semiconductor processing device |
| CN108122724A (en) * | 2016-11-30 | 2018-06-05 | 朗姆研究公司 | General non-intrusion type room impedance measurement system and correlation technique |
| CN108122724B (en) * | 2016-11-30 | 2020-03-13 | 朗姆研究公司 | Universal non-invasive chamber impedance measurement system and related methods |
| CN110867362A (en) * | 2018-08-27 | 2020-03-06 | 北京北方华创微电子装备有限公司 | Radio frequency structure, process chamber and plasma generation method |
| CN110911262A (en) * | 2019-11-12 | 2020-03-24 | 北京北方华创微电子装备有限公司 | Inductively coupled plasma system |
| CN110911262B (en) * | 2019-11-12 | 2022-07-22 | 北京北方华创微电子装备有限公司 | Inductively coupled plasma system |
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