CN202583645U - 玻璃基板蚀刻组件 - Google Patents
玻璃基板蚀刻组件 Download PDFInfo
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- CN202583645U CN202583645U CN 201220139970 CN201220139970U CN202583645U CN 202583645 U CN202583645 U CN 202583645U CN 201220139970 CN201220139970 CN 201220139970 CN 201220139970 U CN201220139970 U CN 201220139970U CN 202583645 U CN202583645 U CN 202583645U
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- glass substrate
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- adhesive tape
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- 239000011521 glass Substances 0.000 title claims abstract description 83
- 239000000758 substrate Substances 0.000 title claims abstract description 80
- 238000005530 etching Methods 0.000 title claims abstract description 44
- 239000000565 sealant Substances 0.000 claims abstract description 19
- 239000002390 adhesive tape Substances 0.000 claims description 30
- 239000012530 fluid Substances 0.000 claims description 16
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 claims description 10
- 239000004809 Teflon Substances 0.000 claims description 7
- 229920006362 Teflon® Polymers 0.000 claims description 7
- 239000003292 glue Substances 0.000 claims description 7
- -1 polytetrafluoroethylene Polymers 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 2
- 230000000712 assembly Effects 0.000 claims 2
- 238000000429 assembly Methods 0.000 claims 2
- 239000002253 acid Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 5
- 238000005498 polishing Methods 0.000 abstract description 5
- 238000007789 sealing Methods 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 239000011247 coating layer Substances 0.000 abstract 5
- 238000010586 diagram Methods 0.000 description 4
- 230000008595 infiltration Effects 0.000 description 4
- 238000001764 infiltration Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
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- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201220139970 CN202583645U (zh) | 2012-04-05 | 2012-04-05 | 玻璃基板蚀刻组件 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201220139970 CN202583645U (zh) | 2012-04-05 | 2012-04-05 | 玻璃基板蚀刻组件 |
Publications (1)
Publication Number | Publication Date |
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CN202583645U true CN202583645U (zh) | 2012-12-05 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 201220139970 Expired - Lifetime CN202583645U (zh) | 2012-04-05 | 2012-04-05 | 玻璃基板蚀刻组件 |
Country Status (1)
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CN (1) | CN202583645U (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103359949A (zh) * | 2013-07-24 | 2013-10-23 | 惠晶显示科技(苏州)有限公司 | Tft玻璃基板单面蚀刻的方法 |
CN104926145A (zh) * | 2015-05-20 | 2015-09-23 | 安徽力华光电玻璃科技有限公司 | 一种玻璃的刻蚀工艺 |
CN106746705A (zh) * | 2017-02-13 | 2017-05-31 | 京东方科技集团股份有限公司 | 玻璃单面减薄方法及玻璃减薄设备 |
CN106746697A (zh) * | 2016-11-28 | 2017-05-31 | 昆山国显光电有限公司 | 一种tft阵列基板单面蚀刻方法 |
CN115784625A (zh) * | 2022-12-01 | 2023-03-14 | 业泓科技(成都)有限公司 | 指纹辨识模组的减薄方法 |
-
2012
- 2012-04-05 CN CN 201220139970 patent/CN202583645U/zh not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103359949A (zh) * | 2013-07-24 | 2013-10-23 | 惠晶显示科技(苏州)有限公司 | Tft玻璃基板单面蚀刻的方法 |
CN104926145A (zh) * | 2015-05-20 | 2015-09-23 | 安徽力华光电玻璃科技有限公司 | 一种玻璃的刻蚀工艺 |
CN106746697A (zh) * | 2016-11-28 | 2017-05-31 | 昆山国显光电有限公司 | 一种tft阵列基板单面蚀刻方法 |
CN106746705A (zh) * | 2017-02-13 | 2017-05-31 | 京东方科技集团股份有限公司 | 玻璃单面减薄方法及玻璃减薄设备 |
CN106746705B (zh) * | 2017-02-13 | 2024-03-01 | 京东方科技集团股份有限公司 | 玻璃单面减薄方法及玻璃减薄设备 |
CN115784625A (zh) * | 2022-12-01 | 2023-03-14 | 业泓科技(成都)有限公司 | 指纹辨识模组的减薄方法 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: JIANGXI WG PHOTOELECTRIC CO., LTD. Free format text: FORMER NAME: JIANGXI WG PHOTOELECTRIC TECHNOLOGY CO., LTD. |
|
CP03 | Change of name, title or address |
Address after: 338004 Xinyu City, Jiangxi Province High - tech Industrial Development Zone Xicheng Avenue Vogg Industrial Park Patentee after: WG TECH (JIANGXI) CO., LTD. Address before: 338004 Xinyu City, Jiangxi Province High - tech Development Zone Xicheng Road Vogg Industrial Park Patentee before: Jiangxi Woge Optoelectronic Technology Co., Ltd. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20121205 |